Line recognition device and display device

Abstract

A kind of line identification device and display device, the line identification device has multiple pixel units, and include substrate substrate, drive circuit layer, photosensitive element layer and lens layer.Drive circuit layer is arranged on substrate substrate, photosensitive element layer is arranged on substrate substrate, lens layer is arranged on the side of photosensitive element layer away from substrate substrate, at least one pixel unit in multiple pixel units includes pixel drive circuit arranged in drive circuit layer, multiple photosensitive elements arranged in photosensitive element layer and multiple lens units arranged in lens layer, pixel drive circuit is electrically connected with multiple photosensitive elements, to drive multiple photosensitive elements, in the direction perpendicular to the board surface of substrate substrate, multiple photosensitive elements and multiple lens units one-to-one correspond and overlap.The line identification device has better line identification effect.

Description

Technical Field

[0001] Embodiments of this disclosure relate to a texture recognition device and a display device. Background Technology

[0002] Due to the uniqueness of skin patterns such as fingerprints or palm prints, texture recognition technology combined with optical imaging is increasingly being adopted by various electronic products for functions such as identity verification and electronic payments. Current electronic products, such as mobile phones and tablets, are developing towards larger and full-screen displays. Therefore, how to design more optimized texture recognition devices and improve the user's texture recognition experience is a key focus in this field. Summary of the Invention

[0003] At least one embodiment of this disclosure provides a texture recognition device having a plurality of pixel units and including a substrate, a driving circuit layer, a photosensitive element layer, and a lens layer. The driving circuit layer is disposed on the substrate, the photosensitive element layer is disposed on the substrate, and the lens layer is disposed on the side of the photosensitive element layer away from the substrate. At least one of the plurality of pixel units includes a pixel driving circuit disposed in the driving circuit layer, a plurality of photosensitive elements disposed in the photosensitive element layer, and a plurality of lens units disposed in the lens layer. The pixel driving circuit is electrically connected to the plurality of photosensitive elements to drive the plurality of photosensitive elements. In a direction perpendicular to the surface of the substrate, the plurality of photosensitive elements and the plurality of lens units correspond one-to-one and overlap.

[0004] For example, in the texture recognition device provided in at least one embodiment of this disclosure, the at least one pixel unit includes a plurality of photosensitive elements arranged in an N*M array, where M is a positive integer greater than or equal to 1 and N is a positive integer greater than 1.

[0005] For example, in the texture recognition device provided in at least one embodiment of this disclosure, M is 2, N is 2, and the at least one pixel unit includes a plurality of photosensitive elements arranged in a 2*2 array.

[0006] For example, the texture recognition device provided in at least one embodiment of this disclosure further includes at least one aperture layer, the at least one aperture layer including a first aperture layer, wherein the first aperture layer is disposed between the photosensitive element layer and the lens layer, and includes a plurality of first light-transmitting openings, wherein in a direction perpendicular to the surface of the substrate, the plurality of first light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap.

[0007] For example, in the texture recognition device provided in at least one embodiment of this disclosure, in the direction parallel to the surface of the substrate, the diameter of each of the plurality of first light-transmitting openings is D1, then 2μm≤D1≤50μm.

[0008] For example, in at least one embodiment of the texture recognition device provided in this disclosure, the material of the first aperture layer is a light-absorbing material.

[0009] For example, in the texture recognition device provided in at least one embodiment of this disclosure, the thickness of the first aperture layer is 1μm-3μm in the direction perpendicular to the surface of the substrate, and the distance between the first aperture layer and the photosensitive element layer is 5μm-20μm.

[0010] For example, at least one embodiment of the texture recognition device provided in this disclosure further includes a second aperture layer, wherein the second aperture layer is disposed between the first aperture layer and the lens layer, and includes a plurality of second light-transmitting openings, wherein in a direction perpendicular to the surface of the substrate, the plurality of second light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap.

[0011] For example, in the texture recognition device provided in at least one embodiment of this disclosure, in a direction parallel to the surface of the substrate, the diameter of each of the plurality of first light-transmitting openings is D1, and the diameter of each of the plurality of second light-transmitting openings is D2, then 2μm≤D1≤D2≤50μm.

[0012] For example, in the texture recognition device provided in at least one embodiment of this disclosure, the thickness of the second aperture layer is 1μm-3μm in the direction perpendicular to the surface of the substrate, and the distance between the second aperture layer and the first aperture layer is 5μm-20μm.

[0013] For example, at least one embodiment of the texture recognition device provided in this disclosure further includes a light filter layer disposed between the photosensitive element layer and the first aperture layer, the light filter layer being configured to transmit light with a wavelength of 580nm to 850nm.

[0014] For example, at least one embodiment of the texture recognition device provided in this disclosure further includes a field stop layer disposed between the photosensitive element layer and the light filter layer. The field stop layer includes a plurality of third light-transmitting openings, and in a direction perpendicular to the surface of the substrate, the plurality of third light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap.

[0015] For example, in the texture recognition device provided in at least one embodiment of this disclosure, in the direction parallel to the surface of the substrate, the diameter of each of the plurality of third light-transmitting openings is D3, then 2μm≤D3≤10μm.

[0016] For example, in at least one embodiment of the texture recognition device provided in this disclosure, the thickness of the field stop layer is 300nm to 500nm in the direction perpendicular to the surface of the substrate.

[0017] For example, in at least one embodiment of the texture recognition device provided in this disclosure, the material of the field stop layer includes a metallic material.

[0018] For example, in the texture recognition device provided in at least one embodiment of this disclosure, for a lens unit, a first light-transmitting opening, a second light-transmitting opening and a third light-transmitting opening corresponding to the same photosensitive element in a direction perpendicular to the surface of the substrate, the orthogonal projection of the center of the lens unit on the substrate overlaps with the orthogonal projection of the center of the first light-transmitting opening on the substrate, overlaps with the orthogonal projection of the center of the second light-transmitting opening on the substrate, and overlaps with the orthogonal projection of the third light-transmitting opening on the substrate.

[0019] For example, in the texture recognition device provided in at least one embodiment of this disclosure, the angle between the light rays entering the lens unit through the edge of the lens unit and along the direction perpendicular to the surface of the substrate and the normal to the surface of the lens unit away from the substrate at the point of incidence is θ1. The light rays, after being refracted by the lens unit, enter the center of the third light-transmitting opening, and the angle between the light rays and the normal is θ2, and the angle between the light rays and the direction perpendicular to the surface of the substrate is θ3. The refractive index of air is n1, the refractive index of the lens unit is n2, the distance between the surface of the lens unit near the substrate and the surface of the second aperture layer away from the substrate is h1, the distance between the surface of the second aperture layer near the substrate and the surface of the first aperture layer away from the substrate is h2, the distance between the surface of the first aperture layer near the substrate and the surface of the field aperture layer away from the substrate is h3, and the distance between the surface of the lens unit near the substrate and the surface of the field aperture layer near the substrate is h4, then:

[0020] n1*sinθ1=n2*sinθ2;

[0021] D1 = (h4 - h1 - h2) * tanθ3 * 2.

[0022] For example, in the texture recognition device provided in at least one embodiment of this disclosure,

[0023] D2=(h4-h1)*tanθ3*2.

[0024] For example, in at least one embodiment of the texture recognition device provided in this disclosure, the angle between the light rays entering the lens unit through the edge of the lens unit at an angle of less than 90 degrees with the direction perpendicular to the surface of the substrate and the normal to the surface of the lens unit away from the substrate at the point of incidence is θ4. The light rays, after being refracted by the lens unit, enter the edge of the third light-transmitting opening at an angle of θ5 with the normal and θ6 with the direction perpendicular to the surface of the substrate. The diameter of the lens unit is D0. Then:

[0025] n1*sinθ4=n2*sinθ5;

[0026] D3=(h4*tanθ6-D0 / 2)*2.

[0027] For example, in the texture recognition device provided in at least one embodiment of this disclosure, for a lens unit, a first light-transmitting opening, a second light-transmitting opening and a third light-transmitting opening corresponding to the same photosensitive element in a direction perpendicular to the surface of the substrate, the orthogonal projection of the center of the lens unit on the substrate does not overlap with the orthogonal projection of the center of the first light-transmitting opening on the substrate, does not overlap with the orthogonal projection of the center of the second light-transmitting opening on the substrate, and does not overlap with the orthogonal projection of the center of the third light-transmitting opening on the substrate.

