Display panel, manufacturing method thereof, and display device

Abstract

The present application discloses a display panel, a manufacturing method thereof, and a display device. The display panel includes a base substrate, a pixel definition layer, a plurality of light-emitting units, and an isolation column. The isolation column is provided on the pixel definition layer and is used to separate two adjacent light-emitting units when forming a light-emitting unit. When the isolation column is in a first state, the width of the isolation column away from the base substrate is greater than the width of the isolation column close to the base substrate. When the isolation column is in a second state, the width of the isolation column away from the base substrate is less than or equal to the width of the isolation column close to the base substrate. When the isolation column is in the first state, it is used to separate two adjacent light-emitting units when forming a light-emitting unit. By providing an isolation column with two state changes, the present application ensures the uniformity of subsequent film formation while realizing a maskless evaporation process for the light-emitting unit, improves the stability of the isolation column structure, and thus improves the quality of the display panel.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel, a manufacturing method thereof, and a display device. Background Art

[0002] In the fabrication process of OLED devices, photolithography is typically used to pattern pixels, using metal masks to fabricate the organic light-emitting units. However, the cost of changing metal masks for different products is high, leading to the emergence of metal-mask-free technology, which offers high precision without a metal mask. By providing an overhang structure on the pixel definition layer before evaporating the organic light-emitting functional layer and cathode, the overhang structure isolates adjacent organic light-emitting functional layers, thereby resolving the short-circuiting problem of the organic light-emitting functional layers between adjacent pixels.

[0003] However, the current overhang structure requires a structure that is wide at the top and narrow at the bottom and fixed on the left side during preparation. The partitioning effect of the overhang structure will also act on the top electrode, and there is a problem that the top electrode is easily partitioned by the overhang structure during film formation. Moreover, even if a metal layer is added to the overhang structure as a way to connect the top electrode, there is still a problem of poor connection stability between the metal layer and the top electrode. Summary of the Invention

[0004] The purpose of this application is to provide a display panel, a manufacturing method thereof, and a display device. By setting an isolation column with two state changes, the uniformity of subsequent film layer formation is guaranteed while realizing a maskless evaporation process for the light-emitting unit, thereby improving the stability of the isolation column structure and thus improving the quality of the display panel.

[0005] The present application discloses a display panel, comprising a base substrate, a pixel definition layer, a plurality of light-emitting units and an isolation column, wherein the pixel definition layer is arranged on the base substrate and has a plurality of opening areas; the plurality of light-emitting units are arranged on the base substrate and are respectively located in the plurality of opening areas; the isolation column is arranged on the pixel definition layer and is used to separate two adjacent light-emitting units when forming the light-emitting units; wherein, when the isolation column is in a first state, the width of the isolation column away from the base substrate is greater than the width of the isolation column close to the base substrate; when the isolation column is in a second state, the width of the isolation column away from the base substrate is less than or equal to the width of the isolation column close to the base substrate; when the isolation column is in the first state, it is used to separate two adjacent light-emitting units when forming the light-emitting units.

[0006] Optionally, the isolation column is formed of a vertically oriented liquid crystal elastic material, and the side of the isolation column away from the base substrate is irradiated with ultraviolet light so that the isolation column is in a first state, and the side of the isolation column away from the base substrate is irradiated with visible light so that the isolation column is in a second state.

[0007] Optionally, the light-emitting unit includes a light-emitting functional layer. When the light-emitting unit is formed, the isolation column is in a first state, and the isolation column is used to separate the light-emitting functional layers of two adjacent light-emitting units when in the first state; after the light-emitting functional layer of the light-emitting unit is formed, the isolation column is in a second state.

[0008] Optionally, the light-emitting unit further includes a bottom electrode and a top electrode, the bottom electrode is arranged under the light-emitting functional layer, and the top electrode is arranged on the light-emitting functional layer; the bottom electrodes of the multiple light-emitting units are not connected to each other, and the top electrodes of the multiple light-emitting units are connected to each other; wherein, when the top electrode is formed, the isolation column is in the second state.

[0009] Optionally, a groove is provided on the pixel definition layer, the isolation column is provided in the groove, and the height of the isolation column is greater than the depth of the groove.

[0010] Optionally, the display panel further includes a light-shielding layer, which is disposed on the isolation column and is used to prevent the ultraviolet light or visible light from entering the isolation column.

