A liquid-phase plasma nano-polishing solution of kovar alloy 4j29, a preparation method and application thereof

Abstract

The application discloses a liquid-phase plasma nano-polishing solution for a Kovar alloy 4j29, a preparation method and application thereof, and the raw materials of the liquid-phase plasma nano-polishing solution for the Kovar alloy 4j29 are composed of ammonium sulfate, sodium ethylenediaminetetraacetate, sodium gluconate and deionized water, the mass of the ammonium sulfate accounts for 2-6% of the mass of the deionized water, the mass of the sodium ethylenediaminetetraacetate accounts for 0.01-0.1% of the mass of the deionized water, and the mass of the sodium gluconate accounts for 0.02-0.06% of the mass of the deionized water. The ammonium sulfate, the sodium ethylenediaminetetraacetate and the sodium gluconate are mixed with the deionized water to prepare the plasma nano-polishing solution, the Kovar alloy 4j29 is polished by using the polishing solution, the surface roughness of the Kovar alloy 4j29 can be reduced by one time or even more, and the scratch is less; and the polishing solution can greatly reduce the surface roughness of the Kovar alloy 4j29 and improve the glossiness.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of application of plasma nanotechnology, and particularly relates to a liquid-phase plasma nano-polishing solution for Kovar alloy 4J29, a preparation method and application thereof. BACKGROUND

[0002] Kovar alloy is increasingly widely used in various fields. In order to improve the surface decoration of Kovar alloy, polishing has become an important technology for surface treatment of Kovar alloy. There are three kinds of polishing methods for Kovar alloy, namely mechanical polishing, electrolytic polishing and chemical polishing.

[0003] Mechanical polishing can obtain a smooth surface by using a rubber wheel, polishing sand (325# white corundum powder), a cloth wheel and polishing paste in sequence. The known mechanical polishing method consumes manpower and is more suitable for planar materials. For non-planar materials, there will be dead angles that cannot be polished.

[0004] Chemical polishing is generally a mixed solution of phosphoric acid and corrosion inhibitor in a certain proportion. The chemical polishing method has low requirements for equipment and operation, and the size and quantity of parts that can be polished are only limited by the size of the polishing tank. It is beneficial for large-area polishing and multi-piece processing. However, the solubility is not easy to control, and the polishing effect is generally worse than that of electrolytic polishing. Therefore, the chemical polishing method mostly uses high-concentration acidic solution. The recovery or treatment of waste acid solution will cause problems, and may also have adverse effects on environmental protection.

[0005] As for the electrolytic polishing method, like the chemical polishing method, a high-concentration acidic solution is also used as the electrolyte. This method still has problems such as high toxicity, high risk, difficult management in the production process, and waste liquid pollution.

[0006] Plasma polishing is that the metal ions in the polishing liquid are adsorbed on the surface of the workpiece by electrifying the workpiece and the polishing liquid, the current impact is high at the protruding part of the workpiece and the removal is fast, the current flows, the concave and convex changes continuously, and the rough surface is gradually flattened. Plasma nanometer polishing is a new metal surface treatment process, and various plasma nanometer polishing liquids are disclosed in the prior art. For example, a copper alloy liquid phase plasma nanometer polishing liquid is disclosed in Chinese patent application document with publication number CN107513758A, which contains 2-6% of ammonium sulfate, 0.01-0.1% of ammonium chloride, 0.01-0.1% of sodium ethylenediaminetetraacetate, 0.02-0.06% of sodium nitrite and 0.02-0.06% of sodium gluconate by mass percentage, and the balance is water. The copper alloy is polished by using the polishing liquid, so that the surface roughness of the copper alloy can be reduced to below 0.1 microns, and the scratches are less. A single-alpha-phase titanium liquid phase plasma nanometer polishing liquid is disclosed in Chinese patent application document with publication number CN113089072A, which contains the following raw materials by mass percentage: 2-6% of ammonium chloride, 0.01-0.1% of potassium fluoride, 0.01-0.1% of sodium ethylenediaminetetraacetate, 0.02-0.06% of sodium nitrite and 0.02-0.06% of sodium gluconate, and the balance is deionized water. The titanium is polished by using the polishing liquid, and the treatment effect is good. However, the polishing liquids disclosed in the patent application documents with publication numbers CN107513758A and CN113089072A are only for specific copper alloy and titanium, and the polishing effect for processing Kovar alloy 4j29 is poor, which limits its application. SUMMARY

[0007] The technical problem to be solved by the present application is to provide a plasma nanometer polishing liquid with good polishing effect for Kovar alloy 4j29.