[0028] For example, in the texture recognition device provided in at least one embodiment of this disclosure, the distance between the orthographic projection of the center of the first light-transmitting opening on the substrate and the orthographic projection of the center of the second light-transmitting opening on the substrate is 1μm-5μm; the distance between the orthographic projection of the center of the first light-transmitting opening on the substrate and the orthographic projection of the center of the third light-transmitting opening on the substrate is 1μm-5μm.

[0029] For example, in at least one embodiment of the texture recognition device provided in this disclosure, the angle between the light rays entering the lens unit through the first edge of the lens unit at a first angle with the direction perpendicular to the surface of the substrate and the normal to the surface of the lens unit away from the substrate at the point of incidence is θ11. The light rays refracted by the lens unit enter the center of the third light-transmitting opening, with an angle of θ12 with the normal and an angle of θ13 with the direction perpendicular to the surface of the substrate. The angle between the light rays entering the lens unit through the second edge of the lens unit opposite to the first edge at the first angle with the direction perpendicular to the surface of the substrate and the normal to the surface of the lens unit away from the substrate at the point of incidence is θ14. The light rays refracted by the lens unit... The light enters the center of the third light-transmitting opening, with an angle of θ15 to the normal and an angle of θ16 to the direction perpendicular to the surface of the substrate. The refractive index of air is n1, the refractive index of the lens unit is n2, the distance between the surface of the lens unit near the substrate and the surface of the second aperture layer away from the substrate is h1, the distance between the surface of the second aperture layer near the substrate and the surface of the first aperture layer away from the substrate is h2, the distance between the surface of the first aperture layer near the substrate and the surface of the field aperture layer away from the substrate is h3, the distance between the surface of the lens unit near the substrate and the surface of the field aperture layer near the substrate is h4, and the diameter of the lens unit is D0. Then:

[0030] n1*sinθ11=n2*sinθ12;

[0031] n1*sinθ14=n2*sinθ15;

[0032] D1=D0-(h1+h2)*tanθ13-(h1+h2)*tanθ16.

[0033] For example, in the texture recognition device provided in at least one embodiment of this disclosure,

[0034] D2=D0-h1*tanθ13-h1*tanθ16.

[0035] For example, in at least one embodiment of the texture recognition device provided in this disclosure, light rays entering the lens unit through the first edge of the lens unit at a second angle to the direction perpendicular to the surface of the substrate are refracted by the lens unit and then enter the edge of the third light-transmitting opening, with the refracted light rays forming an angle θ17 with the direction perpendicular to the surface of the substrate, the second angle being greater than the first angle. Similarly, light rays entering the lens unit through the second edge of the lens unit opposite to the first edge at a second angle to the direction perpendicular to the surface of the substrate are refracted by the lens unit and then enter the edge of the third light-transmitting opening, with the refracted light rays forming an angle θ18 with the direction perpendicular to the surface of the substrate. Then:

[0036] D3=h4*(tanθ17+tanθ18)-D0.

[0037] For example, at least one embodiment of the texture recognition device provided in this disclosure further includes a planarization layer disposed on the side of the lens layer away from the substrate, wherein the refractive index of the material of the planarization layer is 1.35 to 1.45.

[0038] For example, in the texture recognition device provided in at least one embodiment of this disclosure, each of the plurality of lens units has a radius of curvature of 5μm to 20μm and a diameter of 25μm to 35μm.

[0039] For example, in the texture recognition device provided in at least one embodiment of this disclosure, each of the plurality of lens units is substantially circular, square, or rectangular in shape.

[0040] For example, in the texture recognition device provided in at least one embodiment of this disclosure, the refractive index of the material of the lens layer is 1.6 to 1.7.

[0041] At least one embodiment of this disclosure also provides a display device, which includes a display panel and a texture recognition device provided in the embodiments of this disclosure. The display panel has a display side and a non-display side, and allows light to pass through from the display side to the non-display side. The texture recognition device is disposed on the non-display side of the display panel and configured to receive light passing through from the display side to the non-display side for texture recognition. The lens layer is closer to the display panel than the photosensitive element layer. Attached Figure Description

[0042] To more clearly illustrate the technical solutions of the embodiments of this disclosure, the accompanying drawings of the embodiments will be briefly described below. Obviously, the drawings described below only relate to some embodiments of this disclosure and are not intended to limit this disclosure.

[0043] Figure 1A plan view of a texture recognition device provided in at least one embodiment of the present disclosure, and a cross-sectional view obtained by cutting along the MM line in the plan view;

[0044] Figure 2 This is a planar schematic diagram of the first aperture layer, the first aperture layer, and the field aperture layer in a texture recognition device provided in at least one embodiment of the present disclosure;

[0045] Figure 3 This is a planar schematic diagram of a plurality of lens units in a texture recognition device provided in at least one embodiment of the present disclosure;

[0046] Figure 4A for Figure 1 and Figure 2 A schematic diagram of the propagation path of signal light in the texture recognition device;

[0047] Figure 4B Another schematic diagram of the signal light propagation path in a texture recognition device provided in at least one embodiment of this disclosure;

[0048] Figure 4C This is another schematic diagram of the signal light propagation path in a texture recognition device provided in at least one embodiment of the present disclosure;

[0049] Figure 5 Another plan view of the texture recognition device provided in at least one embodiment of the present disclosure, and a cross-sectional view obtained by cutting along the MM line in the above plan view;

[0050] Figure 6 Another planar schematic diagram of the first aperture layer, the first aperture layer, and the field aperture layer in the texture recognition device provided in at least one embodiment of the present disclosure;

[0051] Figure 7A for Figure 5 and Figure 6 A schematic diagram of the propagation path of signal light in the texture recognition device.

[0052] Figure 7B for Figure 5 and Figure 6 Another schematic diagram of the propagation path of signal light in the texture recognition device;

[0053] Figure 7C for Figure 5 and Figure 6 Another schematic diagram of the propagation path of signal light in the texture recognition device;

[0054] Figure 8 This is a cross-sectional schematic diagram of the driving circuit layer and the photosensitive element layer in a texture recognition device provided in at least one embodiment of the present disclosure;

[0055] Figure 9 A circuit diagram of a pixel driving circuit and a photosensitive element in a texture recognition device provided in at least one embodiment of this disclosure; and

[0056] Figure 10 This is a cross-sectional schematic diagram of a display device provided in at least one embodiment of the present disclosure. Detailed Implementation

[0057] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. All other embodiments obtained by those skilled in the art based on the described embodiments of this disclosure without creative effort are within the scope of protection of this disclosure.

[0058] Unless otherwise defined, the technical or scientific terms used in this disclosure shall have the ordinary meaning understood by one of ordinary skill in the art to which this disclosure pertains. The terms “first,” “second,” and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as “comprising” or “including” mean that the element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects. Terms such as “connected” or “linked” are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. Terms such as “upper,” “lower,” “left,” and “right” are used only to indicate relative positional relationships, and these relative positional relationships may change accordingly when the absolute position of the described objects changes.

[0059] In a display device, a texture recognition device can be integrated into the non-display side of the display panel. The display panel is at least partially transparent, allowing the texture recognition device to receive signal light through the panel. Thus, the display device simultaneously possesses display and texture recognition functions. Current display devices typically employ texture recognition devices with multiple pixel units for recognizing signal light and synthesizing texture images. Each pixel unit can utilize a collimating film with a microlens structure as its optical path system to collimate the light incident on the texture recognition device, making the collimated light easier to recognize and improving light utilization. For example, each pixel unit includes a photosensitive element with a corresponding microlens structure to specifically collimate the light incident on it.

[0060] However, the inventors of this disclosure have discovered that due to limitations in the structure and manufacturing process of the collimating film, light collimated by the microlens structure is prone to crosstalk between adjacent pixel units, causing the collimating film to affect the light signal of the texture in a specific scene at a certain angle. On the other hand, since optically transparent adhesive (OCA adhesive) is usually used to bond various structures inside the texture recognition device, air is trapped inside some structures of the texture recognition device. After reliability tests and other experiments, this part is prone to deformation, causing attenuation of the light signal incident on the texture recognition device, making the texture recognition device unable to recognize or inaccurately recognize.

