Display panel and display device

Abstract

The invention discloses a display panel and a display device. The display panel comprises a light-emitting layer, a cathode layer and a dielectric layer. The light-emitting layer comprises a pixel area and a non-pixel area located on the side edge of the pixel area. The cathode layer is arranged on one side of the light-emitting layer; the cathode layer comprises a first sub-cathode layer corresponding to the pixel region and a second sub-cathode layer corresponding to the non-pixel region; the dielectric layer is arranged on one side, deviating from the light-emitting layer, of the cathode layer; wherein a plurality of isolation structures are formed on the surface, deviating from the light-emitting layer, of the second sub-cathode layer so as to prevent light emitted by the pixel region from being transmitted to the edge of the display panel along the surface of the cathode layer. The plurality of isolation structures are formed on the surface, deviating from the light-emitting layer, of the second sub-cathode layer, the surface plasma effect formed on the interface between the cathode layer and the dielectric layer is interfered, light emitted by the pixel area is prevented from spreading to the edge of the display panel along the surface of the cathode layer, and the edge light leakage phenomenon is improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a display device. Background Art

[0002] OLED (Organic Light-Emitting Diode) is widely used due to its advantages such as self-luminous properties, wide viewing angle, high contrast, fast response time and flexibility.

[0003] However, OLED devices suffer from edge light leakage, and in severe cases, there are obvious visible bright lines at the edges. Summary of the invention

[0004] The display panel and display device provided in the present application are used to improve edge light leakage.

[0005] In order to solve the above technical problems, the first technical solution provided in the present application is: providing a display panel, the display panel comprising a light-emitting layer, a cathode layer and a dielectric layer; the light-emitting layer comprises a pixel area and a non-pixel area located on the side of the pixel area; the cathode layer is arranged on one side of the light-emitting layer; the cathode layer comprises a first sub-cathode layer corresponding to the pixel area and a second sub-cathode layer corresponding to the non-pixel area; the dielectric layer is arranged on the side of the cathode layer away from the light-emitting layer; wherein a plurality of isolation structures are formed on the surface of the second sub-cathode layer away from the light-emitting layer to block the light emitted from the pixel area from propagating along the surface of the cathode layer to the edge of the display panel.

[0006] In one embodiment, the isolation structure is an isolation column protruding from the surface of the second sub-cathode layer; the dielectric layer includes an embedded portion, and the embedded portion is arranged between any two adjacent isolation columns; optionally, the height of the isolation column is less than or equal to the thickness of the dielectric layer; the isolation structure is formed by a deposition process or an etching process.

[0007] In one implementation, the material of the isolation column includes a metal material; optionally, the material of the isolation column includes Al.

[0008] In one embodiment, the isolation structure is an isolation opening formed on the surface of the second sub-cathode layer; the dielectric layer includes an embedded portion, and the embedded portion is arranged in the isolation opening; optionally, the depth of the isolation opening is less than or equal to the thickness of the second sub-cathode layer; optionally, the isolation opening includes an isolation groove and / or an isolation hole.

[0009] In one embodiment, the distance between two adjacent isolation structures is smaller than the wavelength of blue light; optionally, the distance between two adjacent isolation structures is 130nm-280nm.

[0010] In one embodiment, the width of the isolation structure is the same as the distance between two adjacent isolation structures.

[0011] In one embodiment, the orthographic projection of the isolation structure closest to the pixel area on the light-emitting layer is spaced apart from the pixel area; optionally, the orthographic projection of the isolation structure closest to the pixel area on the light-emitting layer is spaced apart from the pixel area by a distance greater than 100 μm.

[0012] In one embodiment, at least three isolation structures are formed on the surface of the second sub-cathode layer along a direction from the pixel area to the non-pixel area.

[0013] In one embodiment, along the direction from the pixel area to the non-pixel area, a plurality of isolation structures arranged at equal intervals or at unequal intervals are formed on the surface of the second sub-cathode layer; optionally, the isolation structures are formed by a deposition process or an etching process.

[0014] In order to solve the above technical problem, the second technical solution provided in the present application is: to provide a display device, comprising any of the display panels described above.

