A chamfered pad structure for angular variation of a desktop cyclotron

Abstract

The application provides an angle-variable chamfer pad structure for a desktop cyclotron, and belongs to the technical field of small cyclotrons. The angle-variable chamfer pad structure is characterized in that: the structure is formed in a mode that the fixed cutting height H and length L and the variable chamfer cutting angle are adopted, so that the cutting volume of the chamfer pad and the pad amount are in linear relationship; the cutting volume and the pad amount are in linear relationship, that is, the side surface of the side adjacent to the high-frequency cavity is divided into two parts, the lower part is a long rectangular vertical plane penetrating the small radius to the large radius of the insert strip, and the upper part is a curved surface with an inward opening chamfer adjacent to the upper edge line of the long rectangular vertical plane; and the application solves the problem that the increasing of the main magnetic pole opening angle of the desktop cyclotron causes the high-frequency cavity installation space to be nervous or even occupied by adopting the mode that the fixed cutting height H and length L and the variable chamfer cutting angle are adopted.

Description

Technical Field

[0001] This invention belongs to the technical field of small cyclotrons, and particularly relates to a chamfered padding structure for angle changes in desktop cyclotrons. Background Technology

[0002] Compared to conventional cyclotrons of the same energy, desktop cyclotrons have a diameter reduced to three-fifths and a height reduced to nearly half. Simultaneously, the average magnetic field of a desktop cyclotron is significantly higher. This higher average magnetic field is because, with the same beam magnetic stiffness, a smaller cyclotron radius requires a higher magnetic flux density. The 20-30% smaller radius of a desktop cyclotron means a higher average magnetic field. This smaller size and significantly higher average magnetic field present challenges in designing the main magnet.

[0003] The design challenge of the main magnet for a desktop cyclotron is that, due to the significantly higher average magnetic field, the pole angle inevitably increases. This makes traditional magnetic field padding methods unsuitable. Traditional padding involves machining the two sides of a strip to create uneven, curved surfaces. Since these raised areas occupy additional space on both sides of the pole, using this traditional method with an increased pole angle severely restricts the installation space for the high-frequency cavity, potentially even encroaching on it entirely. Summary of the Invention

[0004] To address the problems existing in the prior art, this invention proposes a chamfered padding structure for angle changes in desktop cyclotrons. The purpose is to solve the problem that traditional magnetic field padding methods are not suitable when the magnetic pole angle of a desktop cyclotron increases.

[0005] To solve its technical problem, the present invention adopts the following technical solution:

[0006] A chamfering padding structure for angle variation in a desktop cyclotron is characterized in that the chamfering padding structure with angle variation is achieved by using a fixed cutting height H and length L, and varying the chamfering cutting angle, so that the cutting volume of the chamfering padding is linearly related to the padding amount.

[0007] Furthermore, the method of using a fixed cutting height H and length L, and varying the chamfering cutting angle, involves dividing the side of the insert adjacent to the high-frequency cavity into upper and lower parts. The lower part is a rectangular vertical plane that runs through the insert from its small radius to its large radius. The upper part is a curved surface with an inward chamfer that is adjacent to the upper edge of the rectangular vertical plane. The lower edge of this curved surface is a straight line, which is the upper edge of the rectangular vertical plane. The upper edge of this curved surface is a curve, which is laid on the upper surface of the insert, and each point on the curve has an inward chamfer. The angle of the inward chamfer changes with the radius of the insert.

[0008] Furthermore, the inward chamfering means that the chamfer is tilted in the direction of the right or left side of the strip.

[0009] Furthermore, when the left side of the insert is adjacent to the high-frequency cavity, the chamfer is tilted at an angle to the upper right side of the insert; when the right side of the insert is adjacent to the high-frequency cavity, the chamfer is tilted at an angle to the lower left side of the insert.

[0010] Advantages and effects of the present invention

[0011] This invention solves the problem of insufficient or even occupied installation space for the high-frequency cavity caused by the increased main magnetic pole angle of the desktop cyclotron accelerator. This is achieved by using a chamfered padding structure with varying angles, namely, a fixed cutting height, varying the cutting angle, varying the cutting angle and width above the insert, and making the side of the insert adjacent to the high-frequency cavity a vertical plane. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the non-linear magnetic pole structure of the present invention;

[0013] Figure 2a This is a schematic diagram of the chamfered padding structure with varying angles according to the present invention. Figure 1 ;

[0014] Figure 2b This is a schematic diagram of the chamfered padding structure with varying angles according to the present invention;

[0015] Figure 3a The diagram illustrates the principle of existing technology that uses a fixed 45-degree angle for chamfering and padding, so that the cut volume and the padding amount are in a square relationship.

[0016] Figure 3b The present invention employs a method of fixed height and length, while varying chamfer width for padding, so that the cut volume and padding amount have a linear relationship.

