Semiconductor defect detection multi-station transfer system

By designing a multi-station transfer system in the wafer detection system, wafer transfer and vacuum environment management are optimized, and the problems of low detection efficiency and long vacuum environment switching time in the existing technology are solved, and a more efficient wafer detection process is achieved.

CN119706250AActive Publication Date: 2025-03-28JIHUA LAB
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Patent Information

Application Number
CN202411811393.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-10
Publication Date
2025-03-28
Estimated Expiration
2044-12-10

AI Technical Summary

Technical Problem

In the existing wafer detection technology, the layout of the detection station and the waiting station is not optimized enough, resulting in low wafer transfer efficiency and long vacuum environment switching time, which affects the detection efficiency.

Method used

A semiconductor defect detection multi-station transfer system is designed, and efficient wafer transfer and vacuum environment optimization is achieved by setting clear functional areas such as wafer feeding area, waiting area, detection area and discharge area, and equipped with automatic transfer devices and grabbing components.

Benefits of technology

It improves the production efficiency of wafer detection, optimizes the process flow, reduces the waiting time and vacuum environment switching time, and improves the utilization rate of detection equipment and overall detection efficiency.

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Abstract

The invention relates to the technical field of wafer detection, in particular to a semiconductor defect detection multi-station transfer system which is provided with four functional areas including a wafer feeding area, a waiting area, a detection area and a discharging area, and is equipped with a conveying device and a grabbing assembly, so that the advantages are remarkable; firstly, the first conveying device of the feeding area can automatically convey the to-be-detected wafer box to the waiting area, manual intervention is not needed, time is saved, and production efficiency is improved; the detection area grabbing assembly can efficiently transfer wafers in the waiting area and the detection area, the waiting time is shortened, and the utilization rate of detection equipment is increased; and thirdly, the second conveying device in the discharging area moves away the detected wafer box in time, and the technological process is optimized. The division of each functional area enables the wafer to be transferred in order, and enables the whole process to be smooth. In conclusion, the system has remarkable effects in the aspects of improving the production efficiency, optimizing the technological process and the like.
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