A device for stripping injection of a heavy ion synchrotron

Abstract

The application discloses a device for stripping injection of a heavy ion synchrotron, which comprises a stripping membrane storage chamber, a stripping injection chamber and a stripping membrane conveying mechanism; the stripping membrane storage chamber comprises a vacuum storage cavity, a membrane rack turntable, membrane racks and a first driving mechanism, the membrane rack turntable is arranged in the vacuum storage cavity; a plurality of membrane racks are circumferentially distributed on the membrane rack turntable; the first driving mechanism is configured to drive the membrane rack turntable to shift between an initial position and a membrane replacement position in the vacuum storage cavity; the stripping injection chamber is connected with the vacuum storage cavity and is internally provided with a specified stripping injection point; the stripping membrane conveying mechanism comprises a membrane rack grabbing assembly, a transmission rod, a vacuum bellows assembly and a second driving mechanism; the vacuum bellows assembly is connected with the vacuum storage cavity at a distal end, the transmission rod is arranged in the vacuum bellows assembly, the membrane rack grabbing assembly is arranged at a distal end of the transmission rod, and the proximal ends of the transmission rod and the vacuum bellows assembly are jointly connected with the second driving mechanism.

Description

Technical Field

[0001] This invention relates to an apparatus for stripping and implantation in a heavy ion synchrotron, belonging to the field of accelerator technology. Background Technology

[0002] Currently, synchrotron injection methods mainly include multi-turn injection, multiple multi-turn injection with cooling assistance, and stripping injection. Multi-turn injection is limited by Liouville's theorem, resulting in an injection gain of only about 15 times. Multiple multi-turn injection can achieve higher beam gains, but requires phase-space cooling devices, such as electron cooling or random cooling, which are technically challenging and expensive, making them unsuitable for medical heavy ion facilities. Stripping injection, on the other hand, involves striking a stripping membrane with the beam, causing the loss of electrons and altering the beam's trajectory. Stripping injection can easily achieve injection gains of 40 to 50 times or more, making it suitable for use in medical heavy ion accelerators.

[0003] In the synchrotron, the non-fully stripped heavy ion beam supplied by the injection line is deflected by the diode to the carbon film stripping location during injection. The stripped heavy ion beam is then injected into and fills the synchrotron, where it undergoes cyclotron motion. The injection-stripping point is located in a flat vacuum chamber inside the diode, and the distance between the initial position of the carbon film stripped outside the diode and the injection-stripping point is as large as 1200 mm. To minimize the impact on the magnet's performance, the opening on the magnet's side is required to be as small as possible, with a maximum diameter of 56 mm. After deducting the wall thickness of the pipe passing through the magnet's side opening, the effective internal aperture is only 50 mm, requiring an effective carbon film area of ​​at least 40 mm². Therefore, the effective vertical clearance of the entire film frame inside the pipe is only about 2-3 mm.

[0004] Given the extremely limited space at the stripping and injection point and the ultra-high vacuum of the accelerator, existing stripping and injection devices for heavy ion synchrotrons require accelerator shutdown, vacuum breaking, and re-vacuuming every time the carbon film is replaced. Furthermore, transporting the stripped carbon film from its initial position to the injection stripping point requires a span of 1200 mm, and the effective gap between the film holders is only 2-3 mm. Deformation of the target rod and unstable movement can cause the target head to touch the pipe wall and damage the carbon film, which seriously affects the accelerator's operating efficiency and greatly increases the accelerator's operating costs. Summary of the Invention

[0005] To address the aforementioned problems, one objective of this invention is to provide a device for stripping and implanting carbon films in a heavy ion synchrotron. This device can deliver the stripping film through the narrow space inside the secondary iron layer to the beam stripping and implantation point. It can install and load multiple carbon films at once and remotely and automatically replace the carbon films without disrupting the vacuum environment, thereby greatly improving work efficiency, reducing accelerator operating costs, and increasing accelerator operating efficiency.

[0006] To achieve the above objectives, the present invention adopts the following technical solution: an apparatus for stripping and implantation in a heavy ion synchrotron, comprising a stripping membrane storage chamber, a stripping and implantation chamber, and a stripping membrane conveying mechanism;

[0007] The release film storage chamber includes a vacuum storage chamber, a film holder turntable, film holders, and a first drive mechanism. The film holder turntable is disposed in the vacuum storage chamber. A plurality of film holders are evenly distributed circumferentially and movably disposed on the film holder turntable, and a release film is attached to each film holder. The first drive mechanism is connected to the film holder turntable and is configured to drive the film holder turntable to move between an initial position and a film replacement position in the vacuum storage chamber.

