A large-span multi-optical-axis parallelism testing device and testing method

By using a large-span multi-optical-axis parallelism testing device and method, and constructing a parallel optical path for the beam using mirror groups and reflecting mirror groups, the problem of large optical axis spans in large optoelectronic systems that are difficult to test is solved, and multi-axis parallelism testing and multi-dimensional observation are realized.

CN115615669BActive Publication Date: 2026-02-27TIANJIN JINHANG INST OF TECH PHYSICS
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Patent Information

Application Number
CN202211100446.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-09-09
Publication Date
2026-02-27
Estimated Expiration
2042-09-09

AI Technical Summary

Technical Problem

In large-scale optoelectronic systems, the optical axis space span between various optoelectronic loads is large, and existing technologies are difficult to effectively test the optical axis parallelism, especially when using collimators, which cannot achieve full aperture coverage.

Method used

A large-span multi-optical-axis parallelism testing device is adopted, including an emitting unit, a collimator, a calibration unit, and a photoelectric system under test. The parallel optical path of the beam is constructed by the mirror group and the reflecting mirror group in the calibration unit. The parallelism test of the large-span optical axis is realized by using a small-aperture collimator. A beam splitting optical path can be added to test the optical axis parallelism of multiple photoelectric loads.

Benefits of technology

It enables effective parallelism testing of optical axes with large spans, and can construct parallel optical paths in optoelectronic loads with different spans, making it suitable for optoelectronic systems for multi-dimensional observation.

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Abstract

The application discloses a large-span multi-optical-axis parallelism testing device and a testing method. The device comprises a transmitting unit, a collimator, a calibration unit and a to-be-tested optoelectronic system. The transmitting unit transmits a first light beam to the collimator. The collimator reflects the first light beam to form a second light beam. The second light beam can be incident on any one of the calibration unit and the to-be-tested optoelectronic system. The calibration unit comprises first and second to-be-calibrated lens groups and a mirror group. The first and second to-be-calibrated lens groups are matched to form first and second calibration positions and a light beam parallel light path. The mirror group comprises first and second mirrors, which are arranged at the first and second calibration positions respectively. The first and second mirrors are matched to emit a light beam parallel to the second light beam to the other to-be-tested load, so that the two to-be-tested loads can receive light beams parallel to each other. The collimator and the calibration unit are matched to test the parallelism of the large-span optical axis.
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Description

TECHNICAL FIELD

[0001] The present disclosure relates to the field of optical testing, in particular to a large-span multi-optical axis parallelism testing device and testing method. BACKGROUND

[0002] In a multi-optical path photoelectric system, different types of photoelectric loads such as infrared imagers, visible light imagers, and laser range finders are simultaneously provided to realize multi-dimensional observation of a target. In such a system, the optical axis parallelism of each photoelectric load needs to be adjusted and calibrated to realize stable observation of the same target by each photoelectric load.

[0003] The optical axes of each photoelectric load in a large photoelectric system span a large space, up to meters. When testing the optical axis parallelism, the method of using a collimator to cover the full aperture of the device to be tested is no longer applicable. Therefore, the present application proposes a large-span multi-optical axis parallelism testing device and testing method to effectively solve the above problems. SUMMARY

[0004] In view of the above defects or deficiencies in the prior art, it is desirable to provide a large-span multi-optical axis parallelism testing device and testing method suitable for large-span multi-optical axes.

[0005] In a first aspect, the present application provides a large-span multi-optical axis parallelism testing device, comprising:

[0006] a to-be-tested photoelectric system, the to-be-tested photoelectric system comprising at least two to-be-tested loads;

[0007] a transmitting unit for transmitting a first light beam to a collimator;

[0008] a collimator having an objective lens, the objective lens being capable of reflecting the first light beam to form a second light beam; the second light beam being capable of being incident on any to-be-tested load in the to-be-tested photoelectric system;

[0009] a calibration unit between the collimator and the to-be-tested photoelectric system; the calibration unit comprising a first to-be-calibrated mirror group, a second to-be-calibrated mirror group, and a mirror group;