[0015] Beneficial effects of the present application: Different from the prior art, the present application discloses a display panel and a display device; the display panel includes a light-emitting layer, a cathode layer and a dielectric layer; the light-emitting layer includes a pixel area and a non-pixel area located on the side of the pixel area; the cathode layer is arranged on one side of the light-emitting layer; the cathode layer includes a first sub-cathode layer corresponding to the pixel area and a second sub-cathode layer corresponding to the non-pixel area; the dielectric layer is arranged on the side of the cathode layer away from the light-emitting layer; wherein, a plurality of isolation structures are formed on the surface of the second sub-cathode layer away from the light-emitting layer to block the light emitted from the pixel area from propagating along the surface of the cathode layer to the edge of the display panel. By forming a plurality of isolation structures on the surface of the second sub-cathode layer away from the light-emitting layer, the surface plasma effect formed at the interface between the cathode layer and the dielectric layer is disturbed, and the light emitted from the pixel area of ​​the light-emitting layer is blocked from propagating along the surface of the cathode layer to the edge of the display panel, thereby improving the edge light leakage phenomenon. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0017] Figure 1 is a schematic structural diagram of a first embodiment of a display panel provided in the present application;

[0018] Figure 2 yes Figure 1 A schematic structural diagram of another embodiment of an isolation column of a display panel shown;

[0019] Figure 3 yes Figure 1 A schematic structural diagram of another embodiment of an isolation column of a display panel is shown;

[0020] Figure 4 yes Figure 1 A schematic structural diagram of another embodiment of an isolation column of a display panel is shown;

[0021] Figure 5 yes Figure 1 A schematic structural diagram of another embodiment of an isolation column of a display panel is shown;

[0022] Figure 6 is a schematic structural diagram of a second embodiment of a display panel provided in the present application;

[0023] Figure 7 It is a schematic structural diagram of a third embodiment of a display panel provided in the present application. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0025] In the following description, for the purpose of explanation rather than limitation, specific details such as specific system structures, interfaces, and technologies are provided to facilitate a thorough understanding of the present application.

[0026] The terms "first", "second", and "third" in this application are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, the features defined as "first", "second", and "third" can explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined. All directional indications in the embodiments of this application (such as up, down, left, right, front, back...) are only used to explain the relative position relationship, movement, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication also changes accordingly. The terms "including" and "having" in the embodiments of this application and any of their variations are intended to cover non-exclusive inclusions. For example, a process, method, system, product, or device that includes a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units that are not listed, or optionally also includes other steps or components inherent to these processes, methods, products, or devices.

[0027] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0028] The present application is described in detail below with reference to the accompanying drawings and embodiments.

[0029] OLED devices have edge light leakage, and in severe cases, there are obvious visible bright lines on the edges. For the edge light leakage problem, there are usually two commonly used improvement measures in the prior art: one is to absorb the light at the edge through ink coating; the other is to adjust the arc angle morphology of the product cover to change the reflection path of the light. When ink coating is used to improve light leakage, since the ink itself has a certain thickness, the edge of the cover cannot be completely coated with ink, and the light leakage absorption effect is not obvious. When adjusting the arc angle morphology of the product cover to improve light leakage, since the adjustment space of the arc angle of the cover is limited, the simulation results of simply changing the arc angle do not significantly improve the light leakage, and change the appearance of the product.

[0030] In view of the problems existing in the prior art in improving edge light leakage technology, the present application provides a technology for improving edge light leakage that is different from the prior art, specifically a display panel and a display device.

[0031] See also Figures 1 to 5 , Figure 1is a schematic structural diagram of a first embodiment of a display panel provided in the present application, Figure 2 yes Figure 1 The structure diagram of another embodiment of the isolation column of the display panel is shown. Figure 3 yes Figure 1 The structure diagram of another embodiment of the isolation column of the display panel is shown in FIG. Figure 4 yes Figure 1 The structure diagram of another embodiment of the isolation column of the display panel is shown in FIG. Figure 5 yes Figure 1 A schematic structural diagram of another embodiment of an isolation column of a display panel is shown.