[0008] The present application solves the above technical problems by the following technical means:

[0009] A liquid phase plasma nanometer polishing liquid for Kovar alloy 4j29, which is composed of ammonium sulfate, sodium ethylenediaminetetraacetate, sodium gluconate and deionized water, and the mass of the ammonium sulfate accounts for 2-6% of the mass of the deionized water, the mass of the sodium ethylenediaminetetraacetate accounts for 0.01-0.1% of the mass of the deionized water, and the mass of the sodium gluconate accounts for 0.02-0.06% of the mass of the deionized water.

[0010] Beneficial effects: the application mixes ammonium sulfate, sodium ethylenediaminetetraacetate, sodium gluconate and deionized water to prepare the plasma nano polishing liquid, and the polishing liquid is used for polishing treatment of the kovar alloy 4j29, so that the surface roughness of the kovar alloy 4j29 is reduced by one time or even more, and the scratch is less; the application can greatly reduce the surface roughness of the kovar alloy 4j29 and improve the glossiness of the kovar alloy 4j29 by adding the ammonium sulfate and cooperating with other raw materials, the surface roughness of the kovar alloy 4j29 can be reduced by more than 4 times, and the glossiness can be improved by 6 times, so that the mirror effect is achieved.

[0011] The ammonium sulfate makes the whole solution present weak acidity, is a basic component of the polishing liquid, is beneficial to the generation of mixed gas layers such as water vapor, hydrogen and oxygen in the polishing process, and the mixed gas layer is an important factor affecting the quality of the plasma nano polishing; the sodium gluconate and the sodium ethylenediaminetetraacetate can be complexed with metal ions such as calcium, magnesium and iron as complexing agents, effectively prevent the generation of precipitates in the polishing liquid and dirt on the surface of the kovar alloy 4j29, and secondly, the sodium gluconate can also prevent the oxidation of the metal surface and has corrosion inhibition effect.

[0012] Preferably, the mass of the ammonium sulfate accounts for 3-5% of the mass of the deionized water, the mass of the sodium ethylenediaminetetraacetate accounts for 0.03-0.07% of the mass of the deionized water, and the mass of the sodium gluconate accounts for 0.03-0.05% of the mass of the deionized water.

[0013] Preferably, the mass of the ammonium sulfate accounts for 4% of the mass of the deionized water, the mass of the sodium ethylenediaminetetraacetate accounts for 0.05% of the mass of the deionized water, and the mass of the sodium gluconate accounts for 0.04% of the mass of the deionized water.

[0014] The application also provides a preparation method of the liquid-phase plasma nano polishing liquid for the kovar alloy 4j29.

[0015] The ammonium sulfate, the sodium ethylenediaminetetraacetate and the sodium gluconate are added to the deionized water, fully stirred and mixed, and heated to 60-90 DEG C, so that the liquid-phase plasma nano polishing liquid for the kovar alloy 4j29 is prepared.

[0016] Preferably, 2g of the ammonium sulfate, 0.01g of the sodium ethylenediaminetetraacetate and 0.02g of the sodium gluconate are added to 100g of the deionized water, fully stirred and mixed, and heated to 60-90 DEG C.

[0017] Preferably, the heating is to 70 DEG C.

[0018] Preferably, the heating is to 80 DEG C.

[0019] Preferably, the deionized water is added with ammonium sulfate, sodium ethylenediaminetetraacetate and sodium gluconate in an amount of 6g of ammonium sulfate, 0.1g of sodium ethylenediaminetetraacetate and 0.06g of sodium gluconate per 100g of deionized water, fully stirred and mixed uniformly, and then heated to 90 DEG C.

