Display panel, preparation method thereof and display device

Abstract

The embodiment of the invention provides a display panel, a preparation method thereof and a display device. The display panel includes: a substrate; an isolation structure; the isolation structure encloses a plurality of isolation openings and comprises a first isolation part and a second isolation part, the first isolation part is located on the side, away from the substrate, of the second isolation part, the second isolation part comprises a first surface, a second surface and a side wall, the first surface is located on the side, away from the substrate, of the second surface, and the first surface and the second surface are connected through the side wall; the orthographic projection of the first surface on the substrate is located in the orthographic projection range of the first isolation part on the substrate; the orthographic projection of the first surface on the substrate is located in the orthographic projection range of the second surface on the substrate; in the isolation structure surrounding the first isolation opening, the included angle between the side wall and the second surface is a first included angle; in the isolation structure surrounding the second isolation opening, the included angle between the side wall and the second surface is a second included angle; the first angle is larger than the second angle.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel, a method for manufacturing the same, and a display device. Background Art

[0002] Organic Light Emitting Diode (OLED) display technology is considered the most promising new display technology for the next generation. Compared with liquid crystal display technology, OLED display technology has advantages such as low energy consumption, low cost, self-luminescence, wide viewing angle, and fast response speed.

[0003] Traditionally, pixel patterning is achieved using a fine metal mask (FMM) during the production of OLED display panels. FMM technology is mature and boasts extensive mass production experience. However, it also suffers from limitations such as limited precision and high cost. FMM-free technology eliminates the limitations of traditional OLED processes on display size, resolution, and other performance characteristics, offering the advantages of high performance, full-scale scalability, and agile delivery. Patents CN118251982A, CN115666161A, CN116648095A, CN117062489A, CN118678742A, CN118785761A, CN115224220A, CN118678729A, CN118660529A, and CN118660589A describe FMM-free technology for reference.

[0004] However, due to the limitations of related technologies, current display panels have a low yield problem and still cannot meet the demand well. Summary of the Invention

[0005] In order to overcome the technical problems mentioned in the above technical background, embodiments of the present application provide a display panel, a method for manufacturing the same, and a display device.

[0006] In a first aspect, the present application provides a display panel, comprising: substrate; An isolation structure is located on one side of a substrate; the isolation structure encloses a plurality of isolation openings, the plurality of isolation openings including a first isolation opening and a second isolation opening; the isolation structure includes a first isolation portion and a second isolation portion, the first isolation portion is located on a side of the second isolation portion facing away from the substrate, the second isolation portion includes a first surface, a second surface and a sidewall, the first surface is located on a side of the second surface facing away from the substrate, and the first surface and the second surface are connected by the sidewall; the orthographic projection of the first surface on the substrate is located within the orthographic projection range of the first isolation portion on the substrate; the orthographic projection of the first surface on the substrate is located within the orthographic projection range of the second surface on the substrate; in the isolation structure enclosing the first isolation opening, the angle between the sidewall and the second surface is a first angle; in the isolation structure enclosing the second isolation opening, the angle between the sidewall and the second surface is a second angle; the first angle is greater than the second angle; A plurality of light emitting devices include a first light emitting device and a second light emitting device, at least part of the first light emitting device is located in the first isolation opening, and at least part of the second light emitting device is located in the second isolation opening.

[0007] In one embodiment, in the isolation structure surrounding the first isolation opening, the distance that the first isolation portion extends from the first surface is a first distance; in the isolation structure surrounding the second isolation opening, the distance that the first isolation portion extends from the first surface is a second distance, and the first distance is less than or equal to the second distance; Preferably, in the isolation structure surrounding the first isolation opening, the distance that the first isolation portion extends from the second surface is a third distance; in the isolation structure surrounding the second isolation opening, the distance that the first isolation portion extends from the second surface is a fourth distance, and the third distance is greater than or equal to the fourth distance; Preferably, in the isolation structure surrounding the first isolation opening, the first isolation portion extends out of the second surface; and in the isolation structure surrounding the second isolation opening, the second surface extends out of the first isolation portion.

[0008] In one embodiment, the first light-emitting device includes a first light-emitting functional layer and a first electrode layer located in the first isolation opening, wherein the first electrode layer is located on a side of the first light-emitting functional layer facing away from the substrate; The second light-emitting device includes a second light-emitting functional layer and a second electrode layer located in the second isolation opening, wherein the second electrode layer is located on a side of the second light-emitting functional layer facing away from the substrate; The thickness of the first light-emitting functional layer is less than the thickness of the second light-emitting functional layer; Preferably, the first light emitting device includes a blue light emitting device, and the second light emitting device includes a green light emitting device.

[0009] In one embodiment, the display panel further includes a first encapsulation layer, the first encapsulation layer includes a plurality of encapsulation parts, and the plurality of encapsulation parts include a first encapsulation part and a second encapsulation part; The first encapsulation portion is located on a side of the first light-emitting device facing away from the substrate, and an orthographic projection of the first isolation opening on the substrate is located within the orthographic projection of the first encapsulation portion on the substrate; a portion of the first encapsulation portion is located on a side of the first isolation portion facing away from the substrate, and a distance between the first encapsulation portion and the first isolation portion is a fifth distance; The second encapsulation portion is located on a side of the second light-emitting device facing away from the substrate, and an orthographic projection of the second isolation opening on the substrate is located within the orthographic projection of the second encapsulation portion on the substrate; a portion of the second encapsulation portion is located on a side of the isolation structure facing away from the substrate, and a distance between the second encapsulation portion and the first isolation portion is a sixth distance; The fifth distance is smaller than the sixth distance.

[0010] In one embodiment, an orthographic projection area of ​​the first isolation opening on the substrate is larger than an orthographic projection area of ​​the second isolation opening on the substrate.

[0011] In one embodiment, the plurality of isolation openings further include a third isolation opening, and in the isolation structure surrounding the third isolation opening, an angle between the sidewall and the second surface is a third angle; The second angle is greater than the third angle.

[0012] In one embodiment, in the isolation structure surrounding the third isolation opening, the distance that the first isolation portion extends from the first surface is the seventh distance; in the isolation structure surrounding the second isolation opening, the distance that the first isolation portion extends from the first surface is the second distance, and the second distance is less than or equal to the seventh distance; Preferably, in the isolation structure surrounding the second isolation opening, the distance that the first isolation portion extends from the second surface is the fourth distance; in the isolation structure surrounding the third isolation opening, the distance that the first isolation portion extends from the second surface is the eighth distance, and the fourth distance is greater than or equal to the eighth distance; Preferably, in the isolation structure surrounding the second isolation opening, the first isolation portion extends out of the second surface; in the isolation structure surrounding the third isolation opening, the second surface extends out of the first isolation portion; Preferably, in the isolation structure surrounding the second isolation opening, the distance the second surface extends from the first isolation portion is the ninth distance; in the isolation structure surrounding the third isolation opening, the distance the second surface extends from the first isolation portion is the tenth distance; the tenth distance is greater than or equal to the ninth distance.

[0013] In one embodiment, the plurality of light-emitting devices include a third light-emitting device, the third light-emitting device including a third light-emitting functional layer and a third electrode layer located in the third isolation opening, the third electrode layer being located on a side of the third light-emitting functional layer facing away from the substrate; The second light-emitting device includes a second light-emitting functional layer and a second electrode layer located in the second isolation opening, wherein the second electrode layer is located on a side of the second light-emitting functional layer facing away from the substrate; The thickness of the second light-emitting functional layer is less than that of the third light-emitting functional layer; Preferably, the second light emitting device includes a green light emitting device, and the third light emitting device includes a red light emitting device.

[0014] In one embodiment, the display panel further includes a first encapsulation layer, the first encapsulation layer includes a plurality of encapsulation parts, and the plurality of encapsulation parts include a second encapsulation part and a third encapsulation part; The second encapsulation portion is located on a side of the second light-emitting device facing away from the substrate, and an orthographic projection of the second isolation opening on the substrate is located within the orthographic projection of the second encapsulation portion on the substrate; a portion of the second encapsulation portion is located on a side of the isolation structure facing away from the substrate, and a distance between the second encapsulation portion and the first isolation portion is a sixth distance; The third encapsulation portion is located on a side of the third light-emitting device facing away from the substrate, and an orthographic projection of the third isolation opening on the substrate is located within the orthographic projection of the third encapsulation portion on the substrate; a portion of the third encapsulation portion is located on a side of the first isolation portion facing away from the substrate, and a distance between the third encapsulation portion and the first isolation portion is an eleventh distance; The sixth distance is smaller than the eleventh distance.

[0015] In one embodiment, the orthographic projection area of ​​the first isolation opening on the substrate is larger than the orthographic projection area of ​​the second isolation opening on the substrate, and the orthographic projection area of ​​the first isolation opening on the substrate is larger than the orthographic projection area of ​​the third isolation opening on the substrate.

[0016] In one embodiment, the isolation structure further includes a third isolation portion located on a side of the second isolation portion close to the substrate, and an orthographic projection of the second isolation portion on the substrate is located within the orthographic projection of the third isolation portion on the substrate; Preferably, in the isolation structure surrounding the first isolation opening, the third isolation portion extends from the second surface by a twelfth distance; in the isolation structure surrounding the second isolation opening, the third isolation portion extends from the second surface by a thirteenth distance; the twelfth distance is smaller than the thirteenth distance.

