High-temperature-resistant silicone polymer, and preparation method and application thereof

By introducing a borate ester bridging structure through the addition reaction of ladder-type polysiloxanes with single-chain polysiloxanes, a high-temperature resistant organosilicon block copolymer was prepared, which solved the problems of insufficient heat resistance and film-forming properties of ladder-type polysiloxanes and realized the application of high-temperature stability and thermoplastic materials.

CN120988291BActive Publication Date: 2026-06-09JIANGXI TAIN NEW MATERIAL TECHNOLOGY CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
JIANGXI TAIN NEW MATERIAL TECHNOLOGY CO LTD
Filing Date
2025-09-08
Publication Date
2026-06-09

AI Technical Summary

Technical Problem

Existing technologies make it difficult to prepare ladder-type polysiloxane modified polymers with block structures, resulting in deficiencies in heat resistance and film-forming properties. Furthermore, conventional polysiloxane reactions are uncontrollable and it is difficult to form linear structures.

Method used

By introducing a borate ester bridging structure through an addition reaction between ladder-type polysiloxane and single-chain polysiloxane, and using a noble metal catalyst, a high-temperature resistant organosilicon block copolymer was prepared, thus achieving the synthesis of ladder-line block polysiloxane.

Benefits of technology

A block copolymer with excellent high-temperature resistance and thermoplasticity was prepared, with an initial decomposition temperature as high as 439℃. It also has good film-forming properties and mechanical properties, making it suitable for industrial production.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN120988291B_ABST
    Figure CN120988291B_ABST
Patent Text Reader

Abstract

The application discloses the technical field of organic silicon material, and relates to a high-temperature-resistant organic silicon polymer and a preparation method and application thereof. The high-temperature-resistant organic silicon polymer is formed by a ladder-shaped polysiloxane and a linear polysiloxane. The ladder-shaped polysiloxane is dehydrated and condensed and ring-closed with a double functional silanol group on one side end of the ladder-shaped polysiloxane and an alkenyl boronic acid, and is further chain-extended by a silicon hydrogen addition reaction with a linear polysiloxane with a terminal hydrogen group, so that a ladder-linear block structure organic silicon polymer bridged by a borate group is finally obtained. The block organic silicon polymer contains the ladder-shaped molecule which is heat-resistant in nature, and the borate bridging group can further strengthen the heat-resistant property of the material. The block organic silicon polymer disclosed by the application has a heat-resistant temperature (according to the weight loss of 1.0% when initial decomposition) of 435 DEG C. The preparation method of the high-temperature-resistant organic silicon polymer is simple in process, simple in equipment, and easy in raw material acquisition, and is suitable for large-scale industrial production. The prepared organic silicon material is a thermoplastic polymer, has good film-forming property, can be hot-pressed into a film, and has a wide application prospect as a high-temperature-resistant elastic film material.
Need to check novelty before this filing date? Find Prior Art