Display device and electronic device including the same

Abstract

A display device and an electronic device including the same are disclosed. The display device may include: a substrate; a thin film transistor layer on one surface of the substrate and including a thin film transistor; a planarization film on the thin film transistor and including a first flat portion and a second flat portion spaced and / or separated (e.g., spaced or separated) from each other and a first inclined portion between the first flat portion and the second flat portion; a pixel electrode on the first flat portion, the first inclined portion, and the second flat portion of the planarization film; a pixel defining film including an opening exposing a portion of the pixel electrode; a light emitting layer on the pixel electrode in the opening; and a common electrode on the light emitting layer and the pixel defining film.

Description

[0001] Cross-reference to related applications

[0002] This application claims priority and benefit to Korean Patent Application No. 10-2024-0108694, filed on August 14, 2024, with the Korean Intellectual Property Office, the entire contents of which are incorporated herein by reference. Technical Field

[0003] One or more embodiments of this disclosure relate to a display device, an electronic device including the display device, and a method of manufacturing the display device (or a method of manufacturing a display device). Background Technology

[0004] With the development of communication technologies and media, display devices are being used to display images in one or more suitable places and environments. For example, one or more suitable types (categories) of display devices (such as liquid crystal displays (LCDs) and / or organic light-emitting diode (OLED) displays) are widely used.

[0005] Organic light-emitting diode (OLED) displays are widely used in display devices because they offer fast response times, high brightness, wide brightness angles, wide viewing angles, and low power consumption. However, the brightness of a display device may be lower when viewed from the side compared to viewing it from the front. Furthermore, due to differences in the refractive index of the displayed colors, colors may appear distorted when viewed from the side compared to viewing them from the front. As a result, even when displaying a white image, the image may appear somewhat or primarily bluish when viewed from the side compared to viewing it from the front. Summary of the Invention

[0006] One or more aspects of embodiments of this disclosure relate to a display device that has improved (enhanced) brightness and color deviation when viewed from the side compared to when viewed from the front.

[0007] One or more aspects of embodiments of this disclosure relate to a method of manufacturing a display device (or a method of manufacturing a display device) that has improved (enhanced) brightness and color deviation when viewed from the side compared to when viewed from the front.

[0008] Additional aspects of the embodiments will be set forth in part in the description which follows, and in part will be obvious from the description or may be learned by practicing the embodiments presented in this disclosure.

[0009] According to one or more embodiments of this disclosure, a display device may include: a substrate; a thin-film transistor layer on one surface of the substrate, and including thin-film transistors; a planarization film on the thin-film transistors, and including a first flat portion and a second flat portion spaced apart and / or separated (e.g., spaced apart or separated) from each other, and a first inclined portion between the first flat portion and the second flat portion; a pixel electrode on the first flat portion, the first inclined portion and the second flat portion of the planarization film; a pixel defining film including an opening exposing a portion of the pixel electrode; a light-emitting layer in the opening on the pixel electrode; and a common electrode on the light-emitting layer and the pixel defining film. The minimum thickness of the planarization film in the first flat portion may be less than the minimum thickness of the planarization film in the second flat portion, and the thickness of the planarization film in the first inclined portion may decrease from the second flat portion to the first flat portion.

[0010] In the first flattened portion, an extension line extending from the upper surface of the planarized film parallel to (e.g., substantially parallel to) a surface of the substrate can be defined as a first extension line; in the second flattened portion, an extension line extending from the upper surface of the planarized film parallel to (e.g., substantially parallel to) a surface of the substrate can be defined as a second extension line; a line connecting a first point where the first inclined portion intersects (e.g., intersects) the first extension line and a second point where the first inclined portion intersects (e.g., intersects) the second extension line can be defined as a first inclined line; and the angle between the first extension line and the first inclined line can be from about 15° to about 35°.

[0011] The maximum length between one end of the second flat portion and the second point can be from about 0.5 μm to about 1.5 μm.

[0012] The planar area of ​​the first inclined portion can be approximately 70% to approximately 80% of the planar area of ​​the opening.

[0013] The planarization film may further include a second inclined portion that is spaced apart from and / or separated (e.g., spaced apart or separated) from the first inclined portion and a third flat portion that is spaced apart from and / or separated (e.g., spaced apart or separated) from the second flat portion, wherein the second inclined portion is between the second flat portion and the third flat portion.

[0014] In the first flattened portion, an extension line extending from the upper surface of the planarized film parallel to (e.g., substantially parallel to) a surface of the substrate can be defined as a first extension line; in the second flattened portion, an extension line extending from the upper surface of the planarized film parallel to (e.g., substantially parallel to) a surface of the substrate can be defined as a second extension line; in the third flattened portion, an extension line extending from the upper surface of the planarized film parallel to (e.g., substantially parallel to) a surface of the substrate can be defined as a third extension line; a line connecting a first point where the first inclined portion intersects (e.g., intersects) the first extension line and a second point where the first inclined portion intersects (e.g., intersects) the second extension line can be defined as a first inclined line; a line connecting a fourth point where the second inclined portion intersects (e.g., intersects) the second extension line and a third point where the second inclined portion intersects (e.g., intersects) the third extension line can be defined as a second inclined line; and a first angle, which is the acute angle between the first extension line and the first inclined line, can be smaller than a second angle, which is the acute angle between the second extension line and the second inclined line.

[0015] The maximum length of the first flat portion in the first direction may be about 20% to about 40% of the maximum length of the opening in the first direction.

[0016] The planar area of ​​the first inclined portion can be approximately 10% to approximately 45% of the planar area of ​​the opening.

[0017] The thickness of the first inclined portion can be from about 1.0 μm to about 2.5 μm.

[0018] The planar area of ​​the second flat portion can be approximately 10% to approximately 25% of the planar area of ​​the opening.

[0019] The thickness of the second inclined portion can be from about 0.4 μm to about 1.5 μm.

[0020] The planarization film may further include a first aperture defined by the boundary between the first flat portion and the first inclined portion, and a second aperture defined by the boundary between the second flat portion and the second inclined portion.

[0021] The size of the second hole can be larger than the size of the first hole, and the size of the opening can be larger than the size of the second hole.

[0022] The first and second holes can overlap with the opening.

[0023] According to one or more embodiments of this disclosure, a method of manufacturing a display device (or a method of manufacturing a display device) may include: forming or providing a thin-film transistor on a surface of a substrate; forming or providing (coating) a planarization film on the thin-film transistor, the planarization film including a first flat portion and a second flat portion spaced apart and / or separated (e.g., spaced apart or separated) from each other, and a first inclined portion between the first flat portion and the second flat portion; forming or providing a pixel electrode on the first flat portion, the first inclined portion and the second flat portion of the planarization film; forming or providing a pixel defining layer on the pixel electrode including an opening exposing a portion of the pixel electrode; forming or providing a light-emitting layer on the pixel electrode in the opening; and forming or providing a common electrode on the light-emitting layer and the pixel defining film. Forming or providing the planarization film may include: forming or providing a first planarization film; forming or providing a second planarization film having a first hole overlapping the opening on the first planarization film; and forming or providing a third planarization film on the second planarization film and the first planarization film exposed in the first hole.

[0024] Forming or providing a second planarization film may include exposing the second planarization film at a distance of about 25 μm to about 50 μm from the focal point of the exposure apparatus.

[0025] According to one or more embodiments of this disclosure, a method of manufacturing a display device (or a method of manufacturing a display device) may include: forming or providing a thin-film transistor on a surface of a substrate; forming or providing a planarization film on the thin-film transistor, the planarization film including a first flat portion and a second flat portion spaced apart and / or separated (e.g., spaced apart or separated) from each other, and a first inclined portion between the first flat portion and the second flat portion; forming or providing a pixel electrode on the first flat portion, the first inclined portion and the second flat portion of the planarization film; forming or providing a pixel defining layer on the pixel electrode including an opening exposing a portion of the pixel electrode; forming or providing a light-emitting layer on the pixel electrode in the opening; and forming or providing a common electrode on the light-emitting layer and the pixel defining film. Forming or providing the planarization film may include: forming or providing a first planarization film; forming or providing a second planarization film having a first hole overlapping the opening on the first planarization film; and forming or providing a third planarization film having a second hole overlapping the second planarization film and the opening on the first planarization film exposed in the first hole.

[0026] Forming or providing a planarization film may also include forming or providing a fourth planarization film on a third planarization film, a second planarization film exposed in a second hole, and a first planarization film exposed in a first hole.

[0027] The thickness of the fourth planarization film can be from about 0.4 μm to about 1.0 μm.

[0028] According to one or more embodiments of this disclosure, a display device may include: a substrate; a thin-film transistor layer on one surface of the substrate and including thin-film transistors; a planarization film on the thin-film transistors and including a tilted portion and a flattened portion; a pixel electrode on the tilted and flattened portions of the planarization film; a pixel defining film including an opening exposing a portion of the pixel electrode; a light-emitting layer in the opening on the pixel electrode; and a common electrode on the light-emitting layer and the pixel defining film. The tilted portion may overlap with a central portion of the pixel electrode, and the flattened portion may surround the tilted portion (e.g., around the tilted portion).

[0029] The thickness of the planarization film can be increased from the center of the inclined section to the outer part of the inclined section.

[0030] The width of the flat portion in the first direction can be from about 0.5 μm to about 1.5 μm.

[0031] According to one or more embodiments of this disclosure, an electronic device includes a display device, which may include: a substrate; a thin-film transistor layer on one surface of the substrate and including thin-film transistors; a planarization film on the thin-film transistors and including a first flat portion and a second flat portion spaced apart and / or separated (e.g., spaced apart or separated) from each other, and a first inclined portion between the first flat portion and the second flat portion; a pixel electrode on the first flat portion, the first inclined portion and the second flat portion of the planarization film; a pixel defining film including an opening exposing a portion of the pixel electrode; a light-emitting layer in the opening on the pixel electrode; and a common electrode on the light-emitting layer and the pixel defining film. The minimum thickness of the planarization film in the first flat portion may be less than the minimum thickness of the planarization film in the second flat portion, and the thickness of the planarization film in the first inclined portion may decrease from the second flat portion to the first flat portion.

[0032] According to one or more embodiments of this disclosure, a planarization film having a planarized surface formed or provided thereon can be used to form or provide a planarized portion in the light-emitting region. For example, the inclination of the planarized portion of the light-emitting region can be adjusted by forming or providing holes in the planarization film and adjusting the thickness of the planarization film. Therefore, light emitted from the planarized portion of the light-emitting region can be guided toward the front of the display device, and light emitted from the planarized portion of the light-emitting region can be guided toward the side of the display device. Thus, if (e.g., when) the display device is viewed from the side, the degree or incidence of brightness reduction and color distortion can be reduced compared to viewing from the front.

[0033] According to one or more embodiments of this disclosure, a tilted portion can be formed or provided on the upper surface of the planarization film using a mask in which a pattern is formed or provided during exposure of the planarization film. For example, the size and tilt of the tilted portion on the upper surface of the planarization film can be adjusted by adjusting the pattern of the mask. Therefore, since the light emitted from the tilted portion of the light-emitting area is directed toward the side of the display device, the degree or incidence of brightness reduction and color distortion can be reduced when the display device is viewed from the side, for example, when viewed from the front.

[0034] For example, according to one or more embodiments of this disclosure, a display device and a method of manufacturing the same involve forming a tilted portion in a light-emitting region using a planarization film having a tilted surface. The tilt can be adjusted by forming holes in the planarization film and modifying its thickness. This directs light from the planar portion toward the front and light from the tilted portion toward the side, reducing brightness reduction and color distortion if (e.g., when) viewed from the side.

[0035] In one or more embodiments, a tilted portion can be formed or provided on the upper surface of the planarized film by utilizing a patterned mask during exposure. Adjusting the mask pattern allows control over the size and tilt of the tilted portion, further reducing brightness reduction and color distortion if (e.g., when) viewed from the side.

