Brazing method for graphite target material

By sandblasting and vacuum magnetron sputtering titanium plating treatment on the graphite target, combined with heating treatment, the problems of low welding bonding rate and high de-welding risk during the brazing process are solved, and efficient and strong welding effects are achieved, and production costs are reduced.

CN119703242AInactive Publication Date: 2025-03-28KONFOONG MATERIALS INTERNATIONAL CO LTD
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Patent Information

Application Number
CN202411830328.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-12
Publication Date
2025-03-28
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

During the brazing process, graphite targets have low welding bonding rate and high risk of desoldering due to poor surface solder wetting, and existing treatment methods such as electroless nickel plating are costly and environmentally contaminated.

Method used

By sandblasting the welding surface of the graphite target, the surface roughness is enhanced, and then titanium is plated under vacuum magnetron sputtering environment to form a titanium film to improve solder wetting, and the graphite target and back plate are heated before brazing to achieve temperature equilibrium.

Benefits of technology

The welding bonding rate and strength between graphite target and back plate is significantly improved, the risk of desoldering and production costs are reduced, the production efficiency of products is improved, and the tensile strength of graphite target is enhanced.

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Abstract

The invention relates to a graphite target material brazing method which comprises the following steps: (1) carrying out sand blasting on a welding surface of a graphite target material to obtain a sand-blasted graphite target material; (2) carrying out vacuum magnetron sputtering titanium plating on the welding surface of the graphite target material subjected to sand blasting to obtain a graphite target material with a titanium film; and (3) the back plate and the graphite target material with the titanium film are heated, and brazing is conducted on the heated graphite target material and the back plate. The graphite target material is subjected to sand blasting and vacuum magnetron sputtering titanium plating treatment, the problem that the wettability of the welding flux on the surface of the graphite target material is poor is solved, the risk of unsoldering in the using process of the graphite target material is greatly reduced, the production cost is reduced, the production efficiency of products is improved, meanwhile, the backboard and the graphite target material with the titanium film are brazed, and the quality of the products is improved. And the tensile strength of the graphite target material can be greatly improved.
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