[0011] The present application also discloses a method for manufacturing a display panel, comprising the steps of:

[0012] providing a substrate;

[0013] forming a pixel definition layer on the base substrate and forming a plurality of opening areas;

[0014] forming isolation columns on the pixel definition layer;

[0015] When the isolation column is in the first state, a plurality of light-emitting units are respectively formed in the plurality of opening regions; and

[0016] After the light emitting unit is formed, the isolation column is in a second state;

[0017] The isolation column has a first state and a second state. When the isolation column is in the first state, the width of the isolation column at a side away from the base substrate is greater than the width of the isolation column at a side close to the base substrate.

[0018] When the isolation column is in the second state, the width of the isolation column at a side away from the base substrate is less than or equal to the width of the isolation column at a side close to the base substrate;

[0019] When the isolation column is in the first state, it is used to separate two adjacent light-emitting units.

[0020] Optionally, the step of forming a pixel definition layer on the base substrate and forming a plurality of opening areas includes:

[0021] forming a patterned bottom electrode of the light-emitting unit on the base substrate;

[0022] forming a pixel definition layer on the bottom electrode and forming a plurality of opening areas, wherein the bottom electrode is exposed from the opening areas;

[0023] When the isolation pillar is in the first state, the step of forming a plurality of light-emitting units in the plurality of opening regions respectively includes:

[0024] irradiating the isolation pillar with ultraviolet light on a side away from the base substrate so that the isolation pillar is in a first state;

[0025] forming a light-emitting functional layer of the light-emitting unit, and using the isolation column to isolate the light-emitting functional layers in the plurality of opening areas;

[0026] The step of placing the isolation column in the second state after the light emitting unit is formed includes:

[0027] After the light-emitting functional layer of the light-emitting unit is formed, irradiating the isolation column with visible light on a side away from the base substrate so that the isolation column is in a second state;

[0028] forming a top electrode of the light-emitting unit;

[0029] Wherein, the isolation column is formed by vertically oriented liquid crystal elastic material.

[0030] Optionally, the step of forming isolation columns on the pixel definition layer includes:

[0031] forming a groove on the pixel definition layer;

[0032] forming an isolation column in a second state in the groove;

[0033] Wherein, the height of the isolation column in the second state is greater than the depth of the groove.

[0034] The present application also discloses a display device, comprising a driving circuit and the above-mentioned display panel, wherein the driving circuit is used to drive the display panel to display.

[0035] In the present application, an isolation column with two state changes is provided on the pixel definition layer. The isolation column with state changes is used to separate two adjacent light-emitting units in the first state during the formation of the light-emitting unit. After the light-emitting unit is formed, the isolation column can be transformed into the second state, so that the isolation column no longer has a shape similar to an overhanging structure that is wide at the top and narrow at the bottom, thereby avoiding the isolation column from separating subsequent film layers. In this embodiment, the isolation column is mainly utilized to have two states that can be transformed into each other. When forming the light-emitting unit, the isolation column can be placed in the first state. After the light-emitting unit is formed, the isolation column can be placed in the second state. When the isolation column is in the second state, since it no longer has the shape of an overhanging structure that is wide at the top and narrow at the bottom, it no longer has the ability to separate the film layer, thereby avoiding the problem of being separated when forming other film layers. By providing an isolation column with two state changes, the present application ensures the uniformity of subsequent film layer formation when the light-emitting unit is subjected to a maskless evaporation process, improves the stability of the isolation column structure, and thus improves the quality of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] The included drawings are used to provide a further understanding of the embodiments of the present application, which constitute a part of the specification, are used to illustrate the implementation methods of the present application, and together with the text description, explain the principles of the present application. Obviously, the drawings described below are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without inventive work. In the drawings:

[0037] Figure 1 is a schematic diagram of a display panel of the present application;

[0038] Figure 2 Schematic diagrams of the isolation column of the present application in the first state and the second state;

[0039] Figure 3 is a schematic diagram of the photoincrement of the isolation column of the present application;

[0040] Figure 4 is a schematic diagram of another isolation column of the present application;

[0041] Figure 5 is a schematic diagram of another display panel of the present application;

[0042] Figure 6 is a schematic diagram of a method for manufacturing a display panel of the present application;

[0043] Figure 7 This is a schematic diagram of the manufacturing process of the display panel of the present application;

[0044] Figure 8 is a schematic diagram of a display device of the present application.

