Communication system, computing device, and communication method

Abstract

The disclosed communication system includes a master device, a plurality of slave devices, and a computing device. The data frame transmitted to the plurality of slave devices includes a plurality of datagrams for each of the plurality of slave devices. Each datagram of the plurality of datagrams includes setting data for a corresponding slave device of the plurality of slave devices and monitoring data written in the corresponding slave device. The computing device is configured so as to obtain updated setting data for each of a plurality of datagrams in a data frame to be transmitted to the plurality of slave devices in a subsequent communication cycle, on the basis of monitoring data for each of the plurality of slave devices in the data frame received in a preceding communication cycle.

Description

Technical Field

[0001] Exemplary embodiments of the present disclosure relate to a communication system, a computing device, and a communication method. Background Art

[0002] In industrial systems, EtherCAT (registered trademark), which is industrial Ethernet (registered trademark), is used as a data communication protocol. In an industrial system that complies with EtherCAT, a primary device (or master device) is connected to a plurality of secondary devices (or slave devices). The primary device sends a data frame containing setting data for each of the plurality of slave devices to the plurality of slave devices. The setting data for each of the plurality of slave devices is obtained in the primary device.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Publication No. 2010-278897 Summary of the invention

[0006] Problem that the invention aims to solve

[0007] The present disclosure provides a technique for alleviating a computational load on a master device in a communication system.

[0008] Solutions for solving problems

[0009] In an exemplary embodiment, a communication system is provided. The communication system includes a master device, a plurality of slave devices, and a computing device. The plurality of slave devices are connected to the master device in a manner capable of communication. The computing device is connected to the master device and the plurality of slave devices in a manner capable of communication. A data frame sent to the plurality of slave devices includes a plurality of datagrams for each of the plurality of slave devices. Each of the plurality of datagrams includes setting data for a corresponding slave device among the plurality of slave devices and monitoring data written in the corresponding slave device. The computing device is configured to obtain updated setting data for each of the plurality of datagrams in a data frame sent to the plurality of slave devices in a subsequent communication cycle based on the monitoring data of each of the plurality of slave devices in a data frame received in a previous communication cycle.

[0010] Effects of the Invention

[0011] According to an exemplary embodiment, it is possible to reduce the computation load of a master device in a communication system. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a diagram for explaining a configuration example of a plasma processing system.

[0013] Figure 2 It is a diagram for explaining a configuration example of a capacitive coupling type plasma processing apparatus.

[0014] Figure 3 FIG. 1 is a diagram showing a plasma processing system according to an exemplary embodiment.

[0015] Figure 4 is a diagram showing a communication system according to an exemplary embodiment.

[0016] Figure 5 This is a diagram showing an example of a data frame.

[0017] Figure 6 is a diagram showing a computing device according to an exemplary embodiment.

[0018] Figure 7 is a flow chart of a communication method according to an exemplary embodiment.

[0019] Figure 8 is a diagram illustrating a first data frame flow in a communication system according to an exemplary embodiment.

[0020] Fig. 9 is a diagram illustrating a second data frame flow in a communication system according to an exemplary embodiment.

[0021] Fig.10 This is a diagram showing a communication system according to another exemplary embodiment.

[0022] Fig.11 is a diagram showing a computing device according to another exemplary embodiment.

[0023] Fig.12 is a flow chart of a communication method according to another exemplary embodiment.

[0024] Fig.13 This is a diagram showing the flow of a first data frame in a communication system according to another exemplary embodiment.

[0025] Fig.14 is a diagram showing a second data frame used in a communication system according to another exemplary embodiment.

[0026] Fig.15 This is a diagram showing the flow of a second data frame in a communication system according to another exemplary embodiment.

[0027] Fig.16is a diagram showing a third data frame used in a communication system according to another exemplary embodiment.

[0028] Fig.17 It is a diagram showing the flow of a third data frame in a communication system according to another exemplary embodiment.

[0029] Fig.18 It is a diagram showing the flow of a fourth data frame in a communication system according to another exemplary embodiment.

[0030] Fig.19 It is a diagram showing another process of the first data frame in the communication system involved in an exemplary embodiment.

[0031] Fig. 20 It is a diagram showing other processes of the second data frame in the communication system involved in an exemplary embodiment.

[0032] Fig.21 It is a diagram showing another process of the first data frame in the communication system involved in another exemplary embodiment.

[0033] Fig. 22 It is a diagram showing other processes of the fourth data frame in the communication system involved in another exemplary embodiment. DETAILED DESCRIPTION

[0034] Hereinafter, various exemplary embodiments will be described in detail with reference to the accompanying drawings. In addition, in each of the drawings, the same or corresponding parts are denoted by the same reference numerals.

[0035] First, as an example of a communication system, refer to Figure 1 to Figure 3 A plasma processing system will be described.

[0036] Figure 1 : is a diagram for illustrating a structural example of a plasma processing system. In one embodiment, the plasma processing system includes a plasma processing device 1 and a control unit 2. The plasma processing system is an example of a substrate processing system, and the plasma processing device 1 is an example of a substrate processing device. The plasma processing device 1 includes a plasma processing chamber 10, a substrate support portion 11, and a plasma generating portion 12. The plasma processing chamber 10 has a plasma processing space. In addition, the plasma processing chamber 10 has at least one gas supply port for supplying at least one processing gas to the plasma processing space, and at least one gas exhaust port for exhausting gas from the plasma processing space. The gas supply port is connected to the gas supply portion 20 described later, and the gas exhaust port is connected to the exhaust system 40 described later. The substrate support portion 11 is arranged in the plasma processing space, and has a substrate supporting surface for supporting a substrate.

[0037] The plasma generating unit 12 is configured to generate plasma from at least one processing gas supplied into the plasma processing space. The plasma formed in the plasma processing space may be a capacitively coupled plasma (CCP: Capacitively Coupled Plasma), an inductively coupled plasma (ICP: Inductively Coupled Plasma), an ECR plasma (Electron-Cyclotron-Resonance Plasma: Electron Cyclotron Resonance Plasma), a helicon wave excited plasma (HWP: Helicon Wave Plasma) or a surface wave plasma (SWP: Surface Wave Plasma), etc. In addition, various types of plasma generating units including an AC (Alternating Current: Alternating Current) plasma generating unit and a DC (Direct Current: Direct Current) plasma generating unit may also be used. In one embodiment, the AC signal (AC power) used in the AC plasma generating unit has a frequency in the range of 100kHz to 10GHz. Therefore, the AC signal includes an RF (Radio Frequency: Radio Frequency) signal and a microwave signal. In one embodiment, the RF signal has a frequency in the range of 100kHz to 150MHz.

[0038] The control unit 2 processes computer executable commands that cause the plasma processing device 1 to execute various processes described in the present disclosure. The control unit 2 can be configured to control the various elements of the plasma processing device 1 to execute the various processes described herein. In one embodiment, a part or all of the control unit 2 can be included in the plasma processing device 1. The control unit 2 can include a processing unit 2a1, a storage unit 2a2, and a communication interface 2a3. The control unit 2 is implemented, for example, by a computer 2a. The processing unit 2a1 can be configured to perform various control actions by reading a program from the storage unit 2a2 and executing the read program. The program can be stored in the storage unit 2a2 in advance, or it can be obtained via a medium when necessary. The obtained program is stored in the storage unit 2a2, and is read and executed from the storage unit 2a2 by the processing unit 2a1. The medium can be various storage media that can be read by the computer 2a, or it can be a communication line connected to the communication interface 2a3. The processing unit 2a1 can be a CPU (Central Processing Unit). The storage unit 2a2 may include a RAM (Random Access Memory), a ROM (Read Only Memory), a HDD (Hard Disk Drive), an SSD (Solid State Drive), or a combination thereof. The communication interface 2a3 may communicate with the plasma processing device 1 via a communication line such as a LAN (Local Area Network).