[0032] The display panel includes a light-emitting layer 11, a cathode layer 12 and a dielectric layer 13. The light-emitting layer 11 includes a pixel area 111 and a non-pixel area 112 located on the side of the pixel area 111. The cathode layer 12 is arranged on one side of the light-emitting layer 11. The cathode layer 12 includes a first sub-cathode layer 121 corresponding to the pixel area 111 and a second sub-cathode layer 122 corresponding to the non-pixel area 112. The dielectric layer 13 is arranged on the side of the cathode layer 12 away from the light-emitting layer 11. Among them, a plurality of isolation structures 1221 are formed on the surface of the second sub-cathode layer 122 away from the light-emitting layer 11 to block the light emitted from the pixel area 111 of the light-emitting layer 11 from propagating along the surface of the cathode layer 12 to the edge of the display panel.

[0033] It should be noted that the pixel area 111 refers to the area where the light-emitting layer 11 can emit light. The non-pixel area 112 refers to the area where the light-emitting layer 11 does not emit light; to put it another way, the non-pixel area 112 refers to the area of ​​the light-emitting layer 11 other than the pixel area 111. In one embodiment, there are non-pixel areas 112 on opposite sides of the pixel area 111. In one embodiment, the non-pixel area 112 is arranged around the entire circumference of the pixel area 111.

[0034] The inventor has found that when the light emitted by the pixel area 111 of the light-emitting layer 11 irradiates the surface of the cathode layer 12, it may excite the collective oscillation of the free electrons inside the metal of the cathode layer 12. This oscillation interacts with the light incident on the surface of the cathode layer 12 and can propagate along the surface of the cathode layer 12 to generate a surface plasma effect (SPP effect); there is a sufficient amount of light transmitted along the surface of the cathode layer 12 to the edge of the display panel, and this part of the light will cause edge light leakage. The embodiment of the present application forms a plurality of isolation structures 1221 on the surface of the second sub-cathode layer 122 away from the light-emitting layer 11, interferes with the SPP effect formed at the interface between the cathode layer 12 and the dielectric layer 13, breaks the SPP propagation on the surface of the cathode layer 12, blocks the light emitted by the pixel area 111 of the light-emitting layer 11 from propagating along the surface of the cathode layer 12 to the edge of the display panel, solves the problem of light propagation to the edge of the display panel from the source, improves the light emitted by the light-emitting layer 11 to gather at the edge of the display panel, and thus improves the edge light leakage phenomenon. In addition, forming an isolation structure 1221 on the surface of the second sub-cathode layer 122 can improve edge light leakage without changing the product appearance and affecting other optical properties of the display panel.

[0035] In one implementation, the isolation structure 1221 is formed by a deposition process or an etching process.

[0036] In one embodiment, the orthographic projection of the dielectric layer 13 on the cathode layer 12 covers the cathode layer 12 ; that is, the dielectric layer 13 covers the first sub-cathode layer 121 and the second sub-cathode layer 122 .

[0037] In this embodiment, the isolation structure 1221 is an isolation column 1221a protruding from the surface of the second sub-cathode layer 122. The dielectric layer 13 includes an embedded portion 131, and the embedded portion 131 is arranged between any two adjacent isolation columns 1221a. The structure formed by the cooperation of a plurality of spaced isolation columns 1221a interferes with the SPP effect formed at the interface between the cathode layer 12 and the dielectric layer 13, breaks the SPP propagation on the surface of the cathode layer 12, and thereby improves the edge light leakage.

[0038] In one embodiment, the isolation column 1221a is formed on the surface of the second sub-cathode layer 122 by evaporation or deposition. It should be noted that, compared with the display panel formed in the prior art, a mask plate may be added, and the isolation column 1221a may be formed by evaporation or deposition on the surface of the second sub-cathode layer 122 through the mask plate; or a film layer may be firstly evaporated or deposited on the surface of the second sub-cathode layer 122, and the isolation column 1221a may be obtained by exposure and development; in addition, the formation process of other structures of the display panel may refer to the prior art.

[0039] In one embodiment, the height of the isolation column 1221a is less than or equal to the thickness of the dielectric layer 13, and the isolation column 1221a does not protrude from the surface of the dielectric layer 13 away from the cathode layer 12, so that the surface of the dielectric layer 13 away from the cathode layer 12 is a flat surface, reducing the influence of the setting of the isolation column 1221a on the process of each film layer on the side of the dielectric layer 13 away from the cathode layer 12, and each film layer on the side of the dielectric layer 13 away from the cathode layer 12 can be formed by an existing process. It should be noted that the height of the isolation column 1221a refers to the vertical distance between the end face of the isolation column 1221a close to the second sub-cathode layer 122 and the end face of the isolation column 1221a away from the second sub-cathode layer 122. The thickness of the dielectric layer 13 refers to the vertical distance between the surface of the dielectric layer 13 close to the cathode layer 12 and the surface of the dielectric layer 13 away from the cathode layer 12. The height of the isolation column 1221a and the thickness of the dielectric layer 13 appearing in the following content are defined in the same way and will not be repeated.

