Cold shield cleaning system and control method

Abstract

The invention discloses a cold shield cleaning system and a control method.The cold shield cleaning system comprises a cold shield body and a cleaning device body arranged on the outer side of the cold shield body, a mounting flange is arranged on the upper side of the cold shield body, and a flange with the diameter equal to that of the mounting flange is arranged on the upper side of the cleaning device body; a mounting opening is formed in the inner side of the middle of the mounting flange, a device tail gas exhaust opening is formed in the upper portion of the cleaning device body, and irreversible body injury is caused by the fact that an engineer directly makes contact with hypertoxic impurities such as arsenic and beryllium due to traditional manual scraping and grinding of a cold screen and is prone to inhaling or adhering dust due to improper protection. According to the integrated cleaning equipment, an automatic cleaning mode is adopted, and direct contact between personnel and dangerous impurities is greatly reduced. Operators do not need to enter the cavity for manual scraping, and only need to operate and control outside the equipment, so that the poisoning risk caused by improper protection is effectively avoided, and the body health and life safety of engineers are guaranteed.

Description

Technical Field

[0001] The present invention belongs to the technical field related to cold screen cleaning, and particularly relates to a cold screen cleaning system and a control method. Background Art

[0002] Molecular beam epitaxy (MBE) technology can produce new semiconductor materials and devices, but the cold shield during the growth process can adsorb hazardous materials such as arsenic, phosphorus, and beryllium. Molecular beam epitaxy (MBE) technology plays a vital role in the preparation of semiconductor materials and devices. It has unique advantages and can accurately produce new semiconductor materials and devices. However, during the growth process, it is important to note that the cold shield can adsorb hazardous materials such as arsenic, phosphorus, and beryllium. If these hazardous materials are not properly handled during the growth process, they may pose potential risks to the environment and the health of operators.

[0003] Traditional cleaning of cold screens requires workers wearing gas masks to manually scrape and polish the cavity. This process is extremely dangerous. Handling phosphorus-containing impurities can easily cause sparks, potentially starting a fire. Furthermore, impurities like arsenic and beryllium are highly toxic, and engineers without proper protection can easily inhale or absorb dust, causing irreversible damage. Furthermore, the scraping and polishing process requires extreme care when handling weld interfaces. Any inattention can lead to weld leaks, resulting in significant losses during equipment recovery. Summary of the Invention

[0004] The purpose of the present invention is to provide a cold screen cleaning system and control method to solve the problem of traditional cold screen cleaning in the above-mentioned background technology, which requires personnel to wear gas masks and manually scrape the cavity. The whole process is extremely dangerous. In the process of handling phosphorus-containing impurities, sparks are very likely to be generated, which in turn causes fires. At the same time, impurities such as arsenic and beryllium are highly toxic. Engineers who do not protect themselves properly are prone to inhaling or adhering to dust, causing irreversible damage to the body. In addition, during the scraping process, when handling the weld interface, extreme care is required. A slight mistake may cause the weld surface to leak, which in turn causes significant losses to equipment recovery.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] Option 1.

[0007] A cold screen cleaning system comprises a cold screen main body and a cleaning device main body arranged outside the cold screen main body;

[0008] A mounting flange is provided on the upper side of the cold shield body, and a flange with the same diameter as the mounting flange is provided on the upper side of the cleaning device body;

[0009] A mounting opening is provided on the inner middle side of the mounting flange;

[0010] An exhaust port for device tail gas is provided at the upper part of the main body of the cleaning device, and the exhaust port for device tail gas is communicated with the inside of the main body of the cleaning device;

[0011] An installation disk is provided inside the installation port, and a water inlet for the cleaning device is provided inside the middle of the installation disk;

[0012] A device sewage discharge port is provided on the lower side of the main body of the cleaning device protruding outward;

[0013] A plurality of two-fluid atomizing nozzles are provided on the outer side of the main body of the cleaning device, and a nitrogen pipeline is connected to the two-fluid atomizing nozzles;

[0014] An aeration disk is provided on the upper side of the bottom of the main body of the cleaning device.

[0015] Further, a plurality of water outlet nozzles are connected and communicated to the outside of the lower side of the water inlet for the cleaning device. The water inlet for the cleaning device is combined through the installation disk and the installation port and is fixedly connected by external bolts.

[0016] Further, the two-fluid atomizing nozzles are inserted into the inside of the main body of the cleaning device, and a sealing ring is provided at the connection between the plurality of two-fluid atomizing nozzles and the inside of the main body of the cleaning device for sealing treatment.

