A flip chip interconnect reliability testing method and computer equipment
By using test chips and built-in temperature measurement and heating elements in flip-chip interconnection tests, external current stress loading is achieved, high temperature, power cycle, electromigration and thermal migration tests are solved, solving the excessive demand for equipment and samples in traditional methods. The problem of quantitative evaluation of thermal gradient and solder joint temperature improves testing efficiency and accuracy.
Patent Information
- Application Number
- CN202411570987.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-06
- Publication Date
- 2025-01-07
- Estimated Expiration
- 2044-11-06
AI Technical Summary
The prior art requires multiple sets of temperature control equipment and a large number of test samples in the flip-chip interconnect reliability evaluation. The thermal gradient is difficult to quantify and evaluate in thermal migration test. The actual temperature of the solder joint is higher than the setting of the temperature control equipment during the electromigration test. temperature.
Design a flip chip interconnect reliability test method, by making test chips, using multiple independent daisy-chain interconnect solder joints and built-in temperature measurement heating elements, and using programmable multi-channel current source and digital multimeter to achieve temperature Control and monitoring, external current stress loading, high temperature, power cycle, electromigration and thermal migration tests.
Without the need to carry temperature control equipment and a large number of test samples, it can effectively evaluate the reliability of flip-chip interconnects, solve the quantitative evaluation of thermal gradient difference and solder joint temperature problems, and simplify the testing process.
Smart Images

Figure CN119064768B_ABST
Abstract
Description
Technical Field
[0001] The invention belongs to the field of microelectronic reliability evaluation, and in particular relates to a flip chip interconnect reliability testing method, a computer device, a computer readable storage medium and a computer program product. Background Art
[0002] As the packaging of microelectronic devices continues to develop towards miniaturization and sophistication, the use of flip-chip structures in advanced packaging technologies has become increasingly widespread. Solder joint interconnection, as the weak link of flip-chip packaging, has become a key factor directly affecting the service life of high-end microelectronic devices. Its reliability issues have received great attention and attention from the industry.
[0003] At present, the reliability evaluation of flip chip interconnects mainly focuses on testing under high temperature, power cycling, thermal migration and electromigration conditions. The above tests often require multiple sets of temperature control equipment and a large number of test samples. The thermal gradient difference during thermal migration testing is difficult to quantify and evaluate, and the actual temperature of the solder joint during electromigration testing is higher than the temperature set by the temperature control equipment. Summary of the invention
[0004] The purpose of the present invention is to provide a flip chip interconnect reliability test method, computer equipment, computer readable storage medium and computer program product, which can effectively solve the problems of the traditional solution requiring multiple sets of temperature control equipment, requiring a large number of test samples, the difficulty in quantifying and evaluating the thermal gradient difference during the thermal migration test, and the actual temperature of the solder joint during the electromigration test being higher than the temperature set by the temperature control device.
[0005] In order to achieve the above object, one aspect of the present invention provides a flip chip interconnect reliability testing method, comprising:
[0006] Step S1: manufacturing a test chip for a flip chip that needs to be tested for reliability, the test chip comprising a chip, a substrate, and multiple daisy chain interconnection solder joints, wherein the multiple independent daisy chain interconnection solder joints are arranged on the chip to realize the interconnection between the chip and the substrate, the chip has a built-in chip-end temperature measuring element and a chip-end heating element, and the substrate has a built-in substrate-end temperature measuring element and a substrate-end heating element;
[0007] Step S2: using a programmable multi-channel current source, selecting a current source to load current to the chip end heating element, so that the chip end is heated;
[0008] Step S3: using a programmable multi-channel current source, selecting one current source to load current to the temperature measuring element at the chip end so that the temperature measuring element works, selecting one current source to load current to the temperature measuring element at the substrate end so that the temperature measuring element works, and using two test ports of a digital multimeter to monitor the voltages of the temperature measuring elements at the chip end and the substrate end;
[0009] Step S4: Selecting a multi-channel test port of a digital multimeter to monitor the interconnection resistance of multiple daisy-chain solder joints respectively to determine the failure status of the interconnection paths;
[0010] Step S5: Calculate the actual temperature of the chip end and the substrate end according to the voltage of the temperature measuring element at the chip end and the substrate end respectively, adjust the current of the heating element at the chip end, and ensure that the temperature of the chip end and the substrate end is consistent and meets the temperature requirements for reliability testing.