[0017] A second aspect of the present application provides a method for preparing a display panel, comprising: preparing a fourth electrode layer on one side of the substrate; sequentially preparing a second isolation material layer and a first isolation material layer on a side of the fourth electrode layer facing away from the substrate; The first isolation material layer and the second isolation material layer are patterned to obtain a first isolation opening and a first middle isolation opening; the fourth electrode layer is at least partially exposed in the first isolation opening and the first middle isolation opening; Sequentially preparing a first light-emitting functional material layer and a first electrode material layer in the first isolation opening, with portions of the first light-emitting functional material layer and the first electrode material layer being located in the first middle isolation opening; The first light-emitting functional material layer and the first electrode material layer are subjected to a first etching process to remove the first light-emitting functional material layer and the first electrode material layer located in the first middle isolation opening, and retain the first light-emitting functional material layer and the first electrode material layer located in the first isolation opening, thereby obtaining a first light-emitting device, a second isolation portion, a first isolation portion, and a second isolation opening, wherein the first isolation portion and the second isolation portion constitute an isolation structure; the second isolation portion comprises a first surface, a second surface, and a sidewall, the first surface being located on a side of the second surface facing away from the substrate, and the first surface and the second surface being connected via the sidewall; the orthographic projection of the first surface on the substrate is located within the orthographic projection range of the first isolation portion on the substrate; the orthographic projection of the first surface on the substrate is located within the orthographic projection range of the second surface on the substrate; in the isolation structure surrounding the first isolation opening, the angle between the sidewall and the second surface is a first angle; in the isolation structure surrounding the second isolation opening, the angle between the sidewall and the second surface is a second angle; and the first angle is greater than the second angle; A second light-emitting functional layer and a second electrode layer are sequentially prepared in the second isolation opening to obtain a second light-emitting device.

[0018] In one embodiment, the first isolation material layer and the second isolation material layer are patterned to obtain a first isolation opening, a first middle isolation opening, and a second middle isolation opening; Preferably, in the step of sequentially preparing the first light-emitting functional material layer and the first electrode material layer in the first isolation opening, parts of the first light-emitting functional material layer and the first electrode material layer are located in the first middle isolation opening and the second middle isolation opening; Preferably, the step of performing the first etching process on the first light-emitting functional material layer and the first electrode material layer further includes removing the first light-emitting functional material layer and the first electrode material layer located in the second intermediate isolation opening to obtain a third intermediate isolation opening; Preferably, sequentially preparing the second light-emitting functional layer and the second electrode layer in the second isolation opening includes: Sequentially preparing a second light-emitting functional material layer and a second electrode material layer in the second isolation opening, with portions of the second light-emitting functional material layer and the second electrode material layer being located in the third middle isolation opening; The second light-emitting functional material layer and the second electrode material layer are subjected to a second etching process to remove the second light-emitting functional material layer and the second electrode material layer located in the third middle isolation opening, and retain the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening to obtain a second light-emitting device and a third isolation opening. In the isolation structure surrounding the third isolation opening, the angle between the side wall and the second surface is the third angle; the second angle is greater than the third angle.

[0019] In one embodiment, the step of sequentially preparing a first light-emitting functional material layer and a first electrode material layer in the first isolation opening includes: Sequentially preparing a first light-emitting functional material layer, a first electrode material layer, and a first encapsulation material layer in the first isolation opening; Preferably, performing a first etching process on the first light-emitting functional material layer and the first electrode material layer includes: performing a first etching process on the first light-emitting functional material layer, the first electrode material layer and the first encapsulation material layer to obtain a first light-emitting device and a first encapsulation portion, wherein a portion of the first encapsulation portion is located on a side of the first isolation portion facing away from the substrate, and a distance between the first encapsulation portion and the first isolation portion is a fifth distance; Preferably, sequentially preparing the second light-emitting functional layer and the second electrode layer in the second isolation opening includes: A second light-emitting functional material layer and a second electrode material layer are sequentially formed in the second isolation opening, wherein the thickness of the second light-emitting functional material layer is greater than the fifth distance; at an edge position of the first packaging portion, the second electrode material layer continuously extends from a side of the first packaging portion facing away from the substrate to a side of the first isolation portion facing away from the substrate; The second light-emitting functional material layer and the second electrode material layer are subjected to a second etching process to retain the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening to obtain a second light-emitting device.

[0020] A third aspect of the present application provides a display device, comprising the aforementioned display panel, or comprising a display panel prepared by the aforementioned preparation method.

[0021] In the display panel provided by the embodiment of the present application, in the isolation structure surrounding the first isolation opening, the angle between the side wall and the second surface is the first angle; in the isolation structure surrounding the second isolation opening, the angle between the side wall and the second surface is the second angle; when the first angle is greater than the second angle, the film layer of the second light-emitting device, such as the cathode film layer of the second light-emitting device, is more likely to overlap with the side wall of the isolation structure and is conducive to obtaining a relatively large overlapping area, and the cathode climbing angle of the second light-emitting device is smaller, which is conducive to improving the continuity of the cathode film layer, improving the overlapping effect, improving the yield of the display panel, and reducing the power consumption of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without creative work.

[0023] Figure 1 This is one of the cross-sectional structural diagrams of a display panel in the related art.

[0024] Figure 2This is the second schematic diagram of the cross-sectional structure of a display panel in the related art.

[0025] Figure 3 Schematic diagram of the cross-sectional structure of a display panel in one embodiment of the present application.

[0026] Figure 4 This is a schematic diagram of the top view of the display panel in one embodiment of the present application.

[0027] Figure 5 This is one of the schematic cross-sectional structural diagrams of a display panel in another embodiment of the present application.

[0028] Figure 6 This is a second schematic cross-sectional structural diagram of a display panel in another embodiment of the present application.

[0029] Figure 7 This is the third schematic diagram of the cross-sectional structure of a display panel in another embodiment of the present application.

[0030] Figure 8 This is a fourth schematic diagram of the cross-sectional structure of a display panel in another embodiment of the present application.

[0031] Figure 9 This is the fifth schematic diagram of the cross-sectional structure of a display panel in another embodiment of the present application.

[0032] Figure 10 FIG. 1 is a flow chart of a method for manufacturing a display panel in one embodiment of the present application.

[0033] Figure 11 This is a structural schematic diagram of sequentially preparing a first light-emitting functional material layer and a first electrode material layer in a first isolation opening in an embodiment of the present application.

[0034] Figure 12 FIG. 1 is a schematic cross-sectional structural diagram of a display panel in another embodiment of the present application.

[0035] Figure 13 This is a structural diagram of sequentially preparing a second light-emitting functional layer, a second electrode layer, and a second packaging material layer in the second isolation opening in an embodiment of the present application.

[0036] Figure 14 FIG. 1 is a schematic cross-sectional structural diagram of a display panel in another embodiment of the present application. DETAILED DESCRIPTION To make the objectives, technical solutions, and advantages of the embodiments of the present application more clear, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Generally, the components of the embodiments of the present application described and shown in the drawings herein can be arranged and designed in various different configurations.

[0037] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application for protection, but merely represents selected embodiments of the present application. All other embodiments obtained by persons of ordinary skill in the art based on the embodiments in the present application without making any creative efforts shall fall within the scope of protection of the present application.

[0038] It should be noted that similar reference numerals and letters represent similar items in the following figures. Therefore, once an item is defined in one figure, it does not need to be further defined or explained in subsequent figures. It should be noted that different features in the embodiments of the present application can be combined with each other without conflict.

[0039] For ease of understanding, the drawings show mutually orthogonal X-axis, Y-axis, and Z-axis. The direction along the X-axis is referred to as the X-direction, the direction along the Y-axis is referred to as the Y-direction, and the direction along the Z-axis is referred to as the Z-direction. The Z-direction is the normal direction relative to the plane containing the X-direction and the Y-direction. In addition, the situation where various elements are viewed parallel to the plane containing the X-direction and the Y-direction is referred to as a top view. Alternatively, the planes in the X-direction and the Y-direction are parallel to the display surface of the display panel, and the Z-direction is parallel to the thickness direction of the display panel.

[0040] For certain elements, terms such as "upper" or "above" are sometimes used to describe the position of the element in the Z direction, while "lower" or "below" is used to describe the position of the element in the opposite direction. In addition, when terms such as "upper," "above," "lower," "below," and "relatively" are used to define the relative position of two elements, they include not only a state in which the two elements are directly connected, but also a state in which the two elements are separated by a gap or other elements. In addition, terms such as "first," "second," and "third" are used only to distinguish and describe, and should not be understood to indicate or imply relative importance.