[0010] If the first to-be-calibrated mirror group receives the second light beam and is capable of reflecting it back to the transmitting unit along the incident light path, a first calibration position is formed in the first to-be-calibrated mirror group;

[0011] the second to-be-calibrated mirror group comprises a whiteboard, if the whiteboard is capable of receiving the light beam emitted by the first to-be-calibrated mirror group and the light beam emitted by the second to-be-calibrated mirror group, and the two light beam spots coincide, then a second calibration position is formed in the second to-be-calibrated mirror group at this time;

[0012] The mirror group comprises a first mirror and a second mirror, and the first mirror and the second mirror are respectively arranged at a first calibration position and a second calibration position; the first mirror and the second mirror cooperate to emit a light beam parallel to the second light beam to another to-be-measured load, so that the two to-be-measured loads can receive light beams parallel to each other.

[0013] According to the technical scheme provided in the embodiment of the application, the first to-be-calibrated mirror group comprises:

[0014] A first adjusting support, the first adjusting support is the first calibration position;

[0015] A beam splitter, the beam splitter is arranged on the first adjusting support; the beam splitter is used for receiving the second light beam;

[0016] A second adjusting support, the second adjusting support is arranged on a side of the first adjusting support away from the parallel light pipe;

[0017] A first prism, the first prism is arranged on the second adjusting support; the first prism is used for receiving a transmitted light beam of the beam splitter;

[0018] A third adjusting support, the third adjusting support is arranged along a line perpendicular to the first adjusting support and the second adjusting support;

[0019] A third mirror, the third mirror is arranged on the third adjusting support; the third mirror is used for receiving reflected light beams of the beam splitter and the first prism, and reflecting the two light beams back to the emission unit along the incident light path of the two light beams.

[0020] According to the technical scheme provided in the embodiment of the application, the second to-be-calibrated mirror group further comprises:

[0021] A fourth adjusting support, the fourth adjusting support is arranged on a reflected light path of the beam splitter; the fourth adjusting support is the second calibration position;

[0022] A second prism, the second prism is arranged on the fourth adjusting support; the second prism can receive a reflected light beam of the beam splitter and can reflect the reflected light beam to the whiteboard;

[0023] A fifth adjusting support, the fifth adjusting support is arranged on an emitted light path of the second prism, and the fifth adjusting support is used for carrying the whiteboard.

[0024] According to the technical scheme provided in the embodiment of the application, the emission unit comprises:

[0025] A laser emitter, the laser emitter is used for emitting a first light beam;

[0026] A circular hole target corresponding to the laser emitter is arranged; the first light beam is incident on the collimator via the circular hole target.

[0027] In a second aspect, the application provides a large-span multi-optical-axis parallelism testing method, which uses the large-span multi-optical-axis parallelism testing device described above, and includes the following steps:

[0028] S1, placing any to-be-tested load in the to-be-tested optoelectronic system in a target range, the target range being a reflection range of the collimator;

[0029] S2, adjusting the laser emitter and the circular hole target, so that the first light beam can pass through the circular hole target and be incident on the collimator;

[0030] S3, placing the first calibration mirror group at a first set position, the first set position being on an exit light path of the second light beam;

[0031] S4, adjusting the position of the first calibration mirror group, so that the first calibration mirror group can reflect the received second light beam along the incident direction to the circular hole target;

[0032] S5, placing the second calibration mirror group at a second set position, the second set position being close to another to-be-tested load in the to-be-tested optoelectronic system;

[0033] S6, adjusting the position of the second calibration mirror group, so that the light beams emitted by the first calibration mirror group can be incident on the white board, and the light spots coincide, and the coincident position is marked to form an initial light spot marking point;

[0034] S7, removing the second prism and placing the second reflecting mirror at the second calibration position;

[0035] S8, adjusting the position of the second reflecting mirror, so that the light beam emitted via the second reflecting mirror can be incident on the white board, and the light spot coincides with the light spot of the light beam emitted by the first calibration mirror group;

[0036] S9, removing the beam splitter and placing the first reflecting mirror at the first calibration position;

[0037] S10, adjusting the position of the first reflecting mirror, so that the first reflecting mirror can receive the second light beam, and can reflect the second light beam to the white board in cooperation with the second reflecting mirror, so that the exit light spot coincides with the initial light spot marking point;

[0038] S11, removing the second adjusting support, the fifth adjusting support, the first prism and the white board.