[0011] Preferably, the reliability test is a high temperature test;
[0012] Step S2 also includes: selecting a current source to load current to the heating element at the substrate end, so that the substrate end is heated;
[0013] In step S5, the currents of the heating elements at the chip end and the substrate end are adjusted to ensure that the temperature at the chip end and the substrate end is consistent and reaches the temperature requirement for high temperature testing.
[0014] Preferably, the reliability test is a power cycle test;
[0015] Step S2 also includes: selecting a current source to load current to the heating element at the substrate end, so that the substrate end is heated;
[0016] In step S5, the current of the heating elements at the chip end and the substrate end is adjusted to ensure that the temperature of the chip end and the substrate end is consistent and meets the temperature requirement for the power cycle test;
[0017] The method further comprises: using a programmable multi-channel current source to set a current output timing of a current port connecting the chip end and the substrate end, so that the temperature cycle variation generated by the heating elements at the chip end and the substrate end meets the power cycle test requirements.
[0018] Preferably, the reliability test is an electromigration test;
[0019] Step S2 also includes: selecting a current source to load current to the heating element at the substrate end, so that the substrate end is heated;
[0020] Step S3 also includes: selecting multiple ports of the programmable multi-channel current source to respectively load current stress on interconnection resistors of multiple daisy-chain solder joints;
[0021] In step S5, the currents of the heating elements at the chip end and the substrate end are adjusted to ensure that the temperature of the chip end and the substrate end is consistent and meets the temperature requirement for the electromigration test.
[0022] Preferably, the reliability test is a thermal migration test;
[0023] In step S5, the current of the heating element at the chip end is adjusted to ensure that a temperature difference is formed between the chip end and the substrate end and that the thermal gradient difference meets the thermal migration test requirements.
[0024] Another aspect of the present invention provides a computer device, including a memory, a processor, and a computer program stored in the memory, wherein the processor executes the computer program to implement the steps of the above method.
[0025] Another aspect of the present invention provides a computer-readable storage medium having a computer program stored thereon, which implements the steps of the above method when executed by a processor.
[0026] Another aspect of the present invention provides a computer program product, comprising a computer program, which implements the steps of the above method when executed by a processor.
[0027] The flip chip interconnect reliability testing method, computer device, computer readable storage medium and computer program product according to the above aspects of the present invention do not require temperature control equipment or a large number of test samples. Reliability tests such as high temperature, power cycling, electromigration and thermal migration can be achieved through external current stress loading. BRIEF DESCRIPTION OF THE DRAWINGS
[0028] In order to more clearly illustrate the technical solution of the present invention, the following briefly introduces the drawings used in the description of the embodiments of the present invention. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work:
[0029] Figure 1 is a flow chart of a flip chip interconnect reliability testing method according to an embodiment of the present invention;
[0030] Figure 2 is a schematic diagram of the structure of a chip according to an embodiment of the present invention;
[0031] Figure 3 is a schematic structural diagram of a substrate according to an embodiment of the present invention;
[0032] Figure 4 is a side schematic diagram of a chip and a substrate interconnected according to an embodiment of the present invention;
[0033] Figure 5 It is a structural diagram of a computer device according to an embodiment of the present invention. DETAILED DESCRIPTION
[0034] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0035] An embodiment of the present invention provides a flip chip interconnect reliability test method, in which a test chip is manufactured for a flip chip that needs to undergo reliability test evaluation. The test chip adopts the same packaging process as the actual chip, and interconnects the chip and the substrate through a multi-channel independent daisy chain solder joint structure. The solder joint temperature is monitored by built-in temperature measuring elements at the chip end and the substrate end, and the solder joint temperature stress is loaded by a built-in heating element. The temperature control of the chip and the current loading of the interconnected solder joints are achieved through external current stress loading, thereby realizing reliability tests such as high temperature, power cycling, electromigration and thermal migration.
[0036] Figure 1 FIG. 1 is a flow chart of a flip chip interconnect reliability testing method according to an embodiment of the present invention. Figure 1 As shown, the flip chip interconnect reliability testing method according to the embodiment of the present invention includes steps S1 to S5.