[0039] Next, a configuration example of a capacitive coupling type plasma processing apparatus will be described as an example of the plasma processing apparatus 1 . Figure 2 It is a diagram for explaining a configuration example of a capacitive coupling type plasma processing apparatus.

[0040] A capacitively coupled plasma processing apparatus 1 includes a plasma processing chamber 10, a gas supply unit 20, a power supply 30, and an exhaust system 40. In addition, the plasma processing apparatus 1 includes a substrate support unit 11 and a gas inlet unit. The gas inlet unit is configured to introduce at least one processing gas into the plasma processing chamber 10. The gas inlet unit includes a shower head 13. The substrate support unit 11 is disposed in the plasma processing chamber 10. The shower head 13 is disposed above the substrate support unit 11. In one embodiment, the shower head 13 constitutes at least a portion of the ceiling of the plasma processing chamber 10. The plasma processing chamber 10 has a plasma processing space 10s defined by the shower head 13, the side wall 10a of the plasma processing chamber 10, and the substrate support unit 11. The plasma processing chamber 10 is grounded. The shower head 13 and the substrate support unit 11 are electrically insulated from the shell of the plasma processing chamber 10.

[0041] The substrate support portion 11 includes a main body 111 and a ring assembly 112. The main body 111 has a central area 111a for supporting a substrate W and an annular area 111b for supporting the ring assembly 112. A wafer is an example of a substrate W. The annular area 111b of the main body 111 surrounds the central area 111a of the main body 111 when viewed from above. The substrate W is arranged on the central area 111a of the main body 111, and the ring assembly 112 is arranged on the annular area 111b of the main body 111 in a manner that surrounds the substrate W on the central area 111a of the main body 111. Therefore, the central area 111a is also referred to as a substrate supporting surface for supporting the substrate W, and the annular area 111b is also referred to as a ring supporting surface for supporting the ring assembly 112.

[0042] In one embodiment, the main body 111 includes a base 1110 and an electrostatic holding disk (holding disk: chuck) 1111. The base 1110 includes a conductive component. The conductive component of the base 1110 can function as a lower electrode. The electrostatic holding disk 1111 is arranged on the base 1110. The electrostatic holding disk 1111 includes a ceramic component 1111a and an electrostatic electrode 1111b arranged in the ceramic component 1111a. The ceramic component 1111a has a central area 111a. In one embodiment, the ceramic component 1111a also has an annular area 111b. In addition, other components surrounding the electrostatic holding disk 1111, such as an annular electrostatic holding disk or an annular insulating component, may also have an annular area 111b. In this case, the ring assembly 112 can be arranged on the annular electrostatic holding disk or the annular insulating component, or on both the electrostatic holding disk 1111 and the annular insulating component. In addition, at least one RF / DC electrode coupled to the RF power supply 31 and / or the DC power supply 32 described later may be arranged in the ceramic component 1111a. In this case, the at least one RF / DC electrode functions as a lower electrode. In the case where the bias RF signal and / or the DC signal described later are supplied to the at least one RF / DC electrode, the RF / DC electrode is also referred to as a bias electrode. In addition, the conductive component of the base 1110 and the at least one RF / DC electrode may also function as a plurality of lower electrodes. In addition, the electrostatic electrode 1111b may also function as a lower electrode. Thus, the substrate support portion 11 includes at least one lower electrode.

[0043] The ring assembly 112 includes one or more ring-shaped members. In one embodiment, the one or more ring-shaped members include one or more edge rings and at least one cover ring. The edge ring is formed of a conductive material or an insulating material, and the cover ring is formed of an insulating material.

[0044] In addition, the substrate support 11 may include a temperature control module, which is configured to adjust at least one of the electrostatic holding disk 1111, the ring assembly 112 and the substrate W to a target temperature. The temperature control module may include a heater, a heat transfer medium, a flow path 1110a or a combination thereof. A heat transfer fluid such as brine or gas flows in the flow path 1110a. In one embodiment, the flow path 1110a is formed in the base 1110, and one or more heaters are arranged in the ceramic component 1111a of the electrostatic holding disk 1111. In addition, the substrate support 11 may include a heat transfer gas supply unit, which is configured to supply a heat transfer gas to the gap between the back side of the substrate W and the central area 111a.

[0045] The shower head 13 is configured to introduce at least one processing gas from the gas supply unit 20 into the plasma processing space 10s. The shower head 13 has at least one gas supply port 13a, at least one gas diffusion chamber 13b, and a plurality of gas inlet ports 13c. The processing gas supplied to the gas supply port 13a passes through the gas diffusion chamber 13b and is introduced into the plasma processing space 10s from the plurality of gas inlet ports 13c. In addition, the shower head 13 includes at least one upper electrode. In addition, the gas inlet portion may include, in addition to the shower head 13, one or more side gas injection portions (SGI: Side Gas Injector) installed in one or more openings formed in the side wall 10a.

[0046] The gas supply unit 20 may include at least one gas source 21 and at least one flow controller 22. In one embodiment, the gas supply unit 20 is configured to supply at least one process gas from the respective gas sources 21 to the shower head 13 via the respective flow controllers 22. Each flow controller 22 may include, for example, a mass flow controller or a pressure-controlled flow controller. In addition, the gas supply unit 20 may include at least one flow modulation device for modulating or pulsing the flow of at least one process gas.

[0047] The power supply 30 includes an RF power supply 31 coupled to the plasma processing chamber 10 via at least one impedance matching circuit. The RF power supply 31 is configured to supply at least one RF signal (RF power) to at least one lower electrode and / or at least one upper electrode. Thus, plasma is formed from at least one processing gas supplied to the plasma processing space 10s. Therefore, the RF power supply 31 can function as at least a part of the plasma generating unit 12. In addition, by supplying a bias RF signal to at least one lower electrode, a bias potential can be generated on the substrate W to attract ion components in the formed plasma to the substrate W.

[0048] In one embodiment, the RF power supply 31 includes a first RF generating unit 31a and a second RF generating unit 31b. The first RF generating unit 31a is configured to be coupled to at least one lower electrode and / or at least one upper electrode via at least one impedance matching circuit to generate a source RF signal (source RF power) for generating plasma. In one embodiment, the source RF signal has a frequency in the range of 10 MHz to 150 MHz. In one embodiment, the first RF generating unit 31a may also be configured to generate a plurality of source RF signals having different frequencies. The generated one or more source RF signals are supplied to at least one lower electrode and / or at least one upper electrode.

[0049] The second RF generating unit 31b is configured to be coupled to at least one lower electrode via at least one impedance matching circuit to generate a bias RF signal (bias RF power). The frequency of the bias RF signal may be the same as or different from the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency lower than the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency in the range of 100kHz to 60MHz. In one embodiment, the second RF generating unit 31b may also be configured to generate a plurality of bias RF signals having different frequencies. The generated one or more bias RF signals are supplied to at least one lower electrode. In addition, in various embodiments, at least one of the source RF signal and the bias RF signal may also be pulsed.

