Display panel and display device

By introducing a second color resist and a second black matrix isolation section into the TFT-LCD display panel, the light leakage and mura problems caused by the stacking of color resist and BPS in the narrow bezel design are solved, and the display uniformity and the stability of the liquid crystal pretilt angle are achieved.

CN117742034BActive Publication Date: 2026-06-26SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Filing Date
2024-01-09
Publication Date
2026-06-26

AI Technical Summary

Technical Problem

In existing TFT-LCD display panels with narrow bezel designs, the stacking of color resist and BPS leads to an increase in the thickness of the film layer in the bezel area, making material diffusion difficult and resulting in mura problems and light leakage around the panel.

Method used

A second color resist and a second black matrix isolation section are introduced in the bezel area of ​​the display panel to form a gap and extend its side into the display area. This reduces the terrain of the black matrix isolation section, avoids PI liquid accumulation, and solves the light leakage problem through the uniform distribution of the alignment layer.

Benefits of technology

It effectively prevents light leakage in the bezel area of ​​the display panel, improves the mura problem in dark conditions, and ensures the consistency of the liquid crystal pretilt angle and the uniformity of the display.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application discloses a display panel and a display device. The display panel has a display area and a frame area in the periphery of the display area. The display panel comprises an upper substrate and a lower substrate arranged oppositely, a color resistance layer and a spacer layer. The lower substrate is provided with a thin film transistor in the display area. The color resistance layer is arranged on the lower substrate and comprises a first color resistance and a second color resistance. The first color resistance is in the display area and above the thin film transistor. The second color resistance is in the frame area and is arranged separately from the first color resistance to form a gap. The spacer layer comprises a first black matrix isolation part and a second black matrix isolation part. The first black matrix isolation part is in the display area and between the first color resistance and the upper substrate. The second black matrix isolation part is in the frame area and above the second color resistance. One side edge of the second black matrix isolation part extends to the gap in the display area to make the upper surface of the second black matrix isolation part sink to form a transition surface at the position corresponding to the gap.
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Description

Technical Field

[0001] This application relates to the field of display device technology, specifically to a display panel and a display device. Background Technology

[0002] TFT-LCD (Thin Film Transistor Liquid Crystal Display) is one of the mainstream display types. TFT-LCD consists of an array substrate and a color filter substrate. The array substrate includes a gate layer, gate insulating layer, semiconductor layer, source / drain electrode layer, protective layer, and other film layer patterns. The color filter substrate includes a black matrix, RGB color resists, and film pillars. To reduce the photomask size, further simplify the process, and improve equipment capacity and utilization, a BPS (Black Photo Spacer) technology has been proposed. This technology combines BM (Black Mask) and PS (Black Photo Spacer) into a single photomask, fabricated on the array substrate. Simultaneously, when TFT-LCDs have narrow bezels, a color resist + BPS stacked structure is used to address light leakage at the panel edges. However, because the color resist + BPS stacked structure results in a thicker film layer in the bezel area than in the display area, it causes difficulties in material diffusion and accumulation during PI (Polymer Injection) film fabrication. This leads to mura (discrepancy in grayscale around the panel edges compared to other areas), resulting in abnormal panel display. Summary of the Invention

[0003] This application provides a display panel and display device that can solve the problem of light leakage at the edge of the panel and the problem of mura around the panel.

[0004] In a first aspect, embodiments of this application provide a display panel having a display area and a border area surrounding the display area, the display panel comprising:

[0005] An upper substrate and a lower substrate are arranged opposite to each other, and a thin-film transistor is disposed on the lower substrate within the display area;

[0006] A color resist layer is disposed on the lower substrate and includes a first color resist and a second color resist. The first color resist is located in the display area and above the thin film transistor, and the second color resist is located in the border area and is spaced apart from the first color resist to form a gap.

[0007] The spacer layer includes a first black matrix isolation portion and a second black matrix isolation portion. The first black matrix isolation portion is located in the display area and between the first color resist and the upper substrate. The second black matrix isolation portion is located in the border area and above the second color resist. One side of the second black matrix isolation portion extends toward the display area and terminates in the gap, so that the upper surface of the second black matrix isolation portion sinks at the position corresponding to the gap and forms a transition surface.

[0008] In one embodiment, the display panel further includes:

[0009] A first alignment layer is disposed on the side of the upper substrate facing the lower substrate;

[0010] The second alignment layer is disposed on the upper surface of the second black matrix isolation portion and is located in the border area. One side of the first alignment layer extends to the display area and ends at the first black matrix isolation portion.

