Display Panel

By setting multiple pixel openings on the pixel definition layer of the OLED display panel and increasing the opening rate of the sub-pixels with different widths, the problem of how to improve the quality and life of the display panel is solved, and a more efficient manufacturing process and lower manufacturing cost are achieved.

CN118401055BActive Publication Date: 2025-05-02HKC CORP LTD
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Patent Information

Application Number
CN202410437799.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-04-11
Publication Date
2025-05-02
Estimated Expiration
2044-04-11

AI Technical Summary

Technical Problem

How to increase the pixel opening ratio of the OLED display panel to improve the life and quality of the display panel.

Method used

By setting a plurality of pixel openings on the pixel definition layer of the display panel and dividing the sub-pixels into a central sub-pixel and a peripheral sub-pixel, a first isolation structure and a second isolation structure with different widths are set to reduce the width of the partial isolation structure to improve the opening rate of the sub-pixels.

Benefits of technology

By increasing the opening rate of sub-pixels, the quality and life of the display panel are improved, while reducing the process difficulty and manufacturing cost of manufacturing isolation structures.

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Abstract

The present invention relates to the technical field of displays, and in particular to a display panel. The sub-pixels of a pixel group are divided into a central sub-pixel and a peripheral sub-pixel, so that a first isolation structure and a second isolation structure with different widths are set between the central sub-pixel and the peripheral sub-pixel and between adjacent peripheral sub-pixels, and the widths of part of the first isolation structure and part of the second isolation structure are reduced, the isolation structure with the first width and the sub-pixel cathode realize the electrical connection of adjacent sub-pixels, and the isolation structure with the second width is narrowed to increase the opening area of ​​the sub-pixels on both sides, and the quality of the display panel can be improved by increasing the aperture ratio of the sub-pixels.
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Description

Technical Field

[0001] The present invention relates to the technical field of displays, and in particular to a display panel. Background Art

[0002] OLED (Organic Light-Emitting Diode) is called organic light-emitting diode. OLED display technology has many advantages such as full solid state, active light emission, high contrast, ultra-thin, low power consumption, fast effect speed, wide working range, easy to realize flexible display and 3D display, etc., which makes it currently used in many display screens, such as televisions and mobile display devices. The pixel opening rate of OLED display panel is one of the important factors that determine the quality of display panel. The larger the pixel opening, the more conducive it is to improve the life of the display panel. Therefore, how to increase the pixel opening of the display panel is an important topic in the display field. Summary of the invention

[0003] The purpose of the present application is to provide a display panel.

[0004] The present application provides a display panel, comprising: a substrate, provided with a pixel definition layer, the pixel definition layer having a plurality of pixel openings; a pixel group, comprising a plurality of sub-pixels arranged at the pixel openings, wherein one of the sub-pixels is a central sub-pixel, and the remaining plurality of the sub-pixels are peripheral sub-pixels surrounding the central sub-pixel, and adjacent pixel groups share one peripheral sub-pixel; an isolation structure, protruding from the pixel definition layer and surrounding the pixel opening, the isolation structure comprising a first isolation structure and a second isolation structure, the first isolation structure being located between two adjacent peripheral sub-pixels, and the second isolation structure being located between adjacent central sub-pixels and the peripheral sub-pixels; the width of the orthographic projection of at least part of the first isolation structure and at least part of the second isolation structure on the substrate is a first width, and the width of the orthographic projection of at least part of the second isolation structure on the substrate is a second width, the first width is greater than the second width, and cathodes of adjacent sub-pixels are electrically connected through the isolation structure of the first width.

[0005] In an exemplary embodiment of the present application, the orthographic projection shape of the central sub-pixel on the substrate is a quadrilateral, the orthographic projection shape of the peripheral sub-pixel on the substrate is a hexagon, and each pixel group has four peripheral sub-pixels, and the four peripheral sub-pixels are arranged in a one-to-one correspondence with the four sides of the central sub-pixel; the six side edges of the peripheral sub-pixels include two straight edges and four oblique edges, two of the straight edges are arranged opposite to each other and respectively face one of the central sub-pixels, and the four oblique edges respectively correspond to the other four peripheral sub-pixels; the first isolation structure is arranged corresponding to the oblique edges, and the second isolation structure is arranged corresponding to the straight edges.

[0006] In an exemplary embodiment of the present application, the second isolation structure includes a transverse isolation structure and a longitudinal isolation structure, the transverse isolation structure extends in a first direction, the longitudinal isolation structure extends in a second direction, the first direction is perpendicular to and intersects with the second direction; at least one of the transverse isolation structure and the longitudinal isolation structure has the first width.

[0007] In an exemplary embodiment of the present application, all of the lateral isolation structures have the first width, and all of the longitudinal isolation structures have the second width; or, all of the longitudinal isolation structures have the first width, and all of the lateral isolation structures have the second width.