[0050] In addition, the power supply 30 may include a DC power supply 32 coupled to the plasma processing chamber 10. The DC power supply 32 includes a first DC generating unit 32a and a second DC generating unit 32b. In one embodiment, the first DC generating unit 32a is configured to be connected to at least one lower electrode and generate a first DC signal. The generated first DC signal is applied to at least one lower electrode. In one embodiment, the second DC generating unit 32b is configured to be connected to at least one upper electrode and generate a second DC signal. The generated second DC signal is applied to at least one upper electrode.

[0051] In various embodiments, the first DC signal and the second DC signal may also be pulsed. In this case, a sequence of voltage pulses is applied to at least one lower electrode and / or at least one upper electrode. The voltage pulse may have a rectangular, trapezoidal, triangular, or a pulse waveform of a combination of these shapes. In one embodiment, a waveform generator for generating a sequence of voltage pulses from a DC signal is connected between the first DC generator 32a and at least one lower electrode. Thus, the first DC generator 32a and the waveform generator constitute a voltage pulse generator. In the case where the second DC generator 32b and the waveform generator constitute a voltage pulse generator, the voltage pulse generator is connected to at least one upper electrode. The voltage pulse may have a positive polarity or a negative polarity. In addition, the sequence of voltage pulses may include one or more positive polarity voltage pulses and one or more negative polarity voltage pulses in one cycle. In addition, a first DC generator 32a and a second DC generator 32b may be provided in addition to the RF power supply 31, or a first DC generator 32a may be provided instead of the second RF generator 31b.

[0052] The exhaust system 40 can be connected to a gas outlet 10e, for example, provided at the bottom of the plasma processing chamber 10. The exhaust system 40 can include a pressure regulating valve and a vacuum pump. The pressure in the plasma processing space 10s is adjusted by the pressure regulating valve. The vacuum pump can include a turbomolecular pump, a dry pump, or a combination thereof.

[0053] The plasma processing system includes a primary device (or master device) and a plurality of secondary devices (or slave devices). In the plasma processing system, data communication is performed using data frames that comply with EtherCAT as a communication protocol. In the plasma processing system, the primary device is the control unit 2.

[0054] Below, refer to Figure 3 . Figure 3 FIG. 1 is a diagram showing a plasma processing system according to an exemplary embodiment. Figure 3 As shown, the plasma processing system may further include a pressure sensor 10c. The pressure sensor 10c is configured to obtain a measured value (an example of monitoring data) of the pressure in the chamber 10. The pressure sensor 10c is, for example, a capacitance pressure gauge.

[0055] In addition, the exhaust system 40 may further include a pressure reducing pump 41 and a pressure controller 42. The pressure reducing pump 41 may include a dry pump and / or a turbomolecular pump. The pressure reducing pump 41 is connected to the chamber 10 via the pressure controller 42. The pressure controller 42 is, for example, a pressure control valve. The pressure controller 42 is configured to control the pressure (control amount) in the chamber 10 according to the setting data (pressure setting value). The plurality of slave devices in the plasma processing system may also include a pressure sensor 10c and a pressure controller 42.

[0056] In addition, the flow controller 22 includes a flow sensor 22s. The flow sensor 22s is configured to obtain a measured value (another example of monitoring data) of the flow rate of the gas supplied into the chamber 10 from the flow controller 22. The flow controller 22 is configured to control the flow rate (controlled amount) of the gas supplied to the chamber 10 according to the setting data (flow setting value). A plurality of slave devices in the plasma processing system may include the flow controller 22.

[0057] In addition, the first RF generating unit 31a may include a high frequency power supply 311 and a sensor 312. The high frequency power supply 311 is configured to generate a first RF signal (source high frequency power). The sensor 312 is configured to obtain a state value of the source high frequency power. The state value of the high frequency power (an example of monitoring data) can be the power level of the traveling wave of the source high frequency power, the power level of the reflected wave of the source high frequency power, or the level of the load power of the source high frequency power (the difference between the power level of the traveling wave and the power level of the reflected wave), etc. The high frequency power supply 311 is configured to control the source high frequency power according to setting data (setting data of the source high frequency power). The plurality of slave devices in the plasma processing system may include the first RF generating unit 31a. In addition, the plurality of slave devices in the plasma processing system may also include other devices in the plasma processing system other than the control unit 2.

[0058] Below, refer to Figure 4 The communication system according to an exemplary embodiment is described below. Figure 4 An example of a communication system 100 is shown. Figure 4 As shown, the communication system 100 includes a master device 101, a plurality of slave devices 102, and a computing device 103. The communication system 100 includes N slave devices 102. N is an integer greater than 2. In the example shown in the figure, N is 3. That is, in the example shown in the figure, the communication system 100 includes the slave devices 102 as the plurality of slave devices 102. 1 , 102 2 , 102 3 In the following description, the slave device 102 n Indicates any one of the plurality of slave devices 102 .

[0059] In the plasma processing system, the main device 101 is the control unit 2. The main device 101 includes a first port 101a and a second port 101b. A plurality of slave devices 102 are connected to the main device 101 in a manner that allows communication. The computing device 103 is connected to the main device 101 and the plurality of slave devices 102 in a manner that allows communication. The plurality of slave devices 102 and the computing device 103 can be connected in series with respect to the main device 101. The communication system 100 includes a communication path 121 (main communication path). The communication path 121 is a communication path that returns from the first port 101a via the computing device 103 and the plurality of slave devices 102 (in one example, via the serial connection of the computing device 103 and the plurality of slave devices 102) to the second port 101b. In one embodiment, the communication system 100 may further include a communication path 122 (backup communication path). The communication path 122 is a communication path from the second port 101 b via the plurality of slave devices 102 and the computing device 103 (in one example, via a series connection of the plurality of slave devices 102 and the computing device 103 ) back to the first port 101 a .

[0060] Communication system 100 uses Figure 5 The data frame shown is used for data communication. Figure 5 This is a diagram showing an example of a data frame. Figure 5 The data frame 200 shown is a data frame that complies with EtherCAT. The data frame 200 includes an Ethernet header 211, Ethernet data 212, and a frame check sequence 213. The Ethernet header 211 includes a destination MAC address 211a, a source MAC address 211b, and an EtherType 211c. A value indicating that the data frame is a data frame that complies with EtherCAT is set in the EtherType 211c.

[0061] The Ethernet data 212 includes a plurality of datagrams 220 for each of the plurality of slave devices 102. Thus, the number of the plurality of datagrams 220 is N, and the plurality of datagrams 220 includes the datagrams 220 1 ~Data 220 N In the following description, datagram 220 n Indicates that the slave device 102 n datagram.

[0062] Datagram 220 n Contains a datagram header 221, setting data 222, and monitoring data 223. Datagram 220 n The datagram header 221 in the slave device 102 includes n Datagram 220 n The setting data 222 in the slave device 102 is used nSetting data. Datagram 220 n The monitoring data 223 in the slave device 102 is n The monitoring data obtained from .

[0063] return Figure 4 , slave device 102 n The datagram 220 is constructed based on n The output of the slave device 102 is controlled by the setting data 222 in the plasma processing system. In the plasma processing system, the output of the slave device 102 is any one of the pressure in the chamber 10, the flow rate of the gas output by the flow controller 22, and the source high frequency power.

[0064] Each of the plurality of slave devices 102 includes a first port 102a, a second port 102b, and a communication processing unit 102c. A data frame transmitted from the upstream via a communication path 121 is received by the first port 102a and provided to the communication processing unit 102c. A data frame provided from the communication processing unit 102c to the second port 102b is transmitted to the downstream via the communication path 121. A data frame transmitted from the upstream via a communication path 122 is received by the second port 102b and provided to the communication processing unit 102c. A data frame provided from the communication processing unit 102c to the first port 102a is transmitted to the downstream via the communication path 122.