[0036] However, the aspects and features of embodiments of this disclosure are not limited to those set forth herein. The above and other aspects and features of certain embodiments of this disclosure will become more apparent to those skilled in the art upon reference to the detailed description of this disclosure. Attached Figure Description

[0037] The above and other aspects and features of certain embodiments of this disclosure will become more apparent and readily understood from the following description of one or more embodiments, taken in conjunction with the accompanying drawings, in which:

[0038] Figure 1 This is a perspective view of a display device according to one or more embodiments of the present disclosure;

[0039] Figure 2 To show in more detail Figure 1 Layout diagram of area A;

[0040] Figure 3 It is shown Figure 2 An enlarged layout diagram of an example of the pixel electrode in the first light-emitting region;

[0041] Figure 4 It shows along Figure 3 A cross-sectional view of the section intercepted by line P-P';

[0042] Figure 5 yes Figure 4 Enlarged cross-sectional view of part B;

[0043] Figure 6 This is a flowchart illustrating a method of manufacturing a display device according to one or more embodiments of the present disclosure;

[0044] Figures 7 to 15 To show in more detail Figure 6 A view of a method for manufacturing a display device;

[0045] Figure 16 It is shown Figure 2 An enlarged layout diagram of another example of the pixel electrode in the first light-emitting region;

[0046] Figure 17 It shows along Figure 16 A cross-sectional view of the section intercepted by line Q-Q';

[0047] Figure 18 yes Figure 17 Enlarged cross-sectional view of part C;

[0048] Figure 19 This is a flowchart illustrating a method of manufacturing a display device according to one or more embodiments of the present disclosure;

[0049] Figures 20 to 26 To show in more detail Figure 19 A view of a method for manufacturing a display device;

[0050] Figure 27 It is shown Figure 2 An enlarged layout diagram of another example of the pixel electrode in the first light-emitting region;

[0051] Figure 28 It shows along Figure 27 A cross-sectional view of the section intercepted by line R-R';

[0052] Figure 29 yes Figure 28 Enlarged cross-sectional view of part D;

[0053] Figure 30 This is a flowchart illustrating a method of manufacturing a display device according to one or more embodiments of the present disclosure;

[0054] Figures 31 to 38 To show in more detail Figure 30 A view of a method for manufacturing a display device;

[0055] Figure 39This is a plan view showing a slit mask on a second planarization film in a method of manufacturing a display device according to one or more embodiments of the present disclosure;

[0056] Figure 40 and Figure 41 It shows how to utilize Figure 39 A cross-sectional view of a method for manufacturing a display device using a slit mask;

[0057] Figure 42 It is shown Figure 2 An enlarged layout diagram of another example of the pixel electrode in the first light-emitting region;

[0058] Figure 43 It shows along Figure 42 A cross-sectional view of the section intercepted by line S-S';

[0059] Figure 44 yes Figure 43 Enlarged cross-sectional view of part E;

[0060] Figure 45 This is a flowchart illustrating a method of manufacturing a display device according to one or more embodiments of the present disclosure;

[0061] Figures 46 to 54 To show in more detail Figure 45 A view of the manufacturing method of the display device. Detailed Implementation

[0062] The aspects and features of the embodiments of this disclosure, as well as the methods of implementing the embodiments, can be more readily understood by referring to the detailed description and accompanying drawings of the embodiments. Hereinafter, the subject matter of this disclosure will be described in more detail with reference to the accompanying drawings, in which embodiments of this disclosure are illustrated. In this respect, the subject matter of this disclosure may be implemented in different forms and should not be construed as limited to the one or more embodiments set forth herein. Rather, these embodiments are provided by way of example so that this disclosure will be thorough and complete, and will fully convey the aspects and features of this disclosure to those skilled in the art. Therefore, processes, elements, and techniques that are not necessary for a full understanding of the aspects and features of this disclosure by those skilled in the art are not described.

[0063] Unless otherwise stated, throughout the drawings and written description, the same reference numerals, characters, and / or one or more (e.g., any suitable) combinations thereof denote the same elements, and a repeated description thereof may not be provided, and therefore will not be repeated. Furthermore, for clarity, portions unrelated to the description of one or more embodiments may be omitted.

[0064] In the accompanying drawings, the relative dimensions of elements, layers, and regions may be exaggerated to effectively or appropriately illustrate the technical content of this disclosure. Furthermore, crosshairs and / or shading in the drawings may be used to clarify the boundaries between adjacent elements. Thus, unless otherwise stated, the presence or absence of crosshairs and / or shading neither conveys nor indicates any preference or requirement for certain materials, material properties, sizes, proportions, commonalities among the elements shown, and / or any other characteristics, properties, or characteristics.

[0065] One or more embodiments of this disclosure are described herein with reference to cross-sectional views as schematic diagrams of examples and / or intermediate structures. Thus, variations in the shapes illustrated can be expected due to, for example, manufacturing techniques and / or tolerances. Furthermore, the specific structural or functional descriptions disclosed herein are illustrative only for the purpose of describing one or more embodiments of this disclosure. Therefore, one or more embodiments disclosed herein should not be construed as limited to a specific shape of a region, but should be construed as including deviations in shape due to, for example, manufacturing. Thus, the shapes shown in the drawings may not depict the actual shape of a region of the device, and the embodiments of this disclosure are not limited thereto.

[0066] For example, an injection zone shown as rectangular (e.g., substantially rectangular) may have rounded or curved features at its edges and / or a gradient of injection concentration, rather than a binary change from an injection zone to a non-injection zone. Similarly, a buried zone formed or provided by injection may result in injection in a zone between the buried zone and the surface where the injection occurs. Therefore, the zones shown in the figures are schematic in nature, and their shapes are not intended to show the actual shape of the zones of the device, nor are they intended to be limiting. Furthermore, as those skilled in the art will recognize, this disclosure may be modified in one or more suitable different ways without departing from the spirit or scope of this disclosure.

[0067] In this disclosure, one or more specific details are set forth for illustrative purposes to provide a thorough understanding of one or more embodiments. However, it will be apparent that one or more embodiments may be practiced without these specific details or using one or more equivalent arrangements. In other instances, structures and arrangements that are generally available or commonly used are shown in block diagram form to avoid unnecessarily obscuring one or more embodiments.

[0068] For ease of interpretation, spatial relative terms (such as “below,” “under,” “below,” “below,” “above,” and / or “above,” etc.) may be used herein to describe the relationship of one element or feature as shown in the accompanying drawings to another element(s) or feature(s). It will be understood that, in addition to the orientations depicted in the accompanying drawings, spatial relative terms are also intended to cover different orientations of the device in use or operation. For example, if the device in the accompanying drawings is flipped, then an element described as “below,” “below,” or “below” other elements or features may then be oriented “above” said other elements or features. Thus, the example terms “below” and “below” may cover (e.g., simultaneously cover) both above and below orientations. The device may be oriented in other ways (e.g., rotated 90 degrees or in other orientations), and the spatial relative descriptors used herein should be interpreted accordingly. Similarly, if the first part is described as "on" the second part (e.g., when the first part is described as "on" the second part), this means that the first part is located on the upper or lower side of the second part, and is not limited to being on the upper side of the second part based on the direction of gravity.

[0069] Furthermore, in this disclosure, the phrase "in a plane" or "in a plan view" refers to the target portion viewed from the top, and the phrase "in a cross section" or "in a cross section view" refers to the cross section formed by vertically cutting the target portion viewed from the side.

[0070] It will be understood that if (for example, when) an element, layer, area, or component is referred to as being “formed or provided on” another element, layer, area, or component, “on” another element, layer, area, or component, “connected to” or “coupled to” another element, layer, area, or component, then the element, layer, area, or component may be directly formed or provided on the other element, layer, area, or component, directly on the other element, layer, area, or component, directly connected to or coupled to the other element, layer, area, or component, or indirectly formed or provided on the other element, layer, area, or component, indirectly on the other element, layer, area, or component, indirectly connected to or coupled to the other element, layer, area, or component, such that one or more intermediary elements, layers, areas, or components may be present therein. For example, if (e.g., when) a layer, zone, or component is referred to as "electrically connected" or "electrically coupled" to another layer, zone, or component, then the layer, zone, or component may be directly electrically connected or coupled to the other layer, zone, or component, or there may be intermediary layers, zones, or components therein. However, "direct connection / direct coupling" means that one component is directly connected or coupled to another component without (e.g., any) intermediate components. In one or more embodiments, other expressions describing the relationship between components (such as "between," "immediately adjacent to," "adjacent to," and "directly adjacent to") can be interpreted similarly. In one or more embodiments, it will also be understood that if (e.g., when) an element or layer is referred to as "between" two elements or layers, the element or layer may be the only element or layer between the two elements or layers, or there may be one or more intermediary elements or layers therein.

[0071] In this disclosure, if expressions such as “at least one of…”, “one of…”, and “selected from…” appear before / after a list of elements, they modify the entire list of elements, not individual elements within the list. For example, “at least one of X, Y, and Z” and “selected from the group consisting of X, Y, and Z” can be interpreted as only X, only Y, only Z, or any combination of two or more of X, Y, and Z (such as XYZ, XY, XZ, YZ, and XZ, or their (e.g., any suitable) variants). Similarly, expressions such as “at least one of A and B” can include A, B, or A and B.

[0072] As used herein, the term “and / or” includes any and all combinations of one or more of the associated listed items. For example, an expression such as “A and / or B” may include A, B, or A and B. Furthermore, the use of “may” when describing embodiments of this disclosure means “one or more embodiments of this disclosure”.

[0073] It will be understood that although the terms “first,” “second,” and / or “third,” etc., may be used herein to describe one or more suitable elements, components, areas, layers, and / or segments, such elements, components, areas, layers, and / or segments should not be limited by these terms. These terms are used to distinguish one element, component, area, layer, or segment from another element, component, area, layer, or segment. Therefore, without departing from the spirit and scope of this disclosure, a more detailed description of a first element, first component, first area, first layer, or first segment may be referred to as a second element, second component, second area, second layer, or second segment.

[0074] In the example, the X-axis, Y-axis, and / or Z-axis directions are not limited to the three axes of a Cartesian coordinate system and can be interpreted in a broader sense. For example, the X-axis, Y-axis, and Z-axis directions can be orthogonal to each other (e.g., perpendicular), or they can represent different directions that are not orthogonal to each other (e.g., perpendicular). Essentially the same applies to the first direction, the second direction, and / or the third direction.

[0075] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit this disclosure. As used herein, unless the context clearly indicates otherwise, the singular forms “a” and “an” are also intended to include the plural forms.

[0076] In this disclosure, it will be understood that the terms “comprise(s) / comprising,” “include(s) / including,” or “have / has / having” indicate the presence of the stated features, integrals, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integrals, steps, operations, elements, components, and / or groups thereof. Furthermore, the terms “comprise(s) / comprising,” “include(s) / including,” “have / has / having,” or similar terms include or support the terms “composed of” and “substantially composed of” that indicate the presence of the stated features, integrals, steps, operations, elements, and / or components, without the presence or substantial need for the presence of other features, integrals, steps, operations, elements, components, and / or groups thereof.

[0077] As used herein, the terms “substantially,” “about,” “approximately,” and similar terms are used as approximate terms rather than terms of degree and are intended to account for inherent deviations in measured or calculated values ​​that would be recognized by one of ordinary skill in the art. Taking into account the measurements discussed and the errors associated with the measurement of a particular quantity (e.g., limitations of the measurement system), “about” or “approximately” as used herein includes the stated value and refers to a range of acceptable deviations from the particular value as determined by one of ordinary skill in the art. For example, “about” may mean within one or more standard deviations, or within ±30%, ±20%, ±10%, or ±5% of the stated value. Furthermore, the use of “may” when describing one or more embodiments of this disclosure means “one or more embodiments of this disclosure.”

[0078] If (for example, when) one or more embodiments can be implemented differently, a set or particular process sequence can be performed in a different order than that described. For example, two consecutively described processes can be performed substantially simultaneously, or in the reverse order of their description.

