Texture recognition device and electronic device

Abstract

A texture recognition device and an electronic device, the texture recognition device has a touch side surface, and includes a light source array, an image sensor array and a light shielding layer. The light source array includes a plurality of light sources; the image sensor array includes a plurality of image sensors, each of the plurality of image sensors includes a photosensitive element; the light shielding layer is arranged on the light incident side of the image sensor array, the light shielding layer includes a plurality of light holes, the plurality of light holes are configured to collimate the light emitted by the plurality of light sources and reflected by the texture in a direction perpendicular to the touch side surface, and in the direction perpendicular to the touch side surface, the photosensitive element in each of the plurality of image sensors at least partially overlaps with at least one of the plurality of light holes. In the texture recognition device, the light collimated by the light holes accurately corresponds to the valley ridges of the texture, will not be cross-talked by other stray light such as ambient light and avoids strong light, thereby obtaining a clearer and more accurate texture image, so as to achieve accurate large-area texture recognition.

Description

Technical Field

[0001] Embodiments of the present disclosure relate to a texture recognition device and an electronic device. Background Art

[0002] With the increasing popularity of mobile terminals, more and more users use mobile terminals for identity authentication, electronic payment and other operations. Due to the uniqueness of skin textures such as fingerprint patterns or palm patterns, fingerprint recognition technology combined with optical imaging is gradually being adopted by mobile electronic devices for identity authentication, electronic payment and the like. How to design a more optimized texture recognition device is a focus of attention in this field. Summary of the invention

[0003] At least one embodiment of the present disclosure provides a texture recognition device, which has a touch side surface and includes a light source array, an image sensor array, and a light shielding layer. The light source array includes a plurality of light sources; the image sensor array includes a plurality of image sensors, wherein the plurality of image sensors are configured to receive light emitted from the plurality of light sources and reflected from the texture to the plurality of image sensors for texture image acquisition, and each of the plurality of image sensors includes a photosensitive element; the light shielding layer is arranged on the light incident side of the image sensor array, and the light shielding layer includes a plurality of light through holes, wherein the plurality of light through holes are configured to collimate the light emitted from the plurality of light sources and reflected from the texture in a direction perpendicular to the touch side surface, and in the direction perpendicular to the touch side surface, the photosensitive element in each of the plurality of image sensors at least partially overlaps with at least one of the plurality of light through holes.

[0004] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the multiple light through holes include a plurality of first light through holes arranged in an array, the multiple image sensors include a first image sensor, and in a direction perpendicular to the touch side surface, the photosensitive element of the first image sensor at least partially overlaps with the plurality of first light through holes.

[0005] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the diameter w of each of the plurality of first light-through holes ranges from 1 micron to 10 microns; the height H of each of the plurality of first light-through holes in a direction perpendicular to the touch side surface ranges from 4 microns to 50 microns.

[0006] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the opening ratio H / w of each of the plurality of first light holes ranges from 1 to 10.

[0007] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the distance between two adjacent ones of the plurality of first light-through holes is 2 micrometers to 10 micrometers.

[0008] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the shading layer includes a plurality of shading patterns arranged in an array, and in a direction perpendicular to the touch side surface, the plurality of shading patterns correspond one-to-one to the plurality of image sensors and at least partially overlap, and the plurality of light holes are distributed in the plurality of shading patterns.

[0009] For example, the texture recognition device provided by at least one embodiment of the present disclosure also includes a display panel, the display panel includes an array substrate, the array substrate includes a base substrate and a sub-pixel array arranged on the base substrate, the sub-pixel array includes a plurality of sub-pixels, the light source array includes the sub-pixel array, and the plurality of light sources include the plurality of sub-pixels.

[0010] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, each of the multiple sub-pixels includes a pixel driving circuit arranged on the base substrate, the pixel driving circuit includes a thin film transistor, and each of the multiple image sensors also includes a switching transistor arranged on the base substrate, and the thin film transistor is arranged on the same layer as the switching transistor.

[0011] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the photosensitive element is arranged on a side of the switching transistor away from the base substrate, the photosensitive element includes a first electrode, a second electrode and a semiconductor layer between the first electrode and the second electrode, and the first electrode is electrically connected to the switching transistor; the array substrate also includes a planarization layer arranged on a side of the photosensitive element away from the base substrate, and the planarization layer has a first via hole and a second via hole; each of the multiple sub-pixels also includes a light-emitting device, which is arranged on a side of the planarization layer away from the base substrate, the light-emitting device includes a first light-emitting electrode, a second light-emitting electrode and a light-emitting layer between the first light-emitting electrode and the second light-emitting electrode, and the first light-emitting electrode is electrically connected to the thin film transistor at least through the first via hole; the array substrate also includes a connecting wire arranged on the same layer as the first light-emitting electrode, and the connecting wire is electrically connected to the second electrode of the photosensitive element through the second via hole.

[0012] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the array substrate also includes a pixel defining layer arranged on the side of the first light-emitting electrode and the connecting wiring away from the base substrate, and the pixel defining layer has a first opening exposing the first light-emitting electrode, and the light-emitting layer and the second light-emitting electrode are at least formed in the first opening.

[0013] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the array substrate further includes a plurality of filling patterns respectively located in the plurality of light-through holes, and the material of the plurality of filling patterns includes a light-transmitting insulating material.

[0014] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the planarization layer is configured to include the light shielding layer.

[0015] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the material of the pixel defining layer is the same as the material of the multiple filling patterns.

[0016] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the pixel defining layer is configured to include the light shielding layer; or the planarization layer and the pixel defining layer are configured to jointly include the light shielding layer.

[0017] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the array substrate further includes a spacer located on a side of the pixel defining layer away from the base substrate, and the material of the spacer is the same as that of the multiple filling patterns.

[0018] For example, in the texture recognition device provided in at least one embodiment of the present disclosure, the array substrate also includes a cover plate located on the side of the second light-emitting electrode away from the base substrate, and the thickness of the cover plate in a direction perpendicular to the base substrate ranges from 100 microns to 300 microns.

[0019] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the display panel includes a first display area, a second display area, and a folding area located between the first display area and the second display area, the light source array, the image sensor array and the shading layer are located in the first display area and the second display area, and the display panel is configured to achieve a folding function through the folding area to make the touch side surface located in the first display area opposite to the touch side surface located in the second display area.

[0020] At least one embodiment of the present disclosure further provides an electronic device, which includes any of the above-mentioned texture recognition devices. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, but are not intended to limit the present disclosure.