[0045] Among them, 100, display panel; 110, base substrate; 120, pixel definition layer; 121, opening area; 122, groove; 130, light-emitting unit; 131, bottom electrode; 132, light-emitting functional layer; 133, top electrode; 140, isolation column; 150, light-shielding layer; 200, display device; 210, driving circuit. DETAILED DESCRIPTION

[0046] It should be understood that the terms used herein, the specific structures and functional details disclosed are only for describing specific embodiments and are representative. However, the present application can be implemented in many alternative forms and should not be construed as being limited to the embodiments described herein.

[0047] In the description of this application, the terms "first" and "second" are used for descriptive purposes only and are not to be understood as indicating relative importance or implicitly indicating the number of technical features indicated. Therefore, unless otherwise specified, features defined as "first" and "second" may explicitly or implicitly include one or more of such features; "multiple" means two or more. In addition, terms indicating orientation or positional relationships such as "upper", "lower", "left", "right", "vertical", and "horizontal" are described based on the orientation or relative positional relationships shown in the accompanying drawings. They are only simplified descriptions for the convenience of describing this application, and do not indicate that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they cannot be understood as limitations on this application. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0048] The present application is described in detail below with reference to the accompanying drawings and optional embodiments.

[0049] Figure 1 is a schematic diagram of the display panel of this application, Figure 2 This is a schematic diagram of the first and second states of the isolation column of the present application, see Figures 1 to 2As shown, the present application discloses a display panel 100, the display panel 100 includes a base substrate 110, a pixel definition layer 120, a plurality of light-emitting units 130 and an isolation column 140, the pixel definition layer 120 is arranged on the base substrate 110 and is formed with a plurality of opening areas 121, the plurality of light-emitting units 130 are arranged on the base substrate 110, and are respectively located in the plurality of opening areas 121, the isolation column 140 is arranged on the pixel definition layer 120, and is used to isolate two adjacent light-emitting units 130 when forming the light-emitting units 130. 0; wherein, when the isolation column 140 is in a first state, the width of the isolation column 140 away from the base substrate 110 is greater than the width of the isolation column 140 close to the base substrate 110; when the isolation column 140 is in a second state, the width of the isolation column 140 away from the base substrate 110 is less than or equal to the width of the isolation column 140 close to the base substrate 110; when the isolation column 140 is in the first state, it is used to separate two adjacent light-emitting units 130 when forming the light-emitting unit 130.

[0050] In the present application, an isolation column 140 having two states is provided on the pixel definition layer 120. The isolation column 140 having a state change is used to separate two adjacent light-emitting units 130 in the first state during the formation of the light-emitting unit 130. After the light-emitting unit 130 is formed, the isolation column 140 can be transformed into a second state, so that the isolation column 140 no longer has a shape similar to an overhang structure with a width at the top and a narrowness at the bottom, thereby preventing the isolation column 140 from separating subsequent film layers. In this embodiment, the isolation column 140 mainly utilizes the mutual transformation of the two states. When forming the light-emitting unit 130, the isolation column 140 can be placed in the first state. After the light-emitting unit 130 is formed, the isolation column 140 can be placed in the second state. When the isolation column 140 is in the second state, since it no longer has the shape of an overhang structure with a width at the top and a narrowness at the bottom, it no longer has the ability to separate film layers, thereby avoiding the problem of being separated when forming other film layers. The present application provides an isolation column 140 with two state changes, thereby ensuring the uniformity of subsequent film formation while implementing a maskless evaporation process for the light-emitting unit 130, improving the stability of the isolation column 140 structure, and thus improving the quality of the display panel 100.

[0051] The isolation column 140 has a first state and a second state, and can switch between the first state and the second state, and can only be in either the first state or the second state at the same time. It is understood that the isolation column 140 can be converted from the first state to the second state or from the second state to the first state under different conditions.

[0052] Specifically, the isolation column 140 is formed of a vertically oriented liquid crystal elastic material, and the side of the isolation column 140 away from the base substrate 110 is irradiated with ultraviolet light so that the isolation column 140 is in a first state, and the side of the isolation column 140 away from the base substrate 110 is irradiated with visible light so that the isolation column 140 is in a second state.