[0040] Optional, such as Figures 1 to 5 As shown, the height of the isolation column 1221a is less than the thickness of the dielectric layer 13; the dielectric layer 13 includes an embedded portion 131 and a main body 132, and the main body 132 is located on the side of the embedded portion 131 away from the cathode layer 12. The main body 132 covers a plurality of embedded portions 131, and the plurality of embedded portions 131 are respectively connected to the main body 132; the surface of the main body 132 close to the cathode layer 12 and the surface of the main body 132 away from the cathode layer 12 are both planes, and the main body 132 is parallel to the light-emitting layer 11. The height of the embedded portion 131 is equal to the height of the isolation column 1221a. Exemplarily, the embedded portion 131 and the main body 132 are integrally formed. Exemplarily, the dielectric layer 13 is formed by coating and leveling. It should be noted that the height of the embedded portion 131 refers to the vertical distance between the end face of the embedded portion 131 close to the cathode layer 12 and the end face of the embedded portion 131 away from the cathode layer 12. The definition of the height of the embedded portion 131 in the following content is the same as this and will not be repeated herein.

[0041] Optionally, the height of the isolation column 1221a is equal to the thickness of the dielectric layer 13. The dielectric layer 13 includes only the embedded portion 131 and does not include the body portion 132; in other words, the dielectric layer 13 includes a plurality of embedded portions 131, each of which is disposed between two adjacent isolation columns 1221a.

[0042] Optionally, the height of the isolation column 1221a is less than or equal to 80nm, and the thickness of the dielectric layer 13 is greater than or equal to 80nm, and the height of the isolation column 1221a is kept less than or equal to the thickness of the dielectric layer 13. Exemplarily, the thickness of the dielectric layer 13 is 80nm, and the height of the isolation column 1221a is less than or equal to 80nm.

[0043] In one embodiment, the material of the isolation column 1221a includes a metal material. Using a metal material to block the propagation of SPP waves is effective; at the same time, the size and position of the isolation column 1221a can be accurately controlled, and the connection reliability between the isolation column 1221a and the cathode layer 12 can be maintained, and it is not easy to fall off (that is, it is not easy to peel).

[0044] Optionally, the material of the isolation column 1221a includes Al, which is a relatively cheap and easily available metal, which helps to reduce costs.

[0045] In one embodiment, the spacing between two adjacent isolation structures 1221 is smaller than the wavelength of blue light; in other words, the spacing between two adjacent isolation columns 1221a is smaller than the wavelength of blue light. The inventors have found that the blue light band is the main component of the SPP wave on the surface of the cathode layer 12. The spacing between two adjacent isolation structures 1221 is designed to be smaller than the wavelength of blue light to form a sub-wavelength structure, which can effectively break the propagation effect of the SPP on the surface of the cathode layer 12 and effectively improve the edge light leakage phenomenon. It should be noted that the spacing between two adjacent isolation structures 1221 refers to the shortest distance from the surface of one isolation structure 1221 to the surface of another isolation structure 1221.

[0046] Optionally, the spacing between two adjacent isolation structures 1221 is 130nm-280nm, which can block the propagation of SPP waves to a large extent within the range of 1 / 3-1 / 2 of the wavelength of blue light, thereby maximally improving the edge light leakage phenomenon. Exemplarily, the spacing between two adjacent isolation structures 1221 can be 130nm, 140nm, 150nm, 160nm, 170nm, 180nm, 190nm, 200nm, 210nm, 220nm, 230nm, 240nm, 250nm, 160nm, 270nm, 280nm, etc., or a range consisting of any two of the above values, such as 150nm-270nm, 130nm-230nm, 180nm-280nm, etc.