[0020] Preferably, the deionized water is added with ammonium sulfate, sodium ethylenediaminetetraacetate and sodium gluconate in an amount of 4g of ammonium sulfate, 0.05g of sodium ethylenediaminetetraacetate and 0.04g of sodium gluconate per 100g of deionized water, fully stirred and mixed uniformly, and then heated to 80 DEG C.

[0021] The application further provides application of the liquid-phase plasma nanopolishing solution of the Kovar alloy 4j29 in surface polishing treatment of the Kovar alloy 4j29 piece.

[0022] The application method of the liquid-phase plasma nanopolishing solution of the Kovar alloy 4j29 is as follows: the polishing solution is heated and electrified as a cathode in a working tank, the Kovar alloy 4j29 piece is clamped by a clamp and electrified as an anode, the motor drives the Kovar alloy 4j29 piece to slowly immerse in the electrolyte (i.e. the polishing solution), the electrolyte is evaporated under heating to form a dense gas layer near the surface of the Kovar alloy 4j29 piece, the gas layer is composed of plasma formed by the electrolyte, the discharge channel appears in the plasma, the probability of the discharge channel increases in the rough area of the surface of the Kovar alloy 4j29 piece due to the equipotential surface of the metal surface, the small-area extremely large current in the discharge channel makes the contacted surface of the Kovar alloy 4j29 piece slightly melt, the slightly melted surface of the Kovar alloy 4j29 piece becomes a regular plane under the action of the electromagnetic field according to the equipotential surface principle, and the surface of the Kovar alloy 4j29 piece realizes the polishing effect through the above process.

[0023] The application has the following advantages:

[0024] 1. The plasma nanopolishing solution is prepared by mixing ammonium sulfate, sodium ethylenediaminetetraacetate and sodium gluconate with deionized water, the surface roughness of the Kovar alloy 4j29 piece is reduced by one time or even more, and the scratch is less after the polishing treatment of the Kovar alloy by using the polishing solution, the surface roughness of the Kovar alloy 4j29 piece is greatly reduced and the gloss is improved by adding ammonium sulfate and other substances, the surface roughness of the Kovar alloy 4j29 piece is reduced by more than 4 times, and the gloss is improved by 6 times, and the mirror surface effect is achieved.

[0025] 2. The preparation method of the polishing solution is simple and safe to operate, the consumption of solutes is very small during the polishing process, more metal surface area can be polished by unit volume of the polishing solution, and thus the polishing cost is reduced, the polishing waste liquid can be used as a fertilizer for secondary utilization, and the polishing waste liquid has the advantages of environmental protection, energy saving and emission reduction. DETAILED DESCRIPTION

[0026] In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the embodiments of the present application. Obviously, the described embodiments are some but not all of the embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by a person of ordinary skill in the art without creative work fall within the protection scope of the present application.

[0027] In the following examples, the test materials and reagents used, unless otherwise specified, can be obtained commercially.

[0028] If a specific technique or condition is not specified in the examples, the technique or condition described in the literature in the art or according to the product manual can be used.

[0029] Example 1

[0030] A liquid-phase plasma nanopolishing solution for Kovar alloy 4j29, which is composed of 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate, 0.02g of sodium gluconate and 100g of deionized water;

[0031] 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate and 0.02g of sodium gluconate are added to 100g of deionized water, and then stirred sufficiently and uniformly, and then heated to 60℃, to prepare a liquid-phase plasma nanopolishing solution for Kovar alloy 4j29.

[0032] A roughness meter is used to test the original roughness of the surface of a Kovar alloy 4j29 piece without polishing treatment, and then the surface roughness is tested again after polishing treatment with the above-mentioned liquid-phase plasma nanopolishing solution. The measurement results are shown in Table 1.

[0033] According to the plastic mirror gloss test method of GB / T8807-1988, the gloss of the Kovar alloy 4j29 piece before and after polishing treatment in the present example is detected, and the detection results are shown in Table 1.