[0061] At least one embodiment of this disclosure provides a texture recognition device and a display device. The texture recognition device has multiple pixel units and includes a substrate, a driving circuit layer, a photosensitive element layer, and a lens layer. The driving circuit layer is disposed on the substrate, the photosensitive element layer is disposed on the substrate, and the lens layer is disposed on the side of the photosensitive element layer away from the substrate. At least one pixel unit includes a pixel driving circuit disposed in the driving circuit layer, multiple photosensitive elements disposed in the photosensitive element layer, and multiple lens units disposed in the lens layer. The pixel driving circuit is electrically connected to the multiple photosensitive elements to drive the multiple photosensitive elements. In a direction perpendicular to the surface of the substrate, the multiple photosensitive elements and the multiple lens units correspond one-to-one and overlap.

[0062] In the texture recognition device provided in the embodiments of this disclosure, at least one pixel unit includes multiple photosensitive elements. These multiple photosensitive elements are driven by the same pixel driving circuit, thereby operating in the same state. The pixel unit can receive sufficient signal light through the multiple photosensitive elements and synthesize a texture image. On the other hand, each of the multiple photosensitive elements has a lens unit corresponding to it, so that each lens unit can perform more precise light collimation for its corresponding photosensitive element, thereby more precisely controlling the propagation direction of the signal light incident on each photosensitive element, avoiding crosstalk and other adverse phenomena between adjacent pixel units, and improving the texture recognition effect of the texture recognition device.

[0063] The texture recognition device and display device provided in at least one embodiment of this disclosure will be described in detail below through several specific embodiments.

[0064] Figure 1 A plan view of a texture recognition device provided in at least one embodiment of this disclosure, and a cross-sectional view obtained by cutting along the MM line in the plan view. Figure 1 The correspondence between the above planar schematic diagram and cross-sectional schematic diagram is shown in the figure. For example... Figure 1As shown, the texture recognition device has multiple pixel units PX (two pixel units PX are shown in the figure as an example), and includes a substrate 10, a driving circuit layer 20, a photosensitive element layer 30, and a lens layer 40.

[0065] For example, such as Figure 1 As shown, the driving circuit layer 20 is disposed on the substrate 10, and the photosensitive element layer 30 is disposed on the substrate 10. Figure 1 The diagram shows that the photosensitive element layer 30 is disposed on the side of the driving circuit layer 20 away from the substrate 10. For example, in other embodiments, the photosensitive element layer 30 may also be disposed on the side of the driving circuit layer 20 closer to the substrate 10 or disposed in the same layer as the driving circuit layer 20, as long as the driving circuit layer 20 does not affect the photosensitivity of the photosensitive element layer 30.

[0066] For example, the lens layer 40 is disposed on the side of the photosensitive element layer 30 away from the substrate 10, and at least one of the plurality of pixel units PX includes a pixel driving circuit disposed in the driving circuit layer 20 (described in detail later) and a plurality of photosensitive elements 301 disposed in the photosensitive element layer 30. Figure 1 Four photosensitive elements 301 are shown as an example) and multiple lens units 401 disposed in the lens layer 40. Figure 1 (As shown in the example, four lens units 401 are illustrated.) The pixel driving circuit is electrically connected to multiple photosensitive elements 301 to drive the multiple photosensitive elements 301. In the direction perpendicular to the surface of the substrate 10, i.e. Figure 1 In the vertical direction, multiple photosensitive elements 301 correspond one-to-one with multiple lens units 401 and overlap.

[0067] Therefore, in the texture recognition device provided in the embodiments of this disclosure, at least one pixel unit includes multiple photosensitive elements electrically connected to the same pixel driving circuit, so that they can be driven by the same pixel driving circuit, and the multiple photosensitive elements are in the same working state under the same pixel driving circuit. The pixel unit can receive sufficient signal light through multiple photosensitive elements and synthesize a texture image. On the other hand, each of the multiple photosensitive elements has a lens unit corresponding to it, so that each lens unit can perform more precise light collimation for its corresponding photosensitive element, thereby more precisely controlling the propagation direction of the signal light incident on each photosensitive element, avoiding crosstalk and other adverse phenomena between adjacent pixel units, improving light utilization, and thus improving the texture recognition effect of the texture recognition device.

[0068] For example, in some embodiments, at least one pixel unit PX includes a plurality of photosensitive elements 301 arranged in an N*M array, where M is a positive integer greater than or equal to 1, and N is a positive integer greater than 1. M and N can be the same or different. For example, in some examples, the plurality of photosensitive elements 301 are arranged in a 2*2 array (i.e., both M and N are 2). Figure 1 (as shown in the diagram), 3x3 array, 4x4 array, or 2x3 array, etc.

[0069] For example, each photosensitive element 301 is island-shaped, and its planar shape can be square, rectangular, or other shapes in the direction parallel to the surface of the substrate 10. For example, when the planar shape of the photosensitive element 301 is square, the side length of the square can be 10μm-20μm, such as 12μm, 15μm, or 18μm.

[0070] For example, in embodiments of this disclosure, the photosensitive element 301 can be a photodiode, such as a PN type or a PIN type. For example, when the photodiode is PN type, the photosensitive element 301 includes a stacked P-type semiconductor layer and an N-type semiconductor layer; when the photodiode is PIN type, the photosensitive element 301 includes a stacked P-type semiconductor layer, an intrinsic semiconductor layer, and an N-type semiconductor layer. For example, the semiconductor material used in the photosensitive element 301 can be silicon, germanium, selenium, gallium arsenide, etc., and the embodiments of this disclosure do not limit this.

[0071] For example, in some embodiments, such as Figure 1 As shown, the planar shape of the multiple lens units 401 can be circular. In this case, the radius of curvature R of each lens unit 401 can be 5μm to 20μm, such as 7μm, 10μm or 15μm, and the diameter D0 of each lens unit 401 can be 25μm to 35μm, such as 27μm, 30μm or 32μm.

[0072] For example, in other embodiments, the planar shape of the plurality of lens units 401 may also be rectangular or square, etc. Figure 3 Another planar schematic diagram of multiple lens units is shown, such as Figure 3 As shown in the example, the planar shape of the multiple lens units 401 is a rounded rectangle. In this case, the radius of curvature R of each lens unit 401 can be 5μm to 20μm, such as 7μm, 10μm or 15μm, and the side length D01 of each lens unit 401 can be 25μm to 35μm, such as 27μm, 30μm or 32μm.

[0073] For example, in some embodiments, the refractive index of the material of the lens layer 40 can be 1.6 to 1.7, such as 1.65. Thus, the multiple lens units 401 can sufficiently refract the light incident upon them, thereby achieving an effective collimation effect and improving the utilization rate of the incident light.

[0074] For example, such as Figure 1 As shown, in some embodiments, the texture recognition device may further include a first aperture layer 50, which is disposed between the photosensitive element layer 30 and the lens layer 40, and includes a plurality of first light-transmitting openings 501. In a direction perpendicular to the surface of the substrate 10, the plurality of first light-transmitting openings 501 correspond one-to-one with and at least partially overlap with the plurality of photosensitive elements 301. The plurality of first light-transmitting openings 501 are respectively used to transmit signal light incident on the plurality of photosensitive elements 301, and to block light at a certain angle (a certain large angle with the surface of the substrate) and unnecessary light such as signal light for adjacent photosensitive elements, for example... Figure 1 The light indicated by the dashed line further prevents adverse phenomena such as signal crosstalk.

[0075] For clarity and simplicity, Figure 1 The plan view does not show a schematic diagram of the plurality of first light-transmitting openings 501 of the first aperture layer 50. Figure 2 A plan view of a plurality of first light-transmitting openings 501 in a first aperture layer 50 of a texture recognition device provided in at least one embodiment of the present disclosure is shown.

[0076] For example, such as Figure 1 and Figure 2 As shown, in some embodiments, in the direction parallel to the surface of the substrate 10, i.e. Figure 1 In the horizontal direction, the diameter of each first light-transmitting opening 501 is D1, then 2μm≤D1≤50μm, for example, D1 is 10μm, 20μm or 30μm, etc.