[0008] In an exemplary embodiment of the present application, all of the transverse isolation structures have a first width, some of the longitudinal isolation structures have a first width, some of the longitudinal isolation structures have a second width, and the longitudinal isolation structures with the first width and the longitudinal isolation structures with the second width are alternately arranged in the first direction; or, all of the longitudinal isolation structures have a first width, some of the transverse isolation structures have a first width, some of the transverse isolation structures have a second width, and the transverse isolation structures with the first width and the transverse isolation structures with the second width are alternately arranged in the second direction.

[0009] In an exemplary embodiment of the present application, the orthographic projection of the central sub-pixel on the substrate is a rectangle, and the orthographic projection of the peripheral sub-pixel on the substrate is a parallelepiped; the orthographic projection of the first isolation structure as a whole on the substrate constitutes a plurality of array-arranged rectangles; the orthographic projection of the second isolation structure as a whole on the substrate constitutes a plurality of array-arranged X-shapes.

[0010] In an exemplary embodiment of the present application, the isolation structure includes a main layer and an eaves layer arranged in sequence, and the eaves layer is protruded toward the pixel opening relative to the main layer; the isolation structure has conductivity or insulation; the main layer of the first isolation structure has conductivity and is used to electrically connect the cathode of the adjacent peripheral sub-pixel.

[0011] In an exemplary embodiment of the present application, the eaves layer of the first isolation structure and the eaves layer of the second isolation structure are both insulating, and the two are formed in the same patterning process; the main layer of the first isolation structure and the main layer of the second isolation structure are both conductive layers, and the two are formed in the same patterning process.

[0012] In an exemplary embodiment of the present application, in the isolation structure having the first width, the main layer is conductive and the eaves layer is insulating; in the isolation structure having the second width, the main layer is insulating and the eaves layer is conductive; wherein, in the isolation structure having the first width and the isolation structure having the second width, the eaves layer in the isolation structure having the second width and the main layer in the isolation structure having the first width are formed in the same patterning process, and the main layer in the isolation structure having the second width and the pixel definition layer use the same insulating material.

[0013] In an exemplary embodiment of the present application, the isolation structure includes a main body layer and an eaves layer arranged in sequence, and the eaves layer is protruded toward the pixel opening relative to the main body layer; in the isolation structure with the first width and the isolation structure with the second width, the main body layer and the eaves layer of both are insulating and are formed in the same graphic process, and the main body layers and the pixel definition layers of both are made of the same insulating material.

[0014] A display panel according to the present application has the following beneficial effects: a pixel definition layer is provided on the substrate, and the pixel definition layer has a plurality of pixel openings; the sub-pixels are provided in the pixel openings, and the sub-pixels include a central sub-pixel and a peripheral sub-pixel, and adjacent pixel groups share one peripheral sub-pixel; a plurality of the sub-pixels are provided in the pixel openings in a one-to-one correspondence; an isolation structure is provided protruding from the pixel definition layer and surrounds the pixel opening, and the isolation structure includes a first isolation structure and a second isolation structure, the first isolation structure is provided between two adjacent peripheral sub-pixels, and the second isolation structure is provided between adjacent central sub-pixels and the peripheral sub-pixels; the width of the orthographic projection of at least part of the first isolation structure and at least part of the second isolation structure on the substrate is a first width, and the width of the orthographic projection of at least part of the second isolation structure on the substrate is a second width, the first width is greater than the second width, and cathodes of adjacent sub-pixels are electrically connected through the isolation structure of the first width. The sub-pixels of the pixel group are divided into a central sub-pixel and a peripheral sub-pixel, so that a first isolation structure and a second isolation structure with different widths are arranged between the central sub-pixel and the peripheral sub-pixel and between adjacent peripheral sub-pixels, and the widths of part of the first isolation structure and part of the second isolation structure are reduced. The isolation structure with the first width realizes electrical connection with the sub-pixel cathode to adjacent sub-pixels, and the isolation structure with the second width is narrowed to increase the opening area of ​​the sub-pixels on both sides. By increasing the aperture ratio of the sub-pixels, the quality of the display panel can be improved.

[0015] Other features and advantages of the present application will become apparent from the following detailed description, or may be learned in part by the practice of the present application.