[0017] Further, a water pump is externally connected to the two-fluid atomizing nozzles to add ultrapure water fluid, and the fluid is sprayed into the inside of the main body of the cleaning device. A gas pump is externally connected to the nitrogen pipeline to add high-purity nitrogen, and acceleration is provided by the external gas pump and the fluid inside the two-fluid atomizing nozzles is mixed.

[0018] Further, a plurality of air injection ports are provided on the outer side of the upper side of the aeration disk, and a control pump is connected to the outside of the aeration disk to add high-purity nitrogen.

[0019] Further, the cold screen main body is combined with the upper flange of the main body of the cleaning device through an installation flange and is fixedly connected by a plurality of external bolts. A plurality of supporting feet for support are provided on the lower side of the main body of the cleaning device.

[0020] Further, an external control pump is connected to the air inlet;

[0021] A control module is provided outside the main body of the cleaning device to control the operation and parameter adjustment of each component, including: controlling the injection of solution or gas by the external control pump, controlling the switch of the water pump connected to the two-fluid atomizing nozzles and the gas pump on the nitrogen pipeline, controlling the switch of the pump connected to the outside of the aeration disk, controlling the pipeline valve switch of the sewage discharge port, and controlling the switch of the fan and valve of the exhaust port for device tail gas.

[0022] Solution two.

[0023] A control method for a cold screen cleaning system, using the system of Solution 1 above, includes the following steps:

[0024] S1. Open the valve at the exhaust port of the device, turn on the water pump connected to the two-fluid atomizing nozzle to inject Standard Cleaning Liquid No. 1, turn on the air pump on the nitrogen pipeline to introduce high-purity nitrogen, and mix and accelerate through the two-fluid atomizing nozzle to spray out in the form of atomized droplets;

[0025] S2. Set a predetermined time to stop spraying in the form of atomized droplets, and turn on the fan at the exhaust port of the device;

[0026] S3. Turn on the external control pump to inject Standard Cleaning Liquid No. 1 to the set threshold;

[0027] S4. Turn on the pump connected to the outside of the aeration disk and introduce high-purity nitrogen at the set threshold;

[0028] S5. Open the pipeline valve at the sewage outlet for a set time;

[0029] S6. Turn on the external control pump connected to the air inlet to inject ultrapure water, turn on the water pump connected to the two-fluid atomizing nozzle to inject ultrapure water, turn on the air pump on the nitrogen pipeline to introduce high-purity nitrogen, and turn on the pump connected to the outside of the aeration disk to introduce high-purity nitrogen;

[0030] S7. Set a predetermined time to turn off all the pumps in Step S6, and open the sewage outlet to drain the wastewater.

[0031] Further, the control method further includes the following steps:

[0032] S8. Detect the wastewater in Step S7. If the concentration of impurity ions meets the standard, the cleaning is completed; otherwise, continue to execute Steps S3 to S7.

[0033] Further, the control method further includes the following steps:

[0034] S9. Turn on the external control pump connected to the air inlet, the air pump on the nitrogen pipeline, or the pump connected to the outside of the aeration disk, and introduce high-purity nitrogen with any one pump or simultaneously;

[0035] S10. Set a predetermined time to turn off all the pumps in Step S9, and turn off the fan and valve at the exhaust port of the device.

[0036] Compared with the prior art, the present invention provides a cold screen cleaning system and a control method, having the following beneficial effects:

[0037] 1. For the traditional manual scraping and cleaning of the cold shield, engineers directly come into contact with highly toxic impurities such as arsenic and beryllium. If the protection is improper, it is easy to inhale or adhere to dust, causing irreversible physical damage. The integrated cleaning equipment of this invention adopts an automatic cleaning method, greatly reducing the direct contact between personnel and these dangerous impurities. The operator does not need to enter the cavity for manual scraping, but only needs to operate and control outside the equipment, effectively avoiding the poisoning risk caused by improper protection and ensuring the physical health and life safety of engineers.

[0038] 2. In traditional cleaning, when dealing with phosphorus-containing impurities, it is easy to generate sparks and cause fires. The newly invented cleaning equipment avoids the frictional sparks generated by manual scraping through a specific cleaning process, using a two-fluid atomizing nozzle, an aeration disc, and a specific solution for cleaning. For example, during the cleaning process, the standard cleaning liquid No. 1 reacts fully with the impurities, effectively dissolving the impurities, and the whole process is carried out in a relatively enclosed equipment without open flames, greatly reducing the possibility of fire and ensuring the safety of the working environment.