[0077] For example, in a direction parallel to the surface of the substrate 10, the shape of the plurality of first light-transmitting openings 501 can be rectangular, square, or circular, etc. Figure 1 As shown, when the shape of the plurality of first light-transmitting openings 501 is a square, the above-mentioned D1 can be the side length of the square; in other examples, when the shape of the plurality of first light-transmitting openings 501 is a rectangle, the above-mentioned D1 can be the diagonal length of the rectangle; when the shape of the plurality of first light-transmitting openings 501 is a circle, the above-mentioned D1 can be the diameter of the circle.

[0078] For example, in some embodiments, the material of the first aperture layer 50 can be a light-absorbing material, such as a black matrix material, or a black light-absorbing material formed by adding black dye to a resin material. This can reduce or even eliminate the reflection of light by the first aperture layer 50, thereby avoiding adverse effects of reflected light on texture recognition. For example, the plurality of first light-transmitting openings 501 are filled with transparent resin material to prevent deformation or other adverse phenomena inside the texture recognition device due to air gaps.

[0079] For example, in some embodiments, such as Figure 1 As shown, in the direction perpendicular to the surface of the substrate 10, i.e. Figure 1 In the vertical direction, the thickness H1 of the first aperture layer 50 is 1μm-3μm, such as 1.5μm, 2μm, or 2.5μm. The distance between the first aperture layer 50 and the photosensitive element layer 30 is 5μm-20μm, that is, the distance between the lower surface of the first aperture layer 50 and the upper surface of the photosensitive element layer 30 is 5μm-20μm, such as 10μm, 15μm, or 18μm. With the above configuration, the first aperture layer 50 can effectively achieve the crosstalk prevention function.

[0080] For example, in some embodiments, such as Figure 1 and Figure 2 As shown, the texture recognition device may further include a second aperture layer 60, which is disposed between the first aperture layer 50 and the lens layer 40, and includes a plurality of second light-transmitting openings 601. In a direction perpendicular to the surface of the substrate 10, the plurality of second light-transmitting openings 601 correspond one-to-one with and at least partially overlap with a plurality of photosensitive elements 301. The plurality of second light-transmitting openings 601 are respectively used to transmit signal light incident on the plurality of photosensitive elements 301, and to block light at a certain angle (at a certain angle to the surface of the substrate) and unnecessary light such as signal light for adjacent photosensitive elements, for example... Figure 1 The light indicated by the dashed line can further prevent adverse phenomena such as signal crosstalk.

[0081] For example, such as Figure 1 and Figure 2 As shown, in the direction parallel to the surface of the substrate 10, the diameter of each second light-transmitting opening 601 is D2, then 2μm≤D1≤D2≤50μm, for example, D2 can be 20μm, 30μm or 40μm, etc.

[0082] Similarly, in the direction parallel to the surface of the substrate 10, the shape of the second light-transmitting opening 601 can be rectangular, square, or circular, etc. For example... Figure 1As shown, when the shape of the plurality of second light-transmitting openings 601 is a square, the above-mentioned D2 can be the side length of the square; in other examples, when the shape of the second light-transmitting opening 601 is a rectangle, the above-mentioned D2 can be the diagonal length of the rectangle; when the shape of the second light-transmitting opening 601 is a circle, the above-mentioned D2 can be the diameter of the circle.

[0083] For example, in some embodiments, the material of the second aperture layer 60 can be a light-absorbing material, such as a black matrix material, or a black light-absorbing material formed by adding black dye to a resin material. This can reduce or even eliminate the reflection of light by the second aperture layer 60, thereby preventing reflected light from affecting texture recognition. For example, the plurality of second light-transmitting openings 601 are filled with transparent resin material to prevent deformation or other adverse phenomena inside the texture recognition device due to air gaps.

[0084] For example, in some embodiments, the thickness H2 of the second aperture layer 60 is 1μm-3μm in the direction perpendicular to the surface of the substrate 10, such as 1.5μm, 2μm or 2.5μm, and the distance between the second aperture layer 60 and the first aperture layer 50 is 5μm-20μm, such as 10μm, 15μm or 18μm.

[0085] During fingerprint recognition, in addition to the signal light used for fingerprint recognition, the photosensitive element 301 may also sense ambient light passing through the finger. Since the photosensitive element 301 passively receives light and does not actively distinguish between signal light and ambient light, ambient light may interfere with fingerprint recognition. For example, when ambient light shines directly above the finger, it can pass through the finger and excite pigment light emitted by the finger's biological tissue. This pigment light may interfere with fingerprint recognition. Detection shows that this pigment light mainly includes light with wavelengths in the range of 580nm to 850nm.

[0086] For example, in some embodiments, such as Figure 1 As shown, the texture recognition device may further include a light filter layer 70 disposed between the photosensitive element layer 30 and the first aperture layer 50. The light filter layer 70 is configured to transmit light with wavelengths of 580nm to 850nm, that is, to prevent light with wavelengths of 580nm to 850nm from passing through, thereby preventing the aforementioned pigment light from affecting texture recognition and enabling its use in outdoor and other scenarios. For example, the light filter layer 70 may also be configured to have high transmittance for signal light that can be used for texture recognition. For example, the light filter layer 70 may be configured to have high transmittance for visible light with wavelengths of 400nm to 560nm, so that the photosensitive element 301 can fully receive the signal light. For example, in some embodiments, the light filter layer 70 is a green photoresist layer.

[0087] For example, in some embodiments, transparent resin material is filled between the light filter layer 70 and the first aperture layer 50, between the first aperture layer 50 and the second aperture layer 60, and between the second aperture layer 60 and the lens layer 40 to ensure the distance between different structures and not affect the propagation of signal light.

[0088] For example, in some embodiments, such as Figure 1 and Figure 2 As shown, the texture recognition device may further include a field-view aperture layer 80 disposed between the photosensitive element layer 30 and the light filter layer 70. The field-view aperture layer 80 includes a plurality of third light-transmitting openings 801. In a direction perpendicular to the surface of the substrate 10, the plurality of third light-transmitting openings 801 correspond one-to-one with the plurality of photosensitive elements 301 and at least partially overlap. The plurality of third light-transmitting openings 801 are respectively used to transmit signal light incident on the plurality of photosensitive elements 301 and to block unwanted light at large angles (large angles to the surface of the substrate), for example... Figure 1 The light indicated by the dashed line further prevents adverse phenomena such as signal crosstalk.

[0089] For example, such as Figure 1 and Figure 2 As shown, in the direction parallel to the surface of the substrate 10, the diameter of each third light-transmitting opening 801 is D3, then 2μm≤D3≤10μm, for example, D3 is 5μm, 7μm or 9μm, etc.

[0090] For example, in some embodiments, such as Figure 1 As shown, in the direction perpendicular to the surface of the substrate 10, the thickness H3 of the field stop layer 80 is 300nm to 500nm, such as 350nm, 400nm or 450nm.

[0091] For example, in some embodiments, the field stop layer 80 is made of a metallic material, such as molybdenum, aluminum, titanium, or their alloys. In this case, during the fabrication of the texture recognition device, the field stop layer 80 can be formed together with the driving circuit layer 20 and the photosensitive element layer 30, thereby simplifying the fabrication process of the texture recognition device.

[0092] Through testing, Figure 1 Under the above configuration, the texture recognition device shown can effectively transmit signal light and effectively avoid unnecessary light from affecting texture recognition. For example, by testing the light incident on the texture recognition device, it can be found that the texture recognition device can effectively block unnecessary light with wavelengths in the range of 400nm-850nm, and the transmittance of this unnecessary light is less than 1%, thus fully meeting the requirements of the texture recognition device.

[0093] For example, in some embodiments, such as Figure 1 As shown, the texture recognition device may further include a planarization layer 90 disposed on the side of the lens layer 30 away from the substrate 10. The planarization layer 90 can flatten the unevenness caused by the lens layer 30 and facilitates the bonding of the texture recognition device to other devices, such as to a display panel. For example, in some examples, the planarization layer 90 can be bonded to the display panel using optically transparent adhesive. In this case, because the planarization layer 90 is relatively flat, the optically transparent adhesive has a stronger adhesion to the planarization layer 90 and the display panel.

[0094] For example, in some embodiments, the refractive index of the planarization layer 90 is 1.35 to 1.45, such as 1.40. For example, the planarization layer 90 may comprise an organic material with a refractive index of 1.35 to 1.45. In embodiments of this disclosure, by using a material with a low refractive index to form the planarization layer 90, adverse effects on the propagation of signal light can be avoided, such as preventing unnecessary refraction and reflection of the signal light.