[0008] The stripping injection chamber is connected to the vacuum storage chamber, and a stripping injection point is designated inside the stripping injection chamber;

[0009] The peeling film conveying mechanism includes a film holder gripping assembly, a transmission rod, a vacuum bellows assembly, and a second drive mechanism. The distal end of the vacuum bellows assembly is sealed to the vacuum storage chamber. The transmission rod passes through the vacuum bellows assembly. The transmission rod, the peeling injection point, and the film replacement position are located on the same straight line. The film holder gripping assembly is installed at the distal end of the transmission rod. The proximal ends of the transmission rod and the vacuum bellows assembly are connected to the second drive mechanism. The second drive mechanism is configured to drive the vacuum bellows assembly to perform linear telescopic movement, so as to drive the transmission rod together with the film holder gripping assembly to grip the film holder with the required peeling film at the film replacement position in the vacuum storage chamber, and convey the film holder with the required peeling film to the peeling injection point.

[0010] The apparatus for stripping and implantation in a heavy ion synchrotron is preferably provided in which the membrane holder turntable includes an annular disk and a plurality of U-shaped slots evenly distributed circumferentially on the annular disk, and the membrane holder is axially movable relative to the annular disk and can slide out or be inserted into the U-shaped slots.

[0011] The apparatus for stripping and implantation in a heavy ion synchrotron is preferably provided in that the membrane frame includes a base and a membrane frame, the front end of the base is movably fitted onto the membrane frame turntable, and the rear end of the base is movably fitted onto the membrane frame gripping assembly; the membrane frame is detachably connected to the base, and the membrane frame is a U-shaped frame with a single-sided opening facing away from the base, and the stripping membrane is adhered to the membrane frame;

[0012] The device for stripping and implantation in a heavy ion synchrotron is preferably provided in that a wedge-shaped groove is formed on one side of the front end of the fixing base, the membrane holder is inserted into a U-shaped slot on the membrane holder turntable, and the inner sidewall of the U-shaped slot is located in the wedge-shaped groove.

[0013] The apparatus for stripping and implantation in a heavy ion synchrotron is preferably provided in that the membrane holder gripping assembly includes a connecting block with a groove at the front and a clamping member disposed inside the groove, the clamping member being configured to clamp the membrane holder when the rear end of the membrane holder is inserted into the groove.

[0014] The apparatus for stripping and implanting heavy ion synchrotrons is preferably provided in that the groove includes a first groove formed at the center of the front end of the connecting block, and two second U-shaped grooves symmetrically formed on both sides of the front end of the connecting block, the second U-shaped grooves communicating with the first groove; the clamping member includes two spring pieces respectively disposed in the two second U-shaped grooves, each spring piece including a clamping end and a connecting end, the connecting end being fixed in the second U-shaped groove, and a portion of the clamping end extending into the first groove.

[0015] The device for stripping and implanting heavy ion synchrotrons is preferably provided with rolling bearings evenly distributed around the front end of the transmission rod, with at least four sets.

[0016] An I-beam support assembly is provided between the vacuum bellows assembly and the vacuum storage chamber. The I-beam support assembly includes an intermediate tube and two flanges connected to both ends of the intermediate tube. The diameter of the center circle of the flange is larger than the inner diameter of the intermediate tube. Four sets of rolling bearings are arranged at intervals in the flange and around the circumference of the intermediate tube. The rolling bearings are radially adjustable and installed in the center circle of the flange.

[0017] The apparatus for stripping and injecting heavy ion synchrotrons is preferably provided in which the vacuum storage chamber is connected to the stripping and injection chamber where the stripping and injection point is located, and a gate valve is provided at the connection point.

[0018] Vacuum ion pumps are installed on the side of the vacuum storage chamber and at the tail of the vacuum bellows assembly; an extraction port is provided on the vacuum storage chamber, and a fine-tuning valve is installed at the extraction port to connect the molecular pump and the mechanical pump.

[0019] The apparatus for stripping and implantation in a heavy ion synchrotron is preferably provided in that the second driving mechanism includes a drive motor, a transmission assembly, and a base; the transmission assembly includes a lead screw assembly and a guide rail slider assembly, the guide rail is disposed on the base, the slider is slidably connected to the guide rail, and the lead screw is threadedly engaged with the slider; the drive motor is disposed on the base and connected to the lead screw; the proximal end of the transmission rod and the vacuum bellows assembly is connected to the slider;

[0020] The second driving mechanism further includes a front limiting component, a rear limiting component, and a displacement detection component. The front limiting component and the rear limiting component are spaced apart on the base along the length direction of the guide rail and are configured to limit the movement of the slider along the guide rail. The displacement detection component is connected to the slider and is configured to detect the displacement of the slider.

