Optical waveguide structure and manufacturing method therefor, ar near-eye display device, and use

Abstract

An optical waveguide structure (100) and a manufacturing method therefor, an AR near-eye display device, and a use. The optical waveguide structure (100) comprises: a rigid support layer (10), having a first surface (11) and a second surface (12) opposite to each other; a low refractive index layer (20), at least connected to the first surface (11), at least one low refractive index grating structure (21) being arranged on the side of the low refractive index layer (20) away from the rigid support layer (10); a high refractive index layer (30), connected to the side of the low refractive index layer (20) away from the rigid support layer (10), a high refractive index grating structure (31) of the high refractive index layer (30) being correspondingly fitted to the low refractive index grating structure (21); and a resin layer (40), arranged on the side of the high refractive index layer (30) away from the low refractive index layer (20).

Description

Optical waveguide structure and its fabrication method, AR near-eye display device and its application

[0001] Cross-reference to related applications

[0002] This application is based on and claims priority to Chinese patent applications No. 2024118179912, filed on December 10, 2024, entitled "Optical Waveguide Structure and Preparation Method Thereof" and Chinese patent application No. 2024230530311, filed on December 10, 2024, entitled "Optical Waveguide Structure, AR Near-Eye Display Device and Its Application Thereof", the entire contents of which are incorporated herein by reference. Technical Field

[0003] This application relates to the field of optical device technology, and in particular to optical waveguide structures and their fabrication methods, AR near-eye display devices and their applications. Background Technology

[0004] Optical waveguides are widely used in near-eye display devices such as augmented reality and mixed reality due to their thinness, light weight, and good light transmittance.

[0005] Among existing optical waveguide products, the rigidity of the optical waveguide is relatively small. When subjected to external forces, it is easy to deform, which leads to the deterioration of the performance of the optical waveguide. In addition, the thickness of the optical waveguide is relatively large during the manufacturing process, which is not conducive to the lightweight design of the structure. In other optical waveguide products, the impact resistance is poor, it is easy to break, the safety is poor, and the user experience is poor. Summary of the Invention

[0006] In view of this, this application proposes an optical waveguide structure and its fabrication method, an AR near-eye display device and its application, aiming to achieve an optical waveguide structure with certain structural strength and deformation resistance while having a small thickness and light weight.

[0007] The optical waveguide structure proposed in the first aspect of this application includes: a rigid support layer having opposing first and second surfaces; a low-refractive-index layer, at least connected to the first surface, with at least one low-refractive-index grating structure disposed on the side of the low-refractive-index layer away from the rigid support layer; a high-refractive-index layer, connected to the side of the low-refractive-index layer away from the rigid support layer, with at least one high-refractive-index grating structure disposed on the high-refractive-index layer, and the high-refractive-index grating structure correspondingly and fitted to the low-refractive-index grating structure; and a resin layer disposed on the side of the high-refractive-index layer away from the low-refractive-index layer.

[0008] As can be seen from the above technical solutions, the optical waveguide structure proposed in the first aspect of this application has a rigid support layer with sufficient rigidity, making it resistant to deformation under external forces. When other structural layers use the rigid support layer as an attachment layer, the entire optical waveguide structure can possess a certain structural strength and resistance to deformation. Furthermore, due to the refractive index difference between the low-refractive-index layer and the high-refractive-index layer, light undergoes total internal reflection when moving from the high-refractive-index layer to the low-refractive-index layer, preventing it from entering the rigid support layer. Instead, the light can diffract and propagate at the high-refractive-index grating structure, allowing the light to continuously propagate between the resin layer and the high-refractive-index layer. Because the rigid support layer and resin layer of this application work together, the overall structure is thinner compared to using multiple resin layers; and compared to using multiple rigid support layers, the overall structure is lighter, and the risk of breakage is significantly reduced.

[0009] The method for fabricating an optical waveguide structure according to the second aspect of this application includes the following steps: providing a rigid support layer; coating a low-refractive-index imprinting adhesive onto a first surface and / or a second surface of the rigid support layer for imprinting and curing to form a low-refractive-index layer with a low-refractive-index grating structure; coating a high-refractive-index imprinting adhesive onto the low-refractive-index layer so that the high-refractive-index imprinting adhesive completely fills the low-refractive-index grating structure; placing a resin layer on the side of the high-refractive-index imprinting adhesive away from the low-refractive-index layer and curing it to obtain the optical waveguide structure; or, first curing the high-refractive-index imprinting adhesive and then bonding the resin layer to the side of the high-refractive-index layer away from the low-refractive-index layer to obtain the optical waveguide structure.

[0010] The method for fabricating the optical waveguide structure proposed in the second aspect of this application is simple. It utilizes a low-refractive-index grating structure formed by imprinting and curing a low-refractive-index adhesive to create a high-refractive-index grating structure. This method ensures a high degree of fit between the high-refractive-index grating structure and the low-refractive-index grating structure, and simplifies the connection arrangement between the low-refractive-index and high-refractive-index layers. The resulting optical waveguide structure exhibits good rigidity, is not easily deformed, is resistant to external impacts, is lightweight, and has a small thickness.

[0011] The method for fabricating an optical waveguide structure according to the third aspect of this application includes the following steps: providing a rigid support layer and cleaning the rigid support layer; coating a low-refractive-index imprinting adhesive on a first or second surface of the rigid support layer and forming a first substrate with the rigid support layer; providing a resin layer and coating a high-refractive-index imprinting adhesive on the resin layer for imprinting and curing to form a high-refractive-index layer with a high-refractive-index grating structure, wherein the resin layer and the high-refractive-index layer form a second substrate; bonding the second substrate and the first substrate together and removing bubbles in a vacuum environment; and curing the low-refractive-index imprinting adhesive to obtain the optical waveguide structure.

[0012] The method for fabricating the optical waveguide structure proposed in the third aspect of this application is simple, produces fewer bubbles, and achieves high adhesion between the layers. A low-refractive-index grating structure can be formed using a high-refractive-index grating structure created by imprinting and curing a high-refractive-index adhesive. This method ensures high compatibility between the low-refractive-index and high-refractive-index grating structures and simplifies the connection arrangement between the low-refractive-index and high-refractive-index layers. The resulting optical waveguide structure exhibits good rigidity, is not easily deformed, is resistant to external impacts, is lightweight, and has a small thickness.

[0013] The AR near-eye display device proposed in the fourth aspect of this application includes: an optical engine and an optical waveguide structure in the foregoing embodiments, wherein the optical engine emits signal light to the optical waveguide structure, the optical waveguide structure couples the signal light into the signal light, and couples the signal light out to the human eye.

[0014] As can be seen from the above technical solutions, the AR near-eye display device proposed in the fourth aspect of this application emits signal light through an optomechanical system. When the signal light is transmitted to the optical waveguide structure, it can be coupled in and out of the light source to realize the transmission of light from the optomechanical system to the human eye, thereby enabling the human eye to see the virtual image.

