A display panel and a display device

Abstract

The present invention discloses a display panel and a display device. The display panel includes a display area, a device setting area, and a transition area located between the display area and the device setting area, and the display area surrounds at least part of the device setting area; the display panel includes a substrate and a buffer layer located on one side of the substrate; the transition area includes a first light-shielding layer, and the first light-shielding layer is located between the substrate and the buffer layer. By providing a light-shielding layer in the transition area between the display area and the device setting area, during the process of removing the residual metal layer in the device setting area by laser, it plays a role in blocking the laser outside the device setting area, which can not only protect the film layer structure in the transition area, but also remove the residual metal layer in the device setting area directionally, improve the light transmittance in the device setting area, facilitate the realization of an extremely narrow border in the device setting area, increase the screen-to-body ratio of the display panel, and comprehensively improve the visual imaging effect of the display panel.

Description

Technical Field

[0001] Embodiments of the present invention relate to the field of display technologies, and in particular, to a display panel and a display device. Background Art

[0002] As the user's requirement for the screen-to-body ratio of display devices is increasing day by day, usually, trenches, holes, etc. are made in the display area of the display device to implement the setting of under-screen devices, such as setting a camera, etc. Since the film layer step difference between the normal display area and the hole area is large, it is easy to cause the residue of the metal layer in the hole, and it is not easy to achieve an extremely narrow border at the boundary of the hole area in the display area, which affects the full-screen display effect of the display area. Summary of the Invention

[0003] The present invention provides a display panel and a display device. By providing a light-shielding layer in the transition area between the device setting area and the display area, an extremely narrow border design of the device setting area in the display area is achieved, and the full-screen display effect of the display panel is improved.

[0004] In a first aspect, an embodiment of the present invention provides a display panel, including a display area, a device setting area, and a transition area located between the display area and the device setting area, where the display area surrounds at least a part of the device setting area;

[0005] The display panel includes a substrate and a buffer layer located on one side of the substrate; the transition area includes a first light-shielding layer, and the first light-shielding layer is located between the substrate and the buffer layer.

[0006] In a second aspect, an embodiment of the present invention further provides a display device, which includes the display panel provided in the first aspect.

[0007] For the display panel provided by the embodiment of the present invention, by providing a light-shielding layer in the transition area between the display area and the device setting area, during the process of using a laser to remove the residual metal layer in the device setting area, it plays a role in blocking the laser outside the device setting area, which can not only protect the film layer structure in the transition area, but also directionally remove the residual metal layer in the device setting area, improve the light transmittance of the device setting area, facilitate the realization of an extremely narrow border in the device setting area, improve the screen-to-body ratio of the display panel, and thus improve the visual imaging effect of the display panel. Description of the Drawings

[0008] Figure 1 is a surface schematic diagram of a display panel provided by an embodiment of the present invention;

[0009] Figure 2 is Figure 1 a cross-sectional schematic diagram along the AA' direction in

[0010] Figure 3 is Figure 1Another cross-sectional schematic diagram along the AA' direction;

[0011] Figure 4 A lithography schematic diagram during the preparation of a display panel provided for the implementation of the present invention;

[0012] Figure 5 is Figure 1 Another cross-sectional schematic diagram along the AA' direction;

[0013] Figure 6 is Figure 1 Another cross-sectional schematic diagram along the AA' direction;

[0014] Figure 7 is Figure 1 Another cross-sectional schematic diagram along the AA' direction;

[0015] Figure 8 is Figure 1 Another cross-sectional schematic diagram along the AA' direction;

[0016] Figure 9 is Figure 1 Another cross-sectional schematic diagram along the AA' direction;

[0017] Figure 10 is Figure 1 Another cross-sectional schematic diagram along the AA' direction;

[0018] Figure 11 A schematic structural diagram of another display device provided by an embodiment of the present invention. Detailed implementation manners

[0019] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the present invention, rather than limiting the present invention. Additionally, it should be noted that for the sake of description, only parts related to the present invention rather than all structures are shown in the accompanying drawings.

[0020] In this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or sequence between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or further includes elements inherent to such process, method, article or device. Without further limitation, elements defined by the statement "including..." do not exclude the existence of additional identical elements in the process, method, article or device including the said elements.

