Negative photosensitive pigment composition, cured product, organic el display device, electronic apparatus, and composition

Abstract

The present invention provides a negative photosensitive pigment composition that enables the formation of a black pixel-dividing layer having excellent light-blocking properties with suppressed peeling on a large-sized substrate, and that enables the manufacture of an organic EL display device in which the occurrence of dark spots is suppressed. The present invention is a negative photosensitive pigment composition containing: (a) a compound having only one 9,9-bis(naphthyl)fluorene skeleton per molecule and a total of two methacryloxy groups and acryloxy groups per molecule; (b) a resin having a repeating unit represented by formula (1) and / or a repeating unit represented by formula (2); (c) a photopolymerization initiator; (d) an organic black pigment and / or a mixed-color organic black pigment; and (e) an organic solvent, wherein the component (a) contains (a-1) a compound having only two hydroxyl groups per molecule and no carboxyl groups, (a-2) a compound having only one carboxyl group per molecule, and (a-3) a compound having only two carboxyl groups per molecule.

Description

Negative-type photosensitive pigment composition, cured product, organic EL display device, electronic device, and composition 【0001】 The present invention relates to negative-type photosensitive pigment compositions, cured products, organic EL display devices, electronic devices, and compositions. 【0002】 Many electronic devices equipped with organic electroluminescent (EL) displays, such as smartphones, televisions, and in-car monitors, have been developed. Organic EL displays are self-emissive displays that emit light using the energy from the recombination of electrons injected from the cathode and holes injected from the anode. Each light-emitting pixel, such as red, blue, green, or white, is formed in the opening of a patterned pixel division layer that functions as an insulating layer. 【0003】 A technology is attracting attention for forming a black pixel division layer (BPDL) that absorbs ambient light such as sunlight and prevents light reflection toward the viewer, with the aim of improving the visibility and contrast of electronic devices equipped with organic EL displays, reducing power consumption, and extending the product life by reducing the load on the light-emitting pixels. The black pixel division layer is also called a black pixel definition layer or black bank, and its pattern is formed by photolithography. 【0004】 In recent years, in order to improve productivity by manufacturing a larger number of organic EL display devices in batches, attempts have been made to form black pixel separation layers on large substrates with a large surface area per sheet. Therefore, there is a need for materials for forming black pixel separation layers that can achieve a high yield during manufacturing regardless of the size of the substrate. Furthermore, from the aforementioned perspective, in order to increase the added value of electronic devices, there is a simultaneous need for further improvement in the light-shielding properties per 1.0 μm of film thickness of the black pixel separation layer without increasing the thickness of the formed film. 【0005】 As a material for forming a black pixel splitting layer, for example, a negative-type photosensitive pigment composition containing an organic black pigment and a compound having only one 9,9-bis(naphthyl)fluorene skeleton in the molecule and a total of two methacryloxy and acryloxy groups in the molecule is disclosed in Patent Document 1. 【0006】 International Publication No. 2022 / 172780 【0007】 However, when a black pixel segmentation layer is formed on a large substrate using the negative-type photosensitive pigment composition disclosed in Patent Document 1, a problem arises in that dark spots occur in the light-emitting pixels only in certain areas when an organic EL display device equipped with it is driven. Furthermore, when attempting to form a black pixel segmentation layer with improved light-shielding properties by increasing the blending ratio of the pigment dispersion, a problem arises in that peeling occurs, as well as even more dark spots. For these reasons, there has been a strong demand for a material that has high compatibility with large substrates and can form a black pixel segmentation layer with high light-shielding properties while suppressing peeling and dark spots. 【0008】 The inventors have found that increasing the pigment content in the solids of a negative-type photosensitive pigment composition often leads to deterioration of alkali developability and a tendency for peeling due to a decrease in the photocrosslinking density of the film. Therefore, those skilled in the art often employ countermeasures such as increasing the acid value of the alkali-soluble resin and increasing the number of ethylenically unsaturated double bonds in the pre-baked film. However, such conventional methods have not solved the aforementioned problems. As a result of diligent research, the inventors have found that a negative-type photosensitive pigment composition containing a combination of compounds having multiple types of 9,9-bis(naphthyl)fluorene skeletons with a specific structure, and further containing a resin having repeating units of a specific structure, exhibits an extremely remarkable effect in solving the aforementioned problems. 【0009】In other words, the present invention is as follows: [1] A negative-type photosensitive pigment composition comprising: (a) a compound having only one 9,9-bis(naphthyl)fluorene skeleton in the molecule and a total of 2 methacryloxy groups and acryloxy groups in the molecule; (b) a resin having a repeating unit represented by formula (1) and / or a repeating unit represented by formula (2) described later; (c) a photopolymerization initiator; (d) an organic black pigment and / or a mixed organic black pigment; and (e) an organic solvent, wherein component (a) comprises: (a-1) a compound having only two hydroxyl groups in the molecule and no carboxyl group; (a-2) a compound having only one carboxyl group in the molecule; and (a-3) a compound having only two carboxyl groups in the molecule. [2] The negative-type photosensitive pigment composition according to [1], wherein component (a-2) comprises a compound represented by formula (8) described later. [3] The content of component (a-1) is X １ (Parts by mass), the content of the above-mentioned (a-2) component is Y １ (Parts by mass), the content of the above-mentioned (a-3) component is Z １ When (mass part), X １ Y １ and Z １ The negative-type photosensitive pigment composition according to [1] or [2], wherein the value obtained by dividing by the sum of the values ​​is 0.5 or more and 10.0 or less. [4] In formula (8) described later, R ２８[2] The negative-type photosensitive pigment composition according to [2], wherein the group is selected from the group consisting of the group represented by formula (14), the group represented by formula (15), the group represented by formula (16), and the group represented by formula (17), as described later. [5] The negative-type photosensitive pigment composition according to any one of [1] to [4], wherein the component (b) has a repeating unit represented by formula (32) and / or a repeating unit represented by formula (33), as described later, in addition to a repeating unit represented by formula (34), as described later. [6] The negative-type photosensitive pigment composition according to any one of [1] to [5], wherein the component (d) contains the organic black pigment, the organic black pigment contains a benzodifuranone-based black pigment, and further contains a pigment represented by formula (49). [7] A cured product of the negative-type photosensitive pigment composition according to any one of [1] to [6]. [8] An organic EL display device comprising the cured product according to [7]. [9] An electronic device comprising the organic EL display device according to [8].

[10] (a) A composition comprising a compound having only one 9,9-bis(naphthyl)fluorene skeleton in the molecule and a total of 2 methacryloxy groups and acryloxy groups in the molecule, wherein component (a) comprises (a-1) a compound having only two hydroxyl groups in the molecule and no carboxyl groups, (a'-2) a compound represented by formula (93) described later, and (a-3) a compound having only two carboxyl groups in the molecule. 【0010】 The present invention provides a negative-type photosensitive pigment composition that enables the formation of a black pixel division layer with excellent light-shielding properties that suppresses peeling on a large substrate, and enables the manufacture of an organic EL display device in which the occurrence of dark spots is suppressed. 【0011】 This diagram shows a cross-sectional view of a TFT substrate in an organic EL display device equipped with a black pixel splitting layer, which is a specific example of an embodiment of the present invention. This is a schematic diagram showing a specific example of peeling of the black pixel splitting layer that occurred during the manufacturing process of the organic EL display device. This is a schematic cross-sectional view showing the taper angle θ at the end of the opening of the black pixel splitting layer. This is a schematic diagram showing a dark spot that occurred in the light-emitting pixel when the organic EL display device is operated. This is a schematic diagram showing the manufacturing process of the organic EL display device, including the process of forming the black pixel splitting layer. 【0012】The present invention will be described in detail below. A numerical range expressed using "~" means a range that includes the numerical values ​​written before and after "~" as the lower and upper limits. A pixel division layer means a pixel division layer provided by an organic EL display device. Visible light means light in the region of wavelengths from 380 nm to less than 780 nm, and near-ultraviolet light means light in the region of 200 nm to less than 380 nm. Light shielding means the function of reducing the intensity of transmitted light compared to the intensity of light incident perpendicular to the cured film, and light shielding property means the degree to which visible light is shielded. A photosensitive composition means a composition that is photosensitive to near-ultraviolet light. Weight-average molecular weight (Mw) is a value obtained by analysis using gel permeation chromatography with tetrahydrofuran as a carrier and converted using a calibration curve with standard polystyrene. The designation "C.I." used for some colorants stands for Color Index Generic Name. Based on the Color Index issued by The Society of Dyers and Colourists, for colorants registered in the Color Index, the Color Index Generic Name represents the chemical structure or crystalline form of the pigment or dye. Organic yellow pigments include all organic pigments and organometallic complex pigments classified as C.I. Pigment Yellow, organic blue pigments include all organic pigments and organometallic complex pigments classified as C.I. Pigment Blue, and organic purple pigments include all organic pigments and organometallic complex pigments classified as C.I. Pigment Violet. The same applies to organic red pigments and organic brown pigments. In this specification, C.I. I. Carbon black, such as Pigment Black 7, is defined as an inorganic black pigment. Solid content refers to the proportion (mass%) of components excluding solvent and water in the negative-type photosensitive pigment composition. The first aspect of the present invention, the negative-type photosensitive pigment composition, is described below. 【0013】The negative photosensitive pigment composition of the present invention comprises: (a) a compound having only one 9,9-bis(naphthyl)fluorene skeleton in the molecule and a total of 2 methacryloxy groups and acryloxy groups in the molecule; (b) a resin having a repeating unit represented by formula (1) and / or a repeating unit represented by formula (2); (c) a photoinitiator; (d) an organic black pigment and / or a mixed-color organic black pigment; and (e) an organic solvent, and is a negative photosensitive pigment composition, wherein the component (a) contains: (a-1) a compound having only 2 hydroxyl groups in the molecule and no carboxyl group; (a-2) a compound having only 1 carboxyl group in the molecule; and (a-3) a compound having only 2 carboxyl groups in the molecule. 【0014】 【0015】 In formula (1) and formula (2), R １ and R ４ each independently represents a hydrogen atom or a methyl group, R ２ and R ５ each independently represents a divalent group having 1 to 5 carbon atoms containing -COO- or -CONH-, R ３ , R ６ and R ７ each independently represents an alkyl group having 1 to 3 carbon atoms, n １ is an integer and represents 1 or 2, n ４ and n ６ are integers and each independently represents 0 or 1, provided that the sum of n ４ and n ６ is 1 or 2, n ２ , n ３ and n ５ are integers and each independently represents 0 or 1, and * represents a bonding site. 【0016】The first aspect of the present invention, a negative-type photosensitive pigment composition, enables the formation of a black pixel division layer with excellent light-shielding properties by suppressing peeling on a large substrate, and enables the manufacture of an organic EL display device in which the occurrence of dark spots is suppressed. Here, peeling refers to a state in which at least a part of the black pixel division layer peels off, and the parts that are originally necessary are missing. Examples of missing states include a state in which, although the formed film thickness should be 1.5 μm, interlayer delamination of the black pixel division layer results in a localized area with a film thickness of 0.5 μm, or a state in which interlayer delamination between the surface of the first electrode and the black pixel division layer results in a localized area where the black pixel division layer is not formed. Here, a dark spot refers to a localized non-emitting defect area that is visible as a granular dark spot within a single light-emitting pixel when an organic EL display device equipped with a black pixel division layer is driven. Note that a dark spot is a different mode of defect from a non-illuminated pixel in which the entire light-emitting pixel does not emit light. 【0017】 The negative-type photosensitive pigment composition of the present invention has negative-type photosensitivity. Negative-type photosensitivity means that the dissolution rate of the film in the exposed area in the alkaline developer can be made relatively slower than the dissolution rate of the film in the unexposed area in the alkaline developer, and pattern formation becomes possible by removing the film in the unexposed area. Here, the exposed area means the area that has been irradiated with exposure light including near ultraviolet light, and the unexposed area means the area that has not been irradiated with exposure light including near ultraviolet light. 【0018】 The negative-type photosensitive pigment composition of the present invention contains (a) a compound having only one 9,9-bis(naphthyl)fluorene skeleton in the molecule and a total of 2 methacryloxy groups and acryloxy groups in the molecule (hereinafter sometimes referred to as "component (a)"). 【0019】(a) The methacryloxy and / or acryloxy groups of component (a) are radical polymerizable groups, and in the exposure process, they can be photocured in a chain reaction by the generation of radical active species derived from the photopolymerization initiator (c) described later, thus functioning as a photosensitive agent to impart negative photosensitivity. The total number of methacryloxy and acryloxy groups in the molecule is 2, which allows for an appropriate crosslinking density of the film in the exposed area, resulting in a black pixel splitting layer with a low taper angle at the edge of the opening after the curing process and excellent film formation properties for the second electrode described later. 