Display device

Abstract

A display device is provided, including a base layer having a non-sensing area and a sensing area configured to surround the non-sensing area; a touch sensor disposed in the sensing area of the base layer; an optical structure disposed on the base layer; and a polarizing layer disposed on the touch sensor to overlap the sensing area. The touch sensor and the optical structure include a first via positioned in the non-sensing area, and the non-sensing area includes a first area corresponding to the first via and a second area configured to surround the first area. The optical structure is disposed in the second area and includes an optical pattern including a plurality of openings.

Description

[0001] This application claims priority to and the benefit of Korean Patent Application No. 10-2020-0034002, filed on March 19, 2020, which is incorporated herein by reference for all purposes as if fully set forth herein. TECHNICAL FIELD

[0002] Exemplary embodiments / implementations of the present invention relate generally to a display device. BACKGROUND

[0003] The display device can include a display panel and a touch sensor disposed to be overlapped with the display panel. For example, the touch sensor can be attached to one surface of the display panel, or a touch sensor manufactured to be integrated with the display panel can be used. Currently, a technology of disposing a sensor module (including a camera device, etc.) in a display area is being researched in order to minimize a non-display area (such as a bezel of a display device, etc.). SUMMARY

[0004] Various embodiments of the inventive concept relate to a display device capable of reducing reflectivity of light incident to a periphery of a hole of a touch sensor.

[0005] Additional features of the inventive concept will be set forth in the description that follows, and in part will be apparent from the description, or can be learned by practice of the inventive concept.

[0006] Embodiments of the inventive concept can provide a display device. The display device can include a base layer including a non-sensing area and a sensing area configured to surround the non-sensing area, a touch sensor disposed in the sensing area of the base layer, an optical structure disposed on the base layer, and a polarization layer disposed on the touch sensor to be overlapped with the sensing area. The touch sensor and the optical structure can define a first through-hole positioned in the non-sensing area, and the non-sensing area can include a first area corresponding to the first through-hole and a second area configured to surround the first area. The optical structure can include an optical pattern disposed in the second area and including a plurality of openings.

[0007] In an embodiment, the touch sensor can include a first electrode layer disposed in the sensing area of the base layer, a first insulating layer disposed on a portion of the sensing area of the base layer and the first electrode layer, a second electrode layer disposed on the first insulating layer and including first sensing electrodes and second sensing electrodes arranged to be spaced apart from each other, and a second insulating layer disposed on the first insulating layer and the second electrode layer. Among the first sensing electrodes, first sensing electrodes adjacent to each other can be combined to each other by penetrating the first insulating layer and being connected to the first electrode layer, and the optical pattern can be disposed on the same layer as the second electrode layer.

[0008] In an embodiment, the optical structure may further include a third insulating layer disposed in the second region of the base layer. The first insulating layer and the third insulating layer may be formed as a single body, and the optical pattern may be disposed on the third insulating layer.

[0009] In an embodiment, the optical structure may further include a fourth insulating layer configured to cover the optical pattern.The second insulating layer and the fourth insulating layer may be formed as a single body, and a refractive index of the fourth insulating layer may be lower than a refractive index of the optical pattern.

[0010] In an embodiment, the second electrode layer and the optical pattern may include the same metal material.

[0011] In an embodiment, the optical structure may further include a metal layer disposed in the second region of the base layer and a third insulating layer configured to cover the metal layer. The first insulating layer and the third insulating layer may be formed as a single body, and the metal layer may be disposed on the same layer as the first electrode layer.

[0012] In an embodiment, the optical structure may further include a fourth insulating layer configured to cover the optical pattern.The second insulating layer and the fourth insulating layer may be formed as a single body.

[0013] In an embodiment, the optical structure may further include: a first metal oxide film disposed between the base layer and the metal layer; and a second metal oxide film disposed between the metal layer and the third insulating layer.

[0014] In an embodiment, the first electrode layer and the metal layer may include the same metal material.

[0015] In an embodiment, the first metal oxide film, the second metal oxide film, and the metal layer may include the same metal material.

[0016] In an embodiment, a touch sensor may include: a first electrode layer disposed in a sensing region of a base layer; a first insulating layer disposed on a portion of the sensing region of the base layer and on the first electrode layer; a second electrode layer disposed on the first insulating layer and including first and second sensing electrodes spaced apart from each other; and a second insulating layer disposed on the first insulating layer and the second electrode layer. Adjacent first sensing electrodes may be coupled to each other by penetrating the first insulating layer and connecting to the first electrode layer, and the optical pattern may be formed on the same layer as the second insulating layer.

[0017] In an embodiment, the optical structure may further include a metal layer disposed in the second region of the base layer and a cap layer configured to cover the metal layer. The metal layer may be disposed on the same layer as the first electrode layer, the cap layer may be disposed on the same layer as the second electrode layer, the optical pattern may be disposed on the cap layer, and the second insulating layer and the optical pattern may comprise the same material.

[0018] In an embodiment, the display device may further include: a window layer disposed on the polarizing layer and the touch sensor; and an adhesive layer configured to bond the polarizing layer to the window layer in the sensing area and to bond the optical structure to the window layer in the non-sensing area.

[0019] In an embodiment, the adhesive layer may cover the optical pattern, and a refractive index of the adhesive layer may be lower than a refractive index of the optical pattern.

[0020] In an embodiment, the display device may further include: a window layer disposed on the polarizing layer to overlap the sensing area; and an adhesive layer configured to bond the polarizing layer to the window layer. At least a portion of the optical pattern may be exposed to the outside.

[0021] In an embodiment, the display device may further include a substrate, a display element layer and a sensor module, the substrate including a non-display area corresponding to the non-sensing area and a display area corresponding to the sensing area, the display element layer is arranged between the first surface of the substrate and the base layer and is constructed to define a second through hole corresponding to the first through hole, and the sensor module is arranged on the second surface facing the first surface of the substrate to correspond to at least a portion of the first area.

[0022] Embodiments of the inventive concept may provide a display device. The display device may include: a base layer including a non-sensing area and a sensing area configured to surround the non-sensing area; a touch sensor disposed in the sensing area of ​​the base layer; an optical structure disposed on the base layer; and a polarization layer disposed on the touch sensor to overlap with the sensing area. The touch sensor and the optical structure may define a first through-hole positioned in the non-sensing area, and the non-sensing area may include a first area corresponding to the first through-hole and a second area configured to surround the first area. The optical structure may include: a first metal oxide film disposed in the second area of ​​the base layer; a metal layer disposed on the first metal oxide film; and a second metal oxide film disposed on the metal layer.

[0023] In an embodiment, a touch sensor may include: a first electrode layer disposed in a sensing region of a base layer; a first insulating layer disposed on a portion of the sensing region of the base layer and on the first electrode layer; a second electrode layer disposed on the first insulating layer and including a first sensing electrode and a second sensing electrode spaced apart from each other; and a second insulating layer disposed on the first insulating layer and the second electrode layer. Adjacent first sensing electrodes may be coupled to each other by penetrating the first insulating layer and connecting to the first electrode layer, and the metal layer, the first metal oxide film, and the second metal oxide film may be disposed on the same layer as the first electrode layer.

[0024] In an embodiment, the optical structure may further include a third insulating layer disposed in the second region of the base layer. The first insulating layer and the third insulating layer may be formed as a single body, and the third insulating layer may cover the second metal oxide film.

[0025] In an embodiment, the metal layer, the first metal oxide film, the second metal oxide film, and the first electrode layer may include the same metal material.

[0026] It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification. They illustrate exemplary embodiments of the invention and together with the description serve to explain the inventive concept.

[0028] Figure 1 is a perspective view illustrating a display device according to an embodiment of the inventive concept.

[0029] Figure 2 It shows Figure 1 A top view of an example of a display device.

[0030] Figure 3 It is shown that the Figure 2 A top view of a display panel in a display device.