[0041] The inventors of this application have found that when using the non-fine metal mask technology to prepare a display panel, referring to Figure 1 The cross-sectional structure diagram of the display panel shown in FIG. Figure 1Schematic diagram of the structure when the light-emitting device 300 has not yet been manufactured), the display panel includes an isolation structure 200, which is used to isolate the light-emitting functional layer of the light-emitting device 300, and the cathode layer of the light-emitting device 300 will also be isolated. The isolation structure 200 encloses a first isolation opening 211, a second isolation opening 212 and a third isolation opening 213. The isolation structure 200 includes a first isolation portion 201 and a second isolation portion 202. The first isolation portion 201 is located on the side of the second isolation portion 202 away from the substrate 100. The second isolation portion 202 includes a first surface 2021, a second surface 2022 and a sidewall 2023. The first surface 2021 is located on the side of the second surface 2022 away from the substrate 100. The sidewall 2023 is used to connect the first surface 2021 and the second surface 2022. Before preparing the light-emitting functional layer and the cathode layer of the light-emitting device 300, the first isolation portion 201 encloses the first isolation opening 211. 201 extends out of the first surface 201 by a distance L1, the first isolation portion 201 surrounding the second isolation opening 212 extends out of the first surface 201 by a distance L2, and the first isolation portion 201 surrounding the third isolation opening 203 extends out of the first surface 201 by a distance L3 are equal, and the angle α1 between the side wall 203 surrounding the first isolation opening 211 and the second surface 2022, the angle α2 between the side wall 203 surrounding the second isolation opening 212 and the second surface 2022, and the angle α3 between the side wall 203 surrounding the third isolation opening 203 and the second surface 2022 are equal. The light-emitting device 300 includes a first light-emitting device 310, a second light-emitting device 320, and a third light-emitting device 330. The first light-emitting device 310, the second light-emitting device 320, and the third light-emitting device 330 are prepared in this order. During the preparation of the first light-emitting device 310 in the first isolation opening 211, a wet etching process is used for patterning. At the same time, the second isolation opening 212 is etched, resulting in the first isolation portion 201 surrounding the second isolation opening 212 extending from the first surface 201 by a distance L2' greater than the distance L1. Similarly, after the second light-emitting device 320 is prepared, the first isolation portion 201 surrounding the third isolation opening 213 extends from the first surface 2021 by a distance L3' greater than the distance L2'. For details, please refer to Figure 2 The cross-sectional structure diagram of the display panel is shown. Because L3' is greater than L2' and L2' is greater than L1, the cathode layers of the second and third light-emitting devices 320 and 330, which are subsequently fabricated, are not easily overlapped with the isolation structure 200. Furthermore, the relationship between the angles α1, α2, and α3 remains α1 = α2 = α3, resulting in a large slope angle for the cathode layers of the second and third light-emitting devices 320 and 330, making the cathode layers of the second and third light-emitting devices 320 and 330 discontinuous, thereby reducing the yield of the display panel.

[0042] In view of this, the first aspect of the present application provides a display panel, referring to Figure 3 The cross-sectional structure diagram of the display panel shown in FIG. 1 includes a substrate 100 , an isolation structure 200 and a plurality of light-emitting devices 300 .

[0043] Optionally, the isolation structure 200 is located on one side of the substrate 100; the isolation structure 200 is surrounded by a plurality of isolation openings 210, and the plurality of isolation openings 210 include a first isolation opening 211 and a second isolation opening 212; the isolation structure 200 includes a first isolation portion 201 and a second isolation portion 202, the first isolation portion 201 is located on a side of the second isolation portion 202 away from the substrate 100, the second isolation portion 202 includes a first surface 2021, a second surface 2022 and a sidewall 2023, the first surface 2021 is located on a side of the second surface 2022 away from the substrate 100, and the first surface 2021 and the second surface 2022 are connected. The first surface 2021 is connected through the side wall 2023; the orthographic projection of the first surface 2021 on the substrate 100 is located within the orthographic projection range of the first isolation portion 201 on the substrate 100; the orthographic projection of the first surface 2021 on the substrate 100 is located within the orthographic projection range of the second surface 2022 on the substrate 100; in the isolation structure 200 enclosing the first isolation opening 211, the angle between the side wall 2023 and the second surface 2022 is a first angle β1; in the isolation structure 200 enclosing the second isolation opening 212, the angle between the side wall 2023 and the second surface 2022 is a second angle β2; the first angle β1 is greater than the second angle β2.

[0044] Optionally, the plurality of light emitting devices 300 include a first light emitting device 310 and a second light emitting device 320 , at least part of the first light emitting device 310 is located in the first isolation opening 211 , and at least part of the second light emitting device 320 is located in the second isolation opening 212 .

[0045] In one embodiment, the first light-emitting device 310 includes a first light-emitting functional layer 311 and a first electrode layer 312 located in the first isolation opening 211, and the first electrode layer 312 is located on the side of the first light-emitting functional layer 311 facing away from the substrate 100; the second light-emitting device 320 includes a second light-emitting functional layer 321 and a second electrode layer 322 located in the second isolation opening 212, and the second electrode layer 322 is located on the side of the second light-emitting functional layer 321 facing away from the substrate 100.

[0046] Illustratively, the first electrode layer 312 and the second electrode layer 322 are each independently a cathode.

[0047] It can be understood that the first angle β1 is greater than the second angle β2, that is, the slope of the side wall 2023 of the second isolation portion 202 surrounding the second isolation opening 212 is smaller than the slope of the side wall 2023 of the second isolation portion 202 surrounding the first isolation opening 211, so that the climbing angle of the second electrode layer 322 of the second light-emitting device 320 is relatively small, which is beneficial to improving the film continuity of the second electrode layer 322, so that the overlap effect of the second electrode layer 322 and the isolation structure 200 is better.

[0048] In one embodiment, referring to Figure 4 In the top view of the display panel shown, the orthographic projection area of ​​the first isolation opening 211 on the substrate 100 is larger than the orthographic projection area of ​​the second isolation opening 212 on the substrate 100. If the first angle β1 is equal to the second angle β2, the overlapping area between the second electrode layer 322 and the isolation structure 200 is smaller than the overlapping area between the first electrode layer 312 and the isolation structure 200, resulting in a larger overlapping resistance between the second electrode layer 322 and the isolation structure 200. Furthermore, the relatively large slope angle of the second electrode layer 322 reduces the continuity of the second electrode layer 322, further increasing the overlapping resistance between the second electrode layer 322 and the isolation structure 200. In the display panel of the embodiment of the present application, the first angle β1 is greater than the second angle β2, and the climbing angle of the second electrode layer 322 of the second light-emitting device 320 is relatively small, which is beneficial to improving the film continuity of the second electrode layer 322, and may increase the overlapping area between the second electrode layer 322 and the isolation structure 200, which is beneficial to reducing the overlapping resistance between the second electrode layer 322 and the isolation structure 200, and is beneficial to reducing the power consumption of the display panel, and almost no problems such as dark spots or dark spots will occur.

[0049] In the display panel provided in the embodiment of the present application, in the isolation structure 200 surrounding the first isolation opening 211, the angle between the side wall 2023 and the second surface 2022 is a first angle β1; in the isolation structure 200 surrounding the second isolation opening 212, the angle between the side wall 2023 and the second surface 2022 is a second angle β2; when the first angle β1 is greater than the second angle β2, the film layer of the second light-emitting device 320, for example, the cathode film layer of the second light-emitting device 320 is more easily overlapped with the side wall 2023 of the isolation structure 200 and is conducive to obtaining a relatively large overlapping area, and the cathode climbing angle of the second light-emitting device 320 is small, which is conducive to improving the continuity of the cathode film layer and improving the overlapping effect.

[0050] In one embodiment, in the isolation structure 200 surrounding the first isolation opening 211, the first isolation portion 201 extends from the first surface 2021 by a first distance D1; in the isolation structure 200 surrounding the second isolation opening 212, the first isolation portion 201 extends from the first surface 2021 by a second distance D2, and the first distance D1 is less than the second distance D2 (refer to Figure 3 ), or, the first distance D1 is equal to the second distance D2.

[0051] It should be noted that the distance that the first isolation portion 201 extends out of the first surface 2021 means that the orthographic projection of the first surface 2021 on the substrate 100 is located within the orthographic projection range of the first isolation portion 201 on the substrate 100, and the distance between the edge of the orthographic projection of the first surface 2021 on the substrate 100 and the edge of the orthographic projection of the first isolation portion 201 on the substrate 100 is the distance that the first isolation portion 201 extends out of the first surface 2021.

[0052] It can be understood that the first angle β1 is greater than the second angle β2, and the overlapping effect between the first electrode layer 312 of the first light-emitting device 310 and the side wall 2023 is not as good as the overlapping effect between the second electrode layer 322 of the second light-emitting device 320 and the side wall 2023. Therefore, when the first distance D1 is less than the second distance D2, it is beneficial to increase the overlapping area between the first electrode layer 312 and the side wall 2023, and improve the overlapping effect between the first electrode layer 312 and the side wall 2023.

[0053] For example, the first distance D1 is greater than the second distance D2, which can further improve the overlap effect between the second electrode layer 322 of the second light-emitting device 320 and the side wall 2023, but may cause poor overlap between the first electrode layer 312 of the first light-emitting device 310 and the side wall 2023.

[0054] Optionally, in the isolation structure 200 surrounding the first isolation opening 211, the distance from the first isolation portion 201 extending from the second surface 2022 is a third distance D3; in the isolation structure 200 surrounding the second isolation opening 212, the distance from the first isolation portion 201 extending from the second surface 2022 is a fourth distance D4, and the third distance D3 is greater than the fourth distance D4 (refer to Figure 5 ), or, the third distance D3 is equal to the fourth distance D4.

[0055] It should be noted that the distance that the first isolation portion 201 extends beyond the second surface 2022 refers to the distance that the orthographic projection of the second surface 2022 on the substrate 100 is within the orthographic projection of the first isolation portion 201 on the substrate 100, and the distance between the edge of the orthographic projection of the second surface 2022 on the substrate 100 and the edge of the orthographic projection of the first isolation portion 201 on the substrate 100 is the distance that the first isolation portion 201 extends beyond the second surface 2022. It is understood that the smaller the distance that the first isolation portion 201 extends beyond the second surface 2022, the more conducive it is to the overlap between the cathode and the isolation structure 200. For example, a third distance D3 greater than the fourth distance D4 facilitates an enhanced overlap between the second electrode layer 322 of the second light-emitting device 320 and the sidewall 2023.