[0047] Optionally, the width M of the isolation structure 1221 is the same as the spacing between two adjacent isolation structures 1221; in other words, the width M of the isolation column 1221a is the same as the spacing between two adjacent isolation columns 1221a. By making the width M of the isolation structure 1221 the same as the spacing between two adjacent isolation structures 1221, the size of the isolation structure 1221 is sub-wavelength, further effectively breaking the propagation effect of the SPP on the surface of the cathode layer 12, thereby effectively improving the edge light leakage phenomenon. It should be noted that the width M of the isolation structure 1221 refers to the maximum size of the isolation structure 1221 along the direction of the pixel area 111 pointing to the non-pixel area 112.

[0048] For example, Figures 1 to 5 As shown, along the direction from the cathode layer 12 to the dielectric layer 13, the cross-sectional shapes of the isolation column 1221a are the same at all locations, and the cross-sectional areas of the isolation column 1221a are the same; the width of the isolation column 1221a refers to the dimension of the cross-sectional area of ​​the isolation column 1221a in the direction from the pixel region 111 to the non-pixel region 112. Exemplarily, along the direction from the cathode layer 12 to the dielectric layer 13, the cross-sectional shapes of the isolation column 1221a are the same at all locations, and the cross-sectional area of ​​the isolation column 1221a gradually decreases; the width of the isolation column 1221a refers to the dimension of the end surface of the isolation column 1221a close to the cathode layer 12 in the direction from the pixel region 111 to the non-pixel region 112.

[0049] In one embodiment, the orthographic projection of the isolation structure 1221 closest to the pixel area 111 on the light emitting layer 11 is spaced from the pixel area 111 of the light emitting layer 11; in other words, the orthographic projection of the isolation column 1221a closest to the pixel area 111 on the light emitting layer 11 is spaced from the pixel area 111 of the light emitting layer 11. By designing that the orthographic projection of the isolation structure 1221 closest to the pixel area 111 on the light emitting layer 11 is spaced from the pixel area 111 of the light emitting layer 11, the influence of the isolation structure 1221 on the light emitting layer 11 on the light emitting layer 11 is reduced, thereby reducing the influence on other optical properties of the display panel.

[0050] Optionally, the spacing distance N between the orthographic projection of the isolation structure 1221 closest to the pixel area 111 on the light-emitting layer 11 and the pixel area 111 of the light-emitting layer 11 is greater than 100 μm, thereby minimizing the impact of the isolation structure 1221 on the light emission of the pixel area 111 and maintaining the original light extraction efficiency of the light-emitting layer 11.

[0051] In one embodiment, at least three isolation structures 1221 are formed on the surface of the second sub-cathode layer 122 along the direction from the pixel area 111 to the non-pixel area 112; in other words, at least three isolation columns 1221a are formed on the surface of the second sub-cathode layer 122. Through the above arrangement, the propagation of SPP waves on the surface of the cathode layer 12 can be effectively blocked, thereby effectively improving the edge light leakage phenomenon.

[0052] In one embodiment, a plurality of isolation structures 1221 arranged at equal intervals or unequal intervals are formed on the surface of the second sub-cathode layer 122 along the direction pointing from the pixel area 111 to the non-pixel area 112; in other words, a plurality of isolation columns 1221a arranged at equal intervals or isolation columns 1221a arranged at unequal intervals are formed on the surface of the second sub-cathode layer 122.

[0053] For example, Figure 1 , Figure 4 , Figure 5As shown, along the direction from the pixel area 111 to the non-pixel area 112, a plurality of isolating columns 1221a arranged at equal intervals are formed on the surface of the second sub-cathode layer 122. The above arrangement simplifies the difficulty of the production process and helps reduce costs.

[0054] For example, Figure 2 and 3 As shown, along the direction from the pixel area 111 to the non-pixel area 112, the surface of the second sub-cathode layer 122 is formed with isolation columns 1221a arranged at unequal intervals. Figure 2 As shown, along the direction from the pixel area 111 to the non-pixel area 112, the spacing between the plurality of isolation columns 1221a formed on the surface of the second sub-cathode layer 122 gradually increases, which can effectively block the propagation of SPP waves on the surface of the cathode layer 12, thereby effectively improving the edge light leakage phenomenon. Figure 3 As shown, along the direction from the pixel area 111 to the non-pixel area 112, a plurality of isolation columns 1221a are formed on the surface of the second sub-cathode layer 122, and the spacing between the isolation columns 1221a gradually decreases, which can effectively block the propagation of SPP waves on the surface of the cathode layer 12, thereby effectively improving the edge light leakage phenomenon.