[0021] The display panel is a key structure for a display device to achieve its display function. By designing openings in the display area, it is convenient to integrate functional devices such as cameras, speakers, and infrared sensors, which helps narrow the border and achieve a high screen-to-body ratio. And adopting the blind hole solution to integrate functional devices such as cameras, speakers, and infrared sensors under the screen is beneficial to further reduce the area of the opening area, thereby further improving the screen-to-body ratio. In a blind hole type display panel, the film layer in the hole area will cause the problem of low light transmittance in the hole area. Therefore, it is necessary to remove the film layer in the hole area. Since there is a large difference in the film layer step between the normal display area and the blind hole area during the removal process, it is easy to cause metal layer residue in the hole area, affecting the light transmittance of the hole area and the design of the extremely narrow border in the hole area, and ultimately affecting the display effect of the display panel.

[0022] Based on the above technical problems, the inventors have found through research that by setting a light-shielding layer in the transition area between the normal display area and the hole area, it plays a role in blocking the laser outside the hole area during the process of removing the metal layer in the hole area by laser, which is beneficial to achieving the design of the extremely narrow border of the hole area in the display area, thereby improving the screen-to-body ratio of the display panel and the visual imaging effect of the display panel.

[0023] The above is the core idea of the present invention. Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without making creative efforts belong to the scope of protection of the present invention.

[0024] Figure 1 is a schematic surface view of a display panel provided by an embodiment of the present invention, Figure 2 is Figure 1 a schematic cross-sectional view taken along the AA' direction in Figure 3 is Figure 1 a schematic cross-sectional view taken along the AA' direction in Figure 4 is a lithography schematic diagram during the preparation process of the display panel provided by an embodiment of the present invention. As shown in conjunction with Figures 1 - 4 The display panel 200 provided by the embodiment of the present invention includes a display area A1, a device setting area A2, and a transition area A3 located between the display area A1 and the device setting area A2. The display area A1 surrounds at least part of the device setting area A2. The display panel 200 includes a substrate 210 and a buffer layer 211 located on one side of the substrate 210. The transition area A3 includes a first light-shielding layer 31, and the first light-shielding layer 31 is located between the substrate 210 and the buffer layer 211.

[0025] Specifically, the display panel 200 includes an organic light emitting diode display panel (OLED), a light emitting diode display panel (LED), a micro light emitting diode display panel (Micro LED), etc. The embodiment of the present invention does not impose any specific restrictions on the type of the display panel 200. The display panel 200 includes a display area A1, which is used to display the image normally. In a part of the display area A1, a device setting area A2 is prepared by digging holes. Along the Z direction in the figure, the number of film layers in the digging area is less than the number of film layers in the display area A1, which is convenient for integrating functional devices such as cameras, earpieces and infrared sensors. The device setting area A2 is Figure 1 In the blind hole area shown, transition area A2 forms the border area of device placement area A2. In one feasible implementation, the peripheral signal lines of device placement area A2 can be routed around display area A1. The width of transition area A2 along the X direction in the figure can be compressed to 0.1mm to 0.15mm, which helps reduce the interface between display area A1 and device placement area A2 and achieve a narrow border design for device placement area A2.

[0026] The display panel's substrate 210 can be made of a rigid material such as glass or silicon wafer, or a flexible material such as ultra-thin glass, metal foil, or polymer plastic. The flexible or rigid substrate 210 can block oxygen and moisture, preventing moisture or impurities from diffusing through the substrate 210 into the display panel. A first light-shielding layer 31 is added to the substrate 210 in the filter area A2. The first light-shielding layer 31 at least partially surrounds the device placement area A2. For example, the material used is molybdenum (Mo), a silvery-white metal that is hard and tough. A buffer layer 221 covers the substrate 210 and the first light-shielding layer 31. The buffer layer 221 may comprise a stacked structure composed of one or more inorganic materials such as silicon oxide, silicon nitride, and silicon oxynitride. This layer prevents impurities such as oxygen and moisture from penetrating the substrate 210 and flattens the substrate 210.