[0056] Optionally, refer to Figure 6 In the cross-sectional structural diagram of the display panel shown, in the isolation structure 200 surrounding the first isolation opening 211, the first isolation portion 201 extends out of the second surface 2022; in the isolation structure 200 surrounding the second isolation opening 212, the second surface 2022 extends out of the first isolation portion 201. This helps to further increase the overlap area between the second electrode layer 322 of the second light-emitting device 320 and the side wall 2023, improve the continuity of the second electrode layer 322, and improve the overlap effect between the second electrode layer 322 and the side wall 2023. It should be noted that Figure 6 Only the main structures such as the isolation structure and the substrate are shown, which should not be understood as limiting the present application.

[0057] It can be understood that in the isolation structure 200 surrounding the second isolation opening 212, when the second surface 2022 extends out of the first isolation portion 201, the evaporation angle of the second light-emitting functional layer 321 of the second light-emitting device 320 can be adjusted so that the second light-emitting functional layer 321 does not overlap with the isolation structure 200.

[0058] It can be understood that in the isolation structure 200 surrounding the second isolation opening 212 , the second surface 2022 extending out of the first isolation portion 201 is more conducive to the overlap between the second electrode layer 322 and the sidewall 2023 .

[0059] It should be noted that when the first isolation portion 201 extends out from the second surface 2022, the orthographic projection of the second surface 2022 on the substrate 100 is located within the orthographic projection range of the first isolation portion 201 on the substrate 100; when the second surface 2022 extends out from the first isolation portion 201, the orthographic projection of the first isolation portion 201 on the substrate 100 is located within the orthographic projection range of the second surface 2022 on the substrate 100.

[0060] Optionally, the first light emitting device 310 includes a blue light emitting device, and the second light emitting device 320 includes a green light emitting device. The thickness of the first light emitting functional layer 311 is smaller than the thickness of the second light emitting functional layer 321 .

[0061] For example, the first light emitting device 310 and the second light emitting device 320 may be an organic light emitting diode (OLED) or a quantum dot electroluminescent device (QLED).

[0062] It is understood that the light emitted by the light-emitting functional layer needs to be reflected and transmitted by the electrodes to form interference. The interference enhancement effect is controlled by the thickness of the light-emitting functional layer to maximize the light intensity of the target wavelength. The wavelength of blue light (approximately 430 nm-480 nm) is shorter than that of green light (approximately 500 nm-560 nm). Based on the microcavity resonance conditions (the optical path difference is an integer multiple of half the wavelength), the total thickness of the light-emitting functional layer (including the light-emitting layer, charge transport layer, etc.) that matches the blue light resonance is less than the total thickness of the light-emitting functional layer (including the light-emitting layer, charge transport layer, etc.) that matches the green light resonance. This achieves interference enhancement of the blue light and improves luminous efficiency and color purity. In addition, the exciton diffusion length of materials emitting blue light (such as fluorescent or phosphorescent dyes) is shorter. A thinner light-emitting functional layer can reduce non-radiative recombination, which indirectly promotes thinner film layers in blue light-emitting devices.

[0063] In one embodiment, referring to Figure 7 The cross-sectional structural diagram of the display panel shown in FIG. 4 further includes a first encapsulation layer 400 . The first encapsulation layer 400 includes a plurality of encapsulation parts 410 . The plurality of encapsulation parts 410 include a first encapsulation part 411 and a second encapsulation part 412 .

[0064] The first packaging part 411 is located on the side of the first light-emitting device 310 away from the substrate 100, and the orthographic projection of the first isolation opening 211 on the substrate 100 is located within the range of the orthographic projection of the first packaging part 411 on the substrate 100; part of the first packaging part 411 is located on the side of the first isolation part 201 away from the substrate 100, and the distance between the first packaging part 411 and the first isolation part 201 is the fifth distance D5. Illustratively, when preparing the first light-emitting device 310, it is necessary to produce a whole layer of light-emitting functional material layer, first electrode material layer and first packaging material layer, and part of the light-emitting functional material layer, first electrode material layer and first packaging material layer are located on the side of the isolation structure 200 surrounding the first isolation opening 211 away from the substrate 100; then the light-emitting functional material layer, the first electrode material layer and the first packaging material layer are wet-etched to achieve patterning. During the wet etching process, the light-emitting functional material layer, the first electrode material layer and the first packaging material layer located on the side of the isolation structure 200 away from the substrate 100 are also etched, and part of the etching solution enters the side of the first packaging material layer close to the substrate 100 from the side wall of the first packaging material layer, and then etches the light-emitting functional material layer and the first electrode material layer, so that there is a gap between the obtained first packaging part 411 and the isolation structure 200 (or the first isolation part 201).

[0065] The second encapsulation portion 412 is located on a side of the second light-emitting device 320 facing away from the substrate 100. The orthographic projection of the second isolation opening 212 on the substrate 100 is located within the orthographic projection of the second encapsulation portion 412 on the substrate 100. A portion of the second encapsulation portion 412 is located on a side of the isolation structure 200 facing away from the substrate 100, and the distance between the second encapsulation portion 412 and the first isolation portion 201 is a sixth distance D6. The reason for the distance between the second encapsulation portion 412 and the first isolation portion 201 can be referred to as the reason for the distance between the first encapsulation portion 411 and the first isolation portion 201, and will not be further elaborated here.

[0066] For example, the thickness of the second light-emitting functional layer 321 of the second light-emitting device 320 is greater than the thickness of the first light-emitting functional layer 311 of the first light-emitting device 310. After the wet etching is completed, the distance between the first encapsulation portion 411 corresponding to the first light-emitting device 310 and the first isolation portion 201 is smaller than the distance between the second encapsulation portion 412 corresponding to the second light-emitting device 320 and the first isolation portion 201. Exemplarily, the fifth distance D5 is smaller than the sixth distance D6. For example, when preparing the light-emitting device 300, the first light-emitting device 310 can be prepared first, and then the second light-emitting device 320 can be prepared. When preparing the second light-emitting device 320, the entire layer of the second light-emitting functional material layer, the second electrode material layer and the second packaging material layer are prepared in sequence. The thickness of the second light-emitting functional material layer is greater than the thickness of the first light-emitting functional layer 311. The second light-emitting functional material layer can effectively cover the distance between the first packaging part 411 and the first isolation part 201 corresponding to the first light-emitting device 310, thereby making the second electrode material layer a continuous film layer, which can effectively protect the first light-emitting device 310 from damage by the etching solution during the wet etching process of the second light-emitting functional material layer, the second electrode material layer and the second packaging material layer, thereby reducing the display failure probability of the first light-emitting device 310 and improving the reliability of the display panel.

[0067] In one embodiment, the plurality of isolation openings 210 further include a third isolation opening 213. In the isolation structure 200 surrounding the third isolation opening 213, the angle between the sidewall 2023 and the second surface 2022 is a third angle β3; the second angle β2 is greater than the third angle β3. Optionally, the plurality of light-emitting devices 300 further include a third light-emitting device 330. The third light-emitting device 330 includes a third light-emitting functional layer 331 and a third electrode layer 332 located within the third isolation opening 213. The third electrode layer 332 is located on the side of the third light-emitting functional layer 331 facing away from the substrate 100. The third electrode layer 332 of the third light-emitting device 330 has a relatively small slope angle, which helps improve the film continuity of the third electrode layer 332 and potentially increases the overlap area between the third electrode layer 332 and the isolation structure 200. This helps reduce the overlap resistance between the third electrode layer 332 and the isolation structure 200, thereby reducing power consumption of the display panel and virtually eliminating problems such as dark spots or dark spots.

[0068] Illustratively, the third electrode layer 332 is a cathode.

[0069] It can be understood that the second angle β2 is greater than the third angle β3, that is, the slope of the side wall 2023 of the second isolation portion 202 surrounding the third isolation opening 213 is smaller than the slope of the side wall 2023 of the second isolation portion 202 surrounding the second isolation opening 212, so that the climbing angle of the third electrode layer 332 of the third light-emitting device 330 is relatively small, which is beneficial to improving the film continuity of the third electrode layer 332, so that the overlap effect between the third electrode layer 332 and the isolation structure 200 is better.

[0070] It is understood that when preparing the light-emitting devices 300, they can be prepared in the order of the first light-emitting device 310, the second light-emitting device 320, and the third light-emitting device 300. During wet etching and patterning, the light-emitting devices 300 prepared earlier will etch the isolation openings 210 corresponding to the light-emitting devices 300 prepared later. The etching effect on the isolation openings 210 corresponding to the light-emitting devices 300 prepared later in the order will be more severe. In the embodiment of the present application, the first angle β1 is greater than the second angle β2, and the second angle β2 is greater than the third angle β3. This can effectively ensure that the second electrode layer 322 of the second light-emitting device 320 has a better overlap with the isolation structure 200, and the third electrode layer 332 of the third light-emitting device 330 has a better overlap with the isolation structure 200, thereby improving the manufacturing yield of the display panel.

