Display panel and preparation method thereof, display device and mask plate assembly

Abstract

The embodiment of the invention provides a display panel and a preparation method thereof, a display device and a mask plate assembly, relates to the technical field of display, and is used for improving the reliability when a light-emitting device is lightened. The display panel comprises a substrate, an isolation structure and a light emitting device. The isolation structure defines a pixel opening; the isolation structure comprises a first isolation pattern and a second isolation pattern; the first isolation pattern comprises a first part and a second part; the second part comprises a first edge part, and the first edge part extends in the direction close to the center line of the adjacent pixel opening relative to the first part. The light-emitting device is arranged in the pixel opening and comprises a first electrode, a first light-emitting function layer and a second electrode which are stacked in the direction away from the substrate, and the second electrode makes contact with and is electrically connected with the second isolation pattern; the light-emitting function layer is located between the plane where the surface, close to the substrate, of the first edge part is located and the first electrode. The display panel can be used for displaying.

Description

Technical Field

[0001] This disclosure relates to the field of display technology, and in particular to a display panel and its manufacturing method, display device, and photomask assembly. Background Technology

[0002] OLED (Organic Light Emitting Diode) display substrates are widely used in display screens for mobile phones, tablets, automotive displays, and other devices due to their advantages such as being all-solid-state, having a fast response time, and a wide operating temperature range. Summary of the Invention

[0003] The purpose of this disclosure is to provide a display panel and its manufacturing method, display device, and mask assembly to improve the reliability of light-emitting devices when they are lit.

[0004] To achieve the above objectives, the embodiments of this disclosure provide the following technical solutions:

[0005] On one hand, a display panel is provided. The display panel includes a substrate, an isolation structure, and a light-emitting device. The isolation structure is disposed on the substrate; the isolation structure defines a pixel opening, and the isolation structure includes a first isolation pattern and a second isolation pattern stacked in a direction away from the substrate; the material of the first isolation pattern includes an insulating material, and the first isolation pattern includes a first portion and a second portion stacked in a direction away from the substrate; the second portion includes a first edge portion, which extends relative to the first portion in a direction close to the center line of the adjacent pixel opening. The light-emitting device is disposed within the pixel opening and includes a first electrode, a light-emitting functional layer, and a second electrode stacked in a direction away from the substrate, the second electrode being in contact with and electrically connected to the second isolation pattern; along a first direction, the light-emitting functional layer is located between the plane containing the surface of the first edge portion near the substrate and the first electrode, the first direction being the thickness direction of the substrate.

[0006] Understandably, by including a first edge portion in the second part, which extends relative to the first part towards the center line of the adjacent pixel opening, a first recessed structure (also called a first undercut structure) can be formed on the first isolation pattern. The material of the light-emitting functional layer is difficult to climb at the first recessed structure, so that the material of the light-emitting functional layer cannot completely fill the first recessed structure. In this way, along the first direction, the light-emitting functional layer can be confined between the plane where the surface of the first edge portion near the substrate is located and the first electrode, so that the light-emitting functional layer cannot connect with the material of the conductive film layer distributed on the side of the first edge portion away from the substrate, and so that current transmission cannot be formed between the light-emitting functional layer and the material of the conductive film layer located on the side of the first edge portion away from the substrate. In this way, even if the material of the conductive film layer distributed on the side of the first edge portion away from the substrate overlaps with the second isolation pattern, it will not be conductive with the first electrode. Thus, a short circuit can be prevented between the first electrode and the second isolation pattern, and the second electrode can be prevented from being unable to connect the drive signal due to a short circuit. This can improve the reliability of the light-emitting device when it is lit, thereby improving the yield of the light-emitting device fabricated by the photolithography process.

[0007] In some embodiments, the display panel further includes a first pattern layer. The first pattern layer is located on the side of the first edge away from the substrate; the material of the light-emitting functional layer is the same as the material of the first pattern layer. The first pattern layer and the light-emitting functional layer are spaced apart in a first direction.

[0008] In some embodiments, the material of the first part includes a first insulating material; the material of the second part includes a second insulating material, wherein the first insulating material and the second insulating material are different.

[0009] In some embodiments, under the same etching conditions, the etching rate of the first insulating material is greater than that of the second insulating material.

[0010] In some embodiments, the dimension of the first portion along the first direction is greater than the dimension of the second portion along the first direction.

[0011] In some embodiments, the first isolation pattern further includes a third portion. The third portion is located between the first portion and the substrate, and includes a second edge portion that surrounds the center line of an adjacent pixel opening and extends relative to the first portion in a direction closer to the center line of the pixel opening. The dimension of the first portion along the first direction is larger than the dimension of the third portion along the first direction.

[0012] In some embodiments, the material of the third part is the same as that of the second part.

[0013] In some embodiments, the edge of the second edge portion is closer to the center line of the adjacent pixel opening than the edge of the first edge portion.

[0014] In some embodiments, the edge of the first portion near the pixel opening covers the edge of the first electrode; or, the first isolation pattern further includes a third portion, the edge of the second edge of the third portion near the pixel opening covering the edge of the first electrode.

[0015] In some embodiments, the material of the first portion comprises silicon nitride; and / or, the material of the second portion comprises silicon oxide.

[0016] In some embodiments, the second isolation pattern includes a fourth portion and a fifth portion stacked in a direction away from the substrate. The fifth portion includes a plurality of third edge portions that surround the center line of an adjacent pixel opening and extend relative to the fourth portion in a direction closer to the center line of the adjacent pixel opening. A second electrode contacts and is electrically connected to the fourth portion.

[0017] In some embodiments, the display panel further includes a second patterned layer. The second patterned layer is located on the side of the third edge away from the substrate; the material of the light-emitting functional layer is the same as the material of the second patterned layer. The first patterned layer and the second patterned layer of the display panel are spaced apart in a first direction.

[0018] In some embodiments, the dimension of the fourth portion along the first direction is greater than the dimension of the fifth portion along the first direction.

[0019] In some embodiments, the second isolation pattern further includes a sixth portion. The sixth portion is located between the fourth portion and the first isolation pattern. The sixth portion includes a fourth edge portion that surrounds the center line of an adjacent pixel opening and extends relative to the fourth portion in a direction closer to the center line of the adjacent pixel opening; the second electrode contacts and is electrically connected to the fourth edge portion. The dimension of the fourth portion along the first direction is larger than the dimension of the sixth portion along the first direction.

[0020] In some embodiments, the surface of the second electrode away from the substrate, relative to the surface of the isolation structure away from the substrate, is closer to the substrate in a first direction. The display panel also includes an encapsulation pattern. The encapsulation pattern covers the light-emitting device, the sidewalls of the pixel opening, the surface of the third edge of the fifth portion near the substrate, the side surface of the fifth portion, and at least a portion of the surface of the fifth portion away from the substrate.

[0021] In some embodiments, the encapsulation pattern includes a first sub-pattern and a second sub-pattern stacked in a direction away from the substrate. The density of the first sub-pattern is higher than that of the second sub-pattern.

[0022] In some embodiments, the display panel includes a first light-emitting device and a second light-emitting device; the first light-emitting device and the second light-emitting device emit different colors. The encapsulation pattern includes a first encapsulation pattern covering the first light-emitting device and a second encapsulation pattern covering the second light-emitting device, the thickness of the first encapsulation pattern and the thickness of the second encapsulation pattern being different.

[0023] In some embodiments, the display panel includes a first light-emitting device and a second light-emitting device. The first light-emitting device includes a first light-emitting functional layer, and the second light-emitting device includes a second light-emitting functional layer. The first light-emitting device and the second light-emitting device emit different colors. The display panel also includes a first isolation film group and a second isolation film group. The first isolation film group includes a first isolation layer and a second isolation layer stacked in a direction away from the substrate. The first isolation layer and the first light-emitting functional layer are made of the same material, and the second isolation layer and the second electrode are made of the same material. The second isolation film group includes a third isolation layer and a fourth isolation layer stacked in a direction away from the substrate. The third isolation layer and the second light-emitting functional layer are made of the same material, and the fourth isolation layer and the second electrode are made of the same material. Both the first isolation film group and the second isolation film group are located on the side of the second isolation pattern away from the substrate.

[0024] In some embodiments, in the second direction, in the first isolation film group and the second isolation film group located between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device, one partially overlaps the side of the other away from the substrate; the second direction is parallel to the connection between the center of the first light-emitting device and the center of the second light-emitting device.

[0025] In some embodiments, the first barrier film assembly includes a first edge portion away from the first light-emitting device, the size of which gradually decreases in a first direction; and / or, the second barrier film assembly includes a second edge portion away from the second light-emitting device, the size of which gradually decreases in a first direction. The first edge portion and the second edge portion located between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device overlap each other.

[0026] In some embodiments, the first partition film assembly further includes a first partition portion connected to the first edge portion, the first partition portion being closer to the first light-emitting device than the first edge portion. The second partition film assembly further includes a second partition portion connected to the second edge portion, the second partition portion being closer to the second light-emitting device than the second edge portion. In the region between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion and the second edge portion in a first direction is less than the sum of the dimensions of the first partition portion and the second partition portion in the first direction.

[0027] In some embodiments, the display panel includes a third light-emitting device, which includes a third light-emitting functional layer. The first, second, and third light-emitting devices emit different colors. The display panel also includes a third isolation film assembly. The third isolation film assembly is located on the side of the second isolation pattern away from the substrate. The third isolation film assembly includes a fifth isolation layer and a sixth isolation layer stacked along the direction away from the substrate. The fifth isolation layer and the third light-emitting functional group are made of the same material, and the sixth isolation layer and the second electrode are made of the same material. The third isolation film assembly includes a third edge portion away from the third light-emitting device, and the size of the third edge portion gradually decreases in a first direction. The first edge portion and the third edge portion located between the first light-emitting device and the third light-emitting device adjacent to the first light-emitting device overlap each other; and / or, the second edge portion and the third edge portion located between the second light-emitting device and the third light-emitting device adjacent to the second light-emitting device overlap each other.

[0028] In some embodiments, the third partition film assembly further includes a third partition portion connected to the third edge portion, the third partition portion being closer to the third light-emitting device than the third edge portion. In the region between the first light-emitting device and the third light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion and the third edge portion in the first direction is less than the sum of the dimensions of the first partition portion and the third partition portion in the first direction; and / or, in the region between the second light-emitting device and the third light-emitting device adjacent to the second light-emitting device, the maximum value of the sum of the dimensions of the second edge portion and the third edge portion in the first direction is less than the sum of the dimensions of the second partition portion and the third partition portion in the first direction.

[0029] In some embodiments, the first isolation film group and the second isolation film group have a spacing in a second direction, which is parallel to the line connecting the center of the first light-emitting device and the center of the second light-emitting device; or, the boundary of the first isolation film group away from the first light-emitting device coincides with the boundary of the second isolation film group away from the second light-emitting device.

[0030] In some embodiments, the display panel further includes a first encapsulation pattern and a second encapsulation pattern. The first encapsulation pattern covers a portion of the surface of the first light-emitting device and the second isolation layer away from the substrate; the first isolation film assembly further includes a portion of the first encapsulation pattern covering the surface of the second isolation layer away from the substrate. The second encapsulation pattern covers a portion of the surface of the second light-emitting device and the fourth isolation layer away from the substrate; the second isolation film assembly further includes a portion of the second encapsulation pattern covering the surface of the fourth isolation layer away from the substrate.

[0031] On the other hand, a method for fabricating a display panel is provided. The method includes: forming a plurality of first electrodes on a substrate; forming a first initial isolation structure on the substrate, the material of the first initial isolation structure including an insulating material; forming a second initial isolation structure on the side of the first initial isolation structure away from the substrate; sequentially etching the second initial isolation structure and the first initial isolation structure to form a first pixel opening exposing a first electrode of a first light-emitting device; sequentially forming a light-emitting functional layer and a second electrode of the first light-emitting device within the first pixel opening; sequentially etching the second initial isolation structure and the first initial isolation structure to form a second pixel opening exposing a first electrode of a second light-emitting device; sequentially forming a light-emitting functional layer and a second electrode of the second light-emitting device within the second pixel opening; sequentially etching the second initial isolation structure and the first initial isolation structure to form a third pixel opening exposing a first electrode of a third light-emitting device; and sequentially forming a light-emitting functional layer and a second electrode of a third light-emitting device within the third pixel opening. Wherein, the first initial isolation structure and the second initial isolation structure, after forming the first pixel opening, the second pixel opening, and the third pixel opening, respectively become the first isolation pattern and the second isolation pattern; the first isolation pattern includes a first portion and a second portion stacked along a direction away from the substrate, the second portion including a first edge portion, the first edge portion extending relative to the first portion towards the center line of the adjacent pixel opening. The second electrodes of the first light-emitting device, the second light-emitting device, and the third light-emitting device are all in contact with and electrically connected to the second isolation pattern. Along a first direction, the light-emitting functional layers of the first light-emitting device, the second light-emitting device, and the third light-emitting device are all located between the plane containing the surface of the first edge portion near the substrate and the first electrode, the first direction being the thickness direction of the substrate.

[0032] The beneficial effects achievable by the above-described method for manufacturing the display panel are the same as those achievable by the above-described display panel, and will not be repeated here.

[0033] In another aspect, a method for fabricating a display panel is provided. The method includes: forming a plurality of first electrodes on a substrate; forming a first initial isolation structure on the substrate, the material of the first initial isolation structure including an insulating material; forming a second initial isolation structure on the side of the first initial isolation structure away from the substrate; sequentially etching the second initial isolation structure and the first initial isolation structure to form a first pixel opening exposing a first electrode of a first light-emitting device, a second pixel opening exposing a first electrode of a second light-emitting device, and a third pixel opening exposing a first electrode of a third light-emitting device; sequentially forming a light-emitting functional layer and a second electrode of the first light-emitting device within the first pixel opening; sequentially forming a light-emitting functional layer and a second electrode of the second light-emitting device within the second pixel opening; and sequentially forming a light-emitting functional layer and a second electrode of the third light-emitting device within the third pixel opening. Wherein, after the first initial isolation structure and the second initial isolation structure form the first pixel opening, the second pixel opening, and the third pixel opening, they respectively become a first isolation pattern and a second isolation pattern; the first isolation pattern includes a first portion and a second portion stacked along a direction away from the substrate, the second portion including a first edge portion extending relative to the first portion towards the center line of the adjacent pixel opening. The second electrodes of the first, second, and third light-emitting devices are all in contact with and electrically connected to the second isolation pattern. Along the first direction, the light-emitting functional layers of the first, second, and third light-emitting devices are all located between the plane containing the surface of the first edge portion near the substrate and the first electrode, where the first direction is the thickness direction of the substrate.

[0034] The beneficial effects achievable by the above-described method for manufacturing the display panel are the same as those achievable by the above-described display panel, and will not be repeated here.

[0035] In another aspect, a display panel is provided. The display panel includes a substrate, an isolation structure, a plurality of light-emitting devices, a first isolation film group, and a second isolation film group. The isolation structure is disposed on the substrate, defining a first pixel opening and a second pixel opening. The plurality of light-emitting devices includes a first light-emitting device and a second light-emitting device. The first light-emitting device is disposed within the first pixel opening. The second light-emitting device is disposed within the second pixel opening. The first light-emitting device and the second light-emitting device emit different colors. Both the first and second light-emitting devices include a first electrode and a second electrode disposed opposite to each other along a first direction, with the first electrode closer to the substrate than the second electrode. The first direction is the thickness direction of the substrate. The second electrode is in contact with and electrically connected to the isolation structure. The first light-emitting device further includes a first light-emitting functional layer located between the first electrode and the second electrode. The second light-emitting device further includes a second light-emitting functional layer located between the first electrode and the second electrode. The first isolation film group includes a first isolation layer and a second isolation layer stacked along a direction away from the substrate. The first isolation layer and the first light-emitting functional layer are made of the same material, and the second isolation layer and the second electrode are made of the same material. The second isolation film group includes a third isolation layer and a fourth isolation layer stacked along a direction away from the substrate. The third isolation layer is made of the same material as the second light-emitting functional layer, and the fourth isolation layer is made of the same material as the second electrode. Both the first and second isolation film groups are located on the side of the isolation structure away from the substrate. The first isolation film group includes a first edge portion away from the first light-emitting device, the size of which gradually decreases in a first direction; and / or, the second isolation film group includes a second edge portion away from the second light-emitting device, the size of which gradually decreases in a first direction; the first edge portion and the second edge portion located between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device overlap each other.

[0036] Understandably, through the above configuration, the first and second partition film groups can overlap with each other through the first edge portion and the second edge portion. This has several advantages: first, it helps to improve the structural integrity of the fifth part; second, it reduces the manufacturing difficulty of the display panel; and third, it allows for a smoother dimensional change in the overlapping portion of the first and second partition film groups in the first direction. This prevents cracks from forming in the encapsulation structure due to corner areas and improves encapsulation performance.

[0037] In some embodiments, the first partition assembly further includes a first partition portion connected to the first edge portion, the first partition portion being closer to the first light-emitting device than the first edge portion. The second partition assembly further includes a second partition portion connected to the second edge portion, the second partition portion being closer to the second light-emitting device than the second edge portion. In the region between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion and the second edge portion in a first direction is less than the sum of the dimensions of the first partition portion and the second partition portion in the first direction.

[0038] In some embodiments, the plurality of light-emitting devices further includes a third light-emitting device. The third light-emitting device includes a third light-emitting functional layer. The first, second, and third light-emitting devices emit different colors. The display panel further includes a third isolation film assembly. The third isolation film assembly is located on the side of the isolation structure away from the substrate. The third isolation film assembly includes a fifth isolation layer and a sixth isolation layer stacked in a direction away from the substrate. The fifth isolation layer and the third light-emitting functional layer are made of the same material, and the sixth isolation layer and the second electrode are made of the same material. The third isolation film assembly includes a third edge portion away from the third light-emitting device, and the size of the third edge portion gradually decreases in a first direction. The first edge portion and the second edge portion located between the first light-emitting device and the third light-emitting device adjacent to the first light-emitting device overlap each other; and / or, the second edge portion and the third edge portion located between the second light-emitting device and the third light-emitting device adjacent to the second light-emitting device overlap each other.

[0039] In some embodiments, the third partition film assembly further includes a third partition portion connected to the third edge portion, the third partition portion being closer to the third light-emitting device than the third edge portion. In the region between the first light-emitting device and the third light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion and the third edge portion in the first direction is less than the sum of the dimensions of the first partition portion and the third partition portion in the first direction; and / or, in the region between the second light-emitting device and the third light-emitting device adjacent to the second light-emitting device, the maximum value of the sum of the dimensions of the second edge portion and the third edge portion in the first direction is less than the sum of the dimensions of the second partition portion and the third partition portion in the first direction.

[0040] In some embodiments, the display panel further includes a first encapsulation pattern, a second encapsulation pattern, and a third encapsulation pattern. The first encapsulation pattern covers a portion of the surface of the first light-emitting device and the second barrier layer away from the substrate. The first blocking pattern also includes a portion of the first encapsulation pattern covering the surface of the second barrier layer away from the substrate. The second encapsulation pattern covers the second light-emitting device and a portion of the surface of the fourth barrier layer away from the substrate. The second blocking pattern also includes a portion of the second encapsulation pattern covering the surface of the fourth barrier layer away from the substrate. The third encapsulation pattern covers the third light-emitting device and a portion of the surface of the sixth barrier layer away from the substrate. The third blocking pattern also includes a portion of the third encapsulation pattern covering the surface of the sixth barrier layer away from the substrate.

[0041] In another aspect, a display device is provided. The display device includes a circuit board and a display panel as described in any of the above embodiments. The circuit board and the display panel are electrically connected.

[0042] The beneficial effects that the above-mentioned display device can achieve are the same as those that the above-mentioned display panel can achieve, and will not be repeated here.

[0043] In another aspect, a mask assembly is provided. The mask assembly includes at least one mask. The mask includes subpixel patterns corresponding to subpixels of a display panel, the boundaries of which have microstructures.

[0044] Understandably, when the boundary of a sub-pixel pattern has a microstructure, the material in the mask layer directly opposite the boundary of the sub-pixel pattern is in a semi-exposed state. After development, the portion of the mask layer directly opposite the boundary of the sub-pixel pattern is retained, and the thickness of the retained mask layer is less than the thickness before etching. This can form a region with a gradual change in film thickness. In this way, when etching the film group to be etched, the etching amount of the film group directly opposite the boundary of the sub-pixel pattern is less than the etching amount of the film group to be etched away from the pixel opening. This allows the partition film group in the display panel to include the edge portion, so that adjacent edge portions can overlap each other. This has three advantages: first, it helps to improve the flatness of the display panel and improve the encapsulation performance; second, it allows the partition film group to better cover the fifth part, which helps to improve the structural integrity of the fifth part; and third, it can reduce the manufacturing difficulty of the display panel.