[0065] The communication processing unit 102c can be formed of a circuit such as an integrated circuit. For example, the communication processing unit 102c can be formed of an ASIC (Application Specific Integrated Circuit) or an FPGA (Field Programmable Gate Array).

[0066] Slave device 102 n The communication processing unit 102c is configured to extract the datagram 220 n The address in the datagram header 221 is the address of the slave device 102. n In the case of an address, the slave device 102 n The communication processing unit 102c receives the datagram 220 including the datagram header 221. n The slave device 102 extracts the setting data 222. n The output is controlled according to the setting data 222 extracted by the communication processing unit 102c. n The communication processing unit 102c of the slave device 102 n The monitoring data obtained in the datagram is sent as datagram 220 n The monitoring data 223 within is written.

[0067] The calculation device 103 is configured to obtain updated setting data for each of the plurality of slave devices 102 based on the monitoring data 223 of each of the plurality of slave devices 102 in the data frame received in the previous communication cycle, and to include the updated setting data for each of the plurality of slave devices 102 in the data frame sent to the plurality of slave devices 102 in the subsequent communication cycle.

[0068] Figure 6 FIG. 1 is a diagram showing a computing device according to an exemplary embodiment. Figure 6 As shown, the computing device 103 includes a first port 103a, a second port 103b, a communication processing unit 103c, a data analyzer 103d and an operator 103e.

[0069] The data frame sent from the master device 101 to the computing device 103 via the communication path 121 is received by the first port 103a. The data frame sent from the computing device 103 to the plurality of slave devices 102 via the communication path 121 is output from the second port 103b. The data frame sent from the plurality of slave devices 102 to the computing device 103 via the communication path 121 is received by the second port 103b. The data frame sent from the computing device 103 to the master device 101 via the communication path 121 is output from the first port 103a.

[0070] The data frame sent from the master device 101 to the computing device 103 via the communication path 122 is received by the first port 103a. The data frame sent from the computing device 103 to the plurality of slave devices 102 via the communication path 122 is output from the second port 103b. The data frame sent from the plurality of slave devices 102 to the computing device 103 via the communication path 122 is received by the second port 103b. The data frame sent from the computing device 103 to the master device 101 via the communication path 122 is output from the first port 103a.

[0071] The communication processing unit 103c can be formed of a circuit such as an integrated circuit. For example, the communication processing unit 103c can be formed of an ASIC (Application Specific Integrated Circuit) or an FPGA (Field Programmable Gate Array).

[0072] The communication processing unit 103c is configured to perform the first data frame 200 in the first communication cycle TC1. 1 and the second data frame 200 in the second communication cycle TC2 2The second communication cycle TC2 is a communication cycle following the first communication cycle TC1. The first data frame 200 1 and the second data frame 200 2 Each has the same structure as the data frame 200 .

[0073] The communication processing unit 103c writes the first data frame 200 into each datagram. 1 The communication processing unit 103c generates a second data frame 200 including the updated setting data 222 for each of the plurality of slave devices 102 in the corresponding datagram. 2 The communication processing unit 103c transmits the second data frame 200 to the master device 101 and the plurality of slave devices 102 in the second communication cycle TC2. 2 .

[0074] The data analyzer 103d may be formed of a circuit such as an integrated circuit. The communication processing unit 103c may be formed of, for example, an ASIC (Application Specific Integrated Circuit) or an FPGA (Field Programmable Gate Array). The data analyzer 103d extracts the first data frame 200 1 The monitoring data 223 in each datagram of the multiple datagrams 220 within is provided to the operator 103e.

[0075] The computing unit 103e is composed of a computing unit such as a CPU. The computing unit 103e obtains updated setting data 222 based on the monitoring data 223 extracted by the data analyzer 103d. The updated setting data 222 is written into the second data frame 200 in the communication processing unit 103c. 2 For example, based on the first data frame 200 1 Datagram 220 n The setting data 222 obtained by extracting the monitoring data 223 is written into the second data frame 200 2 Datagram 220 n .

[0076] Below, refer to Figure 7 to Figure 9 A communication method according to an exemplary embodiment will be described. Figure 7 is a flow chart of a communication method according to an exemplary embodiment. Figure 8 This is a diagram showing the flow of a first data frame in a communication system according to an exemplary embodiment. Fig. 9: is a diagram showing the flow of a second data frame in a communication system according to an exemplary embodiment. Figure 7 The illustrated communication method (hereinafter referred to as “method MT”) is performed in the communication system 100 .

[0077] The method MT starts with a step STa. In the step STa, the master device 101 sends a first data frame 200 to the plurality of slave devices 102. 1 .like Figure 8 As shown, the master device 101 sends the first data frame 200 to the plurality of slave devices 102 in sequence via the computing device 103 on the communication path 121. 1 .

[0078] In the next step STb, the plurality of slave devices 102 perform the first data frame 200 1 The monitoring data 223 is sequentially written into the corresponding datagram in the slave device 102. n In the slave device 102 n The monitoring data 223 obtained in the first data frame 200 is written 1 Datagram 220 n In. Figure 8 As shown, the slave device 102 n The first data frame 200 is sent downstream via the communication path 121 1 In addition, in step STb, the plurality of slave devices 102 may respectively receive the first data frame 200 1 The output is controlled by the setting data 222 in the corresponding datagram in the slave device 102. n According to the first data frame 200 1 Datagram 220 n The setting data 222 in is used to control its output.

[0079] In the next step STc, if Figure 8 As shown, the first data frame 200 1 The data is returned to the host device 101 via the calculation device 103. In the first communication cycle TC1, the first data frame 200 of the steps STa to STc is performed. 1 of sending.

[0080] In the next step STd, the computing device 103 calculates the first data frame 200 based on the first data frame 200. 1 The updated setting data 222 is obtained by using the monitoring data 223 in each of the plurality of datagrams in the datagram. For example, the computing device 103 obtains the updated setting data 222 based on the datagram 220 n The monitoring data 223 in the slave device 102 is used to obtain n The updated setting data 222 is used.

[0081] In the next step STe, the computing device 103 performs the following operations on the second data frame 200. 2 In each of the plurality of datagrams in the second data frame 200, the computing device 103 writes the updated setting data 222 for the corresponding slave device. 2 Datagram 220 n The corresponding slave device 102 is written into n The updated setting data 222 is used. The second data frame 200 is generated by this step STe. 2 .

[0082] In the next step STf, if Fig. 9 As shown, the computing device 103 sends a second data frame 200 to the plurality of slave devices 102. 2 In the second communication cycle TC2, the second data frame 200 2 The second data frame 200 is sequentially sent to the plurality of slave devices 102 via the communication path 121. In step STf, the computing device 103 sends the second data frame 200 to the plurality of slave devices 102. 2 After step STf, the plurality of slave devices 102 respectively receive the second data frame 200. 2 The output is controlled by the setting data 222 in the corresponding datagram in the slave device 102. n According to the second data frame 200 2 Datagram 220 n The setting data 222 in is used to control its output.

[0083] According to the communication system 100 described above, the setting data 222 is updated not in the host device 101 but in the calculation device 103. Therefore, the calculation load of the host device 101 is reduced.