[0071] In one embodiment, the orthographic projection area of ​​the first isolation opening 211 on the substrate 100 is greater than the orthographic projection area of ​​the third isolation opening 213 on the substrate 100. If the first angle β1 is equal to the third angle β3, the overlapping area between the third electrode layer 332 and the isolation structure 200 is smaller than the overlapping area between the first electrode layer 312 and the isolation structure 200, resulting in a larger overlapping resistance between the third electrode layer 332 and the isolation structure 200. Furthermore, the relatively large slope angle of the third electrode layer 332 results in a lower continuity of the third electrode layer 332, further increasing the overlapping resistance between the third electrode layer 332 and the isolation structure 200. In the display panel of the embodiment of the present application, the first angle β1 is greater than the second angle β2, the second angle β2 is greater than the third angle β3, and the first angle β1 is greater than the third angle β3. The climbing angle of the third electrode layer 332 is relatively small, which is beneficial to improving the film continuity of the third electrode layer 332, and may increase the overlapping area between the third electrode layer 332 and the isolation structure 200, which is beneficial to reducing the overlapping resistance between the third electrode layer 332 and the isolation structure 200, and is beneficial to reducing the power consumption of the display panel. Problems such as dark spots or dark spots will hardly occur.

[0072] In one embodiment, in the isolation structure 200 surrounding the third isolation opening 213, the first isolation portion 201 extends out of the first surface 2021 by a seventh distance D7; the second distance D2 is less than the seventh distance D7 (refer to Figure 3 ), or the second distance D2 is equal to the seventh distance D7. It is understood that when the second angle β2 is greater than the third angle β3, the overlap between the second electrode layer 322 of the second light-emitting device 320 and the sidewall 2023 is not as good as the overlap between the third electrode layer 332 of the third light-emitting device 330 and the sidewall 2023. Therefore, when the second distance D2 is less than or equal to the seventh distance D7, it is beneficial to increase the overlap area between the second electrode layer 322 and the sidewall 2023, thereby improving the overlap between the second electrode layer 322 and the sidewall 2023.

[0073] For example, the second distance D2 is greater than the seventh distance D7, which can further improve the overlap effect between the third electrode layer 332 of the third light-emitting device 330 and the side wall 2023, but may cause poor overlap between the second electrode layer 322 of the second light-emitting device 320 and the side wall 2023.

[0074] Optionally, in the isolation structure 200 surrounding the second isolation opening 212, the distance from the first isolation portion 201 extending from the second surface 2022 is a fourth distance D4; in the isolation structure 200 surrounding the third isolation opening 213, the distance from the first isolation portion 201 extending from the second surface 2022 is an eighth distance D8, and the fourth distance D4 is greater than the eighth distance D8 (refer to Figure 5 ), or the fourth distance D4 is equal to the eighth distance D8. Exemplarily, the fourth distance D4 being greater than the eighth distance D8 is advantageous in enhancing the overlap effect between the third electrode layer 332 of the third light-emitting device 330 and the sidewall 2023.

[0075] Optionally, refer to Figure 6 In the isolation structure 200 surrounding the second isolation opening 212, the first isolation portion 201 extends beyond the second surface 2022. In the isolation structure 200 surrounding the third isolation opening 213, the second surface 2022 extends beyond the first isolation portion 201. This further increases the overlap area between the third electrode layer 332 of the third light-emitting device 330 and the sidewall 2023, improves the continuity of the third electrode layer 332, and enhances the overlap effect between the third electrode layer 332 and the sidewall 2023.

[0076] It can be understood that in the isolation structure 200 surrounding the third isolation opening 213, when the second surface 2022 extends out of the first isolation portion 201, the evaporation angle of the third light-emitting functional layer 331 of the third light-emitting device 330 can be adjusted so that the third light-emitting functional layer 331 does not overlap with the isolation structure 200.

[0077] It can be understood that in the isolation structure 200 surrounding the third isolation opening 213 , the second surface 2022 extending out of the first isolation portion 201 is more conducive to overlapping the third electrode layer 332 with the sidewall 2023 .

[0078] Optionally, refer to Figure 6 In the isolation structure 200 surrounding the second isolation opening 212, the second surface 2022 extends beyond the first isolation portion 201 by a ninth distance D9. In the isolation structure 200 surrounding the third isolation opening 213, the second surface 2022 extends beyond the first isolation portion 201 by a tenth distance D10. The tenth distance D10 is greater than or equal to the ninth distance D9. This further enhances the overlap between the third electrode layer 332 and the sidewall 2023.

[0079] For example, the first light-emitting device 310 includes a blue light-emitting device, the second light-emitting device 320 includes a green light-emitting device, and the third light-emitting device 330 includes a red light-emitting device. The thickness of the first light-emitting functional layer 311 is less than that of the second light-emitting functional layer 321, and the thickness of the second light-emitting functional layer 321 is less than that of the third light-emitting functional layer 331. For example, the first light-emitting device 310, the second light-emitting device 320, and the third light-emitting device 330 can be organic light-emitting diodes (OLEDs) or quantum dot light-emitting diodes (QLEDs). As a result, the first light-emitting device 310, the second light-emitting device 320, and the third light-emitting device 330 can all exhibit a strong microcavity effect, resulting in excellent display quality for the display panel.

[0080] In one embodiment, referring to Figure 7 The display panel further includes a first encapsulation layer 400, which includes a plurality of encapsulation portions 410. The plurality of encapsulation portions 410 include a second encapsulation portion 412 and a third encapsulation portion 413. The second encapsulation portion 412 is located on a side of the second light-emitting device 320 facing away from the substrate 100, and the orthographic projection of the second isolation opening 212 on the substrate 100 is within the orthographic projection of the second encapsulation portion 412 on the substrate 100. A portion of the second encapsulation portion 412 is located on a side of the isolation structure 200 facing away from the substrate 100, and the distance between the second encapsulation portion 412 and the first isolation portion 201 is a sixth distance D6. The third encapsulation portion 413 is located on a side of the third light-emitting device 330 facing away from the substrate 100, and the orthographic projection of the third isolation opening 213 on the substrate 100 is within the orthographic projection of the third encapsulation portion 413 on the substrate 100. A portion of the third encapsulation portion 413 is located on a side of the first isolation portion 201 facing away from the substrate 100, and the distance between the third encapsulation portion 413 and the first isolation portion 201 is an eleventh distance D11.

[0081] It should be noted that the reason why there is a distance between the third packaging part 413 and the first isolation part 201 can be referred to the reason why there is a distance between the first packaging part 411 and the first isolation part 201 as described above, and will not be elaborated here.

[0082] For example, the thickness of the third light-emitting functional layer 331 of the third light-emitting device 330 is greater than the thickness of the second light-emitting functional layer 321 of the second light-emitting device 320. After the wet etching is completed, the distance between the second encapsulation portion 412 corresponding to the second light-emitting device 320 and the first isolation portion 201 is smaller than the distance between the third encapsulation portion 413 corresponding to the third light-emitting device 330 and the first isolation portion 201. Exemplarily, the sixth distance D6 is smaller than the eleventh distance D11. For example, when preparing the light-emitting device 300, the second light-emitting device 320 can be prepared first, and then the third light-emitting device 330 can be prepared. When preparing the third light-emitting device 330, a whole layer of the third light-emitting functional material layer, the third electrode material layer and the third packaging material layer are prepared in sequence. The thickness of the third light-emitting functional material layer is greater than the thickness of the first light-emitting functional layer 311 and the second light-emitting functional layer 321. The third light-emitting functional material layer can effectively cover the distance between the first packaging part 411 corresponding to the first light-emitting device 310 and the first isolation part 201, as well as the distance between the second packaging part 412 corresponding to the second light-emitting device 320 and the first isolation part 201, thereby making the third electrode material layer a continuous film layer, which can effectively protect the first light-emitting device 310 and the second light-emitting device from damage by the etching solution during the wet etching process of the third light-emitting functional material layer, the third electrode material layer and the third packaging material layer, thereby reducing the display failure probability of the first light-emitting device 310 and the second light-emitting device 320, and improving the reliability of the display panel.

[0083] In one embodiment, referring to Figure 8 The isolation structure 200 further includes a third isolation portion 203 located on a side of the second isolation portion 202 close to the substrate 100. The orthographic projection of the second isolation portion 202 on the substrate 100 is within the orthographic projection of the third isolation portion 203 on the substrate 100. This further improves the overlap between the cathode of the light-emitting device 300 and the isolation structure.

[0084] Optionally, in the isolation structure 200 surrounding the first isolation opening 211, the third isolation portion 203 extends from the second surface 2022 by a twelfth distance D12; in the isolation structure 200 surrounding the second isolation opening 212, the third isolation portion 203 extends from the second surface 2022 by a thirteenth distance D13; and in the isolation structure 200 surrounding the third isolation opening 213, the third isolation portion 203 extends from the second surface 2022 by a fourteenth distance D14. The twelfth distance D12 is less than the thirteenth distance D13, and the thirteenth distance D13 is less than the fourteenth distance D14. This facilitates improved overlap between the cathode of a subsequently fabricated light-emitting device and the isolation structure 200, further preventing the occurrence of undesirable phenomena such as dark spots.

[0085] Illustratively, the light emitting device 300 further includes a fourth electrode layer 301 located between the isolation structure 200 and the substrate 100 , at least a portion of the fourth electrode layer 301 is exposed in the isolation opening 210 , and the fourth electrode layer 301 serves as an anode.