[0039] 3. Traditional scraping and cleaning is difficult to handle the weld interface. If there is a slight mistake, it will cause leakage of the weld surface, bringing significant losses to the equipment restoration. The automatic cleaning equipment of this invention is automatically controlled by a control module, which can accurately control the cleaning process and reduce the damage to the weld interface. Each component of the cleaning device cooperates closely to complete the cleaning work without contacting the weld interface, reducing the risk of equipment damage, improving the stability and reliability of the equipment, and reducing the equipment maintenance cost and downtime.

[0040] 4. The traditional manual scraping and cleaning method is inefficient and affected by factors such as personnel physical strength and technical proficiency. The cleaning equipment of this invention is automatically controlled by a control module and sequentially performs steps such as cleaning, reaction, rinsing, and air drying according to a preset program. Each link is closely connected, greatly shortening the cleaning time. At the same time, the equipment can clean the inside and outside of the cold shield simultaneously, further improving the cleaning efficiency and helping to improve the overall production efficiency.

[0041] 5. The cold shield main body and the cleaning device main body arranged outside the cold shield main body. An installation flange is arranged on the upper side of the cold shield main body, and a flange with the same caliber as the installation flange is arranged on the upper side of the cleaning device main body. The modular design with the same caliber enables the direct removal of the cold shield sample rack and replacement with the flange of this invention when cleaning the cold shield equipment. It not only realizes efficient and safe cleaning and maintenance, but also optimizes the system performance from multiple dimensions such as compatibility, economy, and equipment life.

[0042] 6. In steps S3-S4, the control module controls the two-fluid atomizing nozzle and the control pump connected to the aeration plate to start, and blows high-purity nitrogen into the interior of the cleaning device body through the air blowing port on the aeration plate, so that the injected standard cleaning liquid No. 1 is fully mixed and reacted with the impurities inside and outside the cold screen, dissolving the impurity particles attached to the inside and outside of the cold screen.

[0043] 7. Through step S6, the water inlet of the cleaning device and the two-fluid atomizing nozzle continuously spray ultrapure water to the inside and outside of the cold screen body to rinse the cold screen and wash away the impurities and residual solution after the reaction.

[0044] 8. Through step S9, an air-drying path is set on the inside of the cold screen. The relevant valves and fans can be opened to allow high-purity nitrogen to pass through this path and other air-drying channels to dry the inner and outer surfaces of the cold screen at the same time, reducing the residual moisture on the surface of the cold screen and improving the drying efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] Figure 1 This is a structural diagram of the cold shield body of the present invention after being arranged inside the cleaning device body.

[0046] Figure 2 For the present invention Figure 1 Schematic diagram of the structure from a half-section perspective.

[0047] Figure 3 For the present invention Figure 1 Schematic diagram of the structure from the bottom perspective.

[0048] Figure 4 For the present invention Figure 3 Only the structural diagram of the cleaning device body is retained.

[0049] Figure 5 It is a structural schematic diagram of the cold shield main body in the present invention.

[0050] Figure 6 It is a structural schematic diagram of the aeration plate in the present invention.

[0051] Figure 7 It is a structural schematic diagram of the two-fluid atomizing nozzle in the present invention.

[0052] Figure 8 For the present invention Figure 7 Schematic diagram of the structure from a half-section perspective.

[0053] Figure 9 It is a structural schematic diagram of the water inlet of the cleaning device in the present invention.

[0054] Figure 10 It is a structural diagram of the logic diagram of the device operation in the present invention.

[0055] Figure 11Structural schematic diagram of the operation logic of another device of the present invention.

[0056] In the figure: 1. Two-fluid atomizing nozzle; 2. Water inlet of the cleaning device; 3. Aeration disk; 4. Exhaust port of the device tail gas; 5. Drain port of the device; 6. Installation flange; 7. Installation disk; 8. Cold screen main body; 9. Water outlet nozzle; 10. Nitrogen pipeline; 11. Air injection port; 12. Support foot seat; 13. Cleaning device main body; 14. Installation port. Detailed implementation manners

[0057] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0058] Embodiment 1.

[0059] The present invention provides a cold screen cleaning system as Figure 1-9 shown, including a cold screen main body 8 and a cleaning device main body 13 arranged outside the cold screen main body 8.

[0060] An installation flange 6 is arranged on the upper side of the cold screen main body 8, a flange with the same diameter as the installation flange 6 is arranged on the upper side of the cleaning device main body 13. The cold screen main body 8 is combined with the upper flange of the cleaning device main body 13 through the installation flange 6 and is fixedly connected by a plurality of external bolts. A plurality of support foot seats 12 for support are arranged on the lower side of the cleaning device main body 13.