[0039] According to the technical scheme provided in the embodiments of the application, the step S3 includes the following steps:

[0040] S31, sequentially placing the first adjusting support and the second adjusting support along the exit direction of the second light beam;

[0041] S32, placing the beamsplitter on the first adjusting support and placing the first prism on the second adjusting support;

[0042] S33, placing the third adjusting support on the perpendicular line of the connecting line between the first adjusting support and the second adjusting support;

[0043] S34, placing the third mirror on the third adjusting support, so that the third mirror can receive the reflected light beams of the beamsplitter and the first prism.

[0044] According to the technical scheme provided by the embodiment of the application, the step S5 comprises the following steps:

[0045] S51, removing the third adjusting support and the third mirror;

[0046] S52, placing the fourth adjusting support on the reflected light path of the beamsplitter;

[0047] S53, placing the fifth adjusting support on the exit light path of the first prism;

[0048] S54, placing the second prism on the fourth adjusting support and placing the whiteboard on the fifth adjusting support.

[0049] In summary, the technical scheme specifically discloses a large-span multi-optical-axis parallelism testing device, which comprises a transmitting unit, a collimator, a calibration unit and a to-be-tested optoelectronic system; the to-be-tested optoelectronic system comprises at least two to-be-tested loads; the transmitting unit is used for transmitting a first light beam to the collimator; the collimator has an objective lens and can reflect the first light beam to form a second light beam after receiving the first light beam; the second light beam can be emitted to the to-be-tested loads in the to-be-tested optoelectronic system and can also enter the calibration unit to assist the optical elements in the calibration unit to form a parallel light path of the light beam;

[0050] The calibration unit is located between the collimator and the to-be-tested optoelectronic system; the calibration unit comprises a first to-be-calibrated mirror group, a second to-be-calibrated mirror group and a mirror group; the first to-be-calibrated mirror group and the second to-be-calibrated mirror group cooperate with each other to form the parallel light path of the light beam and form a calibration position of the mirror in the mirror group at the same time; the mirror forms a beamsplitting light path by replacing the optical element in the parallel light path; at this time, the light beam emitted to the to-be-tested load close to the second mirror is parallel to the light beam emitted to the to-be-tested load by the above-mentioned collimator;

[0051] The application effectively solves the problem of how to use a small-aperture collimator to test the parallelism of a large-span optical axis by cooperating with a calibration unit. In addition, the application can increase a light splitting light path according to actual needs, so as to simultaneously test the optical axis parallelism of multiple optoelectronic loads of different spans. BRIEF DESCRIPTION OF DRAWINGS

[0052] Other features, objects and advantages of the application will become more apparent from the following detailed description of non-limiting embodiments made with reference to the accompanying drawings:

[0053] Figure 1 It is a large-span multi-optical axis parallelism testing device for implementing example steps 1 to 4.

[0054] Figure 2 It is a large-span multi-optical axis parallelism testing device for implementing example steps 5 and 6.

[0055] Figure 3 It is a large-span multi-optical axis parallelism testing device for implementing example steps 7 and 8.

[0056] Figure 4 It is a large-span multi-optical axis parallelism testing device for implementing example steps 9 and 10.

[0057] Figure 5 It is a large-span multi-optical axis parallelism testing device for implementing example step 11.

[0058] Figure Label: 1, laser emitter; 2, round hole target; 3, collimator; 4, first adjustment support; 5, light splitter; 6, second adjustment support; 7, first prism; 8, third adjustment support; 9, third mirror; 10, fourth adjustment support; 11, second prism; 12, fifth adjustment support; 13, whiteboard; 14, second mirror; 15, first mirror; 16, halogen lamp; 17, optoelectronic system to be tested. DETAILED DESCRIPTION

[0059] The application will be further described in detail below with reference to the accompanying drawings and examples. It can be understood that the specific examples described herein are only used to explain the related application, and not to limit the application. In addition, it should be noted that only the parts related to the application are shown in the drawings for ease of description.