[0053] Liquid crystal elastic materials include liquid crystal elastomers (LCEs). Liquid crystal elastomers (LCEs) are polymer materials composed of non-crosslinked liquid crystal polymers that have been moderately crosslinked and exhibit elasticity in either the isotropic or liquid crystal state. LCEs combine the anisotropy of liquid crystals with the rubbery elasticity of polymer networks, resulting in excellent external field responsiveness, molecular synergy, and elasticity. LCEs can undergo shape changes in response to external stimuli such as electric fields, temperature, and light by altering the arrangement of mesogens, or even by undergoing a phase transition from a liquid crystal phase to an isotropic phase.

[0054] Taking light as an example, photoresponsive polymers typically contain molecules or functional groups (such as azobenzene groups) that absorb light energy. In response to light, they undergo chemical or physical reactions, resulting in a series of structural and morphological changes, thereby exhibiting specific functions. This principle involves converting light energy into mechanical energy by inducing shape changes in macroscopic objects, a process also known as photodeformation.

[0055] Figure 3 This is a schematic diagram of the photoexpansion of the isolation column of the present application, see Figure 3 As shown, liquid crystal elastomers also include azobenzene mesogens, and the derivatives of azobenzene are the most widely studied type of photoresponsive groups. For example, the film of parallel-oriented azobenzene mesogens at 360nm (5 to 20 ) will bend along the arrangement direction of the liquid crystal unit toward the incident light under the irradiation of ultraviolet light of 540nm (10 to 30 ) ), the film returns to its original flat state. The principle is that at a wavelength of approximately 360nm, the molar absorption coefficient of azobenzene is high, and 99% of the photons are absorbed by the azobenzene layer less than 1μm thick on the surface. This means that only the surface of the film undergoes photoinduced contraction, while the rest of the film remains unchanged because it is largely unaffected by the UV light. As a result, the film bends due to internal stress. When the bent film is exposed to visible light, the cis-azobenzene returns to its trans state, and the film returns to its original flat state. Similarly, films with vertically oriented azobenzene mesogens exhibit the opposite effect. The azobenzene mesogens in these films are arranged perpendicular to the film surface. The curved cis-azobenzene produced by UV light causes the film surface to expand isotropically, causing the film to bend in the exact opposite direction.

[0056] Therefore, in this embodiment, a vertically oriented liquid crystal elastomer material is used. The azobenzene liquid crystal unit is vertically oriented so that the side of the isolation column 140 away from the base substrate 110 is irradiated with ultraviolet light, and the width of the isolation column 140 away from the base substrate 110 gradually increases, that is, it is in a first state. The side of the isolation column 140 away from the base substrate 110 is irradiated with visible light, so that the width of the isolation column 140 away from the base substrate 110 gradually shrinks, that is, it is in a second state.

[0057] It should be understood that, as defined herein, when the isolation column 140 is in the second state, the width of the isolation column 140 on the side away from the substrate 110 is less than or equal to the width of the isolation column 140 on the side closer to the substrate 110. The width of the isolation column 140 on the side away from the substrate 110 referred to herein refers to the portion of the thin film of vertically oriented azobenzene mesogens that does not absorb photons or undergo photocontraction. For example, when the second state of the isolation column 140 is uniformly wide from top to bottom, the first state of the isolation column 140 is a shape where the upper portion is wider than the lower portion after photoinduction expansion, forming a shape similar to an inverted trapezoid. When the second state of the isolation column 140 is a right trapezoid with a narrower top and wider bottom, the isolation column 140 in the first state has a shape with a wide top and narrower middle, providing a barrier function, and the width of the upper portion may be greater than the lower portion. The upper portion mentioned above is the portion that undergoes photoinduction expansion.

[0058] Specifically, the light emitting unit 130 includes a bottom electrode 131 , a light emitting functional layer 132 and a top electrode 133 . In this embodiment, the isolation column 140 has an overhanging shape that is wide at the top and narrow at the bottom, so that the isolation column 140 has a partitioning capability and is mainly used to form the light emitting functional layer 132 .

[0059] When the light-emitting unit 130 is formed, the isolation column 140 is in a first state, and is used to separate the light-emitting functional layers 132 of two adjacent light-emitting units 130 when in the first state; after the light-emitting functional layers 132 of the light-emitting unit 130 are formed, the isolation column 140 is in a second state.