[0037] Step S1: Test chip fabrication
[0038] Test chips are made for flip chips that need reliability testing and evaluation. They are used for reliability testing of flip chip interconnects such as high temperature, power cycling, electromigration, and thermal migration. The structure of the test chip is as follows: Figure 2-4 shown.
[0039] (1) The test chip mainly includes the chip, substrate and multiple daisy-chain interconnection solder joints. It may also include the plastic package and peripheral solder joints required for packaging. The size of the chip, the size of the daisy-chain interconnection solder joints, the material, the manufacturing process and the welding process are consistent with the actual flip-chip process.
[0040] (2) If Figure 2 and 3 As shown, multiple independent daisy-chain interconnection solder joints 1 are arranged on the chip to realize the interconnection between the chip and the substrate, and each daisy-chain interconnection solder joint 1 can independently carry current stress for electromigration testing. Figure 4 FIG. 3 shows the state after the chip and the substrate are interconnected, wherein the dotted line indicates the direction of the current.
[0041] (3) The chip has a built-in chip-side temperature measuring element 2 and a chip-side heating element 3. The chip-side temperature measuring element 2 and the chip-side heating element 3 can independently carry current for temperature loading and temperature monitoring. The chip-side temperature measuring element 2 can be a simple component such as a temperature sensitive diode, or a corresponding temperature measuring module. The chip-side heating element 3 can be a simple component such as a resistance wire, or a corresponding heating module.
[0042] (4) A substrate-side temperature measuring element 4 and a substrate-side heating element 5 are built into the substrate side. The substrate-side temperature measuring element 4 and the substrate-side heating element 5 can independently carry current for temperature loading and temperature monitoring. The substrate-side temperature measuring element 4 can be a simple component such as a temperature sensitive diode, or a corresponding temperature measuring module. The substrate-side heating element 5 can be a simple component such as a resistance wire, or a corresponding heating module.
[0043] Step S2: Temperature stress loading
[0044] By using a programmable multi-channel current source, one channel of the current source is selected to load current to the chip end heating element, so that the chip end generates heat.
[0045] Step S3: Temperature monitoring
[0046] Using a programmable multi-channel current source, one current source is selected to load current to the temperature measuring element at the chip end so that the temperature measuring element works, and one current source is selected to load current to the temperature measuring element at the substrate end so that the temperature measuring element works, and the voltages of the temperature measuring elements at the chip end and the substrate end are monitored using two test ports of a digital multimeter;
[0047] Step S4: Failure monitoring
[0048] Select the multi-channel test port of the digital multimeter to monitor the interconnection resistance of multiple daisy-chain solder joints respectively to determine the failure status of the interconnection path;
[0049] Step S5: Temperature Control
[0050] The actual temperatures of the chip and substrate are calculated based on the voltages of the temperature measuring elements at the chip and substrate ends, and the current of the heating element at the chip end is adjusted to ensure that the temperatures of the chip and substrate ends are consistent and meet the temperature requirements for reliability testing.
[0051] As specific embodiments, the processes of high temperature test, power cycle test, electromigration test and thermal migration test are respectively described in detail below.
[0052] 1. High temperature test
[0053] based on Figure 2-4The test chip shown does not require a temperature control device. Instead, it is equipped with a programmable multi-channel current source and a multi-channel digital multimeter to perform high-temperature testing of flip-chip interconnects and monitor interconnect failures. The specific steps are as follows:
[0054] (1) Select one current source from the programmable multi-channel current source to load current to the chip-side heating element, so that the chip-side heats up; select one current source to load current to the substrate-side heating element, so that the substrate-side heats up.
[0055] (2) Select a current source to load current to the temperature measuring element at the chip end so that the temperature measuring element works; select a current source to load current to the temperature measuring element at the substrate end so that the temperature measuring element works. Select two test ports of a digital multimeter to monitor the voltage of the temperature measuring elements at the chip end and the substrate end.
[0056] (3) Select the n-way (multi-way) test port of the digital multimeter to monitor the interconnection resistance of n independent daisy-chain solder joints respectively to determine the failure status of the interconnection path.
