A projection screen with nanocrystalline structure and its manufacturing method

Abstract

The application discloses a projection screen with nano microcrystal structure and a manufacturing method thereof. The screen is composed of a nano microcrystal layer formed by transparent crystals with different shapes and sizes and a structure layer with a continuous curved surface and an irregular array structure layer with different curvatures and different heights. The structure layer provides a basic angle distribution and uniformity of reflected light in space. The nano microcrystal layer refracts light to efficiently distribute the light in a set space angle, expands the visual angle of the screen, improves the uniformity of the screen, optimizes the space distribution, reduces the space distribution of reflected light in a non-main observation area, ensures better viewing quality, increases an absorption layer to effectively absorb a small amount of transmitted light penetrating the reflection layer, ensures no interference to an image, improves a system contrast polarization ratio, increases a crystal layer, increases multiple reflection effects and strengthens reflected light by means of a transparent nano film layer and the increase of adhesion of the reflection layer and protection of the reflection layer.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of projection imaging, and more particularly, the present application mainly relates to a projection screen with nano microcrystalline structure and a manufacturing method thereof. BACKGROUND

[0002] At present, projection screens are widely used in cinemas, education industry and enterprise conferences. However, even the projection screen used in the cinema representing the highest level in the industry usually only adopts PVC substrate plus sheet-shaped aluminum powder plus outer protective layer spraying, and the contrast ratio is usually only more than 100, and there are many shortcomings such as obvious light spot effect, insufficient definition, and the screen is easy to be damaged and the optical performance is easy to be attenuated.

[0003] In a cinema system, the traditional metal screen, which is a Lambertian diffuser, faces great problems. One of them is that the viewing angle is small. Because the intensity changes with the cosine of the angle, the actual brightness observed by the audience seats on both sides is very small, which brings a very poor viewing experience. Secondly, because the radiance of the scattered light of the Lambertian diffuser is independent of the direction, no audience seats are arranged for extreme angles (±70-90), and the light is still reflected to these areas without being distinguished, which reduces the actual observation intensity of the areas in the absolute front (-5-5 degrees) and the golden angle. In order to solve these problems, some metal screens increase the irregular reflection optical structure layer to increase the reflection angle of the reflection layer, but at the same time, the gain and contrast ratio of polarization of the projection are reduced. Therefore, it is necessary to design a screen with high brightness gain, high contrast ratio of polarization, and large reflection angle to improve the viewing quality. SUMMARY

[0004] The present application aims at the above-mentioned deficiencies, and provides a projection screen with nano microcrystalline structure and a manufacturing method thereof, so as to solve the technical problems of insufficient reflection angle, insufficient brightness gain and contrast ratio in the prior art.

[0005] To solve the above-mentioned technical problems, the present application adopts the following technical solutions:

[0006] The present application provides a manufacturing method of a projection screen with nano microcrystalline structure, which comprises the following steps:

[0007] A structure layer in which a transparent adhesive or a transparent plastic body is embossed into a corrugated shape and adhered to the substrate layer in a concave-convex surface shape is formed on the carrier substrate layer by a press roller or a mold;

[0008] A layer of reflective metal is formed on the surface of the structure layer by printing, spraying, deposition, vacuum evaporation or electroplating as a reflection layer;

[0009] A nano-microcrystal layer is formed on the surface of the reflective layer by coating or spraying, and the nano-microcrystal layer is composed of two or more transparent three-dimensional crystals.

[0010] Further, the concave-convex surface of the structure layer is composed of a continuous curved surface irregular array with different curvatures and different heights.

[0011] Further, the curved surface height of the structure layer ranges from 10 um to 100 um.

[0012] Further, the transparent three-dimensional crystal of the nano-microcrystal layer is a microcrystal material or a nanoparticle with a crystal structure in the nano-micro size, and the size ranges from 100 nm to 300 nm.

[0013] Further, the nano-microcrystal layer material is one of zinc oxide, nano-kaolin, titanium dioxide, montmorillonite, silver, graphene, and aluminum oxide, or a mixture of two to seven of them.

[0014] Further, the transparent three-dimensional crystal is a micro-circular spherical nanocrystal, and the shape and size of the micro-circular spherical nanocrystal are not uniform, and the distribution position is irregular, thereby avoiding the generation of moire fringes.