[0084] In addition, according to the communication system 100, the collection of monitoring data from the plurality of slave devices 102 and the provision of updated setting data to the plurality of slave devices 102 are completed only through the first and second communication cycles, that is, two communication cycles. Therefore, the communication system 100 can collect monitoring data from the plurality of slave devices 102 and provide updated setting data to the plurality of slave devices 102 in a short time. In addition, in the communication system 100, the data frame transmitted in the first and second communication cycles is only the first data frame 200. 1 and the second data frame 200 2 Therefore, the communication system 100 can perform communication including the collection of monitoring data from the plurality of slave devices 102 and the provision of updated setting data to the plurality of slave devices 102 with a small amount of data.

[0085] Below, refer to Fig.10 A communication system according to another exemplary embodiment will be described. Fig.10 FIG. 1 is a diagram showing a communication system according to another exemplary embodiment. Fig.10 Hereinafter, the communication system 100A will be described based on the differences between the communication system 100 and the communication system 100A.

[0086] The communication system 100A includes a computing device 103A instead of the computing device 103 . Fig.11 FIG. 2 is a diagram showing a computing device according to another exemplary embodiment. Fig.11 As shown, the computing device 103A includes a first port 103a, a second port 103b, a communication processing unit 103c, and an operator 103e.

[0087] The data frame sent from the master device 101 to the computing device 103A via the communication path 121 is received by the first port 103a. The data frame sent from the computing device 103A to the plurality of slave devices 102 via the communication path 121 is output from the second port 103b. The data frame output from the second port 103b to the communication path 121 is returned to the second port 101b of the master device 101 via the plurality of slave devices 102.

[0088] The data frames sent from the master device 101 to the slave devices 102 via the communication path 122 are received by the second port 103b of the computing device 103A after passing through the slave devices 102. The data frames sent from the computing device 103A to the master device 101 via the communication path 122 are output from the first port 103a.

[0089] The communication processing unit 103 c of the calculation device 103A is configured to receive the second data frame 202 in the second communication cycle TC2 and to transmit the third data frame 203 in the third communication cycle TC3 .

[0090] The communication processing unit 103c of the computing device 103A outputs the second data frame 202 to the computing unit 103e. The communication processing unit 103c of the computing device 103A generates a third data frame 203 including updated setting data 222 for each of the plurality of slave devices 102, and transmits it to the master device 101 in the third communication cycle TC3.

[0091] The calculation unit 103e of the calculation device 103A obtains the updated setting data 222 based on the monitoring data 223 of each of the plurality of slave devices 102 in the second data frame 202. The updated setting data 222 is written into the third data frame 203 in the communication processing unit 103c.

[0092] Below, refer to Figures 12 to 18 A communication method according to another exemplary embodiment will be described. Fig.12 is a flow chart of a communication method according to another exemplary embodiment. Fig.13 This is a diagram showing the flow of a first data frame in a communication system according to another exemplary embodiment. Fig.14 is a diagram showing a second data frame used in a communication system according to another exemplary embodiment. Fig.15 This is a diagram showing the flow of a second data frame in a communication system according to another exemplary embodiment. Fig.16 is a diagram showing a third data frame used in a communication system according to another exemplary embodiment. Fig.17 It is a diagram showing the flow of a third data frame in a communication system according to another exemplary embodiment. Fig.18 It is a diagram showing the flow of a fourth data frame in a communication system according to another exemplary embodiment. Fig.12 The communication method shown (hereinafter referred to as "method MTA") is performed in the communication system 100A.

[0093] The method MTA starts with a step STAa. In the step STAa, the master device 101 sends a first data frame 201 to the plurality of slave devices 102. The first data frame 201 is the same as the first frame 200 sent in the communication system 100. 1 The same data frame. Fig.13 As shown, the master device 101 sends a first data frame 201 to the plurality of slave devices 102 in sequence via the computing device 103A on the communication path 121 .

[0094] In the next step STAb, the plurality of slave devices 102 sequentially write the monitoring data 223 into the corresponding datagrams in the first data frame 201. That is, the slave devices 102 n In the slave device 102 n The monitoring data 223 obtained in the first data frame 201 is written into the datagram 220 n In. Fig.13 As shown, the slave device 102 nThe first data frame 201 is transmitted downstream via the communication path 121. In addition, in step STAb, the plurality of slave devices 102 can control their outputs according to the setting data 222 in the corresponding datagram in the first data frame 201, respectively.

[0095] In the next step STAc, Fig.13 As shown in FIG. 1 , the first data frame 201 is returned to the master device 101. In the first communication cycle TC1, the first data frame 201 of the process STAa to the process STAc is performed. 1 of sending.

[0096] In the next step STAd, the master device 101 generates a second data frame 202 based on the monitoring data 223 in each of the plurality of datagrams 220 in the first data frame 201 .

[0097] The second data frame 202 is a data frame that complies with EtherCAT. Fig.14 As shown, the second data frame 202 includes an Ethernet header 211 , Ethernet data 212B and a frame check sequence 213 .

[0098] The Ethernet data 212B includes a datagram 220B. The datagram 220B includes a datagram header 221B and monitoring data 222B. 1 , monitoring data 223B 1 , ..., monitoring data 222B N 、Monitoring data 223B N The datagram header 221B contains the address of the computing device 103A. Monitoring data 223B n is in the slave device 102 n The monitoring data in the second data frame 202 is obtained.

[0099] In the next step STAe, if Fig.15 As shown, the host device 101 sends a second data frame 202 to the computing device 103A. The second data frame 202 is sent via the communication path 121 in the second communication cycle TC2.

[0100] In the next step STAf, the calculation device 103A obtains the updated setting data 222 based on the monitoring data in the second data frame 202. For example, the calculation device 103A obtains the updated setting data 222 based on the monitoring data 223B. n To find the slave device 102 n Updated setting data 222 n .

[0101] In the next step STAg, the computing device 103A generates a third data frame 203 including updated setting data 222 for each of the plurality of slave devices 102 .

[0102] The third data frame 203 is a data frame that complies with EtherCAT. Fig.16 As shown, the third data frame 203 includes an Ethernet header 211 , Ethernet data 212C and a frame check sequence 213 .

[0103] The Ethernet data 212C includes a datagram 220C. The datagram 220C includes a datagram header 221C and setting data 222C. 1 , ..., setting data 222C N The datagram header 221C includes the address of the host device 101. Setting data 222C n For slave device 102 n And the updated setting data.

[0104] In the next step STAh, if Fig.17 As shown, the computing device 103A sends the third data frame 203 to the host device 101. The third data frame 203 is sent via the communication path 121 in the third communication cycle TC3.

[0105] In the next step STAi, the host device 101 generates a fourth data frame 204, and the setting data 222C in the third data frame 203 1 , ..., setting data 222C N The fourth data frame 204 is respectively included in a plurality of datagrams of the fourth data frame 204. The fourth data frame 204 is 2 Same data frame.

[0106] In the next step STAj, if Fig.18 As shown, the master device 101 sends a fourth data frame 204 to the plurality of slave devices 102. In the fourth communication cycle TC4, the fourth data frame 204 is sequentially sent to the plurality of slave devices 102 via the communication path 121. After the step STAj, the plurality of slave devices 102 control their outputs according to the setting data 222 in the corresponding datagram in the fourth data frame 204.

[0107] According to the communication system 100A described above, the setting data 222 is updated not in the host device 101 but in the calculation device 103A. Therefore, the calculation load of the host device 101 is reduced.