[0031] Figure 4 It is shown that the Figure 2 A top view of a touch sensor, optical structure, and substrate layer in a display device.

[0032] Figure 5 is schematically shown along Figure 2 1 is a cross-sectional view of an example of a portion of a display device taken along line II'.

[0033] Figure 6is schematically shown along Figure 2 FIG. 1 is a cross-sectional view of another example of a portion of a display device taken along line II′.

[0034] Figure 7 It shows Figure 2 An enlarged view of an example of a second non-display area of ​​a display device.

[0035] Figure 8 It shows Figure 4 An enlarged view of an example of a touch sensor, optical structure, and enlarged area EA portion of the base layer.

[0036] Figures 9A-9E It schematically shows a view taken along line II-II'. Figure 8 FIG1 is a cross-sectional view of an example of an enlarged area EA portion.

[0037] Figure 10 It shows Figure 4 An enlarged view of another example of a touch sensor, optical structure, and enlarged area EA portion of the base layer.

[0038] Figure 11 It is schematically shown that the Figure 10 FIG1 is a cross-sectional view of an example of an enlarged area EA portion. DETAILED DESCRIPTION

[0039] In the following description, for the purpose of explanation, many specific details are set forth in order to provide a thorough understanding of the various exemplary embodiments or implementations of the invention. As used herein, "embodiment" and "implementation" are interchangeable words, which are non-limiting examples of one or more devices or methods using the inventive concepts disclosed herein. However, it is apparent that various exemplary embodiments can be put into practice without these specific details or with one or more equivalent arrangements. In other examples, well-known structures and devices are shown in block diagram form to avoid unnecessary ambiguity of various exemplary embodiments. In addition, various exemplary embodiments can be different, but do not have to be exclusive. For example, without departing from the inventive concept, the specific shape, construction and characteristics of an exemplary embodiment can be used or implemented in another exemplary embodiment.

[0040] Unless otherwise stated, the exemplary embodiments shown will be understood as providing exemplary features of varying details of some of the ways in which the inventive concept can be implemented in practice. Therefore, without departing from the inventive concept, unless otherwise stated, the features, components, modules, layers, films, panels, regions and / or aspects, etc. (hereinafter, individually or collectively referred to as "elements") of the various embodiments may be further combined, separated, interchanged and / or rearranged.

[0041] The use of cross hatching and / or shading in the accompanying drawings is generally provided to clarify the boundaries between adjacent elements. Thus, unless otherwise specified, the presence or absence of cross hatching or shading does not convey or indicate any preference or demand for the specific material, material properties, size, ratio, commonality between the elements shown and / or any other characteristics, attributes, properties, etc. of the elements. In addition, in the accompanying drawings, the size and relative size of the elements can be exaggerated for clarity and / or descriptive purposes. When the exemplary embodiments can be implemented differently, a specific process sequence can be performed differently from the described order. For example, two continuously described processes can be performed substantially simultaneously or in an order opposite to the described order. In addition, the same reference numerals represent the same elements.

[0042] When an element or layer is referred to as being "on," "connected to," or "bonded to" another element or layer, the element or layer may be directly on, directly connected to, or directly bonded to the other element or layer, or there may be intervening elements or layers. However, when an element or layer is referred to as being "directly on," "directly connected to," or "directly bonded to" another element or layer, there are no intervening elements or layers. For this purpose, the term "connected" may refer to a physical connection, an electrical connection, and / or a fluid connection with or without intervening elements. In addition, the DR1 axis, the DR2 axis, and the DR3 axis are not limited to the three axes of a rectangular coordinate system (such as the x-axis, the y-axis, and the z-axis), and may be interpreted in a broader sense. For example, the DR1 axis, the DR2 axis, and the DR3 axis may be perpendicular to each other, or may represent different directions that are not perpendicular to each other. For the purposes of this disclosure, "at least one of X, Y, and Z" and "at least one selected from the group consisting of X, Y, and Z" may be interpreted as only X, only Y, only Z, or any combination of two or more of X, Y, and Z, such as XYZ, XYY, YZ, and ZZ for example. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0043] Although the terms "first," "second," etc. may be used herein to describe various types of elements, these elements should not be limited by these terms. These terms are used to distinguish one element from another. Thus, a first element discussed below could be referred to as a second element without departing from the disclosed teachings.

[0044] Spatially relative terms can be used herein for descriptive purposes, and by way of illustration, to describe one element's relationship to another element(s) as illustrated in the figures. Spatially relative terms are intended to encompass different orientations of the device in use, operation, and / or manufacture in addition to the orientations depicted in the figures. For example, if a device in the figures is turned over, elements described as "below" or "beneath" other elements or features would then be oriented "above" the other elements or features. Thus, the exemplary term "below" can encompass both an orientation of above and below. For example, when a device is turned over, elements described as "below" other elements or features would then be oriented "above" the other elements or features. Accordingly, the spatially relative terminology used herein is in no way limiting of the situations in which the devices can be used, operated, and / or manufactured.

[0045] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used herein, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. Furthermore, to the extent that the terms "including," "includes," "containing," "contains," or "containing," "contains," or the like, are used in the detailed description and / or claims, such terms are intended to be inclusive in a manner similar to the term "comprising" as "comprising" is interpreted when employed as a transitional term in the patent clause.

[0046] Various exemplary embodiments are described herein with reference to cross-sectional and / or exploded illustrations that are schematic illustrations of idealized embodiments and / or intermediate structures. As such, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and / or tolerances, are to be expected. Thus, the exemplary embodiments disclosed herein are not to be construed as being limited to the particular shapes of regions as illustrated in the drawings. Rather, the regions illustrated in the drawings are schematic and the shapes of the regions in the drawings can not reflect the actual shapes of the regions in a device. It is expected that one of ordinary skill, notwithstanding some possible variations in the shapes of the regions, will be able to practice the subject matter of the present disclosure, based on the description as set forth herein.

[0047] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs as part of the disclosure. The terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0048] Figure 1 is a perspective view showing a display device according to an embodiment of the inventive concept, Figure 2 is a perspective view showing Figure 1 a top view of an example of the display device of

[0049] Referring to Figure 1 and Figure 2 , the display device DD can include a display area DA and a non-display area NDA.

[0050] The display area DA is defined as an area in which an image is displayed. The display device DD can include a display panel, and the display panel can include a plurality of pixels in the display area DA.

[0051] The display device DD can display an image through the display area DA (or a front display surface). The display area DA can be parallel to a surface defined by a first direction axis (i.e., an axis extending in a first direction DR1) and a second direction axis (i.e., an axis extending in a second direction DR2). A normal direction of the display surface (i.e., a thickness direction of the display device DD) can be defined as a third direction DR3.

[0052] A front surface (or an upper surface) and a rear surface (or a lower surface) of each of various components or units of the display device DD, which will be described below, can be identified based on the third direction DR3. However, the first direction DR1, the second direction DR2, and the third direction DR3 shown in the present embodiment are merely examples. The first direction DR1, the second direction DR2, and the third direction DR3 are relative concepts, and can be changed to other directions. Hereinafter, the first direction DR1, the second direction DR2, and the third direction DR3 will be denoted by the same reference numerals.

[0053] In an embodiment, the display device DD can include a planar display area DA, but is not limited thereto. For example, the display device DD can include a curved display area or a stereoscopic display area.

[0054] In addition, the display area DA not only serves as an area in which an image is displayed but also serves as an area (i.e., a sensing area SA) configured to identify a touch input by a user. To this end, the display device DD can include a touch sensor.

[0055] Here, the sensing area SA corresponds to the display area DA, and can overlap at least a portion of the display area DA.

[0056] The non-display area NDA is defined as an area in which an image is not displayed. The non-display area NDA can include a first non-display area NDA1 configured to surround the outside of the display area DA and a second non-display area NDA2 disposed in the display area DA.