[0079] Furthermore, any numerical ranges disclosed and / or enumerated herein are intended to include all subranges containing substantially the same numerical precision within the enumerated ranges. For example, the range “1.0 to 10.0” is intended to include all subranges between the enumerated minimum value 1.0 and the enumerated maximum value 10.0 (and includes both the enumerated minimum value 1.0 and the enumerated maximum value 10.0), such as a minimum value equal to or greater than 1.0 and a maximum value equal to or less than 10.0 (e.g., 2.4 to 7.6). Any maximum numerical limit enumerated herein is intended to include all lower numerical limits contained herein, and any minimum numerical limit enumerated herein is intended to include all higher numerical limits contained herein. Therefore, the applicant reserves the right to amend this specification (including the claims) to expressly enumerate any subranges contained within the ranges expressly enumerated herein.

[0080] Electronic devices, electrical devices, manufacturing apparatuses thereto, and / or any other related devices or components according to one or more embodiments of this disclosure can be implemented using any suitable hardware, firmware (e.g., application-specific integrated circuits), software, and / or combinations of software, firmware, and hardware (e.g., any suitable combination). For example, one or more suitable components of such devices can be formed or provided on an integrated circuit (IC) chip or a separate IC chip. Furthermore, one or more suitable components of such devices can be implemented on a flexible printed circuit film, tape-on-a-carrier (TCP), printed circuit board (PCB), or formed or provided on a substrate.

[0081] Furthermore, one or more suitable components of these devices may be processes or threads running on one or more processors in one or more computing devices, executing computer program instructions and interacting with other system components to perform one or more suitable functions as described herein. The computer program instructions may be stored in memory that can be implemented in the computing device using standard memory devices, such as random access memory (RAM). The computer program instructions may also be stored in other non-transitory computer-readable media, such as CD-ROMs and / or flash drives. Moreover, those skilled in the art will recognize that, without departing from the spirit and scope of this disclosure, the functionality of one or more suitable computing devices may be combined or integrated into a single computing device, or the functionality of a particular computing device may be distributed across one or more other computing devices.

[0082] In the context of this application, and unless otherwise specified, the terms "use, using, and used" may be considered synonymous with the terms "utilize, utilizing, and utilized," respectively. Furthermore, the use of "may" in describing embodiments of the inventive concept means "one or more embodiments of the inventive concept."

[0083] Unless otherwise specified, all terms used herein (including technical and scientific terms) shall have substantially the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure pertains. It will also be understood that terms that are generally available or commonly used (such as those defined in dictionaries) should be interpreted as having a meaning consistent with their meaning in the context of the relevant field and / or in this specification, and should not be interpreted in an idealized or overly formal sense.

[0084] In the following description, one or more embodiments will be described in more detail with reference to the accompanying drawings.

[0085] Figure 1 This is a perspective view of a display device according to one or more embodiments of the present disclosure.

[0086] Reference Figure 1The display device 10 can be a means for displaying still images and / or moving images, and can be used as a display screen for each of one or more suitable products (such as televisions, laptops, monitors, billboards, and Internet of Things (IoT) devices) and portable electronic devices (such as mobile phones, smartphones, tablet PCs, smartwatches, watch phones, mobile communication terminals, electronic notebooks, e-books, portable multimedia players (PMPs), navigation devices, and ultra-mobile PCs (UMPCs)). The display device 10 can be any of the following selected from organic light-emitting diode (OLED) display devices, liquid crystal display devices, plasma display devices, quantum dot (QD) display devices, and micro-LED display devices. In the following description, the display device 10 is primarily described as an organic light-emitting diode (OLED) display device, but embodiments of this disclosure are not limited thereto.

[0087] The display device 10 may include a display panel 100, a display driving circuit 200, and a circuit board 300.

[0088] The display panel 100 may include a main area MA and a protruding area PA that protrudes from one side of the main area MA.

[0089] The main region MA can be in a rectangular (e.g., substantially rectangular) plane having a short side in a first direction (X-axis direction) and a long side in a second direction (Y-axis direction) that intersects (e.g., crosses) the first direction (X-axis direction). The angle where the short side in the first direction (X-axis direction) and the long side in the second direction (Y-axis direction) intersect each other can be rounded (e.g., substantially rounded) to have a set or predetermined curvature, or can be formed or provided as a right angle (e.g., substantially right angle). The planar shape (e.g., substantially planar shape) of the display device 10 is not limited to a quadrilateral shape (e.g., substantially quadrilateral shape), and can be other polygonal (e.g., substantially polygonal), circular (e.g., substantially circular), or elliptical (e.g., substantially elliptical) shapes.

[0090] The main region MA can be formed or provided as flat (e.g., substantially flat), but embodiments of this disclosure are not limited thereto, and may include curved portions at the left and right ends. In this case, the curved portions may have a set or predefined curvature. In one or more embodiments, the main region MA can be formed or provided as partially or entirely bendable and / or foldable.

[0091] The main region MA may include a display region DA in which pixels are formed or provided to display an image and a non-display region NDA surrounding the display region DA (e.g., around the display region DA).

[0092] In the display area DA, not only pixels can be arranged or provided, but also scan lines, data lines, and power lines connected to the pixels can be arranged or provided. If (for example, when) the main area MA includes a curved portion, the display area DA can be located within the curved portion. In this case, it is even possible to view the image of the display panel 100 within the curved portion.

[0093] The non-display area NDA can be defined as the area extending from the outside of the display area DA to the edge of the display panel 100. Scan drivers that apply scan signals to scan lines, as well as connecting lines that connect data lines and display drive circuitry 200, can be arranged or provided in the non-display area NDA.

[0094] The protruding region PA can protrude from one side of the main region MA. For example, the protruding region PA can protrude from the main region MA in the opposite direction (Y-axis direction). The length of the protruding region PA in the first direction (X-axis direction) can be shorter than the length of the main region MA in the first direction (X-axis direction).

[0095] The display driver circuit 200 and the circuit board 300 can be located in the protruding area PA.

[0096] The display driving circuit 200 can be used to output signals and voltages to drive the display panel 100. For example, the display driving circuit 200 can be used to supply data voltage to data lines. In one or more embodiments, the display driving circuit 200 can be used to supply power voltage to power lines and supply scan control signals to a scan driver. The display driving circuit 200 can be formed or provided as an integrated circuit (IC) and can be attached to the display panel 100 by means of glass-on-gold (COG), plastic-on-gold (COP), and / or ultrasonic bonding, but the embodiments of this disclosure are not limited thereto. For example, the display driving circuit 200 can be mounted on a circuit board 300.

[0097] The circuit board 300 can be attached to the display panel 100 using an anisotropic conductive (e.g., electrically conductive) film. Therefore, the leads of the circuit board 300 can be electrically connected to the display panel 100. The circuit board 300 can be a flexible printed circuit board, a printed circuit board, or a flexible film such as a chip-on-film.

[0098] Figure 2 To show in more detail Figure 1 The layout diagram of area A.

[0099] Reference Figure 2 The display area DA of the display panel 100 can be defined by a pixel-limited film ( Figure 4The pixel-defining film 135 defines the light source and may include a first light-emitting region EA1, a second light-emitting region EA2, and a third light-emitting region EA3, each serving as a light-emitting region for emitting a set or predetermined amount of light. Each of the first light-emitting region EA1, the second light-emitting region EA2, and the third light-emitting region EA3 may include a pixel electrode 131, a light-emitting layer (… Figure 4 The light-emitting layer 132 and the common electrode (in the middle) Figure 4 The common electrode 133 in the image can refer to the pixel electrode 131 and the light-emitting layer. Figure 4 The light-emitting layer 132 and the common electrode (in the middle) Figure 4 The region in which the common electrodes 133 are stacked sequentially.

[0100] Each of the first luminous region EA1, the second luminous region EA2, and the third luminous region EA3 may have a circular shape (e.g., substantially circular), an elliptical shape (e.g., substantially elliptical), a polygonal shape (e.g., substantially polygonal), or an irregular planar shape (e.g., substantially irregular planar). In the following, as an example, the case where the first luminous region EA1, the second luminous region EA2, and the third luminous region EA3 have a circular shape (e.g., substantially circular) will be described in more detail.

[0101] Each pixel PX may include a first light-emitting region EA1, a third light-emitting region EA3, and two second light-emitting regions EA2. In this case, in each pixel PX, the first light-emitting region EA1, the second light-emitting region EA2, and the third light-emitting region EA3 may be in a rhomboid shape (e.g., substantially rhomboid). For example, in each pixel PX, the first light-emitting region EA1 and the third light-emitting region EA3 may be arranged or provided to be adjacent to each other in a first direction (X-axis direction), and the second light-emitting regions EA2 may be arranged or provided to be adjacent to each other in a second direction (Y-axis direction).

[0102] In one or more embodiments, in each of the pixels PX, a first light-emitting region EA1 and one selected from the second light-emitting regions EA2 may be arranged or provided as adjacent to each other in a first diagonal direction DD1, and another selected from the second light-emitting regions EA2 may be arranged or provided as adjacent to each other in a second diagonal direction DD2. In one or more embodiments, in each of the pixels PX, one selected from the second light-emitting regions EA2 and a third light-emitting region EA3 may be arranged or provided as adjacent to each other in the second diagonal direction DD2, and another selected from the second light-emitting regions EA2 and the third light-emitting region EA3 may be arranged or provided as adjacent to each other in the first diagonal direction DD1. The first diagonal direction DD1 may be a direction between a first direction (X-axis direction) and a second direction (Y-axis direction), and may be a direction inclined at 45° relative to the first direction (X-axis direction) and the second direction (Y-axis direction). The second oblique direction DD2 can be the direction between the first direction (X-axis direction) and the opposite direction of the second direction (Y-axis direction), and can be a direction inclined at 45° relative to the opposite direction of the first direction (X-axis direction) and the second direction (Y-axis direction).

[0103] For example, in this disclosure, pixels PX can be arranged or provided as rhomboid RGBG pixels (e.g., substantially rhomboid RGBG pixels).

[0104] Pixel electrode 131 may include a first portion 131a in each of the first light-emitting region EA1, the second light-emitting region EA2, and the third light-emitting region EA3, and a second portion 131b protruding from the first portion 131a in one direction. The first portion 131a may have a circular planar shape (e.g., substantially a circular planar shape), but embodiments of this disclosure are not limited thereto. The second portion 131b may be a portion protruding from the first portion 131a. The second portion 131b may pass through a first contact hole ( Figure 4 The first contact hole (CNT1) is electrically connected to the third connection electrode ( Figure 4 (The third connecting electrode 129 in the middle).

[0105] The second portion 131b of the pixel electrode 131 in the first light-emitting region EA1 and the third light-emitting region EA3 can protrude from the first portion 131a in the first direction (X-axis direction). The second portion 131b of the pixel electrode 131 in the second light-emitting region EA2 can protrude from the first portion 131a in the second direction (Y-axis direction).

[0106] In one or more embodiments, a first emitting region EA1 can be used to emit a first light in the blue band, a second emitting region EA2 can be used to emit a second light in the green band, and a third emitting region EA3 can be used to emit a third light in the red band. For example, the blue band can indicate that the main peak wavelength of the light is included in the band from about 370 nm to about 460 nm, the green band can indicate that the main peak wavelength of the light is included in the band from about 480 nm to about 560 nm, and the red band can indicate that the main peak wavelength of the light is included in the band from about 600 nm to about 750 nm.

[0107] In one or more embodiments, the area of ​​the first light-emitting region EA1 may be larger than the area of ​​the third light-emitting region EA3, and the area of ​​the third light-emitting region EA3 may be larger than the area of ​​the second light-emitting region EA2.

[0108] For example, the diameter of the third luminescent region EA3 can be from about 17 μm to about 19 μm, the diameter of the second luminescent region EA2 can be from about 16 μm to about 18 μm, and the diameter of the first luminescent region EA1 can be from about 22 μm to about 23 μm.

[0109] Figure 2 The diagram illustrates that each of a plurality of pixels PX may include four light-emitting regions EA1, EA2, and EA3, but embodiments of this disclosure are not limited thereto. For example, each of the plurality of pixels PX may also include three light-emitting regions.