[0060] It should be noted that the examples in the application and the features in the examples can be combined with each other without conflict. The application will be described in detail below with reference to the accompanying drawings and examples.

[0061] Embodiment 1

[0062] Reference is made to Figure 1 A first embodiment of a large-span multi-optical-axis parallelism testing device provided by the present application is shown in the structural schematic diagram, which comprises:

[0063] The to-be-tested optoelectronic system 17 comprises at least two to-be-tested loads;

[0064] The emitting unit is configured to emit a first light beam to the collimator 3;

[0065] The collimator 3 has an objective lens capable of reflecting the first light beam to form a second light beam; the second light beam can be incident on any to-be-tested load in the to-be-tested optoelectronic system 17;

[0066] The calibration unit is located between the collimator 3 and the to-be-tested optoelectronic system 17; the calibration unit comprises a first to-be-calibrated lens group, a second to-be-calibrated lens group and a mirror group;

[0067] If the first to-be-calibrated lens group receives the second light beam and can reflect it back to the emitting unit along the incident light path, a first calibration position is formed in the first to-be-calibrated lens group;

[0068] The second to-be-calibrated lens group comprises a whiteboard 13; if the whiteboard 13 can receive the light beam emitted by the first to-be-calibrated lens group and the light beam emitted by the second to-be-calibrated lens group via the second to-be-calibrated lens group, and the light spots of the two light beams coincide, a second calibration position is formed in the second to-be-calibrated lens group at this time;

[0069] The mirror group comprises a first mirror 15 and a second mirror 14, which are respectively arranged at the first calibration position and the second calibration position; the first mirror 15 and the second mirror 14 cooperate to emit a light beam parallel to the second light beam to another to-be-tested load, so that the two to-be-tested loads can receive light beams parallel to each other.

[0070] In this embodiment, the emitting unit is configured to emit a first light beam to the collimator 3; the first light beam is reflected by the objective lens in the collimator 3 to form a second light beam; here, the type of the collimator 3 is, for example, a reflective collimator; the types of the first light beam and the second light beam are, for example, laser beams, which are convenient for position calibration of optical elements in the device by using the directionality of the laser beams, so as to construct a parallel light path;

[0071] The second light beam can be incident on any to-be-tested load in the to-be-tested optoelectronic system 17 and the calibration unit; the second light beam is used for position calibration of optical devices of the calibration unit, and at the same time, the second light beam can be incident on any to-be-tested load in the to-be-tested optoelectronic system 17;

[0072] The calibration unit comprises a first to-be-calibrated lens group, a second to-be-calibrated lens group and a plane mirror group;

[0073] The first calibration lens group and the second calibration lens group cooperate with each other to determine the first calibration position and the second calibration position, and construct a parallel light path of the light beam;

[0074] As shown in Figure 3 and Figure 4 , the mirror group comprises a first mirror 15 and a second mirror 14, and the two are respectively arranged at the first calibration position and the second calibration position; the types of the first mirror 15 and the second mirror 14 are, for example, plane mirrors; based on the completion of the construction of the parallel light path of the light beam, the mirrors are used to replace the optical elements in the original light path, and the beam splitting of the parallel light tube 3 light beam can be obtained.

[0075] After the parallel light path is constructed, the first mirror 15 can receive the second light beam and reflect it to the second mirror 14; since the second calibration position is close to another to-be-measured load, the second mirror 14 will reflect a light beam parallel to the second light beam to another to-be-measured load, so that the two to-be-measured loads can receive light beams parallel to each other, thereby realizing the parallelism of the optical axes of the two loads with large span.