[0021] The apparatus for stripping and implanting heavy ion synchrotrons preferably further includes a support, which comprises an upper support, a lower support, and a support adjustment mechanism; the support adjustment mechanism is connected between the upper support and the lower support and is configured to drive the upper support to move relative to the lower support in a three-dimensional coordinate system.

[0022] The apparatus for stripping and implantation in a heavy ion synchrotron also includes a control system, which, together with the first drive mechanism and the second drive mechanism, is configured to control the operation of the entire apparatus.

[0023] The release film is a carbon film with an effective area greater than 40mm x 40mm and a thickness of 10ug / cm. 2 -150ug / cm 2 ;

[0024] The vacuum storage chamber has a circular structure, and a vacuum observation window and camera assembly are provided on the side wall of the vacuum storage chamber. A detachable observation window is provided on the top.

[0025] The present invention adopts the above technical solution and has the following advantages: The device for stripping and implantation in heavy ion synchrotrons provided by the present invention.

[0026] 1. The device has a stripping membrane storage chamber, inside which is a membrane holder turntable with multiple slots. Multiple carbon membranes can be installed in one operation. Through the upward and rotational movement of the membrane holder turntable and the forward and backward movement of the second drive mechanism, the membrane holder gripper can grab and replace the required carbon membrane. This allows for remote automatic replacement of carbon membranes without disrupting the vacuum environment and delivery of the carbon membranes to the stripping injection point, greatly improving work efficiency, reducing the operating cost of the accelerator, and increasing the accelerator's operating efficiency.

[0027] 2. The side wall of the vacuum storage chamber of the device is equipped with a vacuum observation window, a reflector and a camera assembly. The camera can remotely observe the state of the carbon film inside the vacuum chamber through the reflector, without the need for on-site inspection by personnel.

[0028] 3. This device uses a gate valve to isolate the vacuum of the synchrotron main ring from the vacuum of the stripping membrane storage chamber and the linear stripping membrane conveying mechanism. This eliminates the need to break the vacuum in the main ring when loading the stripping membrane into the storage chamber; only the vacuum in the storage chamber and the linear stripping membrane conveying mechanism needs to be broken separately. Furthermore, the storage chamber uses a fine-tuning valve to connect the molecular pump and the mechanical pump. This valve effectively reduces the impact of the gas flow on the carbon membrane during evacuation and venting, ensuring the integrity of the carbon membrane.

[0029] 4. The front end of the vacuum bellows assembly of the device is equipped with an I-beam support assembly for supporting the transmission rod. At the same time, rolling bearing assemblies are set around the front end of the transmission rod. When the transmission rod drives the carbon film into the thin pipe of the diode vacuum chamber, it can effectively support and limit the transmission rod, preventing the carbon film frame from touching the pipe wall and causing damage to the carbon film due to deformation or vibration of the transmission rod. It can smoothly and safely deliver the carbon film to the designated stripping injection point inside the narrow vacuum.

[0030] In summary, the device for stripping and implanting heavy ion synchrotrons provided by this invention can achieve long-distance transport of carbon films in confined spaces, and has the advantages of high positional accuracy and high loading capacity. It can remotely replace different carbon films without disrupting the vacuum environment. It features simple structure, convenient use, high reliability, high working efficiency, and low cost, and can provide reliable services for stripping and implanting synchrotrons. Attached Figure Description

[0031] Figure 1 This is a general schematic diagram of an apparatus for stripping and implanting heavy ion synchrotrons according to an embodiment of this disclosure;

[0032] Figure 2 This is a front view of a beam stripping and injection apparatus provided in an embodiment of this disclosure;

[0033] Figure 3 This is a schematic diagram of the installation of a beam stripping and injection device in an accelerator synchrotron ring according to an embodiment of this disclosure;

[0034] Figure 4 This is a schematic diagram of the structure of a peeling film storage chamber provided in an embodiment of this disclosure;

[0035] Figure 5 This is a top sectional view of a peeling film storage chamber provided in an embodiment of this disclosure;

[0036] Figure 6 This is a schematic diagram of a membrane frame turntable equipped with a plurality of membrane frames according to an embodiment of the present disclosure;