[0011] In one embodiment, the first color resist includes a red sub-color resist, a green sub-color resist, and a blue sub-color resist; and / or,

[0012] The second color resist is set to green.

[0013] In one embodiment, the width of the gap is set to 100 μm to 500 μm.

[0014] In one embodiment, the step difference between the transition surface and the upper surface of the second black matrix isolation portion is set to H1, where 1≤H1≤1.2.

[0015] In one embodiment, the lower substrate further includes a lower substrate;

[0016] The thin-film transistor is disposed on the lower substrate;

[0017] The lower substrate further includes a polymer layer disposed on the lower substrate and covering the thin film transistor and the color resist layer. A portion of the polymer layer is disposed within the gap to form a groove on its surface away from the substrate.

[0018] The spacer layer is disposed on the polymer layer, and one side of the second black matrix isolation portion extends toward the display area and terminates in the groove;

[0019] The transition surface corresponds to the position of the groove.

[0020] In one embodiment, the distance between the transition surface and the upper surface of the polymer layer is H2, where 1 ≤ H2 ≤ 1.2; and / or,

[0021] The distance between the upper substrate and the upper surface of the polymer layer is H3, where 3≤H3≤3.3.

[0022] In one embodiment, the first black matrix isolation portion includes a stacked black matrix and a support pillar. The black matrix is ​​disposed on the first color resist, and the support pillar connects the black matrix and the upper substrate to maintain the spacing between the upper substrate and the lower substrate.

[0023] The black matrix forms a first orthographic projection on the lower substrate, and the support column forms a second orthographic projection on the lower substrate. The first orthographic projection completely covers the second orthographic projection, and the area of ​​the first orthographic projection is larger than that of the second orthographic projection.

[0024] In one embodiment, the upper surface of the second black matrix isolation portion is flush with the upper surface of the black matrix.

[0025] Secondly, embodiments of this application provide a display device including the aforementioned display panel.

[0026] Beneficial Effects: In the display panel provided by this application, within the display area, the first color resist and the first black matrix isolation portion on the lower substrate jointly shield the light between adjacent pixels within the display area. Simultaneously, the first black matrix isolation portion supports the upper substrate, maintaining the distance between the upper and lower substrates. Within the border area, the second color resist and the second black matrix isolation portion on the lower substrate jointly shield the border area, preventing light leakage from the display panel in the border area. It is understood that by adding the second color resist in the border area, the elevation of the second black matrix isolation portion is raised. The second black matrix isolation portion forms a barrier on the side facing the display area. When the PI liquid is coated onto the spacer layer in subsequent processes, the PI liquid will be absorbed by the second black matrix isolation portion. Side backflow buildup is a problem. In this application, the distance between the second color resist and the first color resist is increased to form a gap between them. When the second black matrix isolation portion is fabricated on the second color resist, the side of the second black matrix isolation portion facing the display area extends to the gap. The upper surface of the second black matrix isolation portion is recessed at the position corresponding to the gap to form the transition surface. Since the transition surface is lower than the upper surface of the second black matrix isolation portion, the terrain of the side of the second black matrix isolation portion near the display area is reduced. When the PI liquid is coated subsequently, the PI liquid will not accumulate, and the alignment layer is evenly distributed, thereby making the pretilt angle of the liquid crystal approximately the same everywhere, thus solving the peripheral mura problem of light leakage in the display panel in the dark state. Attached Figure Description

[0027] The technical solution and other beneficial effects of this application will become apparent from the following detailed description of specific embodiments in conjunction with the accompanying drawings.

[0028] Figure 1 This is a schematic diagram of the structure of a display panel in the prior art (without added color resist);

[0029] Figure 2 A schematic diagram of the structure of a display panel (with added color resist) in the prior art;

[0030] Figure 3 This is a schematic diagram of the structure of the display panel provided in an embodiment of this application;

[0031] Figure 4 for Figure 3 An enlarged schematic diagram of part A in the image. Detailed Implementation

[0032] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0033] In the description of this application, it should be understood that the terms "above," "below," "front," "back," "left," "right," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and should not be construed as limiting this application. Furthermore, unless otherwise expressly specified and limited, "above" or "below" the second feature of the first feature merely indicates that the first feature is at a higher or lower level than the second feature, and does not indicate a direct connection relationship.