[0061] In addition, an installation port 14 is arranged on the inner side of the middle of the installation flange 6.

[0062] An exhaust port 4 of the device tail gas is arranged on the upper part of the cleaning device main body 13, and the exhaust port 4 of the device tail gas is communicated with the inside of the cleaning device main body 13.

[0063] An installation disk 7 is arranged on the inner side of the installation port 14, and a water inlet 2 of the cleaning device is arranged on the inner side of the middle of the installation disk 7.

[0064] A drain port 5 of the device is protrudingly arranged outward on the lower side of the cleaning device main body 13.

[0065] Furthermore, the drain port 5 in the middle of the lower side of the cleaning device main body 13 can be divided into two paths. One path discharges high-concentration impurity wastewater, and the other path discharges flushing wastewater. The valves on the two drain pipelines are respectively controlled to be opened, and the wastewater is discharged into the corresponding treatment system or storage container. During the discharge process, parameters such as the discharge flow rate and concentration of the wastewater can be monitored by devices such as flow sensors arranged on the drain pipelines.

[0066] A plurality of two-fluid atomizing nozzles 1 are arranged outside the main body 13 of the cleaning device, and a nitrogen pipeline 10 is connected to the lower side of the two-fluid atomizing nozzle 1.

[0067] An aeration disc 3 is arranged on the upper side of the bottom of the main body 13 of the cleaning device.

[0068] The air inlet 2 is connected to an external control pump.

[0069] A control module is arranged outside the main body 13 of the cleaning device to control the operation and parameter adjustment of each component, including: controlling the external control pump to inject solution or gas, controlling the switch of the water pump connected to the two-fluid atomizing nozzle 1 and the air pump on the nitrogen pipeline 10, controlling the switch of the pump connected to the outside of the aeration disc 3, controlling the pipeline valve switch of the sewage outlet, and controlling the switch of the fan and valve at the exhaust port 4 of the device tail gas.

[0070] Optionally, as shown in Figure 10 A control module PLC is arranged outside the main body of the cleaning device. A plurality of valves are arranged on the pipelines for inputting standard cleaning solution No. 1 (SC1 solution), high-purity nitrogen, and ultrapure water (UPW), and all the valves and pumps are centrally controlled by the control module PLC.

[0071] A plurality of water outlet nozzles 9 are externally connected and communicated with the lower side of the water inlet 2 of the cleaning device. The water inlet 2 of the cleaning device is combined through the mounting disc 7 and the mounting port 14 and fixedly connected by external bolts.

[0072] Optionally, the air inlet 2 of the cleaning device is connected to an external control pump, and the SC1 solution can be injected by the control pump. Through the water inlet 2 of the cleaning device and the plurality of water outlet nozzles 9 connected to the lower side, it is evenly sprayed on the inner and outer surfaces of the cold screen main body 8 to preliminarily wet the cold screen and soften impurities. During this process, the injection amount of the SC1 solution can be adjusted by controlling the water pump flow according to the pollution degree of the cold screen.

[0073] The two-fluid atomizing nozzle 1 is inserted into the main body 13 of the cleaning device, and a sealing ring is arranged at the connection between the plurality of two-fluid atomizing nozzles 1 and the inside of the main body 13 of the cleaning device for sealing treatment. The outside of the two-fluid atomizing nozzle 1 is connected to a water pump to add ultrapure water fluid and spray it into the main body 13 of the cleaning device. The outside of the nitrogen pipeline 10 is connected to an air pump to add high-purity nitrogen, and acceleration is provided by the external air pump and mixed with the fluid inside the two-fluid atomizing nozzle 1.

[0074] The two-fluid nozzle can participate in the cleaning stage and the rinsing stage. Among them, the cleaning stage is as follows: Control the water pump connected to the two-fluid atomizing nozzle 1 and the air pump on the nitrogen pipeline 10 to start. The water pump adds ultrapure water (or first sprays the SC1 solution and then sprays ultrapure water according to the improvement) to the two-fluid atomizing nozzle 1. The air pump adds high-purity nitrogen to the nitrogen pipeline 10, and after providing acceleration through the air pump and mixing with the internal fluid of the two-fluid atomizing nozzle 1, it sprays into the interior of the cleaning device main body 13. By adjusting the parameters of the water pump and the air pump, the pressure, flow rate, and atomization effect of the sprayed water flow can be changed to achieve more efficient cleaning of the cold shield and ensure that the impurities on the surface of the cold shield are fully washed away.