[0015] Further, the transparent three-dimensional crystal is a cubic nanocrystal or a cuboid nanocrystal or a cylindrical nanocrystal or a triangular nanocrystal or a semi-cylindrical nanocrystal or a polyhedral nanocrystal, and the shape and size are not uniform, and the distribution position is irregular.

[0016] Further, the reflective layer material is silver, aluminum, or nickel, and the thickness is 80 nm to 500 nm.

[0017] Further, the method further comprises:

[0018] A deep color material is first formed on the surface of the structure layer by deposition or electroplating to adhere to the structure layer as a light-absorbing layer, and then a reflective metal is formed on the surface of the light-absorbing layer by printing, spraying, deposition, vacuum evaporation, or electroplating to adhere to the light-absorbing layer as a reflective layer.

[0019] Further, the light-absorbing layer material is chromium or iron, and the thickness is 100 nm to 300 nm.

[0020] Further, the method further comprises:

[0021] A crystal layer composed of at least one transparent nanofilm layer is first formed on the surface of the reflective layer by deposition, vacuum evaporation, or electroplating to adhere to the reflective layer, and then a nano-microcrystal layer is formed on the surface of the crystal layer by coating or spraying to adhere to the crystal layer.

[0022] Further, the crystal layer is 50-200 nm thick per transparent nanometer film layer, and the number of layers of the crystal layer transparent nanometer film layer is not more than two.

[0023] A projection screen with a nano-microcrystal structure is manufactured by the method of any one of the above.

[0024] Compared with the prior art, the present application has the beneficial effect that, on a conventional metal reflective screen, a reflective layer is attached to a continuous curved surface irregular array structure layer with different curvatures and different heights, and a nano-microcrystal layer composed of transparent crystals with different shapes and sizes, the structure layer provides a basic angular distribution and uniformity of reflected light in space, the nano-microcrystal layer refracts light to efficiently distribute the light in a set spatial angle, expands the viewing angle of the screen and improves the uniformity and optimizes the spatial distribution, and the reflected light in the non-main observation area is reduced to ensure better viewing quality;

[0025] At the same time, the design of the absorption layer can effectively absorb a small amount of transmitted light that penetrates the reflective layer to ensure that no interference is caused to the image and improve the contrast polarization ratio of the system;

[0026] The crystal layer is added through the transparent nanometer film layer, which increases the adhesion of the reflective layer and protects the reflective layer while increasing the effect of multiple reflections and strengthening the reflected light, and supplements the problem of insufficient reflectivity of certain metals in the metal reflective layer for specific visible light bands. BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 A flowchart of the manufacturing method of the projection screen with a nano-microcrystal structure in the embodiment of the present application;

[0028] Figure 2 A schematic diagram of the structure of the projection screen with a nano-microcrystal structure in the embodiment of the present application;

[0029] Figure 3 A schematic diagram of the micro-circular spheres of the nano-microcrystal layer in the embodiment of the present application;

[0030] Figure 4 A schematic diagram of the emitted light of the micro-circular spheres of the nano-microcrystal layer in the embodiment of the present application;

[0031] Figure 5 A schematic diagram of the refraction and reflection of the crystal layer in the embodiment of the present application.

[0032] The reference signs are explained as follows:

[0033] 1 is a substrate layer, 2 is a structure layer, 3 is a reflective layer, 4 is a nano-microcrystal layer, 5 is an absorption layer, and 6 is a crystal layer. DETAILED DESCRIPTION

[0034] The application will be further described below with reference to the accompanying drawings.

[0035] Reference Figure 1 and Figure 2 As shown in the drawings, the embodiment of the application is a method for manufacturing a nano-microcrystal structured projection screen, and importantly, the method comprises:

[0036] Impressing a transparent adhesive or transparent plastic body on the carrier substrate layer 1 by a press roller or a mold to form a structured layer 2 with a relief-shaped concave-convex surface adhered on the substrate layer 1;

[0037] Forming a reflective metal layer 3 on the structured layer 2 by printing, spraying, depositing, vacuum evaporation or electroplating to form a reflective layer 3 on the structured layer 2;

[0038] Forming a nano-microcrystal layer 4 on the reflective layer 3 by coating or spraying to form a nano-microcrystal layer 4 on the reflective layer 3, wherein the nano-microcrystal layer 4 is composed of two or more transparent three-dimensional crystals with different shapes and sizes;