[0110] In one or more embodiments, the arrangement of the light-emitting regions EA1, EA2, and EA3 in each of the pixels PX is not limited to... Figure 2 The arrangement is shown in the figure. For example, in each of the plurality of pixels PX, the light-emitting regions EA1, EA2, and EA3 can be a stripe structure (e.g., substantially stripe structure) in the first direction (X-axis direction) where the light-emitting regions have a diamond arrangement (e.g., substantially diamond arrangement). A structure or a hexagonal structure (e.g., a substantially hexagonal structure) in which a light-emitting area having a hexagonal planar shape (e.g., a substantially hexagonal planar shape) is arranged or provided.

[0111] Figure 3 It is shown Figure 2 An enlarged layout diagram of an example of the pixel electrode in the first light-emitting region.

[0112] The pixel electrode 131 in each of the second light-emitting regions EA2 and the third light-emitting region EA3 can be formed or provided in substantially the same manner as the pixel electrode 131 in the first light-emitting region EA1. Therefore, a more detailed description of the pixel electrode 131 in each of the second light-emitting regions EA2 and the third light-emitting region EA3 is not required.

[0113] Reference Figure 3 The first light-emitting region EA1 may include a first flat portion M1, a first inclined portion N1, and a second flat portion M2.

[0114] The first flat portion M1 may be located at the center of the first light-emitting region EA1. The first flat portion M1 may be a region in which the pixel electrode 131 is flat (e.g., substantially flat) or the tilt of the pixel electrode 131 is less than a first angle. The first angle may be about 3°. For example, the first flat portion M1 may be a region in which the pixel electrode 131 is flat or nearly flat (e.g., substantially flat).

[0115] Because the first flat portion M1 is the region in which the pixel electrode 131 is flat or nearly flat (e.g., substantially flat), the first flat portion M1 can be the region in which the light-emitting layer 132 (see Figure 4 The area in which light generated in the frontal direction is emitted.

[0116] The planar shape (e.g., substantially planar shape) of the first flat portion M1 can follow the planar shape (e.g., substantially planar shape) of the first light-emitting region EA1. If (e.g., when) the first light-emitting region EA1 has such... Figure 3 When the planar shape shown is circular (e.g., substantially circular), the planar shape of the first flat portion M1 (e.g., substantially planar) can also be circular (e.g., substantially circular).

[0117] The first inclined portion N1 may be around the outer portion of the first flat portion M1 (e.g., surrounding the outer portion of the first flat portion M1). The first inclined portion N1 may be between the first flat portion M1 and the second flat portion M2.

[0118] The first tilted portion N1 can be a region where the tilt angle of the pixel electrode 131 is a second angle or greater. The second angle can be an angle greater than the first angle. The second angle can be approximately 15°.

[0119] Because a second angle or greater tilt is formed or provided in the pixel electrode 131, the first tilted portion N1 can be the light generated in the light-emitting layer 132 in the display device 10 (see [link]). Figure 1 The area emitted from the side direction of ).

[0120] The planar shape (e.g., substantially planar shape) of the first inclined portion N1 can be an annular shape (e.g., substantially annular shape) or a circle shape with a hollow center (e.g., substantially a circle shape), like a donut. The planar area of ​​the first inclined portion N1 can be the first luminous region EA1 ( Figure 12 The area of ​​the opening (H0) is approximately 70% to approximately 80% of the plane area.

[0121] The second flat portion M2 may be around the outer portion of the first inclined portion N1 (e.g., surrounding the outer portion of the first inclined portion N1). The second flat portion M2 may be a region in which the pixel electrode 131 is flat (e.g., substantially flat) or the tilt of the pixel electrode 131 is less than the first angle. For example, the second flat portion M2 may be a region in which the pixel electrode 131 is flat or nearly flat (e.g., substantially flat).

[0122] Since the second flat portion M2 is the region in which the pixel electrode 131 is flat or nearly flat (e.g., substantially flat), the second flat portion M2 can be the region in which light generated in the light-emitting layer 132 is emitted in the frontal direction.

[0123] The planar shape (e.g., substantially planar) of the second flat portion M2 can be an annular shape (e.g., substantially annular) or a circle shape with a hollow center (e.g., substantially a circle), like a donut. The width a2 of the second flat portion M2 can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). In one or more embodiments, the width a2 of the second flat portion M2 can be less than the width a1 of the first inclined portion N1. The minimum value of the width a2 of the second flat portion M2 can be about 0.5 μm. In an embodiment, one end of the second flat portion M2 is connected to the second point P2 (see...). Figure 5 The maximum length between them is approximately 0.5 μm to approximately 1.5 μm.

[0124] The first flat portion M1 and the second flat portion M2 may be spaced apart and / or separated from each other (e.g., spaced apart or separated), and the first inclined portion N1 may be between the first flat portion M1 and the second flat portion M2.

[0125] If (for example, when) the first flat portion M1 is formed or provided in a circular shape (e.g., substantially circular), then the maximum length D2 of the first flat portion M1 in the first direction (X-axis direction) can be equal to the maximum length of the first flat portion M1 in the second direction (Y-axis direction). If (for example, when) the first inclined portion N1 is formed or provided in a ring shape (e.g., substantially ring-shaped), then the width a1 of the first inclined portion N1 in the first direction (X-axis direction) (i.e., the width a1 of the first inclined portion N1) can be formed or provided to be substantially the same as the width of the first inclined portion N1 in the second direction (Y-axis direction). If (for example, when) the second flat portion M2 is formed or provided in a ring shape (e.g., substantially ring-shaped), then the width a2 of the second flat portion M2 in the first direction (X-axis direction) (i.e., the width a2 of the second flat portion M2) can be formed or provided to be substantially the same as the width of the second flat portion M2 in the second direction (Y-axis direction).

[0126] The maximum length D2 of the first flat portion M1 in the first direction (X-axis direction) can be less than the width a1 of the first inclined portion N1 in the first direction (X-axis direction). The maximum length of the first flat portion M1 in the second direction (Y-axis direction) can be greater than the maximum length of the first inclined portion N1 in the second direction (Y-axis direction).

[0127] The width a1 of the first inclined portion N1 in the first direction (X-axis direction) can be greater than the width a2 of the second flat portion M2 in the first direction (X-axis direction). The maximum length of the first inclined portion N1 in the second direction (Y-axis direction) can be greater than the maximum length of the second flat portion M2 in the second direction (Y-axis direction).

[0128] Figure 4 It shows along Figure 3 A cross-sectional view of the section cut by line P-P'.

[0129] Reference Figure 4 The display panel 100 may include a substrate 101 and a thin film transistor layer 110, a light-emitting element layer 130 and a thin film encapsulation layer 140 on the substrate 101.

[0130] The substrate 101 may be made of an insulating (e.g., electrically insulating) material such as glass, quartz, and / or polymer resin. In one or more embodiments, the substrate 101 may also include a metallic material. The substrate 101 may be a rigid substrate or a flexible substrate that can be bent, folded, and / or rolled up. If, for example, the substrate 101 is a flexible substrate, the substrate 101 may be made of polyimide (PI), but embodiments of this disclosure are not limited thereto.

[0131] The thin film transistor layer 110 may be on the substrate 101. The thin film transistor layer 110 may include thin film transistors TR for each pixel PX (see Figure 2 ), a first connection electrode 125, a second connection electrode 127, and a plurality of insulating (e.g., electrically insulating) films.

[0132] The buffer film BF may be on the substrate 101. The buffer film BF may include a plurality of inorganic films stacked alternately. For example, the buffer film BF may be formed or provided as a plurality of films (e.g., a multilayer film) in which one or more inorganic films such as a silicon nitride film, a silicon oxynitride film, a silicon oxide film, a titanium oxide film, and an aluminum oxide film are stacked alternately.

[0133] The active layer of each of the thin film transistors TR may be on the buffer film BF. The active layer may include a channel CH, a source electrode SR, and a drain electrode DR.

[0134] The gate insulating film 111 may be on the active layer. The gate insulating film 111 may be formed or provided as an inorganic insulating (e.g., electrically insulating) film, such as a silicon nitride (e.g., Si3N4) film, a silicon oxide (e.g., SiO X , where 0 < X ≤ 2; e.g., SiO2) film, a silicon oxynitride film (or silicon nitride oxide (e.g., Si2N2O or SiO X N Y , where 0 < X ≤ 2 and 0 ≤ Y ≤ 2) film), a titanium oxide (e.g., TiO x , where 0 < X ≤ 2; e.g., TiO2) film, and / or an aluminum oxide (e.g., Al2O3) film.

[0135] The first gate metal layer may be on the gate insulating film 111. The first gate metal layer may include a gate electrode GT. The gate electrode GT may overlap the channel CH in the third direction (Z-axis direction) as the thickness direction. The first gate metal layer may be a single layer or a multilayer made of any one selected from molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or their (e.g., any suitable) alloy.

[0136] The interlayer insulating film 113 may be on the first gate metal layer. The interlayer insulating film 113 may be formed or provided as an inorganic insulating (e.g., electrically insulating) film, such as a silicon nitride (e.g., Si3N4) film, a silicon oxide (e.g., SiO X , where 0 < X ≤ 2; e.g., SiO2) film, a silicon oxynitride film (or silicon nitride oxide (e.g., Si2N2O or SiO X N Y , where 0 < X ≤ 2 and 0 ≤ Y ≤ 2) film), a titanium oxide (e.g., TiO x, where 0 < X ≤ 2; for example, a TiO2 film and / or an alumina (e.g., Al2O3) film.

[0137] The first source metal layer may be on the interlayer insulating film 113. The first source metal layer may include a first connection electrode 125. The first connection electrode 125 may be connected to the drain electrode DR of the transistor TR through a fourth contact hole CNT4 that passes through the gate insulating film 111 and the interlayer insulating film 113. The first source metal layer may be formed or provided as a single-layer or multi-layer made of any one selected from molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or their (e.g., any suitable) alloy.

[0138] The protective layer 119 may be on the first source metal layer. The protective layer 119 may be formed or provided as an organic insulating (e.g., electrically insulating) film made of acrylic resin, epoxy resin, phenolic resin, polyamide resin, and / or polyimide resin. In one or more embodiments, the plurality of insulating (e.g., electrically insulating) films may further include a planarization film 120 on the protective layer 119. The planarization film 120 may include a first planarization film 121, a second planarization film 122, and a third planarization film 123. In practice, the planarization film 120 may include a first flat portion M1 (see Figure 3 ) and a second flat portion M2 (see Figure 3 ) and a first inclined portion N1 between the first flat portion M1 and the second flat portion M2 (see Figure 3 ). A more detailed description of the planarization film 120 will be provided herein with reference to Figure 5 .

[0139] The second source metal layer may be on the protective layer 119. The second source metal layer may include a second connection electrode 127. The second connection electrode 127 may be connected to the first connection electrode 125 through a third contact hole CNT3 that passes through the protective layer 119. The second source metal layer may be formed or provided as a single-layer or multi-layer made of any one selected from molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or their (e.g., any suitable) alloy.

[0140] The first planarization film 121 may be on the second source metal layer. The first planarization film 121 may be formed or provided as an organic insulating (e.g., electrically insulating) film made of acrylic resin, epoxy resin, phenolic resin, polyamide resin, and / or polyimide resin.

[0141] The third source metal layer may be on the first planarization film 121. The third source metal layer may include a third connection electrode 129. The third connection electrode 129 may be connected to the second connection electrode 127 through a second contact hole CNT2 passing through the first planarization film 121. The third source metal layer may be a single layer or multiple layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu) or their (e.g., any suitable) alloys.

[0142] The second planarization film 122 may be on the third source metal layer. The second planarization film 122 may be formed or provided as an organic insulating (e.g., electrically insulating) film made of acrylic resin, epoxy resin, phenolic resin, polyamide resin and / or polyimide resin.

[0143] The third planarization film 123 may be on the second planarization film 122. The third planarization film 123 may be formed or provided as an organic insulating (e.g., electrically insulating) film made of acrylic resin, epoxy resin, phenolic resin, polyamide resin and / or polyimide resin.

[0144] The light-emitting element layer 130 may be on the planarization film 120. The light-emitting element layer 130 may include a pixel electrode 131, a light-emitting layer 132, a common electrode 133, and a pixel defining film 135.