[0034] Furthermore, the terms "first" and "second" are used for descriptive purposes only, and features defined as "first" or "second" may explicitly or implicitly include one or more of the stated features. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0035] The following disclosure provides many different embodiments for implementing different structures of this application. To simplify the disclosure of this application, specific examples of components and arrangements are described below. Of course, these are merely examples and are not intended to limit the scope of this application. Furthermore, various specific examples of processes and materials are provided in this application, but those skilled in the art will recognize the application of other processes and / or the use of other materials.

[0036] This application provides a display panel and a display device. The display panel can be a display panel in a mobile phone, computer, television, or multimedia display device, etc., and is not limited thereto.

[0037] In a first aspect, embodiments of this application provide a display panel 100. Please refer to... Figure 3The display panel 100 has a display area 1a and a border area 1b surrounding the display area 1a. The display panel 100 includes an upper substrate 1 and a lower substrate 2 disposed opposite to each other, a color resist layer 3, and a spacer layer 4. A thin-film transistor 21 is disposed in the display area 1a on the lower substrate 2. The color resist layer 3 is disposed on the lower substrate 2 and includes a first color resist 31 and a second color resist 32. The first color resist 31 is located in the display area 1a and above the thin-film transistor 21, and the second color resist 32 is located in the border area 1b and is spaced apart from the first color resist 31. To form a gap 33; the spacer layer 4 includes a first black matrix isolation portion 41 and a second black matrix isolation portion 42. The first black matrix isolation portion 41 is located in the display area 1a and between the first color resist 31 and the upper substrate 1. The second black matrix isolation portion 42 is located in the border area 1b and above the second color resist 32. One side of the second black matrix isolation portion 42 extends toward the display area 1a and terminates in the gap 33, so that the upper surface 421 of the second black matrix isolation portion 42 sinks at the position corresponding to the gap 33 to form a transition surface 422.

[0038] Understandably, please refer to Figure 1 In existing narrow-bezel products, only a middle frame 7' is provided on the outer side of the display panel 100'. The lower substrate 2' near the backlight module needs to be adhered and fixed to the middle frame 7' with black tape 73'. A lower polarizer 9' is attached to the side of the lower substrate 2' facing the backlight module. There is a gap between the lower polarizer 9' and the black tape 73'. Some of the light emitted by the backlight module passes through the gap. Among the light entering the bezel area 1b' through the gap, 8% of the light with a wavelength of 410nm passes through the BPS material 42' set in the bezel area 1b'. As a result, some blue light passes through the upper polarizer 8' on the upper side of the upper substrate 1', causing light leakage in the bezel area 1b'. To solve the light leakage problem in the bezel area 1b', please refer to [link to relevant documentation]. Figure 2 The existing solution proposes to place a color resist 32' below the BPS 42' in the bezel area 1b'. The color resist 32' and BPS 42' together block light, thereby filtering out light leakage. However, the placement of the color resist 32' will raise the elevation of the BPS 42' in the bezel area 1b'. The side of the BPS 42' facing the display area 1a' will form a barrier. When the PI liquid is coated on the BPS 42' in the subsequent process, the PI liquid will flow back and accumulate on the side of the BPS 42', which will result in a larger liquid crystal pretilt angle at that point, causing light leakage in the dark state and resulting in a mura problem around the display panel 100'.

[0039] In the display panel 100 provided in this application, please refer to... Figure 3Within the display area 1a, the first color resist 31 and the first black matrix isolation portion 41 on the lower substrate 2 jointly shield adjacent pixels within the display area 1a from light. Simultaneously, the first black matrix isolation portion 41 supports the upper substrate 1, maintaining the distance between the upper substrate 1 and the lower substrate 2. Within the border area 1b, the second color resist 32 and the second black matrix isolation portion 42 on the lower substrate 2 jointly shield the border area 1b from light, preventing light leakage from the display panel 100 in the border area 1b. Simultaneously, increasing the distance between the second color resist 32 and the first color resist 31 creates a gap 33 between them. When the second black matrix isolation portion 42 is fabricated on the resist 32, the side of the second black matrix isolation portion 42 facing the display area 1a extends to the end within the gap 33. The upper surface 421 of the second black matrix isolation portion 42 sinks at the position corresponding to the gap 33 to form the transition surface 422. Since the transition surface 422 is lower in elevation than the upper surface 421 of the second black matrix isolation portion 42, the elevation of the side of the second black matrix isolation portion 42 near the display area 1a is reduced. During the subsequent coating of PI liquid, the PI liquid will not accumulate, and the alignment layer will be evenly distributed, thereby making the pretilt angle of the liquid crystal approximately the same in all places, thus solving the peripheral mura problem of light leakage in the display panel 100 in the dark state.

