A method for realizing full-color patterning based on PDMS stamp quantum dot size screening

By using nanoscale pixel arrays and quantum dot size screening with PDMS stamps, the problems of high resolution and interlayer alignment deviation in full-color QLED devices were solved, achieving high-brightness full-color patterning, simplifying the fabrication process and reducing costs.

CN122421646APending Publication Date: 2026-07-17FUZHOU UNIV
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Patent Information

Application Number
CN202610507072.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-04-16
Publication Date
2026-07-17

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Abstract

本发明涉及一种基于PDMS印章的量子点尺寸筛选实现全彩图案化的方法，包括：制备具有像素点阵列形状的PDMS印章，其每个结构单元包括三个不同尺寸的柱形结构；在基板上旋涂绝缘层材料薄膜；用PDMS印章压印得到具有像素点阵列坑状结构的绝缘层材料薄膜；按量子点尺寸从大到小依次旋涂红、绿、蓝量子点，利用尺寸筛选自组装形成全彩量子点像素阵列；将全彩量子点像素阵列转印至底发射量子点光学器件的空穴传输层上，作为其发光层。本发明通过PDMS印章实现纳米级像素图案化，无需复杂对准工艺，解决了传统多层压印对位不准的问题，具有工艺简单、分辨率高、成本低、可重复利用等优点，适用于高亮度、高PPI的全彩量子点显示器件。
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