Ink jet patterning method

By printing narrow line width dams and fill materials on the silicon wafer substrate, combined with metal layer deposition and cleaning etching, the problem of insufficient control of line width and uncontrollable edge morphology in the existing inkjet printing technology is solved, and higher material utilization and lower cost are achieved.

CN119704920APending Publication Date: 2025-03-28WUXI PSPATTERN TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202311281123.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2023-09-28
Publication Date
2025-03-28

AI Technical Summary

Technical Problem

The existing inkjet printing technology has problems such as insufficient control of metal deposition line width, uncontrollable edge morphology, low material utilization and high cost in the fields of photovoltaic and semiconductors.

Method used

Using an inkjet patterning method, the dam of the dam with a narrow line width is first printed on the silicon wafer substrate, and the second sacrificial layer material is filled in the dam frame, followed by metal layer deposition and cleaning etching, and finally the dam and fill area sacrificial layer are removed.

Benefits of technology

The controllability of the metal deposition line width is achieved, the morphology of the metal deposition layer is controllable, which reduces the invalid loss of the material, saves ink material, and simplifies the difficulty of printing on the nozzle selection and filling area.

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Abstract

The invention discloses an ink-jet patterning method, which can realize that a GAP value (a value) is adjustable and controllable from 0 to 1 mm and is separated from a mode that conventional ink-jet printing is controlled according to DPI, namely, the line width of metal deposition is controllable, the morphology of a metal deposition layer can be controlled, and the morphology of the metal deposition layer is in a vertical state as far as possible. The viscosity selection window of the box dam material is very large (1-100 thousand mP.s can be selected), the higher height-width ratio can be achieved, the shape is steeper, meanwhile, after the box dam material is completed, the filled material only needs to be used for filling and covering the inner area of the box dam, the edge linearity and shape do not need to be considered, the material characteristic requirement is reduced, and through the technology, the production efficiency is improved. The thickness of the metal layer and the thickness of the box dam are ensured to be consistent, the box dam only needs to be filled and paved fully, ink materials can be saved, and by means of the method, the printing difficulty of the filling area is greatly reduced, and the nozzle type selection requirement can be greatly reduced.
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