[0040] In one embodiment, the display panel 100 further includes a first alignment layer 51 and a second alignment layer 52; the first alignment layer 51 is disposed on the side of the upper substrate 1 facing the lower substrate 2; the second alignment layer 52 is disposed on the upper surface 421 of the second black matrix isolation portion 42, the second alignment layer 52 is located in the border area 1b, and one side of the first alignment layer 51 extends to the display area 1a and terminates at the first black matrix isolation portion 41; it is understood that the initial alignment of liquid crystal molecules is a key factor of the display panel 100 and has a great influence on the photoelectric performance of the display panel 100. The alignment layer is a key element for obtaining a stable and uniform liquid crystal molecule arrangement; by setting the first alignment layer 51 and the second alignment layer 52, the liquid crystal molecules of the display panel 100 are aligned... The liquid crystal molecules have a consistent and stable pretilt angle, which makes the arrangement of liquid crystal molecules stable and uniform. At the same time, the upper surface 421 of the second black matrix isolation part 42 sinks at the position corresponding to the gap 33 to form the transition surface 422, thereby reducing the terrain of the second black matrix isolation part 42 near the side of the display area 1a. The second alignment layer 52 is formed on the upper surface 421 of the second black matrix isolation part 42 and extends through the transition surface 422 to the display area 1a and ends at the first black matrix isolation part 41. This makes the PI liquid of the second alignment layer 52 flow evenly and will not accumulate on the side of the second black matrix isolation part 42, thereby avoiding the liquid crystal molecules in some areas having a large pretilt angle, which would lead to light leakage and perimeter mura problems in the display panel 100 in the dark state.

[0041] In this application, the first color resist 31 includes a red sub-color resist, a green sub-color resist, and a blue sub-color resist; within the display area 1a of the lower substrate 2, the first color resist 31 is configured as a red sub-color resist, a green sub-color resist, and a blue sub-color resist to form the red, blue, and green colored light emitted by the display panel 100.

[0042] In this application, the second color resist 32 is set as a green color resist or a red color resist. It is known that 8% of the light in the 410nm band will pass through the second black matrix isolation portion 42 disposed in the border area 1b, thereby some blue light will pass through the upper substrate 1, resulting in light leakage in the border area 1b, and the light leakage in the border area 1b will appear bluish. By setting the second color resist 32 as a green color resist or a red color resist, blue light can be completely filtered out, further improving the effect of preventing light leakage in the border area 1b.

[0043] It should be noted that the above two technical features can be set individually or simultaneously. Specifically, in one embodiment, the above two technical features are set simultaneously.

[0044] It is understandable that the thickness of the second black matrix isolation portion 42 is generally set to 1.3μm. When the width of the gap 33 between the second color resist 32 and the first color resist 31 is small, the second black matrix isolation portion 42 will fill the gap 33 during the fabrication of the second black matrix isolation portion 42, thus failing to achieve the effect of reducing the side profile of the second black matrix isolation portion 42; in one embodiment, please refer to Figure 4 The width of the gap 33 is set to 100μm to 500μm. Thus, the spacing between the first color resist 31 and the second color resist 32 is relatively wide. After the side of the second black matrix isolation part 42 extends into the gap 33, the upper surface 421 of the second black matrix isolation part 42 will sink significantly at the position corresponding to the gap 33, thereby forming the transition surface 422. This reduces the terrain of the second black matrix isolation part 42 near the side of the display area 1a, solving the problem of PI liquid accumulation on the side.

[0045] Similarly, when the step difference between the transition surface 422 and the upper surface 421 of the second black matrix isolation section 42 is too small, the position of the transition surface 422 does not actually decrease significantly, and the side terrain of the second black matrix isolation section 42 remains high, still posing a risk of PI liquid accumulating on the side. In one embodiment, see further... Figure 4 The step difference between the transition surface 422 and the upper surface 421 of the second black matrix isolation part 42 is set to H1, where 0.6μm≤H1≤0.8μm. At this time, the transition surface 422 is significantly lower than the upper surface 421 of the second black matrix isolation part 42, and the side terrain of the second black matrix isolation part 42 is significantly lower, thereby eliminating the risk of PI liquid accumulating on the side.