[0145] For example, the pixel electrode layer may be on the third planarization film 123. The pixel electrode layer may include a pixel electrode 131. The pixel electrode 131 may be connected to the third connection electrode 129 through a first contact hole CNT1 passing through the second planarization film 122 and the third planarization film 123. In a top-emitting structure that emits light in the direction of the common electrode 133 based on the light-emitting layer 132, the pixel electrode 131 may be formed or provided as a monolayer made of molybdenum (Mo), titanium (Ti), copper (Cu), aluminum (Al), or alloys thereof (e.g., any suitable alloy), or formed or provided as a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum and ITO (ITO / Al / ITO), an APC alloy, or a stacked structure of APC alloy and ITO (ITO / APC / ITO) to increase or enhance reflectivity. The APC alloy may be an alloy of silver (Ag), palladium (Pd), and copper (Cu).

[0146] The pixel defining film 135 may be on a portion of the pixel electrode 131. The pixel defining film 135 may be used to define the light-emitting regions EA1, EA2, and EA3 of the pixel PX (see [link to documentation]). Figure 2The pixel defining film 135 may be formed or provided to expose a portion of the pixel electrode 131 on the third planarization film 123. The pixel defining film 135 may cover the edges of the pixel electrode 131. The pixel defining film 135 may be formed or provided as an organic film made of acrylic resin, epoxy resin, phenolic resin, polyamide resin and / or polyimide resin.

[0147] A light-emitting layer 132 may be located on the pixel electrode 131. The light-emitting layer 132 may be an organic light-emitting layer comprising organic materials. In this case, the light-emitting layer 132 may include a hole transport layer, an organic light-emitting layer, and an electron transport layer. If (for example, when) a set or predetermined voltage is applied to the pixel electrode 131 through the thin-film transistor TR of the thin-film transistor layer 110 and a cathode voltage is applied to the common electrode 133, holes and electrons can move to the organic light-emitting layer through the hole transport layer and the electron transport layer, respectively, and can recombine with each other in the organic light-emitting layer to emit light. The pixel PX, including the light-emitting element layer 130, may be located in the display area DA (see [link to relevant documentation]). Figure 1 )middle.

[0148] The common electrode 133 can be on the pixel defining film 135 and the light-emitting layer 132. The common electrode 133 can be formed or provided to cover the light-emitting layer 132. The common electrode 133 can be a common layer that is commonly formed or provided in the light-emitting regions EA1, EA2 and EA3.

[0149] The thin-film encapsulation layer 140 may be on the light-emitting element layer 130. The thin-film encapsulation layer 140 may include a first inorganic encapsulation layer 141 and a second inorganic encapsulation layer 143 for preventing oxygen and / or moisture from penetrating into the light-emitting element layer 130 (or reducing the degree or occurrence of oxygen and / or moisture penetration into the light-emitting element layer 130). The first inorganic encapsulation layer 141 and the second inorganic encapsulation layer 143 may be silicon nitride layers, silicon oxynitride layers, silicon oxide layers, titanium oxide layers, and / or aluminum oxide layers, but the embodiments of this disclosure are not limited thereto.

[0150] In one or more embodiments, the thin-film encapsulation layer 140 may further include a first organic encapsulation layer 142 for protecting the light-emitting element layer 130 from foreign matter (such as dust). The first organic encapsulation layer 142 may be located between a first inorganic encapsulation layer 141 and a second inorganic encapsulation layer 143. The first organic encapsulation layer 142 may be made of acrylic resin, epoxy resin, phenolic resin, polyamide resin and / or polyimide resin, but embodiments of this disclosure are not limited thereto.

[0151] Thin-film encapsulation layer 140 may (e.g., simultaneously) be applied to the display area DA and the non-display area NDA (see... Figure 1(One of the two.) For example, the thin-film encapsulation layer 140 may be arranged or provided as a light-emitting element layer 130 covering the display area DA and the non-display area NDA and a thin-film transistor layer 110 covering the non-display area NDA.

[0152] Figure 5 yes Figure 4 Enlarged cross-sectional view of part B.

[0153] Reference Figure 5 In the first flattened portion M1 and the second flattened portion M2, the upper surface of the planarization film 120 may be flat (e.g., substantially flat), or the inclination of the upper surface of the planarization film 120 may be less than a first angle. For example, the first angle may be about 3°. If (e.g., when) the inclination of the upper surface of the planarization film 120 is less than about 3°, then the upper surface of the planarization film 120 may be considered almost flat (e.g., substantially flat) without any inclination. The upper surface of the planarization film 120 refers to the upper surface of the third planarization film 123.

[0154] In the first inclined portion N1, the inclination of the upper surface of the planarization film 120 can be a first angle or greater. If (for example, when) the inclination of the upper surface of the planarization film 120 is about 3° or greater, the upper surface of the planarization film 120 can be considered to have a set or predetermined inclination.

[0155] Planarization film 120 may include a first planarization film 121, a second planarization film 122, and a third planarization film 123. The first planarization film 121 may be in the protective layer 119 (see...). Figure 4 The upper surface of the first planarization film 121 may be formed or provided as flat (e.g., substantially flat).

[0156] The second planarization film 122 may be on the first planarization film 121. The second planarization film 122 may include a first hole H1 passing through the second planarization film 122. The central portion of the first hole H1 may overlap with the first planar portion M1, and the edge portion of the first hole H1 may overlap with the first inclined portion N1.

[0157] The third planarization film 123 may be on the second planarization film 122. The third planarization film 123 may be on the first planarization film 121 exposed in the first hole H1.

[0158] Because the third planarization film 123 includes organic materials and has fluidity before curing, the second thickness t2 of the third planarization film 123 can have a maximum value in the first hole H1.

[0159] In the first planarized portion M1, the upper surface of the third planarization film 123 is parallel (e.g., substantially parallel) to the substrate 101 (see [reference]). Figure 4 An extension line extending from one surface of the third planarization film 123 can be defined as a first extension line m1. Similarly, an extension line extending from the upper surface of the third planarization film 123 in the second planarization portion M2, parallel to (e.g., substantially parallel to) the substrate 101, can be defined as a second extension line m2. If (e.g., when) the point where the first inclined portion N1 intersects (e.g., intersects) the first extension line m1 is called the first point P1 and the point where the first inclined portion N1 intersects (e.g., intersects) the second extension line m2 is called the second point P2, then the line connecting the first point P1 and the second point P2 can be defined as a first inclined line n1. In one or more embodiments, in order to give the pixel electrode 131 a second angle or greater in the first inclined portion N1, the first tilt angle θ1 between the first extension line m1 and the first inclined line n1 can be from about 15° to about 35°.

[0160] If (for example, when) the first extension line m1 and the first tilt line n1 have a first tilt angle θ1, then the light emitted from the first tilted portion N1 can be displayed on the display device 10 (see...). Figure 1 It moves along the side. Therefore, the display panel 100 can be adjusted according to the first tilt angle θ1 (see...). Figure 4 The brightness and color difference for each viewing angle. In one or more embodiments, brightness for each viewing angle refers to the brightness value relative to the angle relative to the front of the display device 10. Color difference for each viewing angle refers to the degree of color distortion relative to the angle relative to the front of the display device 10. In this case, the viewing angle is the angle at which a user views the display device. If (for example, when) the viewer looks directly at the display device, the viewing angle is 0 degrees, and the viewing angle can increase as the viewer tilts their head to view the display device.

[0161] If (for example, when) the first tilt angle θ1 is less than about 15°, the brightness may be reduced if (for example, when) the image of the display device 10 is viewed from the side of the display device 10, compared to if (for example, when) the image of the display device 10 is viewed from the front of the display device 10.

[0162] In one or more embodiments, if (e.g., when) the first tilt angle θ1 is less than about 15°, the upper surface of the pixel electrode 131 can be guided almost toward the upper surface of the display device 10. In the process where light emitted from the light-emitting layer 132 passes through components such as the thin-film encapsulation layer 140 and is refracted, due to the difference in refractive index according to the wavelength of the light, the longer wavelength light of the white light emitted from the display device 10 can be guided in a third direction (Z-axis direction), and the shorter wavelength light of the white light can be guided in a direction that intersects (e.g., crosses) the third direction (Z-axis direction). Therefore, compared to if (e.g., when) the white image of the display device 10 is viewed from the front of the display device 10, if (e.g., when) the white image of the display device 10 is viewed from the side of the display device 10, the white image of the display device 10 may appear somewhat or substantially blue.

[0163] If (for example, when) the first tilt angle θ1 is between approximately 15° and approximately 35°, the longer wavelength portion of the light emitted from the first tilt portion N1 can travel in a direction that intersects (e.g., crosses) the third direction (Z-axis direction). Therefore, the phenomenon that the white image appears somewhat or essentially blue when viewed from the side of the display device 10 can be reduced.

[0164] In contrast, if (for example, when) the first tilt angle θ1 exceeds about 35°, a phenomenon may occur where light is trapped between the pixel electrode 131 and the common electrode 133 and not emitted. In this case, because the generated light may not be emitted, the brightness at both the front and sides of the display device may be reduced (e.g., simultaneously). Therefore, according to this disclosure, by forming or providing the first tilt angle θ1 to about 15° to about 35°, if (for example, when) viewed from the side, the brightness and color difference for each viewing angle can be improved or enhanced, while minimizing or reducing the reduction in frontal efficiency.

[0165] Therefore, the first thickness t1 of the second planarization film 122 and the second thickness t2 of the third planarization film 123 can be predetermined (e.g., set or scheduled) to values ​​that satisfy the range of the first tilt angle θ1. For example, the first thickness t1 can be formed or provided to be from about 1.5 μm to about 3.0 μm, and the second thickness t2 can be formed or provided to be from about 0.4 μm to about 1.5 μm. However, the values ​​of the first thickness t1 and the second thickness t2 can vary depending on the maximum length h1 of the first aperture H1 in the first direction (X-axis direction) and the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). In an embodiment, the thickness of the planarization film 120 in the first tilted portion N1 can decrease from the second planar portion M2 to the first planar portion M1. In this disclosure, by way of example, the case where the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction) is from about 17 μm to about 19 μm will be described in more detail.

[0166] The first planarization film 121, the second planarization film 122, and the third planarization film 123 may be made of substantially the same material. For example, the first planarization film 121, the second planarization film 122, and the third planarization film 123 may be made of photoresist and / or polyimide, but the embodiments in this specification are not limited thereto.

[0167] Figure 6 This is a flowchart illustrating a method of manufacturing a display device (or a method of manufacturing a display device) according to one or more embodiments of the present disclosure, and Figures 7 to 15 To show in more detail Figure 6 A view of a method for manufacturing a display device (or a method for manufacturing a display device).

[0168] In the following text, reference will be made to Figures 4 to 15 A method of manufacturing a display device (or a method of manufacturing a display device) according to one or more embodiments of the present disclosure is described in more detail.

[0169] First, multiple thin-film transistors TR can be formed or provided on the substrate 101. Figure 6 (S110 in the example). Next, a first planarization film 121 can be formed or provided on the thin-film transistor TR. Figure 6 (S120 in the first planarization film). Next, a second planarization film 122 having a first pore H1 can be formed or provided on the first planarization film 121. Figure 6 (S130 in the middle).

[0170] For example, a buffer film BF can be formed or provided on the substrate 101, an active layer can be formed or provided on the substrate 101 by photolithography, and a gate insulating film 111 can be formed or provided on the substrate 101 and the active layer. Next, a gate electrode GT can be formed or provided on the gate insulating film 111 by photolithography, and an interlayer insulating film 113 can be formed or provided on the gate insulating film 111 and the gate electrode GT.

[0171] Next, a first connection electrode 125, passing through the gate insulating film 111 and the interlayer insulating film 113 and connected to the active layer, can be formed or provided by photolithography. A protective layer 119 can be formed or provided on the interlayer insulating film 113 and the first connection electrode 125. Next, a second connection electrode 127 can be formed or provided on the protective layer 119 by photolithography. A first planarization film 121 can be formed or provided on the protective layer 119 and the second connection electrode 127.