[0086] Exemplarily, the first isolation portion 201 and the second isolation portion 202 are made of different materials, and the etching rate of the first isolation portion 201 is lower than that of the second isolation portion 202. The material of the second isolation portion 202 includes a conductive material, specifically at least one of aluminum (Al) and an aluminum alloy. The aluminum alloy may include at least one of an aluminum-neodymium alloy (AlNd), an aluminum-yttrium alloy (AlY), or an aluminum-silicon alloy (AlSi). The first isolation portion 201 may have a single-layer structure or a multi-layer structure. If the first isolation portion 201 has a single-layer structure, the material of the first isolation portion 201 may include at least one of titanium, titanium nitride, molybdenum, tungsten, a molybdenum-tungsten alloy, or a molybdenum-niobium alloy. If the first isolation portion 201 has a multi-layer structure, one layer of the first isolation portion 201 may include at least one of titanium, titanium nitride, molybdenum, tungsten, a molybdenum-tungsten alloy, or a molybdenum-niobium alloy, and another layer of the first isolation portion 201 may include a conductive oxide or an inorganic insulating material, such as indium tin oxide (ITO) or indium zinc oxide (IZO).

[0087] Exemplarily, the material of the third isolation portion 203 may include at least one of molybdenum (Mo), titanium (Ti), titanium nitride (TiN), molybdenum-tungsten alloy (MoW), or molybdenum-niobium alloy (MoNb).

[0088] For example, referring to Figure 9The display panel also includes a second encapsulation layer 500 and a third encapsulation layer 600. The second encapsulation layer 500 covers the isolation structure 200 and the encapsulation portion 410, and the third encapsulation layer 600 covers the second encapsulation layer 500. The first encapsulation layer 400 and the third encapsulation layer 600 are both made of inorganic materials, and the materials of the first encapsulation layer 400 and the third encapsulation layer 600 include at least one of silicon nitride (SiN), silicon oxide (SiO), and silicon oxynitride (SiON). The second encapsulation layer 500 is an organic insulating material, such as a resin material such as epoxy resin or acrylic resin. The second encapsulation layer 500 and the third encapsulation layer 600 are continuously arranged at least across the entire display area of ​​the display panel, and a portion of them is also arranged in the frame area of ​​the display panel.

[0089] In one embodiment, the display panel may further include a pixel defining layer 700, with the isolation structure 200 disposed on the pixel defining layer 700. Pixel openings communicating with the isolation openings 210 are disposed on the pixel defining layer 700. Specifically, the pixel defining layer 700 includes a first pixel opening communicating with the first isolation opening 211, a second pixel opening communicating with the second isolation opening 212, and a third pixel opening communicating with the third isolation opening 213. The orthographic projections of the first, second, and third pixel openings on the substrate 100 may be the same or different in area. The shapes of the pixel openings and the orthographic projections of the corresponding isolation openings 210 on the substrate 100 may be the same or different. Generally speaking, the orthographic projection area of ​​an isolation opening 210 on the substrate 100 is larger than the orthographic projection area of ​​the pixel opening communicating with the isolation opening 210 on the substrate 100. The orthographic projections of the pixel openings on the substrate 100 overlap with the orthographic projections of the isolation openings 210 on the substrate 100. The pixel defining layer 700 is made of an inorganic material. For example, the pixel defining layer 700 is formed using at least one inorganic insulating material selected from silicon nitride (SiNx), silicon oxide (SiOx), and silicon oxynitride (SiON).

[0090] In another embodiment, the isolation structure 200 is disposed in the groove of the pixel defining layer 700. Alternatively, the pixel defining layer 700 may not be disposed in the display panel, and the isolation structure 200 is disposed on one side of the substrate 100, and the isolation structure 200 is disposed in contact with one side of the substrate 100.

[0091] For example, the display panel may further include at least one film layer including a touch layer, a polarizer, a color filter substrate, a protective cover plate, etc. The film layer may also be bonded to the display panel via an adhesive layer such as OCA (Optical Clear Adhesive).

[0092] Illustratively, the substrate 100 includes a pixel driving circuit, and the pixel driving circuit is electrically connected to the fourth electrode layer 301 .

[0093] It should be noted that the cross-sectional views involved in this article can be Figure 4 Schematic diagram of the cross-sectional structure of the display panel along the AA' direction.

[0094] The second aspect of the present application provides a method for preparing a display panel, referring to Figure 10 The manufacturing method of the display panel shown in FIG. 1 includes the following steps.

[0095] S100: preparing a fourth electrode layer on one side of the substrate.

[0096] It should be noted that the substrate and the fourth electrode layer are consistent with the above description and will not be further elaborated here.

[0097] S200: sequentially preparing a second isolation material layer and a first isolation material layer on a side of the fourth electrode layer facing away from the substrate.

[0098] Illustratively, the second isolation material layer and the first isolation material layer may be prepared by an evaporation method.

[0099] S300 : performing patterning on the first isolation material layer and the second isolation material layer to obtain a first isolation opening and a first middle isolation opening; the fourth electrode layer is at least partially exposed in the first isolation opening and the first middle isolation opening.

[0100] In one embodiment, the first isolation material layer and the second isolation material layer are patterned to obtain a first isolation opening, a first middle isolation opening, and a second middle isolation opening.

[0101] S400: sequentially preparing a first light-emitting functional material layer and a first electrode material layer in the first isolation opening, with portions of the first light-emitting functional material layer and the first electrode material layer being located in the first middle isolation opening.

[0102] Illustratively, in the step of sequentially preparing the first light-emitting functional material layer and the first electrode material layer in the first isolation opening, portions of the first light-emitting functional material layer and the first electrode material layer are located in the first middle isolation opening and the second middle isolation opening.

[0103] In one embodiment, the step of sequentially preparing a first light-emitting functional material layer and a first electrode material layer in the first isolation opening includes: sequentially preparing a first light-emitting functional material layer 31, a first electrode material layer 32, and a first packaging material layer 41 in the first isolation opening 211. The first light-emitting functional material layer 31, the first electrode material layer 32, and the first packaging material layer 41 are respectively located in the first isolation opening 211, the first middle isolation opening 212a, and the second middle isolation opening 213a. Figure 11The first light-emitting functional material layer, the first electrode material layer and the first packaging material layer located in the first intermediate isolation opening 212a and the second intermediate isolation opening 213a need to be etched away to obtain the first light-emitting device 310. Figure 12 .

[0104] S500: Perform a first etching process on the first light-emitting functional material layer and the first electrode material layer to remove the first light-emitting functional material layer and the first electrode material layer located in the first middle isolation opening, and retain the first light-emitting functional material layer and the first electrode material layer located in the first isolation opening to obtain a first light-emitting device, a second isolation portion, a first isolation portion and a second isolation opening, wherein the first isolation portion and the second isolation portion constitute an isolation structure.

[0105] It should be noted that the isolation structure is consistent with the previous description and will not be elaborated here.

[0106] In which, the second isolation portion includes a first surface, a second surface and a side wall, the first surface is located on the side of the second surface facing away from the substrate, and the first surface and the second surface are connected by the side wall; the orthographic projection of the first surface on the substrate is located within the orthographic projection range of the first isolation portion on the substrate; the orthographic projection of the first surface on the substrate is located within the orthographic projection range of the second surface on the substrate; in the isolation structure surrounding the first isolation opening, the angle between the side wall and the second surface is the first angle; in the isolation structure surrounding the second isolation opening, the angle between the side wall and the second surface is the second angle; the first angle is greater than the second angle.

[0107] Exemplarily, a wet etching method is used to remove the first light-emitting functional material layer and the first electrode material layer located within the first intermediate isolation opening. After the etching is completed, the first intermediate isolation opening is inevitably etched by the etching solution, resulting in a second isolation opening having a larger size than the first intermediate isolation opening. Specifically, the sidewall of the second isolation portion of the second isolation opening is retracted from the first isolation portion by a greater distance than the sidewall of the second isolation portion of the first intermediate isolation opening. For example, the etching rate of the first isolation material layer is lower than the etching rate of the second isolation material layer, resulting in an isolation structure surrounding the second isolation opening having a longer extension of the first isolation material portion from the first surface of the second isolation portion.

[0108] Optionally, the step of performing a first etching treatment on the first light-emitting functional material layer and the first electrode material layer further includes removing the first light-emitting functional material layer and the first electrode material layer located in the second intermediate isolation opening to obtain a third intermediate isolation opening. Exemplarily, a wet etching method is used to remove the first light-emitting functional material layer and the first electrode material layer located in the second intermediate isolation opening. After the etching is completed, the second intermediate isolation opening is inevitably etched by the etching solution. The size of the third intermediate isolation opening is larger than that of the second intermediate isolation opening. Specifically, the distance by which the sidewall of the second isolation portion of the third intermediate isolation opening is retracted from the first isolation portion is greater than the distance by which the sidewall of the second isolation portion of the second intermediate isolation opening is retracted from the first isolation portion. For example, the etching rate of the first isolation material layer is lower than the etching rate of the second isolation material layer, so that in the isolation structure surrounding the third intermediate isolation opening, the length of the first isolation portion extending from the first surface of the second isolation portion is longer.