[0046] In one embodiment, the lower substrate 2 further includes a lower substrate; the thin-film transistor 21 is disposed on the lower substrate; see further reference. Figure 3 The lower substrate 2 further includes a polymer layer 22 disposed on the lower substrate and covering the thin film transistor 21 and the color resist layer 3. A portion of the polymer layer 22 is placed within the gap 33 to form a groove on its surface away from the substrate. The spacer layer 4 is disposed on the polymer layer 22, and one side of the second black matrix isolation portion 42 extends toward the display area 1a and terminates in the groove. The transition surface 422 corresponds to the position of the groove.

[0047] In this embodiment, the polymer layer 22 is used to isolate the color resist layer 3 and the spacer layer 4. When the polymer layer 22 is fabricated on the color resist layer 3, the material flows into the gap 33, thereby forming a groove on the upper surface 421 of the polymer layer 22. When the second black matrix isolation portion 42 is fabricated on the polymer layer 22, the second black matrix isolation portion 42 extends into the groove towards the side of the display layer, thereby forming the transition surface 422 on its upper surface 421. That is, from the direction from the border area 1b to the display area 1a, the upper surface 421 of the second black matrix isolation portion 42, the transition surface 422, and the polymer layer 22 are arranged in a stepped manner and descend layer by layer. When the second alignment layer 52 is fabricated on the spacer layer 4, the second alignment layer 52 extends along the upper surface 421 of the second black matrix isolation portion 42, through the transition surface 422 to the upper surface 421 of the polymer layer 22, and terminates at the first black matrix isolation portion 41. In this way, when fabricating the second alignment layer 52, the PI liquid can flow along the upper surface 421 of the second black matrix isolation portion 42, the transition surface 422, and the upper surface 421 of the polymer layer 22, and will not accumulate on the side of the second black matrix isolation portion 42. This makes the second alignment layer 52 uniformly distributed, thereby making the pretilt angle of the liquid crystal approximately the same at each location, and solving the peripheral mura problem of light leakage in the display panel 100 in the dark state.

[0048] This application does not limit the specific material of the polymer layer 22. In one embodiment, the material of the polymer layer 22 includes PFA (Polyfluoroalkoxy, tetrafluoroethylene-perfluoroalkoxy vinyl ether copolymer).

[0049] Further references are provided in this application. Figure 4 The distance between the transition surface 422 and the upper surface 421 of the polymer layer 22 is H2, where 0.9μm≤H2≤1.1μm. With this setting, the transition surface 422 is significantly lower than the upper surface 421 of the second black matrix isolation part 42, and the side terrain of the second black matrix isolation part 42 is significantly reduced, thereby eliminating the risk of PI liquid accumulating on the side.

[0050] Further references are provided in this application. Figure 4 The distance between the transition surface 422 and the upper surface 421 of the polymer layer 22 is H3, where 3.2μm≤H3≤3.4μm.

[0051] It should be noted that the above two technical features can be set individually or simultaneously; specifically, in one embodiment, the above two technical features are set simultaneously.

[0052] This application does not impose specific restrictions on the form of the first black matrix isolation part 41 and the second black matrix isolation part 42. The first black matrix isolation part 41 can be a spacer column, and the second black matrix isolation part 42 can be a spacer layer.

[0053] In one embodiment, the first black matrix isolation portion 41 includes a stacked black matrix 411 and a support column 412. The black matrix 411 is disposed on the first color resist 31, and the support column 412 connects the black matrix and the upper substrate 1 to maintain the spacing between the upper substrate 1 and the lower substrate 2. The black matrix 411 forms a first orthographic projection on the lower substrate 2, and the support column 412 forms a second orthographic projection on the lower substrate 2. The first orthographic projection completely covers the second orthographic projection, and the area of ​​the first orthographic projection is larger than that of the second orthographic projection.

[0054] Furthermore, the upper surface 421 of the second black matrix isolation part 42 is flush with the upper surface 421 of the black matrix 411.

[0055] In one embodiment, the display panel 100 further includes a frame adhesive 6 disposed between the upper substrate 1 and the lower substrate 2, the frame adhesive 6 extending along the periphery of the upper substrate 1 to seal the upper substrate 1 and the lower substrate 2.