[0172] Next, a third connecting electrode 129 can be formed or provided on the first planarization film 121 by photolithography, and a second planarization film 122 can be formed or provided on the first planarization film 121 and the third connecting electrode 129.

[0173] Reference Figures 7 to 9 A second planarization film 122 having a first coating thickness t10 can be formed or provided on the first planarization film 121. In one or more embodiments, the first coating thickness t10 can be greater than that of the first planarization film 121. Figure 5 The first thickness t1 is a large value. Because the second planarization film 122 is made of an organic material, the thickness of the second planarization film 122 can be reduced by about 50% to about 70% during the curing of the second planarization film 122. Therefore, the first thickness t1 can have a value of about 50% to about 70% of the first coating thickness t10. Next, the first hole H1 can be formed or provided by exposing the second planarization film 122 exposed by the first opening OA1 using a first mask MSK1 having a first opening OA1 and developing the exposed second planarization film 122. In one or more embodiments, because the second planarization film 122 is an organic film, a tilted surface can be formed or provided around (or around) the first hole H1 of the second planarization film 122. For example, because the second planarization film 122 comprises an organic material, a tilted surface with a continuously (e.g., substantially continuously) varying tilt can be formed or provided around (or around) the first hole H1.

[0174] If exposure is performed on the second planarization film 122, the second planarization film 122 can be separated from the focal point of the light output from the exposure apparatus (e.g., spaced apart or separated) to expose the second planarization film 122 to about 25 μm to about 50 μm. Compared to if the second planarization film 122 is at the focal point of the light output from the exposure apparatus, if the second planarization film 122 is separated from the focal point (e.g., spaced apart or separated), the range of light exposed to the second planarization film 122 from the exposure apparatus can be increased. This allows for an increase in the area of ​​the inclined surface of the second planarization film 122.

[0175] Next, a third planarization film 123 can be formed or provided on the first planarization film 121 exposed in the second planarization film 122 and the first hole H1. Figure 6 (S140 in the middle).

[0176] Reference Figure 5 , Figure 9 and Figure 10 A third planarization film 123 can be formed or provided on the first planarization film 121 exposed in the second planarization film 122 and the first hole H1. For substantially the same reasons as the second planarization film 122, the coating thickness of the third planarization film 123 can be greater than the second thickness t2. The thickness of the third planarization film 123 can be determined (e.g., set or predetermined) according to the size of the first hole H1. For example, if (e.g., when) the maximum length h1 of the first hole H1 in the first direction (X-axis direction) is the opening H0 (see... Figure 12 If the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction) is about 30% to about 50% of the maximum length D1 of the first light-emitting region EA1 in the first direction, then the second thickness t2 of the third planarization film 123 can be about 0.4 μm to about 1.0 μm. As another example, if (for example, when) the maximum length h1 of the first aperture H1 in the first direction (X-axis direction) is about 50% to about 70% of the maximum length D1 of the opening H0 in the first direction (X-axis direction), then the second thickness t2 of the third planarization film 123 can be about 0.8 μm to about 1.5 μm.

[0177] In this case, because the third planarization film 123 is an organic film, it can be fluid before curing and therefore can flow toward the first hole H1. Thus, the inclined portion of the third planarization film 123 can be formed or provided with a gentler inclination than the inclined surface around the first hole H1 of the second planarization film 122 (e.g., around the first hole H1 of the second planarization film 122). Depending on the flow of the third planarization film 123, the maximum length D2 of the first planar portion M1 in the first direction (X-axis direction) can be formed or provided to be less than the maximum length h1 of the first hole H1 in the first direction (X-axis direction).

[0178] Next, pixel electrodes 131 can be formed or provided on the first flat portion M1, the first inclined portion N1, and the second flat portion M2. Figure 6 (S150 in the middle).

[0179] Reference Figure 5 and Figure 11 Pixel electrodes 131 can be formed or provided on the third planarization film 123. In this case, such as Figure 4 As described, one side of the pixel electrode 131 may protrude beyond the second flat portion M2, and the other side of the pixel electrode 131 may extend to the first contact hole CNT1 and be electrically connected to the thin-film transistor TR.

[0180] Next, a pixel-defining film 135, including an opening that exposes a portion of the pixel electrode 131, may be formed or provided on the pixel electrode 131. Figure 6 (S160 in the middle).

[0181] Reference Figure 12 A pixel defining film 135, including an opening H0 that exposes a portion of the pixel electrode 131, may be formed or provided on the pixel electrode 131. When the pixel defining film 135 is formed or provided, the second flat portion M2 of the third planarization film 123 may be defined with the interior of the opening H0 as its boundary.

[0182] Next, a light-emitting layer 132 can be formed or provided on the pixel electrode 131 in the opening H0. Figure 6 (S170 in the middle).

[0183] Reference Figure 13 It can be found at opening H0 (see Figure 12A light-emitting layer 132 is formed or provided on the pixel electrode 131. The light-emitting layer 132 may be formed or provided in a curved shape, wherein the distance from the substrate 101 to the center portion 132a of the light-emitting layer 132 is shorter than the distance from the substrate 101 to the edge 132b of the light-emitting layer 132, and an inclined surface is formed or provided between the center portion 132a and the edge 132b of the light-emitting layer 132 to correspond to the shape of the pixel electrode 131.

[0184] Next, a common electrode 133 can be formed or provided on the light-emitting layer 132 and the pixel defining film 135. Figure 6 (S180 in the middle).

[0185] Reference Figure 14 A common electrode 133 may be formed or provided on the light-emitting layer 132 and the pixel defining film 135. The common electrode 133 may be formed or provided in a curved shape, wherein the distance from the substrate 101 to the center portion 133a of the common electrode 133 is shorter than the distance from the substrate 101 to the edge 133b of the common electrode 133, and an inclined surface is formed or provided between the center portion 133a and the edge 133b of the common electrode 133 to correspond to the shape of the light-emitting layer 132.

[0186] Next, refer to Figure 15 A first inorganic encapsulation layer 141, a first organic encapsulation layer 142, and a second inorganic encapsulation layer 143 may be sequentially formed or provided on the common electrode 133. The first inorganic encapsulation layer 141 may be formed or provided in a curved shape, wherein the distance from the substrate 101 to the center portion of the first inorganic encapsulation layer 141 is shorter than the distance from the substrate 101 to the edge of the first inorganic encapsulation layer 141, and an inclined surface is formed or provided between the center portion and the edge of the first inorganic encapsulation layer 141 to correspond to the shape of the common electrode 133.

[0187] In one or more embodiments, the lower surface of the first organic encapsulation layer 142 may be formed or provided in a curved shape, wherein the distance from the substrate 101 to the center portion of the lower surface of the first organic encapsulation layer 142 is shorter than the distance from the substrate 101 to the edge of the lower surface of the first organic encapsulation layer 142, and an inclined surface is formed or provided between the center portion and the edge of the lower surface of the first organic encapsulation layer 142 to correspond to the shape of the first inorganic encapsulation layer 141. The second inorganic encapsulation layer 143 may be formed or provided in a flat shape (e.g., substantially flat shape) like the upper surface of the first organic encapsulation layer 142.

[0188] A display device manufactured according to one or more embodiments of the present disclosure using a method of manufacturing a display device (or a method of manufacturing a display device) can be used to emit light from both the flat portions M1 and M2 and the tilted portion N1 of the light-emitting layer 132 (e.g., simultaneously). Therefore, if the display device is viewed from the front (e.g., when viewed from the front), the reduction in frontal efficiency can be minimized or reduced because the long-wavelength light emitted from the flat portions M1 and M2 and the short-wavelength light emitted from the tilted portion N1 are mixed. In one or more embodiments, if the display device is viewed from the side (e.g., when viewed from the side), the phenomenon of color distortion and reduced brightness compared to viewing from the front can be improved or enhanced because the short-wavelength light emitted from the flat portions M1 and M2, the short-wavelength light emitted from one tilted portion N1, and the long-wavelength light emitted from the other tilted portion N1 are mixed.

[0189] In the following text, reference will be made to Figures 16 to 26 A display device and a method of manufacturing the same according to one or more embodiments of the present disclosure will be described in more detail. Any content that overlaps with one or more embodiments as described herein may be omitted or may be briefly described, and the differences will be primarily described.

[0190] Figure 16 It is shown Figure 2 An enlarged layout diagram of another example of the pixel electrode of the first light-emitting region EA1.

[0191] Reference Figure 16 The first light-emitting region EA1 may include a third flat portion M3, a second inclined portion N2, a fourth flat portion M4, a third inclined portion N3, and a fifth flat portion M5.

[0192] The third flat portion M3 may be located at the center of the first light-emitting region EA1. The third flat portion M3 may be a region where the pixel electrode 131 is flat (e.g., substantially flat) or where the tilt angle of the pixel electrode 131 is less than a first angle. The first angle may be approximately 3°. For example, the third flat portion M3 may be a region where the pixel electrode 131 is flat or nearly flat (e.g., substantially flat). Therefore, in the light-emitting layer 132 of the third flat portion M3 (see...) Figure 17 The light generated in the display device 10 (see) Figure 1 It is launched from the front direction.

[0193] The planar shape (e.g., substantially planar shape) of the third flat portion M3 can follow the planar shape (e.g., substantially planar shape) of the first light-emitting region EA1. If (e.g., when) the first light-emitting region EA1 has such... Figure 16When the planar shape shown is circular (e.g., substantially circular), the planar shape of the third flat portion M3 (e.g., substantially planar) can also be circular (e.g., substantially circular). The maximum length D4 of the third flat portion M3 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). For example, the maximum length D4 of the third flat portion M3 in the first direction (X-axis direction) can be about 20% to about 40% of the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction).

[0194] The second inclined portion N2 may be around the outer portion of the third flat portion M3 (e.g., surrounding the outer portion of the third flat portion M3). The second inclined portion N2 may be between the third flat portion M3 and the fourth flat portion M4.

[0195] The second tilted portion N2 can be a region where the tilt of the pixel electrode 131 is a second angle or greater. The second angle can be an angle greater than the first angle. The second angle can be approximately 15°.

[0196] Because a second angle or greater tilt is formed or provided in the pixel electrode 131, the second tilted portion N2 can be the area in which light generated in the light-emitting layer 132 is emitted in the lateral direction of the display device 10.

[0197] The planar shape (e.g., substantially planar) of the second inclined portion N2 can be an annular shape (e.g., substantially annular) or a circle shape with a hollow center (e.g., substantially a circle), like a donut. The width a3 of the second inclined portion N2 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). The planar area of ​​the second inclined portion N2 can be from about 10% to about 45% of the planar area of ​​the first light-emitting region EA1. In an embodiment, the thickness of the second inclined portion N2 can be from about 1.0 μm to about 2.5 μm.

[0198] The fourth flat portion M4 may be located around the outer portion of the second inclined portion N2 (e.g., surrounding the outer portion of the second inclined portion N2). The fourth flat portion M4 may be a region in which the pixel electrode 131 is flat (e.g., substantially flat) or the tilt angle of the pixel electrode 131 is less than the first angle. For example, the fourth flat portion M4 may be a region in which the pixel electrode 131 is flat or nearly flat (e.g., substantially flat). Therefore, the light generated in the light-emitting layer 132 of the fourth flat portion M4 can be emitted in the front direction of the display device 10.

[0199] The planar shape (e.g., substantially planar) of the fourth flat portion M4 can be an annular shape (e.g., substantially annular) or a circle shape with a hollow center (e.g., substantially a circle), like a donut. The width a4 of the fourth flat portion M4 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). In one or more embodiments, the fourth flat portion M4 may not be provided. In embodiments, the planar area of ​​the fourth flat portion M4 is equal to the area of ​​the first light-emitting region EA1 (i.e., Figure 23 The planar area of ​​the opening H0 described herein is approximately 10% to approximately 25%.

[0200] The third inclined portion N3 may be around the outer portion of the fourth flat portion M4 (e.g., surrounding the outer portion of the fourth flat portion M4). The third inclined portion N3 may be between the fourth flat portion M4 and the fifth flat portion M5.