[0109] Optionally, performing a first etching process on the first light-emitting functional material layer and the first electrode material layer includes: performing a first etching process on the first light-emitting functional material layer, the first electrode material layer, and the first packaging material layer to obtain a first light-emitting device and a first packaging portion, wherein a portion of the first packaging portion is located on a side of the first isolation portion facing away from the substrate, and the spacing between the first packaging portion and the first isolation portion is a fifth distance. Thus, the first packaging material layer can avoid damage to the underlying film layer by the etching liquid. During the etching process, a portion of the etching liquid enters the side of the first packaging portion close to the substrate, causing a portion of the first light-emitting functional material layer and the first electrode material layer on the side of the first packaging portion close to the substrate to be etched away.

[0110] S600: sequentially preparing a second light-emitting functional layer and a second electrode layer in the second isolation opening to obtain a second light-emitting device.

[0111] Optionally, sequentially forming a second light-emitting functional layer and a second electrode layer in the second isolation opening includes: sequentially forming a second light-emitting functional material layer and a second electrode material layer in the second isolation opening, with a portion of the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening; performing a second etching process on the second light-emitting functional material layer and the second electrode material layer to remove the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening, while retaining the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening, thereby obtaining a second light-emitting device and a third isolation opening. Exemplarily, a wet etching method is used to remove the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening. After the etching is completed, the third intermediate isolation opening is inevitably etched by the etching solution. The dimensions of the third isolation opening are larger than those of the third intermediate isolation opening. Specifically, the distance by which the sidewall of the second isolation portion of the third intermediate isolation opening is retracted from the first isolation portion is greater than the distance by which the sidewall of the second isolation portion of the third intermediate isolation opening is retracted from the first isolation portion. For example, the etching rate of the first isolation material layer is lower than the etching rate of the second isolation material layer, so that in the isolation structure surrounding the third isolation opening, the first isolation portion extends longer than the first surface of the second isolation portion.

[0112] In the isolation structure surrounding the third isolation opening, the angle between the sidewall and the second surface is the third angle; the second angle is greater than the third angle. As a result, when fabricating the third light-emitting device, the third electrode layer has a smaller slope angle and greater continuity, which is more conducive to increasing the overlap area between the third electrode layer and the isolation structure, thereby improving the overlap yield rate.

[0113] Optionally, sequentially preparing a second light-emitting functional layer and a second electrode layer in the second isolation opening includes: sequentially preparing a second light-emitting functional material layer and a second electrode material layer in the second isolation opening, wherein the thickness of the second light-emitting functional material layer is greater than the fifth distance; at an edge position of the first packaging portion, the second electrode material layer continuously extends from a side of the first packaging portion facing away from the substrate to a side of the first isolation portion facing away from the substrate; and performing a second etching process on the second light-emitting functional material layer and the second electrode material layer, retaining the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening, to obtain a second light-emitting device. It is understandable that because the thickness of the second light-emitting functional material layer is greater than the fifth distance, the second light-emitting functional material layer is almost not broken at the edge position of the first packaging portion, and has a strong continuity, thereby ensuring that the second electrode material layer remains continuous at the edge position of the first packaging portion. During the subsequent wet etching process, the second electrode material layer and the second light-emitting functional material layer can effectively protect the first packaging portion of the first light-emitting device from being etched and damaged, thereby effectively protecting the first light-emitting device.

[0114] Exemplarily, sequentially preparing the second light-emitting functional layer and the second electrode layer in the second isolation opening includes: sequentially preparing the second light-emitting functional material layer 33, the second electrode material layer 34 and the second packaging material layer 35 in the second isolation opening 212; at the edge position of the first packaging portion 411, the second electrode material layer 33 continuously extends from the side of the first packaging portion 411 facing away from the substrate 100 to the side of the first isolation portion 411 facing away from the substrate 100, and the second packaging material layer 35 is a continuous film layer, refer to Figure 13 ; The second light-emitting functional material layer 33, the second electrode material layer 34 and the second packaging material layer 35 are subjected to a second etching process to retain the second light-emitting functional material layer 33, the second electrode material layer 34 and the second packaging material layer 35 located in the second isolation opening 212, to obtain a second light-emitting device 320 and a second packaging portion 412, with reference to Figure 14 .

[0115] Similarly, the preparation steps of the third light-emitting device include: sequentially preparing a third light-emitting functional material layer and a third electrode material layer in the third isolation opening, the third light-emitting functional material layer and the third electrode material layer cover the first packaging part and the second packaging part, and the third light-emitting functional material layer and the third electrode material layer are continuous film layers at the edge position of the first packaging part, and the third light-emitting functional material layer and the third electrode material layer are continuous film layers at the edge position of the second packaging part. In the subsequent wet etching process, the third light-emitting functional material layer and the third electrode material layer can effectively protect the first packaging part of the first light-emitting device and the second packaging part of the second light-emitting device from being etched and damaged, thereby effectively protecting the first light-emitting device and the second light-emitting device.

[0116] Illustratively, sequentially preparing a third light-emitting functional layer and a third electrode layer in the third isolation opening includes: sequentially preparing a third light-emitting functional material layer, a third electrode material layer and a third packaging material layer in the third isolation opening; at an edge position of the first packaging portion, the third electrode material layer continuously extends from a side of the first packaging portion facing away from the substrate to a side of the first isolation portion facing away from the substrate, and the third packaging material layer is a continuous film layer; at an edge position of the second packaging portion, the third electrode material layer continuously extends from a side of the second packaging portion facing away from the substrate to a side of the first isolation portion facing away from the substrate, and the third packaging material layer is a continuous film layer; performing a second etching treatment on the third light-emitting functional material layer, the third electrode material layer and the third packaging material layer to retain the third light-emitting functional material layer, the third electrode material layer and the third packaging material layer located in the third isolation opening to obtain a third light-emitting device and a third packaging portion.

[0117] It should be noted that the display panel prepared by the preparation method of this embodiment can be combined with the display panel described above in whole or in part, and will not be described in detail here.

[0118] A third aspect of the present application provides a display device, comprising the aforementioned display panel, or comprising a display panel prepared by the aforementioned preparation method.

[0119] It should be noted that, in addition to the aforementioned display panel, the display device may also include structures that a conventional display device should have, such as a chip, a battery, a housing, etc., which will not be described in detail here.

[0120] For example, the display device may include a device with image processing capabilities, such as a mobile phone, a desktop computer, a laptop computer, a tablet computer, a car display, a wearable device, etc. Since the display device includes the display panel of the present application, the reliability of the electronic device is higher.

[0121] The technical features of the above embodiments can be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0122] The above-described embodiments merely illustrate several implementations of the present invention, and while their descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent. It should be noted that a person skilled in the art would be able to make numerous variations and improvements without departing from the spirit of the present invention, all of which fall within the scope of protection of the present invention. Therefore, the scope of protection of the patent for this invention shall be determined by the appended claims.

Claims

1. A display panel, characterized in that: include: substrate; an isolation structure, located on one side of the substrate; The isolation structure is surrounded by a plurality of isolation openings, the plurality of isolation openings including a first isolation opening and a second isolation opening; the isolation structure includes a first isolation portion and a second isolation portion, the first isolation portion is located on a side of the second isolation portion facing away from the substrate, the second isolation portion includes a first surface, a second surface, and a sidewall, the first surface is located on a side of the second surface facing away from the substrate, and the first surface and the second surface are connected by the sidewall; The orthographic projection of the first surface on the substrate is located within the orthographic projection range of the first isolation portion on the substrate; The orthographic projection of the first surface on the substrate is within the range of the orthographic projection of the second surface on the substrate; In the isolation structure surrounding the first isolation opening, the angle between the side wall and the second surface is a first angle; in the isolation structure surrounding the second isolation opening, the angle between the side wall and the second surface is a second angle; The first angle is greater than the second angle; A plurality of light emitting devices include a first light emitting device and a second light emitting device, at least part of the first light emitting device is located in the first isolation opening, and at least part of the second light emitting device is located in the second isolation opening.

2. The display panel according to claim 1, wherein: In the isolation structure surrounding the first isolation opening, the distance that the first isolation portion extends from the first surface is a first distance; in the isolation structure surrounding the second isolation opening, the distance that the first isolation portion extends from the first surface is a second distance, and the first distance is less than or equal to the second distance; And / or, in the isolation structure surrounding the first isolation opening, the distance the first isolation portion extends from the second surface is a third distance; in the isolation structure surrounding the second isolation opening, the distance the first isolation portion extends from the second surface is a fourth distance, and the third distance is greater than or equal to the fourth distance; and / or, in the isolation structure surrounding the first isolation opening, the first isolation portion extends out of the second surface; In the isolation structure surrounding the second isolation opening, the second surface extends out of the first isolation portion.

3. The display panel according to claim 1, wherein: The first light-emitting device includes a first light-emitting functional layer and a first electrode layer located in the first isolation opening, wherein the first electrode layer is located on a side of the first light-emitting functional layer facing away from the substrate; The second light emitting device includes a second light emitting functional layer and a second electrode layer located in the second isolation opening, wherein the second electrode layer is located on a side of the second light emitting functional layer facing away from the substrate; The thickness of the first light-emitting functional layer is smaller than the thickness of the second light-emitting functional layer; And / or, the first light emitting device includes a blue light emitting device, and the second light emitting device includes a green light emitting device.