[0055] In one embodiment, if Figures 1 to 3 As shown, the heights of the plurality of isolation columns 1221 a are the same.

[0056] In one embodiment, if Figure 4 and Figure 5 As shown, the heights of the plurality of isolation columns 1221a are different. Figure 4 As shown, along the direction from the pixel area 111 to the non-pixel area 112, the height of the plurality of isolation columns 1221a gradually decreases, effectively blocking the light emitted from the pixel area 111 of the light-emitting layer 11 from propagating along the surface of the cathode layer 12 toward the edge of the display panel, improving the light emitted by the light-emitting layer 11 to gather at the edge of the display panel, thereby improving the edge light leakage phenomenon. Figure 5 As shown, along the direction from the pixel area 111 to the non-pixel area 112, a plurality of isolation columns 1221a are divided into a first isolation column 1221a-1 and a second isolation column 1221a-2. The height of the first isolation column 1121a-1 is different from the height of the second isolation column 1221a-2. The first isolation column 1121a-1 and the second isolation column 1221a-2 are alternately arranged, which effectively blocks the light emitted from the pixel area 111 of the light-emitting layer 11 from propagating along the surface of the cathode layer 12 to the edge of the display panel, thereby improving the light emitted by the light-emitting layer 11 to gather at the edge of the display panel, and further improving the edge light leakage phenomenon.

[0057] In one embodiment, a plurality of isolation structures 1221 are formed on the surface of the second sub-cathode layer 122, and the plurality of isolation structures 1221 are arranged in an array; in other words, a plurality of isolation columns 1221a are formed on the surface of the second sub-cathode layer 122, and the plurality of isolation columns 1221a are arranged in an array. Through the above arrangement, the propagation of SPP waves in all directions is blocked, and the edge leakage is effectively improved. Exemplarily, the plurality of isolation structures 1221 are arranged in multiple rows and columns. In another exemplary embodiment, along the direction from the pixel area 111 to the non-pixel area 112, the plurality of isolation structures 1221 are arranged in a row and multiple columns.

[0058] In one embodiment, the cross-sectional shape of the isolation column 1221a can be circular, square, rectangular, triangular, etc., and is specifically designed according to needs. The diversity of the morphology of the isolation column 1221a reduces the requirements for process accuracy and helps reduce yield loss. It should be noted that the cross section refers to the cross section parallel to the direction of the cathode layer 12.

[0059] In one embodiment, the dielectric layer 13 is used to improve the light extraction efficiency of the pixel region 111 of the light emitting layer 11. Optionally, the dielectric layer 13 is a CPL layer (Capping Layer).

[0060] In one embodiment, along the direction from the cathode layer 12 to the dielectric layer 13 , the cross-sectional shapes of the isolation columns 1221 a are the same at all locations, and the cross-sectional areas of the isolation columns 1221 a may be the same, gradually decrease, or gradually increase.

[0061] It can be understood that the display panel also includes structures such as a drive array layer 14 and an anode layer. The drive array layer 14 is arranged on the side of the light-emitting layer 11 away from the cathode layer 12, and the drive array layer 14 is used to drive the pixel area 111 of the light-emitting layer 11 to emit light. The anode layer is arranged between the drive array layer 14 and the light-emitting layer 11, and the anode layer and the cathode layer 12 are respectively located on both sides of the light-emitting layer 11. When the display panel is powered on, the anode layer injects holes and the cathode layer 12 injects electrons; these carriers migrate from the anode layer and the cathode layer 12 to the light-emitting layer 11 respectively under the action of the electric field, and in the pixel area 111 of the light-emitting layer 11, the holes and the electrons meet and recombine to form molecules or molecular clusters in an excited state, namely excitons; subsequently, in the process of de-excitation of the excitons from the high energy state to the low energy state, energy is released, and this part of energy is radiated in the form of photons, thereby generating visible light.

[0062] See also Figure 6 , Figure 6 It is a schematic structural diagram of a second embodiment of a display panel provided in the present application.

[0063] The second embodiment of the display panel is different from the first embodiment of the display panel in that the specific structure of the isolation structure 1221 is different, and the same parts are not repeated here.