[0039] Specifically, the microcrystal screen uses a substrate layer 1 made of PC or PVC or PET, and the structured layer 2 is on the substrate, and the material of the structured layer 2 can be an adhesive or a transparent plastic body, and the preferred processing method is to process the required shape by a mold;

[0040] According to Fresnel equation, when the incident light is incident to the medium interface at an angle θ i For s-polarized light, there is:

[0041]

[0042] For p-polarized light, there is:

[0043]

[0044] And for both polarization states, there is: n i sinθ i =n t sinθ t

[0045] When the normal incidence reflection is reflected, i.e. θ i =0, the total reflectivity is:

[0046]

[0047] For the complex refractive index of metal medium such as aluminum (Al), silver (Ag), gold (Au) and so on, the reflectivity of which is in the form of n-ik, when the light is vertically incident in the air, the reflectivity is:

[0048]

[0049] When the light is incident at a certain angle θ i The calculation of reflectivity is more complex. When the metal layer is thick enough, the reflectivity of p light and s light is respectively:

[0050]

[0051]

[0052] Wherein,

[0053] The reflectivity of s light and p light is not the same with different incident angles. The polarized light used in the cinema system and reality cannot absolutely eliminate the unwanted polarized light. In general application, taking s polarized light as an example, if the s light intensity is more than 1000:1 than p light, it can be considered as a good linearly polarized light. The standard of laser or cinema system is improved. We take p:s as 1000:1 as an example, and take copper metal as an example at an incident angle of about 50 degrees. Rp is about 0.56, and Rs is about 0.76. After reflection, p:s is about 736.8. If circularly polarized light is used, this phenomenon is more obvious. Here, only the influence of different light intensities is calculated. In fact, there is a non-zero relative phase difference for sp light. Therefore, when the incident light is linearly polarized, the reflected light on the absorbing medium is usually called elliptically polarized light;

[0054] Therefore, in order to reduce the influence of this problem, the cinema system needs to provide a larger angle to meet the audience at different positions. The structure layer 2 of the present patent has a certain undulating shape, and the characteristic is that the shape is continuously controlled to avoid large angle curve and large amplitude change, so as to reduce the influence on sp light mentioned above. The overall undulating structure should have a certain change, and the continuous curved surface with different curvatures and different heights should not form a regular array to prevent moire fringes; the curved surface height of the structure layer is 10um-100um;

[0055] In addition to controlling the spatial angle distribution of reflected light, the structure layer 2 also helps to scatter and uniform the angle of reflected light.

[0056] In addition, the transparent three-dimensional crystal of the nano-microcrystal layer 4 is a microcrystal material or a nanoparticle with a crystal structure in the nano-micro size, with a size range of 100 nm-300 nm, and the atomic arrangement is neither ordered in the crystalline state nor disordered in the amorphous state (glass state), which plays a role in scattering light, so that the light is efficiently distributed in the set spatial angle, not only expanding the viewing angle of the screen but also improving its uniformity.

[0057] The material of the nano-microcrystal layer 4 is one of zinc oxide, kaolin, titanium dioxide, montmorillonite, silver, graphene, and aluminum oxide, or a mixture of two to seven of them.

[0058] As shown in Figure 3 , one embodiment of the transparent three-dimensional crystal is a micro-circular spherical nanocrystal, and the reflected incident light can be considered as parallel light. As shown in Figure 4 , the outgoing light will converge at a point in front of the screen and be scattered out, playing a role in scattering light, and the maximum angle is affected by the refractive index, the shape and size of the micro-circular spherical nanocrystal. The shape and size of the micro-circular spherical nanocrystal are not completely standard and uniform, and the distribution position is different, so as to avoid the generation of moire fringes.

[0059] In other embodiments, the transparent three-dimensional crystal is a cubic nanocrystal or a rectangular nanocrystal or a cylindrical nanocrystal or a triangular nanocrystal or a semi-cylindrical nanocrystal or a polyhedral nanocrystal, with irregular shape and size and irregular distribution position, which can also achieve the corresponding effect.

[0060] After such design, the beneficial effects of the present application are: on the traditional metal reflective screen, through the continuous curved surface irregular array structure layer 2 with different curvatures and different heights attached to the reflective layer 3, and the nano-microcrystal layer 4 composed of transparent three-dimensional crystals with irregular shape and size, the structure layer 2 controls the spatial angle distribution of reflected light and the angle scattering and uniformity of reflected light, the nano-microcrystal layer 4 scatters light so that the light is efficiently distributed in the set spatial angle, expanding the viewing angle of the screen and improving its uniformity, ensuring the observation brightness, reducing the reduction of the reflection brightness gain of the projected light, and ensuring better viewing quality.