[0075] The rinsing stage is as follows: Close the valve of the SC1 solution injection pipeline, open the valve of the ultrapure water pipeline, and continuously spray ultrapure water to the inner and outer sides of the cold shield main body 8 through the water inlet 2 of the cleaning device and the two-fluid atomizing nozzle 1 to rinse the cold shield and wash away the reacted impurities and residual solution. The rinsing time is determined according to the actual situation to ensure that there are no residual impurities and solution on the surface of the cold shield.

[0076] There are multiple air injection ports 11 opened on the outer side of the upper side of the aeration disk 3, and a control pump is connected to the outside of the aeration disk 3 to add high-purity nitrogen.

[0077] The aeration disk can participate in the aeration mixing reaction stage. The control module PLC controls the pump Pump1 and the control pump connected to the aeration disk 3 to start, and high-purity nitrogen is blown into the interior of the cleaning device main body 13 through the air injection ports 11 on the aeration disk 3, so that the injected SC1 solution fully mixes and reacts with the impurities on the inner and outer sides of the cold shield, and dissolves the impurity particles attached to the inner and outer sides of the cold shield. The air blowing time and nitrogen flow rate can be adjusted according to the actual cleaning requirements. For example, for a severely contaminated cold shield, the air blowing time can be appropriately extended and the nitrogen flow rate can be increased.

[0078] By setting an air drying path on the inner side of the cold shield, relevant valves and fans can be opened, so that high-purity nitrogen passes through this path and other air drying channels to simultaneously air dry the inner and outer surfaces of the cold shield, reduce the water residue on the surface of the cold shield, and improve the drying efficiency. During the air drying process, the air drying time and nitrogen flow rate can be controlled by monitoring parameters such as the surface humidity of the cold shield.

[0079] In this embodiment, the control of the cold shield cleaning system is composed of a PLC (programmable logic controller) as the core control unit, various sensors (such as liquid level sensors, flow sensors, pressure sensors, humidity sensors, etc.) and actuators (such as water pumps, air pumps, control pumps, valves, etc.) to form a control system. The PLC realizes the logical control and parameter adjustment of each component through programming.

[0080] A liquid level sensor is also provided inside the main body 13 of the cleaning device. When the cleaning liquid (SC1 solution or ultrapure water) is injected to reach the set high liquid level, the liquid level sensor feeds back a signal to the PLC, and the PLC controls the closing of the water inlet pipeline valve to stop the solution injection. When the cleaning is completed and enters the sewage discharge stage, when the liquid level drops to the set low liquid level, the lower limit liquid level sensor feeds back a signal to the PLC, and the PLC controls the sewage discharge pipeline valve to close after a delay of 20 s (the delay time can be adjusted according to the actual situation) to prevent problems such as excessive sewage discharge and air backflow, realizing the full-automatic liquid level control of the equipment.

[0081] Pressure sensors and flow sensors are provided on the output pipelines of equipment such as water pumps, air pumps, and control pumps. The sensors monitor the pressure and flow data of the fluid in the pipeline in real time and feed them back to the PLC. The PLC automatically adjusts the operating frequency or valve opening of the water pump, air pump, and control pump according to the set pressure and flow parameter ranges to ensure the stable injection pressure and flow of the two-fluid atomizing nozzle 1 and the appropriate air-blowing flow of the aeration disk 3, meeting the requirements of different cleaning stages.

[0082] In addition, a fault detection mechanism is set for each key device (such as water pumps, air pumps, control pumps, etc.) and sensors in the system. When a device fails or the sensor data is abnormal, a fault signal is immediately fed back to the PLC. The PLC triggers an alarm device (such as an audible and visual alarm), and at the same time, information such as the fault type and location is displayed on the operation interface (such as a touch screen). The operator can perform fault troubleshooting and handling according to the prompts. When necessary, the PLC can automatically take protection measures, such as stopping the operation of relevant devices, to prevent the expansion of the fault and equipment damage.

[0083] Under the support of the above system, the present invention provides a control method for a cold screen cleaning system. The operation process of the main body of this cleaning device is as follows:

[0084] S1. Open the valve of the device tail gas exhaust port 4, start the water pump connected to the two-fluid atomizing nozzle 1 to inject the standard cleaning liquid No. 1, start the air pump on the nitrogen pipeline 10 to introduce high-purity nitrogen, and mix and accelerate through the two-fluid atomizing nozzle 1 to spray in the form of atomized droplets; the water pump flow can be adjusted according to the pollution degree.

[0085] S2. Set a predetermined time to stop spraying in the form of atomized droplets, and start the fan of the device tail gas exhaust port 4.

[0086] S3. Start the external control pump to inject the standard cleaning liquid No. 1 to the set threshold.

