Detection device and calibration method for substrate transmission calibration of semiconductor equipment
By using a contact sensing device to record the position information of the detection device in a semiconductor device, the problem of difficulty in determining the position of the substrate in the processing cavity is solved, and accurate analysis and adjustment of position deviation is achieved, and process effect is improved.
Patent Information
- Application Number
- CN202311246172.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-09-25
- Publication Date
- 2025-03-25
- Estimated Expiration
- 2043-09-25
AI Technical Summary
During the semiconductor process, it is difficult to determine whether the position of the substrate in the processing chamber of the semiconductor device is correct, resulting in poor process effects. The prior art photographs substrates through cameras, but the data volume is large and the accuracy is low, making it difficult to analyze the reasons for position deviation.
A detection device for substrate transmission calibration of semiconductor equipment is provided, including a contact sensing device, which can record position information of the detection device during transmission or when placed in a processing chamber, and contact with the transmission device or the carrier device through the contact sensing device, and determine whether the position of the detection device is correct.
Through the position information of the detection device, it is possible to analyze the reasons for the position deviation of the inspection device and make targeted adjustments to improve the process effect when processing the substrate. This method simplifies data analysis and improves efficiency.