[0057] (4) Calculate the actual temperature of the chip and substrate ends based on the voltage of the temperature measuring element, and adjust the current of the heating elements at the chip and substrate ends to ensure that the temperature of the chip and substrate ends is consistent and meets the temperature requirements for high temperature testing.
[0058] Therefore, by applying an external constant current, current is loaded on the heating elements at the chip end and the substrate end of the test chip, and current is loaded on the temperature measuring elements at the chip end and the substrate end, so as to realize high-temperature stress loading of high-temperature testing and monitor the failure of the interconnection path.
[0059] 2. Power Cycle Test
[0060] based on Figure 2-4 The test chip shown does not require a temperature control device, but is equipped with a programmable multi-channel current source and a multi-channel digital multimeter to perform power cycling tests on flip-chip interconnects and monitor the failure of interconnect paths. The specific steps are as follows:
[0061] (1) Select a current source to load current to the heating element at the chip end, so that the chip end heats up; select a current source to load current to the heating element at the substrate end, so that the substrate end heats up.
[0062] (2) Select a current source to load current to the temperature measuring element at the chip end so that the temperature measuring element works; select a current source to load current to the temperature measuring element at the substrate end so that the temperature measuring element works. Select two test ports of a digital multimeter to monitor the voltage of the temperature measuring elements at the chip end and the substrate end.
[0063] (3) Select the n-way test port of the digital multimeter to monitor the interconnection resistance of n independent daisy-chain solder joints respectively to determine the failure status of the interconnection path.
[0064] (4) Calculate the actual temperature of the chip and substrate ends based on the voltage of the temperature measuring element, and adjust the current of the heating elements at the chip and substrate ends to ensure that the temperature of the chip and substrate ends is consistent and meets the temperature requirements required for the power cycle test.
[0065] (5) Compile the program of the programmable multi-channel current source and set the current output timing of the current port connected to the chip end and the substrate end so that the temperature cycle change generated by the heating element meets the power cycle test requirements.
[0066] Therefore, by an external constant current, current is loaded on the chip-end and substrate-end heating elements of the test chip, and the current output timing of the current port connecting the chip end and the substrate end is set, and by loading current on the chip-end and substrate-end temperature measuring elements, the cyclic temperature stress loading of the power cycle test is realized and the failure of the interconnection path is monitored.
[0067] 3. Electromigration test
[0068] based on Figure 2-4 The test chip shown does not need to be equipped with a temperature control device. It can be equipped with a programmable multi-channel current source and a multi-channel digital multimeter to carry out electromigration testing of flip-chip interconnects and monitor the failure of interconnect paths. The specific steps are as follows:
[0069] (1) Select a current source to load current to the heating element at the chip end, so that the chip end heats up; select a current source to load current to the heating element at the substrate end, so that the substrate end heats up.
[0070] (2) Select a current source to load current to the temperature measuring element at the chip end so that the temperature measuring element works; select a current source to load current to the temperature measuring element at the substrate end so that the temperature measuring element works. Select two test ports of a digital multimeter to monitor the voltage of the temperature measuring elements at the chip end and the substrate end.
[0071] (3) Select n-way ports of the current source to respectively load current stress on n-way independent daisy-chain solder joint interconnection resistors, and select n-way test ports of the digital multimeter to respectively monitor the n-way independent daisy-chain solder joint interconnection resistors to determine the failure status of the interconnection path.
[0072] (4) Calculate the actual temperature of the chip end and the substrate end based on the voltage of the temperature measuring element, and adjust the current of the heating elements at the chip end and the substrate end to ensure that the temperature of the chip end and the substrate end is consistent and meets the temperature setting requirements required for the electromigration test.
[0073] Therefore, through an external constant current, current is loaded on the chip-end and substrate-end heating elements of the test chip, current is loaded on the chip-end and substrate-end temperature measuring elements, and current is loaded on the independent daisy-chain solder joint structure, so as to realize high-temperature stress loading and solder joint current loading of electromigration test and monitor the failure of interconnection paths.
[0074] 4. Thermal migration test
[0075] based on Figure 2-4 The test chip shown does not need to be equipped with a temperature control device. It can be equipped with a programmable multi-channel current source and a multi-channel digital multimeter to carry out thermal migration testing of flip-chip interconnects and monitor the failure of interconnect paths. The specific steps are as follows:
[0076] (1) Select a current source to load current to the heating element at the chip end, so that the chip end heats up.