【0020】 The negative-type photosensitive pigment composition of the present invention contains, as components belonging to component (a) above, (a-1) a compound having only two hydroxyl groups in the molecule and no carboxyl groups (hereinafter sometimes referred to as "component (a-1)"), (a-2) a compound having only one carboxyl group in the molecule (hereinafter sometimes referred to as "component (a-2)"), and (a-3) a compound having only two carboxyl groups in the molecule (hereinafter sometimes referred to as "component (a-3)") as essential components. The hydroxyl groups referred to here are -OH and -O － It encompasses and means, and the carboxyl group is synonymous with the carboxyl group, -COOH and -COO － It encompasses and means. 【0021】 At least some of the hydroxyl groups and / or carboxyl groups of component (a) may form salts with components other than component (a). Specific examples of components that can form salts include the basic catalyst used in the synthesis process of component (a), and the tertiary amino groups and pyridyl groups of component (f), which will be described later. 【0022】 The carboxyl groups in components (a-2) and (a-3) are preferably carboxyl groups from the reaction residues of dicarboxylic acid anhydrides in order to suppress dark spots. Furthermore, the negative-type photosensitive pigment composition of the present invention preferably does not contain reaction residues of tetracarboxylic dianhydrides in order to suppress dark spots. 【0023】Examples of reaction residues for dicarboxylic acid anhydrides include the group represented by formula (3), and a specific example is the group represented by formula (5), which is the reaction residue for nadic acid anhydride. Examples of reaction residues for tetracarboxylic dianhydrides include the group represented by formula (4), and a specific example is the group represented by formula (6), which is the reaction residue for 3,3',4,4'-biphenyltetracarboxylic dianhydride. 【0024】 【0025】 In formula (3), X １ X represents a divalent group derived from the substructure of a dicarboxylic acid anhydride, excluding one acid anhydride group. In formula (4), X ２ represents a tetravalent group derived from the substructure of tetracarboxylic dianhydride excluding the two acid anhydride groups. In formulas (3), (4), (5), and (6), * represents a bond site with a carbon atom. 【0026】 In this invention, the effect of suppressing dark spots is thought to be due to the combined action of multiple mechanisms, but the technical feature of having extremely little dependence on the water pressure level during the rinsing process is thought to have played at least an advantageous role. When the rinsing process is performed on a large substrate, there is a tendency for the water pressure applied to the substrate surface to become uneven, with high water pressure in areas close to the nozzle outlet and low water pressure in areas farther away. As component (a), the synergistic effect of combining components (a-1), (a-2), and (a-3), which have a stepwise difference in the number of carboxyl groups in the molecule, with component (b), which will be described later, makes it possible to suppress peeling even in areas with high water pressure, and to easily remove development residue even in areas with low water pressure. Furthermore, the alkaline developer solution of the negative-type photosensitive pigment composition generated in the development process is less likely to re-adhere to the surface of the first electrode, and as a result, dark spots are thought to be suppressed. In the negative-type photosensitive pigment composition described in Patent Document 1, the higher the pigment content in the solid content, the more likely this problem is to occur. Therefore, the higher the light-shielding properties of the black pixel splitting layer, the more useful the technical effects of the present invention become. 【0027】Furthermore, component (a-1) has a cardo skeleton in which two naphthalene rings, which are even more rigid and hydrophobic than the benzene ring, are single-bonded to the carbon atom at position 9 of the fluorene skeleton. It has only two hydroxyl groups and no carboxyl groups, which prevents excessive penetration of high-concentration alkaline developer (e.g., 2.38% by mass of tetramethylammonium hydroxide) into the film in the photocrosslinked areas of at least components (a-1), (a-2), and (a-3), thereby suppressing peeling. 【0028】 (a-1) As for component (a-1), a compound represented by formula (7) is preferred in terms of suppressing peeling. 【0029】 【0030】 In formula (7), A １ R represents a divalent group with 13 to 21 carbon atoms containing only one fluorene skeleton, ８ and R ９ Each of these independently represents a hydrogen atom or a methyl group, R １０ , R １１ , R １２ and R １３ Each of these independently represents an alkylene group having 1 to 4 carbon atoms, R １４ , R １５ , R １６ and R １７ n represents an alkyl group having 1 to 3 carbon atoms. ７ , n ８ , n ９ and n １０ n are integers, each independently representing either 0 or 1. １１ , n １２ , n １３ and n １４ These are integers, each independently representing a value between 0 and 3. 【0031】 In suppressing dark spots, n １１ , n １２ , n １３ and n １４ 0 is preferable. If further improvement in the flexibility of the black pixel division layer is required, R １０ , R １１ , R １２ and R１３ is an alkylene group having 2 to 4 carbon atoms, and n ７ , n ８ , n ９ and n １０ It is preferable that this value is 1. 【0032】 As component (a-2), a compound represented by formula (8) is preferred in order to achieve both suppression of peeling and suppression of dark spots. That is, the negative-type photosensitive pigment composition of the present invention preferably contains a compound represented by formula (8) as component (a-2). 【0033】 【0034】 In formula (8), A ２ R represents a divalent group with 13 to 21 carbon atoms containing only one fluorene skeleton, １８ and R １９ Each of these independently represents a hydrogen atom or a methyl group, R ２０ , R ２１ , R ２２ and R ２３ Each of these independently represents an alkylene group having 1 to 4 carbon atoms, R ２４ , R ２５ , R ２６ and R ２７ R represents an alkyl group having 1 to 3 carbon atoms. ２８ represents a divalent group with 2 to 10 carbon atoms, n １５ , n １６ , n １７ and n １８ n are integers, each independently representing either 0 or 1. １９ , n ２０ , n ２１ and n ２２ These are integers, each independently representing a value between 0 and 3. 【0035】 In suppressing dark spots, n １９ , n ２０ , n ２１ and n ２２ 0 is preferable. If further improvement in the flexibility of the black pixel division layer is required, R ２０ , R ２１ , R ２２ and R ２３is an alkylene group having 2 to 4 carbon atoms, and n １５ n １６ n １７ and n １８ are preferably 1. 【0036】 The component (a-3) is preferably a compound represented by the formula (9) for suppressing dark spots. 【0037】 【0038】 In the formula (9), A ３ represents a divalent group having 13 to 21 carbon atoms containing only one fluorene skeleton, and R ２９ and R ３０ each independently represent a hydrogen atom or a methyl group, and R ３１ R ３２ R ３３ and R ３４ each independently represent an alkylene group having 1 to 4 carbon atoms, and R ３５ R ３６ R ３７ and R ３８ represent an alkyl group having 1 to 3 carbon atoms, and R ３９ and R ４０ each independently represent a divalent group having 2 to 10 carbon atoms, and n ２３ n ２４ n ２５ and n ２６ are integers and each independently represent 0 or 1, and n ２７ n ２８ n ２９ and n ３０ are integers and each independently represent 0 to 3. For suppressing dark spots, n ２７ n ２８ n ２９ and n ３０ are preferably 0. When further improvement in flexibility is required for the black pixel division layer, R ３１ R ３２ R ３３ and R ３４ are alkylene groups having 2 to 4 carbon atoms, and n ２３ n ２４ n ２５ and n ２６ are preferably 1. 【0039】 In equations (7), (8), and (9), A １ A ２ and A ３ Examples of divalent groups with 13 to 21 carbon atoms containing only one fluorene skeleton that correspond to the above include the group represented by formula (10), the group represented by formula (11), the group represented by formula (12), and the group represented by formula (13). The group represented by formula (10) is preferred because it is economically advantageous and has an excellent effect in suppressing dark spots. That is, in order to suppress dark spots, the negative-type photosensitive pigment composition of the present invention contains a compound represented by formula (7) as component (a-1), and the compound represented by formula (7) is A in formula (7). １ It is more preferable that the compound contains a group represented by formula (10). Component (a-2) contains a compound represented by formula (8), and the compound represented by formula (8) contains A in formula (8). ２ It is most preferable that the compound contains a group represented by formula (10). Component (a-3) contains a compound represented by formula (9), and the compound represented by formula (9) contains A in formula (9). ３ It is more preferable that the compound contains a group represented by formula (10). 【0040】 【0041】 In formulas (10), (11), (12), and (13), * represents a bonding site with a carbon atom constituting the naphthalene ring. 【0042】 R in equation (8) ２８ , R in equation (9) ３９ and R ４０ Examples of divalent groups with 2 to 10 carbon atoms represented by include the group represented by formula (14), the group represented by formula (15), the group represented by formula (16), the group represented by formula (17), the group represented by formula (18), the group represented by formula (19), and the group represented by formula (20). 【0043】 【0044】 In equations (14), (15), (16), and (17), R ３９ , R ４０, R ４１ and R ４２ Each of these independently represents an alkyl group having 1 to 3 carbon atoms, n ３１ , n ３２ , n ３３ and n ３４ Each is an integer, independently representing either 0 or 1. * represents a connection point. 【0045】 【0046】 In equations (18), (19), and (20), * represents a bonding site. 【0047】 In particular, in suppressing dark spots, R in equation (8) ２８ , R in equation (9) ３９ and R ４０ The divalent group having 2 to 10 carbon atoms represented by is preferably the group represented by formula (14), the group represented by formula (15), the group represented by formula (16), and the group represented by formula (17), with the group represented by formula (14) being more preferred. This is R ２８ However, R is selected from the group consisting of the group represented by formula (14), the group represented by formula (15), the group represented by formula (16), and the group represented by formula (17). ２８ This effect is presumed to stem from the fact that the carboxyl group bonded to it has a moderately low acidic strength and weak interaction with other components in the negative-type photosensitive pigment composition, thus easily maintaining a good dispersion state of component (d), which will be described later. 【0048】 In other words, the negative-type photosensitive pigment composition of the present invention contains component (a-2) which contains a compound represented by formula (8), and in formula (8), R ２８ However, it is preferable that the group is selected from the group consisting of the group represented by formula (14), the group represented by formula (15), the group represented by formula (16), and the group represented by formula (17). 【0049】Specific examples of compounds belonging to component (a-1) include the compound represented by formula (21), the compound represented by formula (22), and the compound represented by formula (23). Specific examples of compounds belonging to component (a-2) include the compound represented by formula (24), the compound represented by formula (25), and the compound represented by formula (26). Specific examples of compounds belonging to component (a-2) include the compound represented by formula (27), the compound represented by formula (28), and the compound represented by formula (29). 【0050】 【0051】 【0052】 【0053】 (a) Preferably, the total content of components (a-1), (a-2), and (a-3) in 100% by mass of component (a) is 90 to 100% by mass. 【0054】 The content ratio of components (a-1), (a-2), and (a-3) is such that the content of component (a-1) is X in order to achieve both the suppression of peeling and the suppression of dark spots. １ The content of component (a-2) in parts by mass is Y １ The content of component (a-3) in parts by mass is Z １ When (mass part), X １ Y １ and Z １ The value obtained by dividing by the sum of the values ​​is preferably 0.5 or more and 10.0 or less. More preferably 1.0 or more and 8.0 or less. Also, Y １ Y １ and Z １ The value obtained by dividing by the total value is preferably 0.2 or more and 0.8 or less. More preferably 0.3 or more and 0.7 or less. That is, the negative-type photosensitive pigment composition of the present invention has a content of component (a-1) of X １ The content of component (a-2) in parts by mass is Y １ The content of component (a-3) in parts by mass is Z １ When (mass part), X １ Y １ and Z １It is preferable that the value obtained by dividing by the sum of the values ​​is between 0.5 and 10.0. 【0055】 (a) The content of component (a) is preferably 3 to 20% by mass, and more preferably 5 to 15% by mass, of 100% by mass of the solid content of the negative-type photosensitive pigment composition, in order to achieve both suppression of peeling and suppression of dark spots. 【0056】 (a) The chemical structure of the component was determined by proton nuclear magnetic resonance spectroscopy (hereinafter, １ It can be analyzed using known analytical methods such as 1H-NMR and liquid chromatography-mass spectrometry (LC-MS). 【0057】 (a-1) A method for obtaining component (a-1) is to use a compound having only one 9,9-bis(naphthyl)fluorene skeleton and only two glycidyl groups as a starting material, and react it with a monocarboxylic acid having only one (meth)acryloxy group by heating in a solvent. (meth)acryloxy group means methacryloxy group or acryloxy group. 【0058】Compounds having only one 9,9-bis(naphthyl)fluorene skeleton and only two glycidyl groups in the molecule include, for example, the compound represented by formula (30). Monocarboxylic acids having only one (meth)acryloxy group in the molecule include, for example, methacrylic acid, acrylic acid, sodium methacrylate, and sodium acrylate. The solvent can be selected from the group of organic solvents (e) described later. The heating conditions can be appropriately set according to the type of solvent and the desired reaction rate, with a liquid temperature of 90 to 150°C and a heating time of 2 to 10 hours being preferred. The reaction endpoint may be determined by the acid value. To avoid undesirable self-polymerization of (meth)acryloxy groups, polymerization inhibitors such as 4-methoxyphenol and hydroquinone may be added depending on the set heating conditions. To increase the reaction rate, the use of a basic catalyst is preferred. Examples include phosphorus-based catalysts such as triphenylphosphine, tertiary amine catalysts such as trimethylamine, triethylamine, and tributylamine, alkylammonium salt catalysts such as tetramethylammonium bromide, tetraethylammonium bromide, and tetrabutylammonium bromide, and inorganic catalysts such as sodium hydroxide and potassium hydroxide. The compound represented by formula (30) may also be obtained by reacting the compound represented by formula (31), described later, with epichlorohydrin, followed by purification. 【0059】 【0060】 In formula (30), A ４ R represents a divalent group with 13 to 21 carbon atoms containing only one fluorene skeleton, ４３ and R ４４ Each of these independently represents an alkylene group having 1 to 4 carbon atoms, R ４５ , R ４６ , R ４７ and R ４８ n represents an alkyl group having 1 to 3 carbon atoms. ３５ and n ３６ n are integers, each independently representing either 0 or 1. ３７ , n ３８ , n ３９ and n ４０ These are integers, each independently representing a value between 0 and 3. 【0061】 Another method involves using a compound as a starting material that has only one 9,9-bis(naphthyl)fluorene skeleton, only two hydroxyl groups, and no (meth)acryloxy groups, and reacting it with a compound that has only one (meth)acryloxy group and only one glycidyl group by heating in a solvent. 