[0034] Example 2

[0035] A liquid-phase plasma nanopolishing solution for Kovar alloy 4j29, which is composed of 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate, 0.02g of sodium gluconate and 100g of deionized water;

[0036] 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate and 0.02g of sodium gluconate are added to 100g of deionized water, and then stirred sufficiently and uniformly, and then heated to 70℃, to prepare a liquid-phase plasma nanopolishing solution for Kovar alloy 4j29.

[0037] The original roughness of the surface of the unpolished Kovar 4j29 piece is tested by using a roughness meter, and then the surface roughness is tested again after polishing treatment by using the above-mentioned liquid-phase plasma nanometer polishing liquid, and the measurement results are shown in Table 1.

[0038] According to the plastic mirror gloss test method of GB / T8807-1988, the gloss of the Kovar 4j29 piece before and after polishing treatment in this embodiment is detected, and the detection results are shown in Table 1.

[0039] Example 3

[0040] A liquid-phase plasma nanometer polishing liquid for a Kovar 4j29 piece is prepared by using 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate, 0.02g of sodium gluconate and 100g of deionized water as raw materials;

[0041] 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate and 0.02g of sodium gluconate are added into 100g of deionized water, and then fully stirred and mixed uniformly, and then heated to 80℃ to prepare a liquid-phase plasma nanometer polishing liquid for a Kovar 4j29 piece.

[0042] The original roughness of the surface of the unpolished Kovar 4j29 piece is tested by using a roughness meter, and then the surface roughness is tested again after polishing treatment by using the above-mentioned liquid-phase plasma nanometer polishing liquid, and the measurement results are shown in Table 1.

[0043] According to the plastic mirror gloss test method of GB / T8807-1988, the gloss of the Kovar 4j29 piece before and after polishing treatment in this embodiment is detected, and the detection results are shown in Table 1.

[0044] Example 4

[0045] A liquid-phase plasma nanometer polishing liquid for a Kovar 4j29 piece is prepared by using 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate, 0.02g of sodium gluconate and 100g of deionized water as raw materials;

[0046] 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate and 0.02g of sodium gluconate are added into 100g of deionized water, and then fully stirred and mixed uniformly, and then heated to 90℃ to prepare a liquid-phase plasma nanometer polishing liquid for a Kovar 4j29 piece.

[0047] The original roughness of the surface of the unpolished Kovar 4j29 piece is tested by using a roughness meter, and then the surface roughness is tested again after polishing treatment by using the above-mentioned liquid-phase plasma nanometer polishing liquid, and the measurement results are shown in Table 1.

[0048] The glossiness of the Kovar 4j29 piece before and after polishing treatment was detected according to GB / T8807-1988 Plastic Mirror Gloss Test Method, and the detection results are shown in Table 1.

[0049] Example 5

[0050] A liquid phase plasma nano-polishing liquid of a Kovar 4j29 is prepared by adding 6g of ammonium sulfate, 0.1g of sodium ethylenediaminetetraacetate, 0.06g of sodium gluconate into 100g of deionized water, fully stirring and mixing uniformly, and then heating to 90℃.

[0051] A liquid phase plasma nano-polishing liquid of a Kovar 4j29 is prepared by adding 6g of ammonium sulfate, 0.1g of sodium ethylenediaminetetraacetate, 0.06g of sodium gluconate into 100g of deionized water, fully stirring and mixing uniformly, and then heating to 90℃.

[0052] The original roughness of the surface of the Kovar 4j29 piece without polishing treatment was tested by a roughness meter, and then the surface roughness was tested again after polishing treatment by the above-mentioned liquid phase plasma nano-polishing liquid, and the measurement results are shown in Table 1.

[0053] The glossiness of the Kovar 4j29 piece before and after polishing treatment was detected according to GB / T8807-1988 Plastic Mirror Gloss Test Method, and the detection results are shown in Table 1.

[0054] Example 6

[0055] A liquid phase plasma nano-polishing liquid of a Kovar 4j29 is prepared by adding 6g of ammonium sulfate, 0.1g of sodium ethylenediaminetetraacetate, 0.06g of sodium gluconate into 100g of deionized water, fully stirring and mixing uniformly, and then heating to 90℃.