[0076] As shown in Figure 1 , specifically, the first to-be-calibrated lens group comprises:

[0077] The first adjusting support 4 is the first calibration position, and the first adjusting support 4 is used for carrying the beam splitter 5 or the first mirror 15; the first calibration position is the position of the first mirror 15 replacing the optical element;

[0078] The beam splitter 5 is arranged on the first adjusting support 4; the beam splitter 5 is used for receiving the second light beam, and the beam splitter 5 can transmit and reflect the second light beam; here, the type of the beam splitter 5 is, for example, a cubic beam splitter, which has a beam splitting characteristic and can realize self-collimation of the light beam according to the self-collimation principle;

[0079] The second adjusting support 6 is arranged on the side of the first adjusting support 4 away from the parallel light tube 3, and the second adjusting support 6 is used for carrying the first prism 7;

[0080] The first prism 7 is arranged on the second adjusting support 6; the first prism 7 is used for receiving the transmitted light beam of the beam splitter 5 and reflecting it to the third mirror 9 or the whiteboard 13; here, the type of the first prism 7 is, for example, a five-prism, which has a 90° light turning characteristic;

[0081] The application mainly utilizes the 90° light turning characteristic of the five-prism, the light splitting characteristic of the cubic beam splitter and the self-collimation principle to construct the laser parallel light path.

[0082] The third adjusting support 8 is arranged along the perpendicular line of the connecting line between the first adjusting support 4 and the second adjusting support 6, and the third adjusting support 8 is used for bearing the third mirror 9;

[0083] The third mirror 9 is arranged on the third adjusting support 8, and the third mirror 9 is used for receiving the reflected light beams of the beam splitter 5 and the first prism 7 and reflecting the two light beams back to the circular hole target 2 along the incident light path to realize the self-collimation of the light beams;

[0084] The third adjusting support 8 is adjusted to make the laser emitted by the first prism 7 reflected by the third mirror 9 and then returned to the circular hole target 2 along the incident light path, so that the self-collimation of the light beam is realized; the first adjusting support 4 is adjusted to make the laser reflected by the beam splitter 5 reflected back to the circular hole target 2 along the original light path after being incident to the third mirror 9, so that the self-collimation of the light beam is realized.

[0085] As shown in Figure 2 , specifically, the second to-be-calibrated mirror group includes:

[0086] The fourth adjusting support 10 is a second calibration position, and the fourth adjusting support 10 is used for bearing the second prism 11 or the second mirror 14; the second calibration position is a position for replacing the optical element by the second mirror 14;

[0087] The second prism 11 is arranged on the fourth adjusting support 10, and the second prism 11 can receive the reflected light beam of the beam splitter 5 and reflect it to the white board 13; here, the type of the second prism 11 is, for example, a five-prism;

[0088] The fifth adjusting support 12 is arranged on the exit light path of the second prism 11, and the fifth adjusting support 12 is used for supporting the white board 13;

[0089] The light beam reflected by the beam splitter 5 enters the second prism 11 and is turned out to the direction of the white board 13; at the same time, the two light beams emitted by the first prism 7 and the second prism 11 can be incident to the white board 13 together, and the light spots of the two light beams are strictly overlapped on the white board 13.

[0090] As shown in Figure 1 , the emission unit includes:

[0091] The laser emitter 1 is used for emitting the first light beam; the type of the laser emitter is, for example, an alignment laser;

[0092] The circular hole target 2 is arranged corresponding to the laser emitter 1, the first light beam is incident on the collimator 3 through the circular hole target 2, and the incident angle of the laser emitter 1 to the circular hole target 2 can be adjusted, and the circular hole target 2 at the focal plane can be replaced by a photosensitive paper or a thermal target or other materials that can be inducted by laser. The application can be applied to the multi-optical axis parallelism test of different types of photoelectric systems through the adjustment of the adjusting bracket and the replacement of the target surface light source and the target.

[0093] The application also provides a test method based on the above large-span multi-optical axis parallelism test device, which comprises the following steps:

[0094] S1, placing any to-be-tested load in the to-be-tested photoelectric system 17 in a target range, the target range being the reflection range of the collimator 3, to ensure that the collimator 3 can emit parallel light beams to the to-be-tested load;

[0095] S2, adjusting the laser emitter 1 and the circular hole target 2 so that the first light beam can be incident on the collimator 3 through the circular hole target 2; the collimator 3 reflects the first light beam after receiving it to form a second light beam, and the second light beam is used for position calibration of the optical elements in the calibration unit;