[0022] Figure 1A This is the principle diagram of fingerprint imaging;

[0023] Figure 1BSchematic diagram of the imaging range of a point light source;

[0024] Figure 1C Schematic diagram of the imaging range of the line light source;

[0025] Figure 1D The fingerprint image is collected in a low-light environment;

[0026] Figure 1E The fingerprint image is collected in a strong light environment;

[0027] Figure 2 A schematic cross-sectional view of a texture recognition device provided by at least one embodiment of the present disclosure;

[0028] Figure 3 A schematic plan view of a light hole and a photosensitive element in a texture recognition device provided by at least one embodiment of the present disclosure;

[0029] Figure 4 A schematic diagram of a texture recognition light path in a texture recognition device provided by at least one embodiment of the present disclosure;

[0030] Figure 5 A schematic plan view of a light hole and a photosensitive element in another pattern recognition device provided by at least one embodiment of the present disclosure;

[0031] Figure 6 A schematic cross-sectional view of a texture recognition device provided by at least one embodiment of the present disclosure;

[0032] Figure 7 for Figure 6 A schematic diagram of a texture recognition optical path of a texture recognition device;

[0033] Fig. 8A A schematic plan view of a sub-pixel array and an image sensor array in a display device provided by at least one embodiment of the present disclosure;

[0034] Figure 8B A schematic plan view of a sub-pixel array, an image sensor array, and a light shielding layer in a display device provided by at least one embodiment of the present disclosure;

[0035] Figure 8C A schematic plan view of a sub-pixel array, an image sensor array, and a light shielding layer in another display device provided in at least one embodiment of the present disclosure;

[0036] Fig. 9 A schematic diagram of irradiance simulation results of fingerprint recognition of a pattern recognition device provided by at least one embodiment of the present disclosure;

[0037] Fig.10 A cross-sectional schematic diagram of another pattern recognition device provided by at least one embodiment of the present disclosure;

[0038] Fig.11 for Fig.10 A schematic diagram of a texture recognition optical path of a texture recognition device;

[0039] Fig.12 A cross-sectional schematic diagram of yet another pattern recognition device provided by at least one embodiment of the present disclosure;

[0040] Fig.13 for Fig.12 A schematic diagram of a texture recognition optical path of a texture recognition device; and

[0041] Fig.14 A schematic diagram of a display panel provided according to at least one embodiment of the present disclosure. DETAILED DESCRIPTION

[0042] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0043] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0044] Currently, narrow borders are gradually becoming the mainstream in the design and manufacture of display devices, especially for portable display devices such as mobile phones. One of the means to achieve narrow borders is to integrate an image sensor with a fingerprint recognition function into the display device to realize an under-screen fingerprint recognition method, increase the display area of ​​the display device, and thus increase the screen-to-body ratio.

[0045] For example, a point light source, a line light source, a surface light source, or a light source with a certain pattern can be used as a light-sensitive light source of an image sensor for fingerprint recognition. In addition, there are many ways to set the light source and the image sensor. For example, the light source can be set on the side of the image sensor close to the fingerprint touch, or the light source can be set in the same plane as the image sensor, or the light source can be set on the side of the image sensor away from the fingerprint touch. The setting method of the light source and the image sensor can be selected and set according to different needs.

[0046] The following uses a point light source as the light-sensitive light source of the image sensor, and the light source is arranged on the side of the image sensor close to the fingerprint touch as an example to introduce the fingerprint recognition principle, but this does not constitute a limitation to the embodiments of the present disclosure.

[0047] In a reflective optical fingerprint recognition device, during the fingerprint recognition process, such as Figure 1A As shown, when the point light source L1 emits light, the light it emits irradiates the fingerprint pressing interface (such as the outer surface of the glass screen) at different angles. Due to the total reflection of the fingerprint pressing interface, the part of these lights with an incident angle greater than or equal to the critical angle θ of total reflection will undergo total reflection, resulting in this part of the light being unable to be emitted from the fingerprint pressing interface, thereby generating a total reflection area. Correspondingly, the part of these lights with an incident angle less than the critical angle θ of total reflection is emitted from the fingerprint pressing interface. Therefore, the texture image can be collected by the light reflected from the total reflection area. For example, a clear texture image is formed at B1 of the fingerprint imaging interface where the image sensor is located. The texture image corresponds to the part of the fingerprint located at F1. F1 is the total reflection area, and B1 is the imaging area.

[0048] Specifically, when, for example, the fingerprint of a user's finger is pressed on the total reflection area F1, the ridge of the fingerprint touches the surface of the total reflection area F1, so the total reflection condition at the position corresponding to the ridge of the fingerprint is destroyed, so the light will be emitted at the corresponding position, so that the original reflection path is changed, while the valley of the fingerprint will not touch the surface of the total reflection area F1, so the total reflection condition at the position corresponding to the valley of the fingerprint is not destroyed, so the light will still be totally reflected at the corresponding position, so that the original reflection path is not changed. In this way, due to the different effects of the valleys and ridges of the fingerprint on the total reflection conditions, the light in the total reflection area that is incident on the fingerprint imaging interface forms a light and dark texture image at different positions.

[0049] In addition, due to the interference caused by the light emitted from the fingerprint pressing interface and reflected by the fingerprint, etc., or the light emitted by the light source is reflected to the fingerprint imaging interface by other functional layers before reaching the fingerprint pressing interface, the A1 of the fingerprint imaging interface becomes an invalid detection area, and this area cannot form an effective texture image. In the invalid area A1, the part of the light emitted by the light source L1 that has not reached the fingerprint pressing interface but is reflected to the fingerprint imaging interface by other functional layers and the part that is almost vertically reflected by the fingerprint pressing interface has a high brightness and is basically located in the center of the invalid area A1, thereby forming a highlight area. Due to the high brightness of the light in this highlight area, a large photoelectric signal is generated in the corresponding part of the image sensor array, which is easy to form an afterimage, and can also be called an afterimage area.

[0050] For example, Figure 1B FIG. 1 shows an imaging range diagram of a point light source. Figure 1B As shown, in the sensitive range of the point light source, the effective imaging range is annular, that is, Figure 1B In the figure, the annular area between the inner circle 11 and the outer circle 12 is the effective imaging range, corresponding to Figure 1A The imaging area B1 corresponds to the total reflection area F1; the area within the inner circle 11 of the ring (hereinafter referred to as the center 10) is the invalid imaging area, corresponding to Figure 1A The invalid area A1 in the center of the ring; the partial area (shadow area) 13 inside the center of the ring 10 is a highlight area (afterimage area), which is easy to cause afterimage in the image sensor array during the imaging process.

[0051] Similarly, Figure 1C FIG. 1 shows an imaging range diagram of a line light source. Figure 1C As shown, for a line light source, the effective imaging range is a runway-shaped annular area or an oblong annular area between an inner circle 21 and an outer circle 22, the ring center 20 is an invalid imaging area, and the partial area (shadow area) 23 inside the ring center 10 is a highlight area (afterimage area) that is easy to cause afterimages in the image sensor array during the imaging process.

[0052] In addition, for fingerprint recognition, since the fingerprint recognition image area of ​​the point light source solution is small, it is easily disturbed by strong external light, especially the edge of the fingerprint, where the degree of interference is more obvious. Figure 1D The fingerprint image is collected in a low-light environment; Figure 1E It is a fingerprint image collected under strong light environment, where: Figure 1D For example, a fingerprint image collected in a low-light environment indoors. Figure 1E For example, a fingerprint image collected in an outdoor strong light environment. Figure 1D and Figure 1EAs shown, in the fingerprint recognition process of a small area, no matter in a strong light environment or a weak light environment, the fingerprints in some areas of the fingerprint image are clear, while the fingerprint signals in other areas are weak or even difficult to distinguish.

[0053] Since the light is received passively during the fingerprint image recognition process using a point light source optical path, the light emitted by the light source array will not be actively distinguished from the ambient light. In addition, some fingerprint recognition devices are equipped with polarizers, which cause uneven illumination of the fingerprint image. Therefore, strong ambient light or uneven illumination may interfere with the fingerprint recognition of the image sensor, resulting in blurred texture imaging or even failure to image. In the field of under-screen fingerprint recognition technology, it is necessary to take into account both eliminating interference from external ambient light and achieving large-area fingerprint recognition.