[0108] Furthermore, in the communication system 100A, the collection of monitoring data from the plurality of slave devices 102 and the provision of updated setting data to the plurality of slave devices 102 are completed through the first to fourth communication cycles, that is, four communication cycles. Therefore, the communication system 100 can complete the collection of monitoring data from the plurality of slave devices 102 and the provision of updated setting data to the plurality of slave devices 102 in fewer cycles than the communication system 100A. Therefore, the communication system 100 can complete the collection of monitoring data from the plurality of slave devices 102 and the provision of updated setting data to the plurality of slave devices 102 in a shorter time than the communication system 100A. Furthermore, in the communication system 100A, the first to fourth data frames are sent through the first to fourth communication cycles, respectively. On the other hand, the data frame sent in the communication system 100A is only the first data frame 200. 1 and the second data frame 200 2 Therefore, the communication system 100 can perform communication including the collection of monitoring data from the plurality of slave devices 102 and the provision of updated setting data to the plurality of slave devices 102 with a smaller amount of data than the communication system 100A.

[0109] Below, refer to Fig.19 and Fig. 20 . Fig.19 It is a diagram showing another process of the first data frame in the communication system involved in an exemplary embodiment. Fig. 20 FIG. 1 is a diagram showing another process of the second data frame in the communication system according to an exemplary embodiment. When there is no disconnection between two slave devices among the plurality of slave devices 102, the communication system 100 may send the first data frame 200 via the communication path 121. 1 and the second data frame 200 2 .

[0110] On the other hand, Fig.19 and Fig. 20 As shown, when a disconnection occurs between two slave devices among the plurality of slave devices 102, the communication system 100 may send the first data frame 200 via both the communication path 121 and the communication path 122. 1 and the second data frame 200 2 .

[0111] like Fig.19 As shown, the master device 101 sends a first data frame 200 from the first port 101a via the communication path 121 to all slave devices maintaining communication with the first port 101a. 1 . The first data frame 200 1The communication path 122 is returned from the most downstream slave device among all slave devices maintaining communication with the first port 101 a to the computing device 103 and the first port 101 a of the master device 101 .

[0112] In addition, if Fig.19 As shown, the master device 101 sends the first data frame 200 from the second port 101b via the communication path 122 to all slave devices maintaining communication with the second port 101b. 1 . The first data frame 200 1 The communication path 121 returns from the most downstream slave device among all slave devices maintaining communication with the second port 101 b to the computing device 103 and the second port 101 b of the master device 101 .

[0113] In addition, if Fig. 20 As shown, the computing device 103 sends the second data frame 200 from the second port 103b via the communication path 121 to all slave devices maintaining communication with the second port 103b. 2 In addition, if Fig. 20 As shown, the computing device 103 sends the second data frame 200 from the second port 103b via the communication path 122 to all slave devices maintaining communication with the second port 103b. 2 .

[0114] exist Fig.19 and Fig. 20 In the illustrated example, even if a disconnection occurs between two slave devices, the communication system 100 can collect monitoring data from a plurality of slave devices 102 and provide updated setting data to the plurality of slave devices 102 .

[0115] Below, refer to Fig.21 and Fig. 22 . Fig.21 It is a diagram of other processes of the first data frame in the communication system involved in another exemplary embodiment. Fig. 22 The communication system 100A is a diagram showing another flow of the fourth data frame in the communication system according to another exemplary embodiment. The communication system 100A can transmit the first data frame 201 and the fourth data frame 204 via the communication path 121 when there is no disconnection between two slave devices among the plurality of slave devices 102 .

[0116] On the other hand, Fig.21 and Fig. 22 As shown, when a line is disconnected between two slave devices among the plurality of slave devices 102 , the communication system 100A can transmit the first data frame 201 and the fourth data frame 204 via both the communication path 121 and the communication path 122 .

[0117] like Fig.21 As shown, the master device 101 sends a first data frame 201 from the first port 101a to all slave devices maintaining communication with the first port 101a via the communication path 121. The first data frame 201 is returned to the first port 101a of the master device 101 via the communication path 122 from the most downstream slave device among all slave devices maintaining communication with the first port 101a.

[0118] In addition, if Fig.21 As shown, the master device 101 sends the first data frame 201 from the second port 101b to all slave devices maintaining communication with the second port 101b via the communication path 122. The first data frame 201 is returned to the second port 101b of the master device 101 via the communication path 121 from the most downstream slave device among all slave devices maintaining communication with the second port 101b.

[0119] In addition, if Fig. 22 As shown, the master device 101 sends the fourth data frame 204 from the first port 101a via the communication path 121 to all slave devices maintaining communication with the first port 101a. In addition, the master device 101 sends the fourth data frame 204 from the second port 103b via the communication path 122 to all slave devices maintaining communication with the second port 101b.

[0120] exist Fig.21 and Fig. 22 In the illustrated example, even if a disconnection occurs between two slave devices, the communication system 100A can collect monitoring data from a plurality of slave devices 102 and provide updated setting data to the plurality of slave devices 102 .

[0121] Various exemplary embodiments have been described above, but the present invention is not limited to the exemplary embodiments described above, and various additions, omissions, substitutions, and changes may be made. In addition, elements in different embodiments may be combined to form other embodiments.

[0122] For example, each communication system of the communication systems 100 and 100A may be a substrate processing system other than the plasma processing system as long as the above-mentioned data frame and communication method are used. In addition, each communication system of the communication systems 100 and 100A may be an industrial system other than the substrate processing system as long as the above-mentioned data frame and communication method are used.

[0123] In addition, the computing device in the various embodiments described above may also have a communication function as a slave device (secondary device or slave device) that complies with EtherCAT. In this case, the multiple datagrams in the above-mentioned data frame communicated between the master device and the computing device include a datagram for the computing device. The datagram for the computing device includes a datagram header, monitoring data, and setting data, wherein the datagram header includes the address of the computing device. The setting data in the datagram for the computing device may also include data related to the condition setting for the calculation of the computing device. The monitoring data in the datagram for the computing device may also include data related to the status of the computing device. In addition, the computing device in the various embodiments described above may not have a communication function as such a slave device. That is, the multiple datagrams in the above-mentioned data frame may not include a datagram for the computing device.

[0124] Here, various exemplary embodiments included in the present disclosure are described in the following [E1] to [E17].

[0125] [E1]

[0126] A communication system comprising:

[0127] Main device;

[0128] a plurality of slave devices connected to the master device in a communicable manner; and

[0129] a computing device connected to the master device and the plurality of slave devices in a communicable manner,

[0130] The data frame sent to the plurality of slave devices includes a plurality of datagrams for each of the plurality of slave devices, each of the plurality of datagrams includes setting data for a corresponding slave device among the plurality of slave devices and monitoring data written in the corresponding slave device.

[0131] The calculation device is configured to obtain updated setting data for each of the multiple datagrams in the data frame sent to the multiple slave devices in a subsequent communication cycle based on the monitoring data of each of the multiple slave devices in the data frame received in a previous communication cycle.

[0132] [E2]

[0133] In the communication system described in E1, the computing device is configured as follows:

[0134] generating a second data frame based on the monitoring data in each of the plurality of datagrams of the first data frame received in the first communication cycle, the second data frame including the plurality of datagrams each including the updated setting data,

[0135] In a second communication cycle subsequent to the first communication cycle, the second data frame is sent to the plurality of slave devices and the master device.

[0136] [E3]

[0137] In the communication system described in E2, comprising:

[0138] a primary communication path from the first port of the master device via the computing device and the plurality of slave devices back to the second port of the master device; and

[0139] an alternate communication path from the second port via the computing device and the plurality of slave devices back to the first port,

[0140] The communication system consists of:

[0141] sending the first data frame and the second data frame via the main communication path when there is no disconnection between two slave devices among the plurality of slave devices,

[0142] When a line is disconnected between two slave devices among the plurality of slave devices, the first data frame and the second data frame are transmitted via both the main communication path and the backup communication path.