[0056] In one embodiment, the display panel 100 further includes an upper polarizer 8 and a lower polarizer 9. The upper polarizer 8 is disposed on the side of the upper substrate 1 away from the lower substrate 2 and completely covers the upper substrate 1. The lower polarizer 9 is disposed on the side of the lower substrate 2 away from the upper substrate 1.

[0057] In one embodiment, the display panel 100 further includes a middle frame 7, which includes a frame body 71 and a lower folding arm 72. The frame body 71 is disposed on the side of the upper substrate 1 and the lower substrate 2. The lower folding arm 72 is connected to the lower end of the frame body 71. The lower folding arm 72 is bonded to the lower substrate 2 by a black adhesive tape 73. The black adhesive tape 73 is spaced apart from the lower polarizer 9.

[0058] Secondly, embodiments of this application provide a display device. The display device includes a display panel 100; it should be noted that the display panel 100 is configured as described above, that is, the display panel 100 has all the embodiments of the display panel 100 described above, and the display device also has all the technical features of all the embodiments of the display panel 100 described above, and thus has all the beneficial effects brought by all the technical features, which will not be elaborated here.

[0059] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0060] The above provides a detailed description of a display panel and display device provided in the embodiments of this application. Specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the technical solutions and core ideas of this application. Those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. These modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A display panel, characterized in that, The display panel has a display area and a border area surrounding the display area, and the display panel includes: An upper substrate and a lower substrate are arranged opposite to each other, and a thin-film transistor is disposed on the lower substrate within the display area; A color resist layer is disposed on the lower substrate and includes a first color resist and a second color resist. The first color resist is located in the display area and above the thin film transistor, and the second color resist is located in the border area and is spaced apart from the first color resist to form a gap. The spacer layer includes a first black matrix isolation portion and a second black matrix isolation portion. The first black matrix isolation portion is located in the display area and between the first color resist and the upper substrate. The second black matrix isolation portion is located in the border area and above the second color resist. One side of the second black matrix isolation portion extends toward the display area and terminates in the gap, so that the upper surface of the second black matrix isolation portion sinks at the position corresponding to the gap and forms a transition surface. The step difference between the transition surface and the upper surface of the second black matrix isolation part is set to H1, where 0.6≤H1≤0.

8.

2. The display panel as described in claim 1, characterized in that, The display panel also includes: A first alignment layer is disposed on the side of the upper substrate facing the lower substrate; The second alignment layer is located in the border area and on the upper surface of the second black matrix isolation portion. The second alignment layer extends through the transition surface to the display area and terminates at the first black matrix isolation portion.

3. The display panel as described in claim 1, characterized in that, The first color resist includes a red sub-color resist, a green sub-color resist, and a blue sub-color resist; and / or, The second color resist is set to either a green color resist or a red color resist.

4. The display panel as described in claim 1, characterized in that, The width of the gap is set to 100μm~500μm.

5. The display panel as described in claim 1, characterized in that, The lower substrate further includes a lower substrate; The thin-film transistor is disposed on the lower substrate; The lower substrate further includes a polymer layer disposed on the lower substrate and covering the thin film transistor and the color resist layer. A portion of the polymer layer is disposed within the gap to form a groove on its surface away from the substrate. The spacer layer is disposed on the polymer layer, and one side of the second black matrix isolation portion extends toward the display area and terminates in the groove; The transition surface corresponds to the position of the groove.

6. The display panel as described in claim 5, characterized in that, The distance between the transition surface and the upper surface of the polymer layer is H2, where 1 ≤ H2 ≤ 1.2; and / or, The distance between the transition surface and the upper surface of the polymer layer is H3, where 3≤H3≤3.

3.

7. The display panel as described in claim 1, characterized in that, The first black matrix isolation section includes a stacked black matrix and a support pillar. The black matrix is ​​disposed on the first color resist, and the support pillar connects the black matrix and the upper substrate to maintain the spacing between the upper substrate and the lower substrate. The black matrix forms a first orthographic projection on the lower substrate, and the support column forms a second orthographic projection on the lower substrate. The first orthographic projection completely covers the second orthographic projection, and the area of ​​the first orthographic projection is larger than that of the second orthographic projection.

8. The display panel as described in claim 7, characterized in that, The upper surface of the second black matrix isolation part is flush with the upper surface of the black matrix.

9. A display device, characterized in that, Includes the display panel as described in any one of claims 1 to 8.