[0037] Figure 7 This is a schematic diagram of the structure of a membrane frame provided in an embodiment of this disclosure;

[0038] Figure 8 This is a schematic diagram of the structure of a membrane holder gripping assembly provided in one embodiment of the present disclosure;

[0039] Figure 9 This is a cross-sectional view of a membrane holder gripping assembly provided in an embodiment of this disclosure;

[0040] Figure 10 This is a schematic diagram of the clamping member in a membrane holder gripping assembly provided in an embodiment of the present disclosure;

[0041] Figure 11 This is a schematic diagram of a vacuum bellows assembly and a transmission rod provided in an embodiment of this disclosure;

[0042] Figure 12 This is a partial schematic diagram of a transmission rod provided in an embodiment of the present disclosure;

[0043] Figure 13 This is a schematic diagram of an H-beam support assembly provided in an embodiment of this disclosure;

[0044] Figure 14 This is a schematic diagram of a second drive mechanism provided in an embodiment of this disclosure. Detailed Implementation

[0045] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without creative effort are within the scope of protection of this invention.

[0046] In the description of this invention, it should be noted that the terms "upper," "lower," "front," "rear," "inner," "outer," "horizontal," and "vertical," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the system or component referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this invention. Furthermore, the use of terms such as "first" and "second" to define components is merely for the convenience of distinguishing the aforementioned components; unless otherwise stated, these terms have no special meaning and should not be construed as indicating or implying relative importance.

[0047] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "setting," and "connection" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0048] like Figures 1-3 As shown, this disclosure provides an apparatus for stripping and implanting in a heavy ion synchrotron, including a stripping membrane storage chamber 1, a stripping and implantation chamber 2, and a stripping membrane conveying mechanism 3.

[0049] like Figures 4-6 As shown, the stripping membrane storage chamber 1 includes a vacuum storage chamber 11, a membrane holder turntable 12, a membrane holder 13, and a first drive mechanism 14. The membrane holder turntable 12 is disposed inside the vacuum storage chamber 11. A plurality of membrane holders 13 are evenly distributed circumferentially and movably disposed on the membrane holder turntable 12, and a stripping membrane is attached to each membrane holder 13. The first drive mechanism 14 is connected to the membrane holder turntable 12 and is configured to drive the membrane holder turntable 12 to move between the initial position and the membrane replacement position inside the vacuum storage chamber 11.

[0050] The stripping injection chamber 2 is connected to the vacuum storage chamber 11, and the stripping injection point is designated inside the stripping injection chamber 2;

[0051] like Figures 7-9 As shown, the peeling film conveying mechanism 3 includes a film holder gripping assembly 31, a transmission rod 32, a vacuum bellows assembly 33, and a second drive mechanism 34. The distal end of the vacuum bellows assembly 33 is sealed and connected to the vacuum storage chamber 11. The transmission rod 32 passes through the vacuum bellows assembly 33, and the transmission rod 32, the peeling injection point, and the film replacement position are located on the same straight line. The film holder gripping assembly 31 is installed at the distal end of the transmission rod 32, and the proximal ends of the transmission rod 32 and the vacuum bellows assembly 33 are connected to the second drive mechanism 34. The second drive mechanism 34 is configured to drive the vacuum bellows assembly 33 to move linearly and telescopically, so as to drive the transmission rod 32 together with the film holder gripping assembly 31 to grip the film holder 13 with the required peeling film adhering at the film replacement position in the vacuum storage chamber 11, and to convey the film holder 13 with the required peeling film adhering to the designated peeling injection point inside the peeling injection chamber 2.

[0052] In some embodiments, such as Figure 4 , 5As shown, the vacuum storage chamber 11 adopts a circular structure. A vacuum observation window 111 and a camera assembly 112 are provided on the side wall of the vacuum storage chamber 11. A large-area detachable observation window 113 is provided on the top to facilitate the installation of the stripping membrane and the entry of external light, and to facilitate remote observation of the state of the stripping membrane inside the vacuum storage chamber 11 by the side camera assembly.