[0096] S3, placing the first calibration mirror group at a first set position, the first set position being on the exit light path of the second light beam, i.e., placing the first adjusting bracket 4 and the second adjusting bracket 6 in turn at positions close to each other in the light exit path of the collimator 3; wherein the third adjusting bracket 8 needs to be set according to the positions of the first adjusting bracket 4 and the second adjusting bracket 6;

[0097] S4, adjusting the position of the first calibration mirror group, adjusting the positions, heights and angles of the first adjusting bracket 4, the second adjusting bracket 6 and the third adjusting bracket 8 so that the third reflecting mirror 9 can reflect the received reflected light emitted by the beam splitter 5 and the first prism 7 back to the circular hole target 2 along the incident direction, which is used for realizing self-collimation of the light beam;

[0098] S5, placing the second calibration mirror group at a set position, the set position being close to one side of another to-be-tested load in the to-be-tested photoelectric system 17;

[0099] Wherein, the placement positions of the fourth adjusting bracket 10 and the fifth adjusting bracket 12 need to be close to the same straight line as the above to-be-tested load position relationship.

[0100] S6, adjusting the position of the second calibration mirror group, adjusting the positions, heights and angles of the fourth adjusting bracket 10 and the fifth adjusting bracket 12 so that the light beams emitted by the first calibration mirror group can be incident on the white board 13, and the light spots are strictly overlapped, then marking the overlapped positions to form initial light spot marking points; the light beams emitted by the first calibration mirror group include the light beams reflected by the first prism 7 and the light beams reflected by the second prism 11.

[0101] S7, remove the second prism 11, and place the second mirror 14 at the second calibration position, to ensure that the second mirror can reflect parallel light beams to the load to be measured, that is, place the second mirror 14 on the fourth adjusting support 10, and the second mirror can receive the second light beam emitted by the collimator 3;

[0102] S8, adjust the position of the second mirror 14 so that the light beam emitted through the second mirror 14 can be incident on the whiteboard 13, and the light spot thereof strictly coincides with the light spot of the light beam emitted by the first calibration mirror group on the whiteboard 13;

[0103] As shown in the adjustment process, by adjusting the position, height and angle of the fourth adjusting support 10, the light beam reflected by the second mirror 14 can be transmitted along the original light path, and the light spot thereof still coincides with the light spot of the light beam emitted by the first prism 7 at the whiteboard 13. Figure 3 S9, remove the beam splitter 5, and place the first mirror 15 at the first calibration position, which is used to receive the second light beam subsequently, that is, place the first mirror 15 on the first adjusting support 4, and the first mirror 15 can emit a light beam to the second mirror, and the light beam emitted by the second mirror 14 after adjustment can be parallel to the light beam emitted by the collimator 3.

[0104] S10, adjust the position of the first mirror 15 so that the first mirror 15 can receive the second light beam, and cooperate with the second mirror 14 to reflect the second light beam to the whiteboard 13, and make the emitted light spot coincide with the initial light spot mark point;

[0105] As shown in the adjustment process, by adjusting the position, height and angle of the first adjusting support 4, the light beam reflected by the first mirror 15 can be transmitted to the whiteboard 13 along the original light path, and the light spot position is unchanged at the whiteboard 13, that is, coincides with the initial light spot mark point.

[0106] Figure 4 S11, remove the second adjusting support 6, the fifth adjusting support 12, the first prism 7 and the whiteboard 13;

[0107] At this time, the first mirror 15 and the second mirror 14 form a beam splitting light path, and the light beam emitted by the second mirror 14 is parallel to the light beam emitted by the collimator 3;

[0108] According to the adjustment in the above steps, the span between the beam splitting light path and the light path emitted by the collimator 3 can be adjusted in time to realize the parallelism of the optical axes of different span photoelectric loads tested in time, and the beam splitting light path can be increased to realize the parallelism of the optical axes of multiple photoelectric loads to be tested of different spans at the same time.

[0109] According to the adjustment in the above steps, the span between the beam splitting light path and the light path emitted by the collimator 3 can be adjusted in time to realize the parallelism of the optical axes of different span photoelectric loads tested in time, and the beam splitting light path can be increased to realize the parallelism of the optical axes of multiple photoelectric loads to be tested of different spans at the same time. ​

[0110] Optionally, the subsequent replaceable laser emitter 1 is another light emitting element, the type of which is not limited, such as Figure 5 The other light emitting element is, for example, a halogen lamp 16. In addition, the position and angle of the light receiving system 17 to be measured can be adjusted, which can be used for testing the parallelism of the optical axes between different spectral imagers.