[0015] The application of the AR near-eye display device proposed in the fifth aspect of this application applies the AR near-eye display device in the aforementioned example to naked-eye 3D light field display.

[0016] As can be seen from the above technical solutions, the AR near-eye display device proposed in the fifth aspect of this application can be used for naked-eye 3D light field display, and enable the human eye to see clear and continuous stereoscopic images from different angles.

[0017] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and do not limit the disclosure of the embodiments of this application. Attached Figure Description

[0018] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 is a schematic diagram of a colored optical waveguide structure proposed in some embodiments of this application;

[0020] Figure 2 is a schematic diagram of a monochromatic optical waveguide structure proposed in some embodiments of this application;

[0021] Figure 3 is a schematic flowchart of the fabrication method of the optical waveguide structure proposed in some embodiments of this application;

[0022] Figure 4 is a schematic diagram of the structure after each major step in the fabrication method of the optical waveguide structure proposed in some embodiments of this application;

[0023] Figure 5 is a schematic diagram of the fabrication method of the optical waveguide structure proposed in some embodiments of the application, wherein an antifouling film is also prepared on the side of the rigid support layer away from the low refractive index layer;

[0024] Figure 6 is a schematic diagram of the structure after each major step in the fabrication method of the optical waveguide structure proposed in some embodiments of this application, wherein an anti-fouling film is also coated on the side of the rigid support layer away from the low refractive index layer.

[0025] Figure 7 is a schematic flowchart of the fabrication method of the optical waveguide structure proposed in some embodiments of this application;

[0026] Figure 8 is a schematic diagram of the structure after each major step in the fabrication method of the optical waveguide structure proposed in some embodiments of this application;

[0027] Figure 9 is a schematic flowchart of the fabrication method of the optical waveguide structure proposed in some embodiments of this application, wherein an antifouling film is also prepared on the side of the rigid support layer away from the low refractive index layer;

[0028] Figure 10 is a schematic diagram of the structure after each major step in the fabrication method of the optical waveguide structure proposed in some embodiments of this application, wherein an antifouling film is also coated on the side of the rigid support layer away from the low refractive index layer.

[0029] Explanation of reference numerals in the attached drawings: 100, optical waveguide structure; 10, rigid support layer; 11, first surface; 12, second surface; 20, low refractive index layer; 21, low refractive index grating structure; 22, low refractive index imprinting adhesive; 30, high refractive index layer; 31, high refractive index grating structure; 32, high refractive index imprinting adhesive; 40, resin layer; 50, antifouling film. Detailed Implementation

[0030] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0031] It should also be understood that the terminology used in this application specification is for the purpose of describing particular embodiments only and is not intended to limit the application. As used in this application specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise.

[0032] It should also be further understood that the term "and / or" as used in this application specification and the appended claims refers to any combination of one or more of the associated listed items, and all possible combinations thereof. Without conflict, the following embodiments and features described herein can be combined with each other.

[0033] Existing optical waveguides cannot achieve high structural strength while being thin and lightweight, and the finished products are prone to breakage and have poor safety in use.

[0034] In view of this, the optical waveguide structure 100 proposed in this application, as shown in Figures 1 and 2, includes: a rigid support layer 10, a low refractive index layer 20, a high refractive index layer 30, and a resin layer 40.

[0035] The rigid support layer 10 has opposing first surfaces 11 and second surfaces 12. For example, the rigid support layer 10 is a plate with a certain thickness, and therefore has a first surface 11 (such as the bottom surface) and a second surface 12 (such as the top surface) that are sufficiently large compared to the other four sides.

[0036] The low refractive index layer 20 is at least connected to the first surface 11, that is, the low refractive index layer 20 is connected to the first surface 11, or the low refractive index layer 20 is connected to both the first surface 11 and the second surface 12.

[0037] At least one low-refractive-index grating structure 21 is provided on the side of the low-refractive-index layer 20 away from the rigid support layer 10. There can be one, two, three, or more low-refractive-index grating structures 21. When there are multiple low-refractive-index grating structures 21, they can be spaced apart or arranged continuously.

[0038] A high-refractive-index layer 30 is connected to the side of the low-refractive-index layer 20 away from the rigid support layer 10. At least one high-refractive-index grating structure 31 is provided on the high-refractive-index layer 30, and the high-refractive-index grating structure 31 is correspondingly and fitted to the low-refractive-index grating structure 21. Therefore, as shown in Figure 1, when the low-refractive-index layer 20 is only provided on the first surface 11, only one layer of the high-refractive-index layer 30 is provided, that is, the high-refractive-index layer 30 is only provided on the low-refractive-index layer 20 on one side of the rigid support layer 10. As shown in Figure 2, when the low-refractive-index layer 20 is connected to both the first surface 11 and the second surface 12, two layers of the high-refractive-index layer 30 are provided, that is, the high-refractive-index layer 30 is simultaneously provided on the low-refractive-index layers 20 on both sides of the rigid support layer 10.

[0039] The resin layer 40 is disposed on the side of the high refractive index layer 30 away from the low refractive index layer 20. Similarly, as shown in Figure 1, when the high refractive index layer 30 is disposed only on the low refractive index layer 20 on one side of the rigid support layer 10, only one layer of resin layer 40 is disposed. In this case, the optical waveguide structure 100 is a monochromatic optical waveguide, and light can propagate on one side. As shown in Figure 2, when the high refractive index layer 30 is disposed on both sides of the low refractive index layers 20 of the rigid support layer 10, two layers of resin layer 40 are disposed accordingly. In this case, the optical waveguide structure 100 is a colored optical waveguide, and light can propagate on both sides.

[0040] As can be seen from the above technical solutions, the optical waveguide structure 100 proposed in this application has sufficient rigidity in its rigid support layer 10, which is not easily deformed after being subjected to external forces. When other structural layers use the rigid support layer 10 as an attachment layer, the entire optical waveguide structure 100 can have a certain structural strength and anti-deformation performance, good impact resistance, high rigidity, and significantly reduced deformation.

[0041] Because of the refractive index difference between the low-refractive-index layer 20 and the high-refractive-index layer 30, light undergoes total internal reflection when traveling from the high-refractive-index layer 30 to the low-refractive-index layer 20. This means that light can undergo total internal reflection within the high-refractive-index layer 30, while the light will not enter the low-refractive-index layer 20 or the rigid support layer 10. The low-refractive-index layer 20 acts as a light insulator, isolating the light on the side facing the high-refractive-index layer 30, while no light propagates within the rigid support layer 10. Light can diffract and propagate at the high-refractive-index grating structure 31, allowing it to continuously propagate between the resin layer 40 and the high-refractive-index layer 30.

[0042] Because the rigid support layer 10 and the resin layer 40 of this application work together, the overall structure is thinner compared to using multiple resin layers 40; compared to using multiple rigid support layers 10, the overall structure is lighter, less heavy, and the risk of breakage is significantly reduced. The resin layer 40 of this application can also protect the internal high refractive index grating structure 31, effectively preventing damage to the high refractive index grating structure 31, thereby enabling light to propagate effectively.