【0062】 Compounds having only one 9,9-bis(naphthyl)fluorene skeleton, only two hydroxyl groups, and no (meth)acryloxy group include, for example, the compound represented by formula (31). Compounds having only one (meth)acryloxy group and only one glycidyl group include, for example, glycidyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate glycidyl ether, and allyl glycidyl ether. The same considerations as above apply to the solvent, heating conditions, and catalyst. The compound represented by formula (31) can be obtained, for example, by the reaction of fluorenones and naphthols, and the synthesis method disclosed in Japanese Patent Application Publication No. 2005-295702 can be used. As a method for increasing purity, the synthesis and purification methods for 9,9-bis(4-(2-hydroxyethoxy)phenyl)fluorene crystals disclosed in Japanese Patent Publication No. 2018-24630 can be applied. 【0063】 【0064】 In formula (31), A ５ R represents a divalent group with 13 to 21 carbon atoms containing only one fluorene skeleton, ４９ and R ５０ Each of these independently represents an alkylene group having 1 to 4 carbon atoms, R ５１ , R ５２ , R ５３ and R ５４ n represents an alkyl group having 1 to 3 carbon atoms. ４１ and n ４２ n are integers, each independently representing either 0 or 1. ４３ , n ４４ , n ４５ and n ４６These are integers, each independently representing a value between 0 and 3. 【0065】 A method for obtaining component (a-2) and / or component (a-3) is, for example, a method in which component (a-1) is used as a starting material and a dicarboxylic acid anhydride is reacted by heating in a solvent. Examples of dicarboxylic acid anhydrides include maleic anhydride, succinic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2-cyclohexanedicarboxylic acid anhydride, phthalic anhydride, nadic anhydride, methylnadic anhydride, and 3-methyl-4-cyclohexene-1,2-dicarboxylic acid anhydride. 【0066】 The production rates of components (a-2) and (a-3) can be controlled by adjusting the synthesis conditions, such as the solvent, heating conditions, and catalyst, in addition to the mol ratio of component (a-1) to dicarboxylic acid anhydride. The amount of dicarboxylic acid anhydride to be formulated should be selected within the range of 20 to 150 mol per 100 mol of hydroxyl groups in component (a-1). The more dicarboxylic acid anhydride is formulated, the higher the production ratio of components (a-2) and (a-3) relative to component (a-1) can be controlled. The disappearance of component (a-1) and the production ratio of components (a-2) and (a-3) can be determined by liquid chromatography-mass spectrometry (LC-MS). Alternatively, the reaction endpoint may be determined by the disappearance of acid anhydride groups using infrared spectroscopy. Separation of unreacted dicarboxylic acid anhydride and its ring-opened product, as well as at least a portion of component (a-1) and catalyst, may be performed by liquid-liquid extraction or silica gel column chromatography to increase purity. When preparing a negative-type photosensitive pigment composition, it is preferable to combine a mixed solution containing components (a-1), (a-2), and (a-3) with a solution containing only component (a-1). 【0067】 The above component (a) may be obtained in solution form, or, if necessary, recrystallized and dried under reduced pressure to obtain it in powder form. 【0068】The negative-type photosensitive pigment composition of the present invention contains as an essential component (b) a resin having repeating units represented by formula (1) and / or formula (2) (hereinafter sometimes referred to as "component (b)"). 【0069】 【0070】 In equations (1) and (2), R １ and R ４ Each of these independently represents a hydrogen atom or a methyl group, R ２ and R ５ Each of these independently represents a divalent group with 1 to 5 carbon atoms containing -COO- or -CONH-, and R ３ , R ６ and R ７ Each of these independently represents an alkyl group having 1 to 3 carbon atoms, n １ n is an integer, representing either 1 or 2, and n ４ and n ６ n are integers, each independently representing either 0 or 1, where n ４ to n ６ The sum is 1 or 2, n ２ , n ３ and n ５ The integers represent either 0 or 1 independently, and the asterisk (*) represents a connection point. 【0071】 Component (b) moderately mitigates the strong packing properties resulting from the overlapping of rigid aromatic rings of component (a), and has the function of suppressing the dark spots present in components (a-2) and (a-3). 【0072】 (b) Component preferably has a repeating unit represented by formula (34) in addition to the repeating unit represented by formula (32) and / or formula (33), in order to obtain a low taper angle after the curing process even when the pigment content in the developing film is high, thereby suppressing the occurrence of unlit pixels and enhancing the effect of suppressing dark spots. 【0073】In other words, the negative-type photosensitive pigment composition of the present invention preferably has, in addition to the repeating units represented by formula (32) and / or formula (33), a repeating unit represented by formula (34) in component (b). ２ Y is the total number of moles of the repeating units represented by formula (32) and the repeating units represented by formula (33). ２ Z is the number of moles of the repeating unit represented by equation (34). ２ In that case, X ２ to Y ２ The value obtained by dividing by is between 1.0 and 10.0, and X ２ to Z ２ It is more preferable that the value obtained by dividing by is 0.8 to 3.0. In addition, when the total of all repeating units derived from compounds having only one ethylenically unsaturated double bond group in the molecule, as described later, is taken as 100 mol%, it is most preferable that there are no repeating units having a cyclic ether structure such as a glycidyl group, or if there are, they are less than 5.0 mol%. 【0074】 【0075】 In equations (32), (33), and (34), R ５５ , R ５６ and R ５８ Each of these independently represents a hydrogen atom or a methyl group, R ５７ R represents a divalent group with 2 to 10 carbon atoms that does not contain a carboxyl group. ５９ * represents an alkyl group with 1 to 18 carbon atoms, and * represents a bonding site. 【0076】 Specific examples of repeating units represented by formula (1) include the repeating units represented by formula (35), formula (36), formula (37), and formula (38). 【0077】 【0078】 In equations (35), (36), (37), and (38), * represents a bonding site. 【0079】 Specific examples of repeating units represented by formula (2) include the repeating units represented by formula (39), formula (40), formula (41), and formula (42). 【0080】 【0081】 In equations (39), (40), (41), and (42), * represents a bonding site. 【0082】 A specific example of the repeating unit represented by formula (33) is the repeating unit represented by formula (43). A specific example of the repeating unit represented by formula (34) is the repeating unit represented by formula (44). 【0083】 【0084】 In equations (43) and (44), * represents a bonding site. 【0085】 (b) The content of component (b) is preferably 10% by mass or more of 100% by mass of the solid content of the negative-type photosensitive pigment composition in order to obtain a dark spot suppression effect. It is preferably 50% by mass or less in order to suppress peeling. 【0086】 (b) The weight-average molecular weight (Mw) of component (b) is preferably 5,000 or more, and more preferably 10,000 or more, in order to suppress peeling. (b) is preferably 40,000 or less, and more preferably 30,000 or less, in order to improve the developability of component (b). 【0087】(b) A method for obtaining component (b) is to polymerize a compound having only one ethylenically unsaturated double bond group in its molecule (hereinafter sometimes referred to as "monomer") in a solvent in the presence of a thermal polymerization initiator. For example, a monomer that serves as a source for repeating units represented by formula (1) and / or a monomer that serves as a source for repeating units represented by formula (2), and optionally a monomer that serves as a source for repeating units represented by formula (32), a monomer that serves as a source for repeating units represented by formula (33), a monomer that serves as a source for repeating units represented by formula (34), and other monomers that serve as sources for repeating units are dissolved in a solvent and stirred for 2 to 30 hours under a nitrogen atmosphere and at a liquid temperature of 50 to 150°C in the presence of a thermal radical polymerization initiator. As thermal radical polymerization initiators, azo-based thermal radical polymerization initiators such as azobisisobutyronitrile (hereinafter referred to as AIBN), AIBN-HP, V-65HP, V-601, VR-110, and V-40 (all manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) can be used. The amount of thermal radical polymerization initiator added is preferably 0.5 to 1.5 parts by mass per 100 parts by mass of monomer. As a solvent, one can be selected from the group of organic solvents (e) described later. 【0088】 Examples of monomers that serve as the source for the repeating unit represented by formula (1) include 3-hydroxyphenyl methacrylate, 3-hydroxyphenyl acrylate, 4-hydroxyphenyl methacrylate, 4-hydroxyphenyl acrylate, N-(4-hydroxyphenyl)methacrylamide, N-(4-hydroxyphenyl)acrylamide, N-(3,4-dihydroxyphenethyl)methacrylamide, and N-(3,4-dihydroxyphenethyl)acrylamide. 【0089】Examples of monomers that serve as the source for the repeating unit represented by formula (2) include 4-hydroxy-1-naphthyl methacrylate, 4-hydroxy-1-naphthyl acrylate, N-(6-ethyl-4-hydroxynaphthalene-1-yl)methacrylamide, N-(6-ethyl-4-hydroxynaphthalene-1-yl)acrylamide, 2-((6-hydroxynaphthalene-2-yl)oxy)ethyl methacrylate, 2-((6-hydroxynaphthalene-2-yl)oxy)ethyl acrylate, 6-hydroxynaphthalene-2-yl methacrylate, and 6-hydroxynaphthalene-2-yl acrylate. 【0090】 Examples of monomers that serve as the source for the repeating unit represented by formula (32) include methacrylic acid and acrylic acid. 【0091】 Examples of monomers that serve as the source for the repeating unit represented by formula (33) include 4-(4-(acryloyloxy)ethoxy)benzoic acid, 4-(3-(methacryloyloxy)propoxy)benzoic acid, 4-(4-(acryloyloxy)butoxy)benzoic acid, succinic acid (2-acryloyloxyethyl), and mono[2-(methacryloyloxy)ethyl]maleate. 【0092】 Examples of monomers that serve as sources for the repeating units represented by formula (34) include n-butyl methacrylate, n-butyl acrylate, isobutyl methacrylate, isobutyl acrylate, 2-ethylhexyl methacrylate, 2-ethylhexyl acrylate, 2-octyl methacrylate, 2-octyl acrylate, isononyl methacrylate, isononyl acrylate, isodecyl methacrylate, isodecyl acrylate, dodecyl methacrylate, dodecyl acrylate, isostearyl methacrylate, and isostearyl acrylate. 【0093】Other monomers that serve as sources for repeating units include, for example, benzyl methacrylate, benzyl acrylate, phenyl methacrylate, phenyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxybutyl methacrylate, 2-hydroxybutyl acrylate, glycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, and 3,4-epoxycyclohexyl acrylate. 【0094】 (b) The chemical structure of component is, １ 1H-NMR, carbon nuclear magnetic resonance spectroscopy (hereinafter, １３ It can be analyzed using known analytical methods such as C-NMR. 【0095】 The negative-type photosensitive pigment composition of the present invention contains (c) a photopolymerization initiator (hereinafter sometimes referred to as "component (c)"). Component (c) is not particularly limited as long as it is a compound that generates radical active species upon irradiation with exposure light including near-ultraviolet light and has the function of photocuring component (a). Component (c) is an essential component that is one of the photosensitive agents for imparting negative-type photosensitivity to the negative-type photosensitive pigment composition of the present invention. 【0096】 (c) Examples of components include oxime ester-based photopolymerization initiators, alkylphenone-based photopolymerization initiators, and acylphosphine oxide-based photopolymerization initiators. Among these, oxime ester-based photopolymerization initiators are preferred for promoting photocuring of the film bottom layer, and examples include "ADEKA ARCULUS" (registered trademark) NCI-831E, NCI-930, NCI-730, N-1919T (hereinafter, N-1919T) (all manufactured by ADEKA Corporation), "Irgacure" (registered trademark) OXE02, OXE03 (hereinafter, OXE03), OXE04 (all manufactured by BASF Corporation) represented by formula (45), compounds disclosed in Japanese Patent Application Publication No. 2008 / 100955, and compounds disclosed in International Publication No. 2006 / 018405. 【0097】 【0098】The content of component (c) can be adjusted by the content of component (d) described later, and in order to improve the exposure sensitivity, i.e., the minimum exposure amount required to pattern a black pixel splitting layer of the desired thickness, and thereby increase productivity, it is preferable that the content of component (c) be 5 to 20% by mass of the solid content of the negative-type photosensitive pigment composition. 【0099】 The negative-type photosensitive pigment composition of the present invention contains (d) an organic black pigment and / or a mixed organic black pigment (hereinafter sometimes referred to as "component (d)"). Component (d) is an essential component that provides light-shielding properties to the pixel division layer. The mixed organic black pigment referred to here means a pigment mixture that does not contain an organic black pigment and consists of a mixture of (d-1) at least one pigment selected from the group consisting of organic yellow pigment, organic red pigment, organic orange pigment, and organic brown pigment (hereinafter sometimes referred to as "component (d-1)") and (d-2) an organic blue pigment and / or an organic purple pigment (hereinafter sometimes referred to as "component (d-2)"), wherein when the total amount of components (d-1) and (d-2) is 100% by mass, the proportion of component (d-2) is in the range of 20 to 90% by mass. A pseudo-blackened pixel division layer can be obtained by subtractive color mixing of components (d-1) and (d-2), and the hue may be adjusted by their mixing ratio. Furthermore, if a compound contains either component (d-1) or component (d-2) alone, along with an organic black pigment, it is defined as not belonging to the category of mixed organic black pigments. In addition, for some organic pigments, such as C. I. Pigment Brown 26 and C. I. Pigment Violet 29, which belong to both component (d-1) and component (d-2) in terms of color index classification, they are defined as belonging to component (d-2). 【0100】 Examples of organic black pigments include benzodifuranone-based black pigments, perylene-based black pigments, and azo-based black pigments. 【0101】Benzodifuranone-based black pigments refer to organic black pigments consisting of polycyclic compounds having one benzene ring and two furanone rings in the molecule. An example is bis-oxodihydroindorylene-benzodifuranone, disclosed in International Publication No. 2009 / 010521. Among these, benzodifuranone-based black pigments consisting of the compound represented by formula (46), the compound represented by formula (47), and / or their isomers are preferred from the viewpoint of heat resistance. The term isomers here includes geometric isomers and tautomers. Benzodifuranone-based black pigments containing the compound represented by formula (46) have a lactam structure and are also called lactam black. Commercially available benzodifuranone-based black pigments containing the compound represented by formula (48) include "Irgaphor®" Black S0100CF and Experimental Black 582 (both manufactured by BASF). 【0102】 【0103】 In equations (46) and (47), R ６０ , R ６１ , R ６２ , R ６３ , R ６４ , R ６５ , R ６６ , R ６７ , R ６８ and R ６９ Each of these independently represents either a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. 