[0053] In the above embodiments, preferably, as shown below, Figure 5 , 6 As shown, the membrane holder turntable 12 includes an annular disk 121 and a plurality of U-shaped slots 122 evenly distributed circumferentially on the annular disk 121. The membrane holder 13 can slide out or be inserted into the U-shaped slots 122 relative to the annular disk 121 in an axial motion. During operation, the membrane holder turntable 12, together with the plurality of membrane holders 13 mounted thereon, moves from the initial position to the membrane replacement position under the drive of the first drive mechanism 14. The second drive mechanism 34 drives the transmission rod 32, together with the membrane holder gripping assembly 31 mounted at its distal end, to move to the membrane replacement position in the vacuum storage chamber 11. The membrane holder gripping assembly 31 grips the membrane holder 13. The first drive mechanism 14 drives the membrane holder turntable 12, together with the remaining membrane holders 13 thereon, to return to the initial position. The second drive mechanism 34 then continues to drive the transmission rod 32, the membrane holder gripping assembly 31, and the membrane holder 13 to the designated stripping injection point in the stripping injection chamber 2.

[0054] In the above embodiments, preferably, the opening of the U-shaped slot 122 is chamfered and the lower part is tightened accordingly to ensure that the film holder 13 can be smoothly inserted.

[0055] In the above embodiments, preferably, as shown below, Figure 6 , Figure 7 As shown, the membrane frame 13 includes a fixed base 131 and a membrane frame 132. The front end of the fixed base 131 is movably fitted onto the membrane frame turntable 12, and the rear end of the fixed base 131 is movably fitted onto the membrane frame gripping assembly 31. The membrane frame 132 is detachably connected to the fixed base 131. The membrane frame 132 is a U-shaped frame with a single-sided opening, the opening facing away from the fixed base 131. The release membrane is adhered to the membrane frame 132. When the membrane frame 132 with the release membrane adhered is conveyed to the designated release injection point in the release injection chamber 2, the opening faces the direction of the cyclone track, which can effectively avoid the influence of the metal frame on the cyclone beam. Specifically, a wedge-shaped groove 133 is provided on one side of the front end of the fixing seat 131, and the membrane frame 13 is inserted into the U-shaped slot 122 on the membrane frame turntable 12. The inner sidewall of the U-shaped slot 122 is located in the wedge-shaped groove 133, thereby allowing the membrane frame 13 to slide out or be inserted into the U-shaped slot 122 relative to the annular disc 121 in an axial motion.

[0056] In the above embodiments, preferably, the first driving mechanism 14 includes a rotating mechanism and a lifting mechanism. The rotating mechanism is connected to the membrane holder turntable 12 and is configured to drive the membrane holder turntable 12 to rotate in the vacuum storage chamber 11. The lifting mechanism is connected to the rotating mechanism and is configured to drive the rotating mechanism and the membrane holder turntable 12 to move up and down relative to the vacuum storage chamber 11. In operation, the lifting mechanism drives the rotating mechanism and the membrane holder turntable 12 to move, and then the rotating mechanism drives the membrane holder turntable 12 to rotate, so that the membrane holder 13 with the required peeling membrane attached to the membrane holder turntable 12 is aligned with the membrane holder gripping assembly 31, so that the membrane holder turntable 12 moves from the initial position to the membrane changing position. After the membrane holder gripping assembly moves forward 31 to grip the membrane holder 13 with the required peeling membrane attached, the lifting mechanism drives the membrane holder turntable 12 to return to the initial position, and the linear driving mechanism 34 continues to drive the transmission rod 32, the membrane holder gripping assembly 31 and the membrane holder 13 to the designated peeling injection point in the peeling injection chamber 2. The specific structures of the rotating mechanism and the lifting mechanism have been disclosed in patent 201410093585.6, and will not be repeated here.

[0057] In the above embodiments, preferably, as shown below, Figures 8-10 As shown, the membrane holder gripping assembly 31 includes a connecting block 311 with a groove 310 at the front and a clamping member 312 disposed inside the groove 310. The clamping member 312 is configured to clamp the membrane holder 13 when the rear end of the membrane holder 13 is inserted into the groove 310, thereby preventing the membrane holder 13 from shaking or falling during the conveying and membrane changing process.

[0058] In the above embodiments, preferably, as shown below, Figure 9 As shown, the groove 310 includes a first groove 3111 formed in the middle of the front end of the connecting block 311, and two second U-shaped grooves 3112 symmetrically formed on both sides of the front end of the connecting block 311. The second U-shaped grooves 3112 communicate with the first groove 3111. The clamping member 312 includes two spring pieces, which are respectively disposed in the two second U-shaped grooves 3112. Each spring piece includes a clamping end 3121 and a connecting end 3122. The connecting end 3122 is fixed in the second U-shaped groove 3112, and a portion of the clamping end 3121 extends into the first groove. Thus, when the rear end of the film frame 13 is inserted into the first groove 3111, the clamping ends 3121 of the two spring pieces are clamped on both sides of the rear end of the film frame 13, firmly fixing the film frame 13 and preventing the film frame 13 from shaking or falling during conveying and film changing.