[0027] Taking OLED display panel as an example, combined with Figure 2 and Figure 3As shown, the display panel 200 further includes a driving circuit layer 30 and a light-emitting layer 40 on the side of the buffer layer 221 away from the substrate 210. The film layers of the driving circuit layer 220 may include an active layer 222, a gate insulating layer 223, a gate 224, an intermediate dielectric layer 225, an interlayer dielectric layer 226, source electrodes 227s, drain electrodes 227d, a passivation layer 228, connection electrodes 229, and a planarization layer 230. The driving circuit layer 220 includes a thin-film transistor (TFT) structure. Here, taking the top-gate thin-film transistor of the display panel 200 as an example, the structure of the driving circuit layer 30 will be described.

[0028] Among them, the active layer 222 may be disposed on the buffer layer 221. The active layer 222 may include a channel region 222c, and a source region 222s and a drain region 222d located at opposite ends of the channel region 222c. Taking the active layer 222 including polysilicon semiconductors as an example, the channel region 222c includes undoped polysilicon semiconductors, and the source region 222s and the drain region 222d may include polysilicon semiconductors doped with impurities. The active layer 222 may be an n-type semiconductor or a p-type semiconductor. The gate insulating layer 223 covers the active layer 222 and may be disposed on the buffer layer 221. The gate insulating layer 223 may include a stacked structure composed of one or more of inorganic materials such as silicon oxide, silicon nitride, silicon oxynitride, etc. The gate 224 may be disposed on the gate insulating layer 223 and may overlap with the channel region 222c of the active layer 222. The gate 224 and the active layer 222 may form a thin-film transistor (TFT). The gate 224 may include metals such as aluminum (Al), silver (Ag), chromium (Cr), titanium (Ti), tantalum (Ta), molybdenum (Mo), etc., their alloys, their nitrides, conductive metal oxides, transparent conductive materials, etc. As an example, the gate 224 may include molybdenum (Mo).

[0029] The intermediate dielectric layer 225 covers the gate 224 and may be disposed on the gate insulating layer 223. The interlayer dielectric layer 226 may be disposed on the intermediate dielectric layer 225. The intermediate dielectric layer 225 and the interlayer dielectric layer 226 may include a stacked structure composed of one or more of inorganic materials such as silicon oxide, silicon nitride, silicon oxynitride, etc.

[0030] The source electrode 227s can be in contact with the source region 222s of the active layer 222, and the drain electrode 227d can be in contact with the drain region 222d of the active layer 222. The source electrode 227s and the drain electrode 227d can be formed in the same manufacturing process and are located in the same film layer. As an example, the first contact hole CH1 exposing a part of the source region 222s and the second contact hole CH2 exposing a part of the drain region 222d can each be formed through the gate insulating layer 223, the intermediate dielectric layer 225, and the interlayer dielectric layer 226. The source electrode 227s can be in contact with the upper surface of the source region 222s through the first contact hole CH1, and the drain electrode 227d can be in contact with the upper surface of the drain region 222d through the second contact hole CH2. The source electrode 227s and the drain electrode 227d can include metals such as aluminum (Al), silver (Ag), chromium (Cr), titanium (Ti), tantalum (Ta), molybdenum (Mo), etc., their alloys, their nitrides, conductive metal oxides, transparent conductive materials, etc. As an example, the source electrode 227s and the drain electrode 227d can include a Ti / Al / Ti metal stack structure.

[0031] The passivation layer 228 covers the source electrode 227s and the drain electrode 227d, and the passivation layer 228 can be disposed on the interlayer dielectric layer 226. The passivation layer 228 can include a stacked structure composed of one or more of inorganic materials such as silicon oxide, silicon nitride, silicon oxynitride, etc. As an example, the passivation layer 228 can include silicon nitride.

[0032] The planarization layer 230 has a planarization effect. The light-emitting layer 40 includes a plurality of light-emitting elements 41, the driving circuit layer 30 is connected to the light-emitting elements 40 of the display panel, the light-emitting element 41 includes a first electrode 411, a light-emitting body 412, and a second electrode 413, and the first electrode 411, the second electrode 413, and the light-emitting body 412 are prepared by a patterning process. Among them, the first electrode 411 is an anode, and the materials include metals such as Cr, Pt, Ru, Au, Ag, Mo, Al, W, Cu, and / or AlNd; the second electrode 413 is a cathode, and the materials include ITO (indium tin oxide), IZO (indium zinc oxide), ITO / Ag / ITO, etc., and are usually prepared as a whole layer; the light-emitting material of the light-emitting body 412 can be a low-molecular or high-molecular organic material. The drain 227 of the thin-film transistor TFT is electrically connected to the first electrode 411 of the light-emitting element 41 through the connection electrode 229, and the driving circuit layer 220 further includes a driving circuit for driving the light-emitting element 40 to emit light.