[0043] In this application, light can be incident from the resin layer 40 onto the high refractive index layer 30, then onto the high refractive index grating structure 31, and subsequently diffracted back into the resin layer 40. This propagation mode is suitable for reflective gratings and when the optomechanic is located on both sides of the resin layer 40. Alternatively, light can be incident from the high refractive index grating structure 31 and then diffracted into the resin layer 40. This propagation mode is suitable for transmissive gratings and when the optomechanic is located on the same side of the resin layer 40.

[0044] In some examples of this application, the rigid support layer 10 includes at least one of a tempered glass layer, a sapphire glass layer, a quartz layer, or a rigid transparent resin layer. These materials, as the rigid support layer 10, all provide the optical waveguide structure 100 with sufficient structural strength and a certain degree of rigidity, making it less prone to deformation under external forces. Furthermore, these materials have a certain degree of light transmittance, resulting in high overall light transmittance of the entire optical waveguide structure 100. In particular, the use of a tempered glass layer significantly improves the rigidity of the optical waveguide structure 100; under external forces, the deformation of the optical waveguide structure 100 is significantly reduced, and its impact resistance is significantly improved. Since the low-refractive-index layer 20 isolates light on the side facing the high-refractive-index layer 30, the light will not propagate within the tempered glass, and the propagation path of the light will not be affected by the stress within the tempered glass.

[0045] In some specific examples, the rigid light-transmitting resin layer includes at least one of a polycarbonate layer (commonly known as PC), a polymethyl methacrylate layer (commonly known as PMMA), a polystyrene layer (commonly known as PS), an acrylonitrile-styrene copolymer layer (commonly known as AS), a polyethylene terephthalate layer (commonly known as PET), a transparent ABS resin layer, or a polyamide layer (commonly known as PA). These rigid light-transmitting resins have a light transmittance of 85% or higher. In particular, when a polymethyl methacrylate (PMMA) layer is used, the light transmittance reaches as high as 92%. When a polycarbonate (PC) layer is used, the light transmittance reaches as high as 90%.

[0046] In some examples of this application, as shown in Figure 2, the refractive index layer 20, the high refractive index layer 30, and the resin layer 40 each comprise two layers. Two low refractive index layers 20 are respectively connected to the first surface 11 and the second surface 12. A high refractive index layer 30 is connected to the side of each low refractive index layer 20 away from the rigid support layer 10, and a resin layer 40 is connected to the side of each high refractive index layer 30 away from the low refractive index layer 20. In these examples, light can propagate on the high refractive index layers 30 and the resin layer 40 on both sides of the two low refractive index layers 20. Compared to the prior art with added glass covers, the optical waveguide structure 100 is lighter and can withstand greater impacts without cracking or breaking, thus improving safety. The optical waveguide structures 100 in these examples constitute a colored optical waveguide.

[0047] In some examples of this application, as shown in Figure 1, the optical waveguide structure 100 further includes an anti-fouling film 50, a low-refractive-index layer 20 connected to the first surface 11, and the anti-fouling film 50 covering the second surface 12. In these examples, light can propagate through the high-refractive-index layer 30 and resin layer 40 on the side of the low-refractive-index layer 20 on the first surface 11, without entering the interior of the low-refractive-index layer 20 and the rigid support layer 10. The anti-fouling film 50 on the second surface 12 provides some protection to the exposed rigid support layer 10, effectively preventing dust and other contaminants from adhering to the second surface 12 of the rigid support layer 10, thus maintaining the cleanliness and aesthetic appearance of the optical waveguide structure 100. The optical waveguide structure 100 in these examples is a monochromatic optical waveguide.

[0048] In other examples, the low-refractive-index layer 20 is attached to the second surface 12, and the anti-fouling film 50 covers the first surface 11. In these examples, light can propagate over the high-refractive-index layer 30 and resin layer 40 on the side of the low-refractive-index layer 20 on the second surface 12, without entering the low-refractive-index layer 20 and the rigid support layer 10. The anti-fouling film 50 on the first surface 11 provides protection to the exposed rigid support layer 10, effectively preventing dust and other contaminants from adhering to the first surface 11 of the rigid support layer 10, thus maintaining the cleanliness and aesthetic appearance of the optical waveguide structure 100. In these examples, the optical waveguide structure 100 is a monochromatic optical waveguide.

[0049] For example, the anti-fouling film 50 is an AF film (Anti-Fingerprint) layer, which can effectively resist the adhesion of fingerprints and stains. It has the advantages of high transparency, high hardness, scratch resistance and chemical corrosion resistance, thereby effectively protecting the exposed surface of the rigid support layer 10.

[0050] In some examples of this application, as shown in Figure 1, the resin layer 40 and the high refractive index layer 30 are bonded together. This allows the resin layer 40 to form a surface-to-surface connection with the high refractive index layer 30. Exemplarily, an OCA (Optically Clear Adhesive) adhesive is applied to the side of the resin layer 40 facing the high refractive index layer 30. This optical adhesive is colorless and transparent with a total light transmittance greater than 99%, minimizing its impact on light propagation and allowing stable light propagation between the resin layer 40 and the high refractive index layer 30. This optical adhesive provides good bond strength, ensuring a stable connection between the resin layer 40 and the high refractive index layer 30. The optical adhesive cures at room temperature, facilitating bonding. It is resistant to yellowing over long-term use, ensuring that the portion of the optical waveguide structure 100 that propagates light remains transparent and that light propagates effectively over extended periods. The optical adhesive exhibits minimal curing shrinkage, preventing the resin layer 40 from peeling off after bonding to the high refractive index layer 30.

[0051] In other examples, the resin layer 40 may first come into contact with the high refractive index imprinting adhesive 32 used to prepare the high refractive index layer 30, and then the high refractive index imprinting adhesive 32 may be cured to achieve the connection between the resin layer 40 and the high refractive index layer 30.

[0052] In some examples of this application, the refractive index of the low-refractive-index layer 20 is 1.0 to 1.4. For example, the refractive index of the low-refractive-index layer 20 is 1.0, 1.1, 1.2, 1.3, 1.4, etc.

[0053] In some examples of this application, the refractive index of the high-refractive-index layer 30 is 1.6 to 2.0. For example, the refractive index of the high-refractive-index layer 30 is 1.6, 1.7, 1.8, 1.9, 2.0, etc. The high-refractive-index layer 30 and the low-refractive-index layer 20 have a certain refractive index difference, which allows total internal reflection to occur at the interface between the high-refractive-index layer 30 and the low-refractive-index layer 20 during the propagation of light from the resin layer 40 and the high-refractive-index layer 30 to the low-refractive-index layer 20, thus preventing light from propagating into the low-refractive-index layer 20 and the rigid support layer 10.