[0059] In the above embodiments, preferably, as shown below, Figure 10 As shown, the clamping end 3121 is a V-shaped bend formed at one end of the spring piece, and the bottom tip of the V-shaped bend extends into the first groove.

[0060] In the above embodiments, preferably, the cross-section of the fixing seat 131 is wedge-shaped, and the first groove is adapted to the shape of the fixing seat 131 to facilitate the cooperation between the fixing seat 131 and the membrane holder gripping assembly 31.

[0061] In the above embodiments, preferably, as shown below, Figure 12 As shown, at least four sets of rolling bearings 35 are evenly arranged around the front end of the transmission rod 32. When the transmission rod 32 drives the membrane holder 13 with the release film adhered to it into the thin pipe of the diode vacuum chamber, the rolling bearings 35 cooperate with the inside of the pipe to provide support and limit the movement, preventing the membrane holder from contacting the pipe wall and damaging the release film due to deformation or vibration of the transmission rod 32. The rolling bearings 35 have a certain gap with the inner wall of the pipe. Under sufficiently small deformation, they do not contact each other. Under larger deformation or vibration, the rolling bearings 35 contact the inside of the pipe, playing a limiting and guiding role, effectively protecting the release film.

[0062] In the above embodiments, preferably, as shown below, Figure 13 As shown, an I-beam support assembly 36 is provided between the vacuum bellows assembly 33 and the vacuum storage chamber 11. The I-beam support assembly 36 includes an intermediate tube 361 and two flanges 362 connected to both ends of the intermediate tube 361. The diameter of the central circle of the flanges 362 is larger than the inner diameter of the intermediate tube 361. Four sets of rolling bearings are arranged at intervals in the flanges 362 and around the circumference of the intermediate tube 361. The rolling bearings are radially adjustable and installed in the central circle of the flanges 362. This allows the position of the rolling bearings to be adjusted as needed, providing effective support for the transmission rod 32 and preventing problems such as shaking or positional deviation of the transmission rod 32 when conveying the peeling film.

[0063] In the above embodiments, preferably, as shown below, Figure 11 As shown, the vacuum bellows assembly 33 includes a vacuum bellows 331 and connecting flanges 332 installed at both ends of the vacuum bellows 331.

[0064] In the above embodiments, preferably, as shown below, Figure 14 As shown, the second drive mechanism 34 includes a drive motor 341, a transmission assembly 342, and a base 343. The transmission assembly 342 includes a lead screw assembly and a guide rail slider assembly. The guide rail is mounted on the base 343, and the slider is slidably connected to the guide rail. The lead screw is threadedly engaged with the slider. The drive motor 341 is mounted on the base 343 and connected to the lead screw. The proximal ends of the transmission rod 32 and the vacuum bellows assembly 33 are connected to the slider.

[0065] In the above embodiments, preferably, the second driving mechanism 34 further includes a front limiting component, a rear limiting component, and a displacement detection component. The front limiting component and the rear limiting component are spaced apart on the base 343 along the length direction of the guide rail and are configured to limit the movement of the slider along the guide rail. The displacement detection component is connected to the slider and is configured to detect the displacement of the slider, thereby realizing real-time feedback of the position information of the membrane frame 13, and thus enabling real-time monitoring of the position information of the peeling membrane.

[0066] In the above embodiments, preferably, as shown below, Figure 1 , Figure 2 As shown, the device for stripping and implanting heavy ion synchrotrons also includes a support 4, which includes an upper support 41, a lower support 42, and a support adjustment mechanism 43. The support adjustment mechanism 43 is connected between the upper support 41 and the lower support 42 and is configured to drive the upper support 41 to move relative to the lower support 42 in a three-dimensional coordinate system, thereby realizing the position adjustment of the entire device during installation, facilitating the installation and docking of the device, and providing long-term support for the device.

[0067] In the above embodiments, preferably, the device for stripping and implanting heavy ion synchrotrons further includes a control system, which, together with the first drive mechanism 14 and the second drive mechanism 34, is configured to control the operation of the entire device, realize remote automatic replacement of the stripping membrane, and deliver the stripping membrane to the designated stripping and implantation point inside the stripping and implantation chamber 2.