[0016] It should be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The drawings herein are incorporated into the specification and constitute a part of the specification, illustrate embodiments consistent with the present application, and together with the specification are used to explain the principles of the present application. Obviously, the drawings described below are only some embodiments of the present application, and for ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0018] Figure 1 is a schematic structural diagram of a display panel in an embodiment of the present invention;

[0019] Figure 2 is a schematic structural diagram of a first embodiment of a pixel group in an embodiment of the present invention;

[0020] Figure 3 is a schematic structural diagram of a second embodiment of a pixel group in an embodiment of the present invention;

[0021] Figure 4 is a schematic structural diagram of a third embodiment of a pixel group in an embodiment of the present invention;

[0022] Figure 5 is a cross-sectional schematic diagram of a first embodiment of an isolation structure in an embodiment of the present invention;

[0023] Figure 6 is a cross-sectional schematic diagram of a second embodiment of an isolation structure in an embodiment of the present invention;

[0024] Figure 7 is a cross-sectional schematic diagram of a third embodiment of an isolation structure in an embodiment of the present invention;

[0025] Figure 8 is a cross-sectional schematic diagram of a fourth embodiment of an isolation structure according to an embodiment of the present invention;

[0026] Fig. 9 4 is a cross-sectional schematic diagram of a fifth embodiment of the isolation structure in the embodiments of the present invention.

[0027] Description of reference numerals:

[0028] 100, substrate; 200, pixel definition layer; 210, pixel opening; 300, pixel group; 310, sub-pixel; 311, central sub-pixel; 312, peripheral sub-pixel; 312A, straight edge; 312B, oblique edge; 400, isolation structure; 401, main layer; 402, eaves layer; 410, first isolation structure; 420, second isolation structure; 421, horizontal isolation structure; 422, vertical isolation structure; D1, first width; D2, second width; D3, third width; D4, fourth width. DETAILED DESCRIPTION

[0029] Example embodiments will now be described more fully with reference to the accompanying drawings. However, example embodiments can be implemented in a variety of forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this application will be more comprehensive and complete and fully convey the concept of the example embodiments to those skilled in the art.

[0030] In addition, described feature, structure or characteristic can be combined in one or more embodiments in any suitable manner. In the following description, many specific details are provided to provide a full understanding of the embodiments of the present application. However, those skilled in the art will appreciate that the technical scheme of the present application can be put into practice without one or more of the specific details, or other methods, components, devices, steps, etc. can be adopted. In other cases, known methods, devices, realizations or operations are not shown or described in detail to avoid blurring the various aspects of the application.

[0031] The present application is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be noted that the technical features involved in the various embodiments of the present application described below can be combined with each other as long as they do not conflict with each other. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present application, and should not be understood as limiting the present application.

[0032] It should be noted that the "multiple" mentioned in this article refers to two or more. "And / or" describes the association relationship of the associated objects, indicating that there can be three relationships. For example, A and / or B can mean: A exists alone, A and B exist at the same time, and B exists alone. The character " / " generally indicates that the associated objects before and after are in an "or" relationship.

[0033] OLED (Organic Light-Emitting Diode) is called organic light-emitting diode. OLED display technology has many advantages such as full solid state, active light emission, high contrast, ultra-thin, low power consumption, fast effect speed, wide working range, easy to realize flexible display and 3D display, etc., which makes it currently used in many display screens, such as televisions and mobile display devices. The pixel opening rate of OLED display panel is one of the important factors that determine the quality of display panel. The larger the pixel opening, the more conducive it is to improve the life of the display panel. Therefore, how to increase the pixel opening of the display panel is an important topic in the display field.

[0034] In order to solve the above technical problems, refer to Figures 1 to 8 As shown, the present application provides a display panel, including a substrate 100, a pixel group 300 and an isolation structure 400. The pixel group 300 and the isolation structure 400 are arranged on the substrate 100, and the pixel group 300 includes a plurality of sub-pixels 310. The isolation structure 400 realizes isolation between adjacent sub-pixels 310. The substrate 100 is provided with a pixel definition layer 200, and the pixel definition layer 200 has a plurality of pixel openings 210; the pixel group 300 includes a plurality of sub-pixels 310 arranged at the pixel openings 210, wherein one sub-pixel 310 is a central sub-pixel 311, and the remaining plurality of sub-pixels 310 are peripheral sub-pixels 312 surrounding the central sub-pixel 311, and adjacent pixel groups 300 share a peripheral sub-pixel 312; the isolation structure 400 is protruding from the pixel definition layer 200 and surrounds the pixel opening 210. The isolation structure 400 includes a first isolation structure 410 and a second isolation structure 411. 20, the first isolation structure 410 is located between two adjacent peripheral sub-pixels 312, and the second isolation structure 420 is located between the adjacent central sub-pixel 311 and the peripheral sub-pixel 312; the width of the positive projection of at least part of the first isolation structure 410 and at least part of the second isolation structure 420 on the substrate 100 is the first width D1, and the width of the positive projection of at least part of the second isolation structure 420 on the substrate 100 is the second width D2, the first width D1 is greater than the second width D2, and the cathodes of the adjacent sub-pixels 310 are electrically connected through the isolation structure 400 of the first width D1. The sub-pixels 310 of the pixel group 300 are divided into a central sub-pixel 311 and a peripheral sub-pixel 312, so that a first isolation structure 410 and a second isolation structure 420 with different widths are arranged between the central sub-pixel 311 and the peripheral sub-pixel 312 and between adjacent peripheral sub-pixels 312, and the widths of part of the first isolation structure 410 and part of the second isolation structure 420 are reduced. The isolation structure 400 with the first width D1 and the cathode of the sub-pixel 310 realize electrical connection between adjacent sub-pixels 310, and the isolation structure 400 with the second width D2 is narrowed to increase the opening area of ​​the sub-pixels 310 on both sides. By increasing the aperture ratio of the sub-pixel 310, the quality of the display panel can be improved.