[0054] At least one embodiment of the present disclosure provides a texture recognition device, which has a touch side surface and includes a light source array, an image sensor array, and a light shielding layer. The light source array includes a plurality of light sources; the image sensor array includes a plurality of image sensors, the plurality of image sensors are configured to receive light emitted from the plurality of light sources and reflected from the texture to the plurality of image sensors for texture image acquisition, and each of the plurality of image sensors includes a photosensitive element; the light shielding layer is disposed on the light incident side of the image sensor array, the light shielding layer includes a plurality of light through holes, the plurality of light through holes are configured to collimate the light emitted from the plurality of light sources and reflected from the texture in a direction perpendicular to the touch side surface, and in the direction perpendicular to the touch side surface, the photosensitive element in each of the plurality of image sensors at least partially overlaps with at least one of the plurality of light through holes.

[0055] In the texture recognition device, multiple light-through holes in the shading layer collimate the light reflected by the texture in a direction perpendicular to the touch side surface, so that the collimated light accurately corresponds to the valley ridges of the texture, will not be interfered by other stray light such as ambient light and avoid strong light, and then multiple image sensors only receive signal light reflected by the texture, so as to obtain clearer and more accurate texture images, thereby realizing accurate large-area texture recognition.

[0056] At least one embodiment of the present disclosure further provides an electronic device, which includes the above-mentioned texture recognition device.

[0057] The texture recognition device and electronic device disclosed in the present invention are exemplarily described below through several specific embodiments.

[0058] At least one embodiment of the present disclosure provides a texture recognition device. Figure 2 A cross-sectional schematic diagram of the texture recognition device is shown.

[0059] like Figure 2As shown, the pattern recognition device has a touch side surface S, including a light source array, an image sensor array and a light shielding layer 103. For example, the touch side of the pattern recognition device has a cover plate 104, such as a glass cover plate, and the surface of the cover plate 104 is formed as the touch side surface S. When an operating body with patterns such as a finger or a palm touches the touch side surface S, the pattern recognition device can collect and recognize patterns such as fingerprints or palm patterns.

[0060] For example, the light source array includes a plurality of light sources 101, and the plurality of light sources 101 are arranged in an array in a predetermined area. The image sensor array includes a plurality of image sensors 102, and the plurality of image sensors 102 are arranged in an array in a predetermined area. The plurality of image sensors 102 are configured to receive light emitted from the plurality of light sources 101 and reflected by the texture to the plurality of image sensors 102 for texture image acquisition.

[0061] For example, the light shielding layer 103 is on the light incident side of the image sensor array, that is, the side of the image sensor array close to the touch detection surface S, which is shown as the upper side of the image sensor array in the figure, so as to cover the image sensor array. In one embodiment, the light shielding layer 103 is arranged on the surface of the image sensor array close to the touch side surface S. The light shielding layer 103 includes a plurality of light holes 1031. The plurality of light holes 1031 are configured to collimate the light emitted by the plurality of light sources 101 and reflected by the texture in a direction perpendicular to the touch side surface S (that is, the vertical direction in the figure). In the direction perpendicular to the touch side surface S, the photosensitive element 1021 in each of the plurality of image sensors 102 at least partially overlaps with at least one of the plurality of light holes 1031, that is, at least one light hole 1031 is correspondingly arranged in the photosensitive element 1021 of each image sensor 102, so that the light passing through the at least one light hole 1031 can be incident on the photosensitive element 1021 of the image sensor 102 to form a texture image.

[0062] Thus, the light reflected by the texture touched on the touch side surface S can pass through the multiple light holes 1031 respectively, and then illuminate the photosensitive elements 1021 of the multiple image sensors 102, and the light passing through the multiple light holes 1031 tends to be vertically incident on the photosensitive elements 1021 of the multiple image sensors 102, so as to improve the light utilization rate of the photosensitive elements 1021 of the multiple image sensors 102; in addition, the light collimated by the multiple light holes 1031 of the light shielding layer 103 accurately corresponds to the valley ridges of the texture, will not be crosstalked by other stray light such as ambient light and avoid strong light, so that the photosensitive element 1021 of each image sensor 102 only receives the light filtered by the light holes 1031, and then the image sensor 102 can obtain a clearer and more accurate texture image to achieve accurate texture recognition.

[0063] For example, the material of the light shielding layer 103 may include an organic resin material doped with black pigment, thereby achieving a light shielding effect, that is, light cannot pass through the non-light-through hole position of the light shielding layer 103 .

[0064] For example, in some embodiments, the photosensitive element 1021 of the image sensor 102 may be provided with a plurality of light holes 1031. Figure 3 A schematic plan view of a light hole and a photosensitive element in a texture recognition device provided by at least one embodiment of the present disclosure. Figure 3 As shown, the plurality of light holes 1031 include a plurality of first light holes 1031A arranged in an array. The plurality of image sensors 102 include a first image sensor 102A. In a direction perpendicular to the touch-side surface S, the photosensitive element 1021 of the first image sensor 102A at least partially overlaps with the plurality of first light holes 1031A, that is, the photosensitive element 1021 of the first image sensor 102A corresponds to the plurality of first light holes 1031A, so as to improve the efficiency of texture recognition.

[0065] For example, in a direction perpendicular to the touch-side surface S, the orthographic projections of the plurality of first light-through holes 1031A are located in the orthographic projection of the first image sensor 102A. Figure 3 In the example shown, the number of the plurality of first light holes 1031A corresponding to the photosensitive element 1021 of the first image sensor 102A is 4. The photosensitive element 1021 of the first image sensor 102A is configured to have a sufficient photosensitive area, and the plurality of first light holes 1031A can fully transmit the light reflected by the texture to meet the requirements of texture recognition.

[0066] For example, the multiple image sensors 102 included in the image sensor array are all arranged in the same manner as the first image sensor 102A, that is, a plurality of light holes 1031 are correspondingly arranged in each of the photosensitive elements 1021 of the multiple image sensors.

[0067] It should be noted that the embodiments of the present disclosure are not limited to the number of first image sensors 102A corresponding to first light holes 1031A. Figure 3 This is only an example and does not constitute a limitation on the embodiments of the present disclosure. In other embodiments, the number of first light holes 1031A corresponding to the first image sensor 102A may also be 2, 3, 5 or more.

[0068] For example, in some examples, the planar shape of the photosensitive elements 1021 of the multiple image sensors 102 is a rectangle. In other examples, the planar shape of the photosensitive elements 1021 of the multiple image sensors 102 may also be other shapes, such as an ellipse, a pentagon, a hexagon, or other irregular shapes, etc., which is not specifically limited in the embodiments of the present disclosure.

[0069] For example, the embodiment of the present disclosure takes the shape of the plurality of light-through holes 1031 as a circular shape as an example. In other examples, the shape of the plurality of light-through holes 1031 may also be other shapes, such as a square or a rectangle.

[0070] For example, Figure 2 As shown, when an operating body with texture, such as a finger, touches the touch side surface S of the texture recognition device, the light emitted by the multiple light sources 101 can be reflected by the operating body and pass through the light holes 1031 of the multiple light-shielding layers 103 to reach the image sensor 102. The image sensor 102 senses these lights and can capture the texture image of the operating body.

[0071] As described above, the operating body with textures may be a hand, in which case the textures recognized by the image sensor 102 are skin textures, such as fingerprints, palm prints, etc. In addition, the operating body with textures may also be a non-biological object with certain textures, such as an object with certain textures made of materials such as resin, and the embodiments of the present disclosure do not specifically limit this.