[0054] For example, the refractive index difference between the high refractive index layer 30 and the low refractive index layer 20 is a minimum of 0.2 and a maximum of 1.0. As long as the light entering from the resin layer 40 and propagating through the high refractive index layer 30 to the low refractive index layer 20 can undergo total internal reflection at the interface between the high refractive index layer 30 and the low refractive index layer 20, it is acceptable.

[0055] In some examples of this application, the refractive index of the resin layer 40 is 1.6 to 2.0. Therefore, the refractive index of the resin layer 40 is essentially the same as or very similar to the refractive index of the high-refractive-index layer 30, allowing light to propagate along a predetermined optical path between the resin layer 40 and the high-refractive-index layer 30. For example, the refractive index of the resin layer 40 is 1.6, 1.7, 1.8, 1.9, 2.0, etc.

[0056] In this application, the high refractive index layer 30 is made of high refractive index imprinting adhesive 32, and the low refractive index layer 20 is made of low refractive index imprinting adhesive 22.

[0057] In some examples of this application, the thickness of the rigid support layer 10 ranges from 0.2 mm to 1 mm. This allows the low-refractive-index imprinting adhesive 22 used to prepare the low-refractive-index layer 20 to adhere to the rigid support layer 10, which provides sufficient support for facilitating the imprinting of the low-refractive-index imprinting adhesive 22. Within the aforementioned thickness range, the rigid support layer 10 also ensures that the final optical waveguide structure 100 possesses sufficient rigidity, effectively resisting external impacts and significantly reducing deformation caused by external forces. For example, the thickness of the rigid support layer 10 can be 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, or 1 mm.

[0058] In some examples of this application, the thickness of the low-refractive-index layer 20 ranges from 0.1 μm to 5 μm. Within this thickness range, the low-refractive-index imprinting adhesive 22 used to prepare the low-refractive-index layer 20 (see Figures 8 and 10) can achieve rapid curing, and after imprinting, a low-refractive-index grating structure 21 of the required size can be achieved. Furthermore, the thickness of the final optical waveguide structure 100 can be controlled within a reasonable range, which is beneficial for designing a thinner optical waveguide structure 100. For example, the thickness of the low-refractive-index layer 20 is 0.1 μm, 0.3 μm, 0.5 μm, 0.7 μm, 0.9 μm, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, etc.

[0059] In some examples of this application, the thickness of the high refractive index layer 30 ranges from 0.1 μm to 10 μm. This allows the high refractive index imprinting adhesive 32 (see Figures 4 and 6) used to form the high refractive index layer 30 to completely cover the surface of the low refractive index layer 20, or to completely fill the low refractive index grating structure 21. For example, the thickness of the high refractive index layer 30 is 0.1 μm, 0.2 μm, 0.3 μm, 0.5 μm, 0.8 μm, 1 μm, 2 μm, 3 μm, 5 μm, 8 μm, or 10 μm, etc.

[0060] In some examples of this application, the thickness of the resin layer 40 ranges from 0.1 mm to 1.0 mm. This allows the resin layer 40 to provide some protection and support for the high refractive index layer 30, and makes the overall structural strength of the optical waveguide structure 100 high, while being thinner than a glass cover plate. For example, the thickness of the resin layer 40 is 0.1 mm, 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, or 1.0 mm, etc.

[0061] The AR near-eye display device proposed in this application is described below.

[0062] The AR near-eye display device proposed in this application includes: an optical engine and an optical waveguide structure 100 in the foregoing embodiments. The optical engine emits signal light into the optical waveguide structure 100, the optical waveguide structure 100 couples in the signal light, and couples the signal light out to the human eye.

[0063] As can be seen from the above technical solution, the AR near-eye display device proposed in this application emits signal light through an optomechanical system. When the signal light is transmitted to the optical waveguide structure 100, it can be coupled in and out of the light source to realize the transmission of light from the optomechanical system to the human eye, thereby enabling the human eye to see the virtual image.

[0064] The application of the AR near-eye display device of this application is described below.

[0065] According to the application of the AR near-eye display device proposed in this application, the AR near-eye display device in the aforementioned example is applied to naked-eye 3D light field display.

[0066] As can be seen from the above technical solutions, the AR near-eye display device proposed in this application can be used for naked-eye 3D light field display, enabling the human eye to see clear and continuous stereoscopic images from different angles and enhancing the interactive immersive experience. The following describes the fabrication method of the optical waveguide structure 100 in this application.

[0067] The fabrication method of the optical waveguide structure 100 proposed in this application, as shown in Figures 3 and 4, includes the following steps:

[0068] Step S10: Provide a rigid support layer 10. The material selection for the rigid support layer 10 is as described above and will not be repeated here.

[0069] Optionally, after providing the rigid support layer 10 in step S10, step S11 is also included to clean the rigid support layer 10.

[0070] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 and / or the second surface 12 of the rigid support layer 10, imprint and cure to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21. The low-refractive-index grating structure 21 formed at this time can be used as a mold for preparing a high-refractive-index grating structure 31.

[0071] Step S30: Coat the low refractive index layer 20 with high refractive index imprinting adhesive 32, so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21. The high refractive index imprinting adhesive 32 has a certain fluidity, and under the action of gravity, it can automatically fill into the low refractive index grating structure 21, which facilitates further molding in the subsequent process.

[0072] Step S40: Place the resin layer 40 on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and cure the high refractive index imprinting adhesive 32 to form an optical waveguide structure 100.

[0073] Specifically, in step S40, the method for fabricating the optical waveguide structure 100 can be selected from one of the following steps S41 and S42.

[0074] S41. Place the resin layer 40 on the side of the high-refractive-index imprinting adhesive 32 away from the low-refractive-index layer 20. At this time, the resin layer 40 can squeeze the high-refractive-index imprinting adhesive 32 by its own gravity, so that the low-refractive-index grating structure 21 is filled with the high-refractive-index imprinting adhesive 32, and the gap between the high-refractive-index imprinting adhesive 32 and the low-refractive-index layer 20 is smaller and better adhered, with fewer air bubbles between the high-refractive-index imprinting adhesive 32 and the low-refractive-index layer 20. After curing, the high-refractive-index imprinting adhesive 32 can form a connection between the high-refractive-index layer 30 and the low-refractive-index layer 20, can also form a connection between the low-refractive-index grating structure 21 and the high-refractive-index grating structure 31, and can also form a connection between the high-refractive-index layer 30 and the resin layer 40, finally obtaining the optical waveguide structure 100. In these examples, the high refractive index imprinting adhesive 32 is in contact with the resin layer 40 while still wet. When the high refractive index imprinting adhesive 32 is subsequently cured and becomes the high refractive index layer 30, it automatically connects with the resin layer 40 without the need to apply adhesive to the resin layer 40, thus saving adhesive usage. The overall thickness of the optical waveguide structure 100 is smaller than that of S42, and the process of applying additional adhesive to the resin layer 40 is saved, reducing the thickness by approximately 0.05 mm.