[0068] In the above embodiments, preferably, as shown below, Figure 1 , Figure 5 As shown, vacuum ion pumps 15 are installed on the side of the vacuum storage chamber 11 and at the tail of the vacuum bellows assembly 33. A suction port is provided on the vacuum storage chamber 11, and a fine-tuning valve 16 is installed at the suction port to connect the molecular pump and the mechanical pump. The fine-tuning valve 16 can effectively reduce the impact of the airflow on the stripping membrane during pumping and venting, effectively ensuring the integrity of the stripping membrane. The entire device can obtain an extremely high vacuum degree, meeting the requirements of the ultra-high vacuum of the synchrotron.

[0069] In the above embodiments, preferably, as shown below, Figure 1 As shown, a gate valve 5 is installed at the connection between the vacuum storage chamber 11 and the stripping injection chamber 2. The gate valve 5 is configured to isolate the stripping injection chamber 2 and the vacuum storage chamber 11. When the device needs to be repaired or the membrane is installed, the gate valve 5 is closed, and the vacuum is broken only in the stripping membrane storage chamber 1 and the stripping membrane conveying mechanism 3. The vacuum can be restored to an extremely high level in a short time, so as not to affect the stripping injection chamber 2, that is, not to affect the operation of the synchrotron, and greatly improve the operating efficiency of the accelerator.

[0070] In the above embodiments, preferably, the release film is a carbon film with an effective area greater than 40mm x 40mm and a thickness of 10ug / cm. 2-150ug / cm 2 It can be replaced according to different physical experiment requirements.

[0071] In the above embodiments, preferably, the stripping injection chamber 2 is the beamline vacuum chamber inside the secondary iron of the synchrotron ring of the synchrotron, and a vacuum pipe communicating with the beamline vacuum chamber is opened on the side of the secondary iron. The vacuum storage chamber 11 is connected to the vacuum pipe through a vacuum tube.

[0072] The apparatus for stripping and implanting a heavy ion synchrotron provided in this embodiment includes a membrane holder turntable 12 in the stripping membrane storage chamber 1, which holds multiple membrane holders 13. These membrane holders 13 can be fitted with carbon films of different thicknesses. A first driving mechanism 14 drives the membrane holder turntable 12 to move upwards and rotate, while a second driving mechanism 34 drives the transmission rod 32, along with the membrane holder gripping assembly 31, to move linearly, enabling the gripping and replacement of the membrane holders 13 with the desired carbon films. The second driving mechanism 34 further drives the vacuum bellows assembly 33 to retract, causing the transmission rod 32 to move linearly through the vacuum pipe inside the diode, delivering the carbon film to a designated stripping and implantation point inside the stripping and implantation chamber 2. When the beam passes through the carbon film, the extranuclear electrons are stripped, and their trajectory changes under the magnetic field of the diode, thus injecting into the synchrotron ring, achieving beam stripping and implantation. This device can deliver an ultra-thin release membrane into the release injection point inside the beamline vacuum chamber through a secondary iron internal vacuum pipe. It can remotely and automatically change membranes without disrupting the vacuum environment. Multiple carbon membranes can be loaded in one installation, greatly improving work efficiency and reducing the operating cost of the accelerator.

