Imaging system and method for detecting axial positioning of an aperture stop, and lithographic apparatus comprising the imaging system
By detecting the mark on the marking unit of the aperture diaphragm through the objective lens and the camera, the problem of calibrating the position of the illumination aperture diaphragm is solved, and high-precision automatic detection and calibration are achieved, ensuring the lighting quality in the semiconductor manufacturing process.
Patent Information
- Application Number
- CN202510991122.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-18
- Publication Date
- 2025-10-03
- Estimated Expiration
- 2045-07-18
AI Technical Summary
Existing technologies are unable to verify and calibrate in real time whether the illumination aperture stop is located at the focal plane of the focusing lens, resulting in an inability to guarantee the performance of the illumination system and affecting the process effects of semiconductor manufacturing.
The objective lens and camera are used to detect the marks on the marking unit of the aperture stop. The axial positioning of the aperture stop is determined through image analysis and calibration instructions are generated to achieve automatic detection and fast calibration.
It realizes high-precision automated axial positioning detection of the aperture stop, ensuring good lighting conditions and process effects during semiconductor manufacturing.