[0035] In some embodiments, the substrate 100 may be a glass substrate or an organic substrate. The organic substrate includes a substrate layer, a flat layer and a driving circuit, and the material of the flat layer may be polyimide (PI for short) and polyamide (PEN for short). The driving circuit may be a thin film transistor (TFT for short) circuit layer, and the TFT circuit layer is used to drive the light-emitting layer of the OLED. The specific TFT circuit layer includes a plurality of driving circuit units arranged in an array, and each driving circuit unit may include a TFT device and a capacitor. Each driving circuit unit corresponds to an anode and an organic light-emitting layer. The TFT device is a low temperature polysilicon (LTPS) type or a metal oxide semiconductor (MOS) type, such as a metal oxide semiconductor type of indium gallium zinc oxide (IGZO).

[0036] In some embodiments, the material of the pixel definition layer 200 may be an organic material, an organic material having an inorganic coating disposed thereon, or one of an inorganic material. The organic material of the pixel definition layer 200 includes, but is not limited to, polyimide. The inorganic material of the pixel definition layer 200 includes, but is not limited to, silicon oxide (SiO), silicon nitride (Si3N4), silicon oxynitride (Si3N4O), magnesium fluoride (MgF2), or a combination thereof.

[0037] In some embodiments, the sub-pixels 310 are used to emit light of different colors, and multiple sub-pixels 310 emit light to display an image. Each pixel is composed of three sub-pixels 310 of red, green, and blue, which are superimposed and mixed to display a white image, and different color images are displayed by controlling the light emission levels of sub-pixels 310 of different colors.

[0038] In some embodiments, the sub-pixel 310 includes an anode, an organic light-emitting layer and a cathode. The anode is disposed on the substrate 100 in the pixel receiving area; the organic light-emitting layer is disposed on the anode; and the cathode is disposed on the organic light-emitting layer.

[0039] Further, the anode is arranged between the pixel definition layer 200 and the substrate 100. The anode is spaced apart and arranged on one side surface of the substrate 100. The material of the anode includes, but is not limited to, chromium, titanium, gold, silver, copper, aluminum, ITO, a combination thereof or other suitable conductive materials. The organic light-emitting layer is used to emit red light, blue light or green light when powered on, and the organic light-emitting layer may include one or more of HIL (Hole Injection Layer), HTL (Hole Transfer Layer), EML (Emitting Layer) and ETL (Electron Transfer Layer). The cathode is arranged on the side of the organic light-emitting layer away from the anode, and the material of the cathode includes, but is not limited to, chromium, titanium, gold, silver, copper, aluminum, ITO, a combination thereof or other suitable conductive materials. The material of the cathode may be the same as that of the anode, or may be different, and is set according to the actual situation.

[0040] In some embodiments, reference Figure 1 and Figure 2 As shown, the first direction extends along the width direction of the central sub-pixel 311 , the second direction extends along the length direction of the central sub-pixel 311 , and the first direction is perpendicular to the second direction.

[0041] In some embodiments, reference Figures 1 to 3As shown, the orthographic projection shape of the central sub-pixel 311 on the substrate 100 is a quadrilateral, the orthographic projection shape of the peripheral sub-pixel 312 on the substrate 100 is a hexagon, and each pixel group 300 has four peripheral sub-pixels 312, and the four peripheral sub-pixels 312 are arranged one-to-one with the four sides of the central sub-pixel 311; the six sides of the peripheral sub-pixel 312 include two straight sides 312A and four oblique sides 312B, the two straight sides 312A are arranged opposite to each other and face one central sub-pixel 311 respectively, and the four oblique sides 312B correspond to the other four peripheral sub-pixels 312 respectively; the first isolation structure 410 is arranged corresponding to the oblique sides 312B, and the second isolation structure 420 is arranged corresponding to the straight sides 312A. Thus, four peripheral sub-pixels 312 are arranged around the central sub-pixel 311, and the peripheral sub-pixels 312 are arranged as hexagons to increase the area of ​​the peripheral sub-pixels 312, so that the width of the partial isolation structure 400 can be set smaller. Further, the straight side 312A of the peripheral sub-pixel 312 is a side extending in the first direction, and the oblique side 312B is a side extending at an angle to the first direction, and each straight side 312A and each oblique side 312B have the same angle, and each oblique side 312B has the same angle as the oblique side 312B. The two central sub-pixels 311 and the peripheral sub-pixels 312 are isolated by providing a second isolation structure 420 between the straight side 312A and the central sub-pixel 311, and the first isolation structure 410 is provided between adjacent oblique sides 312B to isolate adjacent peripheral sub-pixels 312.