[0056] A liquid phase plasma nano-polishing liquid of a Kovar 4j29 is prepared by adding 6g of ammonium sulfate, 0.1g of sodium ethylenediaminetetraacetate, 0.06g of sodium gluconate into 100g of deionized water, fully stirring and mixing uniformly, and then heating to 90℃.

[0057] The original roughness of the surface of the Kovar 4j29 piece without polishing treatment was tested by a roughness meter, and then the surface roughness was tested again after polishing treatment by the above-mentioned liquid phase plasma nano-polishing liquid, and the measurement results are shown in Table 1.

[0058] The glossiness of the Kovar 4j29 piece before and after polishing treatment was detected according to GB / T8807-1988 Plastic Mirror Gloss Test Method, and the detection results are shown in Table 1.

[0059] Example 7

[0060] A liquid phase plasma nanometer polishing solution of Kovar alloy 4j29 is prepared by adding 3g of ammonium sulfate, 0.03g of sodium ethylenediaminetetraacetate, 0.05g of sodium gluconate into 100g of deionized water, and then heating to 80℃ after fully stirring and mixing uniformly.

[0061] A liquid phase plasma nanometer polishing solution of Kovar alloy 4j29 is prepared by adding 3g of ammonium sulfate, 0.03g of sodium ethylenediaminetetraacetate, 0.05g of sodium gluconate into 100g of deionized water, and then heating to 80℃ after fully stirring and mixing uniformly.

[0062] The original roughness of the surface of the unpolished Kovar alloy 4j29 part is tested by a roughness meter, and then the surface roughness is tested again after polishing treatment by the above-mentioned liquid phase plasma nanometer polishing solution, and the measurement results are shown in Table 1.

[0063] The gloss of the Kovar alloy 4j29 part before and after polishing treatment in this embodiment is detected according to GB / T8807-1988 Plastic Mirror Gloss Test Method, and the detection results are shown in Table 1.

[0064] Example 8

[0065] A liquid phase plasma nanometer polishing solution of Kovar alloy 4j29 is prepared by adding 3g of ammonium sulfate, 0.03g of sodium ethylenediaminetetraacetate, 0.05g of sodium gluconate into 100g of deionized water, and then heating to 80℃ after fully stirring and mixing uniformly.

[0066] A liquid phase plasma nanometer polishing solution of Kovar alloy 4j29 is prepared by adding 3g of ammonium sulfate, 0.03g of sodium ethylenediaminetetraacetate, 0.05g of sodium gluconate into 100g of deionized water, and then heating to 80℃ after fully stirring and mixing uniformly.

[0067] The original roughness of the surface of the unpolished Kovar alloy 4j29 part is tested by a roughness meter, and then the surface roughness is tested again after polishing treatment by the above-mentioned liquid phase plasma nanometer polishing solution, and the measurement results are shown in Table 1.

[0068] The gloss of the Kovar alloy 4j29 part before and after polishing treatment in this embodiment is detected according to GB / T8807-1988 Plastic Mirror Gloss Test Method, and the detection results are shown in Table 1.

[0069] Example 9

[0070] A liquid phase plasma nanometer polishing solution of Kovar alloy 4j29 is prepared by adding 3g of ammonium sulfate, 0.03g of sodium ethylenediaminetetraacetate, 0.05g of sodium gluconate into 100g of deionized water, and then heating to 80℃ after fully stirring and mixing uniformly.

[0071] 2g of ammonium sulfate, 0.06g of sodium ethylenediaminetetraacetate, and 0.08g of sodium gluconate were added into 100g of deionized water, mixed well, and then heated to 68℃ to prepare a liquid-phase plasma nano-polishing solution for the Kovar alloy 4j29.

[0072] A roughness meter was used to measure the original roughness of the surface of the Kovar alloy 4j29 piece without polishing treatment, and then the surface roughness was measured again after polishing treatment with the above-mentioned liquid-phase plasma nano-polishing solution. The measurement results are shown in Table 1.