[0072] For example, Figure 4 A schematic diagram of a texture recognition light path in a texture recognition device provided in at least one embodiment of the present disclosure, for example, Figure 4 For along Figure 3 It is obtained by cutting along the line A1-A2 in FIG. Figure 4 As shown, for example, the diameter w of the first light through hole 1031A (for example, in the direction parallel to the touch side surface S) is in the range of about 1 micron to 10 microns, and for example, the diameter w of the first light through hole 1031A is about 2 microns, 3 microns, or 5 microns. For example, the height H of the first light through hole 1031A in the direction perpendicular to the touch side surface S is in the range of about 4 microns to 50 microns, and for example, the height H of the first light through hole 1031A in the direction perpendicular to the touch side surface S is in the range of about 4 microns to 10 microns, and for example, the height H is about 5 microns or 6 microns. The larger the diameter w of the first light hole 1031A is, the more light will pass through the first light hole 1031A after being reflected by the texture; the larger the height H of the first light hole 1031A is, the less light will pass through the first light hole 1031A after being reflected by the texture. Therefore, selecting a suitable range of the diameter w and height H of the first light hole 1031A will help the first light hole 1031A to better filter the light reflected by the texture, so that the collimated light passing through the first light hole 1031A can accurately correspond to the valley ridges of the texture and will not be interfered by other stray light such as ambient light.

[0073] It should be noted that, in the embodiments of the present disclosure, the word “about” indicates that the numerical range or the value of the numerical value may fluctuate within a range of, for example, ±5%, or ±10%.

[0074] For example, Figure 4 As shown, the opening ratio H / w of the first light hole 1031A ranges from about 1 to 10, such as 3, 5 or 8. The angle θ in the figure represents the angle between the light reflected by the texture and the direction perpendicular to the touch side surface S. When the angle between the light reflected by the texture and the direction perpendicular to the touch side surface S is less than the angle θ, the reflected light can pass through the first light hole 1031A, that is, the light with an angle less than θ with the direction perpendicular to the touch side surface S can pass through the first light hole 1031A, for example, θ can be calculated by the opening ratio H / w. The light passing through the first light hole 1031A is received by the photosensitive element 1021 of the first image sensor 102A for texture image acquisition. When the angle between the light reflected by the texture and the direction perpendicular to the touch side surface S is greater than the angle θ, the reflected light cannot be incident on the first light hole 1031A.

[0075] For example, the opening ratio H / w is directly related to the angle θ, and the value of tanθ is the inverse of the opening ratio. That is, the larger the opening ratio, the greater the depth of the first light hole 1031A, the smaller the angle θ, and the less light that can be incident on the first light hole 1031A. When the opening ratio H / w of the first light hole 1031A ranges from about 1 to 10, the first light hole 1031A can better filter out the light reflected by the texture, and the light collimated by the first light hole 1031A accurately corresponds to the valley ridge of the fingerprint, and will not interfere with other stray light such as ambient light.

[0076] For example, Figure 4 As shown, the value range of the spacing P between two adjacent first light holes 1031A is about 2 microns to 10 microns, for example, the value of the spacing P is about 3 microns, 4 microns or 6 microns. The spacing P in the figure represents that the spacing P is parallel to the arrangement direction of the plurality of first light holes 1031A (for example Figure 3 The distance between the center lines of two adjacent first light holes 1031A in the arrangement direction of the plurality of first light holes 1031A in the image sensor 102A. The larger the value of the pitch P of the first light holes 1031A, the fewer the number of first light holes 1031A corresponding to the photosensitive element 1021 of the first image sensor 102A, that is, the less light the photosensitive element 1021 of the first image sensor 102A can receive. When the value range of the pitch P between two adjacent ones of the plurality of first light holes 1031A is approximately 2 microns to 10 microns, the photosensitive element 1021 of each image sensor 102 can uniformly and fully receive the light filtered by the light holes 1031, thereby obtaining a clearer and more accurate texture image, so as to achieve accurate large-area texture recognition.

[0077] For example, Figure 5A schematic plan view of a light hole and a photosensitive element in another pattern recognition device provided by at least one embodiment of the present disclosure. Figure 5 As shown, the light shielding layer includes a plurality of light shielding patterns 1032 arranged in an array. For example, Figure 5 4 image sensors 102 are shown as an example. In the direction perpendicular to the touch side surface S, the plurality of shading patterns 1032 correspond to the plurality of image sensors 102 one by one and overlap at least partially, that is, the shading pattern 1032 covers at least part of the image sensor 102. As shown in the figure, the shading pattern 1032 corresponds to the image sensor 102 one by one, and the orthographic projection of the image sensor 102 on the plane where the shading pattern 1032 is located is located inside the shading pattern 1032. A plurality of light holes 1031 are distributed in the plurality of light shading patterns 1032. For example, the photosensitive element 1021 of each image sensor 102 receives light filtered by one or more light holes 1031, thereby obtaining a clearer and more accurate texture image to achieve accurate large-area texture recognition.

[0078] For example, in some embodiments, the texture recognition device is, for example, a display device with an under-screen texture recognition function, and correspondingly includes a display panel. Figure 6 A cross-sectional schematic diagram of a texture recognition device provided in at least one embodiment of the present disclosure. Fig. 8A A schematic plan view of a sub-pixel array and an image sensor array in a display device provided in at least one embodiment of the present disclosure.

[0079] For example, Figure 6 as well as Fig. 8A As shown, the display panel 10 ( Fig.14 The display panel 10 includes an array substrate, the array substrate includes a base substrate 110 and a sub-pixel array disposed on the base substrate 110, and the sub-pixel array includes a plurality of sub-pixels 111. For example, the light source array includes a sub-pixel array, and the plurality of light sources 101 include a plurality of sub-pixels 111, whereby the sub-pixel array is reused as a light source array, and the plurality of sub-pixels 111 are reused as a plurality of light sources 101. That is, at least some of the sub-pixels 111 of the display panel 10 are reused as the light sources 101, thereby improving the compactness of the display device and reducing the difficulty of arranging various functional structures.

[0080] For example, in some embodiments, the sub-pixels 111 in the entire display area of ​​the display panel 10 can be controlled to be reused as the light source 101, and the image sensor array can also be arranged below the entire display area accordingly, thereby realizing full-screen texture recognition.

[0081] For example, in other embodiments, a display device with an under-screen texture recognition function includes a display panel 10 and light-emitting elements provided separately as light-sensitive light sources for realizing texture recognition. These light-emitting elements are, for example, arranged between adjacent sub-pixels in a sub-pixel array, or arranged overlapping with the sub-pixels. The embodiments of the present disclosure are not limited to this.

[0082] For example, Figure 8B A schematic plan view of a sub-pixel array, an image sensor array, and a light shielding layer in a display device provided by at least one embodiment of the present disclosure; Figure 8C A schematic plan view of a sub-pixel array, an image sensor array, and a light shielding layer in another display device provided by at least one embodiment of the present disclosure. Fig. 8A , Figure 8B as well as Figure 8C As shown, the plurality of sub-pixels 111 include a plurality of sub-pixels of different colors, for example, the plurality of sub-pixels 111 include a red sub-pixel R, a blue sub-pixel B, and a green sub-pixel G. For example, as shown in the figure, one red sub-pixel R, one blue sub-pixel B, and two green sub-pixels G form a pixel unit, and the two green sub-pixels G are separately arranged and arranged between adjacent red sub-pixels R and blue sub-pixels B. For example, as shown in the figure, Fig. 8A As shown, the photosensitive element 1021 of each image sensor 102 is arranged between adjacent sub-pixels, such as Figure 8B as well as Figure 8C As shown, after the light shielding layer 103 is provided, in the direction perpendicular to the touch detection surface S, the light shielding layer 103 respectively shields the photosensitive elements 1021 of the multiple image sensors 102, and the multiple light holes 1031 of the light shielding layer 103 are provided between adjacent sub-pixels 111 to correspond to the photosensitive elements 1021 of the multiple image sensors 102. Thus, the photosensitive element 1021 of each image sensor 102 receives the light filtered by the light holes 1031, thereby realizing accurate full-screen texture recognition.