[0064] In this embodiment, the isolation structure 1221 is an isolation opening 1221b formed on the surface of the second sub-cathode layer 122; the dielectric layer 13 includes an embedded portion 131, and the embedded portion 131 is disposed in the isolation opening 1221b. The structure formed by the plurality of isolation openings 1221b arranged at intervals interferes with the SPP effect formed at the interface between the cathode layer 12 and the dielectric layer 13, breaks the SPP propagation on the surface of the cathode layer 12, and thereby improves the edge light leakage.

[0065] In one embodiment, a plurality of isolation openings 1221 b are formed on the surface of the second sub-cathode layer 122 by an etching process.

[0066] In one embodiment, the depth of the isolation opening 1221 b is less than or equal to the thickness of the second sub-cathode layer 122 , thereby reducing the influence of the isolation opening 1221 b on the structure of the light-emitting layer 11 .

[0067] Optionally, the depth of the isolation opening 1221b is less than the thickness of the second sub-cathode layer 122; in this case, the dielectric layer 13 includes an embedded portion 131 and a main body portion 132, the main body portion 132 is located on the side of the embedded portion 131 away from the cathode layer 12, and the embedded portion 131 is arranged in the isolation opening 1221b; the main body portion 132 covers a plurality of embedded portions 131, and the plurality of embedded portions 131 are respectively connected to the main body portion 132; the surface of the main body portion 132 close to the cathode layer 12 and the surface of the main body portion 132 away from the cathode layer 12 are both planes, and the main body portion 132 is parallel to the light-emitting layer 11. It should be noted that the thickness of the second sub-cathode layer 122 refers to the vertical distance between the surface of the second sub-cathode layer 122 close to the light-emitting layer 11 and the surface of the second sub-cathode layer 122 away from the light-emitting layer 11; the depth of the isolation opening 1221b refers to the dimension of the isolation opening 1221b along the thickness direction of the second sub-cathode layer 122.

[0068] In one embodiment, the isolation opening 1221b includes an isolation groove and / or an isolation hole. It can be understood that when the depth of the isolation opening 1221b is less than the thickness of the second sub-cathode layer 122, the isolation opening 1221b is an isolation groove; when the depth of the isolation opening 1221b is equal to the thickness of the second sub-cathode layer 122, the isolation opening 1221b is an isolation hole.

[0069] It should be noted that when the isolation structure 1221 is an isolation opening 1221b, the spacing between two adjacent isolation openings 1221b, the width of the isolation opening 1221b, the spacing distance between the isolation opening 1221b closest to the pixel area 111 and the pixel area 111 of the light-emitting layer 11, the arrangement of multiple isolation openings 1221b, etc. can refer to the relevant introduction of the isolation structure 1221 in the first embodiment of the display panel, and the same technical effect can be achieved.

[0070] For example, the spacing between two adjacent isolation openings 1221b is less than the wavelength of blue light, and optionally, the spacing is 130nm-280nm; the width of the isolation opening 1221b is the same as the spacing between the two adjacent isolation openings 1221b; the positive projection of the isolation opening 1221b closest to the pixel area 111 on the light-emitting layer 11 is spaced from the pixel area 111 of the light-emitting layer 11, and optionally, the spacing is greater than 100μm; a plurality of isolation openings 1221b are formed on the surface of the second sub-cathode layer 122, and the plurality of isolation openings 1221b are spaced from the pixel area 111 of the light-emitting layer 11. 1b are arranged in an array; the cross-sectional shape of the isolation openings 1221b can be circular, square, rectangular, triangular, etc.; along the direction of the cathode layer 12 pointing to the dielectric layer 13, the cross-sectional shape of each isolation opening 1221b is the same, and the cross-sectional area of ​​the isolation openings 1221b can be the same, or can gradually increase, or can gradually decrease; the depths of the multiple isolation openings 1221b can be the same or different; the spacing between any two adjacent isolation openings 1221b among the multiple isolation openings 1221b can be the same or different.

[0071] See also Figure 7 , Figure 7 It is a schematic structural diagram of a third embodiment of a display panel provided in the present application.

[0072] The third embodiment of the display panel is different from the first embodiment of the display panel in that the specific structure of the isolation structure 1221 is different, and the same parts are not repeated here.