【0104】 Examples of perylene-based black pigments include perylene-3,4,9,10-tetracarboxylic acid bisbenzimidazole and C.I. Pigment Black 31 and 32. 【0105】 Examples of azo-based black pigments include those disclosed in International Publication No. 2012 / 169506 and Japanese Patent Publication No. 2015-110691. For organic black pigments, it is preferable that the organic black pigment has a coating layer on its surface, and that the coating layer contains at least one coating material selected from the group consisting of silica, metal oxides, and metal hydroxides, in order to further suppress dark spots. 【0106】Examples of organic yellow pigments include C. I. Pigment Yellow 120, 138, 139, 151, 175, 180, 185, 181, 192, 194, and the pigment represented by formula (49). 【0107】 【0108】 Examples of organic red pigments include C. I. Pigment Red 122, 123, 149, 177, 179, 180, 189, 190, 202, 209, 254, 255, and 264. 【0109】 Examples of organic orange pigments include C. I. Pigment Orange 13, 36, 43, 61, 64, 71, and 72. 【0110】 Examples of organic brown pigments include C. I. Pigment Brown 23, 25, 38, and 42. 【0111】 Examples of organic blue pigments include C.I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 56, 57, 60, 61, 64, 65, 66, 75, 79, and 80. 【0112】 Examples of organic purple pigments include C. I. Pigment Violet 19, 23, 29, 32, and 37. 【0113】 In particular, benzodifuranone-based black pigments are preferred for suppressing dark spots, and it is even more preferable to use a pigment represented by formula (49) in combination. 【0114】 In other words, the negative-type photosensitive pigment composition of the present invention more preferably contains an organic black pigment as component (d), the organic black pigment contains a benzodifuranone-based black pigment, and further contains a pigment represented by formula (49). 【0115】 The content of the pigment represented by formula (49) is preferably 0.5 parts by mass or less per 100 parts by mass of the benzodifuranone-based black pigment. 【0116】The primary particle size distribution of component (d) is preferably 5 to 150 nm, and more preferably 30 to 100 nm, in order to achieve both dispersion stability in the negative-type photosensitive pigment composition and pattern linearity of the pixel division layer. The primary particle size distribution referred to here can be measured using a transmission electron microscope (hereinafter sometimes referred to as TEM). Micronization can be performed using known methods, including the solvent-salt milling method, in which component (d), a water-soluble inorganic salt, and a water-soluble organic solvent are kneaded under heating, subjected to wet grinding, and then purified. 【0117】 (d) The content of component (d) is preferably 20% by mass or more, and more preferably 30% by mass or more, of 100% by mass of the solid content of the negative-type photosensitive pigment composition in order to improve light shielding properties. In order to suppress dark spots, it is preferably 50% by mass or less, and more preferably 40% by mass or less. 【0118】 The negative-type photosensitive pigment composition of the present invention contains (e) an organic solvent (hereinafter sometimes referred to as "component (e)"). By including component (e), the viscosity of the negative-type photosensitive pigment composition can be adjusted according to the desired coating method, thereby improving the coatability. 【0119】 Examples of component (e) include ether-based solvents, acetate-based solvents, ketone-based solvents, and alcohol-based solvents, and among these, it is preferable to include an acetate-based solvent in order to improve the dispersion stability of component (d). 【0120】 Examples of acetate solvents include 3-methoxybutyl acetate, n-propyl acetate, butyl acetate, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, and 1,3-butylene glycol diacetate. Among these, propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA") and 3-methoxybutyl acetate (hereinafter referred to as "MBA") are preferred due to their dispersion stability and appropriate drying properties. 【0121】(e) The content of component is preferably 70% by mass or more of 100% by mass of the negative-type photosensitive pigment composition in order to obtain high coating properties. It is preferably 90% by mass or less in order to improve the uniformity of the film thickness after the pre-baking process. Furthermore, the water content is preferably 0.5% by mass or less in order to obtain high storage stability. 【0122】 The negative-type photosensitive pigment composition of the present invention preferably contains a resin having a polyethylene oxide structure and a tertiary amino group and / or pyridyl group (hereinafter sometimes referred to as "component (f)") in order to achieve both low viscosity (for example, 10 cP or less) and dispersion stability of component (d) to improve thin film coating properties and improve the uniformity of the film thickness of the black pixel division layer. The polyethylene oxide structure referred to here is -C ２ H ４ This refers to a structure in which three or more O- atoms are linked together. Component (f) functions as a pigment dispersant, and it is preferable that it be blended in the presence of component (d) when producing the pigment dispersion described later. 【0123】 The (f) component is preferably a resin having a substructure represented by formula (50) (hereinafter sometimes referred to as "(f-1) component"), a resin having repeating units represented by formula (51), formula (53), and formula (54) (hereinafter sometimes referred to as "(f-2) component"), a resin having repeating units represented by formula (52), formula (53), and formula (54) (f-3), or a resin having repeating units represented by formula (51), formula (53), and formula (54). 【0124】 【0125】 In formula (50), R７０ R represents an alkylene group with 2 to 4 carbon atoms. ７１ R represents an alkylene group with 3 or 4 carbon atoms. ７２ n represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. ４７ n is an integer, representing 1 to 4. ４８ and n ４９ The integers represent numbers from 3 to 20, and the asterisk (*) represents a connection point. 【0126】 【0127】 In equations (51), (52), (53), and (54), R ７３ , R ７７ and R ７９ Each of these independently represents a hydrogen atom or a methyl group, R ７４ R represents an alkylene group with 1 to 5 carbon atoms. ７５ and R ７６ Each of these independently represents an alkyl group having 1 to 4 carbon atoms, R ７８ n represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. ５０ R is an integer, representing 3 to 20. ８０ * represents an alkyl group with 1 to 10 carbon atoms, and * represents a bonding site. 【0128】 When component (f) is included, the content of component (f) is preferably 5 to 40 parts by mass per 100 parts by mass of component (d). Furthermore, by using a pigment derivative as a pigment-type dispersant in combination, the adsorption to component (d) may be improved, and the dispersion stabilization effect of component (f) may be improved. 【0129】 The negative-type photosensitive pigment composition of the present invention preferably contains a compound having a total of 3 or more methacryloxy and acryloxy groups in the molecule (hereinafter sometimes referred to as "component (g)") in order to improve exposure sensitivity and flexibility of the black pixel division layer. A resin that is a compound having a total of 3 or more methacryloxy and acryloxy groups in the molecule and has a repeating unit represented by formula (1) and / or formula (2) is defined as a compound belonging to component (b) described above. 【0130】(g) Examples of components include the trifunctional acrylate ditrimethylolpropanetetraacrylate, isocyanurate ethylene oxide-modified triacrylate, the pentafunctional acrylate dipentaerythritol pentaacrylate, the hexafunctional acrylate dipentaerythritol hexaacrylate, "KAYARAD®" DPCA-20, DPCA-30, DPCA-60, "KAYARAD®" DPHA, a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, and "KAYARAD®" DPHA-40H, a decafunctional urethane acrylate (all manufactured by Nippon Kayaku Co., Ltd.). 【0131】 When component (g) is included, the content of component (g) is preferably 50 parts by mass or less per 100 parts by mass of component (a) in order to suppress the undercut shape at the end of the opening after the rinsing process caused by excessive photocuring of the surface of the exposed area, and to maintain the film-forming properties of the second electrode described later. 【0132】 The negative-type photosensitive pigment composition of the present invention may further contain other components such as a thermal crosslinking agent, a surfactant, a leveling agent, and an antioxidant. 【0133】 A method for preparing the negative-type photosensitive pigment composition of the present invention includes, for example, preparing a pigment dispersion by wet dispersion treatment by adding component (d) to a solution in which component (b) and / or component (f) are dissolved in component (e), then preparing a mixed solution of component (a), component (b), component (c), component (e), component (g) and other components, further mixing the pigment dispersion, and further filtering as necessary. 【0134】Examples of wet media dispersers used for wet dispersion processing include bead mills such as "Nano-Getter (registered trademark)" (manufactured by Ashizawa Finetech), "DYNO-MILL (registered trademark)" (manufactured by Willy A. Bachofen), "Spike Mill (registered trademark)" (manufactured by Inoue Seisakusho Co., Ltd.), "Ultra Apex Mill Advance (registered trademark)" (manufactured by Hiroshima Metal & Machinery Co., Ltd.), and "NEO-Alpha Mill (registered trademark)" (manufactured by AIMEX Co., Ltd.). 【0135】 Examples of media used in wet dispersion processes include zirconia beads and zircon beads. The media diameter is preferably 0.03 to 0.5 mmφ. 【0136】 A second aspect of the present invention, a cured product of a negative-type photosensitive pigment composition, is described below. Here, "cured product" refers to a product obtained through a process that includes at least a curing step of heating the negative-type photosensitive pigment composition at a temperature of 200°C to 400°C under atmospheric pressure for 10 minutes or more. Its shape and applications are not particularly limited. 【0137】 In the cured film containing the cured product of the present invention, components other than the cured product of the present invention include, for example, alkaline components and ionic components in the developing solution introduced during the formation process of the cured film, and adsorbed water from the air. 【0138】 A method for producing a cured film containing the cured product of the present invention includes, for example, a coating step of applying a negative-type photosensitive pigment composition to the surface of a substrate to obtain a coated film; a pre-baking step of removing at least a portion of the solvent by heating to obtain a pre-baked film; an exposure step of obtaining an exposed film having exposed and unexposed areas in the plane by pattern exposure with exposure light including near ultraviolet light; a developing step of dissolving the film in the unexposed areas using an alkaline developer; a rinsing step of removing the alkaline solution generated in the developing step to obtain a patterned developed film; and a curing step of obtaining a cured product by thermal curing by heating. 【0139】 For the coating process, a spin coater or slit coater can be used as the coating equipment due to its excellent ability to coat thin films. 【0140】A hot plate can be used as the heating device in the pre-baking process. Pin gap pre-baking or contact pre-baking may be performed, with a preferred pre-baking temperature of 50 to 150°C and a preferred pre-baking time of 1 to 5 minutes. Vacuum drying may be performed before heating. 【0141】 For the exposure process, examples of exposure equipment include steppers, mirror projection mask aligners (MPAs), and parallel light mask aligners (PLAs). Preferred exposure wavelengths are the j-line (wavelength 313 nm), i-line (wavelength 365 nm), h-line (wavelength 405 nm), or g-line (wavelength 436 nm) of a mercury lamp, with the use of a mixed line including the i-line and h-line, or a single i-line being preferable. Examples of negative exposure masks include those in which a thin, shielding film made of a metal such as chromium is patterned on one side of a substrate such as glass or quartz that is translucent at the exposure wavelength. By transmitting exposure light only through the openings and performing pattern exposure, an exposure film with exposed and unexposed areas in the plane can be obtained. When using a large substrate, the exposure conditions are preferably such that a high photocrosslinking density is obtained, minimizing the amount of developed film loss, resulting in a residual film rate of 70% or more. A rate of 75% or more is more preferable. In this context, the amount of developer film reduction refers to the difference obtained by subtracting the thickness of the developer film from the thickness of the pre-baked film, and the residual film ratio refers to the value obtained by dividing the thickness of the pixel separation layer after the curing process by the thickness of the pre-baked film, and then multiplying that value by 100. 【0142】Development methods in the development process include the paddle method, shower method, and dipping method. The paddle method is preferred for achieving high productivity and improving the in-plane uniformity of the aperture width of the pixel division layer apertures. The paddle method means that an alkaline developer is applied to the surface of the exposure film by showering or coating, and then developed while left to stand. The development time is preferably 30 seconds to 5 minutes. The paddle method is also called the liquid application method, and it is economically advantageous because it can reduce the amount of alkaline waste liquid discharged compared to the shower method. In the paddle method, the use of a high-concentration alkaline developer is preferred, and high concentration here means an alkaline aqueous solution with a concentration of 1.0% by mass or more. As an alkaline developer, a 1.5 to 2.5% by mass aqueous solution of tetramethylammonium hydroxide (hereinafter sometimes referred to as TMAH) is preferred. 【0143】 In the rinsing process, it is preferable to use deionized water in a shower-type manner to thoroughly remove the alkaline solution generated in the developing process and to quickly replace the strongly alkaline side with a neutral side. 【0144】 Examples of heating devices used in the curing process include hot air ovens and IR ovens. The heating temperature is preferably 200 to 300°C under atmospheric pressure, and more preferably 220 to 270°C. 【0145】 When a cured film containing the cured product of the present invention is used as a black pixel splitting layer, the optical density (OD) per 1.0 μm of film thickness is preferably 1.0 or higher, and more preferably 1.2 or higher, as an indicator of light shielding properties. For suppressing dark spots, it is preferably 1.8 or lower, and more preferably 1.5 or lower. 【0146】 The optical density per 1.0 μm of film thickness refers to the value obtained by dividing the optical density measured using an optical densitometer (X-Rite 361T, manufactured by X-Rite Corporation) on a cured film formed to a thickness of 1.5 μm on a colorless transparent substrate by the film thickness value of 1.5. A higher optical density indicates higher light-shielding properties. As the colorless transparent substrate, a glass substrate called "Tempax (manufactured by AGC Technoglass Co., Ltd.)" can be preferably used. 【0147】The black pixel division layer is typically patterned with a thickness of 1.0 to 3.0 μm so as to expose a portion of the surface of the first electrode, which will be described later. The exposed portion of the first electrode, corresponding to the opening of the pixel division layer, ultimately becomes the light-emitting pixel. The taper angle at the cross-section of the end of the opening of the black pixel division layer after the curing process is preferably 40° or less, and more preferably 35° or less, in order to improve the film formation performance of the second electrode, which will be described later, and to suppress non-illuminated pixels. To suppress the decrease in light shielding performance due to thinning of the end of the opening, it is preferably 15° or more, and more preferably 20° or more. 