[0057] In an embodiment, an area in which a touch input by a user is not recognized (i.e., a non-sensing area NSA) corresponds to the non-display area NDA, and can overlap the non-display area NDA. Also, the non-sensing area NSA can include a first non-sensing area NSA1 and a second non-sensing area NSA2. The first non-sensing area NSA1 can correspond to the first non-display area NDA1, and the second non-sensing area NSA2 can correspond to the second non-display area NDA2.

[0058] The first non-display area NDA1 can be positioned outside the display area DA. However, it is not limited thereto, and the shape of the display area DA and the shape of the first non-display area NDA1 can be designed to be opposite to each other.

[0059] In an embodiment, the display device DD can include the second non-display area NDA2 formed to be surrounded by the display area DA. That is, the second non-display area NDA2 can be positioned inside the display area DA. The second non-display area NDA2 includes the aperture AH, and is defined as an area in which an image is not displayed.

[0060] In an embodiment, the second non-display area NDA2 can include a first area HA1 corresponding to the aperture AH and a second area HA2 configured to surround the first area HA1.

[0061] In an embodiment, an optical pattern can be disposed in at least a portion of the second area HA2. The optical pattern is included in an optical structure, and can include a plurality of openings. The optical pattern will be described later with reference to Figures 7-9E FIG. 6.

[0062] The aperture AH can have a circular shape on a flat surface. However, it is not limited thereto, and the aperture AH can have any shape among various shapes. For example, the aperture AH can have a polygonal shape including a flat rectangle or an irregular shape.

[0063] The aperture AH can include a first through-hole and a second through-hole. Here, the first through-hole can be a portion of the aperture AH corresponding to the touch sensor, and the second through-hole can be a portion of the aperture AH corresponding to the display panel.

[0064] The sensor module may be provided at the lower side of the display device DD (e.g., on the rear surface facing the front surface of the display panel) so as to correspond to the hole AH. That is, the sensor module may be provided so as to overlap the hole AH from the lower side of the display device DD. In embodiments, the sensor module may include at least one of an image sensor (or camera), an illumination sensor, a proximity sensor, an infrared sensor, and an ultrasonic sensor.

[0065] In this specification, unless the term “overlap” is defined differently, the term “overlap” indicates that both components have portions in a direction when viewed from the thickness direction of the display device DD (ie, the third direction DR3 ).

[0066] As mentioned above Figure 1 and Figure 2 As described, the display device DD includes a hole AH formed in the second non-display area NDA2 (or the second non-sensing area NSA2), and a sensor module including a camera, etc. is provided to overlap with the hole AH. Therefore, compared with another display device in which the sensor module is provided only on one side of the display area DA (for example, the first non-display area NDA1), the display device DD can have a minimized inactive area.

[0067] Figure 3 It is shown that the Figure 2 A top view of a display panel in a display device.

[0068] Reference Figures 1-3 The display panel DP may include a substrate SUB, pixels PX, scan lines SL, data lines DL, power lines PL, scan control lines SCL, a scan driver 420, a display driving circuit 410, display electrode pads ("pads," also known as "bonding pads") EP, data coupling lines DLL, and pad coupling lines PLL. Furthermore, the display panel DP may define second through holes TH2.

[0069] Here, the second through hole TH2 may be a reference Figure 1 and Figure 2 The portion of the hole AH described corresponds to the display panel DP. The second through hole TH2 may be formed to correspond to the first area HA1 of the second non-display area NDA2.

[0070] The display panel DP may include a display area DA, a first non-display area NDA1, and a second non-display area NDA2. The pixels PX may be disposed in the display area DA.

[0071] The display panel DP may include scan lines SL, data lines DL, power lines PL, and pixels PX.

[0072] In an embodiment, the scan lines SL may extend in the second direction DR2, and the data lines DL may extend in the first direction DR1. The power lines PL may include at least one line extending in the first direction DR1 and a plurality of lines branched from the at least one line and extending in the second direction DR2.

[0073] Each of the pixels PX may be coupled to at least one of the scan lines SL, any one of the data lines DL, and the power line PL. Each of the pixels PX may include a driving transistor, at least one switching transistor, a light emitting element, a capacitor, and the like.

[0074] In an embodiment, the display panel DP may further include a display driving circuit 410, a scan driver 420, scan control lines SCL, data coupling lines DLL, and pad coupling lines PLL. The display driving circuit 410, the scan driver 420, the scan control lines SCL, the data coupling lines DLL, and the pad coupling lines PLL may be disposed in the first non-display area NDA1.

[0075] Despite Figure 3 The middle scan driver 420 is shown as being disposed in the first non-display area NDA1 outside one side of the display area DA, but its placement is not limited thereto. For example, the scan driver 420 may be disposed in the first non-display area NDA1 outside the opposite side of the display area DA.

[0076] The display driver circuit 410 may be coupled to the display electrode pads EP of the display pad area EPA via pad coupling lines PLL. The display driver circuit 410 may supply data signals to the data lines DL via data coupling lines DLL. In addition, the display driver circuit 410 may generate a scan control signal configured to control the scan driver 420 and supply the scan control signal to the scan driver 420 via scan control lines SCL.

[0077] In an embodiment, the display driving circuit 410 is formed as an integrated circuit (IC) and thereby bonded to the substrate SUB using a chip on glass (COG) method, a chip on plastic (COP) method, an ultrasonic bonding method, or the like.

[0078] Figure 4 It is shown that the Figure 2 A top view of a touch sensor, optical structure, and substrate layer in a display device.

[0079] Reference Figures 2-4 , the touch sensor TS may be provided on the display panel DP (ie, on the front surface of the display panel DP). However, not limited thereto, the touch sensor TS and the display panel DP may be manufactured as a single body.

[0080] The touch sensor TS may be disposed in the sensing area SA of the base layer BSL. The touch sensor TS may include sensing electrodes SE, signal lines CL, and touch electrode pads TP. In addition, the touch sensor TS and the optical structure OS may define a first through hole TH1.

[0081] Here, the first through hole TH1 may be a reference Figure 1 and Figure 2 The portion of the hole AH described above corresponding to the touch sensor TS. The first through hole TH1 may be formed to correspond to the first area HA1 of the second non-sensing area NSA2. The first through hole TH1 may be formed within the first area HA1.

[0082] The base layer BSL may include a sensing area SA in which a touch input by a user is detected, and a non-sensing area NSA in which a touch input by a user is not detected. In an embodiment, the base layer BSL may be an encapsulation layer of the display panel DP. In this case, the touch sensor TS may be directly provided on the display panel DP. In another embodiment, the base layer BSL may be a component separate from the display panel DP, in which case the base layer BSL may be bonded to the upper surface of the display panel DP via a predetermined transparent adhesive member.

[0083] The non-sensing area NSA may include a first non-sensing area NSA1 and a second non-sensing area NSA2 .

[0084] The first non-sensing area NSA1 is a peripheral area of ​​the sensing area SA and may be defined as an area from the outside of the sensing area SA to a boundary of the base layer BSL.

[0085] The second non-sensing area NSA2 is disposed in the sensing area SA and may be formed to be surrounded by the sensing area SA. The second non-sensing area NSA2 may include a first area HA1 corresponding to the first through hole TH1 and a second area HA2 formed to surround the first area HA1.

[0086] A plurality of sensing electrodes SE may be disposed in the sensing area SA, and touch electrode pads TP of the touch pad area TPA and signal lines CL configured to couple the sensing electrodes SE to the touch electrode pads TP may be disposed in the first non-sensing area NSA1.

[0087] The sensing electrodes SE may include first sensing electrodes SSE1 arranged in the first direction DR1. The first sensing electrodes SSE1 may be electrically coupled to each other. For example, the first sensing electrodes SSE1 may form first sensing electrode lines extending along the first direction DR1.

[0088] The sensing electrodes SE may further include second sensing electrodes SSE2 arranged along the second direction DR2. The second sensing electrodes SSE2 may be electrically coupled along the second direction DR2. For example, the second sensing electrodes SSE2 may form second sensing electrode lines extending along the second direction DR2.