[0077] (2) Select a current source to load current to the temperature measuring element at the chip end so that the temperature measuring element works; select a current source to load current to the temperature measuring element at the substrate end so that the temperature measuring element works. Select two test ports of a digital multimeter to monitor the voltage of the temperature measuring elements at the chip end and the substrate end.
[0078] (3) Select the n-way test port of the digital multimeter to monitor the interconnection resistance of n independent daisy-chain solder joints respectively to determine the failure status of the interconnection path.
[0079] (4) Calculate the actual temperature of the chip end and the substrate end based on the voltage of the temperature measuring element, adjust the current of the heating element at the chip end, and ensure that the temperature difference and thermal gradient difference between the chip end and the substrate end meet the temperature setting requirements of the expected thermal migration test.
[0080] Therefore, by applying an external constant current, current is loaded on the chip-end heating element of the test chip, and current is loaded on the chip-end and substrate-end temperature measuring elements, so as to realize the temperature stress loading of the thermal migration test and monitor the failure of the interconnection path.
[0081] The following is a specific experimental example to illustrate the beneficial effects of the flip chip interconnect reliability testing method according to the embodiment of the present invention compared with the traditional method.
[0082] (1) High temperature test, test conditions: 3 groups of high temperature conditions
[0083] The traditional method requires 1 set of high temperature equipment and 15 test samples;
[0084] The method of the present invention does not require high temperature equipment and only requires three test samples.
[0085] (2) Power cycle test, test conditions: 3 sets of temperature cycle conditions
[0086] The traditional method requires 3 temperature cyclers and 45 test samples;
[0087] The method of the present invention does not require temperature cycle equipment and only requires three test samples.
[0088] (3) Electromigration test, test conditions: 3 sets of temperature and 3 sets of current density combinations, a total of 9 sets of conditions
[0089] The traditional method requires 3 sets of high-temperature equipment and 45 test samples. The solder joint interconnection structure is affected by the Joule heat effect, and the actual test temperature of the solder joint is significantly higher than the set temperature of the high-temperature equipment.
[0090] The method of the present invention does not require high-temperature equipment, only requires three test samples, and can solve the problems of the traditional method.
[0091] (4) Thermal migration test, test conditions: 3 groups of temperature difference conditions
[0092] The traditional method requires cold source, heat source equipment and customized fixtures, 15 test samples, and has the problem that the operability of external cold and hot sources is extremely low, and it is impossible to quantitatively evaluate the thermal gradient difference between the upper and lower ends of the solder joint;
[0093] The method of the present invention does not require a cold source, a heat source device, and a customized fixture, only requires three test samples, and can solve the problems of the traditional method.
[0094] In summary, the flip chip interconnect reliability test method of the embodiment of the present invention can carry out reliability tests under various stresses such as high temperature, power cycle, electromigration, and thermal migration by making a test chip with the same packaging process to replace the actual chip for testing, and by externally carrying a programmable multi-channel current source and a multi-channel digital multimeter. It can effectively solve the problems of the traditional solution that multiple sets of temperature control equipment and a large number of test samples are required, the thermal gradient difference is difficult to quantify and evaluate during the thermal migration test, and the actual temperature of the solder joint during the electromigration test is higher than the temperature set by the temperature control device, and provides a new set of solutions for the reliability evaluation of the interconnect structure. The present invention can effectively support the screening, identification, and reliability evaluation of the interconnect structure in high-end integrated circuits, and has good engineering application value and huge economic and social benefits.
[0095] An embodiment of the present invention further provides a computer device, which may be a server, and its internal structure diagram may be as shown in FIG. Figure 5As shown. The computer device includes a processor, a memory and a network interface connected through a system bus. Among them, the processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system, a computer program and a database. The internal memory provides an environment for the operation of the operating system and the computer program in the non-volatile storage medium. The database of the computer device is used to store operating parameter data of each framework. The network interface of the computer device is used to communicate with an external terminal through a network connection. When the computer program is executed by the processor, the steps of the method of the embodiment of the present invention are implemented.