【0148】 A third aspect of the present invention, an organic EL display device, is described below. When the organic EL display device of the present invention is equipped with the cured product of the present invention as a black pixel splitting layer, it has the technical features of high external light reflection suppression function and suppression of dark spots. Furthermore, when the black pixel splitting layer is formed on a large substrate, it also has the feature of being economically advantageous. Figure 1 shows a cross-sectional view of a TFT substrate in an organic EL display device, which is given as a specific example of an embodiment of the present invention. 【0149】 A matrix of bottom-gate or top-gate TFTs 1 (thin-film transistors) is arranged on the surface of the substrate 6, and a TFT insulating layer 3 is formed covering the TFTs 1 and the wiring 2 connected to the TFTs 1. Examples of TFTs 1 include oxide semiconductors such as In-Ga-Zn-O (IGZO) and Ga-Zn-Sn, and TFTs made of low-temperature polysilicon (LTPS). Furthermore, a planarization layer 4 is formed on the surface of the TFT insulating layer 3, and contact holes 7 for opening the wiring 2 are provided in the planarization layer 4. A first electrode 5 is patterned on the surface of the planarization layer 4 and is connected to the wiring 2. 【0150】The black pixel division layer 8 is positioned on the surface of the first electrode 5 with the surface of the first electrode 5 partially exposed, and a transparent cover layer 9 is positioned on a part of the surface of the black pixel division layer 8, forming a pixel division layer 10 made of a laminated film. The black pixel division layer 8 has an opening, and an emissive pixel 11 containing an organic EL emissive material is formed in the opening, and the second electrode 12 is positioned to cover the black pixel division layer 8, the cover layer 9 and the emissive pixel 11. The shape of the opening in the black pixel division layer 8 is not particularly limited and may be square, rectangular, polygonal or elliptical. 【0151】 The TFT substrate having the above-described layered structure can be made to emit light by sealing it under vacuum and then applying a voltage to the light-emitting pixel portion. The organic EL display device of the present invention may be a bottom-emission type organic EL display device that extracts the light emitted from the light-emitting pixel 11 to the substrate side via the substrate 6, or a top-emission type organic EL display device that extracts the light emitted to the opposite side of the substrate 6 via the second electrode 12, and is not particularly limited. 【0152】 Examples of rigid glass substrates that can be used for substrate 6 include OA-10G, OA-11 (both manufactured by Nippon Electric Glass Co., Ltd.), and AN-100 (manufactured by Asahi Glass Co., Ltd.). On the other hand, examples of flexible substrates include substrates made of polyimide resin. A method for producing such a substrate involves applying a solution containing polyamic acid to the surface of a temporary support, then heating the solution to imide the polyamic acid and convert it into polyimide resin, and finally peeling off the temporary support with a laser or the like. 【0153】 The planarization layer 4 is not particularly limited as long as it functions as an insulating layer placed as a base layer for the first electrode 5, and is formed to cover the protrusions caused by the thickness of the TFT 1. For example, the planarization layer 4 can be patterned using a positive-type photosensitive composition. 【0154】The first electrode 5 can be made of any material as long as it functions as an electrode layer. For example, conductive metal oxides such as ITO (Indium Tin Oxide), ITZO (Indium Tin Zinc Oxide), and IZO (Indium Zinc Oxide) can be used as the first electrode 5, and among these, ITO can be preferably used due to its excellent transparency and conductivity. As for the method of forming the ITO pattern, first, ITO is deposited over the entire surface by sputtering, and then an etching positive-type resist material containing a novolac resin or the like is patterned using photolithography to obtain a resist pattern on the ITO film. Next, only the ITO film in the areas where the resist pattern is not formed is removed with an etching solution, then the resist pattern is removed with a resist stripping solution, and further heat treatment is performed as necessary. The ITO referred to here includes so-called amorphous ITO. As etching solutions, aqueous solutions containing nitric acid and hydrochloric acid, or aqueous solutions of oxalic acid can be used. 【0155】 Organic amine-based aqueous solutions can be used as resist stripping solutions. Commercially available examples include "Unlast" (registered trademark) M6, M6B, TN-1-5, and M71-2 (all manufactured by Sanwa Pure Chemical Industries). 【0156】 When the organic EL display device of the present invention is a top-emission type organic EL display device, the first electrode 5 is preferably a laminated film in which a transparent conductive layer is laminated on the surface of a metal reflective layer in order to improve the light extraction efficiency and enhance the luminous brightness. For example, it may be a laminated structure of silver alloy / ITO, or ITO / silver alloy / ITO. Examples of silver alloys include an alloy of Ag and Cu, and an alloy of Ag, Pd and Cu. 【0157】 The black pixel separation layer 8 is a cured film containing a cured product of the negative-type photosensitive pigment composition of the present invention. The transparent cover layer 9 may consist of any material and is not particularly limited, but it is preferable that it be a cured film containing a cured product of the positive-type photosensitive composition in order to improve the light emission reliability as a display device. It is more preferable that it be a cured product of the positive-type photosensitive composition containing a polyimide resin. 【0158】The light-emitting pixel 11 is not particularly limited as long as it is a pixel that emits light in the visible light region. As the organic EL light-emitting material constituting the light-emitting pixel 11, a material combining a light-emitting layer with a hole transport layer and / or an electron transport layer can be suitably used. Examples of light-emitting pixels for each color include a red light-emitting pixel with a peak wavelength of 560 to 700 nm, a blue light-emitting pixel with a peak wavelength of 420 to 490 nm, and a green light-emitting pixel with a peak wavelength of 500 to 550 nm. The light-emitting pixel 11 may have a tandem-type light-emitting layer formed by stacking multiple types of light-emitting layers with different peak wavelengths. An example of a tandem-type light-emitting layer is a white light-emitting pixel in which a total of four light-emitting layers—blue, yellow-green, red, and blue—are stacked in that order. A method for patterning the light-emitting pixel 11 is mask deposition. 【0159】 The second electrode 12 may be made of any material as long as it functions as a cathode electrode. If the organic EL display device of the present invention is a top-emission type organic EL display device, a layer made of a silver-magnesium alloy can be preferably used as the second electrode 12 because it has high light transmittance and excellent light extraction efficiency, and it is preferable to form a thin film so that it is a layer with higher light transmittance in the visible region compared to the first electrode 5 described above. On the other hand, if it is a bottom-emission type organic EL display device, a layer made of an aluminum alloy can be preferably used because it has high light reflectivity and excellent light extraction efficiency, and it is preferable to form a thick film so that it is a layer with higher light reflectance in the visible region compared to the first electrode 5 described above. The second electrode 12 can be formed by full-surface film deposition by sputtering. 【0160】 In order to improve the color purity of the emitted light, the organic EL display device of the present invention may further include a color filter substrate consisting of at least one color filter and a substrate on the light extraction side of the light-emitting pixel. 【0161】A fourth aspect of the present invention, an electronic device, is described below. The electronic device of the present invention is an electronic device equipped with the organic EL display device of the present invention. An electronic device equipped with an organic EL display device, as used herein, means a device that comprises at least an organic EL display device, a drive circuit, and a power supply, and that is capable of displaying text information, images, and / or videos on its own. As described above, the organic EL display device has technical features such as high ambient light reflection suppression and suppression of dark spots, so the electronic device of the present invention has excellent visibility and high brightness even when used outdoors. Specific examples of embodiments of the electronic device of the present invention include a personal computer, a foldable smartphone, a non-foldable rigid smartphone, a wristwatch, a desk clock, eyeglasses, an in-car monitor, a car navigation system, a gaming monitor, a portable game console, a television, and a head-mounted display. 【0162】 A composition according to a fifth aspect of the present invention will be described below. The composition of the present invention is a composition containing (a) a compound having only one 9,9-bis(naphthyl)fluorene skeleton in the molecule and a total of 2 methacryloxy groups and acryloxy groups in the molecule, wherein the (a) component contains (a-1) a compound having only two hydroxyl groups in the molecule and no carboxyl groups, (a'-2) a compound represented by formula (93), and (a-3) a compound having only two carboxyl groups in the molecule. 【0163】 【0164】 In formula (93), A ６ R represents a divalent group with 13 to 21 carbon atoms containing only one fluorene skeleton, ８１ and R ８２ Each of these independently represents a hydrogen atom or a methyl group, R ８３ , R ８４ , R ８５ and R ８６ Each of these independently represents an alkylene group having 1 to 4 carbon atoms, R ８７ , R ８８ , R ８９ and R ９０R represents an alkyl group with 1 to 3 carbon atoms. ９１ n represents any group selected from the group consisting of the group represented by formula (94), the group represented by formula (95), the group represented by formula (96), and the group represented by formula (97). ５１ , n ５２ , n ５３ and n ５４ n are integers, each independently representing either 0 or 1. ５５ , n ５６ , n ５７ and n ５８ These are integers, each independently representing a value between 0 and 3. 【0165】 【0166】 In equations (94), (95), (96), and (97), R ９２ , R ９３ , R ９４ and R ９５ Each of these independently represents an alkyl group having 1 to 3 carbon atoms, n ５９ , n ６０ , n ６１ and n ６２ Each is an integer, independently representing either 0 or 1. * represents a connection point. 【0167】 The composition of the present invention can be used as a raw material for manufacturing a negative-type photosensitive pigment composition that enables the formation of a black pixel division layer with excellent light-shielding properties by suppressing peeling on a large substrate, and enables the manufacture of an organic EL display device in which the generation of dark spots is suppressed. The compound represented by formula (93) (a'-2) (hereinafter sometimes referred to as "component (a'-2)") is a compound that is included in the compound represented by formula (8), which is the aforementioned component (a'-2), and has the technical effect of achieving both suppression of peeling and suppression of dark spots, and having a high dark spot suppression effect. This is R ９１ However, R is selected from the group consisting of the group represented by formula (94), the group represented by formula (95), the group represented by formula (96), and the group represented by formula (97). ９１This effect is presumed to stem from the fact that the carboxyl group bonded to it has a moderately low acidic strength and weak interaction with other components in the negative-type photosensitive pigment composition, thus making it easier to maintain the dispersion state of component (d) as described above. 【0168】 The preferred chemical structures of components (a-1) and (a-3) contained in the composition of the present invention are subject to the same considerations as the preferred chemical structures of components (a-1) and (a-3) contained in the negative-type photosensitive pigment composition, which is the first embodiment of the present invention described above. Furthermore, the preferred chemical structure of component (a'-2) is subject to the same considerations as the preferred chemical structure of formula (8), which is the preferred chemical structure of component (a-2) contained in the negative-type photosensitive pigment composition, which is the first embodiment of the present invention described above. 【0169】 The content ratios of component (a-1), component (a'-2), and component (a-3) are determined in accordance with the same considerations as the preferred content ratios of component (a-1), component (a-2), and component (a-3) contained in a negative-type photosensitive pigment composition. The composition of the present invention is preferably in the form of a solution and further contains (e) an organic solvent, in order to facilitate the production of the negative-type photosensitive pigment composition. 【0170】 The present invention will be described in detail below with reference to examples and comparative examples, but the embodiments of the present invention are not limited to these. First, the evaluation methods in each example and comparative example will be described. 