4. The display panel according to claim 1, wherein: The display panel further includes a first encapsulation layer, the first encapsulation layer includes a plurality of encapsulation parts, and the plurality of encapsulation parts include a first encapsulation part and a second encapsulation part; The first encapsulation portion is located on a side of the first light-emitting device facing away from the substrate, and an orthographic projection of the first isolation opening on the substrate is located within the orthographic projection of the first encapsulation portion on the substrate; a portion of the first encapsulation portion is located on a side of the first isolation portion facing away from the substrate, and a distance between the first encapsulation portion and the first isolation portion is a fifth distance; The second encapsulation portion is located on a side of the second light-emitting device facing away from the substrate, and an orthographic projection of the second isolation opening on the substrate is located within the orthographic projection of the second encapsulation portion on the substrate; a portion of the second encapsulation portion is located on a side of the isolation structure facing away from the substrate, and a distance between the second encapsulation portion and the first isolation portion is a sixth distance; The fifth distance is smaller than the sixth distance.

5. The display panel according to claim 1, wherein: An orthographic projection area of ​​the first isolation opening on the substrate is larger than an orthographic projection area of ​​the second isolation opening on the substrate.

6. The display panel according to any one of claims 1 to 5, wherein: The plurality of isolation openings further include a third isolation opening, and in the isolation structure surrounding the third isolation opening, an angle between the side wall and the second surface is a third angle; The second angle is greater than the third angle.

7. The display panel according to claim 6, wherein: In the isolation structure surrounding the third isolation opening, the first isolation portion extends from the first surface by a seventh distance; in the isolation structure surrounding the second isolation opening, the first isolation portion extends from the first surface by a second distance, and the second distance is less than or equal to the seventh distance; And / or, in the isolation structure surrounding the second isolation opening, the distance that the first isolation portion extends from the second surface is a fourth distance; in the isolation structure surrounding the third isolation opening, the distance that the first isolation portion extends from the second surface is an eighth distance, and the fourth distance is greater than or equal to the eighth distance; and / or, in the isolation structure surrounding the second isolation opening, the first isolation portion extends out of the second surface; In the isolation structure surrounding the third isolation opening, the second surface extends out of the first isolation portion; And / or, in the isolation structure surrounding the second isolation opening, the second surface extends from the first isolation portion by a ninth distance; in the isolation structure surrounding the third isolation opening, the second surface extends from the first isolation portion by a tenth distance; The tenth distance is greater than or equal to the ninth distance.

8. The display panel according to claim 6, wherein: The plurality of light-emitting devices include a third light-emitting device, wherein the third light-emitting device includes a third light-emitting functional layer and a third electrode layer located in the third isolation opening, and the third electrode layer is located on a side of the third light-emitting functional layer facing away from the substrate; The second light emitting device includes a second light emitting functional layer and a second electrode layer located in the second isolation opening, wherein the second electrode layer is located on a side of the second light emitting functional layer facing away from the substrate; The thickness of the second light-emitting functional layer is less than the thickness of the third light-emitting functional layer; And / or, the second light emitting device includes a green light emitting device, and the third light emitting device includes a red light emitting device.

9. The display panel according to claim 8, wherein: The display panel further includes a first encapsulation layer, the first encapsulation layer includes a plurality of encapsulation parts, and the plurality of encapsulation parts include a second encapsulation part and a third encapsulation part; The second encapsulation portion is located on a side of the second light-emitting device facing away from the substrate, and an orthographic projection of the second isolation opening on the substrate is located within the orthographic projection of the second encapsulation portion on the substrate; a portion of the second encapsulation portion is located on a side of the isolation structure facing away from the substrate, and a distance between the second encapsulation portion and the first isolation portion is a sixth distance; The third encapsulation portion is located on a side of the third light-emitting device facing away from the substrate, and the orthographic projection of the third isolation opening on the substrate is located within the orthographic projection range of the third encapsulation portion on the substrate; a portion of the third encapsulation portion is located on a side of the first isolation portion facing away from the substrate, and a distance between the third encapsulation portion and the first isolation portion is an eleventh distance; The sixth distance is smaller than the eleventh distance.

10. The display panel according to claim 6, wherein: The orthographic projection area of ​​the first isolation opening on the substrate is larger than the orthographic projection area of ​​the second isolation opening on the substrate, and the orthographic projection area of ​​the first isolation opening on the substrate is larger than the orthographic projection area of ​​the third isolation opening on the substrate.

11. The display panel according to claim 1, wherein The isolation structure further includes a third isolation portion located on a side of the second isolation portion close to the substrate, and an orthographic projection of the second isolation portion on the substrate is located within the orthographic projection range of the third isolation portion on the substrate.

12. The display panel according to claim 11, wherein: In the isolation structure surrounding the first isolation opening, the distance that the third isolation portion extends from the second surface is the twelfth distance; in the isolation structure surrounding the second isolation opening, the distance that the third isolation portion extends from the second surface is the thirteenth distance; the twelfth distance is smaller than the thirteenth distance.

13. A method for preparing a display panel, characterized in that: include: preparing a fourth electrode layer on one side of the substrate; sequentially preparing a second isolation material layer and a first isolation material layer on a side of the fourth electrode layer facing away from the substrate; Performing patterning on the first isolation material layer and the second isolation material layer to obtain a first isolation opening and a first middle isolation opening; The fourth electrode layer is at least partially exposed to the first isolation opening and the first middle isolation opening; sequentially preparing a first light-emitting functional material layer and a first electrode material layer in the first isolation opening, wherein portions of the first light-emitting functional material layer and the first electrode material layer are located in the first middle isolation opening; performing a first etching process on the first light-emitting functional material layer and the first electrode material layer to remove the first light-emitting functional material layer and the first electrode material layer located in the first middle isolation opening, and retaining the first light-emitting functional material layer and the first electrode material layer located in the first isolation opening, thereby obtaining a first light-emitting device, a second isolation portion, a first isolation portion, and a second isolation opening, wherein the first isolation portion and the second isolation portion constitute an isolation structure; The second isolation portion includes a first surface, a second surface, and a sidewall, the first surface is located on a side of the second surface facing away from the substrate, and the first surface and the second surface are connected by the sidewall; The orthographic projection of the first surface on the substrate is located within the orthographic projection range of the first isolation portion on the substrate; The orthographic projection of the first surface on the substrate is within the range of the orthographic projection of the second surface on the substrate; In the isolation structure surrounding the first isolation opening, the angle between the side wall and the second surface is a first angle; in the isolation structure surrounding the second isolation opening, the angle between the side wall and the second surface is a second angle; The first angle is greater than the second angle; A second light-emitting functional layer and a second electrode layer are sequentially prepared in the second isolation opening to obtain a second light-emitting device.

14. The preparation method according to claim 13, characterized in that The first isolation material layer and the second isolation material layer are patterned to obtain a first isolation opening, a first middle isolation opening, and a second middle isolation opening.

15. The preparation method according to claim 14, characterized in that In the step of sequentially preparing a first light-emitting functional material layer and a first electrode material layer in the first isolation opening, portions of the first light-emitting functional material layer and the first electrode material layer are located in the first middle isolation opening and the second middle isolation opening; And / or, the step of performing a first etching treatment on the first light-emitting functional material layer and the first electrode material layer further includes removing the first light-emitting functional material layer and the first electrode material layer located in the second intermediate isolation opening to obtain a third intermediate isolation opening.

16. The preparation method according to claim 15, characterized in that Sequentially preparing a second light-emitting functional layer and a second electrode layer in the second isolation opening includes: sequentially preparing a second light-emitting functional material layer and a second electrode material layer in the second isolation opening, with portions of the second light-emitting functional material layer and the second electrode material layer being located in the third middle isolation opening; The second light-emitting functional material layer and the second electrode material layer are subjected to a second etching process to remove the second light-emitting functional material layer and the second electrode material layer located in the third intermediate isolation opening, and retain the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening to obtain a second light-emitting device and a third isolation opening. In the isolation structure surrounding the third isolation opening, the angle between the side wall and the second surface is a third angle; the second angle is greater than the third angle.

17. The preparation method according to claim 13, characterized in that The step of sequentially preparing a first light-emitting functional material layer and a first electrode material layer in the first isolation opening includes: sequentially preparing a first light-emitting functional material layer, a first electrode material layer and a first encapsulation material layer in the first isolation opening; And / or, performing a first etching treatment on the first light-emitting functional material layer and the first electrode material layer includes: performing a first etching treatment on the first light-emitting functional material layer, the first electrode material layer and the first packaging material layer to obtain a first light-emitting device and a first packaging part, part of the first packaging part is located on the side of the first isolation part away from the substrate, and the distance between the first packaging part and the first isolation part is the fifth distance.

18. The preparation method according to claim 17, characterized in that: Sequentially preparing a second light-emitting functional layer and a second electrode layer in the second isolation opening includes: A second light-emitting functional material layer and a second electrode material layer are sequentially formed in the second isolation opening, wherein the thickness of the second light-emitting functional material layer is greater than the fifth distance; at an edge of the first encapsulation portion, the second electrode material layer continuously extends from a side of the first encapsulation portion facing away from the substrate to a side of the first isolation portion facing away from the substrate; The second light-emitting functional material layer and the second electrode material layer are subjected to a second etching process to retain the second light-emitting functional material layer and the second electrode material layer located in the second isolation opening to obtain the second light-emitting device.

19. A display device, characterized in that: A display panel comprising any one of claims 1 to 12, or a display panel prepared by the preparation method according to any one of claims 13 to 18.

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