[0073] According to the plastic mirror gloss test method of GB / T8807-1988, the gloss of the Kovar alloy 4j29 piece before and after polishing treatment in this example was detected, and the detection results are shown in Table 1.

[0074] Example 10

[0075] A liquid-phase plasma nano-polishing solution for the Kovar alloy 4j29 was prepared by mixing 5.5g of ammonium sulfate, 0.04g of sodium ethylenediaminetetraacetate, 0.026g of sodium gluconate, and 100g of deionized water;

[0076] 2g of ammonium sulfate, 0.06g of sodium ethylenediaminetetraacetate, and 0.08g of sodium gluconate were added into 100g of deionized water, mixed well, and then heated to 68℃ to prepare a liquid-phase plasma nano-polishing solution for the Kovar alloy 4j29.

[0077] A roughness meter was used to measure the original roughness of the surface of the Kovar alloy 4j29 piece without polishing treatment, and then the surface roughness was measured again after polishing treatment with the above-mentioned liquid-phase plasma nano-polishing solution. The measurement results are shown in Table 1.

[0078] According to the plastic mirror gloss test method of GB / T8807-1988, the gloss of the Kovar alloy 4j29 piece before and after polishing treatment in this example was detected, and the detection results are shown in Table 1.

[0079] Comparative Example 1

[0080] 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate were added into 100g of deionized water, mixed well, and then heated to 60℃ to prepare a liquid-phase plasma nano-polishing solution.

[0081] Comparative Example 2

[0082] 2g of ammonium sulfate, 0.02g of sodium gluconate were added into 100g of deionized water, mixed well, and then heated to 60℃ to prepare a liquid-phase plasma nano-polishing solution.

[0083] Comparative Example 3

[0084] 2g of ammonium sulfate, 0.1g of ammonium chloride, 0.01g of sodium ethylenediaminetetraacetate, 0.02g of sodium nitrite, 0.02g of sodium gluconate were added into 100g of deionized water, fully stirred, mixed uniformly, and then heated to 90°C to prepare the plasma nano polishing liquid.

[0085] Comparative Example 4

[0086] 2g of ammonium sulfate, 0.1g of ammonium chloride, 0.01g of sodium ethylenediaminetetraacetate, 0.02g of sodium nitrite, 0.02g of sodium gluconate were added into 100g of deionized water, fully stirred, mixed uniformly, and then heated to 90°C to prepare the plasma nano polishing liquid.

[0087] Comparative Example 5

[0088] 2g of ammonium sulfate, 0.1g of ammonium chloride, 0.01g of sodium ethylenediaminetetraacetate, 0.02g of sodium nitrite, 0.02g of sodium gluconate were added into 100g of deionized water, fully stirred, mixed uniformly, and then heated to 90°C to prepare the plasma nano polishing liquid.

[0089] The original roughness of the surface of the unpolished kovar alloy 4j29 pieces of Comparative Examples 1-5 was tested by a roughness meter, and then the surface roughness was measured again after polishing treatment by the above-mentioned liquid phase plasma nano polishing liquid. The measurement results are shown in Table 1.

[0090] According to GB / T8807-1988 Plastic Mirror Gloss Test Method, the gloss of the kovar alloy 4j29 pieces of Comparative Examples 1-5 before and after polishing treatment was detected, and the detection results are shown in Table 1.

[0091] Table 1 is the comparison results of the roughness and gloss of the kovar alloy 4j29 of Examples 1-10 and Comparative Examples 1-5 before and after polishing treatment

[0092]