[0073] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. An apparatus for stripping and implantation in a heavy ion synchrotron, characterized in that: Includes a stripping film storage chamber, a stripping injection chamber, and a stripping film delivery mechanism; The release film storage chamber includes a vacuum storage chamber, a film holder turntable, film holders, and a first drive mechanism. The film holder turntable is disposed in the vacuum storage chamber. A plurality of film holders are evenly distributed circumferentially and movably disposed on the film holder turntable, and a release film is attached to each film holder. The first drive mechanism is connected to the film holder turntable and is configured to drive the film holder turntable to move between an initial position and a film replacement position in the vacuum storage chamber. The stripping injection chamber is connected to the vacuum storage chamber, and a stripping injection point is designated inside the stripping injection chamber; The peeling film conveying mechanism includes a film holder gripping assembly, a transmission rod, a vacuum bellows assembly, and a second drive mechanism. The distal end of the vacuum bellows assembly is sealed to the vacuum storage chamber. The transmission rod passes through the vacuum bellows assembly. The transmission rod, the peeling injection point, and the film replacement position are located on the same straight line. The film holder gripping assembly is installed at the distal end of the transmission rod. The proximal ends of the transmission rod and the vacuum bellows assembly are connected to the second drive mechanism. The second drive mechanism is configured to drive the vacuum bellows assembly to perform linear telescopic movement, so as to drive the transmission rod together with the film holder gripping assembly to grip the film holder with the required peeling film at the film replacement position in the vacuum storage chamber, and convey the film holder with the required peeling film to the peeling injection point. The front end of the transmission rod is evenly provided with rolling bearings, at least four sets; an I-beam support assembly is provided between the vacuum bellows assembly and the vacuum storage chamber. The I-beam support assembly includes an intermediate tube and two flanges connected to both ends of the intermediate tube. The diameter of the center circle of the flange is larger than the inner diameter of the intermediate tube. Four sets of rolling bearings are arranged at intervals in the flange and around the circumference of the intermediate tube. The rolling bearings are radially adjustable and installed in the center circle of the flange. The vacuum storage chamber is connected to the stripping injection chamber where the stripping injection point is located, and a gate valve is installed at the connection point. Vacuum ion pumps are installed on the side of the vacuum storage chamber and at the tail of the vacuum bellows assembly; a suction port is provided on the vacuum storage chamber, and a fine-tuning valve is installed at the suction port to connect the molecular pump and the mechanical pump. The membrane frame turntable includes an annular disc and a plurality of U-shaped slots evenly distributed circumferentially on the annular disc. The membrane frame can slide out or be inserted into the U-shaped slots relative to the annular disc in an axial motion. The membrane frame includes a fixed base and a membrane frame. The front end of the fixed base can be movably fitted onto the membrane frame turntable, and the rear end of the fixed base can be movably fitted onto the membrane frame gripping component. The membrane frame is detachably connected to the fixed base. The membrane frame is a U-shaped frame with an opening on one side, with the opening facing away from the fixed base. The release film is adhered to the membrane frame.

2. The apparatus for stripping and implantation in a heavy ion synchrotron as described in claim 1, characterized in that: A wedge-shaped groove is provided on one side of the front end of the fixing seat, and the membrane frame is inserted into the U-shaped slot on the membrane frame turntable, with the inner sidewall of the U-shaped slot located inside the wedge-shaped groove.

3. The apparatus for stripping and implantation in a heavy ion synchrotron as described in claim 1, characterized in that: The membrane holder gripping assembly includes a connecting block with a groove at the front and a clamping member disposed inside the groove, the clamping member being configured to clamp the membrane holder when the rear end of the membrane holder is inserted into the groove.

4. The apparatus for stripping and implanting heavy ion synchrotrons as described in claim 3, characterized in that: The groove includes a first groove formed in the middle of the front end of the connecting block, and two second convex grooves symmetrically formed on both sides of the front end of the connecting block. The second convex grooves are connected to the first groove. The clamping member includes two spring pieces, which are respectively disposed in the two second convex grooves. Each spring piece includes a clamping end and a connecting end. The connecting end is fixed in the second convex groove, and a portion of the clamping end extends into the first groove.

5. The apparatus for stripping and implantation in a heavy ion synchrotron as described in claim 1, characterized in that: The second drive mechanism includes a drive motor, a transmission assembly, and a base; the transmission assembly includes a lead screw assembly and a guide rail slider assembly, the guide rail is disposed on the base, the slider is slidably connected to the guide rail, and the lead screw is threadedly engaged with the slider; the drive motor is disposed on the base and connected to the lead screw; the proximal end of the transmission rod and the vacuum bellows assembly is connected to the slider; The second driving mechanism further includes a front limiting component, a rear limiting component, and a displacement detection component. The front limiting component and the rear limiting component are spaced apart on the base along the length direction of the guide rail and are configured to limit the movement of the slider along the guide rail. The displacement detection component is connected to the slider and is configured to detect the displacement of the slider.

6. The apparatus for stripping and implantation in a heavy ion synchrotron as described in claim 1, characterized in that: It also includes a support frame, which comprises an upper support frame, a lower support frame, and a support adjustment mechanism; the support adjustment mechanism is connected between the upper support frame and the lower support frame and is configured to drive the upper support frame to move relative to the lower support frame in a three-dimensional coordinate system; The apparatus for stripping and implantation in a heavy ion synchrotron also includes a control system, which, together with the first drive mechanism and the second drive mechanism, is configured to control the operation of the entire apparatus. The release film adopts a carbon film, the effective area of the carbon film is greater than 40mmx40mm, and the thickness is 10ug / cm 2 -150ug / cm 2 ; The vacuum storage chamber has a circular structure, and a vacuum observation window and camera assembly are provided on the side wall of the vacuum storage chamber. A detachable observation window is provided on the top.

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