[0060] In order to isolate the light-emitting functional layer 132 , the isolation column 140 needs to meet the condition that the upper portion of the expanded and deformed portion protrudes at least 5 μm beyond the lower portion when in the first state, so that the isolation column has a better isolation capability.

[0061] The light-emitting functional layer 132 generally includes a hole injection layer, a hole transport layer, an electron blocking layer, a light-emitting layer, a hole blocking layer, an electron transport layer, and an electron injection layer, which are stacked in sequence from the bottom electrode 131 to the top electrode 133. When forming the light-emitting functional layer 132, the above film layers are formed in steps and separated by isolation columns 140, so that the light-emitting functional layers 132 of two adjacent light-emitting units 130 are not connected. It is understood that the isolation columns 140 in this embodiment can isolate one or more layers of the light-emitting functional layer 132, such as the hole injection layer, the hole transport layer, the electron blocking layer, and the light-emitting layer, while the hole blocking layer, the electron transport layer, and the electron injection layer are not isolated. The design can be based on actual conditions.

[0062] Specifically, in the light-emitting unit 130, the bottom electrode 131 is arranged under the light-emitting functional layer 132, and the top electrode 133 is arranged on the light-emitting functional layer 132; the bottom electrodes 131 of multiple light-emitting units 130 are not connected to each other, and the top electrodes 133 of multiple light-emitting units 130 are connected to each other.

[0063] In which, when the top electrode 133 is formed, the isolation column 140 is in the second state, that is, the lower width of the isolation column 140 is greater than or equal to the upper width, so that the isolation column 140 no longer has isolation capability. When the top electrode 133 is formed, the top electrode 133 can no longer be isolated, so that the top electrodes 133 between different light-emitting units 130 are connected to each other.

[0064] In other words, in this embodiment, there is no need to consider the situation where the isolation column 140 has too strong isolation ability when it is in the first state, which will cause the top electrode 133 to be isolated. When the top electrode 133 is formed, the isolation column 140 is in the second state and no longer isolates the top electrode 133, so there is no need to connect the top electrode 133 by forming a metal layer in the overhanging structure.

[0065] Specifically, a groove 122 is provided on the pixel definition layer 120 , and the isolation column 140 is disposed in the groove 122 . The height of the isolation column 140 is greater than the depth of the groove 122 .

[0066] In this embodiment, recesses 122 are provided in pixel definition layer 120 primarily to prevent movement of isolation pillars 140. Since isolation pillars 140 may experience slight movement due to deformation during the transition between the first and second states, recesses 122 are provided in pixel definition layer 120 to serve as a base for isolation pillars 140. The pixel definition layer 120 can be made of either an inorganic or organic insulating material, with a thickness of approximately 0.5 μm to 1 μm.

[0067] In one specific embodiment, the groove 122 can be shaped as a groove with inwardly concave sidewalls, meaning that the width of the opening of the groove 122 gradually decreases along its opening direction. In other words, the sidewalls are inclined inward toward the opening of the groove 122. By providing the groove 122 with inwardly concave sidewalls, the isolation column 140 exhibits a trapezoidal structure, wider at the bottom and narrower at the top, in the second state. This increases the stability of the bottom of the isolation column 140. It should be understood that the bottom of the isolation column 140 is not photointensified, so it generally does not deform, but it is affected by the photointensification of the upper portion of the isolation column 140.

[0068] Figure 4 This is a schematic diagram of another isolation column of the present application, see Figure 4 As shown in FIG. 1 , in a specific embodiment, the isolation column 140 can be divided into three parts: an upper part, a lower part, and a bottom part. When the isolation column 140 is in the second state, the width of the upper part and the lower part of the isolation column 140 are the same, but the shape of the bottom part is a regular trapezoid. When the isolation column 140 changes from the second state to the first state, the upper part of the isolation column 140 gradually expands, making the width of the upper part larger than the width of the lower part, thereby forming a suspended isolation column 140 with a partitioning ability. Figure 4 As shown, when the isolation column 140 is in the first state, the upper portion is an inverted trapezoidal shape, the lower portion is a rectangle, and the bottom portion is a regular trapezoidal shape. In this case, when the isolation column 140 is in the first state, the width of the isolation column 140 away from the base substrate 110 is greater than the width of the isolation column 140 close to the base substrate 110, which means that the width of the upper portion is greater than the width of the lower portion, that is, the side of the isolation column 140 close to the base substrate 110 refers to the position of the lower portion.