[0045] In some embodiments, the photomask includes a light-shielding substrate defining an opening, the opening being a sub-pixel pattern, and microstructures formed on the light-shielding substrate. Alternatively, the photomask includes a light-transmitting substrate and a blocking pattern disposed on the light-transmitting substrate, the blocking pattern being a sub-pixel pattern, and microstructures formed on the blocking pattern.

[0046] In some embodiments, the microstructure includes a plurality of sub-patterns arranged along the boundaries of the sub-pixel patterns.

[0047] In some embodiments, at least one photomask includes a first photomask and a second photomask. The first photomask is used to fabricate a first light-emitting device of the display panel, and the second photomask is used to fabricate a second light-emitting device of the display panel. The microstructure of the first photomask includes a plurality of first sub-patterns, and the microstructure of the second photomask includes a plurality of second sub-patterns. The first sub-patterns and the second sub-patterns have the same shape; and / or, the spacing between two adjacent first sub-patterns and the spacing between two adjacent second sub-patterns are the same.

[0048] In some embodiments, at least one photomask further includes a third photomask. The third photomask is used to fabricate a third light-emitting device for the display panel. The microstructure of the third photomask includes a plurality of third sub-patterns. The first sub-patterns, the second sub-patterns, and the third sub-patterns have the same shape; and / or, the spacing between two adjacent first sub-patterns, the spacing between two adjacent second sub-patterns, and the spacing between two adjacent third sub-patterns are the same.

[0049] In some embodiments, the shape of the sub-graphic is a rectangle, square, triangle, or trapezoid. Attached Figure Description

[0050] To more clearly illustrate the technical solutions in this disclosure, the accompanying drawings used in some embodiments of this disclosure will be briefly described below. Obviously, the drawings described below are only drawings of some embodiments of this disclosure, and those skilled in the art can obtain other drawings based on these drawings. In addition, the drawings described below can be regarded as schematic diagrams and are not intended to limit the actual size of the product, the actual flow of the method, the actual timing of the signals, etc. involved in the embodiments of this disclosure.

[0051] Figure 1 This is a structural diagram of a display device according to some embodiments;

[0052] Figure 2 This is a structural diagram of a display panel according to some embodiments;

[0053] Figure 3 This is a structural diagram of a first light-emitting device according to some embodiments;

[0054] Figure 4A This is a structural diagram of a first light-emitting device according to some other embodiments;

[0055] Figure 4B This is a structural diagram of a display panel according to some other embodiments;

[0056] Figure 5 This is a structural diagram of a display panel according to some other embodiments;

[0057] Figure 6A partial view of the microstructure of a display panel according to some embodiments;

[0058] Figure 7 This is a structural diagram of a display panel according to some other embodiments;

[0059] Figure 8 A partial view of the microstructure of a display panel according to some other embodiments;

[0060] Figure 9A This is a structural diagram of a display panel according to some other embodiments;

[0061] Figure 9B This is a structural diagram of a display panel according to some other embodiments;

[0062] Figure 9C This is a structural diagram of a display panel according to some other embodiments;

[0063] Figure 10A This is a flowchart of the manufacturing process of a display panel according to some embodiments;

[0064] Figure 10B This is a flowchart of the manufacturing process of a display panel according to some other embodiments;

[0065] Figure 11A This is a step diagram of the manufacturing process of a display panel according to some embodiments;

[0066] Figure 11B This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0067] Figure 11C This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0068] Figure 11D This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0069] Figure 11E This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0070] Figure 11F This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0071] Figure 11G This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0072] Figure 11H This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0073] Figure 11IThis is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0074] Figure 11J This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0075] Figure 12A This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0076] Figure 12B This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0077] Figure 12C This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0078] Figure 12D This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0079] Figure 12E This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0080] Figure 12F This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0081] Figure 12G This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0082] Figure 12H This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0083] Figure 12I This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0084] Figure 12J This is a step diagram of the manufacturing process of a display panel according to some other embodiments;

[0085] Figure 13A This is an arrangement diagram of the first, second, and third projections of a mask assembly according to some embodiments on a reference plane;

[0086] Figure 13B This is an arrangement diagram of the first, second, and third projections of a mask assembly according to some other embodiments on a reference plane;

[0087] Figure 14A This is a structural diagram of a first mask template according to some embodiments;

[0088] Figure 14B This is a structural diagram of a first mask template according to some other embodiments;

[0089] Figure 15A This is a structural diagram of a second mask template according to some embodiments;

[0090] Figure 15B This is a structural diagram of a second mask template according to some other embodiments;

[0091] Figure 16A This is an arrangement diagram of the first, second, and third projections of a mask assembly according to some other embodiments on a reference plane;

[0092] Figure 16B This is a diagram showing the arrangement of the first projection, second projection, and third projection in the projection unit of a mask assembly according to some embodiments on a reference plane.

[0093] Figure 17A This is a structural diagram of a third mask template according to some embodiments;

[0094] Figure 17B This is a structural diagram of a third mask template according to some other embodiments;

[0095] Figure 18A This is an arrangement diagram of the first, second, and third projections of a mask assembly according to some other embodiments on a reference plane;

[0096] Figure 18B This is a diagram showing the arrangement of the first projection, the second projection, and the third projection in the projection unit of a mask assembly according to some other embodiments on a reference plane.

[0097] Figure 19A This is an arrangement diagram of the first, second, and third projections of a mask assembly according to some other embodiments on a reference plane;

[0098] Figure 19B This is a diagram showing the arrangement of the first projection, the second projection, and the third projection in the projection unit of a mask assembly according to some other embodiments on a reference plane.

[0099] Figure 20A This is an arrangement diagram of the first, second, and third projections of a mask assembly according to some other embodiments on a reference plane;

[0100] Figure 20B This is a diagram showing the arrangement of the first projection, the second projection, and the third projection in the projection unit of a mask assembly according to some other embodiments on a reference plane.

[0101] Figure 21A This is an arrangement diagram of the first, second, and third projections of a mask assembly according to some other embodiments on a reference plane;

[0102] Figure 21B This is a diagram showing the arrangement of the first projection, second projection, and third projection in the projection unit of a mask assembly according to some other embodiments on a reference plane. Detailed Implementation

[0103] The technical solutions in some embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments provided in this disclosure are within the scope of protection of this disclosure.

[0104] Unless the context otherwise requires, throughout the specification and claims, the term "comprise" and its other forms, such as the third-person singular "comprises" and the present participle "comprising," are interpreted as open-ended and encompassing, meaning "including, but not limited to." In the description of the specification, terms such as "one embodiment," "some embodiments," "exemplary embodiments," "example," "specific example," or "some examples," etc., are intended to indicate that a particular feature, structure, material, or characteristic associated with that embodiment or example is included in at least one embodiment or example of this disclosure. The illustrative representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics mentioned may be included in any suitable manner in any one or more embodiments or examples.

[0105] Hereinafter, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of embodiments of this disclosure, unless otherwise stated, "a plurality of" means two or more.

[0106] "At least one of A, B and C" has the same meaning as "at least one of A, B or C", both including the following combinations of A, B and C: only A, only B, only C, combinations of A and B, combinations of A and C, combinations of B and C, and combinations of A, B and C.

[0107] "A and / or B" includes the following three combinations: A only, B only, and a combination of A and B.

[0108] The use of “applies to” or “configured to” in this article implies an open and inclusive language that does not preclude applicability to or configuration to devices that perform additional tasks or steps.

[0109] As used herein, “about,” “approximately,” or “approximately” includes the stated value and the average value within an acceptable range of deviation from the given value, wherein the acceptable range of deviation is determined by a person skilled in the art taking into account the measurement under discussion and the error associated with the measurement of the given quantity (i.e., the limitations of the measurement system).

[0110] As used herein, “parallel,” “perpendicular,” and “equal” include the described situation and situations that are similar to the described situation, within an acceptable range of deviation, which is determined by those skilled in the art taking into account the measurement under discussion and the error associated with the measurement of a particular quantity (i.e., the limitations of the measurement system). For example, “parallel” includes absolute parallelism and approximate parallelism, where an acceptable range of deviation for approximate parallelism may be, for example, within 5°; “perpendicular” includes absolute perpendicularity and approximate perpendicularity, where an acceptable range of deviation for approximate perpendicularity may also be, for example, within 5°; “equal” includes absolute equality and approximate equality, where an acceptable range of deviation for approximate equality may be, for example, a difference between the two equals being less than or equal to 5% of either one.

[0111] It should be understood that when a layer or element is referred to as being on another layer or substrate, it can mean that the layer or element is directly on the other layer or substrate, or that there is an intermediate layer between the layer or element and the other layer or substrate.

[0112] This document describes exemplary embodiments with reference to cross-sectional views and / or plan views, which are idealized exemplary drawings. In the drawings, the thickness of layers and the area of ​​regions are enlarged for clarity. Therefore, variations in shape relative to the drawings are contemplated due to, for example, manufacturing techniques and / or tolerances. Thus, exemplary embodiments should not be construed as being limited to the shapes of the regions shown herein, but rather include shape deviations due to, for example, manufacturing processes. For example, etched areas shown as rectangular would typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to show the actual shapes of the areas of the device, nor are they intended to limit the scope of the exemplary embodiments.

[0113] It should be noted that, for example, 11 to 1 in the accompanying drawings of this disclosure indicate that component 11 belongs to component 1. Figure 5In the figures, 220A to 200A indicate that the first light-emitting functional layer 220A belongs to the first light-emitting device 200A. Other similar reference numerals appearing in the figures also follow the above description. For example, 1 / 2 in the figures of this disclosure indicates that both component 1 and component 2 can refer to that component. For example, in the attached figures… Figure 5 In this context, 200A / 200 indicates that the first light-emitting device 200A and the light-emitting device 200 can both be represented by this component. Other similar reference numerals appearing in the accompanying drawings also follow the above explanation.

[0114] like Figure 1 As shown, some embodiments of this disclosure provide a display device 400, which includes a display panel 300.

[0115] The aforementioned display device 400 may be, for example, an OLED (Organic Light Emitting Diode) display device.

[0116] For example, such as Figure 1 As shown, the display device 400 also includes a circuit board 410. The circuit board 410 is electrically connected to the display panel 300. The circuit board 410 is used to input various signals required for displaying images to the display panel 300, such as control signals, power supply voltage signals, and data signals.

[0117] In addition, the display device 400 may also include an under-display camera and an under-display fingerprint sensor, enabling the display device 400 to perform various functions such as taking photos, recording videos, fingerprint recognition, or facial recognition.

[0118] The aforementioned display device 400 can be any display device that displays either moving (e.g., video) or stationary (e.g., still images), and whether it is text or images. More specifically, the display device 400 of the described embodiment is contemplated for implementation in or associated with a variety of electronic devices, such as (but not limited to) mobile phones, wireless devices, personal data assistants (PDAs), handheld or portable computers, GPS receivers / navigators, cameras, MP4 video players, camcorders, game consoles, watches, clocks, calculators, television monitors, flat panel displays, computer monitors, automotive displays (e.g., odometer displays, etc.), navigators, cockpit controllers and / or displays, displays of camera views (e.g., displays of rearview cameras in vehicles), electronic photographs, electronic billboards or signs, projectors, architectural structures, packaging and aesthetic structures (e.g., displays of images of a piece of jewelry), etc.

[0119] In some examples, the display device 400 is an AR or VR display device with a high pixel density. In this case, the display panel 300 can be an AMOLED display panel, thus leveraging the high contrast advantage of AMOLED display panels to improve display performance.

[0120] In some embodiments, such as Figure 2 As shown, the display panel 300 includes a substrate 310.

[0121] For example, the material of the substrate 310 can be a rigid material, such as glass, to realize a rigid substrate display; or the material of the substrate 310 can also be a flexible material, such as polyimide (PI), to realize a flexible substrate display.

[0122] For example, the material of substrate 310 may include inorganic materials, such as soda-lime glass, quartz glass, or sapphire glass. Alternatively, the material of substrate 310 may also include organic materials, such as one or any combination of polymethyl methacrylate, polyvinyl alcohol, polyvinylphenol, polyethersulfone, polyimide, polyamide, polyacetal, polycarbonate, polyethylene terephthalate, and polyethylene naphthalate. Or, the material of substrate 310 may include both organic and inorganic materials.

[0123] In some embodiments, such as Figure 2 As shown, the display panel 300 includes a light-emitting device 200 and an isolation structure 100 disposed on a substrate 310. The isolation structure 100 defines a pixel opening Q. The light-emitting device 200 is disposed within the pixel opening Q.

[0124] For example, the display panel 300 includes a plurality of light-emitting devices 200, and the isolation structure 100 defines a plurality of pixel openings Q, with the plurality of light-emitting devices 200 correspondingly disposed within the plurality of pixel openings Q.

[0125] Understandably, when the isolation structure 100 includes multiple pixel openings Q, and the light-emitting device 200 is disposed within the pixel openings Q, the isolation structure 100 can be configured to define the pixel openings Q for forming the light-emitting device 200. In this way, the light emitted by the light-emitting device 200 can be emitted from a designated area of ​​the display panel 300, thus avoiding color crosstalk.

[0126] In some embodiments, such as Figure 5 As shown, the isolation structure 100 includes a first isolation pattern 110 and a second isolation pattern 120 stacked along a direction away from the substrate 310. The material of the first isolation pattern 110 includes an insulating material.

[0127] It should be understood that when the isolation structure 100 includes a first isolation pattern 110 and a second isolation pattern 120, the first isolation pattern 110 and the second isolation pattern 120 together define the pixel opening Q.

[0128] In some embodiments, the material of the second isolation pattern 120 includes a conductive material.

[0129] In some examples, such as Figure 2 As shown, the display panel 300 also includes an array layer 320 disposed between the substrate 310 and the plurality of light-emitting devices 200. The array layer 320 includes a plurality of pixel driving circuits 321, wherein each pixel driving circuit 321 includes a plurality of transistor TFTs. Each pixel driving circuit 321 is electrically connected to a light-emitting device 200 and is used to drive the light-emitting device 200 to emit light.

[0130] For example, in the display panel 300, the pixel driving circuit 321 can generate a driving current. Each light-emitting device 200 can emit light under the driving action of the driving current generated by the corresponding pixel driving circuit 321. The light emitted by multiple light-emitting devices 200 cooperates with each other, thereby enabling the display panel 300 to achieve the display function.

[0131] In some examples, such as Figure 2 and Figure 5 As shown, the display panel 300 also includes an encapsulation structure 330 covering the side of the isolation structure 100 and the plurality of light-emitting devices 200 away from the substrate 310.

[0132] Understandably, the encapsulation structure 330 covers the light-emitting device 200, encapsulating the light-emitting device 200 to prevent moisture and oxygen from the external environment from entering the display panel 300 and damaging the materials (e.g., organic materials) in the light-emitting device 200, thereby shortening the lifespan of the display panel 300.

[0133] For example, multiple light-emitting devices 200 may be arranged in a direction parallel to the plane of the substrate 310.

[0134] In some embodiments, such as Figure 4B As shown, the display panel 300 includes at least one red light-emitting device 200R, at least one green light-emitting device 200G, and at least one blue light-emitting device 200B. Under the action of a driving voltage, the red light-emitting device 200R is configured to emit red light, the green light-emitting device 200G is configured to emit green light, and the blue light-emitting device 200B is configured to emit blue light.

[0135] Thus, by setting up multiple light-emitting devices 200, including at least one red light-emitting device 200R, at least one green light-emitting device 200G, and at least one blue light-emitting device 200B, the brightness (grayscale) of the red light-emitting device 200R, the green light-emitting device 200G, and the blue light-emitting device 200B can be adjusted respectively. Through color combination and superposition, multiple colors can be displayed, thereby realizing the full-color display of the display panel 300.

[0136] In some examples, the plurality of light-emitting devices 200 of the display panel 300 also include at least one white light-emitting device configured to emit white light. This configuration allows the use of the white light-emitting device to enhance the light output brightness of the display panel 300.

[0137] In some embodiments, such as Figures 3-5 As shown, the light-emitting device 200 includes a first electrode 210, a light-emitting functional layer 220, and a second electrode 230 stacked along a direction away from the substrate 310. The light-emitting functional layer 220 includes at least one light-emitting layer 221.

[0138] In some embodiments, such as Figure 5 As shown, the second electrode 230 is in contact with and electrically connected to the second isolation pattern 120.

[0139] In some examples, when the second electrode 230 is in contact with and electrically connected to the second isolation pattern 120, the second electrode 230 has a non-full-surface connected structure, that is, the second electrode 230 is a non-full-surface electrode.

[0140] With this configuration, the second electrode 230 can be electrically connected to the second isolation pattern 120, and the second electrodes 230 of multiple light-emitting devices 200 can obtain the same reference voltage signal, such as a signal from the VSS signal line.

[0141] For example, when the second electrode 230 is in contact with and electrically connected to the second isolation pattern 120, the first light-emitting device 200A can be a light-emitting device fabricated using a photolithography process. When the light-emitting device 200 is fabricated using a photolithography process, the patterning of the light-emitting functional layer 220 is achieved through the photolithography process. For example, an initial light-emitting functional layer that is completely connected can be formed first, and then a photolithography process can be used to remove the initial light-emitting functional layer located in areas other than the selected pixel area, while retaining the initial light-emitting functional layer located in the selected pixel area. In this way, the initial light-emitting functional layer located in the selected pixel area can form a light-emitting functional layer.

[0142] In some examples, after patterning the initial light-emitting functional layer, the retained initial light-emitting functional layer includes a portion located within the pixel opening and a portion located on the side of the isolation structure away from the substrate. Therefore, an isolation structure is needed to separate these two portions to prevent crosstalk between adjacent sub-pixels.

[0143] In some examples, a second initial electrode layer for forming multiple second electrodes is provided on the side of the initial light-emitting functional layer away from the substrate. During the patterning of the initial light-emitting functional layer, the second initial electrode layer is also patterned, so that the second initial electrode layer located in the selected pixel area forms the second electrode. In this case, the second initial electrode layer is also disconnected when the isolation structure disconnects the initial light-emitting functional layer. Therefore, the formed second electrode is a non-fully connected structure, that is, the second electrodes located in each pixel opening are spaced apart. In order to obtain the same reference voltage signal for the second electrodes in each pixel opening, the second electrodes can be electrically connected. Therefore, by setting the second electrodes to contact and be electrically connected to the second isolation pattern, the electrical connection between the second electrodes can be achieved.

[0144] It should be noted that, Figure 3 , Figure 4A and Figure 4B This is a simplified schematic diagram of the display panel 300 after removing all film layers except those related to the light-emitting device 200.

[0145] In some examples, such as Figure 3 and Figure 4A As shown, the first electrode 210 is the anode and the second electrode 230 is the cathode. In this case, the light-emitting device 200 can be called a positively positioned light-emitting device. In some other examples, the first electrode 210 is the cathode and the second electrode 230 is the anode. In this case, the light-emitting device 200 can be called an inverted light-emitting device.

[0146] For example, the anode material can be a conductive metal oxide material, such as indium tin oxide (ITO) or indium zinc oxide (IZO). Alternatively, the anode can be a composite electrode containing multiple materials, such as ITO / Ag / ITO, Ag / IZO, CNT / ITO, CNT / IZO, GO / ITO, or GO / IZO, where Ag is silver, CNT is carbon nanotube, and GO is graphene oxide.

[0147] For example, the cathode material can be a metallic material, a metal oxide, or a metal alloy, such as aluminum (Al), silver (Ag), gold (Au), magnesium (Mg), calcium (Ca), ytterbium (Yb), indium (In), lithium (Li), potassium (K), sodium (Na), tin (Sn), titanium (Ti), lead (Pb), samarium (Sm), yttrium (Y), indium tin oxide (ITO), magnesium-silver alloy (Mg:Ag), ytterbium-gold alloy (Yb:Au), and ytterbium-silver alloy. The cathode material can be a multilayer material, such as magnesium / aluminum (Yb:Ag), lithium-aluminum alloy (Li:Al), or lithium-calcium-magnesium alloy (Li:Ca:Al); or, the cathode material can be a multilayer material, such as magnesium / aluminum (Mg / Al), magnesium / silver (Mg / Ag), aluminum / silver (Al / Ag), aluminum / gold (Al / Au), ytterbium / gold (Yb / Au), ytterbium / silver (Yb / Ag), calcium / magnesium (Ca / Mg), calcium / silver (Ca / Ag), barium / silver (Ba / Ag), etc.