[0042] Further, see Figure 2 and Figure 3 As shown, the orthographic projection of the central sub-pixel 311 on the substrate 100 is a rectangle, and the orthographic projection of the peripheral sub-pixel 312 on the substrate 100 is a parallelepiped; the orthographic projection of the first isolation structure 410 as a whole on the substrate 100 constitutes a plurality of rectangles arranged in an array; the orthographic projection of the second isolation structure 420 as a whole on the substrate 100 constitutes a plurality of X-shaped arrays arranged. The peripheral sub-pixels 312 are arranged as parallelepipeds and can be distributed on the four sides corresponding to the central sub-pixel 310, and there is space for setting the first isolation structure 410 between the oblique sides of adjacent peripheral sub-pixels 312, and the formed X-shaped first isolation structure 410 has a common part, thereby reducing the area of ​​the first isolation structure 410, and further improving the pixel aperture ratio of the peripheral sub-pixels 312. Among them, the rectangle and the parallelepiped are regular figures, and their regular figures can reduce the process difficulty of the sub-pixel 310. Therefore, the first isolation structure 410 and the second isolation structure 420 can be arranged to form a regular rectangle and an X-shape, so as to reduce the process difficulty of manufacturing the isolation structure 400, and further reduce the process difficulty of the display panel.

[0043] Further, refer to Figure 2 and Figure 3As shown, the second isolation structure 420 includes a transverse isolation structure 421 and a longitudinal isolation structure 422, the transverse isolation structure 421 extends in a first direction, and the longitudinal isolation structure 422 extends in a second direction, the first direction is perpendicular to and intersects the second direction; at least part of the transverse isolation structure 421 and at least part of the longitudinal isolation structure 422 have a first width D1. The second isolation structure 420 with the first width D1 can ensure that the cathodes on the opposite sides thereof are electrically connected therethrough, thereby forming a transmission network for cathode signals.

[0044] In one embodiment, referring to Figure 2 As shown, all the transverse isolation structures 421 have a first width D1, and all the longitudinal isolation structures 422 have a second width D2. By setting the width of the transverse isolation structure 421 to be greater than the width of the longitudinal isolation structure 422, the pixel aperture ratio can be increased at least in the second direction, and the transmission of the cathode signal can be achieved at least in the first direction. Since the second isolation structures 420 of the same width are arranged in the same direction, and the second isolation structures 420 of different widths are arranged in different directions, the design is simpler.

[0045] In another embodiment, all longitudinal isolation structures 422 have a first width D1, and all transverse isolation structures 421 have a second width D2. By setting the width of the longitudinal isolation structure 422 to be greater than the width of the transverse isolation structure 421, the pixel aperture ratio can be increased at least in the first direction, and the transmission of the cathode signal can be achieved at least in the second direction.

[0046] In yet another embodiment, referring to Figure 3 As shown, all the transverse isolation structures 421 have a first width D1, some of the longitudinal isolation structures 422 have a first width D1, some of the longitudinal isolation structures 422 have a second width D2, and the longitudinal isolation structures 422 with the first width D1 and the longitudinal isolation structures 422 with the second width D2 are arranged alternately in the first direction. By setting the width of some of the longitudinal isolation structures 422 to be the same as the width of all the transverse isolation structures 421, and setting the width of all the transverse isolation structures 421 to be greater than the width of another part of the longitudinal isolation structures 422, the pixel aperture ratio of some of the central sub-pixels 311 or the peripheral sub-pixels 312 can be improved in the second direction. In addition, the longitudinal isolation structures 422 of two widths are arranged alternately in the first direction. This arrangement makes the distribution of the longitudinal isolation structures 422 of two widths more uniform, which can improve the pixel aperture ratio while ensuring the uniformity of cathode signal transmission.

[0047] In other embodiments, all longitudinal isolation structures 422 have a first width D1, some transverse isolation structures 421 have a first width D1, some transverse isolation structures 421 have a second width D2, and transverse isolation structures 421 having the first width D1 and transverse isolation structures 421 having the second width D2 are arranged alternately in the second direction. By setting the width of some transverse isolation structures 421 to be the same as the width of all longitudinal isolation structures 422, and setting the width of all longitudinal isolation structures 422 to be greater than the width of another part of the transverse isolation structure 421, the pixel aperture ratio of some central sub-pixels 311 or peripheral sub-pixels 312 can be improved in the first direction.