[0083] For example, Figure 8B As shown, a plurality of light holes 1031 are arranged between adjacent sub-pixels 111. For example, the plurality of light holes 1031 are arranged in a row, or in other embodiments, the plurality of light holes 1031 are arranged in an array of multiple rows and columns. The photosensitive element 1021 of each image sensor 102 corresponds to a plurality of light holes 1031 (for example, 4 light holes 1031 in the figure). The photosensitive element 1021 of each image sensor 102 has a sufficient photosensitive area, and the plurality of light holes 1031A can fully transmit the light reflected by the texture to meet the requirements of texture recognition.

[0084] For example, Figure 8CAs shown, one light hole 1031 is arranged between adjacent sub-pixels 111, and each photosensitive element 1021 of the image sensor 102 corresponds to one light hole 1031. The photosensitive element 1021 of each image sensor 102 receives light filtered by the light hole 1031 one by one.

[0085] For example, Figure 6 As shown, each of the plurality of sub-pixels 111 includes a pixel driving circuit disposed on the substrate 110, the pixel driving circuit includes a thin film transistor 111B, and each of the plurality of image sensors 102 also includes a switch transistor 1022 disposed on the substrate 110, and the thin film transistor 111B is disposed on the same layer as the switch transistor 1022. For example, the switch transistor 1022 may be a thin film transistor or a polysilicon transistor, etc. For example, the thin film transistor 111B includes a first transistor TFT1, and the switch transistor 1022 includes a second transistor TFT2.

[0086] For example, the first transistor TFT1 and the second transistor TFT2 may be P-type transistors or N-type transistors, but the embodiments of the present disclosure are not limited thereto.

[0087] like Figure 6 As shown, the first transistor TFT1 includes an active layer 122, a gate 121, and source and drain electrodes 123 and 124. The second transistor TFT2 includes an active layer 122A, a gate 121A, and source and drain electrodes 123A and 124A. The active layer 122A is arranged in the same layer as the active layer 122, the gate 121A is arranged in the same layer as the gate 121, and the source and drain electrodes 123A and 124A are arranged in the same layer as the source and drain electrodes 123 and 124, thereby simplifying the manufacturing process of the display panel. Alternatively, at least part of the functional layers of the first transistor TFT1 and the second transistor TFT2 are arranged in the same layer to simplify the manufacturing process of the display substrate.

[0088] It should be noted that in the embodiments of the present disclosure, “same-layer arrangement” means that two functional layers or structural layers are in the same layer and are formed of the same material in the hierarchical structure of the display substrate, that is, in the preparation process, the two functional layers or structural layers can be formed by the same material layer, and the required patterns and structures can be formed by the same composition process.

[0089] For example, the active layer 122A and the active layer 122 may be an amorphous silicon layer, a polycrystalline silicon layer or a metal oxide semiconductor layer. For example, the polycrystalline silicon may be high temperature polycrystalline silicon or low temperature polycrystalline silicon, and the oxide semiconductor may be indium gallium zinc oxide (IGZO), indium zinc oxide (IZO), zinc oxide (ZnO) or gallium zinc oxide (GZO). The gate 121A and the gate 121 may be made of metal materials or alloy materials such as copper (Cu), aluminum (Al), titanium (Ti), etc., for example, formed into a single-layer metal layer structure or a multi-layer metal layer structure, such as a multi-layer metal layer structure such as titanium / aluminum / titanium. The source and drain electrodes 123A and 124A and the source and drain electrodes 123 and 124 may be made of metal materials or alloy materials such as copper (Cu), aluminum (Al), titanium (Ti), etc., for example, formed into a single-layer metal layer structure or a multi-layer metal layer structure, such as a multi-layer metal layer structure such as titanium / aluminum / titanium.

[0090] For example, Figure 6 As shown, the photosensitive element 1021 is arranged on the side of the switching transistor 1022 away from the base substrate 110, including a first electrode 1021A, a second electrode 1021B and a semiconductor layer 1021C between the first electrode 1021A and the second electrode 1021B. The first electrode 1021A is electrically connected to the switching transistor 1022, so that the switching transistor 1022 can control the voltage applied to the first electrode 1021A, thereby controlling the working state of the photosensitive element 1021.

[0091] For example, the photosensitive element 1021 may be a PN photodiode or a PIN photodiode, etc. In this case, the semiconductor layer 1021C includes a stacked P-type semiconductor layer and an N-type semiconductor layer (e.g., an N-type Si layer), or includes a stacked P-type semiconductor layer (e.g., a P-type Si layer), an intrinsic semiconductor layer (e.g., an intrinsic Si layer), and an N-type semiconductor layer (e.g., an N-type Si layer). For example, the second electrode 1021B is a transparent electrode, and materials such as transparent metal oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), and gallium zinc oxide (GZO) may be used. The first electrode 1021A is a metal electrode, and metal materials or alloy materials such as copper (Cu), aluminum (Al), and titanium (Ti) may be used.

[0092] For example, the array substrate further includes a planarization layer 112 disposed on a side of the photosensitive element 1021 away from the base substrate 110, and the planarization layer 112 includes a first via hole V1 and a second via hole V2. Each of the plurality of sub-pixels 111 further includes a light-emitting device 111A, and the light-emitting device 111A is disposed on a side of the planarization layer 112 away from the base substrate 110. The light-emitting device 111A includes a first light-emitting electrode E1, a second light-emitting electrode E2, and a light-emitting layer EM between the first light-emitting electrode E1 and the second light-emitting electrode E2. The first light-emitting electrode E1 is electrically connected to the thin film transistor 111B at least through the first via hole V1. The array substrate further includes a connection line CL disposed on the same layer as the first light-emitting driving electrode E1, and the connection line CL is electrically connected to the second electrode 1021B of the photosensitive element 1021 through the second via hole V2.

[0093] For example, the first light emitting electrode E1 may be made of transparent metal oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), and gallium zinc oxide (GZO), and the second light emitting electrode E2 may be made of metal materials such as lithium (Li), aluminum (Al), magnesium (Mg), and silver (Ag).

[0094] For example, for an organic light-emitting display device OLED, the light-emitting layer EM may include small molecule organic materials or polymer molecule organic materials, may be fluorescent materials or phosphorescent materials, may emit red light, green light, blue light, or may emit white light; and, as needed, the light-emitting layer may further include functional layers such as an electron injection layer, an electron transport layer, a hole injection layer, and a hole transport layer.

[0095] For quantum dot light-emitting display devices QLED, the light-emitting layer EM may include quantum dot materials, such as silicon quantum dots, germanium quantum dots, cadmium sulfide quantum dots, cadmium selenide quantum dots, cadmium telluride quantum dots, zinc selenide quantum dots, lead sulfide quantum dots, lead selenide quantum dots, indium phosphide quantum dots and indium arsenide quantum dots, etc., and the particle size of the quantum dots is 2-20nm.

[0096] For example, the array substrate also includes a transfer electrode E3, which is arranged on the same layer as the first electrode 1021A of the photosensitive element 1021, the first light-emitting electrode E1 is electrically connected to the transfer electrode E3 through the first via hole V1, and the transfer electrode E3 is electrically connected to the thin film transistor 111B, thereby realizing the electrical connection between the first light-emitting electrode E1 and the thin film transistor 111B.

[0097] For example, the array substrate also includes a pixel defining layer 113 arranged on the side of the first light-emitting electrode E1 and the connecting line CL away from the base substrate 110, and the pixel defining layer 113 has a first opening 113A exposing the first light-emitting driving electrode E1, and the light-emitting layer EM and the second light-emitting electrode E2 are respectively at least partially formed in the first opening 113A.