[0089] The first sensing electrode SSE1 and the second sensing electrode SSE2 are Figure 4 1 and 2 are shown as having a diamond shape, but are not limited thereto, and the first sensing electrode SSE1 and the second sensing electrode SSE2 may have other polygonal shapes.

[0090] According to an embodiment, at least some of the first and second sensing electrodes SSE1 and SSE2 may have a mesh shape in which micro patterns alternate. In this case, a reduction in aperture ratio and transmittance of the display device caused by the sensing electrodes SE may be prevented.

[0091] The first sensing electrode lines (e.g., sensing electrode columns) and the second sensing electrode lines (e.g., sensing electrode rows) may be coupled to corresponding touch electrode pads TP via corresponding signal lines CL. In an embodiment, one of the sensing electrode rows and the sensing electrode columns may receive a drive signal configured to sense touch via the signal line CL, and the other may transmit a touch sensing signal via the signal line CL.

[0092] The touch electrode pad TP is coupled to an external driving circuit (such as a position detection circuit) (not shown), and the sensing electrodes SE and the external driving circuit may be electrically coupled to each other.

[0093] Figure 5 It schematically shows a view taken along line II'. Figure 2 A cross-sectional view of an example of a portion of a display device.

[0094] Reference Figures 2-5 , the display device DD may include a display panel DP, a base layer BSL, a touch sensor TS, an optical structure OS, a polarization layer POL, a window layer WDL, an adhesive layer ADL, and a sensor module 300 .

[0095] The display panel DP may include a substrate SUB and a display element layer DEL.

[0096] The substrate SUB can be a rigid substrate or a flexible substrate capable of being bent, folded, rolled, etc. The substrate SUB can be formed of an insulating material such as glass, quartz, a polymer resin, etc. Examples of the polymer resin can include polyether sulfone (PES), polyacrylate (PA), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyallylate, polyimide (PI), polycarbonate (PC), cellulose triacetate (CAT), cellulose acetate propionate (CAP), or a combination thereof. Alternatively, the substrate SUB can include a metallic material.

[0097] The display element layer DEL is disposed on the substrate SUB, and can include a pixel circuit layer PCL and an emission element layer EML.

[0098] The pixel circuit layer PCL can be disposed on the substrate SUB. On the pixel circuit layer PCL, not only a transistor of each of the pixels PX but also a scan line SL, a data line DL, a power line PL, a scan control line SCL, a data combination line DLL, a pad combination line PLL, etc. can be disposed. Each transistor can include a gate electrode, a semiconductor layer, a source electrode, and a drain electrode.

[0099] The emission element layer EML can be disposed on the pixel circuit layer PCL.

[0100] In an embodiment, the emission element layer EML can include the pixels PX configured to emit light by sequentially stacking a first electrode, a light emitting layer, and a second electrode, and a pixel defining layer configured to define the pixels PX. The pixels PX of the emission element layer EML can be disposed in the display area DA.

[0101] The light emitting layer can be an organic light emitting layer including an organic material. In this case, the light emitting layer can include a hole transport layer, an organic light emitting layer, and an electron transport layer.

[0102] In an embodiment, the emission element layer EML can include an inorganic light emitting element. In this case, the first electrode and the second electrode are disposed on the same layer, and the inorganic light emitting element can be electrically combined to the first electrode and the second electrode.

[0103] In an embodiment, the display panel DP (or the display element layer DEL) can define a second through-hole TH2. For example, the second through-hole TH2 can be formed by penetrating the pixel circuit layer PCL and the emission element layer EML so as to correspond to the first area HA1. In this case, the substrate SUB does not include a hole, and can cover the first area HA1. However, it is not limited thereto, and the second through-hole TH2 can be formed by penetrating the substrate SUB.

[0104] The base layer BSL may be a rigid substrate or a flexible substrate capable of bending, folding, curling, etc. The base layer BSL may be formed of an insulating material such as glass, quartz, a polymer resin, etc. Examples of polymer resins may include polyethersulfone (PES), polyacrylate (PA), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyallyl ester, polyimide (PI), polycarbonate (PC), cellulose triacetate (CAT), cellulose acetate propionate (CAP), or a combination thereof. Alternatively, the base layer BSL may include a metal material.

[0105] In embodiments, the base layer BSL may serve as an encapsulation layer configured to encapsulate the emission element layer EML.

[0106] The touch sensor TS may be provided in the sensing area SA of the base layer BSL. The touch sensor TS may include a reference Figure 4 The touch electrode pad TP, the sensing electrode SE configured to sense a touch input by a user using a capacitance method, and the signal line CL configured to couple the touch electrode pad TP to the sensing electrode SE are described. For example, the touch sensor TS can sense a touch input by a user using a self-capacitance method or a mutual-capacitance method.

[0107] In an embodiment, the touch sensor TS may define a first through hole TH1. For example, the first through hole TH1 may be formed by penetrating the touch sensor TS so as to correspond to the first area HA1. In this case, the base layer BSL does not include a hole and may cover the first area HA1. However, this is not limiting, and the first through hole TH1 may be formed by penetrating the base layer BSL. The first through hole TH1 may have the same circumference and radius as the second through hole TH2. The circumference and radius may substantially match the size of the first area HA1.

[0108] The polarizing layer POL and the window layer WDL can be provided on the touch sensor TS. The polarizing layer POL can be provided on a portion of the optical structure OS and the touch sensor TS, and the window layer WDL can be bonded to the polarizing layer POL, the touch sensor TS, and the optical structure OS via an adhesive layer ADL. Here, an optically clear adhesive (OCA) or an optically clear resin (OCR) can be used as the adhesive layer ADL.

[0109] The first through hole TH1 may extend through the adhesive layer ADL, the polarizing layer POL, and the touch sensor TS. The first through hole TH1 may gradually narrow along the edge of the optical structure OS in the touch sensor TS layer. The first through hole TH1 may be wider in the polarizing layer POL than in the touch sensor TS layer.

[0110] In an embodiment, the optical structure OS may be further provided in the second area HA2 of the base layer BSL.

[0111] In an embodiment, the optical structure OS may include an optical pattern provided in at least a portion of the second area HA2. The optical pattern may include a plurality of openings. The optical pattern may be formed in at least a portion of the second area HA2 so as to prevent a plurality of lines running around the hole AH in the second area HA2 (or the display area DA adjacent to the second area HA2) from being visible to the user. Figures 7-9E Describe the optical pattern.

[0112] The polarizing layer POL may be a film type or a liquid crystal coating type. The film type may include a stretched synthetic resin film, and the liquid crystal coating type may include liquid crystals arranged in a predetermined arrangement.

[0113] In an embodiment, the polarizing layer POL may be disposed to overlap the sensing area SA (or the display area DA). In addition, the polarizing layer POL may be disposed to overlap at least a portion of the second non-sensing area NSA2 (or the second non-display area NDA2).

[0114] The window layer WDL is disposed on the polarizing layer POL, the touch sensor TS, and the optical structure OS to protect the display panel DP or the touch sensor TS from external scratches, etc. The front surface (or upper surface) of the window layer WDL may be a surface in contact with a user's input means (finger).

[0115] The window layer WDL does not include the hole AH and may cover the first area HA1 and the second area HA2. However, not limited thereto, the hole AH may be formed by penetrating the window layer WDL.

[0116] Although the space between the emission element layer EML and the base layer BSL is Figure 5 The CMOS image sensor is shown as being empty, but the embodiments of the inventive concept are not limited thereto. For example, a filling film may be provided between the emission element layer EML and the base layer BSL. The filling film may be an epoxy filling film, a silicon filling film, or the like.

