Anti-return exhaust valve structure with isolated valve cavity
By adopting a dual-valve box assembly structure and an inter-valve isolation chamber design in the dust mask, the problems of poor sealing, poor exhaust, and delayed valve closure caused by dust accumulation in the one-way exhaust valve are solved, thereby improving the protective performance and wearing comfort.
Patent Information
- Application Number
- CN202511393231.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-27
- Publication Date
- 2026-01-02
AI Technical Summary
Existing dust masks, gas masks, and valved masks suffer from problems such as poor sealing, poor exhaust, and delayed valve closure due to dust accumulation in the one-way exhaust valve during use, affecting user comfort and safety.
The system adopts a dual-valve box assembly structure, including an outer valve plate and an inner valve plate, forming an inter-valve isolation cavity. Through the Venturi effect and the trapping effect of the low-pressure eddy zone, combined with the principle of micro-condensation and deposition of moisture, the matching method of the outer valve plate and the inner valve plate is designed to ensure the gas flow path and dust blocking effect.
It effectively solves the problems of poor sealing, poor ventilation, and delayed valve closure caused by dust blockage, improves the product's protective performance and wearing comfort, and reduces the burden of cleaning and inspection for users.