[0098] For example, Figure 6 As shown, the array substrate further includes a spacer 117 located on the side of the pixel defining layer 113 away from the base substrate 110, that is, the spacer 117 is located between the pixel defining layer 113 and the second light emitting electrode E2. For example, the material of the spacer 117 may include a transparent insulating material.

[0099] For example, in some embodiments, the planarization layer and the pixel definition layer are configured to include a light shielding layer. Figure 6 As shown, the material of the planarization layer 112 and the pixel defining layer 113 can be an organic resin material doped with black pigment to form the light shielding layer 103. The light hole 1031 is located in the planarization layer 112 and the pixel defining layer 113, and the orthographic projection of the light hole 1031 on the base substrate 110 is located in the orthographic projection of the photosensitive element 1021 on the base substrate 110. The light hole 1031 collimates the light reflected by the texture, and the photosensitive element 1021 can receive the light incident into the light hole 1031 for texture image acquisition.

[0100] For example, in the manufacturing process, the light through hole 1031 can be formed by plasma etching, chemical etching, etc.

[0101] For example, the array substrate further includes a plurality of filling patterns respectively located in the plurality of light-through holes, and the material of the plurality of filling patterns includes a light-transmitting insulating material. Figure 6 As shown, the filling pattern 1033 is located in the light-through hole 1031. When the planarization layer 112 and the pixel defining layer 113 include the light shielding layer 103, the material of the filling pattern 1033 is the same as the material of the spacer 117. For example, in the preparation process, the light-transmitting insulating material is filled in the light-through hole 1031 by chemical deposition or sputtering. For example, the filling pattern 1033 and the spacer 117 can be formed by the same patterning process.

[0102] For example, the transparent insulating material is a transparent organic material such as polyimide or resin.

[0103] For example, Figure 6 As shown, the surface of the photosensitive element 1021 is also covered with a first passivation layer 114 to protect the photosensitive element 1021 from being corroded by water vapor. The first passivation layer 114 is made of transparent insulating material, so it will not affect the propagation of signal light.

[0104] For example, Figure 6As shown, the array substrate further includes a second passivation layer 116 located on the side of the thin film transistor 111B and the switch transistor 1022 away from the base substrate 110. The second passivation layer 116 has a plurality of vias to expose the thin film transistor 111B and the switch transistor 1022. For example, the material of the second passivation layer 116 may include an organic insulating material or an inorganic insulating material, such as silicon nitride material, which has a high dielectric constant and good hydrophobicity, and can well protect the thin film transistor 111B and the switch transistor 1022 from being corroded by water vapor.

[0105] For example, Figure 6 As shown, the array substrate further includes a third passivation layer 115 (e.g., a first planarization layer) away from one side of the second passivation layer 116 to provide a planarized surface, and the second passivation layer 116 has a plurality of vias. For example, a third via V3 and a fourth via V4 are formed in the second passivation layer 116 and the third passivation layer 115. The transfer electrode E3 is electrically connected to the thin film transistor 111B through the third via V3. The first electrode 1021A is electrically connected to the switch transistor 1022 through the fourth via V4. For example, the material of the second passivation layer 116 may include an organic insulating material or an inorganic insulating material.

[0106] For example, Figure 6 As shown, the array substrate further includes an encapsulation layer 106, a first adhesive layer 1071, an auxiliary electrode layer 108, and a second adhesive layer 1072. The encapsulation layer 106 is located on the side of the second light-emitting electrode E2 away from the base substrate 110. The encapsulation layer 106 seals the light-emitting device 111A, thereby reducing or preventing the degradation of the light-emitting device 111A caused by moisture and / or oxygen included in the environment. The auxiliary electrode layer 108 can be used for other auxiliary functions, such as a touch function, etc. The auxiliary electrode layer 108 is located on the side of the encapsulation layer 106 away from the base substrate 110. The first adhesive layer 1071 and the second adhesive layer 1072 are respectively located on the side of the auxiliary electrode layer 108 away from the base substrate 110 and the side close to the base substrate 110 (i.e., the upper and lower sides of the auxiliary electrode layer 108), and the first adhesive layer 1071 and the second adhesive layer 1072 include optically transparent adhesives to respectively bond the auxiliary electrode layer 108 to the encapsulation layer 106 and the cover plate 104.

[0107] For example, the encapsulation layer 106 may be a single-layer structure or a composite layer structure, wherein the composite layer structure includes a stacked structure of an inorganic layer and an organic layer. The encapsulation layer 106 includes at least one encapsulation sublayer. For example, the encapsulation layer 106 may include a first inorganic encapsulation layer, a first organic encapsulation layer, and a second inorganic encapsulation layer, which are sequentially arranged.

[0108] For example, the material of the encapsulation layer 106 may include insulating materials such as silicon nitride, silicon oxide, silicon oxynitride, and polymer resin. Inorganic materials such as silicon nitride, silicon oxide, and silicon oxynitride have high density and can prevent the intrusion of water, oxygen, etc.; the material of the organic encapsulation layer may be a polymer material containing a desiccant or a polymer material that can block water vapor, such as a polymer resin, etc., to planarize the surface of the display substrate, and to relieve the stress of the first inorganic encapsulation layer and the second inorganic encapsulation layer, and may also include a desiccant and other water-absorbing materials to absorb water, oxygen, and other substances that intrude into the interior.

[0109] For example, the auxiliary electrode layer 108 may include a plurality of auxiliary electrodes. The auxiliary electrodes used to implement the touch function may be used to implement a capacitive touch structure, which is a self-capacitive or mutual-capacitive type. The self-capacitive touch structure includes a plurality of self-capacitive electrodes arranged in an array (on the same layer), each of which is electrically connected to a touch processing circuit (touch chip) through a touch lead. Position detection is achieved by detecting a change in capacitance of the self-capacitive electrode due to, for example, the proximity of a finger during touch control. The mutual-capacitive touch structure includes a plurality of first touch signal lines extending in a first direction and a plurality of second touch signal lines extending in a second direction, and the first touch signal line and the second touch signal line are both electrically connected to the touch processing circuit (touch chip) through touch leads. The first direction and the second direction intersect with each other, thereby forming a touch capacitor at the intersection of the first touch signal line and the second touch signal line, and position detection is achieved by detecting a change in the touch capacitor due to, for example, the proximity of a finger during touch control. The embodiments of the present disclosure are described by taking a mutual-capacitive touch structure as an example.

[0110] For example, the mutual capacitance touch structure includes a first touch signal line and a second touch signal line that are arranged to cross each other to realize the touch function of the display substrate. In the touch structure, the first touch signal line and the second touch signal line can be arranged in the same layer. For example, the first touch signal line includes a plurality of segments, and the second touch signal line is continuous. At the position where the first touch signal line and the second touch signal line cross each other, a bridging electrode (not shown) located in a different layer from the first touch signal line and the second touch signal line is provided to electrically connect two adjacent segments of the first touch signal line to each other. The touch sensitivity of the display substrate can be improved by setting the first touch signal line and the second touch signal line.

[0111] For example, the material of the auxiliary electrode layer 108 may include indium tin oxide (ITO), thereby obtaining a transparent electrode, or the material of the auxiliary electrode layer 108 may include a metal mesh, thereby also obtaining a transparent electrode.