[0069] The depth of the groove 122 needs to be smaller than the thickness of the isolation column 140 . The depth of the groove 122 should be less than or equal to half the thickness of the pixel definition layer 120 , so that the stability of the pixel definition layer 120 is higher.

[0070] It will be appreciated that in this embodiment, the UV and visible light exposures are directed to the upper portion of the spacer column 140, specifically, the side of the upper portion of the spacer column 140 facing away from the substrate 110. Under the UV light, the upper portion undergoes photoinduced expansion, while under the visible light, the upper portion recovers. When not exposed to UV light, the spacer column 140 maintains the second state.

[0071] Figure 5 This is a schematic diagram of another display panel of the present application, see Figure 5 As shown, considering that the finished display panel 100 is exposed to natural light when displaying, there is a risk that some ultraviolet light may irradiate the isolation column 140, causing the isolation column 140 to transition from the second state to the first state. For example, when the ultraviolet light is stronger than visible light, the isolation column is more likely to be in the first state. Therefore, after forming the light-emitting unit 130, a light-shielding layer 150 can be provided above the isolation column 140.

[0072] Specifically, the display panel 100 further includes a light shielding layer 150, which is disposed on the isolation pillars 140. The light shielding layer 150 is used to prevent ultraviolet light or visible light from entering the isolation pillars 140. The main function of the light shielding layer 150 is to prevent light (including ultraviolet light and visible light) from entering the upper portion of the isolation pillars 140. Different light shielding layers 150 can be designed for different display panels 100.

[0073] For example, when using a COE (Color on Encapsulation) display panel 100, which utilizes a display technology that replaces traditional polarizers by directly integrating a color filter (CF) onto a thin-film encapsulation layer, a black matrix disposed within the color filter can be used as the light-shielding layer 150 in this embodiment. However, it is worth noting that, because an encapsulation layer is present between the color filter and the isolation pillars 140, the width of the black matrix in the area where the isolation pillars 140 are located should be slightly larger than that of the isolation pillars 140, and should be at least 2μm. The black matrix can effectively absorb ultraviolet light, thereby reducing the impact of ambient light on the display panel 100.

[0074] For example, when a display panel 100 using a circular polarizer is used, it is necessary to additionally provide a light shielding layer 150 above the isolation column 140. For example, it may be a black light absorbing layer or a reflective layer to prevent light from entering the interior of the isolation column 140. The light shielding layer 150 may be provided on the top electrode 133. The isolation column 140 is generally provided with a full-surface top electrode 133 so that different light-emitting units 130 can share a common electrode. Of course, the light shielding layer 150 may also be provided before the top electrode 133 is formed. When the isolation column 140 is in the second state, the light shielding layer 150 is formed on the isolation column 140 so that the light shielding layer 150 is formed between the isolation column 140 and the top electrode 133.

[0075] Figure 6 is a schematic diagram of a method for manufacturing a display panel of the present application, Figure 7 This is a schematic diagram of the manufacturing process of the display panel of this application, see Figures 6 and 7 As shown, the present application also discloses a method for manufacturing a display panel, which comprises the following steps:

[0076] S110: providing a substrate;

[0077] S120: forming a pixel definition layer on the base substrate and forming a plurality of opening areas;

[0078] S130: forming isolation columns on the pixel definition layer;

[0079] S140: When the isolation column is in the first state, forming a plurality of light-emitting units in the plurality of opening areas; and

[0080] S150: After the light emitting unit is formed, the isolation column is in a second state.

[0081] In which, the isolation column has a first state and a second state. When the isolation column is in the first state, the width of the isolation column away from the base substrate is greater than the width of the isolation column close to the base substrate; when the isolation column is in the second state, the width of the isolation column away from the base substrate is less than or equal to the width of the isolation column close to the base substrate.

[0082] In steps S140 and S150 , it is necessary to illuminate the side of the isolation pillar away from the base substrate so that the isolation pillar is in the first state or the second state.