[0048] In some embodiments, in the pixel group 300, one longitudinal isolation structure 422 is set to have a first width D1, and another longitudinal isolation structure 422 and two transverse isolation structures 421 are set to have a second width D2; and / or, one transverse isolation structure 421 is set to have a first width D1, and another transverse isolation structure 421 and two longitudinal isolation structures 422 are set to have a second width D2. Among them, the transverse isolation structure 421 and the longitudinal isolation structure 422 can also be arranged according to actual conditions. For example, when arranging the transverse isolation structures 421 having the first width D1 and the second width D2, multiple transverse isolation structures 421 having the first width D1 can be arranged continuously first, and then multiple transverse isolation structures 421 having the second width D2 can be arranged continuously.

[0049] In some embodiments, reference Figure 4 As shown, there are four first isolation structures 410 between four adjacent peripheral sub-pixels 312 . According to actual conditions, part of the first isolation structure 410 can be set to have a first width D1 , and part of the second isolation structure 420 can be set to have a second width D2 .

[0050] In some other embodiments, all first isolation structures 410 have the first width D1, while some second isolation structures 420 have the first width D1, and some second isolation structures 420 have the second width D2. That is, only the isolation structures 400 corresponding to the center sub-pixel 311 are narrowed, while the isolation structures 400 corresponding to the oblique edges of the edge sub-pixels 312 are not narrowed. This is because the edge sub-pixels 312 around the first isolation structures 410 are more concentrated. Figure 4For example, four first isolation structures 410 are connected to form an X-shape, which corresponds to four edge sub-pixels 312. Therefore, the first isolation structure 410 is not narrowed to ensure that the cathodes of the densely arranged sub-pixels 312 can pass through the first isolation structure 410 to produce a better electrical connection effect. In addition, the hypotenuse of the edge sub-pixel 312 corresponding to the X-shape is usually shorter than the straight edge, so even if the first isolation structure 410 is narrowed, the area saved is relatively small. The second isolation structure 420 is set corresponding to the straight edge, and the straight edge is longer, which is conducive to obtaining more saved area to improve the pixel aperture ratio.

[0051] In other embodiments, the first isolation structure 410 may be narrowed, and the number or total length of the narrowed first isolation structures 410 may be smaller than the number or total length of the narrowed second isolation structures 420, thereby obtaining a larger aperture ratio and taking into account the electrical connection effect between the cathode and the isolation structure 400. In other words, the number of first isolation structures 410 having the second width may be smaller than the number of second isolation structures 420 having the second width, and / or the total length of the first isolation structures 410 having the second width may be smaller than the total length of the second isolation structures 420 having the second width. It can be understood that the length direction is perpendicular to the width direction.

[0052] In some embodiments, reference Figures 5 to 9 As shown, the isolation structure 400 is conductive or insulating, and includes a main layer 401 and an eaves layer 402 arranged in sequence, and the eaves layer 402 is protruded relative to the main layer 401 toward the pixel opening 210; the eaves layer 402 is protruded relative to the main layer 401 toward the pixel opening 210 so that the cross-sectional area of ​​the eaves layer 402 is set to be larger than the cross-sectional area of ​​the main layer 401, thereby enabling different evaporation angles to be formed when evaporating the light-emitting layer and the cathode of the sub-pixel 310, and the above design can also remove the mask required for conventional evaporation, thereby reducing the manufacturing cost of the display panel.

[0053] In some embodiments, Figures 5 to 9 In the figure, the main body layer 401 and the eaves layer 402 are shown. Taking the main body layer 401 and the eaves layer 402 as examples, without considering other structural section lines, the main body layer 401 or the eaves layer 402 having conductivity is represented by a section line extending in the first direction; the main body layer 401 or the eaves layer 402 having insulation is represented by a section line extending at an angle to the first direction.

[0054] In some embodiments, reference Figure 5As shown, the isolation structure 400 whose orthographic projection on the substrate 100 has a first width D1 actually means that the eaves layer 402 of the isolation structure 400 has the first width D1, and the width of the main layer 401 of the isolation structure 400 has a third width D3, which is smaller than the first width D1. The isolation structure 400 whose orthographic projection on the substrate 100 has a second width D2 actually means that the eaves layer 402 of the isolation structure 400 has the second width D2, and the width of the main layer 401 of the isolation structure 400 has a fourth width D4, which is smaller than the second width D2. Among them, the first width D1 is larger than the second width D2, and the fourth width D4 is smaller than the third width D3.

[0055] In some embodiments, reference Figures 5 to 7 As shown, in the isolation structure 400 having the first width D1 , at least the main layer 401 has conductivity, and is used to electrically connect the cathode of the adjacent peripheral sub-pixel 312 .