[0112] For example, Figure 7 for Figure 6 Schematic diagram of the texture recognition optical path of the texture recognition device. Figure 7 As shown, multiple light sources 101 emit and are reflected by the texture to multiple light holes 1031. The multiple light holes 1031 are configured to collimate the light reflected by the texture in a direction perpendicular to the touch side surface S. The light collimated by the multiple light holes 1031 is received by the photosensitive element 1021 of the image sensor 102 for texture image acquisition. The light reflected by the texture needs to pass through the cover plate 104, the second bonding layer 1072, the auxiliary electrode layer 108, the first bonding layer 1071, the encapsulation layer 106 and the second light-emitting electrode E2 before it is incident on the light hole 1031. Since the light reflected by the texture passes through more film layers, in order to reduce the path of the light, the thickness of these film layers needs to be smaller to avoid multiple refractions of the light reflected by the texture, thereby affecting the accuracy of texture recognition.

[0113] For example, the thickness X1 of the cover plate 104 in the direction perpendicular to the base substrate 110 ranges from about 100 microns to 300 microns, for example, the thickness X1 is about 150 microns, 200 microns or 250 microns, etc. The thickness X2 of the second bonding layer 1072 in the direction perpendicular to the base substrate 110 ranges from about 30 microns to 70 microns, for example, the thickness X2 is about 40 microns, 50 microns or 60 microns, etc. The thickness X3 of the auxiliary electrode layer 108 in the direction perpendicular to the base substrate 110 ranges from about 90 microns to 130 microns, for example, the thickness X3 is about 100 microns, 110 microns or 120 microns, etc. The thickness X4 of the first bonding layer 1071 in the direction perpendicular to the base substrate 110 ranges from about 30 microns to 70 microns, for example, the thickness X4 is about 40 microns, 50 microns or 60 microns, etc. The thickness X5 of the encapsulation layer 106 in a direction perpendicular to the base substrate 110 ranges from about 5 micrometers to 15 micrometers, for example, the thickness X5 is about 8 micrometers, 10 micrometers or 12 micrometers.

[0114] For example, Fig. 9 A schematic diagram of irradiance simulation results of texture recognition of a texture recognition device provided by at least one embodiment of the present disclosure. Fig. 9 As shown, for the above example ( Figure 6 as well as Figure 8A-8B The optical simulation test of the texture recognition device of the example shown in the figure is carried out. It can be seen from the simulation structure that the collimated light passing through the multiple light holes 1031 of the light shielding layer 103 accurately corresponds to the valley ridges of the texture, and will not interfere with other stray light such as ambient light. The photosensitive element 1021 of each image sensor 102 receives the light filtered by the light holes 1031, thereby obtaining a clearer and more accurate texture image to achieve accurate texture recognition. It can be concluded that the light shielding layer 103 does not block the signal light while avoiding interference from ambient light, thereby ensuring the accuracy of texture recognition.

[0115] For example, in some other embodiments, the planarization layer 112 is configured to include a light shielding layer. Fig.10 A cross-sectional schematic diagram of another pattern recognition device provided by at least one embodiment of the present disclosure. Fig.10 As shown, the material of the planarization layer 112 can be an organic resin material doped with black pigment to form the light shielding layer 103. The light hole 1031A is located in the planarization layer 112, and the orthographic projection of the light hole 1031A on the base substrate 110 is located in the orthographic projection of the photosensitive element 1021 on the base substrate 110. The light hole 1031A collimates the light reflected by the texture, and the photosensitive element 1021 can receive the light incident into the light hole 1031A for texture image acquisition.

[0116] For example, Fig.10 As shown, the filling pattern 1033A is located in the light-through hole 1031A. When the planarization layer 112 includes the light shielding layer 103, the material of the filling pattern 1033A is the same as the material of the pixel definition layer 113. At this time, the material of the filling pattern 1033A and the material of the pixel definition layer 113 may include a light-transmitting insulating material. The light-transmitting insulating material is filled in the light-through hole 1031 by chemical precipitation or sputtering. For example, in the preparation process, the filling pattern 1033A and the pixel definition layer 113 can be formed by the same patterning process.

[0117] For example, Fig.11 for Fig.10 Schematic diagram of the texture recognition optical path of the texture recognition device. Fig.11 As shown, multiple light sources 101 emit and are reflected by the texture to multiple light holes 1031A. Multiple light holes 1031A are configured to collimate the light reflected by the texture in a direction perpendicular to the touch side surface S. The light collimated by the multiple light holes 1031A is received by the photosensitive element 1021 of the image sensor 102 for texture image acquisition. The light reflected by the texture needs to pass through the cover plate 104, the second bonding layer 1072, the auxiliary electrode layer 108, the first bonding layer 1071, the encapsulation layer 106, the second light-emitting electrode E2 and the pixel defining layer 113 before being incident on the light hole 1031A.

[0118] For example, in some other embodiments, the pixel defining layer 113 is configured to include a light shielding layer. Fig.12 A cross-sectional schematic diagram of another pattern recognition device provided by at least one embodiment of the present disclosure. Fig.12As shown, the material of the pixel defining layer 113 may be an organic resin material doped with black pigment to form the light shielding layer 103. The light hole 1031B is located in the pixel defining layer 113, and the orthographic projection of the light hole 1031B on the base substrate 110 is located in the orthographic projection of the photosensitive element 1021 on the base substrate 110. At this time, the material of the planarization layer 113 may include a light-transmitting insulating material. The light hole 1031B collimates the light reflected by the texture, and the collimated light is received by the photosensitive element 1021 through the planarization layer 113 for texture image acquisition.

[0119] For example, Fig.12 As shown, the filling pattern 1033B is located in the light-through hole 1031B. When the pixel defining layer 113 includes the light shielding layer 103, the material of the filling pattern 1033B is the same as the material of the spacer 117. The light-transmitting insulating material is filled in the light-through hole 1031B by chemical precipitation or sputtering. For example, in the preparation process, the filling pattern 1033B and the spacer 117 can be formed by the same patterning process.

[0120] For example, Fig.13 for Fig.12 Schematic diagram of the texture recognition optical path of the texture recognition device. Fig.13 As shown, multiple light sources 101 emit and are reflected by the texture to multiple light holes 1031B. The multiple light holes 1031B are configured to collimate the light reflected by the texture in a direction perpendicular to the touch side surface S. The light collimated by the multiple light holes 1031B passes through the planarization layer 112 and is received by the photosensitive element 1021 of the image sensor 102 for texture image acquisition. The light reflected by the texture needs to pass through the cover plate 104, the second bonding layer 1072, the auxiliary electrode layer 108, the first bonding layer 1071, the encapsulation layer 106 and the second light-emitting electrode E2 before being incident on the light hole 1031B.

[0121] For example, the display panel provided in at least one embodiment of the present disclosure is a foldable display panel. Fig.14 A schematic diagram of a display panel provided by at least one embodiment of the present disclosure. Fig.14 As shown, the display panel 10 includes a first display area 11, a second display area 12, and a folding area 13 located between the first display area 11 and the second display area 12. The light source array, the image sensor array, and the light shielding layer 103 in the above embodiment are located in the first display area 11 and the second display area 12, that is, the sub-pixels and the image sensor 102 in the first display area 11 and the second display area 12 can be used Figure 8B or Figure 8CIn the arrangement shown, each position of the first display area 11 and the second display area 12 has a texture recognition function. When the texture touches the touch detection surface S of the display panel, part of the sub-pixels located in the first display area 11 and the second display area 12 are illuminated to be used for shape point-shaped light sources, linear light sources or patterned light sources, or all the sub-pixels located in the first display area 11 and the second display area 12 are illuminated to achieve full-screen texture recognition. The display panel 10 is configured to achieve a folding function through a folding area 13, for example, folding along a line L in the folding area 13 to make the touch side surface S located in the first display area 11 opposite to the touch side surface 13 located in the second display area 12. The display panel 10 is Fig.14 When the display panel 10 is folded through the folding area 13, it will be in the folded state.