[0143] [E4]

[0144] In the communication system described in E2 or E3,

[0145] The computing device comprises:

[0146] a communication processing unit configured to receive the first data frame and transmit the second data frame;

[0147] a datagram analyzer configured to obtain the monitoring data in each of the plurality of datagrams in the first data frame; and

[0148] A computing unit is configured to obtain the updated setting data based on the monitoring data acquired by the datagram analyzer.

[0149] [E5]

[0150] In the communication system described in E1,

[0151] The master device is configured to: in a first communication cycle, send a first data frame, and receive the first data frame containing the monitoring data written by the corresponding slave device in each of the plurality of datagrams,

[0152] The master device is configured to generate a second data frame containing the monitoring data in each of the plurality of datagrams of the first data frame, and send the second data frame to the computing device in a second communication cycle,

[0153] The computing device is configured to generate a third data frame based on the second data frame and send the third data frame to the master device in a third communication cycle, wherein the third data frame includes the updated setting data for each of the plurality of slave devices.

[0154] The master device is configured to generate a fourth data frame and send the fourth data frame to the multiple slave devices in a fourth communication cycle, and the updated setting data for each of the multiple slave devices in the third data frame is included in a corresponding datagram among the multiple datagrams of the fourth data frame.

[0155] [E6]

[0156] In the communication system described in E5, comprising:

[0157] a primary communication path from the first port of the master device via the computing device and the plurality of slave devices back to the second port of the master device; and

[0158] an alternate communication path from the second port via the computing device and the plurality of slave devices back to the first port,

[0159] The communication system consists of:

[0160] sending the first data frame, the second data frame, the third data frame, and the fourth data frame via the main communication path when there is no disconnection between two slave devices among the plurality of slave devices,

[0161] When a line break occurs between two of the plurality of slave devices, if no line break occurs in the main communication path, the first data frame, the second data frame, the third data frame, and the fourth data frame are sent via both the main communication path and the backup communication path.

[0162] [E7]

[0163] In the communication system described in E5 or E6, the computing device includes:

[0164] a communication processing unit configured to receive the second data frame and transmit the third data frame; and

[0165] The computing unit is configured to obtain the updated setting data for each of the plurality of slave devices based on the second data frame.

[0166] [E8]

[0167] The communication system described in any one of E1 to E7 is a substrate processing system, and the substrate processing system comprises:

[0168] a processing chamber; and

[0169] The substrate support portion is configured to support the substrate in the chamber.

[0170] [E9]

[0171] In the communication system described in E8, the plurality of slave devices include:

[0172] a pressure controller configured to control the pressure in the chamber according to the setting data; and

[0173] The pressure sensor is configured to obtain a measured value of the pressure in the chamber as the monitoring data.

[0174] [E10]

[0175] In the communication system described in E8 or E9,

[0176] The plurality of slave devices include a flow controller configured to control a flow rate of a gas supplied into the chamber according to the setting data and to obtain a measured value of the flow rate of the gas as the monitoring data.

[0177] [E11]

[0178] In the communication system described in any one of E8 to E10,

[0179] The communication system is a plasma processing system,

[0180] The plurality of slave devices include an RF generation unit configured to set high-frequency power for generating plasma from a gas in the chamber according to the setting data, and to acquire a state value of the high-frequency power as the monitoring data.

[0181] [E12]

[0182] In the communication system described in any one of E1 to E11,

[0183] The datagram complies with EtherCAT (registered trademark).

[0184] [E13]

[0185] A computing device is a computing device used in a communication system,

[0186] The computing device is connected to the master device and the plurality of slave devices in a communicable manner.

[0187] The computing device comprises: a communication processing unit configured to receive a first data frame in a first communication cycle and to transmit a second data frame in a second communication cycle subsequent to the first communication cycle, wherein the first data frame and the second data frame respectively include a plurality of datagrams for each of the plurality of slave devices, and each of the plurality of datagrams includes setting data for a corresponding slave device among the plurality of slave devices and monitoring data written in the corresponding slave device;

[0188] a datagram analyzer configured to obtain the monitoring data in each of the plurality of datagrams of the first data frame; and

[0189] The computing unit is configured to obtain updated setting data for each of the plurality of datagrams in the second data frame to be transmitted to the plurality of slave devices based on the monitoring data acquired from the first data frame by the datagram analyzer.

[0190] [E14]

[0191] A computing device is a computing device used in a communication system,

[0192] The computing device is connected to the master device and the plurality of slave devices in a communicable manner.

[0193] The computing device has:

[0194] a communication processing unit configured to receive and transmit data frames; and

[0195] An operator is configured to determine updated setting data in each of a plurality of datagrams for each of the plurality of slave devices in a data frame sent to the plurality of slave devices in a subsequent communication cycle based on monitoring data of each of the plurality of slave devices in a data frame sent from the master device in a preceding communication cycle.

[0196] [E15]

[0197] A communication method, comprising the following steps:

[0198] Step (a), in each of the plurality of slave devices, writing the monitoring data in a corresponding datagram of a plurality of datagrams of a data frame, wherein the data frame includes the plurality of datagrams for each of the plurality of slave devices, and each of the plurality of datagrams includes setting data for the corresponding slave device of the plurality of slave devices and the monitoring data; and

[0199] Step (b), in a computing device connected to the master device and the plurality of slave devices in a manner capable of communicating, obtains updated setting data for each of the plurality of datagrams in the data frame to be sent to the plurality of slave devices based on the monitoring data in each of the plurality of datagrams in the data frame obtained in step (a).

[0200] [E16]

[0201] In the communication method described in E15,

[0202] The data frame obtained in the step (a) is the first data frame sent in the first communication cycle,

[0203] The communication method includes the following steps:

[0204] Step (c), generating a second data frame in the computing device, the second data frame being a data frame including the plurality of datagrams each including the updated setting data; and

[0205] Step (d), sending the second data frame from the computing device to the plurality of slave devices.

[0206] [E17]

[0207] In the communication method described in E15,

[0208] The data frame obtained in the step (a) is the first data frame sent in the first communication cycle,

[0209] The communication method includes the following steps:

[0210] Step (c), receiving, in the master device, the first data frame in which the monitoring data is written in each of the plurality of datagrams;

[0211] Step (d), generating a second data frame in the master device, wherein the second data frame includes the monitoring data in each of the plurality of datagrams in the first data frame;

[0212] Step (e), in a second communication cycle, sending the second data frame from the host device to the computing device;

[0213] Step (f), generating, in the computing device, a third data frame including the updated setting data for each of the plurality of slave devices;

[0214] Step (g), in a third communication cycle, sending the third data frame from the computing device to the host device;

[0215] Step (h), generating a fourth data frame in the master device, wherein the updated setting data for each of the plurality of slave devices in the third data frame is included in a corresponding datagram among the plurality of datagrams in the fourth data frame; and

[0216] Step (i), in a fourth communication cycle, transmitting the fourth data frame from the master device to the plurality of slave devices.

[0217] It should be understood from the above description that the various embodiments of the present disclosure are described in this specification for the purpose of explanation, and various changes can be made without departing from the scope and spirit of the present disclosure. Therefore, the various embodiments disclosed in this specification are not intended to be limiting, and the true scope and spirit are shown by the attached claims.

[0218] Description of Reference Numerals

[0219] 100: communication system; 101: master device; 102: slave device; 103: computing device; 1: plasma processing device.