[0083] In this embodiment, spacers are formed using a liquid crystal elastic material on the pixel definition layer. When exposed to ultraviolet light, the side of the spacers facing the light expands and deforms, resulting in the upper and lower portions of the spacers assuming an inverted trapezoidal shape, wider at the top and narrower at the bottom. This provides a barrier function. When forming light-emitting units, the spacers in their first state can be used to isolate the film layers of the light-emitting units, allowing the film layers of two adjacent light-emitting units to be independently configured without etching. A redundant layer of this film layer may also form above the spacers, which can be subsequently removed by etching, or it can be retained. By providing the spacers with a certain height, the redundant layer above the spacers prevents contact with the film layers of the light-emitting units in the opening area, even in the second state. After the light-emitting units are formed, the spacers are irradiated with visible light to return to their second state. Subsequent film layer processes, such as the encapsulation layer, can be completed at this point. This results in a smoother encapsulation structure and improved encapsulation performance. It is worth mentioning that when forming the isolation column, the isolation column can be placed in the second state. When the light-emitting unit needs to be formed, the isolation column is briefly placed in the first state. After the light-emitting unit is formed, the isolation column is restored to the second state.

[0084] Specifically, the step S120 includes:

[0085] S121: forming a patterned bottom electrode of the light-emitting unit on the base substrate;

[0086] S122: forming a pixel definition layer on the bottom electrode, and forming a plurality of opening areas, wherein the bottom electrode is exposed from the opening areas.

[0087] The light-emitting unit generally includes a bottom electrode, a light-emitting functional layer, and a top electrode, all of which are formed in separate steps. The bottom electrode generally needs to be connected to the thin-film transistor in the pixel driving layer, and the electrode needs to be exposed from the opening area to ensure direct contact with the light-emitting functional layer during the subsequent formation of the light-emitting functional layer.

[0088] The step S130 includes:

[0089] At S131: forming a groove on the pixel definition layer;

[0090] At S132 : forming an isolation column in a second state in the groove.

[0091] In this embodiment, a groove is formed on the pixel definition layer by etching. The groove can be any of the grooves in the above embodiments. The main function of the groove is to accommodate and fix the isolation column to prevent the isolation column from shifting.

[0092] The steps of S140 include:

[0093] S141: irradiating a side of the isolation pillar away from the base substrate with ultraviolet light so that the isolation pillar is in a first state;

[0094] S142: forming a light-emitting functional layer of the light-emitting unit, and using the isolation column to isolate the light-emitting functional layers in the plurality of opening areas.

[0095] In this embodiment, the isolation column mainly acts on the light-emitting functional layer to isolate the light-emitting functional layer. When different light-emitting units emit different colors, the materials of the light-emitting functional layers corresponding to the light-emitting units of different colors are also different and need to be formed in different steps.

[0096] The steps of S150 include:

[0097] S151: After the light-emitting functional layer of the light-emitting unit is formed, irradiating a side of the isolation column away from the base substrate with visible light so that the isolation column is in a second state;

[0098] S152: forming a top electrode of the light-emitting unit.

[0099] The spacers are formed of a vertically oriented liquid crystal elastic material. The specific materials are described in the above embodiments and will not be described in detail here. After forming the top electrode of the light-emitting unit, the process also includes forming an encapsulation layer, a color filter, or a circular polarizer to complete the display panel.

[0100] Figure 8 is a schematic diagram of the display device of this application, see Figure 8 As shown, the present application also discloses a display device, which includes a driving circuit 210 and a display panel 100. The display panel 100 can be the display panel 100 in any of the above embodiments, wherein the driving circuit 210 is used to drive the display panel 100 to display.

[0101] It should be noted that the inventive concept of this application can form a large number of embodiments, but the length of the application document is limited and it is impossible to list them one by one. Therefore, under the premise of no conflict, the various embodiments or technical features described above can be arbitrarily combined to form new embodiments. After the various embodiments or technical features are combined, the original technical effects will be enhanced.

[0102] The above content is a further detailed description of the present application in conjunction with specific optional implementation methods, and the specific implementation of the present application cannot be considered to be limited to these descriptions. For ordinary technicians in the technical field to which the present application belongs, they can make several simple deductions or substitutions without departing from the concept of the present application, which should be considered to fall within the scope of protection of the present application.