[0122] For example, the display panel 10 may be an organic light emitting diode (OLED) display panel or a quantum dot light emitting diode (QLED) display panel, etc., and the embodiments of the present disclosure do not specifically limit this. In terms of thickness, the display panel 10 may be an ultra-thin display panel. The OLED display panel may be, for example, a flexible OLED display panel. For example, an OLED display panel and a QLED display panel have self-luminous properties, and the light emission of the display pixel unit may also be controlled or modulated as needed, thereby facilitating texture acquisition and helping to improve the integration of the device.

[0123] For example, in addition to the sub-pixel array, the display panel 10 also includes signal lines (including gate lines, data lines, detection lines, etc.) for providing electrical signals (including scan signals, data signals, detection signals, etc.). For example, the light-emitting state of the light-emitting device can be controlled by the driving circuit to realize the lighting of the sub-pixel. For example, the display panel may also have other functional layers, which can refer to the relevant technology, and the embodiments of the present disclosure are not limited to this.

[0124] At least one embodiment of the present disclosure further provides an electronic device, which includes any of the above-mentioned texture recognition devices. The electronic device can be any product or component with a texture recognition function, such as a mobile phone, a tablet computer, a display, a laptop computer, etc., and the embodiments of the present disclosure do not specifically limit this.

[0125] There are a few points to note:

[0126] (1) The drawings of the embodiments of the present disclosure only relate to the structures related to the embodiments of the present disclosure, and other structures may refer to the general design.

[0127] (2) For the sake of clarity, in the drawings used to describe the embodiments of the present disclosure, the thickness of layers or regions is exaggerated or reduced, that is, these drawings are not drawn according to the actual scale. It is understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "under" another element, the element may be "directly" "on" or "under" the other element or there may be intermediate elements.

[0128] (3) In the absence of conflict, the embodiments of the present disclosure and the features therein may be combined with each other to obtain new embodiments.

[0129] The above are only specific implementations of the present disclosure, but the protection scope of the present disclosure is not limited thereto, and the protection scope of the present disclosure shall be based on the protection scope of the claims.

Claims

1. A texture recognition device having a touch side surface, comprising: A light source array, comprising a plurality of light sources; An image sensor array, comprising a plurality of image sensors, wherein the plurality of image sensors are configured to receive light emitted from the plurality of light sources and reflected by the texture to the plurality of image sensors for texture image acquisition, and each of the plurality of image sensors comprises a photosensitive element; and a light shielding layer, arranged on the light incident side of the image sensor array, the light shielding layer comprising a plurality of light through holes, wherein the plurality of light through holes are configured to collimate the light emitted by the plurality of light sources and reflected by the textures in a direction perpendicular to the touch side surface, In the direction perpendicular to the touch-side surface, the photosensitive element in each of the plurality of image sensors at least partially overlaps with at least one of the plurality of light-through holes; The plurality of light-through holes include a plurality of first light-through holes arranged in an array, the plurality of image sensors include a first image sensor, In a direction perpendicular to the touch-side surface, the photosensitive element of the first image sensor at least partially overlaps with the plurality of first light holes.

2. The texture recognition device according to claim 1, wherein: The diameter w of each of the plurality of first light-transmitting holes ranges from 1 micron to 10 microns; A height H of each of the plurality of first light passage holes in a direction perpendicular to the touch-side surface ranges from 4 micrometers to 50 micrometers.

3. The texture recognition device according to claim 2, wherein: The opening ratio H / w of each of the plurality of first light-transmitting holes ranges from 1 to 10.

4. The texture recognition device according to claim 1, wherein: The distance between two adjacent ones of the plurality of first light-through holes is 2 micrometers to 10 micrometers.

5. The texture recognition device according to claim 1, wherein: The light shielding layer includes a plurality of light shielding patterns arranged in an array, In a direction perpendicular to the touch-side surface, the plurality of light shielding patterns correspond to the plurality of image sensors one by one and at least partially overlap, and the plurality of light through holes are distributed in the plurality of light shielding patterns.

6. The texture recognition device according to any one of claims 1 to 5, further comprising a display panel, The display panel includes an array substrate, the array substrate includes a base substrate and a sub-pixel array arranged on the base substrate, the sub-pixel array includes a plurality of sub-pixels, The light source array includes the sub-pixel array, and the plurality of light sources include the plurality of sub-pixels.

7. The texture recognition device according to claim 6, wherein: Each of the plurality of sub-pixels includes a pixel driving circuit disposed on the substrate. The pixel driving circuit includes a thin film transistor, and each of the plurality of image sensors further includes a switch transistor disposed on the substrate. The thin film transistor and the switch transistor are arranged in the same layer.

8. The texture recognition device according to claim 7, wherein: The photosensitive element is arranged on a side of the switch transistor away from the substrate, the photosensitive element comprises a first electrode, a second electrode and a semiconductor layer between the first electrode and the second electrode, and the first electrode is electrically connected to the switch transistor; The array substrate further comprises a planarization layer disposed on a side of the photosensitive element away from the base substrate, wherein the planarization layer has a first via hole and a second via hole; Each of the plurality of sub-pixels further includes a light-emitting device, the light-emitting device being disposed on a side of the planarization layer away from the base substrate, the light-emitting device including a first light-emitting electrode, a second light-emitting electrode, and a light-emitting layer between the first light-emitting electrode and the second light-emitting electrode, the first light-emitting electrode being electrically connected to the thin film transistor at least through the first via hole; The array substrate further includes a connection wire disposed on the same layer as the first light-emitting electrode, and the connection wire is electrically connected to the second electrode of the photosensitive element through the second via hole.

9. The texture recognition device according to claim 8, wherein: The array substrate further comprises a pixel defining layer arranged on a side of the first light emitting electrode and the connecting wire away from the base substrate. The pixel defining layer has a first opening exposing the first light emitting electrode, and the light emitting layer and the second light emitting electrode are at least formed in the first opening.

10. The texture recognition device according to claim 9, wherein: The array substrate further includes a plurality of filling patterns respectively located in the plurality of light-through holes. The material of the plurality of filling patterns includes a light-transmitting insulating material.

11. The texture recognition device according to claim 10, wherein: The planarization layer is configured to include the light shielding layer.

12. The texture recognition device according to claim 11, wherein: A material of the pixel defining layer is the same as a material of the plurality of filling patterns.

13. The texture recognition device according to claim 10, wherein: The pixel defining layer is configured to include the light shielding layer; or The planarization layer and the pixel definition layer are configured to jointly include the light shielding layer.

14. The texture recognition device according to claim 13, wherein: The array substrate further comprises a spacer located on a side of the pixel defining layer away from the base substrate. The material of the spacers is the same as that of the plurality of filling patterns.

15. The texture recognition device according to claim 8, wherein: The array substrate further comprises a cover plate located on a side of the second light emitting electrode away from the base substrate. The thickness of the cover plate in a direction perpendicular to the base substrate ranges from 100 microns to 300 microns.

16. The texture recognition device according to claim 15, wherein: The display panel includes a first display area, a second display area, and a folding area located between the first display area and the second display area. The light source array, the image sensor array and the light shielding layer are located in the first display area and the second display area. The display panel is configured to implement a folding function through the folding area so that a touch side surface located in the first display area is opposite to a touch side surface located in the second display area.

17. An electronic device, comprising the texture recognition device according to any one of claims 1 to 16.

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