[0033] Combined Figure 2 and Figure 3 It can be seen that since the device setting area A2 removes multiple film layers and there is a large film layer step difference from the display area A1, metal residues are likely to exist in the device setting area A2, such as the first electrode 411 and the light-emitting body 412 of the light-emitting element, which affects the light transmittance of the device setting area A2. Combined Figure 4As shown, during the preparation stage of the device setting area A2, an infrared laser can be used as the etching light source, and its beam diameter is greater than or equal to 2 mm. The device setting area A2 is scanned and etched with the laser along the X direction in the figure. Since a hard and tough first light-shielding layer 31 is added in the filtering area A2, the etching light in the transition area A3 can be directionally blocked, protecting the film layer structure within the covered area of the first light-shielding layer 31, which is beneficial for directionally removing the residual metal layer in the device setting area A2 (as shown within the dotted line box in the figure), improving the transmittance of the device setting area A2, and at the same time helping to narrow the border of the device setting area A2 to achieve a high screen-to-body ratio.

[0034] It should be noted that "patterning" in this article specifically refers to a non-whole-layer structure, that is, a structure formed by first forming a whole-layer material and then etching out a specific shape during the manufacturing process; the display device provided in this embodiment further includes other film layers, which jointly function to achieve the display function of the display device, and will not be described in detail here.

[0035] In summary, the display panel provided by the embodiment of the present invention, by setting a light-shielding layer in the transition area between the display area and the device setting area, plays a role in blocking the laser outside the device setting area during the process of using the laser to remove the residual metal layer in the device setting area. It can not only protect the film layer structure in the transition area, but also directionally remove the residual metal layer in the device setting area, improve the light transmittance of the device setting area, facilitate the realization of an extremely narrow border in the device setting area, increase the screen-to-body ratio of the display panel, and thus improve the visual imaging effect of the display panel.

[0036] Based on the above embodiment, combined with Figures 1 - 3 As shown, along the thickness direction of the display panel (as shown in the Z direction in the figure), the projection of the first light-shielding layer 31 surrounds the device setting area A2.

[0037] Specifically, combined with Figures 1 - 3 As shown, the device setting area A2 can be located within the display area A. By setting the projection of the first light-shielding layer 31 to surround the device setting area A2, the device setting area A2 is directionally exposed. During the etching process of the film layer of the display panel, it can adapt to the etching laser with a large beam diameter, which is beneficial for improving the etching efficiency of the laser to remove the residual metal layer in the device setting area A2 and improving the production efficiency of the display panel.

[0038] Figure 5 is Figure 1 Another cross-sectional schematic diagram along the AA' direction in Figure 6 is Figure 1 Another cross-sectional schematic diagram along the AA' direction in Figure 1 、 Figure 5 and Figure 6As shown, the display area A1 includes a pixel defining layer 42 located on the side of the buffer layer 211 away from the substrate 210. The pixel defining layer 42 includes a plurality of pixel openings. The display area A1 further includes a plurality of light-emitting elements 41 located within the pixel openings. The transition area A3 further includes a second light-shielding layer 32, and the second light-shielding layer 32 includes a first light-shielding portion 321 which is on the same layer as the pixel defining layer 42. Along the thickness direction of the display panel (as shown by the Z direction in the figure), the first light-shielding portion 321 surrounds at least part of the device setting area A2.