[0117] The sensor module 300 may be disposed below the display panel DP (or substrate SUB) (e.g., on the rear surface of the display panel DP). Specifically, the sensor module 300 may be disposed so as to overlap the first through hole TH1 and the second through hole TH2. Thus, a light receiver (such as a camera included in the sensor module) may receive light from the outside through the hole AH. To this end, the substrate SUB, base layer BSL, and window layer WDL, which do not include the hole AH, may be formed to be transparent.

[0118] Figure 6 It schematically shows a view taken along line II'. Figure 2A cross-sectional view of another example of a portion of a display device.

[0119] Reference Figure 5 and Figure 6 ,Apart from Figure 6 The adhesive layer ADL' and the window layer WDL' are not provided throughout the entire second non-display area NDA2, Figure 6 The display device DD' and Figure 5 Therefore, repeated description will be omitted.

[0120] Reference Figure 2 and Figure 6 , the display device DD′ may include a display panel DP, a base layer BSL, a touch sensor TS, an optical structure OS, a polarization layer POL, a window layer WDL′, an adhesive layer ADL′, and a sensor module 300 .

[0121] In an embodiment, the window layer WDL' may include a hole AH' including a first through hole TH1' and a second through hole TH2. That is, the hole AH' (or the first through hole TH1') may be formed by penetrating the window layer WDL'. In addition, the window layer WDL' may be bonded to the polarization layer POL via an adhesive layer ADL'.

[0122] Here, the polarizing layer POL is arranged to overlap with the sensing area SA (or the display area DA), and thus the window layer WDL' and the adhesive layer ADL' may also be arranged to overlap with the sensing area SA (or the display area DA). In addition, when the polarizing layer POL is arranged to overlap with at least a portion of the second non-sensing area NSA2 (or the second non-display area NDA2), the window layer WDL' and the adhesive layer ADL' may also be arranged to overlap with at least a portion of the second non-sensing area NSA2 (or the second non-display area NDA2). Therefore, at least a portion of the optical structure OS can be exposed to the outside.

[0123] Figure 7 It shows Figure 2 An enlarged view of an example of a second non-display area of ​​a display device.

[0124] Reference Figures 2-5 and Figure 7 , the second non-sensing area NSA2 (or the second non-display area NDA2) may include a first area HA1 and a second area HA2.

[0125] The hole AH may be formed in the first area HA1. The hole AH may include a reference Figures 3-5 The first through holes TH1 and the second through holes TH2 are described.

[0126] In the second area HA2 , the data lines DL and the scan lines SL may be formed on the pixel circuit layer PCL of the display panel DP by routing around the hole AH.

[0127] In an embodiment, the optical pattern OM may be formed on the optical structure OS in the touch sensor TS layer in the second area HA2 in order to prevent the data lines DL and the scan lines SL running around the hole AH from being visible to the user.

[0128] In an embodiment, the optical pattern OM may include a plurality of openings OP. The optical pattern OM, by including a plurality of openings OP, scatters light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS), thereby reducing the reflectivity of the incident light. For example, the optical pattern OM reduces the reflectivity of light incident on the upper surface of the optical structure OS (or touch sensor TS) from the outside through the aperture AH, thereby reducing the reflectivity of light near the aperture AH (i.e., in the second area HA2). As a result, lines (e.g., data lines DL, scan lines SL, etc.) below the optical structure OS (or touch sensor TS) near the aperture AH and reflected light near the aperture AH may be invisible to the user.

[0129] In addition, when light from the outside is reflected again from the sensor module 300 and then enters the lower surface of the optical structure OS (or touch sensor TS) through the hole AH, the reflectivity of the light entering the lower surface of the optical structure OS (or touch sensor TS) is reduced by the optical pattern OM, thereby reducing the amount of light that re-enters the sensor module 300 by reflecting from the lower surface of the optical structure OS (or touch sensor TS). Therefore, it is possible to reduce the flare phenomenon of the captured image caused by the light re-entering the camera included in the sensor module 300.

[0130] The polarizing layer POL may be disposed in at least a portion of the second area HA2. When the polarizing layer POL is aligned to one side during the alignment process, a portion of the polarizing layer POL may be disposed in the first area HA1 in which the hole AH is formed. Therefore, to prevent a portion of the polarizing layer POL from being disposed in the first area HA1, the polarizing layer POL may be disposed outside the second area HA2 or in a portion of the second area HA2.

[0131] Figure 8 It shows Figure 4 An enlarged view of an example of a touch sensor, an optical structure, and an enlarged area EA portion of the base layer, and Figures 9A-9E is schematically shown along Figure 8 For ease of description, the example of the cross-sectional view of the enlarged area EA portion is taken along the line II-II'. Figures 9A-9D Reference is shown in Figure 5Described adhesive layer ADL.

[0132] Reference Figure 8 and Figure 9A The touch sensor TS may be provided in the sensing area SA of the base layer BSL. The touch sensor TS may include a first electrode layer 910, a second electrode layer 920, a first insulating layer INS1, and a second insulating layer INS2.

[0133] The first electrode layer 910 may be disposed in the sensing area SA of the base layer BSL. In an embodiment, the first electrode layer 910 may be formed of an opaque metal conductive layer, for example, a single layer or multiple layers formed of any one of molybdenum (Mo), niobium (Nb), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu), or alloys thereof.

[0134] The first electrode layer 910 may include a coupling electrode CE provided in the sensing area SA. Since the coupling electrode CE is formed of an opaque metal conductive layer, it does not contact the pixel ( Figure 3 This non-overlapping prevents pixels ( Figure 3 The aperture ratio of the PX) is reduced, but the coupling electrode CE can be arranged to overlap with the pixel defining layer.

[0135] The coupling electrode CE can couple the first sensing electrode SSE1 to the touch island electrode SEI. Specifically, the coupling electrode CE can couple to the touch island electrode SEI via the first touch contact hole TCNT1, which is configured to penetrate the first insulating layer INS1 to expose the touch island electrode SEI. The coupling electrode CE can couple to the first sensing electrode SSE1 via the second touch contact hole TCNT2, which is configured to penetrate the first insulating layer INS1 to expose the first sensing electrode SSE1. Thus, the first sensing electrode SSE1 and the touch island electrode SEI are electrically coupled to each other via the coupling electrode CE.

[0136] In an embodiment, the first electrode layer 910 may not be disposed in the second non-sensing area NSA2 .

[0137] The first insulating layer INS1 may be disposed on the first electrode layer 910, which is disposed in the sensing area SA. In an embodiment, the first insulating layer INS1 may be disposed on a portion of the sensing area SA of the base layer BSL (an area where the first electrode layer 910 is not disposed) and the first electrode layer 910. The first insulating layer INS1 may be disposed to cover the first electrode layer 910. The first insulating layer INS1 may insulate the touch island electrodes SEI from the first sensing electrodes SSE1.

[0138] In an embodiment, the third insulating layer INS3 may be disposed on the base layer BSL in the second area HA2 of the second non-sensing area NSA2. Here, the first insulating layer INS1 and the third insulating layer INS3 may be formed as a single body. That is, the first insulating layer INS1 (or the third insulating layer INS3) may extend from the sensing area SA to the second area HA2.

[0139] The first insulating layer INS1 may include an inorganic film (e.g., at least one of silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, and aluminum oxide). Since the third insulating layer INS3 and the first insulating layer INS1 are formed as a single body, the third insulating layer INS3 may include the same material as that of the first insulating layer INS1.

[0140] The second electrode layer 920 may be disposed on the first insulating layer INS1. The second electrode layer 920 may include a transparent conductive material capable of transmitting light. For example, the second electrode layer 920 may include a transparent conductive material such as indium tin oxide (ITO), indium zinc oxide (IZO), etc.

[0141] The second electrode layer 920 may include first sensing electrodes SSE1, second sensing electrodes SSE2, and touch island electrodes SEI, which are spaced apart from each other in the sensing area SA. Since the first sensing electrodes SSE1, second sensing electrodes SSE2, and touch island electrodes SEI include a transparent conductive material, even if the first sensing electrodes SSE1, second sensing electrodes SSE2, and touch island electrodes SEI are spaced apart from each other in the sensing area SA, the first sensing electrodes SSE1, second sensing electrodes SSE2, and touch island electrodes SEI are spaced apart from each other in the sensing area SA. Figure 3 PX) overlap, pixel ( Figure 3 The aperture ratio of PX) will not decrease either.