[0087] S4. Start the pump connected to the outside of the aeration disk 3 to introduce high-purity nitrogen at the set threshold; promote the reaction of the standard cleaning liquid No. 1 with impurities, and adjust the air-blowing time and flow as needed.

[0088] S5. Open the pipeline valve of the sewage discharge port 5 for a set time.

[0089] S6, turn on the external control pump connected to the air inlet 2 to inject ultrapure water, turn on the water pump connected to the two-fluid atomizing nozzle 1 to inject ultrapure water, turn on the air pump on the nitrogen pipeline 10 to introduce high-purity nitrogen, and turn on the pump connected to the outside of the aeration plate 3 to introduce high-purity nitrogen.

[0090] S7, set a predetermined time to turn off all pumps in step S6, open the sewage outlet (5) to discharge the wastewater, and use sensors to monitor the flow rate and concentration.

[0091] S8, testing the wastewater from step S7, if the impurity ion concentration meets the standard, the cleaning is completed, otherwise continue to perform steps S3 to S7.

[0092] S9, start the external control pump connected to the air inlet 2, the air pump of the nitrogen pipeline 10 or the pump connected to the outside of the aeration plate 3, and start any one of the pumps or simultaneously to introduce high-purity nitrogen; control the time and flow rate according to the humidity.

[0093] S10, setting a predetermined time to shut down all the pumps in step S9, and closing the fan and valve of the tail gas exhaust port 4 of the device.

[0094] Optional, it should be noted that, Figure 10 This is a schematic diagram of the device operation logic. The actual two-fluid atomizing nozzle 1 can be designed as multiple or multi-layer. Only two of the two-fluid atomizing nozzles 1 are shown in the figure. This is only to clarify the operation logic and simplify the relevant design. This is hereby explained.

[0095] Example 2.

[0096] The cold screen cleaning system control method of embodiment 1 is specifically implemented as follows. Figure 10 As shown in the figure, PLC represents a controller, which can be a host computer; Pump represents various pumps; Two fluid nozzle represents a two-fluid atomizing nozzle; Valve represents various valves; and the following steps are included:

[0097] Step 1: The PLC controls the opening of Pump 1, Pump 3 and valves Valve 1, Valve 2, Valve 3, Valve 4, Valve 7. At this time, two fluids, PN2 and UPW, are mixed and accelerated through two two-fluid nozzles, Two fluid nozzle 1 and Two fluid nozzle 2, and sprayed out in the form of atomized droplets to preliminarily treat the impurities attached to the cold screen. This process ends after 3 minutes controlled by the PLC timer, and Pump 1 and valves Valve 1, Valve 2, Valve 3, Valve 4 are closed. At the same time, the excess waste gas generated inside the device is inhaled by Pump 3 and valve Valve 7, processed by the Filtration system and then discharged, and connected to the central tail gas treatment device of the plant. The Facility exhaust is turned on at the initial stage of the equipment operation and keeps running continuously.

[0098] Step 2: The PLC controls the opening of Pump 2 and valve Valve 5, and injects SC1 solution into the device until the Liquid level sensor responds, then Pump 2 and valve Valve 5 are closed.

[0099] Step 3: The PLC controls the opening of Pump 1 and valve Valve 6, and injects gas into the device through the Aeration disc, so that the SC1 solution fully mixes and reacts with the impurities on the inner and outer sides of the cold screen to dissolve the impurity particles attached to the inner and outer sides of the cold screen. This process ends after 30 minutes controlled by the PLC timer, and Pump 1 and valve Valve 6 are closed.

[0100] Step 4: The PLC controls the opening of valve Valve 8, and discharges the waste liquid after the reaction in the device until it is completely emptied, then valve Valve 8 is closed.

[0101] Step 5: The PLC controls the opening of Pump 1, Pump 2 and valves Valve 6, Valve 9, injects ultrapure water into the device and aerates at the same time to wash the surface of the cold screen. When the Liquid level sensor responds, Pump 2 and valve Valve 9 are closed, and then Pump 1 and valve Valve 6 are closed after 5 minutes timed by the PLC timer.

[0102] Step 6: The PLC controls the opening of Valve 8 to drain the waste liquid after the reaction in the device until it is completely emptied, and then closes Valve 8. Detect the residual liquid discharged this time. If the impurity ion concentration meets the standard, end this step and proceed to Step 7; if the test result of the residual liquid does not meet the standard, return to Step 2 and execute it in a loop until the test result of the residual liquid meets the standard.