[0095] For example, in some embodiments, such as Figure 1 and Figure 2 As shown, for a first light-transmitting opening 501, a second light-transmitting opening 601, and a third light-transmitting opening 801 corresponding to the same photosensitive element 301 in a direction perpendicular to the surface of the substrate 10, the orthogonal projection of the center of the first light-transmitting opening 501 onto the substrate 10 overlaps with the orthogonal projection of the center of the second light-transmitting opening 601 onto the substrate 10. For example, the orthogonal projection of the center of the first light-transmitting opening 501 onto the substrate 10 also overlaps with the orthogonal projection of the center of the third light-transmitting opening 801 onto the substrate 10. For example, the orthogonal projection of the center of the first light-transmitting opening 501 onto the substrate 10 also overlaps with the orthogonal projection of the center of the photosensitive element 301 onto the substrate 10.

[0096] For example, Figure 4A It shows Figure 1 and Figure 2 The diagram shows the propagation path of the signal light in the texture recognition device. Figure 4A As shown, the signal light used for texture recognition enters the photosensitive element 301 sequentially through the second light-transmitting opening 601, the first light-transmitting opening 501 and the third light-transmitting opening 801, and the signal light entering the photosensitive element 301 from each direction has a similar angular range.

[0097] Figure 4B It shows Figure 1 and Figure 2 Another schematic diagram showing the propagation path of the signal light in the texture recognition device is shown. (See diagram below.) Figure 4BAs shown, the light rays that enter the lens unit 401 through the edge of the lens unit 401 in a direction perpendicular to the surface of the substrate 10 make an angle θ1 with the normal of the lens unit 401 at the point of incidence away from the substrate 10. After being refracted by the lens unit 401, the light rays enter the middle of the third light-transmitting opening 801, and make an angle θ2 with the normal and an angle θ3 with the direction perpendicular to the surface of the substrate 10. The refractive index of air is n1, and the refractive index of the lens unit is n2. The distance between the surface of lens unit 401 near the substrate 10 and the surface of the second aperture layer 60 away from the substrate 10 is h1; the distance between the surface of the second aperture layer 60 near the substrate 10 and the surface of the first aperture layer 50 away from the substrate 10 is h2; the distance between the surface of the first aperture layer 50 near the substrate 10 and the surface of the field aperture layer 80 away from the substrate 10 is h3; and the distance between the surface of lens unit 401 near the substrate 10 and the surface of the field aperture layer 80 near the substrate 10 is h4. Then:

[0098] n1*sinθ1=n2*sinθ2;

[0099] D1 = (h4 - h1 - h2) * tanθ3 * 2;

[0100] D2=(h4-h1)*tanθ3*2.

[0101] Figure 4C It shows Figure 1 and Figure 2 Another schematic diagram of the signal light propagation path in the texture recognition device shown. Figure 4C As shown, a ray of light entering the lens unit 401 through its edge at an angle less than 90 degrees (e.g., 3-10 degrees) to the direction perpendicular to the surface of the substrate 10 (i.e., the vertical direction in the figure) makes an angle θ4 with the normal to the surface of the lens unit 401 away from the substrate 10 at the point of incidence. After refraction by the lens unit 401, the ray enters the edge of the third light-transmitting opening 801 at an angle θ5 with the normal and θ6 with the direction perpendicular to the surface of the substrate 10. The diameter of the lens unit 401 is D0. Then:

[0102] n1*sinθ4=n2*sinθ5;

[0103] D3=(h4*tanθ6-D0 / 2)*2.

[0104] For example, in some other embodiments, Figure 5 A plan view and a cross-sectional view of another texture recognition device are shown. Figure 6 It shows Figure 5A planar schematic diagram of the first, second, and third light-transmitting openings in the texture recognition device. Figures 7A-7C It shows Figure 5 and Figure 6 A schematic diagram of the propagation path of signal light in the texture recognition device.

[0105] and Figures 1-4C The embodiment shown differs from the one described above in that... Figures 5-7C In the illustrated embodiment, for a first light-transmitting opening 501, a second light-transmitting opening 601, and a third light-transmitting opening 801 corresponding to the same photosensitive element 301 in a direction perpendicular to the surface of the substrate 10, the orthogonal projection of the center of the first light-transmitting opening 501 onto the substrate 10 does not overlap with the orthogonal projection of the center of the second light-transmitting opening 601 onto the substrate 10. Similarly, the orthogonal projection of the center of the first light-transmitting opening 501 onto the substrate 10 does not overlap with the orthogonal projection of the center of the third light-transmitting opening 801 onto the substrate 10. Likewise, the orthogonal projection of the center of the second light-transmitting opening 601 onto the substrate 10 does not overlap with the orthogonal projection of the center of the third light-transmitting opening 801 onto the substrate 10. For example, the orthogonal projection of the center of the third light-transmitting opening 801 onto the substrate 10 does not overlap with the orthogonal projection of the center of the photosensitive element 301 onto the substrate 10.

[0106] For example, such as Figure 7B As shown, the light rays entering the lens unit 401 through the first edge (left edge in the figure) at an angle θ10 perpendicular to the surface of the substrate 10 make an angle θ11 with the normal to the surface of the lens unit 401 away from the substrate 10. After being refracted by the lens unit 401, the light rays enter the middle of the third light-transmitting opening 801, making an angle θ12 with the normal and an angle θ13 with the direction perpendicular to the surface of the substrate 10. The light rays entering the lens unit 401 through the second edge (right edge) opposite to the first edge at an angle θ10 perpendicular to the surface of the substrate 10 make an angle θ14 with the normal to the surface of the lens unit 401 away from the substrate 10. After being refracted by the lens unit 401, the light rays enter the middle of the third light-transmitting opening 801, making an angle θ15 with the normal and an angle θ16 with the direction perpendicular to the surface of the substrate 10. but:

[0107] n1*sinθ11=n2*sinθ12;

[0108] n1*sinθ14=n2*sinθ15;

[0109] D1=D0-(h1+h2)*tanθ13-(h1+h2)*tanθ16;

[0110] D2=D0-h1*tanθ13-h1*tanθ16.

[0111] For example, such as Figure 7C As shown, light rays entering lens unit 401 through its first edge (left edge in the figure) at a second angle θ20 perpendicular to the surface of substrate 10 are refracted by lens unit 401 and then enter the edge of the third light-transmitting opening 801. The angle between the refracted light rays and the direction perpendicular to the surface of substrate 10 is θ17. The second angle θ20 is greater than the first angle θ10; for example, the second angle θ20 is 5-15 degrees, and the first angle θ10 is 3-10 degrees. Light rays entering lens unit 401 through its second edge (right edge in the figure) opposite to the first edge at a second angle θ20 perpendicular to the surface of substrate 10 are refracted by lens unit 401 and then enter the edge of the third light-transmitting opening 801. The angle between the refracted light rays and the direction perpendicular to the surface of substrate 10 is θ18. Therefore:

[0112] D3=h4*(tanθ17+tanθ18)-D0.

[0113] For example, in some examples, such as Figure 6 As shown, the center of the first light-transmitting opening 501 is at the orthogonal projection position O1 on the substrate 10, and the center of the second light-transmitting opening 601 is at the orthogonal projection position O2 on the substrate 10. The distance L1 between O1 and O2 is 1μm-5μm, such as 2μm, 3μm or 4μm.

[0114] For example, the center of the third light-transmitting opening 801 is projected onto the substrate 10 at position O3. The distance L2 between the center of the first light-transmitting opening 501 and its projection onto the substrate 10 is 1μm-5μm, such as 2μm, 3μm, or 4μm. Thus, as shown in Figure 7, signal light at a certain angle to the surface of the substrate 10 can sequentially pass through the second light-transmitting opening 601, the first light-transmitting opening 501, and the third light-transmitting opening 801 and enter the photosensitive element 301. Therefore, the texture recognition device can filter the light entering the texture recognition device at a specific angle for texture recognition by configuring the distance between O1, O2, and O3.

[0115] For example, Figure 8 This is a cross-sectional schematic diagram of the driving circuit layer and the photosensitive element layer in the texture recognition device provided in at least one embodiment of the present disclosure. Figure 9 The present disclosure provides a circuit diagram of a pixel driving circuit and a photosensitive element in a texture recognition device according to at least one embodiment.