[0148] In some examples, such as Figure 3 As shown, the light-emitting device 200 includes a light-emitting layer 221. In this case, the light-emitting device 200 is a single-layer light-emitting device (also referred to as a Single light-emitting device, such as a Single OLED light-emitting device). In other examples, such as... Figure 4A As shown, the light-emitting device 200 includes a plurality (e.g., two) light-emitting layers 221 arranged along the thickness direction of the substrate 310. In this case, the light-emitting device 200 is a series light-emitting device (also referred to as a tandem light-emitting device, such as a tandem OLED light-emitting device).

[0149] In some embodiments, such as Figure 4A As shown, when the light-emitting device 200 includes multiple light-emitting layers 221, the light-emitting functional layer 220 also includes a charge-generating unit 222, which is located between two adjacent light-emitting layers 221.

[0150] In some examples, such as Figure 4A As shown, the charge generation unit 222 includes an electron generation layer 2221 (also referred to as N-CGL) and a hole generation layer 2222 (also referred to as P-CGL) stacked together; the electron generation layer 2221 is closer to the anode than the hole generation layer 2222.

[0151] Through the aforementioned charge generation unit 222, multiple light-emitting layers 221 can be sequentially connected in the vertical direction of the light-emitting surface. Moreover, in the stacked OLED light-emitting device, the charge generation unit 222 not only serves to connect the light-emitting layers 221, but also helps to improve the generation efficiency of charges (holes or electrons), which can have a significant impact on the performance of the first light-emitting device 200A.

[0152] For example, the material of electron generation layer 2221 includes an electron transport material and a metallic material. For example, the material of hole generation layer 2222 includes a hole transport material and a p-type dopant (PD).

[0153] In some embodiments, such as Figure 3 and Figure 4A As shown, to improve the luminous efficiency of the light-emitting device 200, the light-emitting functional layer 220 further includes a hole transport functional layer 223 located on the anode side of the light-emitting layer 221, and / or an electron transport functional layer 224 located on the cathode side of the light-emitting layer 221. The hole transport functional layer 223 includes, for example, at least one of a stacked hole injection layer 2231 (HIL), a hole transport layer 2232 (HTL), and an electron blocking layer 2233 (EBL). The electron transport functional layer 224 includes, for example, at least one of a stacked electron injection layer 2241 (EIL), an electron transport layer 2242 (ETL), and a hole blocking layer 2243 (EBL).

[0154] By setting up the hole injection layer 2231, hole transport layer 2232, electron blocking layer 2233, electron injection layer 2241, electron transport layer 2242, and hole blocking layer 2243, it is equivalent to setting up transition steps between the anode and the light-emitting layer 221, and between the cathode and the light-emitting layer 221, reducing the potential barrier height that carrier transitions need to overcome, and thus making the luminous efficiency higher.

[0155] The aforementioned hole transport functional layer 223, electron transport functional layer 224, and charge generation unit 222 include some highly conductive films (hereinafter referred to as conductive films K, see [reference]). Figure 6 These conductive film layers K can be, for example, the electron transport layer of a single light-emitting device, or the charge generation unit of a tandem light-emitting device. These conductive film layers K exhibit properties similar to those of a metallic conductor.

[0156] In the technique of fabricating light-emitting devices using photolithography, the second electrode 230 contacts and is electrically connected to the side of the second isolation pattern 120 to achieve electrical connection between the second electrodes 230. However, the conductive film layers K in the light-emitting functional layer 220 also overlap and couple with the side of the second isolation pattern 120, causing a short circuit between the first electrode 210 and the second isolation pattern 120. This prevents the second electrode 230 from connecting to the driving signal, resulting in the light-emitting device 200 failing to light up. For example, Figure 6 An electron microscope image of the light-emitting device 200 when the conductive film layer K overlaps the side of the second isolation pattern 120; as shown. Figure 6 As shown, the conductive film layer K can be overlapped at the bottom corner J of the second isolation pattern 120 near the substrate 310, so that the conductive film layer K is coupled to the second isolation pattern 120.

[0157] Based on this, some embodiments of this disclosure provide a display panel 300. For example... Figure 5 As shown, the first isolation pattern 110 includes a first portion 111 and a second portion 112 stacked along a direction away from the substrate 310. The second portion 112 includes a first edge portion 112a, which extends relative to the first portion 111 in a direction close to the center line M of the adjacent pixel opening Q. Along the first direction X, the light-emitting functional layer 220 is located between the plane containing the surface of the first edge portion 112a near the substrate 310 and the first electrode 210, where the first direction X is the thickness direction of the substrate.

[0158] It should be understood that when the display panel 300 includes multiple light-emitting devices 200 and the isolation structure 100 defines multiple pixel openings Q, the number of first edge portions 112a can be multiple, and the first edge portions 112a can be configured in a one-to-one correspondence with the light-emitting devices 200. In some examples, multiple pixel openings Q are configured in a one-to-one correspondence with multiple first edge portions 112a; in other examples, some pixel openings Q have first edge portions 112a, while other pixel openings Q do not have first edge portions 112a.

[0159] Here, the first edge portion 112a extending towards the center line M of the adjacent pixel opening Q relative to the first portion 111 means that the first edge portion 112a is closer to the center line M of the adjacent pixel opening Q relative to the first portion 111. It should be noted that the center line M of the pixel opening Q is a virtual line located within the pixel opening Q and perpendicular to the substrate 310. The center of the pixel opening Q can be roughly determined through this center line M. When the cross-section of the pixel opening Q parallel to the substrate 310 is a regular shape, the center line M of the pixel opening Q passes through the geometric center of this regular shape.

[0160] In some examples, the plurality of first edge portions 112a included in the second part 112 are spaced apart, and each first edge portion 112a surrounds the center line M of a pixel opening Q, that is, the first edge portion 112a can be closed.

[0161] It should be understood that during the formation of the light-emitting functional layer 220, the material of the light-emitting functional layer 220 (including the material of the conductive film layer) will be distributed on the side of the first electrode 210 away from the substrate 310, and may also be distributed on the side of the first edge portion 112a away from the substrate 310. The portion distributed on the side of the first electrode 210 away from the substrate 310 can constitute the light-emitting functional layer 220.

[0162] Understandably, by including a first edge portion 112a in the second part 112, which extends relative to the first part 111 towards the center line M of the adjacent pixel opening Q, a first recessed structure V1 (also called a first undercut structure) can be formed on the first isolation pattern 110. The material of the light-emitting functional layer 220 is difficult to climb at this first recessed structure V1, preventing the material of the light-emitting functional layer 220 from completely filling the first recessed structure V1. Thus, along the first direction X, the light-emitting functional layer 220 can be confined between the plane containing the first edge portion 112a near the surface of the substrate 310 and the first electrode 210, preventing the light-emitting functional layer 220 from interacting with the distributed... The material of the conductive film layer on the side of the first edge portion 112a away from the substrate 310 is connected so that current transmission cannot be formed between the light-emitting functional layer 220 and the material of the conductive film layer on the side of the first edge portion 112a away from the substrate 310. In this way, even if the material of the conductive film layer distributed on the side of the first edge portion 112a away from the substrate 310 overlaps with the second isolation pattern 120, it will not be connected to the first electrode 210. This can prevent a short circuit between the first electrode 210 and the second isolation pattern 120, and prevent the second electrode 230 from being unable to connect to the driving signal due to a short circuit. This can improve the reliability of the light-emitting device 200 when it is lit, thereby improving the yield of the light-emitting device 200 prepared by the photolithography process.

[0163] Based on the above structure, in some embodiments, such as Figure 5 As shown, the display panel 300 also includes a first pattern layer 340. The first pattern layer 340 is located on the side of the first edge portion 112a away from the substrate 310; the material of the light-emitting functional layer 220 is the same as the material of the first pattern layer 340. The first pattern layer 340 and the light-emitting functional layer 220 are spaced apart in the first direction X.

[0164] It should be understood that the material of the light-emitting functional layer 220 distributed on the side of the first edge portion 112a away from the substrate 310 forms the first pattern layer 340. Therefore, the material of the light-emitting functional layer 220 is the same as the material of the first pattern layer 340, and the material of the first pattern layer 340 includes the material of the conductive film layer.

[0165] In some examples, where the second portion 112 includes a plurality of first edge portions 112a, the first pattern layer 340 includes a plurality of first patterns 341. The plurality of first patterns 341 are spaced apart, and each first pattern 341 surrounds the center line M of a pixel opening Q.

[0166] Understandably, when the light-emitting functional layer 220 is located between the plane of the first edge portion 112a near the surface of the substrate 310 and the first electrode 210 along the first direction X, and the first pattern layer 340 is located on the side of the first edge portion 112a away from the substrate 310, the light-emitting functional layer 220 and the first pattern layer 340 are disconnected, thus preventing a short circuit between the first electrode 210 and the second isolation pattern 120.

[0167] It should be noted that the materials in Part 111 and Part 212 may be the same or different.

[0168] In some examples, the material of the first part 111 is the same as that of the second part 112. In this case, the first part 111 and the second part 112 can be two parts in different positions in the same film layer.

[0169] In some embodiments, such as Figure 5 As shown, the material of the first part 111 includes a first insulating material; the material of the second part 112 includes a second insulating material, and the first insulating material and the second insulating material are different.

[0170] It should be understood that when the first isolation pattern 110 includes a first part 111 and a second part 112, both the first part 111 and the second part 112 are patterned structures.

[0171] In some examples, the pattern of the first part 111 and the pattern of the second part 112 are formed using different steps. In this case, a mask with a different opening pattern can be selected, or a mask layer with a different pattern can be used to form the pattern of the first part 111 and the pattern of the second part 112 respectively, so as to form a plurality of first edge portions 112a in the second part 112.

[0172] In some other examples, the pattern of the first part 111 and the pattern of the second part 112 are formed using the same steps. In this case, the difference in etching rates between the first insulating material and the second insulating material can be utilized, i.e., the etching selectivity ratio of the two insulating materials can be used to form the pattern of the second part 112 during the process of forming the pattern of the first part 111, so as to form a plurality of first edge portions 112a in the second part 112.

[0173] Therefore, by setting the materials of the first part 111 and the second part 112 to be different, the process feasibility of forming the first part 111 and the second part 112 can be improved.

[0174] In some embodiments, under the same etching conditions, the etching rate of the first insulating material is greater than the etching rate of the second insulating material.

[0175] For example, the same etching conditions can be the same dry etching process conditions; or, the same etching conditions can be the same wet etching process conditions; of course, the same etching conditions can also be the same conditions of other etching processes. There is no limitation here, as long as the requirement that the etching rate of the first insulating material is greater than the etching rate of the second insulating material is met.

[0176] Understandably, the above settings allow the amount of etching of the first insulating material to be greater than that of the second insulating material under the same etching conditions, so as to form the first edge portion 112a in the second portion 112. In this way, the pattern of the first portion 111 and the pattern of the second portion 112 can be formed by the same etching process, thus simplifying the formation process of the first isolation pattern 110 and simplifying the manufacturing process of the display panel 300.

[0177] It should be noted that there are no restrictions on the relative size relationship between the first part 111 along the first direction X and the second part 112 along the first direction X. In some examples, the size L1 of the first part 111 along the first direction X is less than or equal to the size L2 of the second part 112 along the first direction X.

[0178] In some embodiments, such as Figure 5 As shown, the dimension L1 of the first part 111 along the first direction X is greater than the dimension L2 of the second part 112 along the first direction X.

[0179] By setting it in this way, the size L1 of the first part 111 along the first direction X can be relatively large. In this way, the size of the first recessed structure V1 formed on the first isolation pattern 110 along the first direction X can be relatively large, making it difficult for the material of the light-emitting functional layer 220 to climb at the first recessed structure V1. This can improve the blocking effect of the first isolation pattern 110 on the light-emitting functional layer 220 and the first pattern layer 340.

[0180] In some embodiments, such as Figure 5 As shown, the first isolation pattern 110 also includes a third portion 113. The third portion 113 is located between the first portion 111 and the substrate 310. The third portion 113 includes a second edge portion 113a, which surrounds the center line M of the adjacent pixel opening Q and extends relative to the first portion 111 in a direction closer to the center line M of the adjacent pixel opening Q. The dimension L1 of the first portion 111 along the first direction is greater than the dimension L3 of the third portion 113 along the first direction.

[0181] Understandably, when the dimension L1 of the first part 111 along the first direction X is greater than the dimension L3 of the third part 113 along the first direction X, the dimension L1 of the first part 111 along the first direction X can be relatively large. In this way, the dimension of the first recessed structure V1 formed on the first isolation pattern 110 along the first direction X can be relatively large. As mentioned above, this can improve the blocking effect of the first isolation pattern 110 on the light-emitting functional layer 220 and the first pattern layer 340.

[0182] For example, the material of the third part 113 includes an insulating material. Here, there is no limitation on the type of insulating material included in the third part 113. For example, the material of the third part 113 may include a third insulating material that is different from both the first and second insulating materials. As another example, the material of the third part 113 may include a first insulating material. In this case, the pattern of the third part 113 and the pattern of the first part 111 may be formed in different steps to form the aforementioned second edge portion 113a.

[0183] In some embodiments, such as Figure 5 As shown, the material of the third part 113 is the same as the material of the second part 112.

[0184] For example, the material of the third part 113 and the material of the second part 112 are both the second insulating material.

[0185] Understandably, when the material of the third portion 113 is the same as the material of the second portion 112, the etching conditions for forming the third portion 113 can be the same as the etching conditions for forming the second portion 112. In this way, the third portion 113 can be formed during the etching process of the second portion 112, and the second edge portion 113a of the third portion 113 can be formed during the etching process of the first edge portion 112a of the second portion 112. This simplifies the formation process of the first isolation pattern 110, thereby simplifying the manufacturing process of the display panel 300.

[0186] In some embodiments, such as Figure 5 As shown, the edge of the second edge portion 113a is closer to the center line M of the adjacent pixel opening Q than the edge of the first edge portion 112a.

[0187] In some examples, the microstructure of the first isolation pattern 110 and the first electrode 210 in the display panel 300 is shown in the following figures. Figure 8 As shown, by Figure 8 It can be seen that the material of the third part 113 and the material of the second part 112 can both be the second insulating material, which can be SiO2. The edge of the second edge portion 113a is closer to the center line M of the adjacent pixel opening Q than the edge of the first edge portion 112a (see [reference]). Figure 5 ).

[0188] It should be understood that the patterns of the first part 111, the second part 112, and the third part 113 can be formed using the same steps. In this way, when the material of the third part 113 is the same as that of the second part 112, the second part 112 is closer to the outside than the third part 113, so that the degree of etching of the second part 112 is higher than that of the third part 113. Thus, the amount of etching of the second part 112 is greater than that of the third part 113, and the edge of the second edge portion 113a is closer to the center line M of the adjacent pixel opening Q than the edge of the first edge portion 112a.

[0189] For example, the process for forming the pattern of the first part 111, the pattern of the second part 112, and the pattern of the third part 113 can be a dry etching process. The contact time between the etching gas and the material of the second part 112 is relatively long, and the contact time between the etching gas and the material of the third part 113 is relatively short, so that the amount of etching of the second part 112 is greater than the amount of etching of the third part 113.

[0190] As mentioned above, the first electrode 210 can be a composite electrode containing multiple materials, and the material in the middle can be a metallic material. In this case, the material in the middle of the first electrode 210 may be a metallic material that is easily oxidized. When the sides of the first electrode 210 are exposed, this metallic material is prone to oxidation, affecting the conductivity of the first electrode 210. For example, as... Figure 8 As shown, the material of the first electrode 210 is ITO / Ag / ITO. If the side of the first electrode 210 is exposed, silver is prone to oxidation.

[0191] Therefore, in some embodiments, such as Figure 7 As shown, the edge of the first part 111 near the pixel opening Q covers the edge of the first electrode 210.

[0192] Here, the edge of the first part 111 near the pixel opening Q covers the edge of the first electrode 210. This can be understood as the orthographic projection of the first part 111 on the substrate 310 overlapping with the edge of the orthographic projection of the first electrode 210 on the substrate 310.

[0193] In some embodiments, such as Figure 5 As shown, the first isolation pattern 110 includes a third portion 113, and the edge of the second edge portion 113a of the third portion 113 near the pixel opening Q1 covers the edge of the first electrode 210.

[0194] Here, the edge of the second edge portion 113a near the pixel opening Q covers the edge of the first electrode 210. This can be understood as the orthogonal projection of the second edge portion 113a on the substrate 310 overlapping with the edge of the orthogonal projection of the first electrode 210 on the substrate 310.

[0195] Understandably, through the above arrangement, the side of the first electrode 210 can be covered by the material of the first portion 111 or the material of the second edge portion 113a. In this way, it can prevent easily oxidized metal materials that may exist in the first electrode 210 from coming into contact with oxygen, thereby improving the conductivity of the first electrode 210.

[0196] In some embodiments, the material of the first part 111 includes silicon nitride.

[0197] When the material of the first part 111 includes silicon nitride, the material of the first part 111 has the advantages of being easy to etch and easy to obtain. In this way, when forming the pattern of the first part 111, the pattern of the second part 112, and the pattern of the possible third part 113, the etching amount of the first part 111 can be relatively large, which can improve the process feasibility of forming the first recessed structure V1 in the first isolation pattern 110.

[0198] In some embodiments, the material of the second part 112 includes silicon oxide.

[0199] When the material of the second portion 112 includes silicon oxide, the material of the second portion 112 is readily available and the etching rate is relatively low. In this way, when forming the pattern of the first portion 111, the pattern of the second portion 112, and the pattern of the possible third portion 113, the amount of etching of the second portion 112 and / or the third portion 113 can be relatively small, which can improve the process feasibility of forming the first recessed structure V1 in the first isolation pattern 110.

[0200] The above is an exemplary description of the first isolation pattern 110. The second isolation pattern 120 will be described exemplary below.

[0201] In some embodiments, such as Figure 5 and Figure 7 As shown, the second isolation pattern 120 includes a fourth portion 121 and a fifth portion 122 stacked in a direction away from the substrate 310. The fifth portion 122 includes a third edge portion 122a, which surrounds the center line M of the adjacent pixel opening Q and extends relative to the fourth portion 121 in a direction closer to the center line M of the adjacent pixel opening Q. The second electrode 230 is in contact with and electrically connected to the fourth portion 121.

[0202] Understandably, during the formation of the light-emitting functional layer 220, the material of the light-emitting functional layer 220 may also be distributed on the side of the second isolation pattern 120 away from the substrate 310. By providing the fifth part 122 including the third edge part 122a, a second recessed structure V2 (also called a second undercut structure) can be formed on the second isolation pattern 120. This can improve the barrier effect of the second isolation pattern 120 on the light-emitting functional layer 220 and the material of the light-emitting functional layer 220 distributed on the side of the second isolation pattern 120 away from the substrate 310. In this way, the material of the light-emitting functional layer 220 distributed on the side of the second isolation pattern 120 away from the substrate 310 can be prevented from having an adverse effect on the light-emitting functional layer 220. For example, it can prevent water vapor and oxygen in the external environment from entering the light-emitting functional layer 220 through this part of the material and causing damage to the material of the light-emitting functional layer 220.

[0203] As mentioned above, the process for forming at least one first light-emitting device 200A can be a photolithography process. In some embodiments, before etching, an initial light-emitting functional layer needs to be formed on the side of the first electrode 210 and the isolation structure 100 away from the substrate 310, and a temporary encapsulation layer needs to be formed on the side of the initial light-emitting functional layer away from the substrate 310. The material of the light-emitting functional layer 220 is the same as the material of the initial light-emitting functional layer. In this way, after the light-emitting functional layer 220 is formed by etching, the side surface of the initial light-emitting functional layer will be exposed.

[0204] In some examples, during the etching process to form the light-emitting functional layer 220, the exposed side of the initial light-emitting functional layer is connected to the light-emitting functional layer 220, or the exposed side of the initial light-emitting functional layer is the same as the side of the light-emitting functional layer 220, making it easy for moisture and oxygen from the external environment to enter the light-emitting functional layer 220 and damage the material of the light-emitting functional layer 220.

[0205] Therefore, in some embodiments, the display panel 300 further includes a second pattern layer 350. The second pattern layer 350 is located on the side of the fifth portion 122 away from the substrate 310; the material of the light-emitting functional layer 220 is the same as the material of the second pattern layer 350. The first pattern layer 340 and the second pattern layer 350 are spaced apart in the first direction X.

[0206] It should be understood that the portion of the initial light-emitting functional layer located on the side of the second isolation pattern 120 away from the substrate 310 that is not etched away forms the second pattern layer 350. Moreover, the material of the light-emitting functional layer 220 is the same as the material of the second pattern layer 350.

[0207] In some examples, where the fifth part 122 includes a plurality of third edge portions 122a, the second pattern layer 350 includes a plurality of second patterns 351, the plurality of second patterns 351 being spaced apart, and each second pattern 351 surrounding the center line M of a pixel opening Q.