Claims

1. A display panel, characterized in that: include: substrate; A pixel definition layer is provided on the base substrate and is formed with a plurality of opening areas; A plurality of light-emitting units are provided on the base substrate and are respectively located in the plurality of opening areas; as well as An isolation column, provided on the pixel definition layer, for isolating two adjacent light-emitting units when forming a light-emitting unit; Wherein, when the isolation column is in the first state, the width of the isolation column at a side away from the base substrate is greater than the width of the isolation column at a side close to the base substrate; When the isolation column is in the second state, the width of the isolation column at a side away from the base substrate is less than or equal to the width of the isolation column at a side close to the base substrate; When the isolation column is in the first state, it is used to separate two adjacent light-emitting units when forming the light-emitting units.

2. The display panel according to claim 1, wherein: The isolation column is formed of a vertically oriented liquid crystal elastic material. The side of the isolation column away from the base substrate is irradiated with ultraviolet light so that the isolation column is in a first state, and the side of the isolation column away from the base substrate is irradiated with visible light so that the isolation column is in a second state.

3. The display panel according to claim 2, wherein: The light-emitting unit includes a light-emitting functional layer. When the light-emitting unit is formed, the isolation column is in a first state, and is used to isolate the light-emitting functional layers of two adjacent light-emitting units when in the first state; after the light-emitting functional layer of the light-emitting unit is formed, the isolation column is in a second state.

4. The display panel according to claim 3, wherein: The light-emitting unit further includes a bottom electrode and a top electrode, wherein the bottom electrode is arranged under the light-emitting functional layer, and the top electrode is arranged on the light-emitting functional layer; The bottom electrodes of the plurality of light-emitting units are not connected to each other, and the top electrodes of the plurality of light-emitting units are connected to each other; Wherein, when the top electrode is formed, the isolation column is in the second state.

5. The display panel according to claim 2, wherein: A groove is provided on the pixel definition layer, the isolation column is provided in the groove, and the height of the isolation column is greater than the depth of the groove.

6. The display panel according to claim 5, wherein: The display panel further includes a light shielding layer, which is disposed on the isolation column and is used to prevent the ultraviolet light or visible light from entering the isolation column.

7. A method for manufacturing a display panel, characterized in that: Including steps: providing a substrate; forming a pixel definition layer on the base substrate and forming a plurality of opening areas; forming isolation columns on the pixel definition layer; When the isolation column is in the first state, a plurality of light-emitting units are respectively formed in the plurality of opening areas; as well as After the light emitting unit is formed, the isolation column is in a second state; The isolation column has a first state and a second state. When the isolation column is in the first state, the width of the isolation column at a side away from the base substrate is greater than the width of the isolation column at a side close to the base substrate. When the isolation column is in the second state, the width of the isolation column at a side away from the base substrate is less than or equal to the width of the isolation column at a side close to the base substrate; When the isolation column is in the first state, it is used to separate two adjacent light-emitting units.

8. The method for manufacturing a display panel according to claim 7, wherein: The step of forming a pixel definition layer on the base substrate and forming a plurality of opening areas includes: forming a patterned bottom electrode of the light-emitting unit on the base substrate; forming a pixel definition layer on the bottom electrode and forming a plurality of opening areas, wherein the bottom electrode is exposed from the opening areas; When the isolation pillar is in the first state, the step of forming a plurality of light-emitting units in the plurality of opening regions respectively includes: irradiating the isolation pillar with ultraviolet light on a side away from the base substrate so that the isolation pillar is in a first state; forming a light-emitting functional layer of the light-emitting unit, and using the isolation column to isolate the light-emitting functional layers in the plurality of opening areas; The step of placing the isolation column in the second state after the light emitting unit is formed includes: After the light-emitting functional layer of the light-emitting unit is formed, irradiating the isolation column with visible light on a side away from the base substrate so that the isolation column is in a second state; forming a top electrode of the light-emitting unit; Wherein, the isolation column is formed by vertically oriented liquid crystal elastic material.

9. The method for manufacturing a display panel according to claim 7, wherein: The step of forming isolation columns on the pixel definition layer includes: forming a groove on the pixel definition layer; forming an isolation column in the second state in the groove; Wherein, the height of the isolation column in the second state is greater than the depth of the groove.

10. A display device, characterized in that: The device comprises a driving circuit and the display panel according to any one of claims 1 to 6, wherein the driving circuit is used to drive the display panel to display.

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