[0061] More specifically, the material of the reflective layer 3 is silver, aluminum, or nickel, and the thickness is 80 nm-500 nm; the reflective layer 3 is a metal reflective layer with complex refractive index, and the thickness of the metal reflective layer should not be too thick, so as to prevent the scattering from increasing due to the coarseness of the granularity, resulting in a decrease in reflectivity.

[0062] Further design is that the method for manufacturing the projection screen with microcrystal structure further comprises:

[0063] As shown in Figure 2As shown, a dark-colored material is first deposited or electroplated on the surface of the structural layer 2 to serve as a light-absorbing layer 5. Then, a reflective metal is formed on the surface of the light-absorbing layer 5 by printing, spraying, deposition, vacuum evaporation or electroplating to serve as a reflective layer 3.

[0064] When the projected light is reflected by the reflective layer 3, it cannot achieve 100% reflection. There will still be about 0.001% of transmitted light that penetrates the reflective layer 3. The light-absorbing layer 5 is composed of dark-colored light-absorbing material. After the light shines on the light-absorbing material, it is directly absorbed and there is no transmission. It does not produce reflection, large flares, or reflections. Its preferred material is chromium or iron, with a wavelength of 100nm-300nm. Dark-colored materials can absorb all colors of light. The dark-colored material of the light-absorbing layer 5 is attached to the structural layer 2 by deposition or electroplating.

[0065] The absorption layer 5 design can effectively absorb a small amount of transmitted light that penetrates the reflective layer, ensuring that it does not interfere with the image and improving the system's contrast polarization ratio.

[0066] A further design involves a method for manufacturing projection screens with microcrystalline structures, which also includes:

[0067] like Figure 2 As shown, a crystal layer 6 consisting of at least one transparent nanofilm layer is first formed on the surface of the reflective layer 3 by deposition, vacuum evaporation or electroplating, and then a nanocrystalline layer 4 is formed on the surface of the crystal layer 6 by coating or spraying.

[0068] Each transparent nanofilm layer in crystal layer 6 has a thickness of 50nm-200nm, and the number of transparent nanofilm layers in crystal layer 6 is no more than two.

[0069] The crystalline layer 6 has a multi-layered structure with several main functions. One is as a transition layer to increase the adhesion of the metal layer. When using a metal film layer for the reflective layer, many working metals have poor adhesion and high absorption, thus requiring this transition layer. It is usually composed of non-metallic oxides, and its thickness is typically no more than 400nm. The second function of the crystalline layer is to increase the protection of the reflective layer, improving its wear and corrosion resistance and reducing absorption. This function is achieved by a non-metallic oxide film layer, typically 50nm-200nm thick, which has very low light absorption, is very stable, and is wear-resistant, corrosion-resistant, and highly protective. The third function of the crystalline layer is to increase reflection. With multiple 1 / 4 wavelength high and low refractive index material films, incident light undergoes multiple reflections after passing through this crystalline layer. Due to the structural design, the reflected light between different layers has the same phase. Figure 5As shown, the interference of reflected light is enhanced, which plays a role in strengthening the left and right of reflected light; the multilayer structure is stacked to form a multilayer reflection enhancement, which can further improve the reflectivity;

[0070] However, the film layer should not be too much, first, this increase in reflection is only for a specific wavelength range, and cannot enhance the effect of a wide spectrum, and cannot significantly improve the reflectivity after increasing the number of layers. Second, this structure has a certain negative effect on the polarization state of the system, and too many layers will reduce the contrast. Third, too many layers will increase the cost. However, this structure still has great significance, first, the protective effect, which itself plays a protective role for the reflective layer, preventing damage and wear of the metal film layer; second, increase the reflection; the reflectivity of the specific metal reflective film layer is low in the short-wavelength blue-violet part of the visible light, and this reflection enhancement for this waveband is needed to achieve high reflectivity of the visible light as a whole and to ensure the accuracy of the picture color; third, reduce defect loss; limited by the huge size of the screen, in order to control the production cost, some fast coating processes need to be used. Generally speaking, regardless of the coating method, the faster the deposition speed, the more defects there are. Therefore, due to cost considerations, there are more defects such as dust and fine cracks in the body of the film, and the surface is rough. We take k H and k L respectively represent the extinction coefficient of high and low refractive index materials, and n0, n H and n L respectively represent the refractive index of air, high and low refractive index materials. For the film layer of high and low refractive index materials, and the outermost layer is the high refractive index film layer, the absorption loss is:

[0071]

[0072] And if the last layer is a low refractive index film layer, the absorption loss is:

[0073]

[0074] Since the refractive index of high and low refractive index film layers is greater than 1, it can be easily calculated that the absorption loss of the low refractive index film layer is much lower when the last layer is a high refractive index film layer. Therefore, the outermost layer of high refractive index material can obtain better reflectivity and lower loss. This is the role of the crystal multilayer structure. Without this layer, the metal reflective layer itself still needs a protective layer, and the refractive index of the protective layer is generally low (less than 1.5), which brings high scattering loss. Using a multilayer multiple reflection enhancement structure and ensuring that the outermost layer is a high refractive index material can effectively reduce the scattering loss;

[0075] Therefore, the number of 6-nanometer film layers of the crystal layer is not more than two;

[0076] In this way, the crystal layer 6 is added, the adhesion of the reflection layer is increased, the reflection layer is protected, the multiple reflection effect is increased, the reflected light is strengthened, and the problem of insufficient reflectivity of some metals in the metal reflection layer for specific visible light bands is solved.

[0077] In addition, as Figure 2 indicated, a projection screen with a microcrystalline structure is manufactured by any of the above methods, and the screen has the functional advantages of high brightness gain, high polarization ratio, and large scattering angle. The brightness, effective scattering angle, and polarization ratio of the screen are tested and verified compared with the existing metal screen with a metal reflection layer on the market, and the specific tests are as follows.

[0078] Brightness test: the sample of the projection screen with a microcrystalline structure prepared by the above method and the sample of the metal screen with a single-layer metal reflection layer on the market are respectively hung on a frame according to the normal projection orientation and perpendicular to the horizontal plane. The surface is flat, and the sample size is recommended to be 297 mm x 210 mm (width x height). The minimum area of the sample test area should not be less than 650 mm 2 ;

[0079] Position the projection device so that the optical axis of its objective lens is perpendicular to the surface of the screen sample under test and passes through its center. The included angle of the projection beam of the projection device should not be greater than 10°, and the entire screen sample should be illuminated. The projection distance should be slightly greater than the measurement distance of the luminance meter. The measurement distance of the luminance meter should not be less than 1 m, and preferably not greater than 2 m. The luminance data is measured by the luminance meter.

[0080] The measurement shows that the brightness coefficient of the sample of the projection screen with a nano-microcrystalline structure prepared by the above method is 4.032, and the brightness coefficient of the sample of the metal screen with an existing metal reflection layer on the market is 2.145. The brightness is significantly improved.

[0081] Effective scattering angle test: a diffuse reflection panel with a known brightness coefficient β b is placed in the center of the screen sample under test and parallel to it. The projection device is turned on and focused. On the horizontal plane passing through the center of the screen sample, the luminance meter is placed at a viewing angle of 5° between the optical axis and the central normal of the screen sample surface to measure the surface reflection brightness L b of the panel. The diffuse reflection panel is removed, and the reflection brightness L y of the center of the screen sample surface is measured by the luminance meter under the same conditions. After L y is measured, the effective scattering angle 2α should be measured immediately. The luminance meter is gradually increased on the equal distance arc in the horizontal plane to the normal side, and the reading change on the luminance meter is observed. When the luminance reading gradually decreases to 50% of the value of L y , the horizontal angle between the viewing line of the luminance meter at this position and the central normal of the screen is α. When the left and right sides are symmetrical, the effective scattering angle is twice the value of α.

[0082] The effective scattering angle of the projection screen sample with the nano-microcrystal structure prepared by the method is 44°, and the effective scattering angle of the metal screen sample with the existing metal reflection layer is 31°, and the effective scattering angle is increased.