[0075] It should be noted that, as shown in Figure 4, for a monochromatic waveguide, step S41 only needs to be performed on a low refractive index layer 20 (e.g., a low refractive index layer 20 on the first surface 11 or a low refractive index layer 20 on the second surface 12), and each of the above steps only needs to be performed once.

[0076] For a colored optical waveguide, a low-refractive-index imprinting adhesive 22 is coated onto the first surface 11 of the rigid support layer 10, imprinted, and cured to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21. The low-refractive-index imprinting adhesive 22 is then coated onto the second surface 12 of the rigid support layer 10, imprinted, and cured to form another low-refractive-index layer 20 with the low-refractive-index grating structure 21. Steps S30 and S41 are repeated once each to ensure that a high-refractive-index layer 30 and a resin layer 40 are formed on both the first and second surfaces 11 and on the low-refractive-index layer 20, thereby achieving the fabrication of the colored optical waveguide.

[0077] Optionally, in another embodiment of this application, the resin layer 40 is placed on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and the high refractive index imprinting adhesive 32 is cured to form the optical waveguide structure 100. This is prepared by the following method:

[0078] Step S42: The high-refractive-index imprinting adhesive 32 is cured, forming a high-refractive-index layer 30. This high-refractive-index layer 30 is connected to the low-refractive-index layer 20, and the high-refractive-index grating structure 31 on the high-refractive-index layer 30 is also connected to the low-refractive-index grating structure 21. The resin layer 40 is then bonded to the side of the high-refractive-index layer 30 away from the low-refractive-index layer 20, resulting in the optical waveguide structure 100. In these examples, by further bonding the resin layer 40 to the high-refractive-index layer 30, a complete optical waveguide structure 100 can be formed.

[0079] It should be noted that, as shown in Figure 4, for a monochromatic waveguide, step S42 only needs to be performed on a low refractive index layer 20 (e.g., a low refractive index layer 20 on the first surface 11 or a low refractive index layer 20 on the second surface 12), and each of the above steps only needs to be performed once.

[0080] For a colored optical waveguide, a low-refractive-index imprinting adhesive 22 is coated onto the first surface 11 of the rigid support layer 10, imprinted, and cured to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21. The low-refractive-index imprinting adhesive 22 is then coated onto the second surface 12 of the rigid support layer 10, imprinted, and cured to form another low-refractive-index layer 20 with the low-refractive-index grating structure 21. Steps S30 and S42 are repeated once each, forming a high-refractive-index layer 30 and a resin layer 40 on both the low-refractive-index layers 20 on the first and second surfaces 11, thereby achieving the fabrication of the colored optical waveguide.

[0081] As can be seen from the above, the fabrication method of the optical waveguide structure 100 proposed in this application is simple. A low-refractive-index grating structure 21 formed by imprinting and curing a low-refractive-index imprinting adhesive 22 can be used to form a high-refractive-index grating structure 31. This fabrication method ensures good adhesion between the high-refractive-index grating structure 31 and the low-refractive-index grating structure 21, and simplifies the connection arrangement between the low-refractive-index layer 20 and the high-refractive-index layer 30. The fabricated optical waveguide structure 100 exhibits good rigidity, is not easily deformed, is resistant to external impact, is lightweight, and has a small thickness.

[0082] In this application, as shown in Figure 5, the fabrication method of the optical waveguide structure 100 further includes the following steps: In step S50, when the low-refractive-index imprinting adhesive 22 is only applied to the first surface 11 or the second surface 12 of the rigid support layer 10, before obtaining the optical waveguide structure 100, an anti-fouling film 50 is also coated on the side of the rigid support layer 10 away from the low-refractive-index layer 20. That is, for a monochromatic optical waveguide, an anti-fouling film 50 is coated on the exposed side of the rigid support layer 10.

[0083] As shown in Figure 6, this embodiment illustrates an example where the low-refractive-index imprinting adhesive 22 is only applied to the first surface 11 of the rigid support layer 10, and the second surface 12 is coated with an antifouling film 50. The example where the low-refractive-index imprinting adhesive 22 is only applied to the second surface 12 of the rigid support layer 10, and the first surface 11 is coated with an antifouling film 50, will not be elaborated upon here. The material and advantages of the antifouling film 50 have been described above and will not be repeated here.

[0084] For example, the coated antifouling film 50 is an AF film. For curable resin-based AF films, preparation is achieved by spraying followed by UV curing or heat curing. For self-limiting surface reaction-based AF films, preparation is achieved by spraying or vacuum evaporation.

[0085] According to another method for fabricating the optical waveguide structure 100 proposed in this application, as shown in Figures 7 and 8, the method includes the following steps:

[0086] Step S100: Provide a rigid support layer 10. The material selection for the rigid support layer 10 is as described above and will not be repeated here.

[0087] Optionally, after providing the rigid support layer 10 in step S100, the method further includes step S110, which involves cleaning the rigid support layer 10.

[0088] Step S200: Apply low refractive index imprinting adhesive 22 to the first surface 11 or the second surface 12 of the rigid support layer 10 and form a first substrate with the rigid support layer 10. At this time, the low refractive index imprinting adhesive 22 is not cured and is in a wet adhesive state.

[0089] In step S300, a resin layer 40 is provided, and a high-refractive-index imprinting adhesive 32 is coated on the resin layer 40 for imprinting and curing, forming a high-refractive-index layer 30 with a high-refractive-index grating structure 31. The resin layer 40 and the high-refractive-index layer 30 form a second substrate. At this time, the resin layer 40 provides adhesion for the high-refractive-index imprinting adhesive 32, facilitating the imprinting of the high-refractive-index imprinting adhesive 32. The high-refractive-index grating structure 31 serves as an imprinting mold for preparing the low-refractive-index grating structure 21. When the high-refractive-index layer 30 with the high-refractive-index grating structure 31 is bonded to the uncured low-refractive-index imprinting adhesive 22, a matching structure can be formed on the low-refractive-index imprinting adhesive 22.

[0090] Step S400: The second substrate and the first substrate are bonded and debubbled in a vacuum environment. Exemplarily, debubbling is performed in a debubbling machine to eliminate air bubbles that may exist during the bonding process, thereby ensuring a tight bond between the second substrate and the first substrate with no or fewer air bubbles; that is, to form a bubble-free bond between the high refractive index layer 30 and the low refractive index imprinting adhesive 22.

[0091] Step S500: The low-refractive-index imprinting adhesive 22 is cured to obtain the optical waveguide structure 100. The portion of the cured low-refractive-index imprinting adhesive 22 that mates with the high-refractive-index grating structure 31 will automatically form a low-refractive-index grating structure 21. Thus, the low-refractive-index imprinting adhesive 22 forms a low-refractive-index layer 20 with the low-refractive-index grating structure 21.

