Device and method for attaching polishing pad

Through the automated opening, neutralization and compression mechanism, the precise attachment of the polishing pad is achieved, which solves the problem of difficulty in ensuring accuracy and efficiency in manual operation, and improves the polishing quality and production efficiency.

CN119748339APending Publication Date: 2025-04-04XIAN ESWIN MATERIAL TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202510101502.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-22
Publication Date
2025-04-04

AI Technical Summary

Technical Problem

In the prior art, the attachment of polishing pads depends on manual operation, making it difficult to achieve high efficiency and high precision attachment, which can easily lead to adhesion misalignment and bubble generation, affecting the polishing quality and production efficiency.

Method used

An automated polishing pad attachment device is designed, including a propelling mechanism, a centering mechanism and a pressing mechanism, so as to achieve precise neutralization and bubble-free attachment of the polishing pad through automated operations.

Benefits of technology

It improves the adhesion accuracy and efficiency, reduces bubble generation, reduces manual operation dependence, extends the service life of the polishing pad, and reduces production costs.

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Abstract

The invention provides a device and method for attaching a polishing pad, and the device comprises an opening mechanism which is used for opening the polishing pad; the centering mechanism is used for centering the polishing pad and the polishing table; and the pressing mechanism is used for pressing the polishing pad to the polishing table from the center of the polishing pad to the edge of the polishing pad along a spiral line. The device can improve the attaching precision, reduce bubbles and reduce the dependence on manual operation.
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