Galvanometer scanning laser precision etching method and device based on machine vision measurement feedback
By using machine vision measurement feedback, the position of the laser spot is detected in real time and interpolation calculation is performed, which solves the problem of unstable control of laser etching depth by galvanometer scanning and realizes stable and precise control of laser etching depth.
Patent Information
- Application Number
- CN202511984976.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-26
- Publication Date
- 2026-03-31
AI Technical Summary
Existing galvanometer scanning laser precision etching technology has difficulty maintaining stable control over processing depth. It is greatly affected by the environment, laser parameters, and material surface condition, especially when forming deep structures through multiple scans, the effect is unstable.
The method of machine vision measurement feedback is adopted. The position of the laser spot is measured in real time by an industrial microscope camera. Combined with interpolation calculation, the laser etching depth is detected and controlled in real time. Closed-loop control is performed using a coaxial indicator light and control software.
It enables real-time detection and control of laser etching depth under complex process conditions, reducing measurement errors and ensuring the stability and accuracy of etching depth.