[0092] It should be noted that, as shown in Figure 7, for monochromatic waveguides, steps S200, S300, S400 and S500 only need to be performed on one side of the rigid support layer 10 (e.g., the low refractive index layer 20 on the first surface 11 or the low refractive index layer 20 on the second surface 12), and each of the above steps only needs to be performed once.

[0093] For a colored optical waveguide, steps S200, S300, S400, and S500 need to be repeated. In addition to performing steps S200, S300, S400, and S500 on one side of the aforementioned rigid support layer 10 (e.g., the first surface 11), steps S200, S300, S400, and S500 also need to be performed on the other side of the rigid support layer 10 (e.g., the second surface 12) to achieve the fabrication of the colored optical waveguide. The fabrication process of the colored optical waveguide will not be elaborated upon here.

[0094] As can be seen from the above, the fabrication method of the optical waveguide structure 100 proposed in this application is simple, produces fewer bubbles, and achieves high adhesion between the layers. A low-refractive-index grating structure 21 can be formed using a high-refractive-index grating structure 31 formed by imprinting and curing a high-refractive-index imprinting adhesive 32. This fabrication of the low-refractive-index grating structure 21 ensures high adhesion between the low-refractive-index grating structure 21 and the high-refractive-index grating structure 31, and simplifies the connection arrangement between the low-refractive-index layer 20 and the high-refractive-index layer 30. The resulting optical waveguide structure 100 exhibits good rigidity, is not easily deformed, is resistant to external impacts, is lightweight, and has a small thickness.

[0095] In this application, as shown in Figure 9, the fabrication method of the optical waveguide structure 100 further includes the following steps:

[0096] In step S600, when the low-refractive-index imprinting adhesive 22 is only applied to the first surface 11 or the second surface 12 of the rigid support layer 10, before obtaining the optical waveguide structure 100, an anti-fouling film 50 is also coated on the side of the rigid support layer 10 away from the low-refractive-index layer 20. Therefore, when the low-refractive-index imprinting adhesive 22 is only applied to the first surface 11 or the second surface 12 of the rigid support layer 10, an anti-fouling film 50 is also coated on the side of the rigid support layer 10 away from the low-refractive-index layer 20. In other words, for a monochromatic optical waveguide, an anti-fouling film 50 is coated on the exposed side of the rigid support layer 10.

[0097] As shown in Figure 10, this embodiment illustrates an example where the low-refractive-index imprinting adhesive 22 is only applied to the first surface 11 of the rigid support layer 10, and the second surface 12 is coated with an antifouling film 50. The example where the low-refractive-index imprinting adhesive 22 is only applied to the second surface 12 of the rigid support layer 10, and the first surface 11 is coated with an antifouling film 50, will not be elaborated upon here. The material and advantages of the antifouling film 50 have been described above and will not be repeated here.

[0098] For example, the coated antifouling film 50 is an AF film. For curable resin-based AF films, preparation is achieved by spraying followed by UV curing or heat curing. For self-limiting surface reaction-based AF films, preparation is achieved by spraying or vacuum evaporation.

[0099] The optical waveguide structure 100 and its fabrication method of this application are further described below with reference to specific embodiments. The following embodiments are merely exemplary descriptions of this application and should not be construed as limiting this application.

[0100] Example 1

[0101] An optical waveguide structure 100, as shown in Figure 1, includes a rigid support layer 10, a low-refractive-index layer 20, a high-refractive-index layer 30, a resin layer 40, and an anti-fouling film 50. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The low-refractive-index layer 20 is at least connected to the first surface 11, and two spaced-apart low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layer 20 away from the rigid support layer 10. The high-refractive-index layer 30 is connected to the side of the low-refractive-index layer 20 away from the rigid support layer 10, and two high-refractive-index grating structures 31 are provided on the high-refractive-index layer 30, with the two high-refractive-index grating structures 31 correspondingly attached to the two low-refractive-index grating structures 21. The resin layer 40 is disposed on the side of the high-refractive-index layer 30 away from the low-refractive-index layer 20. The anti-fouling film 50 covers the second surface 12.

[0102] A method for fabricating an optical waveguide structure 100, as shown in Figures 3 and 5, includes the following steps:

[0103] Step S10: Provide a rigid support layer 10.

[0104] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 for imprinting and curing to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21.

[0105] Step S30: Coat the low refractive index layer 20 with high refractive index imprinting adhesive 32 so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0106] Step S41: Place the resin layer 40 on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and then cure it.

[0107] Step S50: An anti-fouling film 50 is coated on the second surface 12 of the rigid support layer 10, and a monochromatic optical waveguide structure 100 is finally obtained.

[0108] Example 2

[0109] An optical waveguide structure 100, as shown in Figure 1, includes a rigid support layer 10, a low-refractive-index layer 20, a high-refractive-index layer 30, a resin layer 40, and an anti-fouling film 50. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The low-refractive-index layer 20 is at least connected to the first surface 11, and two spaced-apart low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layer 20 away from the rigid support layer 10. The high-refractive-index layer 30 is connected to the side of the low-refractive-index layer 20 away from the rigid support layer 10, and two high-refractive-index grating structures 31 are provided on the high-refractive-index layer 30, with the two high-refractive-index grating structures 31 correspondingly attached to the two low-refractive-index grating structures 21. The resin layer 40 is disposed on the side of the high-refractive-index layer 30 away from the low-refractive-index layer 20. The anti-fouling film 50 covers the second surface 12.

[0110] A method for fabricating an optical waveguide structure 100, as shown in Figures 3 and 5, includes the following steps:

[0111] Step S10: Provide a rigid support layer 10.

[0112] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 for imprinting and curing to form a low-refractive-index layer 20 with a low-refractive-index grating structure 21.

[0113] Step S30: Coat the low refractive index layer 20 with high refractive index imprinting adhesive 32 so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0114] Step S42: First, cure the high refractive index imprinting adhesive 32. After curing, the high refractive index imprinting adhesive 32 forms a high refractive index layer 30. Then, bond the resin layer 40 to the side of the high refractive index layer 30 away from the low refractive index layer 20.

[0115] Step S50: An anti-fouling film 50 is coated on the second surface 12 of the rigid support layer 10, and a monochromatic optical waveguide structure 100 is finally obtained.

[0116] Example 3

[0117] An optical waveguide structure 100, as shown in Figure 2, includes a rigid support layer 10, two low-refractive-index layers 20, two high-refractive-index layers 30, and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The two low-refractive-index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layers 20 away from the rigid support layer 10. The two high-refractive-index layers 30 are respectively connected to the side of the low-refractive-index layers 20 away from the rigid support layer 10, and each high-refractive-index layer 30 has two high-refractive-index grating structures 31, with the two high-refractive-index grating structures 31 on the same side correspondingly attached to the two low-refractive-index grating structures 21. The two resin layers 40 are respectively disposed on the side of the high-refractive-index layers 30 away from the low-refractive-index layers 20, forming a colored optical waveguide.

[0118] A method for fabricating an optical waveguide structure 100, referring to Figure 3, includes the following steps:

[0119] Step S10: Provide a rigid support layer 10.

