Carrying table support
By designing the stage bracket, the free movement of the stage components is achieved by using the adjustment components and the movable mechanism, the existing ellipsoidal instruments are solved to solve the problem that it is difficult for the detection of different wafer products, and the detection effect is achieved with high precision and damage-free.
Patent Information
- Application Number
- CN202421197769.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-29
- Publication Date
- 2025-06-24
- Estimated Expiration
- 2034-05-29
AI Technical Summary
Existing ellipsometers can only perform fixed-point inspection, which is difficult to adapt to wafer products of different sizes, shapes and thicknesses for film thickness detection. The adjustment process is cumbersome and easy to damage the wafer.
A stage bracket is designed, including a bracket body, a movable mechanism, an adjustment mechanism and a detection assembly. Through the cooperation of the first adjustment component and the second adjustment component, the first platform and the second platform move freely within the corresponding direction range, driving the stage assembly to move freely within the plane range, realizing position movement and detection of the wafer to be tested.
Accurate detection of wafers of different sizes and shapes, with high movement accuracy and no damage to wafer products.