[0111] Specifically, step S3 comprises:

[0112] S31, placing the first adjusting support 4 and the second adjusting support 6 along the light path of the collimator 3;

[0113] S32, placing the light splitter 5 on the first adjusting support 4 and placing the first prism 7 on the second adjusting support 6; the light splitter 5 can emit a transmitted light beam and a reflected light beam after receiving the second light beam;

[0114] S33, placing the third adjusting support 8 on a line perpendicular to the line between the first adjusting support 4 and the second adjusting support 6;

[0115] S34, placing the third reflecting mirror 9 on the third adjusting support 8, so that the third reflecting mirror 9 can receive the emitted light of the light splitter 5 and the first prism 7, and through adjustment, the third reflecting mirror 9 can reflect the two light beams back to the circular hole target 2 along the incident light path, realizing the self-collimation of the light beams;

[0116] Specifically, step S5 comprises:

[0117] S51, removing the third adjusting support 8 and the third reflecting mirror 9;

[0118] S52, placing the fourth adjusting support 10 on the reflected light exit light path of the light splitter 5 and placing the fifth adjusting support 12 on the exit light path of the first prism 7;

[0119] S53, placing the second prism 11 on the fourth adjusting support 10 and placing the whiteboard 13 on the fifth adjusting support 12.

[0120] The above description is only the preferred embodiment of the present application and the explanation of the applied technical principles. Those skilled in the art should understand that the scope of the invention involved in the present application is not limited to the technical solutions formed by the specific combination of the above technical features, and should also cover other technical solutions formed by any combination of the above technical features or their equivalent features without departing from the inventive concept. For example, the above features can be replaced with the technical features disclosed in the present application (but not limited to) having similar functions to form technical solutions.

Claims

1. A large-span multi-optical-axis parallelism testing device, characterized in that, The utility model relates to a kind of optical-electricity system calibration device, including: To be measured optical-electricity system (17), the to be measured optical-electricity system (17) includes at least two to be measured load; Emitting unit, the emitting unit is used to emit first light beam to collimator (3); Collimator (3), the collimator (3) has objective lens, the objective lens can reflect the first light beam, form second light beam;Second light beam can be incident to any to be measured load in the to be measured optical-electricity system (17); Calibration unit, the calibration unit is between collimator (3) and to be measured optical-electricity system (17);The calibration unit includes first to be calibrated mirror group, second to be calibrated mirror group and mirror group; If the first to be calibrated mirror group receives second light beam, and can be reflected along incident light path back to the emitting unit, then first calibration position is formed in the first to be calibrated mirror group; The second to be calibrated mirror group includes whiteboard (13), if the whiteboard (13) can receive the light beam that the first to be calibrated mirror group emits and its light beam that emits via second to be calibrated mirror group, and two light spot coincidences, then second calibration position is formed in the second to be calibrated mirror group at this time; The mirror group includes first mirror (15) and second mirror (14), and they are respectively arranged at first calibration position and second calibration position;The first mirror (15) and second mirror (14) cooperate, for emitting light beam parallel to second light beam to another to be measured load, so that two to be measured load can receive mutually parallel light beam.

2. The parallelism testing device for large-span multi-optical-axle according to claim 1, characterized in that, The first to be calibrated mirror group includes: First adjusting support (4), the first adjusting support (4) is the first calibration position; Beam splitter (5), the beam splitter (5) is arranged on the first adjusting support (4);The beam splitter (5) is used to receive the second light beam; Second adjusting support (6), the second adjusting support (6) is arranged on the side of first adjusting support (4) away from collimator (3); First prism (7), the first prism (7) is arranged on the second adjusting support (6);The first prism (7) is used to receive the transmission light beam of beam splitter (5); Third adjusting support (8), the third adjusting support (8) is arranged along the line perpendicular to the line between the first adjusting support (4) and the second adjusting support (6); Third mirror (9), the third mirror (9) is arranged on the third adjusting support (8);The third mirror (9) is used to receive the reflected light beam of beam splitter (5) and first prism (7), and reflect two light beams along its incident light path back to the emitting unit.