[0120] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 for imprinting and curing, and apply low-refractive-index imprinting adhesive 22 to the second surface 12 of the rigid support layer 10 for imprinting and curing, thereby forming a low-refractive-index layer 20 with a low-refractive-index grating structure 21 connected to both sides of the rigid support layer 10.

[0121] Step S30: Coat the low refractive index layer 20 of the first surface 11 with a high refractive index imprinting adhesive 32, so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0122] Step S41: Place a resin layer 40 on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and then cure it.

[0123] Step S30: Coat the low refractive index layer 20 of the second surface 12 with high refractive index imprinting adhesive 32 so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0124] Step S41: Place another resin layer 40 on the side of the high refractive index imprinting adhesive 32 away from the low refractive index layer 20, and then cure it to finally obtain a colored optical waveguide structure 100.

[0125] Example 4

[0126] An optical waveguide structure 100, as shown in Figure 2, includes a rigid support layer 10, two low-refractive-index layers 20, two high-refractive-index layers 30, and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The two low-refractive-index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layers 20 away from the rigid support layer 10. The two high-refractive-index layers 30 are respectively connected to the side of the low-refractive-index layers 20 away from the rigid support layer 10, and each high-refractive-index layer 30 has two high-refractive-index grating structures 31, with the two high-refractive-index grating structures 31 on the same side correspondingly attached to the two low-refractive-index grating structures 21. The two resin layers 40 are respectively disposed on the side of the high-refractive-index layers 30 away from the low-refractive-index layers 20, forming a colored optical waveguide.

[0127] A method for fabricating an optical waveguide structure 100, referring to Figure 3, includes the following steps:

[0128] Step S10: Provide a rigid support layer 10.

[0129] Step S20: Apply low-refractive-index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 for imprinting and curing, and apply low-refractive-index imprinting adhesive 22 to the second surface 12 of the rigid support layer 10 for imprinting and curing, thereby forming a low-refractive-index layer 20 with a low-refractive-index grating structure 21 connected to both sides of the rigid support layer 10.

[0130] Step S30: Coat the low refractive index layer 20 of the first surface 11 with a high refractive index imprinting adhesive 32, so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0131] Step S42: Cure the high refractive index imprinting adhesive 32. After curing, the high refractive index imprinting adhesive 32 forms a high refractive index layer 30. Then, a resin layer 40 is bonded to the side of the high refractive index layer 30 away from the low refractive index layer 20.

[0132] Repeat step S30 to coat a high refractive index imprinting adhesive 32 onto the low refractive index layer 20 of the second surface 12, so that the high refractive index imprinting adhesive 32 completely fills the low refractive index grating structure 21.

[0133] Repeat step S42 to cure the high refractive index imprinting adhesive 32 on the low refractive index layer 20 of the second surface 12. After the high refractive index imprinting adhesive 32 is cured, it forms another high refractive index layer 30. Then, another resin layer 40 is bonded to the side of the high refractive index layer 30 away from the low refractive index layer 20 to form a colored optical waveguide structure 100.

[0134] Example 5

[0135] An optical waveguide structure 100, as shown in Figure 1, includes a rigid support layer 10, a low-refractive-index layer 20, a high-refractive-index layer 30, a resin layer 40, and an anti-fouling film 50. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The low-refractive-index layer 20 is at least connected to the first surface 11, and two spaced-apart low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layer 20 away from the rigid support layer 10. The high-refractive-index layer 30 is connected to the side of the low-refractive-index layer 20 away from the rigid support layer 10, and two high-refractive-index grating structures 31 are provided on the high-refractive-index layer 30, with the two high-refractive-index grating structures 31 correspondingly attached to the two low-refractive-index grating structures 21. The resin layer 40 is disposed on the side of the high-refractive-index layer 30 away from the low-refractive-index layer 20. The anti-fouling film 50 covers the second surface 12.

[0136] A method for fabricating an optical waveguide structure 100, as shown in Figures 7 and 9, includes the following steps:

[0137] Step S100: Provide a rigid support layer 10.

[0138] Step S200: Apply low refractive index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 and form a first substrate with the rigid support layer 10.

[0139] Step S300: Provide a resin layer 40, and coat the resin layer 40 with a high refractive index imprinting adhesive 32 for imprinting and curing to form a high refractive index layer 30 with a high refractive index grating structure 31. The resin layer 40 and the high refractive index layer 30 form a second substrate.

[0140] Step S400: Bond the second substrate and the first substrate together in a vacuum environment and remove bubbles.

[0141] Step S500: Curing the low refractive index imprinting adhesive 22.

[0142] Step S600: An anti-fouling film 50 is coated on the second surface 12 of the rigid support layer 10, and a monochromatic optical waveguide structure 100 is finally obtained.

[0143] Example 6

[0144] An optical waveguide structure 100, as shown in Figure 2, includes a rigid support layer 10, two low-refractive-index layers 20, two high-refractive-index layers 30, and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 facing each other. The two low-refractive-index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low-refractive-index grating structures 21 are provided on the side of the low-refractive-index layers 20 away from the rigid support layer 10. The two high-refractive-index layers 30 are respectively connected to the side of the low-refractive-index layers 20 away from the rigid support layer 10, and each high-refractive-index layer 30 has two high-refractive-index grating structures 31, with the two high-refractive-index grating structures 31 on the same side correspondingly attached to the two low-refractive-index grating structures 21. The two resin layers 40 are respectively disposed on the side of the high-refractive-index layers 30 away from the low-refractive-index layers 20, forming a colored optical waveguide.

[0145] A method for fabricating an optical waveguide structure 100, as shown in Figure 7, includes the following steps:

[0146] Step S100: Provide a rigid support layer 10.

[0147] Step S200: Apply low refractive index imprinting adhesive 22 to the first surface 11 of the rigid support layer 10 and form a first substrate with the rigid support layer 10.

[0148] Step S300: Provide a resin layer 40, and coat the resin layer 40 with a high refractive index imprinting adhesive 32 for imprinting and curing to form a high refractive index layer 30 with a high refractive index grating structure 31. The resin layer 40 and the high refractive index layer 30 form a second substrate.

[0149] Step S400: The second substrate and the first substrate are bonded together and debubbled in a vacuum environment to form a one-sided optical waveguide.

[0150] Step S500: Curing the low refractive index imprinting adhesive 22 on the first surface 11.

[0151] Repeat step S200, coat the second surface 12 of the rigid support layer 10 with low refractive index imprinting adhesive 22, and combine it with the single-sided optical waveguide formed after the previous step S400 to form a new first substrate (i.e., the third substrate).

[0152] Repeat step S300, provide another resin layer 40 (i.e., the second resin layer), and coat the resin layer 40 with a high refractive index imprinting adhesive 32 for imprinting and curing to form another high refractive index layer 30 with a high refractive index grating structure 31. The resin layer 40 and the high refractive index layer 30 form a new second substrate (i.e., the fourth substrate).