[0201] The third tilted portion N3 can be a region in which the tilt angle of the pixel electrode 131 is a second angle or greater. Therefore, the light generated in the light-emitting layer 132 of the third tilted portion N3 can be emitted in the lateral direction of the display device 10.

[0202] The planar shape (e.g., substantially planar) of the third inclined portion N3 can be an annular shape (e.g., substantially annular) or a circle shape with a hollow center (e.g., substantially a circle), like a donut. The width a5 of the third inclined portion N3 in the first direction (X-axis direction) can be less than or equal to the width a3 of the second inclined portion N2 in the first direction (X-axis direction). The planar area of ​​the third inclined portion N3 can be about 10% to about 25% of the planar area of ​​the first light-emitting region EA1. In an embodiment, the thickness of the third inclined portion N3 can be about 0.4 μm to about 1.5 μm.

[0203] The fifth flat portion M5 may be located around the outer portion of the third inclined portion N3 (e.g., surrounding the outer portion of the third inclined portion N3). The fifth flat portion M5 may be a region in which the pixel electrode 131 is flat (e.g., substantially flat) or the tilt angle of the pixel electrode 131 is less than the first angle. Therefore, the light generated in the light-emitting layer 132 of the fifth flat portion M5 may be emitted in the front direction of the display device 10.

[0204] The planar shape (e.g., substantially planar) of the fifth flat portion M5 can be an annular shape (e.g., substantially annular) or a circle shape with a hollow center (e.g., substantially a circle), like a donut. The width a6 of the fifth flat portion M5 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). In one or more embodiments, the minimum value of the width a6 of the fifth flat portion M5 in the first direction (X-axis direction) can be about 0.5 μm.

[0205] Figure 17 It shows along Figure 16 A cross-sectional view of the section intercepted by line Q-Q'.

[0206] Reference Figure 17 The display panel 100 may include a substrate 101 and a thin-film transistor layer 110, a light-emitting element layer 130, and a thin-film encapsulation layer 140 on the substrate 101. Since the remaining portions of the assembly, except for the planarization film 120 of the thin-film transistor layer 110, can be formed or provided in substantially the same manner as described in one or more embodiments, their description may be omitted.

[0207] The planarization film 120 may include a first planarization film 121, a second planarization film 122, and a third planarization film 123. In one or more embodiments, the second planarization film 122 may include a second aperture (…). Figure 18 The second pore H2 in the middle), and the third planarization film 123 may include a third pore ( Figure 18 The third hole H3 in the middle). This article will refer to Figure 18 A more detailed description of planarization film 120 is provided.

[0208] Figure 18 yes Figure 17 Enlarged cross-sectional view of part C.

[0209] Reference Figure 18 In the third flattened portion M3, the fourth flattened portion M4, and the fifth flattened portion M5, the upper surface of the planarization film 120 may be flat (e.g., substantially flat), or the inclination of the upper surface of the planarization film 120 may be less than a first angle. For example, the first angle may be about 3°. If (e.g., when) the inclination of the upper surface of the planarization film 120 is less than about 3°, then the upper surface of the planarization film 120 may be considered almost flat (e.g., substantially flat) without any inclination. The upper surface of the planarization film 120 refers to the upper surface of the third planarization film 123, the portion of the upper surface of the second planarization film 122 that does not overlap with the third planarization film 123, and the portion of the upper surface of the first planarization film 121 that does not overlap with the second planarization film 122.

[0210] In the second inclined portion N2, the inclination of the upper surface of the planarization film 120 can be a first angle or greater. If (for example, when) the inclination of the upper surface of the planarization film 120 is about 3° or greater, the upper surface of the planarization film 120 can be considered to have a set or predetermined inclination.

[0211] Planarization film 120 may include a first planarization film 121, a second planarization film 122, and a third planarization film 123. The first planarization film 121 may be in the protective layer 119 (see...). Figure 17 The upper surface of the first planarization film 121 may be formed or provided as flat (e.g., substantially flat).

[0212] The second planarization film 122 may be on the first planarization film 121. The second planarization film 122 may include a second hole H2 passing through the second planarization film 122. The second hole H2 may overlap with the third planarization portion M3.

[0213] The third planarization film 123 may be on the second planarization film 122. The third planarization film 123 may include a third hole H3 passing through the third planarization film 123. The third hole H3 may overlap with the third planar portion M3, the second inclined portion N2, and the fourth planar portion M4. The size of the third hole H3 may be larger than the size of the second hole H2, and the opening H0 (see...) Figure 23 The size of the first hole (H2) can be larger than the size of the third hole (H3). The second hole (H2) and the third hole (H3) can overlap with the opening (H0).

[0214] In the third planarization portion M3, an extension line extending parallel (e.g., substantially parallel) to a surface of the substrate 101 on the upper surface of the first planarization film 121 can be defined as the third extension line m3. Similarly, in the fourth planarization portion M4, an extension line extending parallel (e.g., substantially parallel) to a surface of the substrate 101 on the upper surface of the second planarization film 122 can be defined as the fourth extension line m4. In the fifth planarization portion M5, an extension line extending parallel (e.g., substantially parallel) to a surface of the substrate 101 on the upper surface of the third planarization film 123 can be defined as the fifth extension line m5.

[0215] If, for example, the point where the second inclined portion N2 intersects (e.g., intersects) the third extension line m3 is referred to as the third point P3 and the point where the second inclined portion N2 intersects (e.g., intersects) the fourth extension line m4 is referred to as the fourth point P4, then the line connecting the third point P3 and the fourth point P4 can be defined as the second inclined line n2. In one or more embodiments, in order to give the pixel electrode 131 a second angle or greater in the second inclined portion N2, the second tilt angle θ2a between the third extension line m3 and the second inclined line n2 can be from about 15° to about 35°.

[0216] Similarly, if (for example, when) the point where the third inclined portion N3 intersects (e.g., intersects) the fourth extension m4 is referred to as the fifth point P5 and the point where the third inclined portion N3 intersects (e.g., intersects) the fifth extension m4 is referred to as the sixth point P6, then the line connecting the fifth point P5 and the sixth point P6 can be defined as the third inclined line n3. In one or more embodiments, the third inclination angle θ2b between the fourth extension m4 and the third inclined line n3 can be from about 15° to about 35°. In embodiments, the third inclination angle θ2b can be greater than the second inclination angle θ2a.

[0217] In one or more embodiments, at the edge of the first light-emitting region EA1, by forming or providing two layers of inclined surfaces, the area of ​​the flat surface (e.g., a substantially flat surface) can be reduced and the area of ​​the inclined surface can be increased. In one or more embodiments, by increasing the area of ​​the inclined surface of the light-emitting layer 132, the emission from the inclined surface of the light-emitting layer 132 toward the display device 10 (see [link to relevant documentation]) can be increased. Figure 1 The amount of light guided from the side of the display device 10. Therefore, according to this disclosure, the brightness and color difference for each viewing angle can be improved or enhanced if (e.g., when) the display device 10 is viewed from the side.

[0218] Figure 19 This is a flowchart illustrating a method of manufacturing a display device (or a method of manufacturing a display device) according to one or more embodiments of the present disclosure, and Figures 20 to 26 To show in more detail Figure 19 A view of a method for manufacturing a display device (or a method for manufacturing a display device).

[0219] In the following text, reference will be made to Figures 16 to 26 A method of manufacturing a display device according to one or more embodiments of the present disclosure (or a method of manufacturing a display device) is described in more detail. Any parts that overlap with one or more embodiments described herein may be omitted or may be briefly described, and the differences will be described primarily.

[0220] First, multiple thin-film transistors TR can be formed or provided on the substrate 101. Figure 19 (S210 in the image). Next, a first planarization film 121 can be formed or provided on the thin-film transistor TR. Figure 19 (S220 in the first planarization film). Next, a second planarization film 122 having a second pore H2 can be formed or provided on the first planarization film 121. Figure 19 (S230 in the middle).

[0221] Reference Figure 20 A second planarization film 122 having a third thickness t3 can be formed or provided on the first planarization film 121. In one or more embodiments, the third thickness t3 can be the thickness of the second planarization film 122 after curing, and can be about 1.0 μm to about 2.0 μm. The second aperture H2 can be formed or provided by exposing the second planarization film 122 using a mask with openings and developing the exposed second planarization film 122.

[0222] In this case, the maximum length D4 of the second hole H2 in the first direction (X-axis direction) can vary depending on the opening of the mask. For example, the maximum length D4 of the second hole H2 in the first direction (X-axis direction) can be the opening H0 (see...). Figure 23 The maximum length D1 in the first direction (X-axis direction) is approximately 20% to approximately 40%.

[0223] In one or more embodiments, because the second planarization film 122 is an organic film, a tilted surface with a continuously (e.g., substantially continuously) varying tilt can be formed or provided around the second pore H2 of the second planarization film 122 (e.g., around the second pore H2 of the second planarization film 122).

[0224] Next, a third planarization film 123 having a third pore H3 can be formed or provided on the first planarization film 121 exposed in the second planarization film 122 and the second pore H2. Figure 19 (S240 in the middle).

[0225] Reference Figure 21 A third planarization film 123 having a third pore H3 can be formed or provided on the first planarization film 121 exposed in the second planarization film 122 and the second pore H2. In one or more embodiments, the third planarization film 123 can be formed or provided with a fourth thickness t4. The fourth thickness t4 can be the thickness of the third planarization film 123 after curing, and can be about 1.0 μm to about 2.0 μm.

[0226] In one or more embodiments, the central portion of the third aperture H3 may overlap with the second aperture H2, and the edge of the third aperture H3 may overlap with the first planarization film 121. The third aperture H3 can be formed or provided by exposing the third planarization film 123 using a mask with an opening and developing the exposed third planarization film 123. In this case, the maximum length D5 of the third aperture H3 in the first direction (X-axis direction) can vary depending on the opening of the mask. For example, the maximum length D5 of the third aperture H3 in the first direction (X-axis direction) can be about 50% to about 70% of the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction).

[0227] In one or more embodiments, because the third planarization film 123 is an organic film, a tilted surface with a continuously (e.g., substantially continuously) varying tilt can be formed or provided around the third pore H3 of the third planarization film 123 (e.g., around the third pore H3 of the third planarization film 123).

[0228] Next, pixel electrodes 131 can be formed or provided on the third flat portion M3, the second inclined portion N2, the fourth flat portion M4, the third inclined portion N3, and the fifth flat portion M5. Figure 19 (S250 in the middle).

[0229] Reference Figure 18 and Figure 22 Pixel electrodes 131 can be formed or provided on the third flat portion M3, the second inclined portion N2, the fourth flat portion M4, the third inclined portion N3, and the fifth flat portion M5. In this case, such as Figure 17 As described, one side of the pixel electrode 131 may protrude beyond the fifth flat portion M5, and the other side of the pixel electrode 131 may extend to the first contact hole CNT1 and be electrically connected to the thin-film transistor TR.

[0230] Next, a pixel-defining film 135, including an opening H0 exposing a portion of the pixel electrode 131, may be formed or provided on the pixel electrode 131. Figure 19 (S260 in the middle).

[0231] Reference Figure 18 and Figure 23 A pixel defining film 135, including an opening H0 that exposes a portion of the pixel electrode 131, may be formed or provided on the pixel electrode 131. When the pixel defining film 135 is formed or provided, the fifth planar portion M5 of the third planarization film 123 may be defined with the interior of the opening H0 as its boundary.

[0232] Next, a light-emitting layer 132 can be formed or provided on the pixel electrode 131 in the opening H0. Figure 19(S270 in the middle).

[0233] Reference Figure 24 An emissive layer 132 may be formed or provided on the pixel electrode 131 in the opening H0. The emissive layer 132 may include a third flat portion M3, a second inclined portion N2, a fourth flat portion M4, a third inclined portion N3, and a fifth flat portion M5, so as to correspond to the shape of the pixel electrode 131.

[0234] Next, a common electrode 133 can be formed or provided on the light-emitting layer 132 and the pixel defining film 135. Figure 19 (S280 in the middle).