[0039] Exemplarily, in combination with Figure 1 As shown, the device setting area A2 adopts a narrow border design. The device setting area A2 is relatively close to the light-emitting elements 41 in the display area A1. The stray light emitted from the side of the light-emitting elements 41 is likely to enter the photosensitive device inside the device setting area A2 from the transition area A3. For example, if the photosensitive device is a camera, the stray light will increase the noise signal of the camera and affect the imaging quality of the camera. Taking an OLED display panel as an example, in a feasible implementation manner, as Figure 5 shown, a first light-shielding portion 321 can be prepared in the transition area A2. The first light-shielding portion 321 uses a black light-absorbing material to absorb or block the stray light emitted from the light-emitting elements 41 in the pixel defining layer 42. In a feasible implementation manner, as Figure 6 shown, when patterning the pixel openings, the pixel defining layer 42 in the transition area A3 is retained and reused as the first light-shielding portion 321. The pixel defining layer 42 uses a black light-absorbing material or a light-absorbing material is doped in the pixel defining layer. Setting the first light-shielding portion 321 to surround the device setting area A2 is beneficial to blocking or absorbing the stray light emitted from the light-emitting elements 41 close to the device setting area A2, preventing the stray light from entering the photosensitive device inside the device setting area A2 from the transition area A3, meeting the requirements of the narrow border design of the device setting area A2, and improving the light-sensing performance of the photosensitive device in the device setting area A3, such as the imaging quality of the camera. On the other hand, the pixel defining layer 42 can also block the stray light emitted from the light-emitting elements 41 from entering the inside of the display panel, avoiding the light-induced leakage current of the thin-film transistor TFT in the driving circuit layer 20 caused by the light, thereby ensuring the normal display of the high screen-to-body ratio display panel.

[0040] Figure 7 is Figure 1 Another cross-sectional schematic diagram along the AA' direction in Figure 1 and Figure 7As shown, in a feasible implementation, the second light-shielding layer 32 further includes a second light-shielding portion 322, and the second light-shielding portion 322 is located between the first light-shielding portion 321 and the buffer layer 211. Along the thickness direction of the display panel (as shown by the Z direction in the figure), the projection of the second light-shielding layer 32 surrounds at least a part of the device setting area A2. Along the direction from the display area A1 to the device setting area A2 (as shown by the X direction in the figure), the projection of the second light-shielding layer 32 covers at least a part of the side wall of the device setting area A2.

[0041] Specifically, on the basis of setting the first light-shielding portion 321, a second light-shielding portion 322 can be further provided between the first light-shielding portion 321 and the first light-shielding layer 31. Along the Z direction in the figure, the second light-shielding portion 322 can penetrate through multiple film layer structures in the transition area A3 and surround at least a part of the side wall of the device setting area A2 to form a light absorption or blocking barrier, so as to further block the stray light emitted by the light-emitting element 41 from entering the device setting area 2 through the film layers in the transition area A3. At the same time, the second light-shielding portion 322 can also block the ambient light from entering the display area A1 from the device setting area 2 to avoid causing light leakage current of the thin-film transistor TFT in the driving circuit layer 20.

[0042] A feasible implementation, in combination with Figure 7 As shown, the second light-shielding portion 322 is communicated with the first light-shielding portion 321, and the second light-shielding portion 322 and the first light-shielding portion 321 are made of the same material.

[0043] Specifically, by using a punching method, holes are punched in the film layer below the first light-shielding portion 321 in the direction of the substrate 210, and a black light-absorbing material is filled in the hole area to form the second light-shielding portion 322 and the first light-shielding portion 32, so as to play a light-shielding role.

[0044] Figure 8 is Figure 1 Another cross-sectional schematic diagram along the AA' direction in Figure 9 is Figure 1 Another cross-sectional schematic diagram along the AA' direction in Figure 10 is Figure 1 Another cross-sectional schematic diagram along the AA' direction in. A feasible implementation, in combination with Figure 1 、 Figures 8 - 10 As shown, the transition area A3 further includes a multi-layer metal layer located between the buffer layer 211 and the first light-shielding portion 321; the second light-shielding portion 322 includes at least one metal layer.

[0045] Specifically, on the basis of preparing the first light-shielding portion 321, when fabricating the metal film layer of the entire driving circuit layer 220, a patterning process can be used to retain at least one metal layer in the transition region A2, such as retaining at least one of the metal layers of the gate 224, the source electrode 227s / drain electrode 227d, and the connection electrode 229, and using the metal layer to block the stray light emitted by the light-emitting element 41 from entering the device setting region A2.