3. The parallelism testing device of claim 2, wherein, The second to be calibrated mirror group also includes: Fourth adjusting support (10), the fourth adjusting support (10) is arranged on the reflection light path of beam splitter (5);The fourth adjusting support (10) is second calibration position; Second prism (11), the second prism (11) is arranged on the fourth adjusting support (10);The second prism (11) can receive the reflected light beam of beam splitter (5) and can reflect it to the whiteboard (13); A fifth adjusting support (12) is arranged on the light exit path of the second prism (11), and the fifth adjusting support (12) is used for carrying the whiteboard (13).

4. The parallelism testing device for large-span multi-optical-axle according to claim 3, characterized in that, The transmitting unit comprises: A laser transmitter (1) is used for transmitting a first light beam; A circular hole target (2) is arranged corresponding to the laser transmitter (1); the first light beam is incident on the collimator (3) through the circular hole target (2).

5. A method for testing the parallelism of a large-span multi-optical-axis, characterized in that, The large-span multi-optical-axis parallelism testing device of claim 4 comprises the following steps: S1, placing any to-be-tested load in the to-be-tested optoelectronic system (17) in a target range, the target range being the reflection range of the collimator (3); S2, adjusting the laser transmitter (1) and the circular hole target (2) so that the first light beam can be incident on the collimator (3) through the circular hole target (2); S3, placing the first calibration mirror group at a first set position, the first set position being on the light exit path of the second light beam; S4, adjusting the position of the first calibration mirror group so that the first calibration mirror group can reflect the received second light beam back to the circular hole target (2) along the incident direction; S5, placing the second calibration mirror group at a second set position, the second set position being close to another to-be-tested load in the to-be-tested optoelectronic system (17); S6, adjusting the position of the second calibration mirror group so that the light beams emitted by the first calibration mirror group can be incident on the whiteboard (13), and the light spots coincide, and the coincident position is marked to form an initial light spot marking point; S7, removing the second prism (11) and placing a second reflecting mirror (14) at a second calibration position; S8, adjusting the position of the second reflecting mirror (14) so that the light beam emitted through the second reflecting mirror (14) can be incident on the whiteboard (13), and the light spot coincides with the light spot of the light beam emitted by the first calibration mirror group; S9, removing the beam splitter (5) and placing a first reflecting mirror (15) at a first calibration position; S10, adjusting the position of the first reflecting mirror (15) so that the first reflecting mirror (15) can receive the second light beam and reflect it to the whiteboard (13) in cooperation with the second reflecting mirror (14), so that the emitted light spot coincides with the initial light spot marking point; S11, removing the second adjusting support (6), the fifth adjusting support (12), the first prism (7) and the whiteboard (13).

6. The method of claim 5, wherein the method is a method of testing parallelism of a large-span multi-optical-axis, and The step S3 comprises the following steps: S31, placing the first adjusting support (4) and the second adjusting support (6) in sequence along the light exit direction of the second light beam; S32, placing the beam splitter (5) on the first adjusting support (4) and placing the first prism (7) on the second adjusting support (6); S33, placing the third adjusting support (8) on the perpendicular line of the connecting line between the first adjusting support (4) and the second adjusting support (6); S34, placing the third reflecting mirror (9) on the third adjusting support (8) so that the third reflecting mirror (9) can receive the reflected light beams of the beam splitter (5) and the first prism (7).

7. The method of claim 6, wherein the method is a method of testing parallelism of a large-span multi-optical-axis, and The step S5 comprises the following steps: S51, removing the third adjusting support (8) and the third mirror (9); S52, placing the fourth adjusting support (10) on the reflected light path of the beam splitter (5); S53, placing the fifth adjusting support (12) on the emergent light path of the first prism (7); S54, placing the second prism (11) on the fourth adjusting support (10), and placing the whiteboard (13) on the fifth adjusting support (12).

Citation Information

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