Turnover device for double-sided coating in vacuum system and coating method

By designing a double-sided coating flip device in a vacuum system, using clamping components and gates to achieve independent control of the flip and vacuum environment of the sample, the problems of sample pollution and low production efficiency in the prior art are solved, and an efficient and clean coating process is achieved.

CN119710605APending Publication Date: 2025-03-28LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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Patent Information

Application Number
CN202411757922.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-03
Publication Date
2025-03-28

AI Technical Summary

Technical Problem

The existing semiconductor wafer double-sided coating process is prone to contamination during the handling and switching of internal and external vacuum systems, and the removal of the flip during the coating process may damage the film layer and reduce production efficiency.

Method used

A flip device for double-sided coating in a vacuum system is designed, including a box, a gate, a track assembly and a clamping assembly. By moving the clamping assembly between the coating cavity and the flip cavity, the flip of the sample is realized, and the coating cavity and the flip cavity are separated by the gate, and the vacuum environment is independently controlled.

Benefits of technology

It effectively avoids contamination of samples during coating, improves product reliability and performance, reduces the size of the coating cavity, improves vacuum degree and the filling efficiency of coating gas, and improves production efficiency.

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Abstract

The invention provides a turnover device for double-sided coating in a vacuum system and a coating method, and belongs to the technical field of semiconductor wafer coating. Comprising a box body, a gate, a rail assembly and a clamping assembly. The box body is provided with a coating cavity and an overturning cavity which are communicated with each other, and the coating cavity is used for mounting a coating device; the gate is mounted on the box body so as to separate the coating cavity from the overturning cavity; the track assembly is mounted in the overturning cavity; the clamping assembly is in guide fit with the rail assembly so as to reciprocate between the coating cavity and the overturning cavity, and the clamping assembly is used for clamping a sample located in the coating cavity and moving the sample into the overturning cavity to be overturned. According to the invention, the sample is turned over in the turnover cavity, and the coating cavity is communicated with the turnover cavity, so that the condition that the sample is polluted due to the fact that the sample is taken out and turned over in the coating process is avoided; and moreover, as the surface does not need to be turned over in the coating cavity, the size of the coating cavity can be properly reduced, so that the vacuumizing efficiency of the coating cavity is improved.
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