Detergent Solvents TRIZ Cases
- Anhydrous Dry-Cleaning Composition to Prevent Dirt Redeposition
An anhydrous solvent blend cleans hydrophobic and hydrophilic dirt while preventing redeposition on textiles without PERC hazards.
- Dual-Solvent Cleaning Solution for Metal Film Edge Residue
A dual-boiling-point solvent with organic acid removes metal film edge residue, suppresses humps, and keeps waste liquid stable.
- Filling Film Material for Void-Free High-Aspect-Ratio Pattern Support
A polymer filling film with a residual-solvent removal promoter prevents semiconductor pattern collapse while avoiding voids in high-aspect-ratio features.
- Semiconductor Surface Silylation for Fine Pattern Collapse Control
Using one substrate for contact-angle evaluation and patterned-region treatment helps stabilize fine pattern collapse without dummy wafers.
- Semiconductor Thinner Composition for Cleaner EBR and RRC Processing
A tailored solvent blend improves photoresist and underlayer removal in EBR and RRC, boosting uniformity, yield, and cost efficiency.
- Polyglycerol Liquid Composition to Reduce Perfume-Capsule Leakage
Polyglycerol and alkoxylated polyols form a non-aqueous medium that limits perfume leakage in water-soluble laundry unit doses.
- Core-and-Shell Laundry Composition for Localized Stain Treatment
Localized gel-shell treatment combines surfactants, solvents, enzymes, and bleach in one composition for stains, malodour, and garment hygiene.
- Non-Aqueous Liquid Composition for Perfume Capsule Leakage Control
Non-aqueous solvents reduce perfume capsule leakage and help preserve ingredient stability in water-soluble unit-dose laundry articles.
- pH-Controlled Alkyl Sulfate Compositions for Low-Temperature Stability
This case uses pH adjustment to prevent clouding and precipitation in concentrated alkyl sulfate compositions at low temperatures.