schottky barrier diode
By setting an annular trench and an insulating layer in a gallium oxide-based Schottky barrier diode, the electric field concentration is mitigated, the insulation damage caused by misalignment between the trench and the field insulating layer is solved, and the reverse withstand voltage and leakage current suppression are achieved.
Patent Information
- Application Number
- CN202080087234.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2019-12-18
- Filing Date
- 2020-10-05
- Publication Date
- 2026-05-05
- Estimated Expiration
- 2040-10-05
AI Technical Summary
In gallium oxide-based Schottky barrier diodes, misalignment between the trench and the field insulating layer leads to insulation failure, making it difficult to ensure reverse breakdown voltage and leakage current suppression.
A semiconductor substrate and a drift layer made of gallium oxide are used, with annular outer peripheral trenches and a central trench. An insulating film and a metal film are covered on the drift layer. The field insulating layer is arranged in a ring and extends into the trench. The metal film has the same potential as the anode electrode, which mitigates the concentration of the electric field.
It effectively prevents insulation failure, suppresses leakage current, improves reverse withstand voltage, and ensures device reliability.