Substrate processing apparatus

By designing a dielectric layer and a heater control substrate in the Taichung, and introducing refrigerant using the inlet port, the problem of poor operation stability of the Taichung substrate is solved, and the processing effect of the plasma processing device is improved.

CN119725207APending Publication Date: 2025-03-28TOKYO ELECTRON LTD
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Patent Information

Application Number
CN202411900700.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2019-08-22
Filing Date
2020-08-14
Publication Date
2025-03-28

AI Technical Summary

Technical Problem

The operation stability of the existing Taichung substrate is poor, which affects the processing effect of the plasma processing device.

Method used

A mounting table is designed, which includes a base, a dielectric layer and a heater control substrate. The dielectric layer is provided with a mounting surface on the first side of the base and a plurality of heaters are built into it to adjust the substrate temperature. The heater control substrate is arranged in the storage space for driving a plurality of heaters and introducing refrigerant through the inlet port to cool the system.

Benefits of technology

By improving the operation stability of the substrate in the mounting table, the processing effect of the plasma processing device is enhanced, ensuring the temperature and position of the substrate during the processing process.

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Abstract

The invention provides a substrate processing apparatus. Also provided are a mounting table and a plasma processing apparatus, which improve the stability of the operation of a substrate disposed in an accommodation space in the mounting table. The mounting table includes: a base having an accommodation space therein; a dielectric layer which is provided on the first surface of the base, has a placement surface on which a substrate is placed, and has a plurality of heaters therein; and a heater control substrate that is disposed in the housing space and drives the plurality of heaters, and the base has an introduction port that introduces a refrigerant into the housing space on a second surface of the base, which is a surface opposite to the first surface.
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