[0142] The first sensing electrodes SSE1 and the touch island electrodes SEI may be alternately disposed along the first direction DR1 but may be disposed to be spaced apart from each other. The first sensing electrodes SSE1 and the touch island electrodes SEI that are close to each other may be electrically coupled to each other through the coupling electrode CE.

[0143] In the second area HA2 of the second non-sensing area NSA2, the second electrode layer 920 may include an optical pattern OM disposed therein. That is, the optical pattern OM may be disposed on the same layer as the first sensing electrodes SSE1, the second sensing electrodes SSE2, and the touch island electrodes SEI disposed in the sensing area SA. In embodiments, the optical pattern OM may be formed in the same process as that of the second electrode layer 920 (i.e., the first sensing electrodes SSE1, the second sensing electrodes SSE2, and the touch island electrodes SEI) and may include the same material as that of the first sensing electrodes SSE1, the second sensing electrodes SSE2, and the touch island electrodes SEI (e.g., the same metal material).

[0144] The optical pattern OM may be disposed on the third insulating layer INS3 in the second area HA2.

[0145] The second insulating layer INS2 may be provided on the second electrode layer 920 (i.e., the first sensing electrode SSE1, the second sensing electrode SSE2, and the touch island electrode SEI) provided in the sensing area SA. In an embodiment, the second insulating layer INS2 may be provided on the second electrode layer 920 and in a portion of the region where the first insulating layer INS1 is provided in the sensing area SA (a region where the second electrode layer 920 is not provided). The second insulating layer INS2 is provided to cover the second electrode layer 920, thereby insulating the second electrode layer 920.

[0146] In an embodiment, the fourth insulating layer INS4 may be provided in the second area HA2 of the second non-sensing area NSA2. Here, the second insulating layer INS2 and the fourth insulating layer INS4 may be formed as a single body. That is, the second insulating layer INS2 (or the fourth insulating layer INS4) may be provided by extending from the sensing area SA to the second area HA2.

[0147] In an embodiment, the fourth insulating layer INS4 may cover the optical pattern OM in the second area HA2. Therefore, the optical pattern OM may be prevented from being damaged.

[0148] The second insulating layer INS2 may be formed of an inorganic film (eg, silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, or aluminum oxide). Since the fourth insulating layer INS4 and the second insulating layer INS2 are formed as a single body, the fourth insulating layer INS4 may include the same material as the second insulating layer INS2.

[0149] In an embodiment, the optical pattern OM may include a plurality of openings OP. Figure 7As described above, because the optical pattern OM includes a plurality of openings OP, it causes scattering of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS), thereby reducing the reflectivity of the incident light. To this end, the refractive index of the second electrode layer 920 including the optical pattern OM can be higher than the refractive index of the second insulating layer INS2 (or fourth insulating layer INS4) covering the second electrode layer 920. In addition, the refractive index of the second electrode layer 920 including the optical pattern OM can be higher than the refractive index of the first insulating layer INS1 (or third insulating layer INS3) disposed below the second electrode layer 920.

[0150] For example, the difference between the refractive index of the second electrode layer 920 and the refractive index of the first insulating layer INS1 (or the difference between the refractive index of the second electrode layer 920 and the refractive index of the second insulating layer INS2) may be equal to or higher than about 0.3. For example, when the second electrode layer 920 is formed of ITO and when the first insulating layer INS1 (or the second insulating layer INS2) includes silicon oxide (e.g., SiO2), since the refractive index of ITO is about 1.85 and the refractive index of SiO2 is about 1.45, the difference therebetween may be about 0.40.

[0151] In this case, diffuse reflection is caused by the difference in refractive index among the plurality of openings OP included in the optical pattern OM, which causes scattering of light in the optical pattern OM, thereby reducing the reflectivity of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS). Therefore, lines (e.g., data lines DL, scan lines SL, etc.) below the optical structure OS (or touch sensor TS) near the hole AH and reflected light near the hole AH can be prevented from being visible to the user, and the reflection of the light provided on the display panel ( Figure 5 The sensor module below the DP Figure 5 300) (e.g., camera) flare phenomenon.

[0152] In the embodiment, the planar shape of the opening OP of the optical pattern OM may be circular or elliptical, but is not limited thereto, and the planar shape of the opening OP may be polygonal or the like.

[0153] Reference Figure 9A and Figure 9B , except that the fourth insulating layer INS4 is not provided Figure 9B Outside the second area HA2 in the cross-sectional view, Figure 9B The cross-sectional view of Figure 9A Therefore, repeated description will be omitted.

[0154] Reference Figure 8 and Figure 9BBecause the fourth insulating layer INS4 is not formed on the second electrode layer 920 formed in the second area HA2 of the second non-sensing area NSA2, that is, because the fourth insulating layer INS4 is not formed on the optical pattern OM, the adhesive layer ADL can be provided to cover the optical pattern OM. Here, the refractive index of the second electrode layer 920 forming the optical pattern OM can be higher than the refractive index of the adhesive layer ADL. For example, when the second electrode layer 920 is formed of ITO and when the adhesive layer ADL is formed of OCA, because the refractive index of ITO is approximately 1.85 and the refractive index of OCA is approximately 1.50, the difference between them can be approximately 0.35. The difference between the refractive index of the optical pattern OM and the refractive index of the adhesive layer ADL causes scattering of light in the optical pattern OM, thereby reducing the reflectivity of light incident on the upper and lower surfaces of the touch sensor TS.

[0155] Reference Figure 6 、 Figure 8 and Figure 9B , because hole AH' is penetrated by Figure 6 The optical pattern OM is formed by forming the window layer WDL' in the display device DD', so that the optical pattern OM can be exposed to the outside instead of being covered by the adhesive layer ADL. In this case, because the refractive index of the outside is approximately 1.00, even if the optical pattern OM is formed in the same process as the second insulating layer INS2 rather than the second electrode layer 920 and is disposed on the same layer as the second insulating layer INS2, the difference between the refractive index of the optical pattern OM and the outside can cause scattering of light in the optical pattern OM, thereby reducing the reflectivity of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS). For example, when the second insulating layer INS2 includes silicon oxide (e.g., SiO2), because the refractive index of SiO2 is approximately 1.45 and the refractive index of the outside is approximately 1.00, the difference between them can be approximately 0.45.

[0156] Reference Figure 9B and Figure 9C , except that the third insulating layer INS3 is not formed on Figure 9C Outside the second area HA2 in the cross-sectional view, Figure 9C The cross-sectional view of Figure 9B Therefore, repeated description will be omitted.

[0157] Reference Figure 8 and Figure 9C, the third insulating layer INS3 is not formed below the second electrode layer 920 formed in the second area HA2 of the second non-sensing area NSA2 (i.e., below the optical pattern OM). That is, the optical pattern OM can be directly disposed on the base layer BSL. As described above, even if the optical structure OS does not include the third insulating layer INS3 in the second area HA2, light scattering in the optical pattern OM is caused by the difference in refractive index between the optical pattern OM and the adhesive layer ADL formed to cover the optical pattern OM. As a result, the reflectivity of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS) can be reduced.

[0158] Despite Figure 9C The intermediate adhesive layer ADL is shown as covering the optical pattern OM, but the configuration is not limited thereto. For example, the second insulating layer INS2 can be arranged to extend from the sensing area SA to the second area HA2 to cover the optical pattern OM. That is, the optical structure OS can include a fourth insulating layer INS4 configured to cover the optical pattern OM. In this case, the scattering of light in the optical pattern OM is caused by the difference in refractive index between the optical pattern OM and the fourth insulating layer INS4 formed to cover the optical pattern OM, thereby reducing the reflectivity of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS).