[0208] It should be understood that when the first pattern layer 340 and the second pattern layer 350 have a gap in the first direction X, the first pattern layer 340 and the second pattern layer 350 are disconnected.

[0209] Understandably, when the display panel 300 also includes a second pattern layer 350, located on the side of the fifth portion 122 away from the fourth portion 121, the opening of the photomask used when forming the light-emitting device 200 through etching can be relatively large, thus reducing the process difficulty of forming the light-emitting device 200. Furthermore, when the first pattern layer 340 and the second pattern layer 350 are disconnected, moisture and oxygen from the external environment can be prevented from entering the light-emitting functional layer 220 through the second pattern layer 350, thus preventing damage to the material of the light-emitting functional layer 220.

[0210] In some embodiments, the material of the fourth part 121 includes a first metallic material, and the material of the fifth part 122 includes a second metallic material. The first metallic material and the second metallic material are not the same.

[0211] It should be understood that, in the case where the second isolation pattern 120 includes a fourth part 121 and a fifth part 122, both the fourth part 121 and the fifth part 122 are patterned structures.

[0212] In some examples, the pattern of the fourth part 121 and the pattern of the fifth part 122 are formed using different steps. In this case, a mask with a different opening pattern can be selected, or a mask layer with a different pattern can be used to form the pattern of the fourth part 121 and the pattern of the fifth part 122 respectively, so as to form a plurality of third edge portions 122a in the fifth part 122.

[0213] In some other examples, the pattern of the fourth part 121 is formed using the same steps as the pattern of the fifth part 122. In this case, the difference in etching rates between the first metal material and the second metal material can be utilized, i.e., the etching selectivity ratio of the two metal materials can be used to form the pattern of the fifth part 122 during the process of forming the pattern of the fourth part 121, so as to form a plurality of third edge portions 122a in the fifth part 122.

[0214] Therefore, by setting the first metal material and the second metal material to be different, the process feasibility of forming multiple third edge portions 122a can be improved.

[0215] In some embodiments, under the same etching conditions, the etching rate of the first metal material is greater than the etching rate of the second metal material.

[0216] For example, the same etching conditions can be the conditions of the same dry etching process; or, the same etching conditions can be the conditions of the same wet etching process; of course, the same etching conditions can also be the conditions of other etching processes. There is no limitation here, as long as the requirement that the etching rate of the first metal material is greater than the etching rate of the second metal material is met.

[0217] Understandably, through the above settings, the amount of etching of the first metal material can be greater than that of the second metal material under the same etching conditions, so as to form a plurality of third edge portions 122a in the fifth portion 122. In this way, the pattern of the fourth portion 121 and the pattern of the fifth portion 122 can be formed by the same etching process. Thus, the formation process of the second isolation pattern 120 can be simplified, and the manufacturing process of the display panel 300 can be simplified.

[0218] In some embodiments, such as Figure 5 and Figure 7 As shown, the dimension L4 of the fourth part 121 along the first direction X is greater than the dimension L5 of the fifth part 122 along the first direction X.

[0219] By setting it in this way, the size L4 of the fourth part 121 along the first direction X can be relatively large. In this way, the size of the second recessed structure V2 formed on the second isolation pattern 120 along the first direction X can be relatively large, which can increase the distance between the light-emitting functional layer 220 and the second pattern layer 350 in the first direction X, thereby improving the blocking effect of the second isolation pattern 120 on the light-emitting functional layer 220 and the second pattern layer 350.

[0220] In some examples, the material of the second isolation pattern 120 includes a deformable material, making the second isolation pattern 120 easily deformable during the manufacturing process and / or use of the display panel 300. For example, when the material of the second isolation pattern 120 includes aluminum, aluminum is a heat-deformable metal material, making the second isolation pattern 120 easily deformable during the heating process of the display panel 300. The deformation that occurs is, for example, the formation of protrusions on the surface of the second isolation pattern 120.

[0221] In some embodiments, such as Figure 5 and Figure 7 As shown, the second isolation pattern 120 also includes a sixth portion 123. The sixth portion 123 is located between the fourth portion 121 and the first isolation pattern 110.

[0222] Understandably, when the second isolation pattern 120 also includes a sixth part 123, the fourth part 121 can be sandwiched between the fifth part 122 and the sixth part 123. In this way, the fifth part 122 and the sixth part 123 can be used to improve the deformation resistance of the material of the fourth part 121, making the material of the fourth part 121 less prone to deformation under the action of the external environment (e.g., thermal environment). Thus, the structural stability of the second isolation pattern 120 can be improved.

[0223] It should be understood that the material of the sixth part 123 can be the same as the material of the fifth part 122, and both are materials with good resistance to deformation; that is, the material of the sixth part 123 may include a second metallic material. This enhances the effect of improving the resistance to deformation of the material of the fourth part 121. Furthermore, the pattern of the sixth part 123 can be formed in the same steps as the pattern of the fourth part 121 and the pattern of the fifth part 122.

[0224] In this case, in some embodiments, the sixth portion 123 includes a fourth edge portion 123a that surrounds the center line M of the adjacent pixel opening Q and extends relative to the fourth portion 121 toward the center line M of the adjacent pixel opening Q; the second electrode 230 contacts and is electrically connected to the fourth edge portion 123a.

[0225] In some examples, the fourth edge portion 123a is also formed during the etching process that forms the third edge portion 122a.

[0226] In some embodiments, the dimension L4 of the fourth portion 121 along the first direction is greater than the dimension L6 of the sixth portion 123 along the first direction X.

[0227] Understandably, when the dimension L4 of the fourth part 121 along the first direction is greater than the dimension L6 of the sixth part 123 along the first direction X, the dimension L4 of the fourth part 121 along the first direction X can be relatively large. In this way, the dimension of the second recessed structure V2 formed on the second isolation pattern 120 along the first direction X can be relatively large. As mentioned above, this can improve the blocking effect of the second isolation pattern 120 on the light-emitting functional layer 220 and the second pattern layer 350.

[0228] In some embodiments, the first metallic material includes aluminum.

[0229] When the first metal material includes aluminum, the first metal material has the advantages of being easy to etch and readily available. In this way, when forming the pattern of the fourth part 121, the pattern of the fifth part 122, and the pattern of the possible sixth part 123, the etching amount of the fourth part 121 can be relatively large, which can improve the process feasibility of forming the second recessed structure V2 in the second isolation pattern 120.

[0230] In some embodiments, the second metallic material includes one or both of titanium and molybdenum.

[0231] When the second metallic material includes one or both of titanium and molybdenum, the second metallic material is readily available and has a relatively low etching rate. This allows for a relatively small etching amount in the fifth portion 122 and / or the sixth portion 123 when forming the patterns of the fourth portion 121, the fifth portion 122, and possibly the sixth portion 123. This improves the feasibility of forming the second recessed structure V2 in the second isolation pattern 120. Furthermore, when the second metallic material includes one or both of titanium and molybdenum, it is a non-deformable metallic material, which enhances the deformation resistance of the material in the fourth portion 121.

[0232] The above is an exemplary description of the second isolation pattern 120. The following is an exemplary description of the package structure 330.

[0233] In some embodiments, such as Figure 5 and Figure 7 As shown, the encapsulation structure 330 includes a first sublayer 331, a second sublayer 332, and a third sublayer 333 stacked along a direction away from the substrate 310. The materials of the first sublayer 331 and the third sublayer 333 are, for example, inorganic materials (e.g., TFE), and the material of the second sublayer 332 is, for example, an organic material.

[0234] For example, the process for forming the first sublayer 331 and / or the third sublayer 333 can be a chemical vapor deposition (CVD) process. The process for forming the second sublayer 332 can be an inkjet printing (IJP) process.

[0235] In some embodiments, such as Figure 5 and Figure 7 As shown, the surface of the second electrode 230 that is away from the substrate 310 is closer to the substrate 310 in the first direction X than the surface of the isolation structure 100 that is away from the substrate 310. The display panel 300 also includes an encapsulation pattern 360. The encapsulation pattern 360 includes covering the light-emitting device 200, the sidewall of the pixel opening Q, the surface of the third edge portion 122a of the fifth portion 122 near the substrate 310, the side surface of the fifth portion 122, and at least a portion of the surface of the fifth portion 122 away from the substrate 310.

[0236] In some examples, the temporary encapsulation layer located on the side of the initial light-emitting functional layer away from the substrate 310, as described above, forms an encapsulation pattern 360 after etching.

[0237] Therefore, by including the encapsulation pattern 360 in the display panel 300, the material of the initial light-emitting functional layer (e.g., organic material) can be prevented from being damaged by moisture and oxygen in the external environment, thus improving the lifespan of the display panel 300.

[0238] In some examples, the encapsulation pattern 360 is reused in the first sublayer 331 of the encapsulation structure 330.

[0239] Understandably, when the encapsulation pattern 360 covers the sidewall of the pixel opening Q, the second pattern 351 and the light-emitting functional layer 220 can be isolated by the material of the encapsulation pattern 360. In this way, the corrosion resistance and density of the material of the encapsulation pattern 360 can be utilized to improve the barrier effect between the light-emitting functional layer 220 and the second pattern layer 350, and prevent the material of the light-emitting functional layer 220 (e.g., organic material) from being damaged by moisture and oxygen in the external environment. Thus, the lifespan of the display panel 300 can be improved.

[0240] In some embodiments, such as Figure 7 As shown, the encapsulation pattern 360 includes a first sub-pattern 3601 and a second sub-pattern 3602 stacked along a direction away from the substrate 310. The density of the first sub-pattern 3601 is greater than that of the second sub-pattern 3602.

[0241] For example, the material of the first sub-pattern 3601 includes one or any combination of zirconium oxide, alumina, and tetrafluoroethylene. The process for forming the first sub-pattern 3601 is, for example, atomic layer deposition (ALD).

[0242] For example, the second sub-pattern 3602 is made of tetrafluoroethylene. Tetrafluoroethylene has high corrosion resistance and heat resistance, which improves the encapsulation effect of the second sub-pattern 3602 on the material of the light-emitting functional layer 220. The process for forming the second sub-pattern 3602 is, for example, a chemical vapor deposition (CVD) process.

[0243] With the above settings, the portion of the encapsulation pattern 360 with relatively high density (i.e., the first pattern layer 3601) can be placed closer to the light-emitting device 200 than the portion of the encapsulation pattern 360 with relatively low density (i.e., the second sub-pattern 3602). This can improve the encapsulation effect of the encapsulation pattern 360 on the sidewall of the pixel opening Q, the second pattern layer 350, and the light-emitting device 200, thereby improving the encapsulation effect of the encapsulation pattern 360 on the material of the light-emitting functional layer 220.

[0244] In some embodiments, such as Figure 5 and Figure 7 As shown, the display panel 300 includes light-emitting devices 200, including a first light-emitting device 200A and a second light-emitting device 200D, wherein the first light-emitting device 200A and the second light-emitting device 200D emit different colors. The encapsulation pattern 360 includes a first encapsulation pattern 361 covering the first light-emitting device 200A and a second encapsulation pattern 362 covering the second light-emitting device 200D.

[0245] In some examples, the light emitted by the first light-emitting device 200A is any one of red light, green light, and blue light, and the light emitted by the second light-emitting device 200D is any one of red light, green light, and blue light other than the light emitted by the first light-emitting device 200A.

[0246] In some embodiments, the steps of forming the first light-emitting device 200A and the second light-emitting device 200D in the method for manufacturing the display panel 300 are different; that is, the first light-emitting device 200A and the second light-emitting device 200D can be formed sequentially. In this case, the first encapsulation pattern 361 and the second encapsulation pattern 362 can also be formed sequentially, thus achieving pixel-level encapsulation.

[0247] Therefore, the materials of the first packaging pattern 361 and the second packaging pattern 362 can be the same or different. The thickness of the first packaging pattern 361 and the thickness of the second packaging pattern 362 can be the same or different.

[0248] In some embodiments, such as Figure 7 As shown, the thickness H1 of the first packaging pattern 361 is the same as or approximately the same as the thickness H2 of the second packaging pattern 362.

[0249] In some embodiments, such as Figure 5 As shown, the thickness H1 of the first packaging pattern 361 and the average thickness H2 of the second packaging pattern 362 are different.

[0250] Here, the thickness of the first package pattern 361 refers to the dimension of the first package pattern 361 perpendicular to its extension direction. The thickness of the second package pattern 362 refers to the dimension of the second package pattern 362 perpendicular to its extension direction.

[0251] Understandably, when the light-emitting colors of the first light-emitting device 200A and the second light-emitting device 200D are different, the thickness requirements of the encapsulation pattern for the first light-emitting device 200A and the second light-emitting device 200D are different. Therefore, by setting the thickness H1 of the first encapsulation pattern 361 and the thickness H2 of the second encapsulation pattern 362 to be different, the thickness H1 of the first encapsulation pattern 361 and the thickness H2 of the second encapsulation pattern 362 can be set differently according to the differences in the refractive index, extinction coefficient, etc. of the materials of the light-emitting functional layer 220 (including the first light-emitting functional layer 220A of the first light-emitting device 200A and / or the second light-emitting functional layer 220D of the second light-emitting device 200D) and / or the encapsulation pattern (including the first encapsulation pattern 361 and / or the second encapsulation pattern 362), as well as the differences in the light-emitting performance requirements of the first light-emitting device 200A and the second light-emitting device 200D, so that the luminous efficiency of both the first light-emitting device 200A and the second light-emitting device 200D can be maximized.

[0252] In some embodiments, such as Figure 5 , Figure 9A and Figure 9B As shown, the first light-emitting device 200A includes a first light-emitting functional layer 220A. The second light-emitting device 200D includes a second light-emitting functional layer 220D. The display panel 300 also includes a first isolation film group 370 and a second isolation film group 380. The first isolation film group 370 includes a first isolation layer 371 and a second isolation layer 372. The first isolation layer 371 is made of the same material as the first light-emitting functional layer 220A, and the second isolation layer 372 is made of the same material as the second electrode 230. The second isolation film group 380 includes a third isolation layer 381 and a fourth isolation layer 382. The third isolation layer 381 is made of the same material as the second light-emitting functional layer 220D, and the fourth isolation layer 382 is made of the same material as the second electrode 230. Both the first isolation film group 370 and the second isolation film group 380 are located on the side of the fifth portion 122 away from the substrate 310.

[0253] In some examples, such as Figure 5 , Figure 9A and Figure 9B As shown, for the technique of fabricating light-emitting devices using photolithography, the portion of the initial light-emitting functional layer (e.g., the first initial light-emitting functional layer 220Ai described below) corresponding to the first light-emitting functional layer 220A, located on the side of the fifth portion 122 away from the substrate 310, which is retained after etching, is the first barrier layer 371. Therefore, the first barrier layer 371 includes a portion covering the third edge portion 122a. In some examples, such as... Figure 5 , Figure 9A and Figure 9BAs shown, the first partition layer 371 also includes portions covering the other portions of the fifth portion 122 except for the third edge portion 122a. Moreover, the portion of the first partition layer 371 covering the third edge portion 122a has the same structure as the second pattern layer 350 corresponding to the first light-emitting device 200A.

[0254] Understandably, when the display panel 300 includes the first isolation film group 370, the opening of the photomask used when forming the first light-emitting device 200A by etching can be relatively large. When the display panel 300 includes the second isolation film group 380, the opening of the photomask used when forming the second light-emitting device 200D by etching can be relatively large. In this way, the process difficulty of forming the first light-emitting device 200A and the second light-emitting device 200D can be reduced.

[0255] It should be understood that when the first light-emitting device 200A and the second light-emitting device 200D are adjacent, the first isolation film group 370 includes a portion located between the first light-emitting device 200A and the second light-emitting device 200D, and the second isolation film group 380 includes a portion located between the first light-emitting device 200A and the second light-emitting device 200D. The relative positional relationship between this portion of the first isolation film group 370 and this portion of the second isolation film group 380 will be described exemplarily below.

[0256] In some embodiments, such as Figure 9A As shown, the first diaphragm group 370 and the second diaphragm group 380 have a spacing in the second direction Y; the second direction Y is parallel to the line connecting the center of the first light-emitting device 200A and the center of the second light-emitting device 200D.

[0257] Here, the center of the light-emitting device 200 can be understood as the light-emitting functional layer 220 and the first electrode 210 and the second electrode 230 directly opposite it along the first direction X, which can form a light-emitting device film group, and the center of the light-emitting device 200 is the geometric center of the light-emitting device film group. Specifically, the light-emitting device 200 is either a first light-emitting device 200A or a second light-emitting device 200D.

[0258] For example, the second direction Y is perpendicular to the first direction X.

[0259] Understandably, on the one hand, this configuration reduces the boundary requirements for the first light-emitting device 200A and the second light-emitting device 200D during their formation, thus lowering the manufacturing difficulty of the display panel 300 to some extent. On the other hand, it allows the surfaces of the first isolation film group 370 and the second isolation film group 380 that are away from the substrate 310 to be relatively flush, which helps improve the flatness of the display panel 300, prevents corner areas from appearing in the encapsulation structure 330, avoids cracks, and improves encapsulation performance.

[0260] In some embodiments, such as Figure 5 and Figure 7 As shown, the boundary 370a of the first isolation film group 370 away from the first light-emitting device 200A coincides with the boundary 380a of the second isolation film group 380 away from the second light-emitting device 200D.

[0261] Understandably, through the above configuration, firstly, the surfaces of the first isolation film group 370 that are away from the substrate 310 and the surfaces of the second isolation film group 380 that are away from the substrate 310 can be relatively flush, which is beneficial to improving the flatness of the display panel 300 and avoiding cracks, thus improving the encapsulation performance; secondly, the isolation film groups (e.g., the first isolation film group 370 and / or the second isolation film group 380) can better cover the fifth part 122, which can prevent the surface of the fifth part 122 that is away from the fourth part 121 from being etched multiple times because it is not covered by the pattern film group, thus improving the structural integrity of the fifth part 122.

[0262] In some embodiments, such as Figure 9B and Figure 9C As shown, in the second direction Y, in the first isolation film group 370 and the second isolation film group 380 located between the first light-emitting device 200A and the second light-emitting device 200D adjacent to the first light-emitting device 200A, one part overlaps the other on the side away from the substrate 310; the second direction Y is parallel to the line connecting the center of the first light-emitting device 200A and the center of the second light-emitting device 200D.

[0263] With this configuration, on the one hand, the first isolation film group 370 and the second isolation film group 380 can effectively cover the fifth part 122, preventing the surface of the fifth part 122 furthest from the fourth part 121 from being repeatedly etched due to lack of coverage. This avoids damage to the material of the fifth part 122 and improves its structural integrity. On the other hand, this configuration also reduces the boundary requirements for the first light-emitting device 200A and the second light-emitting device 200D during their formation, thus lowering the manufacturing difficulty of the display panel 300 to some extent.

[0264] In some examples, such as Figure 9B As shown, in the second direction Y, the second isolation membrane group 380 partially overlaps the side of the first isolation membrane group 370 away from the substrate 310.

[0265] In yet another example, in the second direction Y, the first blocking membrane group 370 partially overlaps the side of the second blocking membrane group 380 away from the substrate 310.

[0266] In some embodiments, such as Figure 9C As shown, the first barrier film assembly 370 includes a first edge portion 370A away from the first light-emitting device 200A, the dimension D1 of the first edge portion 370A gradually decreasing in the first direction X; and / or, the second barrier film assembly 380 includes a second edge portion 380A away from the second light-emitting device 200D, the dimension D2 of the second edge portion 380A gradually decreasing in the first direction X. The first edge portion 370A and the second edge portion 380A located between the first light-emitting device 200A and the second light-emitting device 200D adjacent to the first light-emitting device 200A overlap each other.

[0267] For example, the dimension D1 of the first edge portion 370 in the first direction X gradually decreases in the direction away from the first light-emitting device 200A. For example, the dimension D2 of the second edge portion 380 in the first direction X gradually decreases in the direction away from the second light-emitting device 200D.

[0268] Understandably, through the above-mentioned arrangement, the structural integrity of the fifth part 122 can be improved, and the manufacturing difficulty of the display panel 300 can be reduced. The first isolation film group 370 and the second isolation film group 380 can overlap with each other through the first edge portion 370A and the second edge portion 380A. In this way, the advantage of the gradual decrease in size of the first edge portion 370A and / or the second edge portion 380A in the first direction X can be taken advantage of, so that the size change of the overlapping part of the first isolation film group 370 and the second isolation film group 380 in the first direction X is relatively gentle. Thus, it can prevent the encapsulation structure 330 from cracking due to the presence of corner areas, and can improve the encapsulation performance.