[0046] A feasible implementation manner, continue to refer to Figure 8 As shown, the second light-shielding portion 322 includes three metal layers, the three metal layers are connected, and the end surface of the second light-shielding portion 322 away from the substrate 210 is in contact with the first light-shielding portion 321.

[0047] Specifically, such as retaining the metal layer in the transition region A3, the second light-shielding portion 322 includes a first metal layer M1, a second metal layer M2, and a third metal layer M3. The first metal layer M1 can be the metal layer of the gate 224 of the thin-film transistor TFT, the second metal layer M2 is the metal layer of the source electrode 227s and drain electrode 227d of the thin-film transistor TFT, and the third metal layer M3 can be the metal layer of the connection electrode 229 between the drain electrode 227d and the light-emitting element 41. By using a punching method, the first metal layer M1, the second metal layer M2, and the third metal layer M3 are connected, and the third metal layer M3 is in contact with the first light-shielding portion 321 to form a light-blocking barrier. Through this structural setting, it can not only block the stray light emitted by the light-emitting element 41 from entering the device setting region A2 and improve the light-sensing quality of the photosensitive device in the device setting region A2, but also block the ambient light from entering the display region A1 and avoid the occurrence of light leakage current in the thin-film transistor TFT, comprehensively improving the display effect of the high screen ratio display panel.

[0048] A feasible implementation manner, in combination with Figure 9 and Figure 10 As shown, at least one metal layer extends along a first plane; wherein, the first plane is parallel to the plane where the substrate 210 is located.

[0049] Specifically, such as Figure 9 and Figure 10 As shown, such as retaining the source electrode 227s / drain electrode 227d metal layer (M2) and the connection electrode 229 metal layer (M3) of the driving circuit layer 220 in the transition region A3, on the basis of not increasing the number of film layers, using a patterning preparation process, the metal layer M3 and the metal layer M2 extend along a plane parallel to the substrate 210, and can be only located in the transition region A3 or extend to the display region A2. The transition region A3 is provided with multiple metal layers extending in a plane around the device setting region A2, which is beneficial to reducing the scattered light from entering the device setting region A2.

[0050] Further, the surface of the metal film layer in the transition region A3 can be roughened to reduce light reflection; Figure 10 In [figure], the first light-shielding portion 311 can be formed by doping scattering particles o in the pixel defining layer 42 to disrupt the light propagation direction and reduce the light entering the device setting region A2. It should be noted that the second light-shielding portion 322 is electrically insulated from the metal traces in the display region A1.

[0051] A feasible implementation mode, in combination with Figure 3 , Figures 5 - 10 As shown in [figure], the display region A1 and the transition region A3 further include a multi-layer inorganic layer on the side of the buffer layer 211 away from the substrate 210; at least one inorganic layer extends from the display region A1 to the device setting region A2 and covers the buffer layer 211 in the device setting region A2.

[0052] Specifically, in the process of etching the film layer in the device setting region A2, at least one transparent inorganic layer of the buffer layer 211, the gate insulating layer 223, the intermediate dielectric layer 225, the interlayer dielectric layer 226, and the passivation layer 228 is reserved. As Figure 3 , Figures 5 - 8 shown, the buffer layer 211 and the gate insulating layer 223 in the device setting region A2 are reserved, and the gate insulating layer 223 covers the buffer layer 211; as Figures 9 - 10 shown, the buffer layer 211 and the interlayer dielectric layer 226 in the device setting region A2 are reserved, and the interlayer dielectric layer 226 covers the buffer layer 211. By increasing the transparent inorganic layer in the device setting region A2, the step difference between the film layers in the display region A1 and the film layers in the device setting region A2 is reduced, which is beneficial to reducing the metal residue in the device setting region A2 in the subsequent laser etching process, ensuring the light transmittance of the device setting region A2 and the extremely narrow border design of the device setting region A2, and improving the display effect of the display panel.