[0017] Figure 3c This is a graph showing the relationship between the amount of magnetic field padding and the magnetic field strength. Detailed Implementation

[0018] Design principle of this invention:

[0019] Proof that the cutting volume V and the padding amount X are linearly related in this invention:

[0020] like Figure 3a The image shows a triangular prism cut from a strip using existing technology. Since the 45-degree triangle is an isosceles triangle with two equal sides (X), the volume of the cut triangular prism is V = X. 2 *L, where X 2 Let X be the change in magnetic field padding. 2 The relationship between V and the cutting volume V is non-linear: V∝x 2 Therefore, as Figure 3c As shown, there is a certain nonlinear relationship between the padding magnetic field and the padding amount.

[0021] like Figure 3b As shown, the dashed line represents the irregular triangular prism cut from the insert using the method of this invention. During the cutting process, the length L and height H of the irregular triangular prism remain constant, while the cutting width X changes. Therefore, the cutting volume of the irregular triangular prism V = X * L * H. Figure 3a The change in magnetic field compensation X is linearly related to the cutting volume V, therefore, as Figure 3c As shown, there is also a linear relationship between the padding magnetic field and the padding amount. The varying cutting width X is also the varying cutting angle.

[0022] like Figure 3c This diagram illustrates the comparison of the effects of two padding methods: the prior art and the present application. It can be seen that when using the method of the present application, the padding amount and the magnetic field have a linear relationship, while when using the prior art method, the padding amount and the magnetic field exhibit a non-linear relationship.

[0023] Based on the above-mentioned inventive principles, this invention designs a chamfered padding structure for angle changes in desktop cyclotrons, such as... Figure 1 , 2a As shown in 2b, 3a, 3b, and 3c, its characteristic is that the chamfering padding structure with varying angles is achieved by using a fixed cutting height H and length L, and varying the chamfering cutting angle, so that the cutting volume of the chamfering padding is linearly related to the padding amount.

[0024] Furthermore, the method of using a fixed cutting height H and length L, and varying the chamfering cutting angle, involves dividing the side of the insert adjacent to the high-frequency cavity into upper and lower parts. The lower part is a rectangular vertical plane that runs through the insert from its small radius to its large radius. The upper part is a curved surface with an inward chamfer that is adjacent to the upper edge of the rectangular vertical plane. The lower edge of this curved surface is a straight line, which is the upper edge of the rectangular vertical plane. The upper edge of this curved surface is a curve, which is laid on the upper surface of the insert, and each point on the curve has an inward chamfer. The angle of the inward chamfer changes with the radius of the insert.

[0025] Additional notes:

[0026] like Figure 3b As shown, the two sides of the curved surface are respectively arranged on two mutually perpendicular planes of the strip. One side (the lower edge) is arranged on the vertical plane of the rectangle, and the other side (the upper edge) is arranged on the horizontal plane at the top of the strip. If a cut is made along the lower edge to the upper edge of the curved surface, the cut body will be an irregular triangular prism. Two sides of the irregular triangular prism are fixed, and the third side is a curve. Each point on the curve is chamfered inward, and the angle of the chamfer changes with the radius of the strip.

[0027] Furthermore, the inward chamfering means that the chamfer is tilted in the direction of the right or left side of the strip.

[0028] Furthermore, when the left side of the insert is adjacent to the high-frequency cavity, the chamfer is tilted at an angle to the upper right side of the insert; when the right side of the insert is adjacent to the high-frequency cavity, the chamfer is tilted at an angle to the lower left side of the insert.

[0029] Obviously, those skilled in the art can make various modifications and variations to this invention without departing from its spirit and scope. Therefore, if these modifications and variations fall within the scope of the claims of this invention and their equivalents, this invention is also intended to include these modifications and variations.

Claims

1. A chamfered padding structure for angle variation in a desktop cyclotron, characterized in that: The chamfering padding structure with varying angles is achieved by fixing the cutting height H and length L of the cutting area and varying the chamfering cutting angle, so that the cutting volume of the chamfering padding is linearly related to the padding amount; The method of using a fixed cutting height H and length L in the cutting area, and varying the chamfering cutting angle, involves dividing the side of the insert adjacent to the high-frequency cavity into upper and lower parts. The lower part is a rectangular vertical plane that runs through the insert from its small radius to its large radius. The upper part is a curved surface with an inward chamfer that is adjacent to the upper edge of the rectangular vertical plane. The lower edge of this curved surface is a straight line, which is the upper edge of the rectangular vertical plane. The upper edge of this curved surface is a curve, which is laid on the upper surface of the insert, and each point on the curve has an inward chamfer. The angle of the inward chamfer changes with the radius of the insert.

2. The chamfered padding structure for angle variation in a desktop cyclotron accelerator according to claim 1, characterized in that: The inward chamfering means that the chamfer is tilted diagonally upward to the right or left of the strip.

3. The chamfered padding structure for angle variation in a desktop cyclotron accelerator according to claim 2, characterized in that: When the left side of the insert is adjacent to the high-frequency cavity, the chamfer is tilted at an angle to the upper right side of the insert; when the right side of the insert is adjacent to the high-frequency cavity, the chamfer is tilted at an angle to the lower left side of the insert.

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