[0096] Those skilled in the art will understand that Figure 5 The structure shown in the figure is only a block diagram of a part of the structure related to the solution of the present application, and does not constitute a limitation on the computer device to which the solution of the present application is applied. The specific computer device may include more or fewer components than those shown in the figure, or combine certain components, or have a different arrangement of components.
[0097] An embodiment of the present invention further provides a computer-readable storage medium having a computer program stored thereon, and when the computer program is executed by a processor, the steps of the method of the embodiment of the present invention are implemented.
[0098] An embodiment of the present invention further provides a computer program product, including a computer program, which implements the steps of the method of the embodiment of the present invention when executed by a processor.
[0099] The above description is only by way of illustration of certain exemplary embodiments of the present invention. It is undoubted that those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.
Claims
1. A flip chip interconnect reliability testing method, characterized in that: include: Step S1: manufacturing a test chip for a flip chip that needs to be tested for reliability, the test chip comprising a chip, a substrate, and multiple daisy chain interconnection solder joints, wherein the multiple independent daisy chain interconnection solder joints are arranged on the chip to realize the interconnection between the chip and the substrate, the chip has a built-in chip-end temperature measuring element and a chip-end heating element, and the substrate has a built-in substrate-end temperature measuring element and a substrate-end heating element; Step S2: using a programmable multi-channel current source, selecting a current source to load current to the chip end heating element, so that the chip end is heated; Step S3: using a programmable multi-channel current source, selecting one current source to load current to the temperature measuring element at the chip end so that the temperature measuring element works, selecting one current source to load current to the temperature measuring element at the substrate end so that the temperature measuring element works, and using two test ports of a digital multimeter to monitor the voltages of the temperature measuring elements at the chip end and the substrate end; Step S4: Selecting a multi-channel test port of a digital multimeter to monitor the interconnection resistance of multiple daisy-chain solder joints respectively to determine the failure status of the interconnection paths; Step S5: Calculate the actual temperature of the chip end and the substrate end according to the voltage of the temperature measuring element at the chip end and the substrate end respectively, adjust the current of the heating element at the chip end, and ensure that the temperature of the chip end and the substrate end is consistent and meets the temperature requirements for reliability testing.
2. The method according to claim 1, characterized in that The reliability test is a high temperature test; Step S2 also includes: selecting a current source to load current to the heating element at the substrate end, so that the substrate end is heated; In step S5, the currents of the heating elements at the chip end and the substrate end are adjusted to ensure that the temperature at the chip end and the substrate end is consistent and reaches the temperature requirement for high temperature testing.
3. The method according to claim 1, characterized in that The reliability test is a power cycle test; Step S2 also includes: selecting a current source to load current to the heating element at the substrate end, so that the substrate end is heated; In step S5, the current of the heating elements at the chip end and the substrate end is adjusted to ensure that the temperature of the chip end and the substrate end is consistent and meets the temperature requirement for the power cycle test; The method further comprises: using a programmable multi-channel current source to set a current output timing of a current port connecting the chip end and the substrate end, so that the temperature cycle variation generated by the heating elements at the chip end and the substrate end meets the power cycle test requirements.
4. The method according to claim 1, characterized in that The reliability test is an electromigration test; Step S2 also includes: selecting a current source to load current to the heating element at the substrate end, so that the substrate end is heated; Step S3 also includes: selecting multiple ports of the programmable multi-channel current source to respectively load current stress on interconnection resistors of multiple daisy-chain solder joints; In step S5, the currents of the heating elements at the chip end and the substrate end are adjusted to ensure that the temperature of the chip end and the substrate end is consistent and meets the temperature requirement for the electromigration test.
5. The method according to claim 1, characterized in that The reliability test is a thermal migration test; In step S5, the current of the heating element at the chip end is adjusted to ensure that a temperature difference is formed between the chip end and the substrate end and that the thermal gradient difference meets the thermal migration test requirements.
6. A computer device comprising a memory, a processor and a computer program stored in the memory, characterized in that: The processor executes the computer program to implement the steps of the method according to any one of claims 1 to 5.
7. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 5 are implemented.
8. A computer program product, comprising a computer program, characterized in that When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 5 are implemented.
Citation Information
Patent Citations
TSV multi-stress reliability test chip structure and device based on flip-chip bonding
CN113540039A
Packaging thermal test system for multi-heat-source integrated circuit
CN117825914A