[0116] For example, each pixel unit PX includes multiple photosensitive elements disposed on the same first electrode E1, so as to be connected to the same pixel driving circuit through the same first electrode E1. In this case, the first electrode E1 can be electrically connected to the pixel driving circuit through a via (i.e., via V1 in the figure) to realize the electrical connection between multiple photosensitive elements P and the same pixel driving circuit. This reduces the number of vias V1 used for electrical connection, facilitates the selection of the position of via V1, and thus benefits the flatness of the pixel driving circuit. On the other hand, at least one pixel unit PX includes multiple photosensitive elements P driven by the same pixel driving circuit, so that they are in the same working state. The pixel unit PX can receive sufficient signal light through multiple photosensitive elements P and synthesize texture images.

[0117] For example, the pixel driving circuit of each pixel unit PX includes at least one thin-film transistor, and may also include structures such as capacitors. Figure 8 and Figure 9 As shown in the example, the pixel driving circuit includes a first thin-film transistor T1, a second thin-film transistor T2, a third thin-film transistor T3, and a capacitor C.

[0118] For example, such as Figure 9 As shown, the first thin-film transistor T1 acts as a switching transistor, with its control terminal connected to the signal scan line Vr. Its first source-drain terminal S1 and second source-drain terminal D1 are connected to the signal readout line Vout and the first source-drain terminal S2 of the second thin-film transistor T2, respectively. The second thin-film transistor T2 acts as a driving transistor, with its control terminal connected to the first source-drain terminal S3 of the third thin-film transistor T3, the first capacitor plate C1 of capacitor C, and the first electrode E1 of photosensitive element 301. Its second source-drain terminal D2 is connected to the power supply line Vdd. The third thin-film transistor T3 acts as a reset transistor, with its control terminal connected to the reset signal line Vrst. Its second source-drain terminal D3 is connected to the power supply line Vdd. The second capacitor plate C2 of capacitor C and the second electrode E2 of photosensitive element 301 are connected to the bias line Vb.

[0119] For example, in Figure 9In the circuit shown, the operation of the photosensitive element 301 includes: First, in the reset phase, a reset signal is input to the control terminal of the third thin-film transistor T3 through the reset signal line Vrst, causing the third thin-film transistor T3 to conduct. The reset signal is written to the first electrode E1 of the photosensitive element 301 and the control terminal of the second thin-film transistor T2. Then, in the photosensitive phase, the photosensitive element 301 generates photogenerated carriers under the illumination of signal light, generating photogenerated leakage current and charging the capacitor C, so that the capacitor C generates and stores an electrical signal. Finally, in the detection phase, a scan signal is input to the control terminal of the first thin-film transistor T1 through the signal scan line Vr, causing the first thin-film transistor T1 to conduct. The texture recognition chip reads the electrical signal stored in the capacitor C from the first thin-film transistor T1 and the second thin-film transistor T2 through the signal readout line Vout, and then forms a texture image.

[0120] For example, Figure 8 Only one thin-film transistor is shown, for example, the second thin-film transistor T2 mentioned above, which includes an active layer AT, a gate G, a source S, and a drain D. For example, the gate G serves as the control terminal of the second thin-film transistor T2, the source S serves as the first source-drain terminal of the second thin-film transistor T2, and the drain D serves as the second source-drain terminal of the second thin-film transistor T2. For example, Figure 2 Another gate G2 is shown, which is the gate of the first thin-film transistor T1. The other structures of the first thin-film transistor T1 and the third thin-film transistor T3 are not shown. Figure 2 The structure is not shown in the figure. For example, the first thin-film transistor T1 and the third thin-film transistor T3 have a structure similar to that of the second thin-film transistor T2. The embodiments of this disclosure do not limit the specific structure of the first thin-film transistor T1, the second thin-film transistor T2 and the third thin-film transistor T3.

[0121] For example, in some embodiments, such as Figure 8 As shown, the texture recognition device further includes an interlayer insulating layer IL, which is disposed between the driving circuit layer 20 and the first electrode layer. The interlayer insulating layer IL includes a via V1, through which the first electrode E1 is electrically connected to the pixel driving circuit, for example, electrically connected to the gate G of the second thin-film transistor T2 in the pixel driving circuit. For example, the orthographic projection of the via V1 on the substrate 10 does not overlap with the orthographic projection of the plurality of photosensitive elements 301 on the substrate 10.

[0122] Since the location of the via V1 is relatively uneven, by setting the via V1 and multiple photosensitive elements 301 to not overlap in the direction perpendicular to the substrate 10, the uneven part can be avoided from being located below the photosensitive element 301, which would cause the structure of the photosensitive element to be deformed. This ensures the structural accuracy of the photosensitive element and improves the photosensitive effect of the photosensitive element.

[0123] For example, in some embodiments, the interlayer insulating layer is a planarization layer used to planarize the pixel driving circuit so that the first electrode layer above it can be disposed. For example, in some embodiments, such as Figure 8 As shown, the interlayer insulation layer may include a stack of multiple insulator layers, such as a planarization layer IL1 and a first passivation layer IL2. The planarization layer IL1 has a via V10, and the first passivation layer IL2 has a via V11. The via V10 and the via V11 are connected to form the via V1 in the interlayer insulation layer IL. For example, in other embodiments, the interlayer insulation layer may also include a stack of more insulator layers. The embodiments of this disclosure do not limit the specific form of the interlayer insulation layer IL.

[0124] For example, in some embodiments, the first electrode E1 of each pixel unit PX is a monolithic structure disposed below multiple photosensitive elements; or, in other embodiments, referring to... Figure 1 The first electrode E1 includes at least one first cutout portion E10 disposed between two adjacent photosensitive elements 301 in the plurality of photosensitive elements 301. For example, the first electrode E1 includes a plurality of first cutout portions E10 disposed between each pair of adjacent photosensitive elements 301 in the plurality of photosensitive elements 301. The first cutout portion E10 can prevent the first electrode E1 from generating coupling capacitance with the circuit above or below it, thereby avoiding adverse phenomena such as signal crosstalk.

[0125] For example, in some embodiments, such as Figure 8 As shown, the texture recognition device further includes a second electrode layer, which is disposed on the side of the photosensitive element layer away from the substrate 10. For example, at least one pixel unit PX further includes a plurality of second electrodes E2 disposed in the second electrode layer, and the plurality of second electrodes E2 are respectively disposed on the side of the plurality of photosensitive elements 301 away from the substrate 10. The first electrode E1 and the plurality of second electrodes E2 jointly drive the plurality of photosensitive elements 301; on the other hand, the first electrode E1 can also form the capacitor C together with the plurality of second electrodes E2.

[0126] For example, in some embodiments, the orthographic projections of the plurality of second electrodes E2 on the substrate 10 do not overlap with the orthographic projections of the via V1 on the substrate 10. For example, the plurality of second electrodes E2 are spaced apart in the second electrode layer, and the orthographic projection of the second electrode E2 disposed on each photosensitive element 301 on the substrate 10 is located within the orthographic projection of the photosensitive element 301 on the substrate 10, so as to ensure the flatness of the second electrodes E2, thereby ensuring the accuracy of the electrical signals transmitted by the second electrodes E2.

[0127] For example, in some embodiments, such as Figure 8As shown, the texture recognition device may further include a third electrode layer E3, which is disposed on the side of the second electrode layer away from the substrate 10. A plurality of second electrodes E2 are electrically connected to the third electrode layer E3. For example, the third electrode layer E3 is connected to a bias line Vb, thereby allowing each second electrode E2 to obtain the same electrical signal from the bias line Vb through the third electrode layer E3.

[0128] For example, in some embodiments, the third electrode layer E3 includes at least one second cutout portion E30 disposed between two adjacent pixel units PX in the plurality of pixel units PX. For example, the third electrode layer E3 includes a plurality of second cutout portions E30 disposed between every two adjacent pixel units PX in the plurality of pixel units PX. The second cutout portion E30 can prevent the third electrode layer E3 from generating coupling capacitance with the circuit above or below it, thereby avoiding adverse phenomena such as signal crosstalk.