[0159] Reference Figure 6 、 Figure 8 and Figure 9C , because hole AH' is penetrated by Figure 6 The optical pattern OM is formed by forming the window layer WDL' in the display device DD', so that the optical pattern OM can be exposed to the outside instead of being covered by the adhesive layer ADL. In this case, because the refractive index of the outside is approximately 1.00, even if the optical pattern OM is formed in the same process as the first insulating layer INS1 or the second insulating layer INS2, rather than the second electrode layer 920, and is disposed on the same layer as the first insulating layer INS1 or the second insulating layer INS2, the scattering of light in the optical pattern OM is caused by the difference between the refractive index of the optical pattern OM and the refractive index of the outside. This can reduce the reflectivity of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS). For example, when the first insulating layer INS1 or the second insulating layer INS2 includes silicon oxide (e.g., SiO2), because the refractive index of SiO2 is approximately 1.45 and the refractive index of the outside is approximately 1.00, the difference between them can be approximately 0.45.

[0160] Reference Figure 9A and Figure 9D , in addition to the first metal layer MTL1 is additionally formed on Figure 9D Outside the second area HA2 in the cross-sectional view, Figure 9DThe cross-sectional view of Figure 9A Therefore, repeated description will be omitted.

[0161] Reference Figure 8 and Figure 9D , the first electrode layer 910 may further include a first metal layer MTL1 disposed in the second area HA2. The first metal layer MTL1 may be disposed in the second area HA2 of the base layer BSL. In addition, the optical structure OS may include a third insulating layer INS3 configured to cover the first metal layer MTL1. That is, the first metal layer MTL1 and the coupling electrode CE formed in the sensing area SA may be disposed on the same layer. That is, the first metal layer MTL1 may be formed in the same process as the coupling electrode CE and may include the same material as the coupling electrode CE (e.g., the same metal material).

[0162] As described above, the optical structure OS may further include a first metal layer MTL1 disposed in the second area HA2 of the base layer BSL. Here, the reflectivity of light incident on the lower surface of the optical structure OS (or touch sensor TS) may be further reduced by the first metal layer MTL1. Therefore, the flare phenomenon in the captured image caused by light re-entering the camera included in the sensor module 300 may be further reduced.

[0163] The fourth insulating layer INS4 is shown covering Figure 9D The optical pattern OM in, but not limited to this, as shown in FIG. Figure 9B As described, the fourth insulating layer INS4 is not disposed in the second area HA2 and the adhesive layer ADL may cover the optical pattern OM.

[0164] The first metal layer MTL1 may include a main metal layer, a first metal oxide film, and a second metal oxide film. Figure 11 Describe these.

[0165] Reference Figure 9C and Figure 9E , except that the adhesive layer ADL is not included, the optical pattern OM is disposed on the same layer as the second insulating layer INS2 and Figure 9E The cross-sectional view also includes the first metal layer MTL1 and the cap layer CPL. Figure 9E The cross-sectional view of Figure 9C Therefore, repeated description will be omitted.

[0166] Reference Figure 6 、 Figure 8 and Figure 9E , hole AH' can be penetrated as shown in reference Figure 6 The window layer WDL' and the adhesive layer ADL' are formed.

[0167] In an embodiment, the first electrode layer 910 may include a first metal layer MTL1 formed in the second area HA2 of the second non-sensing area NSA2. The first metal layer MTL1 may be provided in the second area HA2 of the base layer BSL. In addition, the cap layer CPL may cover the first metal layer MTL1. The first metal layer MTL1 and the coupling electrode CE formed in the sensing area SA may be provided on the same layer. That is, the first metal layer MTL1 may be formed in the same process as the coupling electrode CE and may include the same material as the coupling electrode CE (e.g., the same metal material). In addition, the cap layer CPL and the second electrode layer 920 may be provided on the same layer. That is, the cap layer CPL may be formed in the same process as the second electrode layer 920 and may include the same material as the second electrode layer 920 (e.g., the same metal material). Because the second electrode layer 920 forming the cap layer CPL is formed of a metal oxide such as ITO, IZO, etc., oxidation of the first metal layer MTL1 may be prevented.

[0168] In addition, the reflectivity of light incident on the upper surface of the optical structure OS (or the touch sensor TS) may be further reduced by the cover layer CPL formed of the second electrode layer 920 .

[0169] As described above, the optical structure OS further includes a first metal layer MTL1 disposed on the base layer BSL, thereby further reducing the reflectivity at the lower surface of the optical structure OS (or touch sensor TS). Therefore, the flare phenomenon of the captured image caused by light re-entering the camera included in the sensor module 300 can be further reduced.

[0170] The optical pattern OM may be disposed on the cover layer CPL.

[0171] In an embodiment, the optical pattern OM is formed of the fourth insulating layer INS4, and the optical pattern OM may be disposed on the same layer as the second insulating layer INS2. Figure 6 The display device DD' is constructed such that the hole AH' is formed by penetrating the window layer WDL', so that the optical pattern OM can be exposed to the outside instead of being covered by the adhesive layer ADL. In this case, because the refractive index of the outside is about 1.00, even if the optical pattern OM is formed in the same process as the second insulating layer INS2 and is disposed on the same layer as the second insulating layer INS2, the difference between the refractive index of the optical pattern OM and the refractive index of the outside causes scattering of light in the optical pattern OM, thereby reducing the reflectivity of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS).

[0172] As mentioned above Figures 9A-9EAs described above, the optical pattern OM includes a plurality of openings OP, thereby causing scattering of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS) near the hole AH, thereby reducing the reflectivity of the incident light. Therefore, lines (e.g., data lines DL, scan lines SL, etc.) below the optical structure OS (or touch sensor TS) near the hole AH and reflected light near the hole AH are not visible to the user.

[0173] In an embodiment, Figure 9E In this case, even if the optical pattern OM is not included, reflectivity of light incident to the upper and lower surfaces of the optical structure OS (or touch sensor TS) may be reduced by the first metal layer MTL1 and the cover layer CPL.

[0174] Figure 10 It shows Figure 4 FIG. 1 is an enlarged view of another example of a touch sensor, an optical structure, and an enlarged area EA portion of the base layer, and FIG. Figure 11 is schematically shown along Figure 10 FIG. 1 is a cross-sectional view of an example of an enlarged area EA portion taken along line III-III'.

[0175] Reference Figure 8 and Figure 10 , except in Figure 10 The view of the enlarged area EA portion does not show the optical pattern OM and shows the outside of the second metal layer MTL2. Figure 10 A magnified view of the EA section with Figure 8 Therefore, repeated description will be omitted.

[0176] Reference Figure 10 and Figure 11 , the first electrode layer 910 may include a second metal layer MTL2. The second metal layer MTL2 may be disposed in the second area HA2 of the base layer BSL. That is, the second metal layer MTL2 is included in the optical structure OS, and the second metal layer MTL2 may be disposed on the same layer as the first electrode layer 910 disposed in the sensing area SA. In an embodiment, the optical pattern OM may be formed in the same process as the first electrode layer 910 and may include the same material as the first electrode layer 910 (e.g., the same metal material).

[0177] In an embodiment, the second metal layer MTL2 may include a main metal layer 922 , a first metal oxide film 921 , and a second metal oxide film 923 .

[0178] The main metal layer 922 may be formed in the same process as that of the bonding electrode CE, and may include the same material (eg, molybdenum (Mo), niobium (Nb), etc.) as that of the bonding electrode CE.

[0179] The first metal oxide film 921 may be disposed between the base layer BSL and the main metal layer 922. The second metal oxide film 923 may be disposed between the main metal layer 922 and the third insulating layer INS3.