[0053] In combination with Figures 2 - 3 , Figures 5 - 10 , the display panel 200 further includes a packaging layer 50. The packaging layer 50 may include a packaging adhesive 51 and a cover plate 52. The packaging adhesive 51 covers the substrate 210 and the driving circuit layer 220 and is used to package the light-emitting element 300. The packaging adhesive 51 covers the side surface of the light-emitting element 41 and may also cover the upper surface of the light-emitting element 41 at the same time. The packaging layer 50 of the display panel further includes an adhesive layer 53, and the adhesive layer 53 is located between the packaging adhesive 51 and the cover plate 52.

[0054] Based on the same inventive concept, an embodiment of the present invention further provides a display device. Figure 11 It is a schematic structural diagram of the display device provided by the embodiment of the present invention. As Figure 11 shown, the display device includes any one of the display panels provided by the above embodiments. Exemplarily, as Figure 11As shown, the display device 300 includes a display panel 200. Therefore, the display device also has the beneficial effects of the display panel in the above embodiments. For the same parts, reference may be made to the explanations of the display panel above, and details will not be repeated hereinafter.

[0055] The display device 300 provided by the embodiment of the present invention may be Figure 11 the mobile phone shown in the figure, or any electronic product with a display function, including but not limited to the following categories: television sets, laptop computers, desktop monitors, tablet computers, digital cameras, smart bracelets, smart glasses, in-vehicle displays, industrial control devices, medical display screens, touch interaction terminals, etc. The embodiment of the present invention does not make special limitations on this.

[0056] Note that the above is only the preferred embodiment of the present invention and the technical principles applied. Those skilled in the art will understand that the present invention is not limited to the specific embodiments described herein. Various obvious changes, re-adjustments and substitutions can be made by those skilled in the art without departing from the protection scope of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments. Without departing from the concept of the present invention, more other equivalent embodiments may be included, and the scope of the present invention is determined by the scope of the appended claims.

Claims

1. A display panel, characterized in that, It includes a display area, a device setting area, and a transition area located between the display area and the device setting area, and the display area surrounds at least part of the device setting area; The display panel includes a substrate and a buffer layer located on one side of the substrate; the transition area includes a first light-shielding layer, and the first light-shielding layer is located between the substrate and the buffer layer; The transition area further includes a second light-shielding layer, the second light-shielding layer includes a first light-shielding portion and a second light-shielding portion, and the first light-shielding portion is on the same layer as the pixel defining layer; the second light-shielding portion is located between the first light-shielding portion and the buffer layer; The second light-shielding portion includes three metal layers, and the three metal layers are connected; the end face of the second light-shielding portion away from the substrate contacts the first light-shielding portion.

2. The display panel according to claim 1, wherein In the thickness direction of the display panel, the projection of the first light-shielding layer surrounds the device setting area.

3. The display panel according to claim 1, characterized in that, The display area includes a pixel defining layer located on the side of the buffer layer away from the substrate, and the pixel defining layer includes a plurality of pixel openings; the display area further includes a plurality of light-emitting elements, and the light-emitting elements are located in the pixel openings; In the thickness direction of the display panel, the first light-shielding portion surrounds at least part of the device setting area.

4. The display panel according to claim 3, wherein, In the thickness direction of the display panel, the projection of the second light-shielding layer surrounds at least part of the device setting area; In the direction from the display area to the device setting area, the projection of the second light-shielding layer covers at least part of the side wall of the device setting area.

5. The display panel according to claim 4, wherein the second light-shielding portion is connected to the first light-shielding portion, and the second light-shielding portion and the first light-shielding portion are made of the same material.

6. The display panel according to claim 4, wherein The transition area further includes a multi-layer metal layer located between the buffer layer and the first light-shielding portion; The second light-shielding portion includes at least one layer of the metal layer.

7. The display panel according to claim 6, wherein, At least one layer of the metal layer extends along a first plane; wherein, the first plane is parallel to the plane where the substrate is located.

8. The display panel according to claim 3, wherein The pixel defining layer includes a black light-absorbing material, and the first light-shielding portion is made of the same material as the pixel defining layer.

9. The display panel according to claim 1, wherein The display area and the transition area further include a multi-layer inorganic layer located on the side of the buffer layer away from the substrate; At least one layer of the inorganic layer extends from the display area to the device setting area and covers the buffer layer located in the device setting area.

10. A display device, characterized in that, It includes the display panel according to any one of claims 1-9.

Images