[0269] In some embodiments, such as Figure 9C As shown, the first partition film assembly 370 further includes a first partition portion 370B connected to the first edge portion 370A, the first partition portion 370B being closer to the first light-emitting device 200A than the first edge portion 370A. The second partition film assembly 380 further includes a second partition portion 380B connected to the second edge portion 380A, the second partition portion 380B being closer to the second light-emitting device 200D than the second edge portion 380A. Within the region SS1 between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion 370A and the second edge portion 380A in the first direction X (i.e., D1+D2) is less than the sum of the dimensions of the first partition portion 370B and the second partition portion 380B in the first direction X, D3+D4. Wherein, the dimension of the first partition portion 370B in the first direction X is D3, and the dimension of the second partition portion 380B in the first direction X is D4.

[0270] In some examples, the interface position between the first edge portion 370A and the first partition portion 370B can be the critical position where the size of the first partition membrane assembly 370 changes along the first direction X (e.g., begins to decrease). The interface position between the second edge portion 380A and the second partition portion 380B is similar.

[0271] Understandably, when the maximum value of the sum of the dimensions of the first edge portion 370A and the second edge portion 380A in the first direction X (i.e., D1+D2) is less than the sum of the dimensions of the first partition portion 370B and the second partition portion 380B in the first direction X (D3+D4), the sum of the dimensions of the first edge portion 370A and the second edge portion 380A in the first direction X (i.e., D1+D2) is relatively small. In other words, the dimensions of the overlapping portion of the first partition film group 370 and the second partition film group 380 in the first direction X are relatively small. This reduces the height difference between the surface of the first partition film group 370 away from the substrate 310 and the surface of the second partition film group 380 away from the substrate 310, which is beneficial to improving the flatness of the display panel 300 and, as mentioned above, can improve the encapsulation performance.

[0272] In some embodiments, such as Figure 9C As shown, the light-emitting device 200 included in the display panel 300 also includes a third light-emitting device 200C, which includes a third light-emitting functional layer 220C; the first light-emitting device 200A, the second light-emitting device 200D and the third light-emitting device 200C all emit different colors.

[0273] The display panel 300 also includes a third isolation film group 390. The third isolation film group 390 is located on the side of the second isolation pattern 120 away from the substrate 310; the third isolation film group 390 includes a fifth isolation layer 391 and a sixth isolation layer 392 stacked in a direction away from the substrate 310, the fifth isolation layer 391 and the third light-emitting functional layer 220C are made of the same material, the sixth isolation layer 392 and the second electrode 230 are made of the same material; the third isolation film group 390 includes a third edge portion 390A away from the third light-emitting device 200C, the dimension D5 of the third edge portion 390A gradually decreases in the first direction X.

[0274] The first edge portion 370A and the third edge portion 390A located between the first light-emitting device 200A and the third light-emitting device 200C adjacent to the first light-emitting device 200A overlap each other; and / or, the second edge portion 380A and the third edge portion 390A located between the second light-emitting device 200D and the third light-emitting device 200C adjacent to the second light-emitting device 200D overlap each other.

[0275] In some examples, the light emitted by the first light-emitting device 200A is one of red, green, and blue light, the light emitted by the second light-emitting device 200D is another of red, green, and blue light, and the light emitted by the third light-emitting device 200C is yet another of red, green, and blue light.

[0276] For an understanding of the third partition membrane assembly 390, please refer to the description of the first partition membrane assembly 370 in the preceding section; for an understanding of the fifth partition layer 391, please refer to the description of the first partition layer 371 in the preceding section; for an understanding of the third edge portion 390A, please refer to the description of the first edge portion 370A in the preceding section; further details will not be repeated here.

[0277] Understandably, similar to the beneficial effects of overlapping the first edge portion 370A and the second edge portion 380A mentioned above, the above arrangement can improve the structural integrity of the fifth part 122 and reduce the manufacturing difficulty of the display panel 300. It can also make the dimensional changes in the overlapping portion of the first partition film group 370 and the third partition film group 390, and / or the second partition film group 380 and the third partition film group 390 in the first direction X more gradual. In this way, it can prevent the encapsulation structure 330 from cracking due to the presence of corner areas and improve the encapsulation performance.

[0278] In some embodiments, such as Figure 9C As shown, the third partition membrane assembly 390 also includes a third partition portion 390B connected to the third edge portion 390A, and the third partition portion 390B is closer to the third light-emitting device 200C than the third edge portion 390A.

[0279] Within region SS2 between the first light-emitting device 200A and the third light-emitting device 200C adjacent to the first light-emitting device 200A, the maximum value of the sum of the dimensions of the first edge portion 370A and the third edge portion 390A in the first direction X (i.e., D1+D5) is less than the sum of the dimensions of the first partition portion 370B and the third partition portion 390B in the first direction X, D2+D6; and / or,

[0280] Within region SS3 between the second light-emitting device 200D and the third light-emitting device 200C adjacent to the second light-emitting device 200D, the maximum value of the sum of the dimensions of the second edge portion 380A and the third edge portion 390A in the first direction X (i.e., D3+D5) is less than the sum of the dimensions of the second partition portion 380B and the third partition portion 390B in the first direction X, D4+D6. The dimension of the third partition portion 390B in the first direction X is D6.

[0281] For an understanding of the third partition 390B, please refer to the description of the first partition 370B in the preceding section; it will not be repeated here.

[0282] Understandably, similar to the beneficial effect of the maximum sum of the dimensions of the first edge portion 370A and the second edge portion 380A in the first direction X being less than the sum of the dimensions of the first partition portion 370B and the second partition portion 380B in the first direction X, the above arrangement allows the overlapping portions of the first partition film group 370 and the third partition film group 390, and / or the overlapping portions of the second partition film group 380 and the third partition film group 390, to have relatively small dimensions in the first direction X. This reduces the height difference between the surfaces of the first partition film group 370, the second partition film group 380, and the third partition film group 390 that are away from the substrate 310, which is beneficial for improving the flatness of the display panel 300 and, as mentioned above, can improve encapsulation performance.

[0283] In some embodiments, such as Figure 5 , Figures 9A to 9C As shown, the display panel 300 also includes a first encapsulation pattern 361 and a second encapsulation pattern 362. The first encapsulation pattern 361 covers the first light-emitting device 200A and a portion of the surface of the second isolation layer 372 away from the substrate 310; the first isolation film assembly 370 also includes a portion of the first encapsulation pattern 361 covering the surface of the second isolation layer 372 away from the substrate 310. The second encapsulation pattern 362 covers the second light-emitting device 200D and a portion of the surface of the fourth isolation layer 382 away from the substrate 310; the second isolation film assembly 380 also includes a portion of the second encapsulation pattern 362 covering the surface of the fourth isolation layer 382 away from the substrate 310.

[0284] For an understanding of the first package pattern 361 and the second package pattern 362, please refer to the description of the first package pattern 361 and the second package pattern 362 in the preceding section, which will not be repeated here.

[0285] Understandably, the first encapsulation pattern 361 can provide protection for the first isolation layer 371 and the second isolation layer 372 during the etching process of the first light-emitting device 200A, and the second encapsulation pattern 362 can provide protection for the third isolation layer 381 and the fourth isolation layer 382 during the etching process of the second light-emitting device 200D. In this way, the material of the initial light-emitting functional layer (including the initial light-emitting functional layer corresponding to the first light-emitting functional layer 220A and the second light-emitting functional layer 220D) can be prevented from being damaged by moisture and oxygen in the external environment, thereby improving the lifespan of the display panel 300.

[0286] The above is an exemplary description of the structure of the display panel 300. The following will provide an exemplary description of the manufacturing method of the display panel 300.

[0287] Some embodiments of this disclosure also provide a method for manufacturing a display panel 300, the method comprising steps S1 to S2.

[0288] S1: As Figure 5 As shown, an isolation structure 100 is formed on a substrate 310. The isolation structure 100 defines a pixel opening Q; the isolation structure 100 includes a first isolation pattern 110 and a second isolation pattern 120 stacked in a direction away from the substrate 310; the first isolation pattern 110 includes a first portion 111 and a second portion 112 stacked in a direction away from the substrate 310; the second portion 112 includes a first edge portion 112a, which extends relative to the first portion 111 in a direction close to the center line M of the adjacent pixel opening Q;

[0289] S2: Forming a light-emitting device 200. The light-emitting device 200 is disposed within the pixel opening Q and includes a first electrode 210, a light-emitting functional layer 220, and a second electrode 230 stacked along a direction away from the substrate 310. The second electrode 230 is in contact with and electrically connected to the second isolation pattern 120. Along the first direction X, the light-emitting functional layer 220 is located between the plane containing the surface of the first edge portion 112a near the substrate 310 and the first electrode 210. The first direction X is the thickness direction of the substrate 310.

[0290] The beneficial effects that can be achieved by the above-described method for manufacturing the display panel 300 are the same as those that can be achieved by the above-described display panel 300, and will not be repeated here.

[0291] In some embodiments, S2 includes S2.1 to S2.2.

[0292] S2.1: Before S1, the first electrode 210 of the light-emitting device 200 is formed on the substrate 310.

[0293] It should be understood that when the display panel 300 includes a plurality of light-emitting devices 200, first electrodes 210 of the plurality of light-emitting devices 200 are formed in S2.1, and the plurality of first electrodes 210 are spaced apart.

[0294] S2.2: After S1, other film structures other than the first electrode 210 are formed in the pixel opening Q of the light-emitting device 200.

[0295] In some embodiments, forming the isolation structure 100 (i.e., S1) includes S1.1 to S1.3.

[0296] S1.1: As Figure 12A As shown, a first initial isolation structure 110i is formed.

[0297] For example, the first initial isolation structure 110i includes a first initial film layer 111i and a second initial film layer 112i. In some examples, the first initial isolation structure 110i also includes a third initial film layer 113i.

[0298] For example, the process for forming the first initial film layer 111i and / or the process for forming the second initial film layer 112i can be a deposition process.

[0299] S1.2: As Figure 12A As shown, a second initial isolation structure 120i is formed on the side of the first initial isolation structure 110i away from the substrate 310.

[0300] For example, the second initial isolation structure 120i includes a fourth initial film layer 121i and a fifth initial film layer 122i. In some examples, the second initial isolation structure 120i also includes a sixth initial film layer 123i.

[0301] For example, the process for forming the fourth initial film layer 121i and / or the process for forming the fifth initial film layer 122i can be a deposition process.

[0302] S1.3: As Figure 12B As shown, the second initial isolation structure 120i is etched to form a second isolation pattern 120; the second isolation pattern 120 includes a second sub-opening Qb.

[0303] S1.4: such as Figure 12D As shown, the first initial isolation structure 110i is etched via the second sub-aperture Qb to form a first isolation pattern 110; the first isolation pattern 110 includes a first sub-aperture Qa, and the first sub-aperture Qa and the second sub-aperture Qb form a pixel opening Q.

[0304] With the above settings, the conditions of the patterning process can be set differently according to the different materials of the first isolation pattern 110 and the second isolation pattern 120, so that the formed second isolation pattern 120 includes a first edge portion 112a, and the first edge portion 112a extends relative to the first portion 111 in the direction close to the center line M of the pixel opening Q.

[0305] In some examples, S1.3A is included after S1.3 and before S1.4.

[0306] S1.3A: As Figure 12C As shown, a second mask layer PR2 is formed on the outside of the second isolation pattern 120.

[0307] The above settings can prevent the process of patterning the first initial isolation structure 110i from affecting the morphology of the formed second sub-opening Qb.

[0308] In some embodiments, the material of the first initial film layer 111i includes a first insulating material. The material of the second initial film layer 112i includes a second insulating material, and the first insulating material and the second insulating material are different. In this case, etching the first initial isolation structure 110i via the second sub-aperture Qb (S1.4) may specifically include: patterning the first initial film layer 111i and the second initial film layer 112i to form the first sub-aperture Qa; the portion of the first initial film layer 111i retained constitutes the first portion 111, and the portion of the second initial film layer 112i retained constitutes the second portion 112. During the patterning of the first initial film layer 111i and the second initial film layer 112i, the etching rate of the first insulating material is greater than the etching rate of the second insulating material.

[0309] Understandably, with the above settings, the first part 111 and the second part 112 corresponding to the same pixel opening Q can be formed by a single etching process. In this way, the formation process of the first isolation pattern 110 can be simplified, and the manufacturing process of the display panel 300 can be simplified.

[0310] In some embodiments, the plurality of pixel openings Q include at least one first pixel opening Q1 and at least one second pixel opening Q2. The display panel 300 includes at least one first light-emitting device 200A and at least one second light-emitting device 200D. The first light-emitting device 200A is disposed within the first pixel opening Q1, and the second light-emitting device 200D is disposed within the second pixel opening Q2; the color of the light emitted by the first light-emitting device 200A is different from the color of the light emitted by the second light-emitting device 200D.

[0311] In this case, the plurality of pixel openings Q formed in S1 include at least one first pixel opening Q1 and at least one second pixel opening Q2.

[0312] In some examples, at least one first pixel opening Q1 and at least one second pixel opening Q2 are formed in the same step.

[0313] As one possible implementation, multiple pixel openings Q can be formed by performing steps S1.1 to S1.4 once, such that at least one first pixel opening Q1 and at least one second pixel opening Q2 are formed in the same step.

[0314] In some other examples, at least one first pixel opening Q1 and at least one second pixel opening Q2 are formed in different steps.

[0315] For example, at least one first pixel opening Q1 and at least one second pixel opening Q2 can be formed by performing steps S1.1 to S1.4 twice.

[0316] In some embodiments, such as Figure 5 and Figure 7 As shown, the surface of the second electrode 230 that is away from the substrate 310 is closer to the substrate 310 than the surface of the isolation structure 100 that is away from the substrate 310. In this case, S2 also includes S2.3.

[0317] S2.3: Form an encapsulation pattern 360°.

[0318] For example, forming the package pattern 360 (i.e., S2.3) includes S2.3.1 and S2.3.2.

[0319] S2.3.1: A first sub-pattern 3601 is formed using atomic layer deposition (ALD) process. The first sub-pattern 3601 covers the light-emitting device 200, the sidewall of the pixel opening Q, the surface of the third edge portion 122a of the fifth portion 122 near the substrate 310, the side surface of the fifth portion 122, and at least a portion of the surface of the fifth portion 122 away from the substrate 310.

[0320] For example, the first sub-pattern 3601 also covers the side of the first pattern layer 340 away from the substrate 310.

[0321] S2.3.2: A second sub-pattern layer 3602 is formed on the side of the first sub-pattern 3601 away from the substrate 310 using a chemical vapor deposition (CVD) process.

[0322] Understandably, the above settings can improve the coverage of the first sub-pattern 3601, thereby enhancing the coverage effect of the first sub-pattern 3601 on the light-emitting device 200 and the sidewall of the pixel opening Q, and further improving the encapsulation effect of the encapsulation pattern 360 on the material of the light-emitting functional layer 220.

[0323] Some embodiments of this disclosure also provide a method for manufacturing a display panel 300, such as... Figure 10A and Figure 5 As shown, the preparation method includes T1 to T9.

[0324] T1: A plurality of first electrodes 210 are formed on the substrate 310.

[0325] T2: A first initial isolation structure 110i is formed on the substrate 310, the material of the first initial isolation structure 110i including an insulating material.

[0326] T3: A second initial isolation structure 120i is formed on the side of the first initial isolation structure 110i away from the substrate 310.

[0327] T4: Sequentially etch the second initial isolation structure 120i and the first initial isolation structure 110i to form the first pixel opening Q1 that exposes the first electrode 210 of the first light-emitting device 200A.

[0328] T5: The light-emitting functional layer 220A of the first light-emitting device 200A and the second electrode 230 are formed sequentially within the first pixel opening Q1.

[0329] T6: Sequentially etch the second initial isolation structure 120i and the first initial isolation structure 110i to form the second pixel opening Q2 that exposes the first electrode 210 of the second light-emitting device 200D.

[0330] T7: The light-emitting functional layer 220D of the second light-emitting device 200D and the second electrode 230 are sequentially formed within the second pixel opening Q2.

[0331] T8: Sequentially etch the second initial isolation structure 120i and the first initial isolation structure 110i to form the third pixel opening Q3 of the first electrode 210 that exposes the third light-emitting device 200C.

[0332] T9: The light-emitting functional layer 220C of the third light-emitting device 200C and the second electrode 230 are formed sequentially within the third pixel opening Q3.

[0333] Wherein, the first initial isolation structure 110i and the second initial isolation structure 120i form the first pixel opening Q1, the second pixel opening Q2 and the third pixel opening Q3, respectively, which are then the first isolation pattern 110 and the second isolation pattern 120. The first isolation pattern 110 includes a first portion 111 and a second portion 112 stacked along a direction away from the substrate 310. The second portion 112 includes a first edge portion 112a, which extends relative to the first portion 111 towards the center line M of the adjacent pixel opening Q. The second electrodes 230 of the first light-emitting device 200A, the second light-emitting device 200D and the third light-emitting device 200C are all in contact with and electrically connected to the second isolation pattern 120. Along the first direction X, the light-emitting functional layers 220 of the first light-emitting device 200A, the second light-emitting device 200D and the third light-emitting device 200C are all located between the plane where the surface of the first edge portion 112a near the substrate 310 is located and the first electrode 210. The first direction X is the thickness direction of the substrate 310.

[0334] The beneficial effects that can be achieved by the above-described method for manufacturing the display panel 300 are the same as those that can be achieved by the above-described display panel 300, and will not be repeated here.

[0335] Some embodiments of this disclosure also provide a method for manufacturing a display panel 300, such as... Figure 10B and Figure 5As shown, the preparation method includes W1 to W7.

[0336] W1: Multiple first electrodes 210 are formed on the substrate 310.

[0337] W2: A first initial isolation structure 110i is formed on the substrate 310, the material of the first initial isolation structure 110i including an insulating material.

[0338] W3: A second initial isolation structure 120i is formed on the side of the first initial isolation structure 110i away from the substrate 310.

[0339] W4: Sequentially etch the second initial isolation structure 120i and the first initial isolation structure 110i to form a first pixel opening Q1 that exposes the first electrode 210 of the first light-emitting device 200A, a second pixel opening Q2 that exposes the first electrode 210 of the second light-emitting device 200D, and a third pixel opening Q3 that exposes the first electrode 210 of the third light-emitting device 200C.

[0340] W5: The light-emitting functional layer 220 of the first light-emitting device 200A and the second electrode 230 are formed sequentially within the first pixel opening Q1.

[0341] W6: The light-emitting functional layer 220D of the second light-emitting device 200D and the second electrode 230 are sequentially formed within the second pixel opening Q2.

[0342] W7: The light-emitting functional layer 220C of the third light-emitting device 200C and the second electrode 230 are formed sequentially within the third pixel opening Q3.

[0343] Wherein, the first initial isolation structure 110i and the second initial isolation structure 120i form the first pixel opening Q1, the second pixel opening Q2 and the third pixel opening Q3, respectively, which are the first isolation pattern 110 and the second isolation pattern 120. The first isolation pattern 110 includes a first portion 111 and a second portion 120 stacked along a direction away from the substrate 310. The second portion 112 includes a first edge portion 112a, which extends relative to the first portion 111 towards the center line M of the adjacent pixel opening Q. The second electrodes 230 of the first light-emitting device 200A, the second light-emitting device 200D and the third light-emitting device 200C are all in contact with and electrically connected to the second isolation pattern 120. Along the first direction X, the light-emitting functional layers 220 of the first light-emitting device 200A, the second light-emitting device 200D and the third light-emitting device 200C are all located between the plane where the surface of the first edge portion 112a near the substrate 310 is located and the first electrode 210. The first direction X is the thickness direction of the substrate 310.

[0344] The beneficial effects that can be achieved by the above-described method for manufacturing the display panel 300 are the same as those that can be achieved by the above-described display panel 300, and will not be repeated here.

[0345] To illustrate more clearly, Example 1 is used to exemplarily describe the case where at least one first pixel opening Q1 and at least one second pixel opening Q2 are formed in the same step, and Example 2 is used to exemplarily describe the case where at least one first pixel opening Q1 and at least one second pixel opening Q2 are formed in different steps. In the following examples, the method for removing the material of the initial light-emitting functional layer (e.g., the first initial light-emitting functional layer 220Ai, the first initial light-emitting functional layer 220Di, or the third initial light-emitting functional layer 220Ci), the second initial electrode (e.g., the second initial electrode represented by reference numerals 230i, 230ii, or 230iii), and the initial encapsulation layer (e.g., the first initial encapsulation layer 361i, the second initial encapsulation layer 362i, or the third initial encapsulation layer 363i) is, for example, a dry etching process.

[0346] Preparation Example 1

[0347] The manufacturing method of the display panel 300, such as Figures 11A to 11J As shown, it includes R1 to R16.

[0348] R1: As Figure 11A As shown, a substrate 310 is provided.

[0349] R2: such as Figure 11A As shown, a first electrode 210 of a plurality of light-emitting devices 200 is formed on a substrate 310.