[0103] Step 7: The PLC controls the opening of Pump 1 and Valves Valve 1, Valve 2 to blow air onto the surface of the cold screen in the device to quickly dry the surface. This process ends after 3 minutes timed by the PLC timer, and then Pump 1 and Valves Valve 1, Valve 2 are closed.

[0104] Step 8: The PLC controls the closing of Fan Pump 3 and Valve 7, and the cleaning process ends.

[0105] Example 3.

[0106] Improve the control method of the cold screen cleaning system in Example 2, as Figure 11 shown, including the following steps:

[0107] Step 1: The PLC controls the opening of Pump 1, Pump 3 and Valves Valve 1, Valve 2, Valve 3, Valve 4, Valve 5, Valve 1,0. At this time, two fluids, PN2 and SC1 solution, pass through two two-fluid nozzles, Two fluid nozzle1, Two fluid nozzle 2, (Two fluid nozzle represents a two-fluid atomizing nozzle, which is expressed in English to distinguish and indicate that there are multiple), mix and accelerate to spray out in the form of atomized droplets to preliminarily treat the impurities attached to the cold screen. This process ends after 3 minutes controlled by the PLC timer, and then Pump 1 and Valves Valve 1, Valve 2, Valve 3, Valve 4, Valve 5 are closed; at the same time, the excess waste gas generated inside the device is inhaled into the Filtration system through Fan Pump 3 and Valve 1,0 for treatment and then discharged, and is connected to the plant central tail gas treatment device. The Facilityexhaust is turned on at the initial stage of equipment operation and keeps running continuously.

[0108] Step 2: The PLC controls the opening of Pump 2 and Valve 6 to inject SC1 solution into the device, and closes Pump 2 and Valve 6 when the Liquid level sensor 1 responds.

[0109] Step 3: The PLC controls the opening of Pump 1 and Valve 7, and gas is introduced into the device through the Aeration disc, causing the SC1 solution to fully mix and react with the impurities on the inner and outer sides of the cold screen to dissolve the impurity particles attached to the inner and outer sides of the cold screen. This process ends after 30 minutes controlled by the PLC timer, and then Pump 1 and Valve 7 are closed.

[0110] Step 4: The PLC controls the opening of Valve 8, and the highly concentrated waste liquid after the reaction in the device is discharged until the Liquid level sensor 2 responds, and then Valve 8 is closed after a 20-second delay.

[0111] Step 5: The PLC controls the opening of Pump 1, Pump 2, Valve 1, Valve 2, Valve 3, Valve 4, Valve 7, Valve 11, and Valve 12, and ultra-pure water is injected into the device while aerating to wash the inner and outer surfaces of the cold screen. When the Liquid level sensor 1 responds, Pump 2 and Valve 1, Valve 2, Valve 3, Valve 4, Valve 11, and Valve 12 are closed, and then Pump 1 and Valve 7 are closed after 5 minutes timed by the PLC timer.

[0112] Step 6: The PLC controls the opening of Valve 9, and the waste liquid after the reaction in the device is discharged until the Liquid level sensor 2 responds, and then Valve 9 is closed after a 20-second delay. The residual liquid discharged this time is detected. If the concentration of impurity ions meets the standard, this step ends and Step 7 is executed; if the detection result of the residual liquid does not meet the standard, it returns to Step 2 and loops until the detection result of the residual liquid meets the standard.

[0113] Step 7: The PLC controls the opening of Pump 1, Pump 2, Valve 1, Valve 2, and Valve 7, Valve 13, and air is blown onto the inner and outer surfaces of the cold screen in the device to dry it quickly. This process ends after 3 minutes timed by the PLC timer, and then Pump 1, Pump 2, Valve 1, Valve 2, Valve 7, and Valve 13 are closed.

[0114] Step 8: The PLC controls the closing of the blower Pump 3 and Valve 10, and the cleaning process ends.

[0115] Finally, it should be noted that the above are only the preferred embodiments of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A cold screen cleaning system, comprising a cold screen main body (8) and a cleaning device main body (13) arranged outside the cold screen main body (8); An installation flange (6) is arranged on the upper side of the cold screen main body (8), and a flange with the same caliber as the installation flange (6) is arranged on the upper side of the cleaning device main body (13); An installation port (14) is arranged on the inner side of the middle of the installation flange (6); It is characterized in that: An exhaust port (4) for device tail gas is arranged on the upper part of the cleaning device main body (13), and the exhaust port (4) for device tail gas is communicated with the inside of the cleaning device main body (13); An installation disk (7) is arranged on the inner side of the installation port (14), and a cleaning device water inlet (2) is arranged on the inner side of the middle of the installation disk (7); A device sewage discharge port (5) protrudes outwards from the lower side of the cleaning device main body (13); A plurality of two-fluid atomizing nozzles (1) are arranged on the outer side of the cleaning device main body (13), and a nitrogen pipeline (10) is communicated with the two-fluid atomizing nozzle (1); An aeration disk (3) is arranged on the upper side of the bottom of the cleaning device main body (13).