[0073] In this embodiment, among the multiple isolation structures 1221 on the surface of the second sub-cathode layer 122, some of the isolation structures 1221 are isolation columns 1221a formed on the surface of the second sub-cathode layer 122, and some of the isolation structures 1221 are isolation openings 1221b formed on the surface of the second sub-cathode layer 122. The dielectric layer 13 includes an embedded portion 131, which is disposed in the isolation opening 1221b and between two adjacent isolation columns 1221a. The structure formed by the cooperation of the multiple isolation structures 1221 arranged at intervals interferes with the SPP effect formed at the interface between the cathode layer 12 and the dielectric layer 13, breaks the SPP propagation on the surface of the cathode layer 12, and thereby improves the edge light leakage.

[0074] It should be noted that when the plurality of isolation structures 1221 are a combination of isolation openings 1221b and isolation columns 1221a, the spacing between two adjacent isolation structures 1221, the width of the isolation structure 1221, the spacing between the isolation structure 1221 closest to the pixel area 111 and the pixel area 111 of the light-emitting layer 11, and the arrangement of the plurality of isolation structures 1221 can refer to the relevant introduction of the isolation structure 1221 in the first embodiment of the display panel, and the same technical effect can be achieved. For example, the spacing between any two adjacent isolation structures of the plurality of isolation structures 1221 on the surface of the second sub-cathode layer 122 can be the same or different.

[0075] The present application also provides a display device, which includes the display panel provided by the above embodiment, which is beneficial to improving the quality of the display device. The display device can be a desktop computer, a notebook computer, a personal digital assistant (PDA), a mobile phone, a television, etc.

[0076] The above are only implementation methods of the present application, and are not intended to limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A display panel, characterized in that: include: A light-emitting layer, comprising a pixel region and a non-pixel region located on the side of the pixel region; A cathode layer, disposed on one side of the light-emitting layer; the cathode layer comprises a first sub-cathode layer corresponding to the pixel area and a second sub-cathode layer corresponding to the non-pixel area; A dielectric layer, disposed on a side of the cathode layer away from the light-emitting layer; A plurality of isolation structures are formed on the surface of the second sub-cathode layer away from the light-emitting layer to block the light emitted from the pixel area from propagating along the surface of the cathode layer toward the edge of the display panel.

2. The display panel according to claim 1, characterized in that: The isolation structure is an isolation column protruding from the surface of the second sub-cathode layer; the dielectric layer includes an embedded portion, and the embedded portion is arranged between any two adjacent isolation columns; Optionally, the height of the isolation column is less than or equal to the thickness of the dielectric layer.

3. The display panel according to claim 2, characterized in that: The material of the isolation column includes a metal material; Optionally, the material of the isolation column includes Al.

4. The display panel according to any one of claims 1 to 3, characterized in that: The isolation structure is an isolation opening formed on the surface of the second sub-cathode layer; the dielectric layer includes an embedded portion, and the embedded portion is arranged in the isolation opening; Optionally, the depth of the isolation opening is less than or equal to the thickness of the second sub-cathode layer; Optionally, the isolation opening includes an isolation groove and / or an isolation hole.

5. The display panel according to claim 1, characterized in that: The distance between two adjacent isolation structures is smaller than the wavelength of blue light; Optionally, the distance between two adjacent isolation structures is 130nm-280nm.

6. The display panel according to claim 5, characterized in that: The width of the isolation structure is the same as the distance between two adjacent isolation structures.

7. The display panel according to claim 1, characterized in that: The orthographic projection of the isolation structure closest to the pixel area on the light-emitting layer is arranged at an interval from the pixel area; Optionally, a distance between an orthographic projection of the isolation structure closest to the pixel region on the light-emitting layer and the pixel region is greater than 100 μm.

8. The display panel according to claim 1, characterized in that: Along the direction from the pixel area to the non-pixel area, a plurality of the isolation structures arranged at equal intervals or at unequal intervals are formed on the surface of the second sub-cathode layer; Optionally, the isolation structure is formed by a deposition process or an etching process.

9. The display panel according to claim 1, characterized in that: Along the direction from the pixel area to the non-pixel area, at least three isolation structures arranged at equal intervals are formed on the surface of the second sub-cathode layer.

10. A display device, characterized in that: A display panel comprising any one of claims 1 to 9.

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