Non-Surface-Active Detergent Compositions TRIZ Cases
- Hydrofluoric Acid Removal Composition for Low-k Dielectric Recycling
A hydrofluoric acid-based removal composition selectively etches low-k dielectric layers from semiconductor wafers.
- Amidoxime Cleaning Compositions for Semiconductor Residue Removal
Amidoxime-based cleaning solutions remove plasma etch residue from low-k dielectrics and copper without substrate damage.
- Gun Oil Composition for Carbon Fouling Prevention
A multi-component gun oil formulation combines high viscosity base oils with detergent additives to enhance lubricity under extreme heat and pressure.
- Thinner Composition for EUV Photoresist Coating Uniformity
A thinner composition comprising alkylene glycol ether acetate, alkylene glycol ether, and cycloketone improves resist coating uniformity.
- Inkjet Cleaning Liquid Hansen Solubility Parameter
A cleaning liquid with a specific Hansen solubility parameter disperses polyurethane resin particles, restoring discharging stability on non-permeable media.
- Urea-Modified Cleaning Agent for RO Membrane Amide Protection
Urea derivatives protect aromatic polyamide membranes from alkaline degradation by adsorbing onto amide bonds, preserving rejection rates.
- Amphiphilic Material Monolayer for Semiconductor Pattern Drying
An amphiphilic material forms a monomolecular film on the washing liquid to reduce surface tension and prevent pattern inclination during semiconductor drying.
- Ethyl nona-3,8-dienoate for complex fruity fragrance diversity
Ethyl nona-3,8-dienoate provides fresh citrusy notes while reducing malodor perception in personal care products.
- Silicon Surface Cleaning Solution for Semiconductor Fabrication
A chemical cleaning solution removes damaged silicon layers while protecting underlying tungsten gate electrodes.
- Covalent Modifier Attachment on Aminoplast Microcapsule Shells
Epoxy coupling molecules attach modifiers to aminoplast microcapsule shells through covalent bonding, preventing wash-off during laundry rinsing.
- Solvent Blend for Electronics Cleaning
A solvent blend removes photoresists from electronic substrates using DMSO and amide components.
- Continuous Sodium Hypochlorite Bleach Production with Salt Removal
A continuous crystallizer tank and two-stage centrifuge separate salt crystals from sodium hypochlorite solution.
- Poly Alpha-1,3-Glucan Esters for Laundry Detergent Stain Removal
A poly alpha-1,3-glucan ester compound enhances stain removal in laundry detergent compositions.
- Ruthenium Recovery from Deposition Equipment via Grit Blasting
Grit blasting removes ruthenium buildup from deposition equipment, preventing substrate damage and enabling precious metal recovery.
- Water-Free EBR Composition for Metal-Containing Resist Edge Bead Removal
A water-free organic solvent composition removes edge beads from metal-containing resists using amino acid and sulfur-based additives.
- Ionic Liquid Film for Substrate Pattern Collapse Prevention
Fluorinated ionic liquid films reduce surface tension to prevent adjacent pattern collapse and eliminate static discharge risks.