【0171】<Fabrication of the first electrode formation substrate> A silver alloy (an alloy consisting of 99% by mass of silver and 1% by mass of copper) was deposited over the entire surface of an alkali-free glass substrate measuring 100 mm in length and 100 mm in width by sputtering. A novolac resin-based positive-type photosensitive resist material was used as the etching resist film, and the substrate was etched by immersion in a silver alloy etching solution at a liquid temperature of 30°C. The resist film was then removed with an etching stripping solution to obtain a patterned silver alloy film with a thickness of 40 nm. Furthermore, an ITO film was deposited over the entire surface by sputtering. Using the aforementioned novolac resin-based positive-type photosensitive resist material as the resist film, the substrate was immersed in a 5% by mass oxalic acid aqueous solution at a liquid temperature of 50°C for 5 minutes, shower-washed with deionized water for 2 minutes, and then dried with an air blower to form a patterned ITO film with a thickness of 20 nm. This film was then heat-treated at 200°C for 30 minutes under atmospheric pressure / nitrogen atmosphere. Through the above operations, a first electrode-forming substrate was obtained, which had a first electrode consisting of a laminated pattern of a silver alloy film and an ITO film. <Measurement of the minimum required exposure amount (exposure sensitivity)> Coating process: Using a spin coater, the rotation speed was adjusted so that the thickness of the pre-baked film described later was 2.0 μm, and the negative-type photosensitive pigment composition was coated onto the ITO surface of the first electrode-forming substrate to obtain a coated film. Pre-baking process: Using a hot plate, the coated film was pre-baked at 110°C under atmospheric pressure for 120 seconds to obtain a pre-baked film. Exposure process: The negative-type square pattern exposure mask was aligned using a near-infrared camera, and using a double-sided alignment single-sided exposure apparatus, the negative-type square pattern exposure mask (with 500 square light-shielding sections arranged in a vertical width of 30.0 μm and a horizontal width of 30.0 μm) was exposed at an exposure amount of 50 to 150 mJ (mJ / cm²) through the mask. ２Within the range of the i-line, the exposure amount was changed in steps of 10 mJ, and the i-line of the ultra-high pressure mercury lamp was pattern-exposed to obtain an exposed film having exposed and unexposed areas in its plane. The pattern exposure was performed by bringing a negative-type square pattern exposure mask into contact with the surface of the pre-baked film. Development process: Using a small photolithography developing device (AD-2000; manufactured by Takizawa Sangyo Co., Ltd.), under conditions where the shower pressure received by the pre-baked film surface located directly below the nozzle outlet was 0.03 MPa, a 2.38 mass% TMAH aqueous solution, an alkaline developer, was applied to the surface of the exposed film by showering it for 10 seconds, then allowed to stand, and developed using the paddle method. The total development time for the shower application and paddle method was calculated by multiplying the time taken for the unexposed areas of the film to dissolve and be removed in the film depth direction, which was measured separately in advance using the same method, by 1.5. Rinsing process: Immediately after the development process described above, the pre-baked film surface located directly below the nozzle outlet was rinsed with ion-depleted water for 30 seconds using the same developing apparatus, under conditions where the shower pressure was 0.3 MPa. Then, the water adhering to the film surface was removed by air blowing for 5 seconds to obtain a patterned developed film. Curing process: The developed film was heated at 260°C for 1 hour under a nitrogen atmosphere using a high-temperature inert gas oven (INH-9CD-S; manufactured by Koyo Thermo Systems Co., Ltd.) to obtain a patterned cured film containing a cured negative-type photosensitive pigment composition. Film thickness measurement: The thickness of the aforementioned cured film corresponding to each exposure condition was measured at three locations in the surface (areas where peeling did not occur) using a stylus-type film thickness measuring device (Surfcom; manufactured by Tokyo Seimitsu Co., Ltd.), and the value was rounded to one decimal place by rounding the second decimal place of the average value. For the average value of the measurement results, the lowest exposure level among the exposure conditions that yielded a cured film with a thickness of 1.5 μm or more was defined as the minimum required exposure level (exposure sensitivity). 【0172】(1) Evaluation of the optical density (OD / μm) of the cured film A cured film with a thickness of 1.5 μm was formed in the same manner as when the minimum required exposure amount was measured as described above, except that Tempax, a colorless transparent glass substrate, was used instead of an alkali-free glass substrate, the rotation speed of the spin coater was adjusted in the coating process so that the final cured film thickness was 1.5 μm, and in the exposure process a negative square pattern exposure mask was not used, and the entire surface of the pre-baked film was exposed with the minimum required exposure amount measured by the method described above. A substrate for optical density evaluation was obtained. 【0173】 For the optical density evaluation substrate, the total optical density (Total OD value) was measured at three locations within the film surface (areas where peeling did not occur) using an optical densitometer (X-Rite 361T, manufactured by X-Rite Corporation). The average value was calculated, and the result was divided by 1.5 and rounded to the second decimal place. The first decimal place was taken as the OD value per 1.0 μm of cured film thickness (OD / μm). A higher OD / μm value indicated a cured film with superior light-shielding properties. The total optical density of Tempax without a cured film was measured separately and found to be 0.00. Therefore, the total optical density of the optical density evaluation substrate was considered as the total optical density of the cured film. The thickness of the cured film was measured at three locations within the film surface using a stylus-type film thickness measuring device (Surfcom, manufactured by Tokyo Seimitsu Co., Ltd.). The average value was rounded to the first decimal place. 【0174】 (2) Evaluation of peeling of the black pixel division layer The black pixel division layer-forming substrate was cut, and an FPD inspection microscope (MX-61L; manufactured by Olympus Corporation) was used to observe the area by sequentially magnifying it on the monitor at 100x magnification so that the 30 openings of the pixel division layer-forming area were included, and the length was measured to determine an area of ​​10.0 μm. ２ The number of areas where the above-mentioned peeling (Figure 2) was observed was counted, and the average value per opening was calculated and rounded to the first decimal place. A smaller value indicated a superior black pixel separation layer. The following criteria were used for evaluation, with AA and A-C being considered passable and D-E being considered failing. 50.0 μm ２ 100.0 μm or more ２ If one or more peeling areas less than 100.0 μm are observed, the judgment is E, and the threshold is 100.0 μm. ２If one or more of the above peeling was observed, the result was graded F, and the sample was deemed unsuccessful. The lower of the evaluation results of black pixel division layer A and black pixel division layer B was used as the final pass / fail criterion. AA: No peeling observed. A: One or two areas of peeling observed. B: Three or four areas of peeling observed. C: Five or more areas of peeling observed, but less than ten. D: Ten or more areas of peeling observed. E: 50.0 μm ２ 100.0 μm or more ２ One or more peeling areas less than F are observed. F: 100.0 μm ２ One or more of the above-mentioned peeling can be observed. 【0175】 (3) Evaluation of the taper angle of the black pixel division layer The black pixel division layer-forming substrate used in the peeling evaluation described above was further cut into smaller pieces, and the cross-section of the edge of the aperture was observed at a magnification of 15,000 times using a field emission scanning electron microscope "S-4800" (manufactured by Hitachi High-Technologies Corporation) to measure the taper angle θ (°) (Figure 3). A taper angle of 20° or more is desirable, and a lower taper angle is preferable. The following criteria were used for judgment, with A to C being acceptable and D to E being unacceptable. Note that black pixel division layer-forming substrates that failed the peeling evaluation described above were excluded from the taper angle evaluation because it was difficult to properly evaluate them. In addition, no taper angles below 20° were observed in any of the examples and comparative examples in which measurements were performed. The lower of the evaluation results of black pixel division layer A and black pixel division layer B was adopted as the final pass / fail criterion. A: The taper angle is 20° or more and less than 35°. B: The taper angle is 35° or more and less than 40°. C: The taper angle is 40° or more and less than 50°. D: The taper angle is 50° or more and less than 80°. E: The taper angle is 80° or more, or less than 20°. 【0176】 (4) Evaluation of dark spots in organic EL display devices Organic EL display devices A and B, described later, were evaluated at 10 mA / cm² ２The device was driven by DC power, and 30 light-emitting pixels located in the center were magnified and displayed on a monitor at 50x magnification for observation. At each aperture, the number of non-light-emitting areas, i.e., dark spots (Figure 4), with a major axis of 0.1 μm or more and less than 5.0 μm, was counted. The average number of dark spots observed per aperture was calculated, and the smaller the value rounded to the first decimal place, the better the organic EL display device was evaluated. Judgments were made based on the following criteria, with AA and A-C being pass and D-E being fail. If a pixel was observed in which normal light emission was not observed within a single light-emitting pixel (a light-emitting pixel in which the area of ​​the non-light-emitting area exceeds 50% of the area of ​​the light-emitting pixel), i.e., a non-lit pixel, a proper evaluation was difficult, and therefore, regardless of the number of dark spots in other light-emitting pixels, the judgment was E, and it was considered a failure. The lower of the evaluation results of organic EL display device A and organic EL display device B was adopted as the final pass / fail criterion. AA: No dark spots are visible. A: One or more dark spots are visible, but fewer than three. B: Three or more dark spots are visible, but fewer than five. C: Five or more dark spots are visible, but fewer than ten. D: Ten or more dark spots are visible. E: One or more unlit pixels are visible. 【0177】 The following shows information such as the chemical structure and solid content of the various raw materials used in the examples and comparative examples. 【0178】 "S0100": "Irgaphor®" Black S0100CF (manufactured by BASF). Equivalent to a benzodifuranone-based organic black pigment represented by formula (48). Primary particle size distribution: 40-80 nm. 【0179】 "Polymer-type dispersant A": Pigment dispersant 1 (solids content 100% by mass, amine value 20 mg KOH / g) synthesized by the same method as the synthesis method disclosed in Synthesis Example 2 of Japanese Patent Publication No. 2020-070352. Polymer-type dispersant A is a resin having a substructure represented by formula (50), and belongs to component (f-1) in this specification. 【0180】"Efka PX 4310": A PGMEA solution of an AB block type acrylic copolymer belonging to component (f-2), having an A block consisting of repeating units represented by formula (53) and formula (54), and a B block consisting of repeating units represented by formula (51), and manufactured by BASF. (Solid content 50% by mass, solid content amine value 40 mg KOH / g) 【0181】 "Pigment-type dispersant 1": A pigment derivative represented by formula (55) obtained by monosulfonating C.I. Pigment Red 177 using fuming sulfuric acid. This corresponds to non-polymer-type dispersant 1 disclosed in International Publication No. 2022 / 172605. 【0182】 【0183】 "Pigment-type dispersant 2": A pigment derivative represented by formula (56), obtained by monosulfonating C.I. Pigment Red 264 using fuming sulfuric acid. 【0184】 【0185】 "ZCR-1569H": A PGMEA solution of an alkali-soluble epoxy acrylate resin having a biphenyl skeleton in the main chain (manufactured by Nippon Kayaku Co., Ltd.: acid value of solids 98 mg KOH / g, Mw 3900, solids 70% by mass). "Alkali-soluble resin (b-1) solution": This is the same resin solution as the alkali-soluble resin (b-1) disclosed in Patent Document 1. Based on the method of Example 1 disclosed in Japanese Patent No. 3120476, the mass ratio of methyl methacrylate / styrene / methacrylic acid was changed from 30 / 40 / 30 to 30 / 30 / 40 and copolymerized. To 100 parts by mass of the resin, an additional 40 parts by mass of glycidyl methacrylate was added (reaction rate 70%), and the resin was reprecipitated with purified water, filtered, and dried to obtain a 20% by mass PGMEA solution of the resin. Mw 30000, acid value 110 mg KOH / g. 【0186】"Resin (F-1) solution containing tertiary amino groups": This is the same resin solution as the resin (F-1) solution containing tertiary amino groups and ethylenically unsaturated groups disclosed in Synthesis Example 14 of Japanese Patent Publication No. 2022-38599. Solids content 20% by mass PGMEA solution. Mw 7000, base number 11 mmol / 100g, acid number 73 mgKOH / g. 【0187】 "SPC-3410": A PGMEA solution of an alkali-soluble methacrylic resin (manufactured by Showa Denko K.K.: solids content 42% by mass, Mw 7300, acid value of solids 75 mg KOH / g) of a copolymer consisting of repeating unit 1 obtained by reacting a repeating unit glycidyl group derived from glycidyl methacrylate with acrylic acid, repeating unit 2 derived from styrene, and repeating unit 3 derived from tricyclodecanyl methacrylate = 60 / 10 / 30 (mol%), to which a carboxyl group derived from tetrahydrophthalic anhydride is further added by ring-opening addition reaction. 【0188】 "Fluorene acrylate solution D": A 50% by mass PGMEA solution of the compound represented by formula (57) disclosed in International Publication No. 2022 / 172605. Fluorene acrylate solution D does not contain components (a) and (b). 【0189】 【0190】 "DPCA-60": A hexaacrylate modified by adding 6 mol of ε-caprolactone to 1 mol of dipentaerythritol (manufactured by Nippon Kayaku Co., Ltd.) (Synthesis Example 1: Synthesis of "Bisnaphthylfluorene Acrylate 1") The reaction product synthesized by the same method as Example 1 of Patent No. 5782281 was used as Bisnaphthylfluorene Acrylate 1. Bisnaphthylfluorene Acrylate 1 has a solid content of 100% by mass and contains only component (a-1) as component (a). 【0191】(Synthesis Example 2: Synthesis of "Bisnaphthylfluorene Acrylate Solution 2") In a flask containing 600.00 g of PGMEA, 450.14 g (0.80 mol) of the compound represented by formula (58) (manufactured by Osaka Gas Chemical Co., Ltd.), 138.36 g of acrylic acid (1.92 mol), 2.94 g of triethylamine, and 1.18 g of methoquinone were dissolved and heated at a liquid temperature of 120°C for 9 hours with stirring to obtain a solution containing the reaction products. After purification by silica gel column chromatography, the solution was dried under reduced pressure, and a portion of the yield was used to obtain a 30% by mass PGMEA solution of the compound represented by formula (59), which was designated as Bisnaphthylfluorene Acrylate Solution 2. １ ¹H-NMR and LC-MS analysis confirmed that bisnaphthylfluorene acrylate solution 2 contains only component (a-1) as component (a). 【0192】 【0193】 (Synthesis Example 3: Synthesis of "Bisnaphthylfluorene Acrylate Solution 3") In a flask containing 400.00 g of PGMEA, 135.16 g (0.30 mol) of the compound represented by formula (60) (manufactured by Osaka Gas Chemical Co., Ltd.), 126.14 g of 4-hydroxybutyl acrylate glycidyl ether (0.63 mol, manufactured by Tokyo Chemical Industry Co., Ltd.), 1.31 g of triethylamine (manufactured by Tokyo Chemical Industry Co., Ltd.), and 0.52 g of methoquinone (manufactured by Tokyo Chemical Industry Co., Ltd.) were dissolved, and the mixture was heated at a liquid temperature of 110°C for 6 hours with stirring to obtain the reaction product. After purification by silica gel column chromatography, the mixture was dried under reduced pressure, and a portion of the yield was used to obtain a 30% by mass PGMEA solution of the compound represented by formula (61), which was then prepared as Bisnaphthylfluorene Acrylate Solution 3. １ H-NMR and LC-MS analysis confirmed that bisnaphthylfluorene acrylate solution 3 contains only component (a-1) as component (a), and that 4-hydroxybutyl acrylate glycidyl ether has disappeared. 【0194】 【0195】(Synthesis Example 4: Synthesis of Bisnaphthylfluorene Acrylate Solutions 4-6) In a flask containing 400.00 g of PGMEA, 212.04 g (0.30 mol) of the compound represented by formula (59), 59.10 g of nadic anhydride (0.36 mol, manufactured by Tokyo Chemical Industry Co., Ltd.), 1.36 g of triethylamine, and 0.54 g of methoquinone were dissolved. The mixture was heated at a liquid temperature of 120°C for 6 hours with stirring, and after cooling, it was purified by silica gel column chromatography and then dried under reduced pressure. The mixture was then dissolved in PGMEA to obtain a 30% solids solution, yielding Bisnaphthylfluorene Acrylate Solution 4, which is a mixture containing the compound represented by formula (59), the compound represented by formula (62), and the compound represented by formula (63) in a weight ratio of 60:25:15. １ ¹H-NMR and LC-MS analysis confirmed that bisnaphthylfluorene acrylate solution 4 contains components (a-1), (a-2), and (a-3), and also revealed the disappearance of nadic anhydride and its ring-opened product. 