[0180] In an embodiment, the first metal oxide film 921 and the second metal oxide film 923 are formed in the same process as the process of forming the bonding electrode CE, and can be formed of a compound of a material forming the bonding electrode CE (for example, a metal such as molybdenum (Mo), niobium (Nb), etc.) and oxygen (for example, a metal oxide). Because the reflectivity of the first metal oxide film 921 and the second metal oxide film 923 formed of such a metal oxide is lower than the reflectivity of the main metal layer 922 formed of only a metal, the reflectivity of light incident on the upper and lower surfaces of the optical structure OS (or touch sensor TS) can be reduced. Therefore, the lines (for example, the data lines DL, the scan lines SL, etc.) below the optical structure OS (or touch sensor TS) near the hole AH and the reflected light near the hole AH can be invisible to the user, and the reflection of the light provided on the display panel ( Figure 5 The flare phenomenon of the sensor module (e.g., camera) below the DP).

[0181] In addition, the first metal oxide film 921 and the second metal oxide film 923 are provided on the front and rear surfaces of the main metal layer 922 , whereby the main metal layer 922 can be prevented from being oxidized.

[0182] Reference Figure 9D and Figure 11 ,when Figure 9D When the first metal layer MTL1 includes the main metal layer 922, the first metal oxide film 921 and the second metal oxide film 923, Figure 11 Like the second metal layer MTL2, the reflectivity of light incident on the upper and lower surfaces of the optical structure OS (or the touch sensor TS) can be further reduced.

[0183] A display device according to an embodiment of the inventive concept may include an optical pattern including a plurality of openings surrounding a through-hole, thereby causing scattering of light incident on the upper and lower surfaces of a touch sensor near the through-hole, thereby reducing the reflectivity of light near the through-hole.

[0184] In addition, the display device according to an embodiment of the inventive concept includes a second metal layer including a first metal oxide film and a second metal oxide film in the second area (near the through hole), whereby the reflectivity of light incident on the upper and lower surfaces of the touch sensor near the through hole can be reduced.

[0185] Therefore, a line under the touch sensor near the hole and reflected light near the hole can be prevented from being visible to the user, and a flare phenomenon of a sensor module (e.g., a camera) disposed under the display panel can be reduced.

[0186] The effects of the present disclosure are not limited to the above-mentioned effects, and can be variously extended without departing from the spirit and scope of the present disclosure.

[0187] The above detailed description illustrates the present disclosure. In addition, the above description only shows and describes the preferred embodiments of the present disclosure, and the present disclosure can be used in various combinations, changes and environments. That is, modifications and changes can be made without departing from the scope of the concept of the present disclosure described in this specification, its equivalents and / or the scope of the technology or common sense to which the present disclosure belongs. Therefore, the detailed description of the present disclosure is not intended to limit the present disclosure to the disclosed embodiments. In addition, it should be understood that the appended claims include even another embodiment.

Claims

1. A display device, comprising: a base layer including a non-sensing area and a sensing area configured to surround the non-sensing area; A touch sensor is provided in the sensing area of ​​the base layer; an optical structure, disposed on the substrate layer; as well as a polarizing layer disposed on the touch sensor to overlap the sensing area, in: The touch sensor and the optical structure define a first through-hole positioned in the non-sensing area, The non-sensing area includes a first area corresponding to the first through hole and a second area configured to surround the first area, and The optical structure includes an optical pattern disposed in the second region and including a plurality of openings.

2. The display device according to claim 1, wherein: The touch sensor includes: a first electrode layer provided in the sensing area of ​​the base layer; a first insulating layer provided on a portion of the sensing area of ​​the base layer and the first electrode layer; a second electrode layer provided on the first insulating layer and including a first sensing electrode and a second sensing electrode spaced apart from each other; and a second insulating layer provided on the first insulating layer and the second electrode layer. Among the first sensing electrodes, the first sensing electrodes adjacent to each other are coupled to each other by penetrating the first insulating layer and being connected to the first electrode layer, and The optical pattern and the second electrode layer are arranged on the same layer.

3. The display device according to claim 2, wherein: The optical structure further comprises a third insulating layer disposed in the second region of the base layer, The first insulating layer and the third insulating layer are formed as a single body, and The optical pattern is disposed on the third insulating layer.

4. The display device according to claim 3, wherein: The optical structure further includes a fourth insulating layer configured to cover the optical pattern, The second insulating layer and the fourth insulating layer are formed as a single body, and The fourth insulating layer has a lower refractive index than the optical pattern.

5. The display device according to claim 2, wherein: The optical structure further includes a metal layer disposed in the second region of the base layer and a third insulating layer configured to cover the metal layer. The first insulating layer and the third insulating layer are formed as a single body, and The metal layer and the first electrode layer are arranged on the same layer.

6. The display device according to claim 5, wherein: The optical structure further includes a fourth insulating layer configured to cover the optical pattern, and The second insulating layer and the fourth insulating layer are formed as a single body.

7. The display device according to claim 5, wherein: The optical structure further includes: a first metal oxide film disposed between the base layer and the metal layer; and a second metal oxide film disposed between the metal layer and the third insulating layer.

8. The display device according to claim 1, wherein: The touch sensor includes: a first electrode layer provided in the sensing area of ​​the base layer; a first insulating layer provided on a portion of the sensing area of ​​the base layer and the first electrode layer; a second electrode layer provided on the first insulating layer and including a first sensing electrode and a second sensing electrode spaced apart from each other; and a second insulating layer provided on the first insulating layer and the second electrode layer. Among the first sensing electrodes, the first sensing electrodes adjacent to each other are coupled to each other by penetrating the first insulating layer and being connected to the first electrode layer, and The optical pattern is formed on the same layer as the second insulating layer.

9. The display device according to claim 8, wherein: The optical structure further includes a metal layer disposed in the second region of the base layer and a cover layer configured to cover the metal layer. The metal layer and the first electrode layer are arranged on the same layer, The cover layer and the second electrode layer are arranged on the same layer, The optical pattern is provided on the cover layer, and The second insulating layer and the optical pattern include the same material.

10. The display device according to claim 1, further comprising: a window layer, disposed on the polarizing layer and the touch sensor; as well as an adhesive layer configured to bond the polarizing layer to the window layer in the sensing region and to bond the optical structure to the window layer in the non-sensing region, wherein the adhesive layer covers the optical pattern, and Wherein, the refractive index of the adhesive layer is lower than the refractive index of the optical pattern.

11. The display device according to claim 1 , further comprising: a window layer, disposed on the polarization layer to overlap the sensing area; as well as an adhesive layer configured to bond the polarizing layer to the window layer, At least a portion of the optical pattern is exposed to the outside.

12. A display device, comprising: a base layer including a non-sensing area and a sensing area configured to surround the non-sensing area; A touch sensor is provided in the sensing area of ​​the base layer; an optical structure, disposed on the substrate layer; as well as a polarizing layer disposed on the touch sensor to overlap the sensing area, in: The touch sensor and the optical structure define a first through-hole positioned in the non-sensing area, The non-sensing area includes a first area corresponding to the first through hole and a second area configured to surround the first area, and The optical structure includes: a first metal oxide film provided in the second region of the base layer; a metal layer provided on the first metal oxide film; and a second metal oxide film provided on the metal layer.

13. The display device according to claim 12, wherein: The touch sensor includes: a first electrode layer provided in the sensing area of ​​the base layer; a first insulating layer provided on a portion of the sensing area of ​​the base layer and the first electrode layer; a second electrode layer provided on the first insulating layer and including a first sensing electrode and a second sensing electrode spaced apart from each other; and a second insulating layer provided on the first insulating layer and the second electrode layer. Among the first sensing electrodes, the first sensing electrodes adjacent to each other are coupled to each other by penetrating the first insulating layer and being connected to the first electrode layer. The metal layer, the first metal oxide film, and the second metal oxide film are provided on the same layer as the first electrode layer, The optical structure further comprises a third insulating layer disposed in the second region of the base layer, The first insulating layer and the third insulating layer are formed as a single body, and The third insulating layer covers the second metal oxide film.

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