[0129] For example, such as Figure 8 As shown, the texture recognition device may further include a first buffer layer 101 disposed on the substrate 10, a first gate insulating layer 102 disposed on the active layer AT, a second gate insulating layer 103 disposed on the gate G, a second buffer layer 104 disposed on the second electrode layer, an organic insulating layer 105 disposed on the second buffer layer 104, a second passivation layer 106 disposed on the organic insulating layer 105, and a third passivation layer 107 disposed on the third electrode layer E3. For example, the second buffer layer 104, the organic insulating layer 105, and the second passivation layer 106 have multiple vias V2, and multiple second electrodes E2 are connected to the third electrode layer E3 through the multiple vias V2 respectively.

[0130] For example, in some embodiments, such as Figure 8 As shown, the texture recognition device may further include an electrostatic shielding layer 108, which is disposed on the side of the third electrode layer E3 away from the substrate 10. The orthographic projection of the third electrode layer E3 on the substrate 10 lies within the orthographic projection of the electrostatic shielding layer 108 on the substrate 10. The electrostatic shielding layer 108 can provide electrostatic shielding for the third electrode layer E3 and the circuit below it.

[0131] For example, in some embodiments, such as Figure 8 As shown, the electrostatic shielding layer 108 can be formed on the entire surface of the third electrode layer E3, or it can have the same pattern as the third electrode layer E3. For example, the electrostatic shielding layer 108 can have a third cutout between adjacent pixel units PX, which is not shown in the figure.

[0132] For example, the field stop layer 80 is disposed on the side of the electrostatic shielding layer 108 away from the substrate 10, and an insulating adhesive layer may be present between the field stop layer 80 and the electrostatic shielding layer 108.

[0133] For example, in embodiments of this disclosure, the substrate 10 may include flexible insulating materials such as polyimide (PI) or rigid insulating materials such as a glass substrate. For example, the first buffer layer 101 and the second buffer layer 104 may include inorganic materials such as silicon nitride, silicon oxide, or silicon oxynitride. The active layer AT may be made of materials such as polycrystalline silicon and metal oxides. The first gate insulating layer 102 and the second gate insulating layer 103 may be made of inorganic insulating materials such as silicon oxide, silicon nitride, or silicon oxynitride. The gate electrode G may be made of metallic materials such as copper, aluminum, titanium, or cobalt, and may be formed as a single-layer structure or a multi-layer structure, such as titanium / aluminum / titanium, molybdenum / aluminum / molybdenum, etc. The first passivation layer IL2, the second passivation layer 106, and the third passivation layer 107 may be made of inorganic insulating materials such as silicon oxide, silicon nitride, or silicon oxynitride. The source / drain electrodes S / D may be made of metallic materials such as copper, aluminum, titanium, or cobalt, and may be formed as a single-layer structure or a multi-layer structure, such as titanium / aluminum / titanium, molybdenum / aluminum / molybdenum, etc. The first electrode layer may include, for example, metal oxides such as ITO and IZO, or metals such as Ag, Al, and Mo, or their alloys. The second electrode layer and the electrostatic shielding layer 108 may include, for example, transparent metal oxides such as ITO and IZO. The planarization layer IL1 may be made of organic insulating materials such as polyimide. The embodiments of this disclosure do not specifically limit the materials of each functional layer.

[0134] For example, the texture recognition device provided in the embodiments of this disclosure may also have other structures, which can be referred to in the relevant technology, and will not be described in detail here.

[0135] At least one embodiment of this disclosure also provides a display device. Figure 10 A cross-sectional schematic diagram of the display device is shown, as follows: Figure 10 As shown, the display device includes a display panel 200 and a texture recognition device provided in this embodiment. The display panel 200 has a display side 201 and a non-display side 202, and allows light to pass through from the display side 201 to the non-display side 202. The texture recognition device is disposed on the non-display side 202 of the display panel 200 and configured to receive light passing through from the display side 201 to the non-display side 202 for texture recognition. When the texture recognition device is disposed, the lens layer 40 is closer to the display panel 20 than the photosensitive element layer 30.

[0136] The display device provided in this embodiment uses the texture recognition device provided in this embodiment to perform texture recognition, which has a better texture recognition effect, such as higher texture recognition speed and texture recognition accuracy.

[0137] The following points also need to be explained:

[0138] (1) The accompanying drawings of the embodiments of this disclosure only involve the structures involved in the embodiments of this disclosure, and other structures can be referred to the general design.

[0139] (2) For clarity, the thickness of layers or regions is enlarged or reduced in the drawings used to describe embodiments of the present disclosure, i.e., these drawings are not drawn to actual scale. It will be understood that when an element such as a layer, film, region or substrate is referred to as being “above” or “below” another element, the element may be “directly” located “above” or “below” the other element or there may be intermediate elements.

[0140] (3) Where there is no conflict, the embodiments of this disclosure and the features in the embodiments can be combined with each other to obtain new embodiments.

[0141] The above are merely specific embodiments of this disclosure, but the scope of protection of this disclosure is not limited thereto. The scope of protection of this disclosure shall be determined by the scope of the claims.

Claims

1. A texture recognition device having multiple pixel units, and comprising: Substrate A driving circuit layer is disposed on the substrate. A photosensitive element layer is disposed on the substrate, and A lens layer is disposed on the side of the photosensitive element layer away from the substrate. Wherein, at least one of the plurality of pixel units includes a pixel driving circuit disposed in the driving circuit layer, a plurality of photosensitive elements disposed in the photosensitive element layer, and a plurality of lens units disposed in the lens layer. The pixel driving circuit is electrically connected to the plurality of photosensitive elements to drive the plurality of photosensitive elements. In a direction perpendicular to the surface of the substrate, the plurality of photosensitive elements and the plurality of lens units correspond one-to-one and overlap. The texture recognition device further includes at least one aperture layer, the at least one aperture layer including a first aperture layer, wherein the first aperture layer is disposed between the photosensitive element layer and the lens layer, and includes a plurality of first light-transmitting openings, wherein in a direction perpendicular to the surface of the substrate, the plurality of first light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap. The at least one aperture layer further includes a second aperture layer, wherein the second aperture layer is disposed between the first aperture layer and the lens layer, and includes a plurality of second light-transmitting openings. In a direction perpendicular to the surface of the substrate, the plurality of second light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap. The texture recognition device further includes a light filter layer disposed between the photosensitive element layer and the first aperture layer, and a field aperture layer disposed between the photosensitive element layer and the light filter layer. The field aperture layer includes a plurality of third light-transmitting openings. In a direction perpendicular to the surface of the substrate, the plurality of third light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap. The angle between the light ray entering the lens unit through its edge and in a direction perpendicular to the surface of the substrate and the normal to the surface of the lens unit away from the substrate is θ1. After refraction by the lens unit, the light ray enters the center of the third light-transmitting opening, forming an angle θ2 with the normal and an angle θ3 with the direction perpendicular to the surface of the substrate. The refractive index of air is n1, and the refractive index of the lens unit is n2. The distance between the surface of the lens unit near the substrate and the surface of the second aperture layer away from the substrate is h1; the distance between the surface of the second aperture layer near the substrate and the surface of the first aperture layer away from the substrate is h2; the distance between the surface of the first aperture layer near the substrate and the surface of the field aperture layer away from the substrate is h3; the distance between the surface of the lens unit near the substrate and the surface of the field aperture layer near the substrate is h4; and the diameter of each of the plurality of first light-transmitting openings is D1 in a direction parallel to the surface of the substrate, then: n1 sinθ1=n2 sinθ2; D1=(h4-h1-h2) tanθ3 2.

2. The texture recognition device according to claim 1, wherein, The at least one pixel unit includes multiple photosensitive elements arranged in N... An array of M, Where M is a positive integer greater than or equal to 1, and N is a positive integer greater than 1.

3. The texture recognition device according to claim 2, wherein, M is 2, N is 2, and the at least one pixel unit includes a plurality of photosensitive elements arranged in a 2:1 configuration. An array of 2.

4. The texture recognition device according to claim 1, wherein, 2μm≤D1≤50μm.

5. The texture recognition device according to claim 1, wherein, The material of the first aperture layer is a light-absorbing material.

6. The texture recognition device according to claim 1, wherein, In a direction perpendicular to the surface of the substrate, the thickness of the first aperture layer is 1μm-3μm, and the distance between the first aperture layer and the photosensitive element layer is 5μm-20μm.