[0056] In some embodiments, reference Figure 5 As shown, in the isolation structure 400 with the first width D1, the main layer 401 is conductive and the eaves layer 402 is insulating; in the isolation structure 400 with the second width D2, the main layer 401 is conductive and the eaves layer 402 is insulating; wherein, in the isolation structure 400 with the first width D1 and the isolation structure 400 with the second width D2, the main layer 401 and the eaves layer 402 of the two are formed in the same graphic process. The main layer 401 is used to realize the electrical connection of the cathode between adjacent sub-pixels 310, and the eaves layer 402 can also realize the insulation effect of the main layer 401 and other structures. The main layer 401 and the eaves layer 402 of the two can be formed simultaneously in the same graphic process, which can reduce the process and save the manufacturing cost of the display panel.

[0057] In some embodiments, reference Figure 6As shown, in the isolation structure 400 with the first width D1, the main body layer 401 is conductive and the eaves layer 402 is insulating. Thus, the electrical connection between adjacent sub-pixels 310 can be achieved through the main body layer 401, and the insulation effect between the main body layer 401 and other structures can be achieved through the eaves layer 402. In the isolation structure 400 with the second width D2, the main body layer 401 is insulating and the eaves layer 402 is conductive, thus, the adjacent sub-pixels 310 can be isolated through the main body layer 401, and the eaves layer 402 can be reused as other structures of the display panel, such as pixel electrodes. Among them, in the isolation structure 400 with the first width D1 and the isolation structure 400 with the second width D2, the eaves layer 402 in the isolation structure 400 with the second width D2 and the main body layer 401 in the isolation structure 400 with the first width D1 are formed in the same patterning process, and the main body layer 401 in the isolation structure 400 with the second width D2 and the pixel definition layer 200 use the same insulating material. The main body layer 401 in the isolation structure 400 of the second width D2 and the pixel definition layer 200 are made of the same insulating material, so that the main body layer 401 can be formed when the pixel definition layer 200 is formed, which can also save processes.

[0058] In some embodiments, reference Figure 7 As shown, in the isolation structure 400 with the first width D1, the main body layer 401 is conductive and the eaves layer 402 is insulating. In the isolation structure 400 with the second width D2, both the main body layer 401 and the eaves layer 402 are insulating.

[0059] In some embodiments, in the isolation structure 400 with the first width D1 and the isolation structure 400 with the second width D2, the main layer 401 and the eaves layer 402 of both are insulating, formed in the same patterning process, and the main layer 401 and the pixel definition layer 200 of both are made of the same insulating material. Figure 8 As shown, in the isolation structure 400 with the second width D2, the main body layer 401 and the eaves layer 402 of both are insulating, formed in the same patterning process, and the main body layer 401 and the pixel definition layer 200 of both are made of the same insulating material. While achieving the isolation function of adjacent sub-pixels 310, due to the lack of conductivity, the width of the main body layer 401 and the eaves layer 402 can be made smaller, and the pixel opening 210 can be further increased.

[0060] In some embodiments, reference Fig. 9 As shown, in the isolation structure 400 with the second width D2, the main body layer 401 is insulating, and the eaves layer 402 is conductive, which will not be described in detail here.

[0061] In the present application, the sub-pixels 310 of the pixel group 300 are divided into a central sub-pixel 311 and a peripheral sub-pixel 312, so that a first isolation structure 410 and a second isolation structure 420 with different widths are set between the central sub-pixel 311 and the peripheral sub-pixel 312, and between adjacent peripheral sub-pixels 312, and the widths of part of the first isolation structure 410 and part of the second isolation structure 420 are reduced, and the isolation structure 400 with the first width D1 and the cathode of the sub-pixel 310 realize the electrical connection of the adjacent sub-pixel 310, and the isolation structure 400 with the second width D2 is narrowed to increase the opening area of ​​the sub-pixels 310 on both sides, and the quality of the display panel can be improved by increasing the aperture ratio of the sub-pixel 310. In addition, the main layer 401 and the eaves layer 402 of the isolation structure 400 are optimized in layout, and while realizing the isolation effect of the adjacent sub-pixels 310, the width of the isolation structure 400 can be further reduced, and the structures with similar functions are formed in the same graphic process, which can save the process and reduce the production cost of the display panel.

[0062] In this application, unless otherwise clearly specified and limited, the terms "disposed (provided with)", "connected" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0063] In the description of this specification, the description of reference terms such as "some embodiments" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment are included in at least one embodiment of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine different embodiments or examples described in this specification and the features of different embodiments or examples without contradiction.

[0064] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the present application. Therefore, any changes or modifications made in accordance with the claims and description of the present application should fall within the scope of the patent of this application.