[0350] R3: such as Figure 11A As shown, a third initial film layer 113i, a first initial film layer 111i, a second initial film layer 112i, a sixth initial film layer 123i, a fourth initial film layer 121i, and a fifth initial film layer 122i are sequentially formed on the side of the plurality of first electrodes 210 away from the substrate 310. The first initial film layer 111i and the third initial film layer 113i are made of silicon oxide, the second initial film layer 112i is made of silicon nitride, the sixth initial film layer 123i and the fifth initial film layer 122i are made of titanium, and the fourth initial film layer 121i is made of aluminum.

[0351] R4: such as Figure 11B As shown, a third initial film layer 113i, a first initial film layer 111i, a second initial film layer 112i, a sixth initial film layer 123i, a fourth initial film layer 121i, and a fifth initial film layer 122i are patterned using one or more etching processes to form at least one first pixel opening Q1.

[0352] R5: such as Figure 11CAs shown, using a full-surface vapor deposition process, a first initial light-emitting functional layer 220Ai and a second initial electrode 230i are sequentially formed in at least one first pixel opening Q1 and on the side of the fifth initial film layer 122i retained in R4 away from the substrate 310.

[0353] R6: such as Figure 11D As shown, a first initial encapsulation layer 361i is formed on the side of the second initial electrode 230i away from the first initial light-emitting functional layer 220Ai using a deposition process.

[0354] R7: such as Figure 11E As shown, an etching process is used to remove the material of the first initial light-emitting functional layer 220Ai, the second initial electrode 230i, and the first initial encapsulation layer 361i, which are located away from at least one first pixel opening Q1. The retained first initial light-emitting functional layer 220Ai forms the first light-emitting functional layer 220A, the first pattern layer 340, and the second pattern layer 350. The retained second initial electrode 230i forms at least one second electrode 230 of the first light-emitting device 200A and a portion of the first isolation film group 370. The retained first initial encapsulation layer 361i forms the first encapsulation pattern 361.

[0355] In some examples, the material removed from the first initial light-emitting functional layer 220Ai, the second initial electrode 230i, and the first initial encapsulation layer 361i away from at least one first pixel opening Q1 includes the material of the first initial light-emitting functional layer 220Ai, the second initial electrode 230i, and the first initial encapsulation layer 361i located in the light-transmitting area of ​​the display panel 300.

[0356] R8: such as Figure 11F As shown, the portions of the third initial film layer 113i, the first initial film layer 111i, the second initial film layer 112i, the sixth initial film layer 123i, the fourth initial film layer 121i, and the fifth initial film layer 122i that are retained in R4 are patterned using one or more etching processes to form at least one second pixel opening Q2.

[0357] R9: such as Figure 11G As shown, a second initial light-emitting functional layer and a second initial electrode are sequentially formed in at least one second pixel opening Q2 and on the side of the fifth initial film layer 122i retained in R8 away from the substrate 310 using a full-surface evaporation process.

[0358] R10: such as Figure 11G As shown, a second initial encapsulation layer is formed on the side of the second initial electrode formed in R9 away from the second initial light-emitting functional layer using a deposition process.

[0359] R11: As Figure 11GAs shown, an etching process is used to remove the material of the second initial light-emitting functional layer, the second initial electrode, and the second initial encapsulation layer that are far from at least one second pixel opening Q2, so that the retained second initial light-emitting functional layer forms at least a portion of the second light-emitting functional layer 220D and the second isolation film group 380; the retained second initial electrode forms at least the second electrode 230 of at least one second light-emitting device 200D, and a portion of the second isolation film group 380; the retained second initial encapsulation layer forms the second encapsulation pattern 362.

[0360] In some examples, the removal of the material of the second initial light-emitting functional layer, the second initial electrode, and the second initial encapsulation layer away from at least one second pixel opening Q2 includes the material of the second initial light-emitting functional layer, the second initial electrode, and the second initial encapsulation layer located in the light-transmitting area of ​​the display panel 300.

[0361] R12: such as Figure 11H As shown, the portions of the third initial film layer 113i, the first initial film layer 111i, the second initial film layer 112i, the sixth initial film layer 123i, the fourth initial film layer 121i, and the fifth initial film layer 122i that are retained in R8 are patterned using one or more etching processes to form at least one third pixel opening Q3.

[0362] R13: such as Figure 11I As shown, a full-surface vapor deposition process is used to sequentially form a third initial light-emitting functional layer and a second initial electrode in at least one third pixel opening Q3 and on the side of the fifth initial film layer 122i retained in R11 away from the substrate 310.

[0363] R14: such as Figure 11I As shown, a third initial encapsulation layer is formed on the side of the second initial electrode formed in R13 away from the third initial light-emitting functional layer using a deposition process.

[0364] R15: such as Figure 11I As shown, an etching process is used to remove the material of the third initial light-emitting functional layer, the second initial electrode, and the third initial encapsulation layer that are far from at least one third pixel opening Q3, so that the retained third initial light-emitting functional layer forms at least a portion of the third light-emitting functional layer 220C and the third isolation film group 390; the retained second initial electrode forms at least a second electrode 230 of at least one third light-emitting device 200C and a portion of the third isolation film group 390; the retained third initial encapsulation layer forms a third encapsulation pattern 363.

[0365] In some examples, the material removed from the third initial light-emitting functional layer, the second initial electrode, and the third initial encapsulation layer away from at least one third pixel opening Q3 includes the material of the third initial light-emitting functional layer, the second initial electrode, and the third initial encapsulation layer located in the light-transmitting area of ​​the display panel 300.

[0366] R16: such as Figure 11J As shown, a second sublayer 332 and a third sublayer 333 of the encapsulation structure 330 are sequentially formed on the side of the first encapsulation pattern 361, the second encapsulation pattern 362, and the third encapsulation pattern 363 away from the substrate 310.

[0367] Preparation Example 2

[0368] The manufacturing method of the display panel 300, such as Figures 12A to 12J As shown, it includes U1 to U15.

[0369] U1: such as Figure 12A As shown, a substrate 310 is provided.

[0370] U2: such as Figure 12A As shown, a first electrode 210 of a plurality of light-emitting devices 200 is formed on a substrate 310.

[0371] U3: such as Figure 12A As shown, a third initial film layer 113i, a first initial film layer 111i, a second initial film layer 112i, a sixth initial film layer 123i, a fourth initial film layer 121i, and a fifth initial film layer 122i are sequentially formed on the side of the plurality of first electrodes 210 away from the substrate 310.

[0372] U4: such as Figure 12A As shown, a first mask layer PR1 is formed on the side of the fifth initial film layer 122i away from the fourth initial film layer 121i.

[0373] U5: such as Figure 12B As shown, an etching process is used to pattern the fourth initial film layer 121i, the fifth initial film layer 122i, and the sixth initial film layer 123i to form portions of a plurality of pixel openings Q away from the substrate 310 (i.e., second sub-openings Qb), and a second isolation pattern 120. The plurality of pixel openings Q includes at least one first pixel opening Q1 (see [reference]). Figure 12D ), at least one second pixel opening Q2 and at least one third pixel opening Q3.

[0374] U6: such as Figure 12C As shown, a second mask layer PR2 is formed on the outside of the second isolation pattern 120.

[0375] U7: such as Figure 12D As shown, the third initial film layer 113i was patterned using an etching process (see [reference]). Figure 12C The first initial film layer 111i and the second initial film layer 112i are used to form portions of a plurality of pixel openings Q near the substrate 310 (i.e., first sub-openings Qa), and a first isolation pattern 110. The plurality of pixel openings Q includes at least one first pixel opening Q1, at least one second pixel opening Q2 and at least one third pixel opening Q3.

[0376] U8: such as Figure 12E As shown, a full-surface vapor deposition process is used to sequentially form a first initial light-emitting functional layer 220Ai and a second initial electrode 230i in multiple pixel openings Q and on the side of the isolation structure 100 away from the substrate 310, and a first initial encapsulation layer 361i is formed on the side of the second initial electrode 230i away from the first initial light-emitting functional layer 220Ai.

[0377] U9: such as Figure 12E and Figure 12F As shown, a third mask layer PR3 is formed on the side of the first initial encapsulation layer 361i away from the second initial electrode 230i; then, an etching process is used to remove the material of the first initial light-emitting functional layer 220Ai, the second initial electrode 230i and the first initial encapsulation layer 361i away from at least one first pixel opening Q1, so that the retained first initial light-emitting functional layer 220Ai forms the first light-emitting functional layer 220A, the first pattern layer 340 and the second pattern layer 350; the retained second initial electrode 230i forms at least one second electrode 230 of the first light-emitting device 200A and a portion of the first blocking film group 370; the retained first initial encapsulation layer 361i forms the first encapsulation pattern 361.

[0378] U10: such as Figure 12G As shown, a full-surface vapor deposition process is used to sequentially form a second initial light-emitting functional layer 220Di and a second initial electrode 230ii in the pixel openings Q (excluding at least one first pixel opening Q1) and on the side of the first encapsulation pattern 361 and the isolation structure 100 away from the substrate 310, and a second initial encapsulation layer 362i is formed on the side of the second initial electrode 230ii away from the second initial light-emitting functional layer 220Di.

[0379] U11: such as 12G and Figure 12HAs shown, a fourth mask layer PR4 is formed on the side of the second initial encapsulation layer 362i away from the second initial electrode 230ii; then, an etching process is used to remove the material of the second initial light-emitting functional layer 220Di, the second initial electrode 230ii, and the second initial encapsulation layer 362i away from at least one second pixel opening Q2, so that the retained second initial light-emitting functional layer 220Di forms at least a portion of the second light-emitting functional layer 220D and the second isolation film group 380; the retained second initial electrode 230ii forms at least a second electrode 230 of at least one second light-emitting device 200D, and a portion of the second isolation film group 380; the retained second initial encapsulation layer 362i forms a second encapsulation pattern 362.

[0380] U12: such as Figure 12H As shown, using a full-surface vapor deposition process, a third initial light-emitting functional layer 220Ci and a second initial electrode 230iii are sequentially formed in the pixel openings Q (excluding at least one first pixel opening Q1 and at least one second pixel opening Q2) and on the side of the first encapsulation pattern 361, the second encapsulation pattern 362 and the isolation structure 100 away from the substrate 310. A third initial encapsulation layer 363i is formed on the side of the second initial electrode 230iii away from the third initial light-emitting functional layer 220Ci.

[0381] U13: such as Figure 12H and Figure 12I As shown, a fifth mask layer PR5 is formed on the side of the third initial encapsulation layer 363i away from the second initial electrode 230iii; then, an etching process is used to remove the material of the third initial light-emitting functional layer 220Ci, the second initial electrode 230iii, and the third initial encapsulation layer 363i away from at least one third pixel opening Q3, so that the retained third initial light-emitting functional layer 220Ci forms at least a portion of the third light-emitting functional layer 220C and the third isolation film group 390; the retained second initial electrode 230iii forms at least a second electrode 230 of at least one third light-emitting device 200C, and a portion of the third isolation film group 390; the retained third initial encapsulation layer 363i forms a third encapsulation pattern 363.

[0382] U14: such as Figure 12J As shown, a second sublayer 332 and a third sublayer 333 of the encapsulation structure 330 are sequentially formed on the side of the first encapsulation pattern 361, the second encapsulation pattern 362, the third encapsulation pattern 363, and the isolation structure 100 not covered by the encapsulation pattern 360 away from the substrate 310. The encapsulation pattern 360 includes the first encapsulation pattern 361, the second encapsulation pattern 362, and the third encapsulation pattern 363.

[0383] The above is an exemplary description of the display panel 300 and its manufacturing method when the isolation structure 100 includes the first isolation pattern 110 and the second isolation pattern 120. The following will describe another structure of the display panel 300. It should be noted that in the following embodiments, this disclosure does not limit the structure of the isolation structure 100 included in the display panel 300.

[0384] Some embodiments of this disclosure provide a display panel 300. For example... Figure 9C As shown, the display panel 300 includes a substrate 310, an isolation structure 100, a first isolation film group 370, a second isolation film group 380, and a plurality of light-emitting devices 200. The isolation structure 100 is disposed on the substrate 310; the isolation structure 100 defines a first pixel opening Q1 and a second pixel opening Q2. Multiple light-emitting devices 200 include a first light-emitting device 200A and a second light-emitting device 200D; the first light-emitting device 200A is disposed within a first pixel opening Q1, and the second light-emitting device 200D is disposed within a second pixel opening Q2. The first light-emitting device 200A and the second light-emitting device 200D emit different colors; both the first light-emitting device 200A and the second light-emitting device 200D include a first electrode 210 and a second electrode 230 disposed opposite to each other along a first direction X, with the first electrode 210 being closer to the substrate 310 than the second electrode 230, and the first direction X being the thickness direction of the substrate 310; the second electrode 230 is in contact with and electrically connected to the isolation structure 100; the first light-emitting device 200A also includes a first light-emitting functional layer 220A located between the first electrode 210 and the second electrode 230 of the first light-emitting device 200A; the second light-emitting device 200D also includes a second light-emitting functional layer 220D located between the first electrode 210 and the second electrode 230 of the second light-emitting device 200D.

[0385] The first isolation film group 370 includes a first isolation layer 371 and a second isolation layer 372 stacked in a direction away from the substrate 310. The first isolation layer 371 and the first light-emitting functional layer 220A are made of the same material, and the second isolation layer 372 and the second electrode 230 are made of the same material. The second isolation film group 380 includes a third isolation layer 381 and a fourth isolation layer 382 stacked in a direction away from the substrate 310. The third isolation layer 381 and the second light-emitting functional layer 220D are made of the same material, and the fourth isolation layer 382 and the second electrode 230 are made of the same material.

[0386] The first isolation film group 370 and the second isolation film group 380 are both located on the side of the isolation structure 100 away from the substrate 310. The first isolation film group 370 includes a first edge portion 370A away from the first light-emitting device 200A, and the size of the first edge portion 370A gradually decreases in the first direction X; and / or, the second isolation film group 380361 includes a second edge portion 380A away from the second light-emitting device 200D, and the size of the second edge portion 380A gradually decreases in the first direction X; the first edge portion 370A and the second edge portion 380A located between the first light-emitting device 200A and the second light-emitting device 200D adjacent to the first light-emitting device 200A overlap each other.

[0387] For an understanding of the first light-emitting device 200A, the second light-emitting device 200D, the first isolation film group 370, the second isolation film group 380, the first edge portion 370A, and the second edge portion 380A, please refer to the description of the first light-emitting device 200A, the second light-emitting device 200D, the first isolation film group 370, the second isolation film group 380, the first edge portion 370A, and the second edge portion 380A in the foregoing section, which will not be repeated here.

[0388] Understandably, through the above arrangement, the first isolation film group 370 and the second isolation film group 380 can overlap with each other through the first edge portion 370A and the second edge portion 380A. As mentioned above, this has the following advantages: first, it helps to improve the structural integrity of the fifth part 122; second, it can reduce the manufacturing difficulty of the display panel 300; and third, it can make the dimensional change of the overlapping part of the first isolation film group 370 and the second isolation film group 380 in the first direction X more gradual. This can prevent the encapsulation structure 330 from cracking due to the corner area and improve the encapsulation performance.

[0389] In some embodiments, such as Figure 9C As shown, the first partition membrane assembly 370 also includes a first partition portion 370B connected to the first edge portion 370A, and the first partition portion 370B is closer to the first light-emitting device 200A than the first edge portion 370A.

[0390] The second partition film assembly 380 further includes a second partition portion 380B connected to the second edge portion 380A, the second partition portion 380B being closer to the second light-emitting device 200D than the second edge portion 380A. Within the region SS1 between the first light-emitting device 200A and the second light-emitting device 200D adjacent to the first light-emitting device 200A, the maximum value of the sum of the dimensions of the first edge portion 370A and the second edge portion 380A in the first direction X is less than the sum of the dimensions of the first partition portion 370B and the second partition portion 380B in the first direction X.

[0391] For an understanding of the first partition 370B and the second partition 380B, please refer to the description of the first partition 370B and the second partition 380B in the preceding section, which will not be repeated here.

[0392] As mentioned above, the height difference between the surface of the first isolation film group 370 away from the substrate 310 and the surface of the second isolation film group 380 away from the substrate 310 can be reduced, which is beneficial to improving the flatness of the display panel 300 and, as mentioned above, can improve the packaging performance.

[0393] In some embodiments, such as Figure 9C As shown, the plurality of light-emitting devices 200 also includes a third light-emitting device 200C, which includes a third light-emitting functional layer 220C; the first, second, and third light-emitting devices emit different colors. The display panel 300 also includes a third isolation film group 390. The third isolation film group 390 is located on the side of the isolation structure 100 away from the substrate 310; the third isolation film group 390 includes a fifth isolation layer 391 and a sixth isolation layer 392 stacked along the direction away from the substrate 310, the fifth isolation layer 391 and the third light-emitting functional layer 220C are made of the same material, and the sixth isolation layer 392 is made of the same material as the second electrode 230. The third isolation film group 390 includes a third edge portion 390A away from the third light-emitting device 200C, and the size of the third edge portion 390A gradually decreases in the first direction X. The first edge portion 370A and the third edge portion 390A located between the first light-emitting device 200A and the third light-emitting device 200C adjacent to the first light-emitting device 200A overlap each other; and / or, the second edge portion 380A and the third edge portion 390A located between the second light-emitting device 200D and the third light-emitting device 200C adjacent to the second light-emitting device 200D overlap each other.

[0394] For an understanding of the third light-emitting device 200C and the third edge portion 390A, please refer to the description of the third light-emitting device 200C and the third edge portion 390A in the preceding section, which will not be repeated here.

[0395] As mentioned above, by adopting the above settings, the structural integrity of the fifth part 122 can be improved and the manufacturing difficulty of the display panel 300 can be reduced. At the same time, the dimensional changes of the overlapping parts of the first partition film group 370 and the third partition film group 390, and / or the second partition film group 380 and the third partition film group 390 in the first direction X are relatively gentle. In this way, the encapsulation structure 330 can be prevented from cracking due to the presence of corner areas, and the encapsulation performance can be improved.

[0396] In some embodiments, such as Figure 9CAs shown, the third partition film assembly 390 further includes a third partition portion 390B connected to the third edge portion 390A, the third partition portion 390B being closer to the third light-emitting device 200C than the third edge portion 390A. In the region SS between the first light-emitting device 200A and the third light-emitting device 200C adjacent to the first light-emitting device 200A, the maximum value of the sum of the dimensions of the first edge portion 370A and the third edge portion 390A in the first direction X is less than the sum of the dimensions of the first partition portion 370B and the third partition portion 390B in the first direction X; and / or, in the region SS3 between the second light-emitting device 200D and the third light-emitting device 200C adjacent to the second light-emitting device 200D, the maximum value of the sum of the dimensions of the second edge portion 380A and the third edge portion 390A in the first direction X is less than the sum of the dimensions of the second partition portion 380B and the third partition portion 390B in the first direction X.

[0397] For an understanding of the third partition 390B, please refer to the description of the third partition 390B in the preceding section, which will not be repeated here.

[0398] As mentioned above, the height difference between the surfaces of the first isolation film group 370, the second isolation film group 380, and the third isolation film group 390 that are away from the substrate 310 can be reduced, which is beneficial to improving the flatness of the display panel 300 and can improve the packaging performance.

[0399] In some embodiments, such as Figure 9C As shown, the display panel 300 further includes a first encapsulation pattern 361, a second encapsulation pattern 362, and a third encapsulation pattern 363. The first encapsulation pattern 361 covers the first light-emitting device 200A and a portion of the surface of the second isolation layer 372 away from the substrate 310; the first isolation film assembly 370 also includes the portion of the first encapsulation pattern 361 covering the surface of the second isolation layer 372 away from the substrate 310. The second encapsulation pattern 362 covers the second light-emitting device 200D and a portion of the surface of the fourth isolation layer 382 away from the substrate 310; the second isolation film assembly 380 also includes the portion of the second encapsulation pattern 362 covering the surface of the fourth isolation layer 382 away from the substrate 310. The third encapsulation pattern 363 covers the third light-emitting device 200C and a portion of the surface of the sixth isolation layer 392 away from the substrate 310; the third isolation film assembly 390 also includes the portion of the third encapsulation pattern 363 covering the surface of the sixth isolation layer 392 away from the substrate 310.

[0400] For an understanding of the first package pattern 361, the second package pattern 362, and the third package pattern 363, please refer to the description of the first package pattern 361 and the second package pattern 362 in the preceding sections, which will not be repeated here.

[0401] As mentioned above, the above settings can prevent the material of the initial light-emitting functional layer (including the initial light-emitting functional layers corresponding to the first light-emitting functional layer 220A, the second light-emitting functional layer 220D and the third light-emitting functional layer 220C) from being damaged by moisture and oxygen in the external environment, thus improving the lifespan of the display panel 300.