7. The texture recognition device according to claim 1, wherein, In a direction parallel to the surface of the substrate, if the diameter of each of the plurality of second light-transmitting openings is D2, then 2μm≤D1≤D2≤50μm.

8. The texture recognition device according to claim 7, wherein, In a direction perpendicular to the surface of the substrate, the thickness of the second aperture layer is 1μm-3μm, and the distance between the second aperture layer and the first aperture layer is 5μm-20μm.

9. The texture recognition device according to claim 1, wherein, The optical filter layer is configured to allow light with wavelengths of 580nm to 850nm to pass through.

10. The texture recognition device according to claim 1, wherein, In a direction parallel to the surface of the substrate, the diameter of each of the plurality of third light-transmitting openings is D3, then 2μm≤D3≤10μm.

11. The texture recognition device according to claim 1, wherein, The thickness of the field stop layer is 300nm~500nm in a direction perpendicular to the surface of the substrate.

12. The texture recognition device according to claim 1, wherein, The material of the field stop layer includes metallic materials.

13. The texture recognition device according to claim 1, wherein, For a lens unit, a first light-transmitting opening, a second light-transmitting opening, and a third light-transmitting opening corresponding to the same photosensitive element in a direction perpendicular to the surface of the substrate, The orthographic projection of the center of the lens unit on the substrate overlaps with the orthographic projection of the center of the first light-transmitting opening on the substrate, and also overlaps with the orthographic projection of the center of the second light-transmitting opening on the substrate, and the orthographic projection of the third light-transmitting opening on the substrate.

14. The texture recognition device according to claim 1, wherein, In a direction parallel to the surface of the substrate, the diameter of each of the plurality of second light-transmitting openings is D2. D2=(h4-h1) tanθ3 2。 15. The texture recognition device according to claim 1, wherein, The angle between the light ray entering the lens unit through its edge at an angle less than 90 degrees to the direction perpendicular to the substrate surface and the normal to the surface of the lens unit away from the substrate at the point of incidence is θ4. The light ray, after being refracted by the lens unit, enters the edge of the third light-transmitting opening at an angle θ5 to the normal and θ6 to the direction perpendicular to the substrate surface. The diameter of the lens unit is D0. In a direction parallel to the substrate surface, the diameter of each of the plurality of third light-transmitting openings is D3. Then: n1 sinθ4=n2 sinθ5; D3=(h4) tanθ6-D0 / 2) 2.

16. The texture recognition device according to any one of claims 1-3 further includes a planarization layer disposed on the side of the lens layer away from the substrate, wherein the refractive index of the material of the planarization layer is 1.35 to 1.

45.

17. The texture recognition device according to any one of claims 1-3, wherein, Each of the plurality of lens units has a radius of curvature of 5μm to 20μm and a diameter of 25μm to 35μm.

18. The texture recognition device according to any one of claims 1-3, wherein, Each of the plurality of lens units is substantially circular, square, or rectangular in shape.

19. The texture recognition device according to any one of claims 1-3, wherein, The refractive index of the material of the lens layer is 1.6~1.

7.

20. A texture recognition device having multiple pixel units, and comprising: Substrate A driving circuit layer is disposed on the substrate. A photosensitive element layer is disposed on the substrate, and A lens layer is disposed on the side of the photosensitive element layer away from the substrate. Wherein, at least one of the plurality of pixel units includes a pixel driving circuit disposed in the driving circuit layer, a plurality of photosensitive elements disposed in the photosensitive element layer, and a plurality of lens units disposed in the lens layer. The pixel driving circuit is electrically connected to the plurality of photosensitive elements to drive the plurality of photosensitive elements. In a direction perpendicular to the surface of the substrate, the plurality of photosensitive elements and the plurality of lens units correspond one-to-one and overlap. The texture recognition device further includes at least one aperture layer, the at least one aperture layer including a first aperture layer, wherein the first aperture layer is disposed between the photosensitive element layer and the lens layer, and includes a plurality of first light-transmitting openings, wherein in a direction perpendicular to the surface of the substrate, the plurality of first light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap. The at least one aperture layer further includes a second aperture layer, wherein the second aperture layer is disposed between the first aperture layer and the lens layer, and includes a plurality of second light-transmitting openings. In a direction perpendicular to the surface of the substrate, the plurality of second light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap. The texture recognition device further includes a light filter layer disposed between the photosensitive element layer and the first aperture layer, and a field aperture layer disposed between the photosensitive element layer and the light filter layer. The field aperture layer includes a plurality of third light-transmitting openings. In a direction perpendicular to the surface of the substrate, the plurality of third light-transmitting openings correspond one-to-one with the plurality of photosensitive elements and at least partially overlap. Specifically, for a lens unit, a first light-transmitting opening, a second light-transmitting opening, and a third light-transmitting opening corresponding to the same photosensitive element in a direction perpendicular to the surface of the substrate, The orthographic projection of the center of the lens unit on the substrate does not overlap with the orthographic projection of the center of the first light-transmitting opening on the substrate, nor with the orthographic projection of the center of the second light-transmitting opening on the substrate, nor with the orthographic projection of the center of the third light-transmitting opening on the substrate. The light ray entering the lens unit through its first edge at a first angle to the direction perpendicular to the substrate surface makes an angle θ11 with the normal to the surface of the lens unit away from the substrate at the point of incidence. After refraction by the lens unit, the light ray enters the center of the third light-transmitting opening, making an angle θ12 with the normal and an angle θ13 with the direction perpendicular to the substrate surface. The light ray entering the lens unit through the second edge opposite to the first edge and at the first angle to the direction perpendicular to the substrate surface forms an angle θ14 with the normal to the surface of the lens unit away from the substrate at the point of incidence. After refraction by the lens unit, the light ray enters the center of the third light-transmitting opening, forming an angle θ15 with the normal and an angle θ16 with the direction perpendicular to the substrate surface. The refractive index of air is n1, and the refractive index of the lens unit is n2. The distance between the surface of the lens unit near the substrate and the surface of the second aperture layer away from the substrate is h1; the distance between the surface of the second aperture layer near the substrate and the surface of the first aperture layer away from the substrate is h2; the distance between the surface of the first aperture layer near the substrate and the surface of the field aperture layer away from the substrate is h3; the distance between the surface of the lens unit near the substrate and the surface of the field aperture layer near the substrate is h4; the diameter of the lens unit is D0; and the diameter of each of the plurality of first light-transmitting openings is D1 in a direction parallel to the surface of the substrate. Then: n1 sinθ11=n2 sinθ12; n1 sinθ14=n2 sinθ15; D1=D0-(h1+h2) tanθ13-(h1+h2) tanθ16。 21. The texture recognition device according to claim 20, wherein, The distance between the orthographic projection of the center of the first light-transmitting opening on the substrate and the orthographic projection of the center of the second light-transmitting opening on the substrate is 1μm-5μm; The distance between the orthographic projection of the center of the first light-transmitting opening on the substrate and the orthographic projection of the center of the third light-transmitting opening on the substrate is 1μm-5μm.

22. The texture recognition device according to claim 20, wherein, In a direction parallel to the surface of the substrate, the diameter of each of the plurality of second light-transmitting openings is D2. D2=D0-h1 tanθ13-h1 tanθ16。 23. The texture recognition device according to claim 20, wherein, Light rays entering the lens unit through its first edge at a second angle to the direction perpendicular to the substrate surface are refracted by the lens unit and then enter the edge of the third light-transmitting opening. The angle between the refracted light rays and the direction perpendicular to the substrate surface is θ17, and the second angle is greater than the first angle. Light rays entering the lens unit through the second edge opposite to the first edge and at the second angle to the direction perpendicular to the substrate surface are refracted by the lens unit and then enter the edge of the third light-transmitting opening. The angle between the refracted light rays and the direction perpendicular to the substrate surface is θ18. In the direction parallel to the substrate surface, the diameter of each of the plurality of third light-transmitting openings is D3. Therefore: D3=h4 (tanθ17+tanθ18)-D0.

24. A display device, comprising: A display panel having a display side and a non-display side, and allowing light to pass through from the display side to the non-display side, and The texture recognition device according to any one of claims 1-23 is disposed on the non-display side of the display panel and configured to receive light transmitted from the display side to the non-display side for texture recognition. The lens layer is closer to the display panel than the photosensitive element layer.

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