Gamma-iodo-allyl diboron ester compound as well as preparation method and application thereof

By using γ-iodoallyl diborate compound and catalyst Ir[(dF(CF3)ppy)2(dtbbpy)]PF6 in alkynes, the problem of introducing halogen and diborate methyl groups in alkynes was solved, and efficient bifunctionalization and improved molecular structure diversity were achieved.

CN119684338AInactive Publication Date: 2025-03-25NANJING TECH UNIV
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Patent Information

Application Number
CN202510201590.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-02-24
Publication Date
2025-03-25
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

The prior art is difficult to efficiently introduce halogen and diborate methyl groups into alkynes, limiting the diversity and complexity of the molecular structure.

Method used

The halogen atom transfer radical addition reaction was carried out to achieve difunctionalization of alkynes by the catalyst Ir[(dF(CF3)ppy)2(dtbbpy)]PF6 and visible light.

Benefits of technology

The efficient construction of γ-iodoallyl diboron ester compounds under mild conditions enriches the difunctionalization method of alkynes and improves the diversity and complexity of molecular structure.

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Abstract

The invention belongs to the technical field of organic synthesis, and relates to a gamma-iodo-allyl diboron ester compound as well as a preparation method and application thereof. An alkyne compound I and a diboric acid ester iodomethane compound II are subjected to a halogen atom transfer radical addition reaction under the action of a catalyst and visible light, and the gamma-iodo-allyl diboron ester compound III is obtained. According to the method provided by the invention, the diboric acid ester iodomethane compound can be used for carrying out direct iododiboron carbon functionalization on alkyne under a mild condition, and a series of gamma-iodoallyl diboron ester compounds with unique structures and application values can be obtained by the method. Compared with the prior art, the method provided by the invention can simultaneously introduce halogen and diborate methyl into alkyne.
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