[0402] In some embodiments, during the etching process to form the light-emitting device 200, a mask layer needs to be formed to define the boundary between the material removed and the material retained during the formation of the light-emitting device 200. For example, in U9 of the above-described fabrication example 2, a third mask layer PR3 is used to define the boundary between the material removed and the material retained during the formation of at least one first light-emitting device 200A; in U11 of the above-described fabrication example 2, a fourth mask layer PR4 is used to define the boundary between the material removed and the material retained during the formation of at least one second light-emitting device 200D; and in U13 of the above-described fabrication example 2, a fifth mask layer PR5 is used to define the boundary between the material removed and the material retained during the formation of at least one third light-emitting device 200C.

[0403] In practical applications, a mask assembly 500G is needed to form the aforementioned mask layer. The mask assembly 500G used in fabricating the display panel 300 will be described exemplarily below.

[0404] In some embodiments, the photomask assembly includes a method for forming at least one first light-emitting device 200A (see also...). Figure 5 A first photomask, a second photomask for forming at least one second light-emitting device 200D, and a third photomask for forming at least one third light-emitting device 200C. The first photomask includes at least one first opening for defining a boundary 370a of the first blocking film group 370 remote from the first pixel opening Q1 (see also...). Figure 5 The second mask includes at least one second opening for defining a boundary 380a of the second blocking film group 380 remote from the second pixel opening Q2. The third mask includes at least one third opening for defining a boundary 390a of the third blocking film group 390 remote from the third pixel opening Q3.

[0405] In some examples, such as Figure 13AAs shown, the orthographic projection of the first opening onto the reference plane D1-600 is D1-N1', the orthographic projection of the second opening onto the reference plane D1-600 is D1-N2', and the orthographic projection of the third opening onto the reference plane D1-600 is D1-N3'. Thus, the structure of the display panel 300 fabricated using this mask assembly can be as follows... Figure 9A As shown, the first isolation membrane group 370 and the second isolation membrane group 380 have a gap in the second direction Y. The second direction Y is parallel to the line connecting the center of the first light-emitting device 200A and the center of the second light-emitting device 200D.

[0406] In some examples, such as Figure 13B As shown, the orthographic projection of the first opening onto the reference plane D2-600 is D2-N1', the orthographic projection of the second opening onto the reference plane D2-600 is D2-N2', and the orthographic projection of the third opening onto the reference plane D2-600 is D2-N3'. Thus, the structure of the display panel 300 fabricated using this mask assembly can be as follows... Figure 9B As shown, along the second direction Y, one of the first isolation film group 370 and the second isolation film group 380 is located on the side of the other away from the substrate 310.

[0407] It is worth noting that the opening of the aforementioned photomask has a relatively flat boundary, making the boundary of the formed light-emitting device 200 perpendicular or nearly perpendicular to the substrate 310. The following will introduce another photomask assembly. Using this photomask assembly 500G to fabricate the light-emitting device 200 of the display panel 300, the blocking film group (e.g., the first blocking film group 370, the second blocking film group 380, or the third blocking film group 390) in the display panel 300 can include edge portions (e.g., the first edge portion 370A, the second edge portion 380A, or the third edge portion 390A), allowing adjacent edge portions to overlap.

[0408] Some embodiments of this disclosure provide a mask assembly 500G. For example... Figure 14A , Figure 14B , Figure 15A , Figure 15B , Figure 17A , Figure 17B and Figure 5 As shown, the mask assembly 500G includes at least one mask 500. The mask 500 includes subpixel patterns N corresponding to subpixels of the display panel 300, the boundaries of which have microstructures Nx.

[0409] Here, the method by which the sub-pixels of the display panel 300 correspond to the sub-pixel pattern N is, for example, to define the boundary of the isolation film group (e.g., the first isolation film group 370, the second isolation film group 380, or the third isolation film group 390) away from the pixel opening Q by the sub-pixel pattern N, so as to form the corresponding sub-pixel. When the sub-pixel pattern N corresponds to the sub-pixel of the first light-emitting device 200A, the above method is specifically as follows: First, a mask layer (e.g., the third mask layer PR3 in U9 above) is formed on the side of the first initial encapsulation layer 361i away from the second initial electrode 230i; then, the mask layer is exposed using the mask template 500, and developed after exposure, so that the part of the mask layer located on the first encapsulation pattern 361 is retained, and the rest is removed; then, using an etching process (e.g., a dry etching process), the first initial light-emitting functional layer 220Ai, the second initial electrode 230i, and the first initial encapsulation layer 361i (hereinafter referred to as the first film group to be etched, see [reference]) not covered by the mask layer are etched. Figure 12E The mask layer located at the first pixel opening Q1 is etched to remove material from the first film group to be etched away from at least one first pixel opening Q1.

[0410] In some examples, such as Figure 14A , Figure 14B , Figure 15A , Figure 15B and Figure 5 As shown, the mask assembly 500G includes a first mask 510 corresponding to the first light-emitting device 200A of the display panel 300, and a second mask 520 corresponding to the second light-emitting device 200D of the display panel 300. The first mask 510 includes a first sub-pixel pattern N1, the boundary of which has a first microstructure N1x; the second mask 520 includes a second sub-pixel pattern N2, the boundary of which has a second microstructure N2x.

[0411] In some examples, such as Figure 17A , Figure 17B and Figure 5 As shown, the mask assembly 500G also includes a third mask 530 corresponding to the third light-emitting device 200C of the display panel 300. The third mask 530 includes a third sub-pixel pattern N3, the boundary of which has a third microstructure N3x.

[0412] Understandably, when the boundary of the sub-pixel pattern N has a microstructure Nx, the material in the mask layer facing the boundary of the sub-pixel pattern N is in a half-exposed state. This allows the portion of the mask layer facing the boundary of the sub-pixel pattern N to be retained after development, and the thickness of the retained mask layer is less than the thickness before etching. This forms a region with a gradual change in film thickness. Consequently, when etching the film group to be etched, the etching amount of the film group facing the boundary of the sub-pixel pattern N (e.g., the first film group to be etched mentioned above) is less than the etching amount of the film group far from the pixel opening Q. This allows the isolation film group (e.g., the first isolation film group 37) in the display panel 300 to be less than the etching amount of the isolation film group far from the pixel opening Q. 0. The second isolation film group 380 or the third isolation film group 390 includes edge portions (e.g., the first edge portion 370A, the second edge portion 380A, or the third edge portion 390A), so that adjacent edge portions can overlap each other. As mentioned above, this has the following advantages: first, it helps to improve the flatness of the display panel 300 and improve the encapsulation performance; second, it allows the isolation film group (e.g., at least one of the first isolation film group 370, the second isolation film group 380, and the third isolation film group 390) to better cover the fifth part 122, which helps to improve the structural integrity of the fifth part 122; and third, it can reduce the manufacturing difficulty of the display panel 300.

[0413] In some embodiments, such as Figure 14A , Figure 15A and Figure 16A As shown, the mask template 500 includes a light-transmitting substrate 503 and a blocking pattern 504 disposed on the light-transmitting substrate 503. The blocking pattern 504 is a sub-pixel pattern N, and the microstructure Nx is formed on the blocking pattern 504.

[0414] For example, the material of the light-transmitting substrate 503 can be glass.

[0415] For example, the material of the masking pattern 504 can be a metallic material, such as chromium.

[0416] It should be understood that when the occlusion pattern 504 is a sub-pixel pattern N, etching is used to form the light-emitting device 200 (see [reference]). Figure 5 The material used for the mask layer can be positive photoresist.

[0417] With the above settings, during exposure, the sub-pixel pattern N (e.g., a first sub-pixel pattern N1, a second sub-pixel pattern N2, or a third sub-pixel pattern N3) can block the mask layer located on the selected light-emitting device 200. Thus, after development, the mask layer located on the selected light-emitting device 200 (e.g., a first light-emitting device 200A, a second light-emitting device 200D, or a third light-emitting device 200C) can be retained, while the remaining portions are removed. For example, during exposure, the sub-pixel pattern N1 can block the mask layer located on at least one first light-emitting device 200A. Thus, after development, the mask layer located on at least one first light-emitting device 200A can be retained, while the remaining portions are removed.

[0418] In some embodiments, such as Figure 14B , Figure 15B and Figure 16B As shown, the mask template 500 includes a light-shielding substrate 501, which defines an opening 502. The opening 502 is a sub-pixel pattern N, and the microstructure Nx is formed on the light-shielding substrate 501.

[0419] For example, the material of the light-shielding substrate 501 can be a metallic material, such as chromium.

[0420] In some examples, the light-shielding substrate 501 is disposed on a transparent base plate, the material of which is, for example, glass.

[0421] It should be understood that when the opening 502 is a sub-pixel pattern N, etching is used to form the light-emitting device 200 (see [reference]). Figure 5 The material used for the mask layer can be negative photoresist.

[0422] With the above settings, during exposure, the sub-pixel pattern N (e.g., a first sub-pixel pattern N1, a second sub-pixel pattern N2, or a third pixel pattern N3) can expose the mask layer located on the selected light-emitting device 200. Thus, after development, the mask layer located on the selected light-emitting device 200 (e.g., a first light-emitting device 200A, a second light-emitting device 200D, or a third light-emitting device 200C) can be retained, while the remaining portions are removed. For example, during exposure, the first sub-pixel pattern N1 can expose the mask layer located on at least one first light-emitting device 200A. Thus, after development, the mask layer located on at least one first light-emitting device 200A can be retained, while the remaining portions are removed.

[0423] It should be noted that the shapes of the first microstructure N1x, the second microstructure N2x, and the third microstructure N3x are not limited here. In some examples, the same sub-pixel pattern (e.g., the first sub-pixel pattern N1, the second sub-pixel pattern N2, or the third sub-pixel pattern N3) can have multiple different micropattern shapes.

[0424] In some embodiments, such as Figure 14A , Figure 14B , Figure 15A , Figure 15B , Figure 17A , Figure 17B As shown, the microstructure Nx includes multiple sub-patterns Nxa arranged along the boundary of the sub-pixel pattern N.

[0425] Understandably, through the above settings, along the extension direction of the boundary of the sub-pixel pattern N, the sub-regions with sub-pattern Nax and the sub-regions without sub-pattern Nax are relatively dispersed in the boundary region of the mask 500. As a result, after exposure and development, the thickness of the material directly opposite the boundary of the sub-pixel pattern N is relatively uniform along the extension direction of the boundary of the sub-pixel pattern N. This helps to improve the surface flatness of the edge portions (e.g., the first edge portion 370A, the second edge portion 380A, or the third edge portion 390A) of the partition film group (e.g., the first partition film group 370, the second partition film group 380, or the third partition film group 390) after they overlap, thereby improving the encapsulation performance of the display panel 300.

[0426] In some embodiments, such as Figure 14A , Figure 14B , Figure 15A , Figure 15B , Figure 17A , Figure 17B As shown, at least one photomask 500 includes a first photomask 510 and a second photomask 520; the first photomask 510 is used to fabricate the first light-emitting device 200A of the display panel 300 (see [reference]). Figure 5 The second photomask 520 is used to fabricate the second light-emitting device 200D of the display panel 300. The microstructure of the first photomask 510 includes multiple first sub-patterns N1xa, and the microstructure of the second photomask 520 includes multiple second sub-patterns N2xa. The first sub-patterns N1xa and the second sub-patterns N2xa have the same shape; and / or, the spacing between two adjacent first sub-patterns N1xa is the same as the spacing between two adjacent second sub-patterns N2xa.

[0427] Here, the first sub-figure N1xa and the second sub-figure N2xa have the same shape, meaning that the first sub-figure N1xa and the second sub-figure N2xa are similar figures, and / or, the corresponding sides of the first sub-figure N1xa and the second sub-figure N2xa have the same dimensions.

[0428] It should be understood that in order to achieve the overlap between the first edge portion 370A and the second edge portion 380A, when designing the mask assembly 500G, it is necessary to position the first sub-pixel pattern N1 projected onto the first etchable film group and the second sub-pixel pattern N2 projected onto the second etchable film group (e.g., including the second initial light-emitting functional layer 220Bi, the second initial electrode 230ii, and the second initial encapsulation layer 362i) so that the two can overlap in the edge region. In this way, the first edge portion 370A formed by the first sub-pixel pattern N1 can overlap with the second edge portion 380A formed by the second sub-pixel pattern N2.

[0429] When the first sub-graphic N1xa and the second sub-graphic N2xa have the same shape; and / or, the spacing between two adjacent first sub-graphics N1xa is the same as the spacing between two adjacent second sub-graphics N2xa, the first sub-graphic N1xa can be fitted into the gap between two adjacent second sub-graphics N2xa, and / or, the second sub-graphic N2xa can be fitted into the gap between two adjacent first sub-graphics N1xa. In this way, when positioning the first sub-pixel graphic N1 and the second sub-pixel graphic N2, multiple first sub-pixel graphics N1 of the first mask 510 and multiple second sub-pixel graphics N2 of the second mask 520 can be projected onto the same reference plane 600 (see [reference]). Figure 16A Within the first sub-pixel pattern N1, multiple first sub-patterns N1xa and multiple second sub-patterns N2xa of the adjacent second sub-pixel pattern N2 are interlocked to achieve positioning of the first sub-pixel pattern N1 and the second sub-pixel pattern N2. Therefore, this arrangement improves the operability of positioning the first sub-pixel pattern N1 and the second sub-pixel pattern N2 and reduces the manufacturing difficulty of the mask assembly 500G.

[0430] In some embodiments, such as Figure 14A , Figure 14B , Figure 15A , Figure 15B , Figure 17A , Figure 17B As shown, at least one photomask 500 further includes a third photomask 530, which is used to fabricate a third light-emitting device 200C of the display panel 300. The microstructure N3x of the third photomask 530 includes a plurality of third sub-patterns N3xa. The first sub-patterns N1xa, the second sub-patterns N2xa, and the third sub-patterns N3xa have the same shape; and / or, the spacing between two adjacent first sub-patterns N1xa, the spacing between two adjacent second sub-patterns N2xa, and the spacing between two adjacent third sub-patterns N3xa are the same.

[0431] Regarding the understanding that the first sub-figure N1xa, the second sub-figure N2xa, and the third sub-figure N3xa have the same shape, please refer to the description of the first sub-figure N1xa and the second sub-figure N2xa having the same shape in the previous section, which will not be repeated here.

[0432] Understandably, similar to the aforementioned part, the above settings can improve the operability of positioning the first sub-pixel pattern N1, the second sub-pixel pattern N2, and the third sub-pixel pattern N3, and reduce the manufacturing difficulty of the mask assembly 500G.

[0433] It should be noted that there are no restrictions on the shape types of the first sub-figure N1xa, the second sub-figure N2xa, and the third sub-figure N3xa.

[0434] In some embodiments, such as Figure 14A , Figure 14B , Figure 15A , Figure 15B , Figure 17A , Figure 17B , Figure 19A and Figure 19B As shown, the shape of the sub-graphic Nax can be a rectangle, square, triangle, or trapezoid.

[0435] For example, such as Figure 14A , Figure 14B , Figure 15A , Figure 15B , Figure 16A , Figure 16B , Figure 17A , Figure 17B , Figure 18A , Figure 18B , Figure 20A and Figure 20B As shown, the sub-graphic Nax has a rectangular shape. For example, as... Figure 19A , Figure 19B Figure 21A and Figure 21B As shown, the sub-graphic Nax has a triangular shape.

[0436] Understandably, when the microstructure Nx of the pixel sub-pattern N has a sub-pattern of the shape described above, in the reference plane 600 (see...), Figure 16A On the above, adjacent sub-graphics Nxa are easy to interlock, which can improve the operability of positioning sub-pixel graphics N.

[0437] To illustrate this more clearly, the following description provides an example of how the first sub-pixel pattern N1, the second sub-pixel pattern N2, and the third sub-pixel pattern N3 are projected onto the reference plane 600. On the reference plane 600, the first sub-pixel pattern N1 has a first projection N1', the second sub-pixel pattern N2 has a first projection N2', and the third sub-pixel pattern N3 has a first projection N3'.

[0438] like Figure 16A , Figure 16B , Figure 18A , Figure 18B , Figure 19A , Figure 19B , Figure 20A , Figure 20B , Figure 21A and Figure 21B As shown, the adjacent boundaries of the first projection N1' and the second projection N2' on the third direction F1 are interlocked; the third direction F1 is the arrangement direction of the first projection N1' and the second projection N2'.

[0439] In the fourth direction F2, the adjacent third projection N3' and the first projection N1' are interlocked at their close boundaries; the fourth direction F2 is the arrangement direction of the third projection N3' and the first projection N1'; in the fifth direction F3, the adjacent third projection N3' and the second projection N2' are interlocked at their close boundaries; the fifth direction F3 is the arrangement direction of the third projection N3' and the second projection N2'.

[0440] like Figure 5 , Figure 16A and Figure 16B As shown, when the first light-emitting device 200A is adjacent to both the second light-emitting device 200D and the third light-emitting device 200C, the first projection N1' includes both the boundary that interlocks with the second projection N2' and the boundary that interlocks with the third projection N3'. The same applies to the second light-emitting device 200D and the third light-emitting device 200C.

[0441] In some embodiments, the display panel 300 includes a plurality of pixel units arranged in an array. Each pixel unit includes one or more first light-emitting devices 200A, one or more second light-emitting devices 200D, and one or more third light-emitting devices 200C (see [reference]). Figure 5 ).

[0442] In this case, in some embodiments, such as Figure 16A , Figure 16B , Figure 18A , Figure 18B , Figure 19A , Figure 19B , Figure 20A , Figure 20B , Figure 21A and Figure 21B As shown, at least one first projection N1', at least one second projection N2', and at least one third projection N3' constitute a plurality of projection units NG. The arrangement directions of the plurality of projection units NG include a first sub-direction Z1 and a second sub-direction Z2 that are perpendicular to each other.

[0443] It should be noted that, Figure 18A , Figure 19A , Figure 20A and Figure 21A This can be understood as the arrangement of the projection units NG on the reference plane 600 when the projection units NG are arranged in a 3×3 pattern.

[0444] Understandably, when at least one first projection N1', at least one second projection N2', and at least one third projection N3' constitute multiple projection units NG, at least one first light-emitting device 200A, at least one second light-emitting device 200D, and at least one third light-emitting device 200C fabricated using the mask assembly 500G can constitute multiple pixel units. When the arrangement direction of the multiple projection units NG includes a first sub-direction Z1 and a second sub-direction Z2 that are perpendicular to each other, the multiple projection units NG on the reference plane 600 are arranged in an array. In this way, the display panel 300 (see...) Figure 5 The multiple pixel units included can be arranged in an array.

[0445] It should be understood that, in practical applications, the first light-emitting device 200A in the pixel unit (see [reference]) can be used as a reference. Figure 5 The design of the number of the first light-emitting device 200D and the third light-emitting device 200C, and the arrangement of the first light-emitting device 200A, the second light-emitting device 200D and the third light-emitting device 200C in the projection unit NG, as well as the arrangement of the first projection N1', the second projection N2' and the third projection N3', will be described exemplarily below.

[0446] In some embodiments, such as Figure 18A , Figure 18B , Figure 19A and Figure 19B As shown, each projection unit NG in the plurality of projection units NG includes a first projection N1', a second projection N2', and a third projection N3'. The first projection N1', the second projection N2', and the third projection N3' are arranged sequentially along the first sub-direction Z1 or the second sub-direction Z2.

[0447] For example, such as Figure 18A , Figure 18B , Figure 19A andFigure 19B As shown, the first projection N1', the second projection N2' and the third projection N3' are arranged sequentially along the second sub-direction Z2.

[0448] With the above settings, the projection unit NG can display as follows: Figure 18A and Figure 19A The arrangement shown allows the pixel units in the display panel 300 fabricated using the mask assembly 500 to be arranged in a manner consistent with... Figure 18A and Figure 19A A similar arrangement can also be called a Real arrangement, or a Strip Real arrangement (e.g., a Strip RGB arrangement).

[0449] It should be noted that, with Figure 18A and Figure 19A Taking the direction shown as an example, the two adjacent projection units NG are set at intervals. In other words, the boundaries of the two adjacent first projections N1' are set at intervals and are not interlocked. The same applies to the two adjacent second projections N2' and the two adjacent third projections N3'.

[0450] In some embodiments, such as Figure 20A , Figure 20B , Figure 21A and Figure 21B As shown, each projection unit NG in the plurality of projection units NG includes a first projection N1', a second projection N2', and a third projection N3'. Among the arrangement directions of the first projection N1' and the second projection N2', the arrangement directions of the first projection N1' and the third projection N3', and the arrangement directions of the second projection N2' and the third projection N3', two are parallel to the first sub-direction Z1, and the other is parallel to the second sub-direction Z2.