Claims

1. A communication system comprising: Main device; a plurality of slave devices, the plurality of slave devices being connected to the master device in a communicable manner; as well as a computing device connected to the master device and the plurality of slave devices in a communicable manner, The data frame sent to the plurality of slave devices includes a plurality of datagrams for each of the plurality of slave devices, each of the plurality of datagrams includes setting data for a corresponding slave device among the plurality of slave devices and monitoring data written in the corresponding slave device. The calculation device is configured to obtain updated setting data for each of the multiple datagrams in the data frame sent to the multiple slave devices in a subsequent communication cycle based on the monitoring data of each of the multiple slave devices in the data frame received in a previous communication cycle.

2. The communication system according to claim 1, wherein: The computing device is composed of: generating a second data frame based on the monitoring data in each of the plurality of datagrams of the first data frame received in the first communication cycle, the second data frame including the plurality of datagrams each including the updated setting data, In a second communication cycle subsequent to the first communication cycle, the second data frame is sent to the plurality of slave devices and the master device.

3. The communication system according to claim 2, wherein: The communication system further comprises: a primary communication path from the first port of the master device via the computing device and the plurality of slave devices back to the second port of the master device; and an alternate communication path from the second port via the computing device and the plurality of slave devices back to the first port, The communication system consists of: sending the first data frame and the second data frame via the main communication path when there is no disconnection between two slave devices among the plurality of slave devices, When a line is disconnected between two slave devices among the plurality of slave devices, the first data frame and the second data frame are transmitted via both the main communication path and the backup communication path.

4. The communication system according to claim 2, wherein: The computing device comprises: a communication processing unit configured to receive the first data frame and transmit the second data frame; a datagram analyzer configured to obtain the monitoring data in each of the plurality of datagrams in the first data frame; and A computing unit is configured to obtain the updated setting data based on the monitoring data acquired by the datagram analyzer.

5. The communication system according to claim 1, wherein: The master device is configured to: in a first communication cycle, send a first data frame, and receive the first data frame containing the monitoring data written by the corresponding slave device in each of the plurality of datagrams, The master device is configured to generate a second data frame containing the monitoring data in each of the plurality of datagrams of the first data frame, and send the second data frame to the computing device in a second communication cycle, The computing device is configured to generate a third data frame based on the second data frame and send the third data frame to the master device in a third communication cycle, wherein the third data frame includes the updated setting data for each of the plurality of slave devices. The master device is configured to generate a fourth data frame and send the fourth data frame to the multiple slave devices in a fourth communication cycle, and the updated setting data for each of the multiple slave devices in the third data frame is included in a corresponding datagram among the multiple datagrams of the fourth data frame.

6. The communication system according to claim 5, wherein: The communication system further comprises: a primary communication path from the first port of the master device via the computing device and the plurality of slave devices back to the second port of the master device; and an alternate communication path from the second port via the computing device and the plurality of slave devices back to the first port, The communication system consists of: sending the first data frame, the second data frame, the third data frame, and the fourth data frame via the main communication path when there is no disconnection between two slave devices among the plurality of slave devices, When a line break occurs between two of the plurality of slave devices, if no line break occurs in the main communication path, the first data frame, the second data frame, the third data frame, and the fourth data frame are sent via both the main communication path and the backup communication path.

7. The communication system according to claim 5, wherein: The computing device comprises: a communication processing unit configured to receive the second data frame and transmit the third data frame; and The computing unit is configured to obtain the updated setting data for each of the plurality of slave devices based on the second data frame.

8. The communication system according to any one of claims 1 to 7, wherein: The communication system is a substrate processing system, and the substrate processing system comprises: a processing chamber; and The substrate support portion is configured to support the substrate in the chamber.

9. The communication system according to claim 8, wherein: The plurality of slave devices include: a pressure controller configured to control the pressure in the chamber according to the setting data; and The pressure sensor is configured to obtain a measured value of the pressure in the chamber as the monitoring data.

10. The communication system according to claim 8, wherein: The plurality of slave devices include a flow controller configured to control a flow rate of a gas supplied into the chamber according to the setting data and to obtain a measured value of the flow rate of the gas as the monitoring data.

11. The communication system according to claim 8, wherein: The communication system is a plasma processing system, The plurality of slave devices include a radio frequency generation unit configured to set a high frequency power for generating plasma from a gas in the chamber according to the setting data, and to acquire a state value of the high frequency power as the monitoring data.

12. The communication system according to any one of claims 1 to 7, wherein: The datagram complies with EtherCAT (registered trademark).

13. A computing device, which is a computing device used in a communication system, The computing device is connected to the master device and the plurality of slave devices in a communicable manner. The computing device has: A communication processing unit is configured to receive a first data frame in a first communication cycle and transmit a second data frame in a second communication cycle following the first communication cycle, wherein: The first data frame and the second data frame respectively include a plurality of datagrams for each of the plurality of slave devices, each of the plurality of datagrams including setting data for a corresponding slave device among the plurality of slave devices and monitoring data written in the corresponding slave device; a datagram analyzer configured to obtain the monitoring data in each of the plurality of datagrams of the first data frame; as well as The computing unit is configured to obtain updated setting data for each of the plurality of datagrams in the second data frame to be transmitted to the plurality of slave devices based on the monitoring data acquired from the first data frame by the datagram analyzer.

14. A computing device, which is a computing device used in a communication system. The computing device is connected to the master device and the plurality of slave devices in a communicable manner. The computing device has: a communication processing unit configured to receive and transmit data frames; and An operator is configured to determine updated setting data in each of a plurality of datagrams for each of the plurality of slave devices in a data frame sent to the plurality of slave devices in a subsequent communication cycle based on monitoring data of each of the plurality of slave devices in a data frame sent from the master device in a preceding communication cycle.

15. A communication method, comprising the following steps: Step (a), in each of the plurality of slave devices, writing monitoring data into a corresponding datagram in a plurality of datagrams of a data frame, wherein: The data frame includes the plurality of datagrams for each of the plurality of slave devices, each of the plurality of datagrams including setting data for a corresponding slave device among the plurality of slave devices and the monitoring data; as well as Step (b), in a computing device connected to the master device and the plurality of slave devices in a manner capable of communicating, obtains updated setting data for each of the plurality of datagrams in the data frame to be sent to the plurality of slave devices based on the monitoring data in each of the plurality of datagrams in the data frame obtained in step (a).

16. The communication method according to claim 15, wherein: The data frame obtained in the step (a) is the first data frame sent in the first communication cycle, The communication method includes the following steps: Step (c), generating a second data frame in the computing device, the second data frame being a data frame including the plurality of datagrams each including the updated setting data; as well as Step (d), sending the second data frame from the computing device to the plurality of slave devices.

17. The communication method according to claim 15, wherein: The data frame obtained in the step (a) is the first data frame sent in the first communication cycle, The communication method includes the following steps: Step (c), receiving, in the master device, the first data frame in which the monitoring data is written in each of the plurality of datagrams; Step (d), generating a second data frame in the master device, wherein the second data frame includes the monitoring data in each of the plurality of datagrams in the first data frame; Step (e), in a second communication cycle, sending the second data frame from the host device to the computing device; Step (f), generating, in the computing device, a third data frame including the updated setting data for each of the plurality of slave devices; Step (g), in a third communication cycle, sending the third data frame from the computing device to the host device; Step (h), generating a fourth data frame in the master device, wherein the updated setting data for each of the plurality of slave devices in the third data frame is included in a corresponding datagram among the plurality of datagrams in the fourth data frame; as well as Step (i), in a fourth communication cycle, transmitting the fourth data frame from the master device to the plurality of slave devices.

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