[0153] Repeat step S400 to bond and remove bubbles from the new second substrate (i.e., the fourth substrate) and the new first substrate (i.e., the third substrate) in a vacuum environment.

[0154] Repeat step S500 to cure the low-refractive-index imprint adhesive 22 on the second surface 12, and finally obtain the colored optical waveguide structure 100.

[0155] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this application, and these modifications or substitutions should all be covered within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. An optical waveguide structure, wherein, include: A rigid support layer having opposing first and second surfaces; A low-refractive-index layer is at least connected to the first surface, and at least one low-refractive-index grating structure is provided on the side of the low-refractive-index layer away from the rigid support layer. A high refractive index layer is connected to the side of the low refractive index layer away from the rigid support layer. At least one high refractive index grating structure is provided on the high refractive index layer, and the high refractive index grating structure is correspondingly attached to the low refractive index grating structure. A resin layer is disposed on the side of the high refractive index layer away from the low refractive index layer.

2. The optical waveguide structure as described in claim 1, wherein, The rigid support layer includes at least one of a tempered glass layer, a sapphire glass layer, a quartz layer, or a rigid light-transmitting resin layer.

3. The optical waveguide structure as described in claim 2, wherein, The rigid, light-transmitting resin layer includes at least one of the following: a polycarbonate layer, a polymethyl methacrylate layer, a polystyrene layer, an acrylonitrile-styrene copolymer layer, a polyethylene terephthalate layer, a transparent ABS resin layer, or a polyamide layer.

4. The optical waveguide structure as described in claim 1, wherein, The low-refractive-index layer, the high-refractive-index layer, and the resin layer each comprise two layers, with the two low-refractive-index layers respectively connected to the first surface and the second surface; a high-refractive-index layer is connected to the side of each low-refractive-index layer away from the rigid support layer; and a resin layer is connected to the side of each high-refractive-index layer away from the low-refractive-index layer.

5. The optical waveguide structure as described in claim 1, wherein, It also includes an antifouling film, wherein the low refractive index layer is attached to the first surface and the antifouling film covers the second surface; or, the low refractive index layer is attached to the second surface and the antifouling film covers the first surface.

6. The optical waveguide structure as described in claim 5, wherein, The anti-fouling film is an anti-fingerprint film.

7. The optical waveguide structure as described in claim 5, wherein, The resin layer and the high refractive index layer are bonded together.

8. The optical waveguide structure as described in claim 6, wherein, The resin layer and the high refractive index layer are bonded together using OCA adhesive; or... The resin layer comes into contact with the high refractive index imprinting adhesive used to prepare the high refractive index layer, and the connection between the resin layer and the high refractive index layer is achieved after the high refractive index imprinting adhesive is cured.

9. The optical waveguide structure as described in claim 1, wherein, The difference between the refractive index of the high refractive index layer and the refractive index of the low refractive index layer is 0.2 to 1.

0.

10. The optical waveguide structure as described in claim 1, wherein, The low refractive index layer has a refractive index of 1.0 to 1.4; and / or, the high refractive index layer has a refractive index of 1.6 to 2.0; and / or, the resin layer has a refractive index of 1.6 to 2.

0.

11. The optical waveguide structure as described in claim 1, wherein, The thickness of the low refractive index layer ranges from 0.1 μm to 5 μm; and / or, the thickness of the high refractive index layer ranges from 0.1 μm to 10 μm; and / or, the thickness of the resin layer ranges from 0.1 mm to 1.0 mm; and / or, the thickness of the rigid support layer ranges from 0.2 mm to 1 mm.

12. A method for fabricating an optical waveguide structure, wherein, Includes the following steps: Provide a rigid support layer; A low-refractive-index imprinting adhesive is coated on the first and / or second surfaces of the rigid support layer and then imprinted and cured to form a low-refractive-index layer with a low-refractive-index grating structure. A high-refractive-index imprinting adhesive is coated onto the low-refractive-index layer, so that the high-refractive-index imprinting adhesive completely fills the low-refractive-index grating structure; The resin layer is placed on the side of the high refractive index imprinting adhesive away from the low refractive index layer and cured to obtain the optical waveguide structure; or, the high refractive index imprinting adhesive is cured first, and then the resin layer is bonded to the side of the high refractive index layer away from the low refractive index layer to obtain the optical waveguide structure.

13. A method for fabricating an optical waveguide structure, wherein, Includes the following steps: Provide a rigid support layer; A low-refractive-index imprinting adhesive is coated on the first surface of the rigid support layer and forms a first substrate with the rigid support layer; A resin layer is provided, and a high refractive index imprinting adhesive is coated on the resin layer for imprinting and curing to form a high refractive index layer with a high refractive index grating structure. The resin layer and the high refractive index layer form a second substrate. The second substrate and the first substrate are bonded together and debubbled in a vacuum environment; The low-refractive-index imprinting adhesive is cured to obtain the optical waveguide structure.

14. The method for fabricating the optical waveguide structure as described in claim 12 or 13, wherein, After providing a rigid support layer, the rigid support layer is then cleaned.

15. The method for fabricating the optical waveguide structure as described in claim 12 or 13, wherein, When the low-refractive-index imprinting adhesive is only applied to the first or second surface of the rigid support layer, an anti-fouling film is also coated on the side of the rigid support layer away from the low-refractive-index layer before the optical waveguide structure is obtained.

16. The method for fabricating the optical waveguide structure as described in claim 15, wherein, The antifouling film is a curable resin film, which is prepared by spraying a curable resin onto the side of the rigid support layer away from the low refractive index layer and then curing it with ultraviolet light or heat.

17. The method for fabricating the optical waveguide structure as described in claim 15, wherein, The antifouling film is prepared on the side of the rigid support layer away from the low refractive index layer by vacuum evaporation.

18. The method for fabricating the optical waveguide structure as described in claim 13, wherein, The process of curing the low-refractive-index imprinting adhesive to obtain the optical waveguide structure includes the following steps: The low-refractive-index imprinting adhesive on the first surface is cured; A low-refractive-index imprinting adhesive is coated onto the second surface of the rigid support layer to form a third substrate; A second resin layer is provided, and a high refractive index imprinting adhesive is coated on the second resin layer for imprinting and curing to form a high refractive index layer with a high refractive index grating structure. The second resin layer and the high refractive index layer form a fourth substrate. The fourth substrate and the third substrate are bonded and debubbled in a vacuum environment; The low-refractive-index imprinting adhesive on the second surface is cured; The optical waveguide structure is obtained.

19. An AR near-eye display device, wherein, include: An optical engine and an optical waveguide structure as described in any one of claims 1 to 11, wherein the optical engine emits signal light into the optical waveguide structure, the optical waveguide structure couples the signal light into the signal light, and couples the signal light out to the human eye.

20. An application of an AR near-eye display device, wherein, The AR near-eye display device of claim 19 is applied to naked-eye 3D light field display.

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