[0083] Polarization ratio measurement: the brightness test measurement device is started, and is focused, one polarizer is placed in front of the lens of the slide projector or the projection device, and another polarizer is placed in front of the brightness meter, the angle of the polarizer in front of the brightness meter is adjusted, so that the polarizer one and the polarizer two are in the same polarization direction, the maximum brightness value b is measured, then the polarizer two is rotated by 90°, the minimum brightness value c is measured, and then the polarization ratio is calculated by the formula R = b / c, wherein (R - the polarization ratio of the screen, expressed in percentage (%); b - the maximum brightness value measured when the polarizer one and the polarizer two are in the same polarization direction, unit: candela per square meter (cd / m 2 );c - the minimum brightness value measured when the polarization directions of the polarizer one and the polarizer two are perpendicular, unit: candela per square meter (cd / m 2 )。

[0084] The polarization ratio of the projection screen sample with the nano-microcrystal structure prepared by the method is 3397.3:1, and the polarization ratio of the metal screen sample with the existing metal reflection layer is 1490.8:1, and the polarization ratio is obviously improved.

[0085] According to the test data, the projection screen with the nano-microcrystal structure prepared by the application can effectively ensure the effective scattering angle, improve the brightness and polarization ratio of the screen, and improve the projection reflection effect and viewing quality.

[0086] In addition to the above, it should be further noted that the "one embodiment", "another embodiment", "embodiment" and the like mentioned in the specification refer to the specific features, structures or characteristics described in conjunction with the embodiment, which are included in at least one embodiment described in the general description of the application. The same expression appears in several places in the specification does not necessarily refer to the same embodiment. Further, when a specific feature, structure or characteristic is described in conjunction with any embodiment, it is claimed that the implementation of such feature, structure or characteristic in conjunction with other embodiments also falls within the scope of the application.

[0087] While the application has been described with reference to numerous exemplary embodiments, it will be understood that various other modifications can be made within the scope of the application as disclosed herein. More particularly, many modifications can be made to the components and / or arrangements of the subject combinations within the scope and spirit of the disclosure, and applicants will not be limited to the specific recitations of the disclosure. For example, the subject combinations can be used in conjunction with other components and / or arrangements not specifically recited.

Claims

1. A method of manufacturing a projection screen with nanocrystalline structure, characterized in that, The method comprises: forming a structure layer on the carrier substrate layer by pressing a transparent adhesive or a transparent plastic body into a relief shape through a press roller or a mold and adhering it to the substrate layer; forming a reflective metal layer on the structure layer by printing, spraying, depositing, vacuum evaporation or electroplating on the surface of the structure layer as a reflective layer; forming a nanocrystalline layer on the reflective layer by coating or spraying on the surface of the reflective layer, wherein the nanocrystalline layer is composed of two or more transparent three-dimensional crystals; the structure layer in a relief shape is composed of a continuous curved surface irregular array with different curvatures and different heights; the transparent three-dimensional crystal in the nanocrystalline layer is a microcrystalline material or a nanoparticle with a crystal structure in a nanometer size range of 100-300 nm; the transparent three-dimensional crystal is a microcircular spherical nanocrystal.

2. The method of claim 1, wherein: The curved surface height of the structure layer ranges from 10 to 100 microns.

3. The method of claim 1, wherein: The nanocrystalline layer material is zinc oxide, nanometer kaolin, titanium dioxide, montmorillonite, silver, graphene, or a mixture of two to seven of the above.

4. The method of claim 1, wherein: The transparent three-dimensional crystal is a cubic nanocrystal, a cuboid nanocrystal, a cylindrical nanocrystal, a triangular nanocrystal, a semi-cylindrical nanocrystal or a polyhedral nanocrystal.

5. The method of claim 1, wherein: The reflective layer material is silver, aluminum or nickel, and the thickness is 80-500 nm.

6. The method of claim 1, wherein, The method further comprises: forming a deep color material layer on the surface of the structure layer by deposition or electroplating as a light absorption layer, and then forming a reflective metal layer on the surface of the light absorption layer by printing, spraying, deposition, vacuum evaporation or electroplating as a reflective layer.

7. The method of claim 6, wherein: The light absorption layer material is chromium or iron, and the thickness is 100-300 nm.

8. The method of claim 1, wherein, The method further comprises: forming a crystal layer on the surface of the reflective layer by deposition, vacuum evaporation or electroplating, and then forming a nanocrystalline layer on the surface of the crystal layer by coating or spraying.

9. The method of claim 8, wherein: The thickness of each transparent nanofilm layer of the crystal layer is 50-200 nm, and the number of transparent nanofilm layers of the crystal layer is not more than two.

10. A projection screen with nanocrystalline structure, characterized in that: The method is manufactured by any one of claims 1-9.

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