Claims

1. A display panel, characterized in that: include: A substrate is provided with a pixel definition layer, wherein the pixel definition layer has a plurality of pixel openings; A pixel group, comprising a plurality of sub-pixels arranged at the pixel opening, wherein one of the sub-pixels is a central sub-pixel, and the remaining plurality of the sub-pixels are peripheral sub-pixels surrounding the central sub-pixel, and adjacent pixel groups share one peripheral sub-pixel, the orthographic projection shape of the central sub-pixel on the substrate is a quadrilateral, the orthographic projection shape of the peripheral sub-pixels on the substrate is a hexagon, and each pixel group has four peripheral sub-pixels, and the four peripheral sub-pixels are arranged in a one-to-one correspondence with the four sides of the central sub-pixel; an isolation structure, protruding from the pixel definition layer and surrounding the pixel opening, the isolation structure comprising a first isolation structure and a second isolation structure, the first isolation structure being located between two adjacent peripheral sub-pixels, the second isolation structure being located between the adjacent central sub-pixel and the peripheral sub-pixel, the first isolation structure being located corresponding to the hypotenuse of the hexagon, and the second isolation structure being located corresponding to the straight side of the hexagon; The width of the orthographic projection of at least part of the first isolation structure and at least part of the second isolation structure on the substrate is a first width, the width of the orthographic projection of at least part of the second isolation structure on the substrate is a second width, the first width is greater than the second width, and the cathodes of adjacent sub-pixels are electrically connected through the isolation structure of the first width.

2. The display panel according to claim 1, characterized in that: The six side edges of the peripheral sub-pixel include two straight edges and four oblique edges, the two straight edges are arranged opposite to each other and respectively face one of the central sub-pixels, and the four oblique edges respectively correspond to the other four peripheral sub-pixels.

3. The display panel according to claim 2, characterized in that: The second isolation structure includes a transverse isolation structure and a longitudinal isolation structure, the transverse isolation structure extends in a first direction, and the longitudinal isolation structure extends in a second direction, the first direction extends along the width direction of the central sub-pixel, and the second direction extends along the length of the central sub-pixel, and the first direction is perpendicular to and intersects with the second direction; at least part of the transverse isolation structure and / or at least part of the longitudinal isolation structure has the first width.

4. The display panel according to claim 3, characterized in that: All of the transverse isolation structures have the first width, and all of the longitudinal isolation structures have the second width; or, all of the longitudinal isolation structures have the first width, and all of the transverse isolation structures have the second width.

5. The display panel according to claim 3, characterized in that: All of the transverse isolation structures have a first width, some of the longitudinal isolation structures have a first width, some of the longitudinal isolation structures have a second width, and the longitudinal isolation structures having the first width and the longitudinal isolation structures having the second width are alternately arranged in the first direction; or, All of the longitudinal isolation structures have a first width, some of the transverse isolation structures have a first width, some of the transverse isolation structures have a second width, and the transverse isolation structures having the first width and the transverse isolation structures having the second width are alternately arranged in the second direction.

6. The display panel according to any one of claims 2 to 5, characterized in that: The orthographic projection of the central sub-pixel on the substrate is a rectangle, and the orthographic projection of the peripheral sub-pixel on the substrate is a parallelepiped; the orthographic projection of the first isolation structure as a whole on the substrate constitutes a plurality of rectangles arranged in an array; the orthographic projection of the second isolation structure as a whole on the substrate constitutes a plurality of X-shaped arrays arranged.

7. The display panel according to claim 1, characterized in that: The isolation structure includes a main body layer and an eaves layer arranged in sequence, and the eaves layer is protruded toward the pixel opening relative to the main body layer; in the isolation structure with the first width, at least the main body layer has conductivity and is used to electrically connect the cathodes of adjacent peripheral sub-pixels.

8. The display panel according to claim 7, characterized in that: In the isolation structure having the first width, the main body layer has conductivity, and the eaves layer has insulation; In the isolation structure having the second width, the main body layer has conductivity, and the eaves layer has insulation; Wherein, in the isolation structure with the first width and the isolation structure with the second width, the main body layer and the eaves layer of both are formed in the same patterning process.

9. The display panel according to claim 7, characterized in that: In the isolation structure having the first width, the main body layer has conductivity, and the eaves layer has insulation; In the isolation structure having the second width, the main body layer has insulation properties, and the eaves layer has conductivity; Among them, in the isolation structure with the first width and the isolation structure with the second width, the eaves layer in the isolation structure with the second width and the main layer in the isolation structure with the first width are formed in the same patterning process, and the main layer in the isolation structure with the second width and the pixel definition layer use the same insulating material.

10. The display panel according to claim 1, characterized in that: The isolation structure includes a main body layer and an eaves layer arranged in sequence, and the eaves layer is protruded toward the pixel opening relative to the main body layer; in the isolation structure with the first width and the isolation structure with the second width, the main body layer and the eaves layer of both are insulating and are formed in the same graphic process, and the main body layers and the pixel definition layers of both are made of the same insulating material.

Citation Information

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