[0093] According to the results of Table 1, it can be known that the plasmonic nano polishing liquid is prepared by mixing ammonium sulfate, sodium ethylenediaminetetraacetate and sodium gluconate with deionized water, and the surface roughness of the Kovar alloy 4j29 piece is reduced by one time or even more, and the scratch is less after the polishing treatment of the Kovar alloy 4j29 by using the polishing liquid; it can be found from the results of Comparative Examples 1-10 and Comparative Examples 1-5 that the surface roughness of the Kovar alloy 4j29 piece polished by the polishing liquid prepared without adding sodium gluconate in Comparative Example 1 is not only not reduced but also increased, and the glossiness becomes lower; the surface roughness of the Kovar alloy 4j29 piece polished by the polishing liquid prepared without adding sodium ethylenediaminetetraacetate in Comparative Example 2 is also not reduced but increased, and the glossiness becomes lower; the surface roughness of the Kovar alloy 4j29 piece polished by the polishing liquid prepared by replacing ammonium sulfate with ammonium chloride in Comparative Example 3 is slightly reduced, and the glossiness is slightly improved, and the effect is poor; the surface roughness and the glossiness of the Kovar alloy 4j29 piece polished by the polishing liquid prepared by using the copper alloy formula in the patent application document with the publication number CN107513758A in Comparative Example 4 are not ideal; the surface roughness and the glossiness of the Kovar alloy 4j29 piece polished by the polishing liquid prepared by using the titanium alloy formula in the patent application document with the publication number CN113089072A in Comparative Example 5 are not ideal.

[0094] The above examples are only used to illustrate the technical solutions of the present application, but not to limit it; although the present application has been described in detail with reference to the foregoing examples, it should be understood by those skilled in the art that the technical solutions recorded in the foregoing examples can be modified, or some technical features can be replaced by equivalents; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A liquid-phase plasma nanopolishing slurry for Kovar alloy 4J29, characterized in that: The raw materials consist of ammonium sulfate, sodium ethylenediaminetetraacetate, sodium gluconate and deionized water, wherein the mass of ammonium sulfate accounts for 2-5.5% of the mass of deionized water, the mass of sodium ethylenediaminetetraacetate accounts for 0.01-0.07% of the mass of deionized water, and the mass of sodium gluconate accounts for 0.02-0.05% of the mass of deionized water.

2. The liquid-phase plasma nanopolishing slurry for Kovar alloy 4J29 according to claim 1, characterized in that: The ammonium sulfate accounts for 3-5% of the mass of the deionized water, the sodium ethylenediaminetetraacetate accounts for 0.03-0.07% of the mass of the deionized water, and the sodium gluconate accounts for 0.03-0.05% of the mass of the deionized water.

3. The liquid-phase plasma nanopolishing slurry for Kovar alloy 4J29 according to claim 1 or 2, characterized in that: The ammonium sulfate accounts for 4% of the mass of the deionized water, the sodium ethylenediaminetetraacetate accounts for 0.05% of the mass of the deionized water, and the sodium gluconate accounts for 0.04% of the mass of the deionized water.

4. A method for preparing a liquid-phase plasma nanopolishing slurry for Kovar alloy 4J29 as described in any one of claims 1-3, characterized in that: Includes the following steps: Ammonium sulfate, sodium ethylenediaminetetraacetate, and sodium gluconate are added to deionized water, stirred thoroughly and mixed evenly, and then heated to 60-90℃ to obtain the liquid phase plasma nanopolishing solution of Kovar alloy 4J29.

5. The method for preparing the liquid-phase plasma nanopolishing slurry of Kovar alloy 4J29 according to claim 4, characterized in that: Add 2g of ammonium sulfate, 0.01g of sodium ethylenediaminetetraacetate, and 0.02g of sodium gluconate to every 100g of deionized water. Stir the mixture thoroughly until homogeneous and heat to 60-90℃.

6. The method for preparing the liquid-phase plasma nanopolishing slurry of Kovar alloy 4J29 according to claim 5, characterized in that: Heat to 70℃.

7. The method for preparing the liquid-phase plasma nanopolishing slurry of Kovar alloy 4J29 according to claim 5, characterized in that: Heat to 80℃.

8. The method for preparing the liquid-phase plasma nanopolishing slurry of Kovar alloy 4J29 according to claim 4, characterized in that: Add 4g of ammonium sulfate, 0.05g of sodium ethylenediaminetetraacetate, and 0.04g of sodium gluconate to every 100g of deionized water. Stir the mixture thoroughly until homogeneous, then heat to 80℃.

9. The application of a liquid-phase plasma nanopolishing slurry of Kovar alloy 4J29 as described in any one of claims 1-3 in the surface polishing treatment of Kovar alloy 4J29 parts.

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