【0196】 Separately, bisnaphthylfluorene acrylate solution 2 and bisnaphthylfluorene acrylate solution 4 were mixed in a mass ratio of 1:1 to obtain bisnaphthylfluorene acrylate solution 5. Also, bisnaphthylfluorene acrylate solution 6 was obtained by mixing bisnaphthylfluorene acrylate solution 2 and bisnaphthylfluorene acrylate solution 4 in a mass ratio of 4:1. 【0197】 【0198】(Synthesis Example 5: Synthesis of "Bisnaphthylfluorene Acrylate Solution 7") In a flask containing 400.00 g of PGMEA, 197.90 g (0.28 mol) of the compound represented by formula (59), 78.14 g of nadic anhydride (0.48 mol), 1.38 g of triethylamine, and 0.55 g of methoquinone were dissolved. The mixture was heated at a liquid temperature of 120°C for 6 hours with stirring, and after cooling, it was purified by silica gel column chromatography and then dried under reduced pressure. The mixture was then dissolved in PGMEA to obtain a 30% solids solution, yielding Bisnaphthylfluorene Acrylate Solution 7, which is a solution of a mixture containing the compound represented by formula (59): the compound represented by formula (62): the compound represented by formula (63) in a weight ratio of 25:46:29. １ ¹H-NMR and LC-MS analysis confirmed that bisnaphthylfluorene acrylate solution 7 contains components (a-1), (a-2), and (a-3), and also revealed the disappearance of nadic anhydride and its ring-opened product. 【0199】 (Synthesis Example 6: Synthesis of "Bisnaphthylfluorene Acrylate Solution 8") In a flask containing 420.00 g of PGMEA, 229.77 g (0.27 mol) of the compound represented by formula (61), 53.40 g of 1,2,3,6-tetrahydrophthalic anhydride (0.35 mol, manufactured by Tokyo Chemical Industry Co., Ltd.), 1.42 g of triethylamine, and 0.57 g of methoquinone were dissolved. The mixture was heated at a liquid temperature of 120°C for 6 hours with stirring, and after cooling, it was purified by silica gel column chromatography and then dried under reduced pressure. The mixture was dissolved in PGMEA to obtain a 30% solids solution, yielding Bisnaphthylfluorene Acrylate Solution 8, which is a solution of a mixture containing the compound represented by formula (61): the compound represented by formula (64): the compound represented by formula (65) in a weight ratio of 62:22:16. １ ¹H-NMR and LC-MS analysis confirmed that bisnaphthylfluorene acrylate solution 8 contains components (a-1), (a-2), and (a-3), and also revealed the disappearance of 1,2,3,6-tetrahydrophthalic anhydride and its ring-opened product. 【0200】 【0201】 (Synthesis Example 7: Synthesis of Bisnaphthylfluorene Acrylate Solution 9) Bisnaphthylfluorene acrylate solution 9 was synthesized in the same manner as the synthesis of bisnaphthylfluorene acrylate solution 4 in Synthesis Example 4, except that 53.32 g (0.36 mol) of phthalic anhydride was used instead of nasic anhydride. Bisnaphthylfluorene acrylate solution 9 is a 30% solids solution of a mixture containing the compound represented by formula (59): the compound represented by formula (66): the compound represented by formula (67) in a weight ratio of 60:23:17. １ ¹H-NMR and LC-MS analysis confirmed that bisnaphthylfluorene acrylate solution 9 contains components (a-1), (a-2), and (a-3), and that phthalic anhydride and its ring-opened product have disappeared. The compounds represented by formula (66) and (67) do not have the group represented by formula (14), the group represented by formula (15), the group represented by formula (16), and the group represented by formula (17), but have the group represented by formula (19). 【0202】 【0203】 The information regarding bisnaphthylfluorene acrylate solutions 1 to 9 is summarized in Tables 1 to 3. 【0204】 【0205】 【0206】 【0207】(Synthesis Example 8: Synthesis of "Alkali-Soluble Resin Solution P-1") Mixed solution 1 was prepared by dissolving 178.19 g (1.00 mol) of 4-hydroxyphenyl methacrylate (manufactured by Resonaq Co., Ltd.), 28.44 g (0.20 mol) of n-butyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 130.88 g (0.66 mol) of 2-ethylhexyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 12.05 g (0.14 mol) of methacrylic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), and 6.99 g of AIBN (manufactured by Tokyo Chemical Industry Co., Ltd.), which is a thermal polymerization initiator, in 600.00 g of mixed solvent (PGMEA: propylene glycol monomethyl ether (hereinafter referred to as "PGME") = mass ratio 70:30). In a flask containing 400.00 g of mixed solvent (PGMEA:PGME = mass ratio 70:30), the aforementioned mixed solution 1 was gradually added over 2 hours while stirring and maintaining a liquid temperature of 80-90°C. The mixture was then heated to 100°C for 5 hours to obtain a solution containing the resin (Mw 18000) belonging to component (b). This resin solution was diluted by adjusting the solvent ratio to obtain a 20% solids solution (PGMEA:PGME = 70:30) to obtain alkali-soluble resin solution P-1. １ ¹H-NMR analysis confirmed that the alkali-soluble resin solution P-1 contains a copolymer having repeating units represented by formula (68), formula (69), formula (70), and formula (71). 【0208】 【0209】 In formulas (68), (69), (70), and (71), * indicates a bonding site. 【0210】(Synthesis Example 9: Synthesis of "Alkali-Soluble Resin Solution P-2") Mixed solution 2 was prepared by dissolving 81.69 g (0.30 mol) of 2-((6-hydroxynaphthalene-2-yl)oxy)ethyl methacrylate (manufactured by Sigma-Aldrich), 79.74 g (0.45 mol) of N-(4-hydroxyphenyl)methacrylamide (manufactured by Osaka Organic Chemical Industry Co., Ltd.), 21.33 g (0.15 mol) of n-butyl methacrylate, 98.16 g (0.50 mol) of 2-ethylhexyl methacrylate, 9.04 g (0.11 mol) of methacrylic acid, and 4.20 g of AIBN in 600.00 g of mixed solvent (PGMEA:PGME = mass ratio 70:30). In a flask containing 400.00 g of mixed solvent (PGMEA:PGME = mass ratio 70:30), the aforementioned mixed solution 2 was gradually added over 2 hours while stirring and maintaining a liquid temperature of 80-90°C. The mixture was then heated to 100°C for 5 hours to obtain a solution containing the resin (Mw 16000) belonging to component (b). This resin solution was diluted by adjusting the solvent ratio to obtain a 20% solids solution (PGMEA:PGME = 70:30) to obtain alkali-soluble resin solution P-2. １ ¹H-NMR analysis confirmed that the alkali-soluble resin solution P-2 contains a copolymer having repeating units represented by formula (72), formula (73), formula (74), formula (75), and formula (76). 【0211】 【0212】 In formulas (72), (73), (74), (75), and (76), * indicates a binding site. 【0213】(Synthesis Example 10: Synthesis of "Alkali-Soluble Resin Solution P-3") Mixed solution 3 was prepared by dissolving 178.19 g (1.00 mol) of 4-hydroxyphenyl methacrylate, 28.44 g (0.20 mol) of n-butyl methacrylate, 130.88 g (0.66 mol) of 2-ethylhexyl methacrylate, 37.00 g (0.14 mol) of 4-(4-(acryloyloxy)butoxy)benzoic acid (manufactured by Sigma-Aldrich), and 7.49 g of AIBN, a thermal polymerization initiator, in 600.00 g of mixed solvent (PGMEA:PGME = mass ratio 70:30). In a flask containing 400.00 g of mixed solvent (PGMEA:PGME = mass ratio 70:30), the aforementioned mixed solution 3 was gradually added over 2 hours while stirring and maintaining a liquid temperature of 80-90°C. The mixture was then heated to 100°C for 5 hours to obtain a solution containing the resin (Mw 18000) belonging to component (b). This resin solution was diluted by adjusting the solvent ratio to obtain a 20% solids solution (PGMEA:PGME = 70:30) to obtain alkali-soluble resin solution P-3. １ ¹H-NMR analysis confirmed that the alkali-soluble resin solution P-3 contains a copolymer having repeating units represented by formula (77), formula (78), formula (79), and formula (80). 【0214】 【0215】 In formulas (77), (78), (79), and (80), * indicates a binding site. 【0216】(Synthesis Example 11: Synthesis of "Alkali-Soluble Resin Solution P-4") Mixed solution 4 was prepared by dissolving 134.18 g (1.00 mol) of 4-isopropenylphenol (manufactured by Mitsui Chemicals, Inc.), 28.44 g (0.20 mol) of n-butyl methacrylate, 130.88 g (0.66 mol) of 2-ethylhexyl methacrylate, 12.05 g (0.14 mol) of methacrylic acid, and 9.17 g of AIBN in 600.00 g of mixed solvent (PGMEA:PGME = mass ratio 70:30). In a flask containing 400.00 g of mixed solvent (PGMEA:PGME = mass ratio 70:30), the aforementioned mixed solution 4 was gradually added over 2 hours while stirring and maintaining a liquid temperature of 80-90°C. The mixture was then heated to 100°C for 5 hours to obtain a solution containing a resin (Mw 18000) that does not belong to component (b). This resin solution was diluted by adjusting the solvent ratio to obtain a 20% solids solution (PGMEA:PGME = 70:30) to obtain alkali-soluble resin solution P-4. １ ¹H-NMR analysis confirmed that the alkali-soluble resin solution P-4 contains a copolymer having repeating units represented by formula (81), formula (82), formula (83), and formula (84). 【0217】 【0218】 In formulas (81), (82), (83), and (84), * indicates a binding site. 【0219】 (Synthesis Example 12: Synthesis of "Alkali-Soluble Resin Solution P-5") A solution containing a resin (Mw8300) belonging to component (b) was obtained by the same method as Synthesis Example 4 (Alkali-Soluble Resin A-1) disclosed in Japanese Patent Application Publication No. 2022-38599. This resin solution was diluted by adjusting the solvent ratio to obtain a solid content of 20% by mass PGMEA solution, and was prepared as alkali-soluble resin solution P-5. １ ¹H-NMR analysis confirmed that the alkali-soluble resin solution P-5 contains a copolymer (mol ratio 40:60) having repeating units represented by formula (85) and formula (86). 【0220】 【0221】 In formulas (85) and (86), * indicates a bonding site. 【0222】 The information regarding the alkali-soluble resin solutions P-1 to P-5 described above is summarized in Tables 4 and 5. 【0223】 【0224】 【0225】 (Manufacturing Example 1: Production of Pigment Dispersion 1) 2088.00 g of PGMEA was mixed with 390.00 g of a resin (F-1) solution having tertiary amino groups and 72.00 g of polymer-type dispersant A, and stirred for 5 minutes. Further, 450.00 g of S0100 was added, and the mixture was stirred for 30 minutes to obtain a preliminary stirring solution. The preliminary stirring solution was sent to a bead mill disperser in which 0.4 mmφ zirconia beads were packed into a vessel at a packing rate of 75 vol% and a wet media dispersion treatment was performed in a circulating manner at a peripheral speed of 8 m / s for 2 hours. Furthermore, the solution was sent to a bead mill disperser in which 0.05 mmφ zirconia beads were packed into a vessel at a packing rate of 75 vol% and a wet media dispersion treatment was performed in a circulating manner at a peripheral speed of 8 m / s for 5 hours to produce Pigment Dispersion 1 with a solid content of 20.00 mass%. The blending amounts of each raw material are shown in Table 6. 【0226】 【0227】 (Manufacturing Example 2: Manufacturing of Pigment Dispersion 2) Furthermore, using the same method as in Manufacturing Example 1, except that the pigment represented by formula (49) was used, a pigment dispersion 2 with a solid content of 20.00% by mass was manufactured in the proportions shown in Table 6. 【0228】 (Manufacturing Example 3: Manufacturing of Pigment Dispersion 3) Except that C.I. Pigment Blue 65 and C.I. Pigment Red 264 were used as pigments instead of S0100, and Efka PX 4310 and dye-type dispersant 2 were used as dispersants instead of polymer-type dispersant A, the same method as in Manufacturing Example 1 was used to manufacture Pigment Dispersion 3 with a solid content of 20.00% by mass in the proportions shown in Table 6. 【0229】(Manufacturing Example 4: Manufacturing of Pigment Dispersion 4) Except for using an alkali-soluble resin (b-1) solution instead of a tertiary amino group-containing resin (F-1) solution, a pigment dispersion 4 with a solid content of 25.00% by mass was manufactured in the same manner as disclosed in Manufacturing Example 1 of Patent Document 1, with the formulations shown in Table 7. 【0230】 【0231】 (Manufacturing Example 5: Manufacturing of Pigment Dispersion 5) Using the same method as disclosed in Manufacturing Example 1 of Japanese Patent Publication No. 2022-38599, a pigment dispersion 5 with a solid content of 25.00% by mass was manufactured in the proportions shown in Table 7. 【0232】 (Manufacturing Example 6: Manufacturing of Pigment Dispersion 6) 785.17 g of PGMEA was mixed with 9.60 g of dye-type dispersant 1 and 35.80 g of polymer-type dispersant A and stirred for 5 minutes. Then, 49.43 g of ZCR-1569H was added and stirred for 10 minutes. Furthermore, 40.00 g of S0100, 40.00 g of C.I. Pigment Red 177, and 40.00 g of C.I. Pigment Blue 60 were added in order and stirred for 30 minutes to obtain a preliminary stirring solution. The preliminary stirring solution was supplied to a bead mill in which 0.4 mmφ zirconia beads were packed into a vessel at a packing rate of 75 volume%, and wet media dispersion treatment was performed in a circulating manner at a peripheral speed of 8 m / s for 1 hour. Furthermore, the liquid was transferred to a bead mill in which 0.05 mmφ zirconia beads were filled into a vessel at a vessel filling rate of 75 volume%, and a wet media dispersion treatment was carried out for 4 hours at a peripheral speed of 8 m / s using a circulating system to produce a pigment dispersion liquid 6 with a solid content of 20.00 mass%. The blending weights of each raw material are shown in Table 7. 【0233】(Example 1) Under a yellow light, 1.65 g of N-1919T, component (c), was added to a mixed solvent of 12.75 g of MBA and 22.93 g of PGMEA, and the mixture was stirred for 10 minutes to dissolve it. Furthermore, 5.00 g of bisnaphthylfluorene acrylate solution 4, 0.45 g of DPCA-60 (100% solids by mass), component (g), and 21.90 g of alkali-soluble resin solution P-1, component (b), were added and the mixture was stirred for 10 minutes. Furthermore, 0.30 g of BYK-333 (manufactured by Bic Chemie) PGMEA solution with a solid content of 5% by mass was added as a leveling agent and the mixture was stirred for 5 minutes. Next, 35.03 g of pigment dispersion 1 was mixed and stirred for 30 minutes to obtain a negative-type photosensitive pigment composition 1 with a solid content of 15.00% by mass. The amounts of each raw material are shown in Table 8. 【0234】 【0235】 Table 9 shows the results of measuring the minimum required exposure (exposure sensitivity) of the negative-type photosensitive pigment composition 1 using the method described above, and evaluating the optical density of the cured film. 【0236】 【0237】 A black pixel-splitting layer containing a cured negative-type photosensitive pigment composition 1 was formed using the following method, and an organic EL display device comprising the black pixel-splitting layer was then fabricated. 【0238】 Figure 5 shows the manufacturing process of an organic EL display device, including the step of forming a black pixel partitioning layer. 【0239】 Using the same method as described above for fabricating the first electrode formation substrate when measuring the minimum required exposure amount, a silver alloy film 23 was patterned on the surface of an alkali-free glass substrate 22 measuring 150 mm in length and 300 mm in width, and then an ITO film 24 in the same pattern was laminated to obtain the first electrode formation substrate. 