[0451] For example, such as Figure 20A , Figure 20B , Figure 21A and Figure 21B As shown, the arrangement directions of the first projection N1' and the third projection N3', as well as the arrangement directions of the second projection N2' and the third projection N3', are parallel to the second sub-direction Z2, while the arrangement directions of the first projection N1' and the second projection N2' are parallel to the first sub-direction Z1.

[0452] With the above settings, the projection unit NG can display as follows: Figure 20A and Figure 21A The arrangement shown allows the pixel units in the display panel 300 fabricated using the mask assembly 500 to be arranged in a manner consistent with... Figure 20A and Figure 21AA similar arrangement can also be called a Delta arrangement, or a Delta Real arrangement (e.g., a DeltaRGB arrangement).

[0453] In some embodiments, such as Figure 16A and Figure 16B As shown, each projection unit NG in the plurality of projection units NG includes two first projections N1', one second projection N2', and one third projection N3', and the two first projections N1', one second projection N2', and one third projection N3' are arranged in a quadrilateral. The second projection N2' and one first projection N1' are arranged along a first sub-direction Z1, and together with the other first projection N1', they are arranged along a second sub-direction Z2. The boundary between the two first projections N1' and the third projection N3' is located between the two first projections N1'.

[0454] Here, the two first projections N1', the second projection N2', and the third projection N3' are arranged in a quadrilateral shape. This can be understood as follows: on the reference plane 600, the centers of the two first projections N1', the second projection N2', and the third projection N3' are connected end to end to form a quadrilateral.

[0455] With the above settings, the projection unit NG can display as follows: Figure 16A The arrangement shown allows the pixel units in the display panel 300 fabricated using the mask assembly 500 to be arranged in a manner consistent with... Figure 16A A similar arrangement, also known as the SPR arrangement.

[0456] The above description is merely a specific embodiment of this disclosure, but the scope of protection of this disclosure is not limited thereto. Any variations or substitutions conceived by those skilled in the art within the scope of the technology disclosed in this disclosure should be included within the scope of protection of this disclosure. Therefore, the scope of protection of this disclosure should be determined by the scope of the claims.

Claims

1. A display panel, characterized in that, include: Substrate; An isolation structure is disposed on the substrate; the isolation structure defines a pixel opening; The isolation structure includes a first isolation pattern and a second isolation pattern stacked along a direction away from the substrate; The material of the first isolation pattern includes an insulating material. The first isolation pattern includes a first portion and a second portion stacked in a direction away from the substrate. The second portion includes a first edge portion that extends relative to the first portion in a direction close to the center line of the adjacent pixel opening. as well as, A light-emitting device, disposed within the pixel opening, includes a first electrode, a light-emitting functional layer, and a second electrode stacked along a direction away from the substrate. The second electrode is in contact with and electrically connected to a second isolation pattern. Along a first direction, the light-emitting functional layer is located between the plane containing the surface of the first edge portion near the substrate and the first electrode. The first direction is the thickness direction of the substrate.

2. The display panel according to claim 1, characterized in that, Also includes: The first pattern layer is located on the side of the first edge portion away from the substrate; the material of the light-emitting functional layer is the same as the material of the first pattern layer; The first pattern layer and the light-emitting functional layer are spaced apart in the first direction.

3. The display panel according to claim 1, characterized in that, The material of the first part includes a first insulating material, and the material of the second part includes a second insulating material, wherein the first insulating material and the second insulating material are different.

4. The display panel according to claim 3, characterized in that, Under the same etching conditions, the etching rate of the first insulating material is greater than that of the second insulating material.

5. The display panel according to claim 1, characterized in that, The dimension of the first portion along the first direction is greater than the dimension of the second portion along the first direction.

6. The display panel according to claim 6, characterized in that, The first isolation pattern also includes: The third part is located between the first part and the substrate; the third part includes a second edge portion that surrounds the center line of the adjacent pixel opening and extends relative to the first part in a direction closer to the center line of the adjacent pixel opening. Wherein, the dimension of the first part along the first direction is greater than the dimension of the third part along the first direction.

7. The display panel according to claim 6, characterized in that, The material of the third part is the same as that of the second part.

8. The display panel according to claim 7, characterized in that, The edge of the second edge portion is closer to the center line of the adjacent pixel opening than the edge of the first edge portion.

9. The display panel according to any one of claims 1 to 8, characterized in that, The edge of the first portion near the pixel opening covers the edge of the first electrode; or, The first isolation pattern also includes the third portion, wherein the edge of the second edge of the third portion near the pixel opening covers the edge of the first electrode.

10. The display panel according to claim 1, characterized in that, The material of the first part includes silicon nitride; and / or, the material of the second part includes silicon oxide.

11. The display panel according to claim 2, characterized in that, The second isolation pattern includes a fourth portion and a fifth portion stacked in a direction away from the substrate. The fifth portion includes a third edge portion that surrounds the center line of the adjacent pixel opening and extends relative to the fourth portion in a direction closer to the center line of the adjacent pixel opening. The second electrode is in contact with and electrically connected to the fourth portion.

12. The display panel according to claim 11, characterized in that, Also includes: The second pattern layer is located on the side of the third edge that is away from the substrate; the material of the light-emitting functional layer is the same as the material of the second pattern layer; The first pattern layer and the second pattern layer are spaced apart in the first direction.

13. The display panel according to claim 11, characterized in that, The dimension of the fourth part along the first direction is greater than the dimension of the fifth part along the first direction.

14. The display panel according to claim 11, characterized in that, The second isolation pattern also includes: The sixth part is located between the fourth part and the first isolation pattern; the sixth part includes a fourth edge portion that surrounds the center line of the adjacent pixel opening and extends relative to the fourth part in a direction closer to the center line of the adjacent pixel opening; the second electrode contacts and is electrically connected to the fourth edge portion. Wherein, the dimension of the fourth part along the first direction is greater than the dimension of the sixth part along the first direction.

15. The display panel according to claim 11, characterized in that, The surface of the second electrode that is away from the substrate is closer to the substrate in the first direction than the surface of the isolation structure that is away from the substrate. The display panel also includes: An encapsulation pattern covers the light-emitting device, the sidewall of the pixel opening, the surface of the third edge of the fifth portion near the substrate, the side of the fifth portion, and at least a portion of the surface of the fifth portion away from the substrate.

16. The display panel according to claim 15, characterized in that, The encapsulation pattern includes a first sub-pattern and a second sub-pattern stacked in a direction away from the substrate, wherein the density of the first sub-pattern is higher than that of the second sub-pattern.

17. The display panel according to claim 15 or 16, characterized in that, The display panel includes a first light-emitting device and a second light-emitting device, and the first light-emitting device and the second light-emitting device emit different colors. The encapsulation pattern includes a first encapsulation pattern covering the first light-emitting device and a second encapsulation pattern covering the second light-emitting device, wherein the thickness of the first encapsulation pattern and the thickness of the second encapsulation pattern are different.

18. The display panel according to any one of claims 1 to 8, 10 to 14, characterized in that, The display panel includes a first light-emitting device and a second light-emitting device. The first light-emitting device includes a first light-emitting functional layer, and the second light-emitting device includes a second light-emitting functional layer. The first light-emitting device and the second light-emitting device emit different colors. The display panel also includes: A first isolation film assembly, comprising a first isolation layer and a second isolation layer stacked in a direction away from the substrate, wherein the first isolation layer and the first light-emitting functional layer are made of the same material, and the second isolation layer and the second electrode are made of the same material; and... The second isolation film group includes a third isolation layer and a fourth isolation layer stacked in a direction away from the substrate. The third isolation layer is made of the same material as the second light-emitting functional layer, and the fourth isolation layer is made of the same material as the second electrode. Both the first isolation film group and the second isolation film group are located on the side of the second isolation pattern away from the substrate.

19. The display panel according to claim 18, characterized in that, In a second direction, in the first and second isolation film groups located between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device, one partially overlaps the other on the side away from the substrate; the second direction is parallel to the line connecting the center of the first light-emitting device and the center of the second light-emitting device.

20. The display panel according to claim 19, characterized in that, The first blocking film assembly includes a first edge portion away from the first light-emitting device, the first edge portion having a gradually decreasing size in the first direction; and / or, The second barrier film assembly includes a second edge portion away from the second light-emitting device, the size of which gradually decreases in the first direction; The first edge portion located between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device overlaps with the second edge portion.

21. The display panel according to claim 20, characterized in that, The first partition film assembly further includes a first partition portion connected to the first edge portion, the first partition portion being closer to the first light-emitting device than the first edge portion; The second partition film assembly further includes a second partition portion connected to the second edge portion, the second partition portion being closer to the second light-emitting device than the second edge portion; In the region between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion and the second edge portion in the first direction is less than the sum of the dimensions of the first partition portion and the second partition portion in the first direction.

22. The display panel according to claim 21, characterized in that, The display panel includes a third light-emitting device, which includes a third light-emitting functional layer; the first, second, and third light-emitting devices emit different colors. The display panel also includes: The third isolation film group is located on the side of the second isolation pattern away from the substrate; the third isolation film group includes a fifth isolation layer and a sixth isolation layer stacked in a direction away from the substrate, the fifth isolation layer and the third light-emitting functional layer are made of the same material, and the sixth isolation layer and the second electrode are made of the same material; The third barrier film assembly includes a third edge portion away from the third light-emitting device, and the size of the third edge portion gradually decreases in the first direction; The first edge portion located between the first light-emitting device and the third light-emitting device adjacent to the first light-emitting device overlaps with the third edge portion; and / or, The second edge portion located between the second light-emitting device and the third light-emitting device adjacent to the second light-emitting device overlaps with the third edge portion.

23. The display panel according to claim 22, characterized in that, The third partition film assembly further includes a third partition portion connected to the third edge portion, the third partition portion being closer to the third light-emitting device than the third edge portion; In the region between the first light-emitting device and the third light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion and the third edge portion in the first direction is less than the sum of the dimensions of the first partition portion and the third partition portion in the first direction; and / or, In the region between the second light-emitting device and the third light-emitting device adjacent to the second light-emitting device, the maximum value of the sum of the dimensions of the second edge portion and the third edge portion in the first direction is less than the sum of the dimensions of the second partition portion and the third partition portion in the first direction.

24. The display panel according to claim 18, characterized in that, The first and second blocking film groups are spaced apart in a second direction; the second direction is parallel to the line connecting the center of the first light-emitting device and the center of the second light-emitting device; or, The boundary of the first isolation film group away from the first light-emitting device coincides with the boundary of the second isolation film group away from the second light-emitting device.

25. The display panel according to claim 18, characterized in that, Also includes: A first encapsulation pattern covers the first light-emitting device and a portion of the second isolation layer away from the substrate; the first isolation film assembly further includes a portion of the first encapsulation pattern covering the surface of the second isolation layer away from the substrate. The second encapsulation pattern covers the second light-emitting device and a portion of the fourth isolation layer away from the substrate; the second isolation film assembly also includes a portion of the second encapsulation pattern covering the surface of the fourth isolation layer away from the substrate.

26. A method for manufacturing a display panel, characterized in that, include: Multiple first electrodes are formed on the substrate; A first initial isolation structure is formed on the substrate; The material of the first initial isolation structure includes insulating material; A second initial isolation structure is formed on the side of the first initial isolation structure away from the substrate; The second initial isolation structure and the first initial isolation structure are etched sequentially to form a first pixel opening that exposes the first electrode of the first light-emitting device; A light-emitting functional layer of a first light-emitting device and a second electrode are sequentially formed within the first pixel opening; The second initial isolation structure and the first initial isolation structure are etched sequentially to form a second pixel opening that exposes the first electrode of the second light-emitting device; A light-emitting functional layer and a second electrode of a second light-emitting device are sequentially formed within the second pixel opening; The second initial isolation structure and the first initial isolation structure are etched sequentially to form a third pixel opening that exposes the first electrode of the third light-emitting device; A light-emitting functional layer of a third light-emitting device and a second electrode are sequentially formed within the opening of the third pixel; Wherein, the first initial isolation structure and the second initial isolation structure form the first pixel opening, the second pixel opening and the third pixel opening, respectively, as the first isolation pattern and the second isolation pattern; the first isolation pattern includes a first part and a second part stacked along a direction away from the substrate, the second part includes a first edge portion, and the first edge portion extends relative to the first part in a direction close to the center line of the adjacent pixel opening. The second electrodes of the first light-emitting device, the second light-emitting device, and the third light-emitting device are all in contact with and electrically connected to the second isolation pattern; Along the first direction, the light-emitting functional layers of the first light-emitting device, the second light-emitting device, and the third light-emitting device are all located between the plane of the first edge portion near the surface of the substrate and the first electrode, and the first direction is the thickness direction of the substrate.

27. A method for manufacturing a display panel, characterized in that, include: Multiple first electrodes are formed on the substrate; A first initial isolation structure is formed on the substrate; The material of the first initial isolation structure includes insulating material; A second initial isolation structure is formed on the side of the first initial isolation structure away from the substrate; The second initial isolation structure and the first initial isolation structure are etched sequentially to form a first pixel opening that exposes the first electrode of the first light-emitting device, a second pixel opening that exposes the first electrode of the second light-emitting device, and a third pixel opening that exposes the first electrode of the third light-emitting device; A light-emitting functional layer of a first light-emitting device and a second electrode are sequentially formed within the first pixel opening; A light-emitting functional layer and a second electrode of a second light-emitting device are sequentially formed within the second pixel opening; A light-emitting functional layer of a third light-emitting device and a second electrode are sequentially formed within the opening of the third pixel; Wherein, the first initial isolation structure and the second initial isolation structure form the first pixel opening, the second pixel opening and the third pixel opening, respectively, which are the first isolation pattern and the second isolation pattern; the first isolation pattern includes a first part and a second part stacked along a direction away from the substrate, the second part includes a first edge portion, and the first edge portion extends relative to the first part in a direction close to the center line of the adjacent pixel opening; The second electrodes of the first light-emitting device, the second light-emitting device, and the third light-emitting device are all in contact with and electrically connected to the second isolation pattern; Along the first direction, the light-emitting functional layers of the first light-emitting device, the second light-emitting device, and the third light-emitting device are all located between the plane of the first edge portion near the surface of the substrate and the first electrode, and the first direction is the thickness direction of the substrate.

28. A display panel, characterized in that, include: Substrate; An isolation structure is disposed on the substrate; the isolation structure defines a first pixel opening and a second pixel opening; Multiple light-emitting devices; The plurality of light-emitting devices includes a first light-emitting device and a second light-emitting device; The first light-emitting device is disposed within the first pixel opening, and the second light-emitting device is disposed within the second pixel opening. The first light-emitting device and the second light-emitting device emit different colors. Both the first light-emitting device and the second light-emitting device include a first electrode and a second electrode disposed opposite to each other along a first direction, with the first electrode being closer to the substrate than the second electrode. The first direction is the thickness direction of the substrate. The second electrode is in contact with and electrically connected to the isolation structure. The first light-emitting device also includes a first light-emitting functional layer located between the first electrode and the second electrode of the first light-emitting device. The second light-emitting device also includes a second light-emitting functional layer located between the first electrode and the second electrode of the second light-emitting device. A first isolation film assembly includes a first isolation layer and a second isolation layer stacked in a direction away from the substrate, wherein the first isolation layer and the first light-emitting functional layer are made of the same material, and the second isolation layer and the second electrode are made of the same material; and... The second isolation film assembly includes a third isolation layer and a fourth isolation layer stacked in a direction away from the substrate. The third isolation layer is made of the same material as the second light-emitting functional layer, and the fourth isolation layer is made of the same material as the second electrode. The first isolation film group and the second isolation film group are both located on the side of the isolation structure away from the substrate; The first blocking film assembly includes a first edge portion away from the first light-emitting device, the first edge portion having a gradually decreasing size in the first direction; and / or, The second barrier film assembly includes a second edge portion away from the second light-emitting device, the size of which gradually decreases in the first direction; The first edge portion located between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device overlaps with the second edge portion.

29. The display panel according to claim 28, characterized in that, The first partition film assembly further includes a first partition portion connected to the first edge portion, the first partition portion being closer to the first light-emitting device than the first edge portion; The second partition film assembly further includes a second partition portion connected to the second edge portion, the second partition portion being closer to the second light-emitting device than the second edge portion; In the region between the first light-emitting device and the second light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion and the second edge portion in the first direction is less than the sum of the dimensions of the first partition portion and the second partition portion in the first direction.

30. The display panel according to claim 29, characterized in that, The plurality of light-emitting devices further includes a third light-emitting device, which includes a third light-emitting functional layer; the first light-emitting device, the second light-emitting device, and the third light-emitting device all emit different colors; The display panel also includes: The third isolation film group is located on the side of the isolation structure away from the substrate; the third isolation film group includes a fifth isolation layer and a sixth isolation layer stacked in a direction away from the substrate, the fifth isolation layer and the third light-emitting functional layer are made of the same material, and the sixth isolation layer and the second electrode are made of the same material; The third barrier film assembly includes a third edge portion away from the third light-emitting device, and the size of the third edge portion gradually decreases in the first direction; The first edge portion located between the first light-emitting device and the third light-emitting device adjacent to the first light-emitting device overlaps with the third edge portion; and / or, The second edge portion located between the second light-emitting device and the third light-emitting device adjacent to the second light-emitting device overlaps with the third edge portion.

31. The display panel according to claim 30, characterized in that, The third partition film assembly further includes a third partition portion connected to the third edge portion, the third partition portion being closer to the third light-emitting device than the third edge portion; In the region between the first light-emitting device and the third light-emitting device adjacent to the first light-emitting device, the maximum value of the sum of the dimensions of the first edge portion and the third edge portion in the first direction is less than the sum of the dimensions of the first partition portion and the third partition portion in the first direction; and / or, In the region between the second light-emitting device and the third light-emitting device adjacent to the second light-emitting device, the maximum value of the sum of the dimensions of the second edge portion and the third edge portion in the first direction is less than the sum of the dimensions of the second partition portion and the third partition portion in the first direction.

32. The display panel according to claim 30 or 31, characterized in that, Also includes: A first encapsulation pattern covers the first light-emitting device and a portion of the second isolation layer away from the substrate; the first isolation film assembly further includes a portion of the first encapsulation pattern covering the surface of the second isolation layer away from the substrate. The second encapsulation pattern covers the second light-emitting device and a portion of the fourth isolation layer away from the substrate; the second isolation film assembly also includes a portion of the second encapsulation pattern covering the surface of the fourth isolation layer away from the substrate. The third encapsulation pattern covers the third light-emitting device and a portion of the sixth isolation layer away from the substrate; the third isolation film assembly also includes a portion of the third encapsulation pattern covering the surface of the sixth isolation layer away from the substrate.

33. A display device, characterized in that, include: The display panel as described in any one of claims 1 to 25, 28 to 32; as well as, A circuit board electrically connected to the display panel.

34. A mask assembly, characterized in that, include: At least one mask template; the mask template includes subpixel patterns for corresponding to subpixels of the display panel, the boundaries of the subpixel patterns having microstructures.

35. The mask assembly according to claim 34, characterized in that, The photomask includes a light-shielding substrate defining an opening, the opening being the sub-pixel pattern, and the microstructure formed on the light-shielding substrate; or... The mask includes a light-transmitting substrate and a masking pattern disposed on the light-transmitting substrate, wherein the masking pattern is the sub-pixel pattern and the microstructure is formed on the masking pattern.

36. The mask assembly according to claim 34 or 35, characterized in that, The microstructure includes a plurality of sub-patterns arranged along the boundaries of the sub-pixel pattern.

37. The mask assembly according to claim 36, characterized in that, The at least one photomask includes a first photomask and a second photomask; the first photomask is used to fabricate a first light-emitting device of the display panel, and the second photomask is used to fabricate a second light-emitting device of the display panel; The microstructure of the first mask template includes multiple first sub-patterns, and the microstructure of the second mask template includes multiple second sub-patterns; The first sub-graphic has the same shape as the second sub-graphic; and / or, The spacing between two adjacent first sub-figures is the same as the spacing between two adjacent second sub-figures.

38. The mask assembly according to claim 37, characterized in that, The at least one photomask further includes a third photomask, the third photomask being used to fabricate a third light-emitting device for the display panel; The microstructure of the third mask template includes multiple third sub-patterns; The first sub-graphic, the second sub-graphic, and the third sub-graphic have the same shape; and / or, The spacing between two adjacent first sub-figures, the spacing between two adjacent second sub-figures, and the spacing between two adjacent third sub-figures are the same.

39. The mask assembly according to claim 36, characterized in that, The shape of the sub-graphic is a rectangle, square, triangle, or trapezoid.

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