2. The cold screen cleaning system according to claim 1, characterized in that: A plurality of water outlet nozzles (9) are communicated with the outside of the lower side of the cleaning device water inlet (2). The cleaning device water inlet (2) is combined through the installation disk (7) and the installation port (14), and is fixedly connected by external bolts.

3. The cold screen cleaning system according to claim 2, characterized in that: The two-fluid atomizing nozzle (1) is inserted into the inside of the cleaning device main body (13), and a sealing ring is arranged at the connection between the plurality of two-fluid atomizing nozzles (1) and the inside of the cleaning device main body (13) for sealing treatment.

4. The cold screen cleaning system according to claim 3, characterized in that: An external water pump is connected to the outside of the two-fluid atomizing nozzle (1) to add ultrapure water fluid, and the fluid is sprayed into the inside of the cleaning device main body (13). A gas pump is connected to the outside of the nitrogen pipeline (10) to add high-purity nitrogen, and acceleration is provided by an external gas pump and the fluid inside the two-fluid atomizing nozzle (1) is mixed.

5. A cold screen cleaning system according to claim 4, characterized in that: A plurality of air injection ports (11) are arranged on the outer side of the upper side of the aeration disk (3), and a control pump is connected to the outside of the aeration disk (3) to add high-purity nitrogen.

6. A cold screen cleaning system according to claim 1, characterized in that: The cold screen main body (8) is combined with the upper flange of the cleaning device main body (13) through the installation flange (6), and is fixedly connected by a plurality of external bolts. A plurality of support feet (12) for support are arranged on the lower side of the cleaning device main body (13).

7. A cold screen cleaning system according to any one of claims 1-6, characterized in that: The air inlet (2) is connected to an external control pump; A control module is arranged outside the cleaning device main body (13) to control the operation and parameter adjustment of each component, including: controlling the injection of solution or gas by the external control pump, controlling the switch of the water pump connected to the two-fluid atomizing nozzle (1) and the gas pump on the nitrogen pipeline (10), controlling the switch of the pump connected to the outside of the aeration disk (3), controlling the pipeline valve switch of the sewage discharge port, and controlling the switch of the fan and valve of the exhaust port (4) for device tail gas.

8. A control method for a cold screen cleaning system, characterized in that: A control method for using any one of the cold screen cleaning systems according to claims 1-6, comprising the following steps: S1. Open the valve at the exhaust port (4) of the device, turn on the water pump connected to the two-fluid atomizing nozzle (1) to inject Standard Cleaning Liquid No. 1, turn on the air pump on the nitrogen pipeline (10) to introduce high-purity nitrogen, and mix and accelerate through the two-fluid atomizing nozzle (1) to spray out in the form of atomized droplets; S2. Set a predetermined time to stop spraying in the form of atomized droplets, and turn on the fan at the exhaust port (4) of the device; S3. Turn on the external control pump to inject Standard Cleaning Liquid No. 1 to the set threshold; S4. Turn on the pump externally connected to the aeration disk (3) and introduce high-purity nitrogen at the set threshold; S5. Open the pipeline valve at the sewage outlet (5) for a set time; S6. Turn on the external control pump connected to the air inlet (2) to inject ultrapure water, turn on the water pump connected to the two-fluid atomizing nozzle (1) to inject ultrapure water, turn on the air pump on the nitrogen pipeline (10) to introduce high-purity nitrogen, and turn on the pump externally connected to the aeration disk (3) to introduce high-purity nitrogen; S7. Set a predetermined time to turn off all the pumps in step S6, and open the sewage outlet (5) to drain the wastewater.

9. The cold screen cleaning system according to claim 8, characterized in that: It further includes the following steps: S8. Detect the wastewater in step S7. If the concentration of impurity ions meets the standard, the cleaning is completed; otherwise, continue to execute steps S3 to S7.

10. A cold screen cleaning system according to claim 8, characterized in that: The control method further includes the following steps: S9. Turn on the external control pump connected to the air inlet (2), the air pump on the nitrogen pipeline (10), or the pump externally connected to the aeration disk (3), and introduce high-purity nitrogen with any one pump or simultaneously; S10. Set a predetermined time to turn off all the pumps in step S9, and turn off the fan and valve at the exhaust port (4) of the device.

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