【0240】Using a spin coater, the rotation speed was adjusted so that the thickness of the pre-baked film of the negative-type photosensitive pigment composition 1 was 2.0 μm, and the film was applied to the surface of the first electrode forming substrate to obtain a coated film. Furthermore, using a hot plate, pre-baking was performed at 110°C under atmospheric pressure for 120 seconds to obtain a pre-baked film 25. Using a double-sided alignment single-sided exposure apparatus, the pre-baked film was pattern-exposed through a negative-type square pattern exposure mask (500 square light-shielding areas with a vertical width of 30.0 μm and a horizontal width of 30.0 μm arranged in an array) with the minimum required exposure amount measured by the method described above to obtain an exposed film. Next, the development process, rinsing process, and drying were performed in the same manner as when the minimum required exposure amount was measured to obtain a patterned developed film. During the rinsing process, the water pressure applied to the pre-baked film 26 located directly below the shower nozzle outlet was 0.3 MPa. Next, the developing film was heated at 260°C for 1 hour under a nitrogen atmosphere using a high-temperature inert gas oven to obtain a black pixel-splitting layer-forming substrate having a black pixel-splitting layer 27 containing a cured negative-type photosensitive pigment composition. Two black pixel-splitting layer-forming substrates obtained by the above method were prepared. One was used to evaluate the peeling of the black pixel-splitting layer and the taper angle θ, and the other was used to prepare an organic EL display device, which will be described later. 【0241】 Within the plane of the alkali-free glass substrate 22, a black pixel separation layer formed in the central part was designated as black pixel separation layer A, and a black pixel separation layer formed at the edge was designated as black pixel separation layer B. Peeling and taper angle θ were evaluated using the methods described above. The evaluation results are shown in Table 9. 【0242】 Next, an organic EL layer 28 including the light-emitting layer is formed in the opening of the black pixel division layer 27 by vacuum deposition, using a vacuum degree of 1 × 10⁻¹⁰. －３Under deposition conditions below Pa, the black pixel splitting layer-forming substrate was rotated relative to the deposition source. First, a 10 nm thick layer of the compound represented by formula (87) (HT-1) was deposited as a hole injection layer, and a 50 nm thick layer of the compound represented by formula (88) (HT-2) was deposited as a hole transport layer. Next, a 40 nm thick layer of the compound represented by formula (89) (GH-1) was deposited as a host material, and a 40 nm thick layer of the compound represented by formula (90) (GD-1) was deposited as a dopant material. Subsequently, an electron transport material consisting of a 1:1 volume ratio layer of ET-1 represented by formula (91) and a 40 nm thick layer of the compound represented by formula (92) (LiQ) was deposited. 【0243】 【0244】 【0245】 Next, after depositing a compound (LiQ) to a thickness of 2 nm, a silver / magnesium alloy (volume ratio 10:1) was deposited to a thickness of 150 nm to form a second electrode 29. Then, under a low humidity / nitrogen atmosphere, a cap-shaped glass plate was sealed by bonding it with an epoxy resin adhesive to the sealing layer 30 to obtain an organic EL display device. Note that each layer constituting the organic EL layer 28 is very thin compared to the aforementioned black pixel division layer, and high measurement accuracy cannot be obtained with a stylus-type film thickness measuring device. Therefore, each layer was measured using a quartz oscillator type film thickness monitor suitable for thin films of less than 100 nm, and the film thickness was taken by rounding the average value of three points in the plane to the first decimal place. 【0246】 Within the plane of the alkali-free glass substrate 22, an organic EL display device located in the center was designated as organic EL display device A, and an organic EL display device located at the edge was designated as organic EL display device B. Dark spots were evaluated using the method described above. The evaluation results are shown in Table 9. 【0247】 (Examples 2-6) Negative-type photosensitive pigment compositions 2-6 were prepared in the same manner as in Example 1, except that bisnaphthylfluorene acrylate solutions 5-9 were used instead of bisnaphthylfluorene acrylate solution 4, in the amounts shown in Tables 8 and 10. The optical density, peeling, taper angle, and dark spots of the cured films were evaluated using the method described above. The evaluation results are shown in Tables 9 and 11. 【0248】 【0249】 【0250】 (Examples 7-8) Negative photosensitive pigment compositions 7-8 were prepared in the same manner as in Example 1, except that bisnaphthylfluorene acrylate solution 5 was used instead of bisnaphthylfluorene acrylate solution 4, and alkali-soluble resin solution P-2 or alkali-soluble resin solution P-3 was used instead of alkali-soluble resin solution P-1, in the proportions shown in Table 10. The optical density, peeling, taper angle, and dark spots of the cured film were evaluated using the method described above. The evaluation results are shown in Table 11. 【0251】 (Examples 9-10) Negative-type photosensitive pigment compositions 9-10 were prepared in the same manner as in Example 1, except that bisnaphthylfluorene acrylate solution 5 was used instead of bisnaphthylfluorene acrylate solution 4, and pigment dispersion 2 or pigment dispersion 3 was used instead of pigment dispersion 1, using the formulation amounts shown in Table 12. The optical density, peeling, taper angle, and dark spots of the cured film were evaluated using the method described above. The evaluation results are shown in Table 13. Note that since pigment dispersion 3 has a different type of (d) component from pigment dispersions 1-2, the formulation amount was adjusted to obtain the same optical density of the cured film as in Example 1. 【0252】 【0253】 【0254】 (Comparative Example 1) A negative-type photosensitive pigment composition 11 was prepared in the same manner as in Example 1, except that "KAYARAD®" HX-220 (hereinafter referred to as HX-220), a compound having two acryloxy groups in its molecule, was used instead of the bisnaphthylfluorene acrylate solution 4, in the amounts shown in Table 14. The optical density and peeling of the cured film were evaluated using the method described above. The evaluation results are shown in Table 15. HX-220 has a solid content of 100% by mass and is a compound that does not belong to component (a) and component (g). 【0255】 【0256】 【0257】 (Comparative Example 2) A negative-type photosensitive pigment composition 12 was prepared in the same manner as in Example 1, except that bisnaphthylfluorene acrylate solution 2 was used instead of bisnaphthylfluorene acrylate solution 4, in the proportions shown in Table 14. The optical density, peeling, taper angle, and dark spots of the cured film were evaluated using the method described above. The evaluation results are shown in Table 15. 【0258】 (Comparative Example 3) To obtain the same composition as Example 1 of Patent Document 1, a negative-type photosensitive pigment composition 13 was prepared by mixing 250.0 g of pigment dispersion 4, 386.5 g of alkali-soluble resin (b-1) solution, 13.3 g of OXE03, 18.7 g of bisnaphthylfluorene acrylate 1, 28.0 g of A-9570 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.) as (g) component, 0.2 g of BYK-333 (solid content 100% by mass), and 490.8 g of PGMEA in the amounts shown in Table 14. The optical density, peeling, taper angle, and dark spots of the cured film were evaluated using the method described above. The evaluation results are shown in Table 15. 【0259】 (Comparative Example 4) A negative-type photosensitive pigment composition 14 was prepared using the formulation amounts shown in Table 14, and the optical density, peeling, taper angle, and dark spots of the cured film were evaluated using the method described above. The evaluation results are shown in Table 15. 【0260】 (Comparative Example 5) A negative-type photosensitive pigment composition 15 was prepared by mixing 180.92 g of pigment dispersion 5, 284.33 g of alkali-soluble resin solution P-5, 5.30 g of NCI-831, 0.20 g of BYK-333, 42.40 g of dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.), and 486.85 g of PGMEA in the amounts shown in Table 16, so as to have the same composition as Example 4 of Japanese Patent Application Publication No. 2022-38599. The optical density, peeling, taper angle, and dark spots of the cured film were evaluated using the method described above. The evaluation results are shown in Table 17. 【0261】 【0262】 【0263】(Comparative Example 6) A negative-type photosensitive pigment composition 16 was prepared with the formulation amounts shown in Table 16, and the optical density and peeling of the cured film were evaluated using the method described above. The evaluation results are shown in Table 17. 【0264】 (Comparative Example 7) A negative-type photosensitive pigment composition 17 was prepared with the same composition as Example 4 of International Publication No. 2022 / 172605, using the formulation amounts shown in Table 18, and the optical density and peeling of the cured film were evaluated using the method described above. The evaluation results are shown in Table 18. 【0265】 (Comparative Example 8) A negative-type photosensitive pigment composition 18 was prepared in the same manner as in Example 1, except that an alkali-soluble resin solution P-4, which does not belong to component (b), was used instead of alkali-soluble resin solution P-1, in the amounts shown in Table 18. The optical density, peeling, taper angle, and dark spots of the cured film were evaluated using the method described above. The evaluation results are shown in Table 19. 【0266】 【0267】 【0268】 From the above results, it can be seen that the negative-type photosensitive pigment composition, cured product, organic EL display device, and electronic device of the present invention are useful. 【0269】 1: TFT 2: Wiring 3: TFT insulating layer 4: Planarization layer 5: First electrode 6: Substrate 7: Contact hole 8: Black pixel division layer 9: Transparent cover layer 10: Pixel division layer made of laminated film 11: Light-emitting pixel 12: Second electrode 13: First electrode 14: Area in the black pixel division layer where peeling did not occur 15: Area in the black pixel division layer where peeling occurred 16: Alkali-free glass substrate 17: First electrode 18: Black pixel division layer 19: Black pixel division layer 20: Area in the light-emitting pixel that lit up normally 21: Dark spot in the light-emitting pixel 22: Alkali-free glass substrate 23: Silver alloy film 24: ITO film 25: Pre-baked film 26: Pre-baked film located directly below the shower nozzle outlet 27: Black pixel division layer 28: Organic EL layer 29: Second electrode 30: Encapsulation layer

Claims

1. A negative photosensitive pigment composition containing (a) a compound having only one 9,9-bis(naphthyl)fluorene skeleton in the molecule and a total of 2 methacryloxy groups and acryloxy groups in the molecule, (b) a resin having a repeating unit represented by formula (1) and / or a repeating unit represented by formula (2), (c) a photopolymerization initiator, (d) an organic black pigment and / or a mixed-color organic black pigment, and (e) an organic solvent, wherein the component (a) contains (a-1) a compound having only 2 hydroxyl groups in the molecule and no carboxyl group, (a-2) a compound having only 1 carboxyl group in the molecule, and (a-3) a compound having only 2 carboxyl groups in the molecule. (In formula (1) and formula (2), R １ and R ４ each independently represent a hydrogen atom or a methyl group, R ２ and R ５ each independently represent a divalent group having 1 to 5 carbon atoms containing -COO- or -CONH-, R ３ , R ６ and R ７ each independently represent an alkyl group having 1 to 3 carbon atoms, n １ is an integer and represents 1 or 2, n ４ and n ６ are integers and each independently represent 0 or 1, provided that the sum of n ４ and n ６ is 1 or 2, n ２ , n ３ and n ５ are integers and each independently represent 0 or 1, and * represents a bonding site.) 2. The negative-type photosensitive pigment composition according to claim 1, wherein the (a-2) component contains a compound represented by formula (8). (In formula (8), A ２ R represents a divalent group with 13 to 21 carbon atoms containing only one fluorene skeleton, １８ and R １９ Each of these independently represents a hydrogen atom or a methyl group, R ２０ , R ２１ , R ２２ and R ２３ Each of these independently represents an alkylene group having 1 to 4 carbon atoms, R ２４ , R ２５ , R ２６ and R ２７ R represents an alkyl group having 1 to 3 carbon atoms. ２８ represents a divalent group with 2 to 10 carbon atoms, n １５ , n １６ , n １７ and n １８ n are integers, each independently representing either 0 or 1. １９ , n ２０ , n ２１ and n ２２ These are integers, each independently representing a value between 0 and 3.

3. The content of component (a-1) is X １ (Parts by mass), the content of the above-mentioned (a-2) component is Y １ (Parts by mass), the content of the above-mentioned (a-3) component is Z １ When (mass part), X １ Y １ and Z １ The negative-type photosensitive pigment composition according to claim 1 or 2, wherein the value obtained by dividing by the sum of the values ​​is 0.5 or more and 10.0 or less.

4. The R ２８ is any group selected from the group consisting of the group represented by the formula (14), the group represented by the formula (15), the group represented by the formula (16), and the group represented by the formula (17). The negative photosensitive pigment composition according to claim 2. (In formula (14), formula (15), formula (16) and formula (17), R ３９ , R ４０ , R ４１ and R ４２ each independently represents an alkyl group having 1 to 3 carbon atoms, and n ３１ , n ３２ , n ３３ and n ３４ are integers and each independently represents 0 or 1. * represents a bonding site.) 5. The negative-type photosensitive pigment composition according to claim 1 or 2, wherein component (b) has a repeating unit represented by formula (32) and / or a repeating unit represented by formula (33), in addition to a repeating unit represented by formula (34). (In equations (32), (33), and (34), R ５５ , R ５６ and R ５８ Each of these independently represents a hydrogen atom or a methyl group, R ５７ R represents a divalent group with 2 to 10 carbon atoms that does not contain a carboxyl group. ５９ (where * represents an alkyl group with 1 to 18 carbon atoms, and * represents a bonding site.) 6. The negative-type photosensitive pigment composition according to claim 1 or 2, wherein component (d) contains the organic black pigment, the organic black pigment contains a benzodifuranone-based black pigment, and further contains a pigment represented by formula (49).

7. A cured product of the negative-type photosensitive pigment composition according to claim 1 or 2.

8. An organic EL display device comprising the cured product described in claim 7.

9. An electronic device comprising the organic EL display device described in claim 8.

10. A composition comprising (a) a compound having only one 9,9-bis(naphthyl)fluorene skeleton in the molecule and a total of 2 methacryloxy and acryloxy groups in the molecule, wherein component (a) comprises (a-1) a compound having only two hydroxyl groups in the molecule and no carboxyl groups, (a'-2) a compound represented by formula (93), and (a-3) a compound having only two carboxyl groups in the molecule. (In formula (93), A ６ R represents a divalent group with 13 to 21 carbon atoms containing only one fluorene skeleton, ８１ and R ８２ Each of these independently represents a hydrogen atom or a methyl group, R ８３ , R ８４ , R ８５ and R ８６ Each of these independently represents an alkylene group having 1 to 4 carbon atoms, R ８７ , R ８８ , R ８９ and R ９０ R represents an alkyl group with 1 to 3 carbon atoms. ９１ n represents any group selected from the group consisting of the group represented by formula (94), the group represented by formula (95), the group represented by formula (96), and the group represented by formula (97). ５１ , n ５２ , n ５３ and n ５４ n are integers, each independently representing either 0 or 1. ５５ , n ５６ , n ５７ and n ５８ These are integers, each independently representing a value between 0 and 3. (In equations (94), (95), (96), and (97), R ９２ , R ９３ , R ９４ and R ９５ Each of these independently represents an alkyl group having 1 to 3 carbon atoms, n ５９ , n ６０ , n ６１ and n ６２ Each is an integer, independently representing either 0 or 1. * represents a connection point.

Images