[0235] Reference Figure 25 A common electrode 133 may be formed or provided on the light-emitting layer 132 and the pixel defining film 135. The common electrode 133 may include a third flat portion M3, a second inclined portion N2, a fourth flat portion M4, a third inclined portion N3, and a fifth flat portion M5, so as to correspond to the shape of the light-emitting layer 132.

[0236] Next, refer to Figure 26 A first inorganic encapsulation layer 141, a first organic encapsulation layer 142, and a second inorganic encapsulation layer 143 may be sequentially formed or provided on a common electrode 133. The first inorganic encapsulation layer 141 may include a third flat portion M3, a second inclined portion N2, a fourth flat portion M4, a third inclined portion N3, and a fifth flat portion M5 to correspond to the shape of the common electrode 133. The lower surface of the first organic encapsulation layer 142 may be formed or provided to correspond to the shape of the first inorganic encapsulation layer 141. In one or more embodiments, the upper surface of the first organic encapsulation layer 142 may be formed or provided in a flat shape (e.g., substantially flat). The second inorganic encapsulation layer 143 may be formed or provided in a flat shape (e.g., substantially flat) like the upper surface of the first organic encapsulation layer 142.

[0237] The display device manufactured according to the method of manufacturing a display device (or the method of manufacturing a display device) may have a double-tilted surface formed or provided in the light-emitting layer 132, and the area of ​​the tilted surface may be increased. As a result, the amount of light emitted from the tilted surface of the light-emitting layer 132 may be increased, thereby improving the light emission from the display device 10 (see [link to display device 10]). Figure 1 The brightness ratio at the sides is improved or enhanced compared to the front view. In one or more embodiments, if the display device 10 is viewed from the side (e.g., when viewed from the side), the short-wavelength light emitted from the flat portions M3, M4 and M5 and the long-wavelength and short-wavelength light emitted from the inclined portions N2 and N3 are mixed, so the phenomenon of color distortion and reduced brightness compared to viewing from the front can be improved or enhanced.

[0238] In the following text, reference will be made to Figures 27 to 38 A display device and a method of manufacturing the display device according to one or more embodiments of the present disclosure will be described in more detail. Any content that overlaps with one or more embodiments described herein may be omitted or may be briefly described, and the differences will be primarily described.

[0239] Figure 27 It is shown Figure 2 An enlarged layout diagram of another example of the pixel electrode of the first light-emitting region EA1.

[0240] Reference Figure 27 The first light-emitting region EA1 may include a sixth flat portion M6, a fourth inclined portion N4, and a seventh flat portion M7.

[0241] The sixth flat portion M6 may be located at the center of the first light-emitting region EA1. The sixth flat portion M6 may be a region where the pixel electrode 131 is flat (e.g., substantially flat) or the tilt angle of the pixel electrode 131 is less than a first angle. The first angle may be approximately 3°. For example, the sixth flat portion M6 may be a region where the pixel electrode 131 is flat or nearly flat (e.g., substantially flat). Therefore, in the sixth flat portion M6, the light-emitting layer 132 (see...) Figure 28 The light generated in the display device 10 (see) Figure 1 It is launched from the front direction.

[0242] The planar shape (e.g., substantially planar shape) of the sixth flat portion M6 may follow the planar shape (e.g., substantially planar shape) of the first light-emitting region EA1. If (e.g., when) the first light-emitting region EA1 has such... Figure 27 When the planar shape shown is circular (e.g., substantially circular), the planar shape of the sixth flat portion M6 (e.g., substantially planar) can also be circular (e.g., substantially circular). The maximum length D6 of the sixth flat portion M6 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). For example, the maximum length D6 of the sixth flat portion M6 in the first direction (X-axis direction) can be less than about 40% of the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction).

[0243] The fourth inclined portion N4 may be around the outer portion of the sixth flat portion M6 (e.g., surrounding the outer portion of the sixth flat portion M6). The fourth inclined portion N4 may be between the sixth flat portion M6 and the seventh flat portion M7.

[0244] The fourth tilted portion N4 can be a region where the tilt angle of the pixel electrode 131 is a second angle or greater. The second angle can be an angle greater than the first angle. The second angle can be approximately 15°.

[0245] Because a second angle or greater tilt is formed or provided in the pixel electrode 131, the fourth tilt portion N4 can be the area in which light generated in the light-emitting layer 132 is emitted in the lateral direction of the display device 10.

[0246] The planar shape (e.g., substantially planar) of the fourth inclined portion N4 can be an annular shape (e.g., substantially annular) or a circle shape with a hollow center (e.g., substantially a circle), like a donut. The width a7 of the fourth inclined portion N4 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). The planar area of ​​the fourth inclined portion N4 can be approximately 70% to approximately 80% of the planar area of ​​the first light-emitting region EA1.

[0247] The seventh flat portion M7 may be located around the outer portion of the fourth inclined portion N4 (e.g., surrounding the outer portion of the fourth inclined portion N4). The seventh flat portion M7 may be a region in which the pixel electrode 131 is flat (e.g., substantially flat) or the tilt angle of the pixel electrode 131 is less than the first angle. For example, the seventh flat portion M7 may be a region in which the pixel electrode 131 is flat or nearly flat (e.g., substantially flat). Therefore, the light generated in the light-emitting layer 132 of the seventh flat portion M7 can be emitted in the front direction of the display device 10.

[0248] The planar shape (e.g., substantially planar) of the seventh flat portion M7 can be an annular shape (e.g., substantially annular) or a circle shape with a hollow center (e.g., substantially a circle), like a donut. The width a8 of the seventh flat portion M7 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). In one or more embodiments, the minimum value of the width a8 of the seventh flat portion M7 in the first direction (X-axis direction) can be about 0.5 μm.

[0249] Figure 28 It shows along Figure 27 A cross-sectional view of the section cut by line R-R'.

[0250] Reference Figure 28The display panel 100 may include a substrate 101 and a thin-film transistor layer 110, a light-emitting element layer 130, and a thin-film encapsulation layer 140 on the substrate 101. Since the remaining portions of the assembly, except for the planarization film 120 of the thin-film transistor layer 110, can be formed or provided in substantially the same manner as described in one or more embodiments, their description may be omitted.

[0251] The planarization film 120 may include a first planarization film 121, a second planarization film 122, a third planarization film 123, and a fourth planarization film 124. In one or more embodiments, the second planarization film 122 may include a fourth pore ( Figure 29 The fourth pore (H4) in the third planarization film 123 may include a fifth pore (H4). Figure 29 The fifth hole (H5) in the middle. This article will refer to Figure 29 A more detailed description of the planarization film 120 is provided.

[0252] Figure 29 yes Figure 28 Enlarged cross-sectional view of part D.

[0253] Reference Figure 29 In the sixth flattening portion M6 and the seventh flattening portion M7, the upper surface of the planarization film 120 may be flat (e.g., substantially flat), or the inclination of the upper surface of the planarization film 120 may be less than a first angle. For example, the first angle may be about 3°. If (e.g., when) the inclination of the upper surface of the planarization film 120 is less than about 3°, then the upper surface of the planarization film 120 may be considered almost flat (e.g., substantially flat) without any inclination. The upper surface of the planarization film 120 refers to the upper surface of the third planarization film 123, the portion of the upper surface of the second planarization film 122 that does not overlap with the third planarization film 123, and the portion of the upper surface of the first planarization film 121 that does not overlap with the second planarization film 122.

[0254] In the fourth tilted portion N4, the tilt angle of the upper surface of the planarization film 120 can be a first angle or greater. If (for example, when) the tilt angle of the upper surface of the planarization film 120 is about 3° or greater, then the upper surface of the planarization film 120 can be considered to have a set or predetermined tilt angle.

[0255] The planarization film 120 may include a first planarization film 121, a second planarization film 122, a third planarization film 123, and a fourth planarization film 124. The first planarization film 121 may be in the protective layer 119 (see...). Figure 28 The upper surface of the first planarization film 121 may be formed or provided to be flat (substantially flat).

[0256] The second planarization film 122 may be on the first planarization film 121. The second planarization film 122 may include a fourth hole H4 passing through the second planarization film 122. The central portion of the fourth hole H4 may overlap with the sixth planar portion M6, and the edge portion of the fourth hole H4 may overlap with the fourth inclined portion N4.

[0257] The third planarization film 123 may be on the second planarization film 122. The third planarization film 123 may include a fifth hole H5 passing through the third planarization film 123. The central portion of the fifth hole H5 may overlap with the sixth planarization portion M6, and the edge portion of the fifth hole H5 may overlap with the fourth inclined portion N4.

[0258] In the sixth planarization portion M6, an extension line extending parallel (e.g., substantially parallel) to a surface of the substrate 101 from the upper surface of the fourth planarization film 124 can be defined as the sixth extension line m6. Similarly, in the seventh planarization portion M7, an extension line extending parallel (e.g., substantially parallel) to a surface of the substrate 101 from the upper surface of the fourth planarization film 124 can be defined as the seventh extension line m7.

[0259] If, for example, the point where the fourth tilted portion N4 intersects (e.g., intersects) the sixth extension line m6 is referred to as the seventh point P7 and the point where the fourth tilted portion N4 intersects (e.g., intersects) the seventh extension line m7 is referred to as the eighth point P8, then the line connecting the seventh point P7 and the eighth point P8 can be defined as the fourth tilted line n4. In one or more embodiments, in order to give the pixel electrode 131 a second angle or greater tilt in the fourth tilted portion N4, the fourth tilt angle θ3 between the sixth extension line m6 and the fourth tilted line n4 can be from about 15° to about 35°.

[0260] In one or more embodiments, the area of ​​the inclined surfaces of the light-emitting regions EA1, EA2, and EA3 can be increased by using a second planarization film 122 and a third planarization film 123 with apertures H4 and H5 of different sizes. In one or more embodiments, the light-emitting regions EA1, EA2, and EA3 can be gradually or appropriately altered by forming or providing a fourth planarization film 124 on apertures H4 and H5 (see [link to documentation]). Figure 2 The tilt angle of the tilted surface of the display device 10. This prevents or reduces the risk of damage if (for example, when) the display device 10 is viewed from the side (see...). Figure 1 (At time) The phenomenon that the brightness and color of the observed display device 10 change rapidly according to the angle.

[0261] Figure 30 This is a flowchart illustrating a method of manufacturing a display device (or a method of manufacturing a display device) according to one or more embodiments of the present disclosure, and Figures 31 to 38 To show in more detail Figure 30 A view of a method for manufacturing a display device (or a method for manufacturing a display device).

[0262] In the following text, reference will be made to Figures 27 to 38 A method of manufacturing a display device according to one or more embodiments of the present disclosure (or a method of manufacturing a display device) is described in more detail. Any parts that overlap with one or more embodiments described herein may be omitted or may be briefly described.

[0263] First, multiple thin-film transistors TR can be formed or provided on the substrate 101. Figure 30 (S310 in the image). Next, a first planarization film 121 can be formed or provided on the thin-film transistor TR. Figure 30 (S320 in the first planarization film). Next, a second planarization film 122 having a fourth pore H4 can be formed or provided on the first planarization film 121. Figure 30 (S330 in the middle).

[0264] Reference Figure 31 A second planarization film 122 having a fifth thickness t5 can be formed or provided on the first planarization film 121. In one or more embodiments, the fifth thickness t5 can be the thickness of the second planarization film 122 after curing, and can be about 1.0 μm or about 2.5 μm. The fourth aperture H4 can be formed or provided by exposing the second planarization film 122 using a mask with openings and developing the exposed second planarization film 122.

[0265] In this case, the maximum length h1 of the fourth hole H4 in the first direction (X-axis direction) can vary depending on the mask used during exposure. For example, the maximum length h1 of the fourth hole H4 in the first direction (X-axis direction) can be the opening H0 (see...). Figure 35 The maximum length D1 in the first direction (X-axis direction) is approximately 20% to approximately 40%.

[0266] In one or more embodiments, because the second planarization film 122 is an organic film, a tilted surface with a continuously (e.g., substantially continuously) varying tilt can be formed or provided around the fourth pore H4 of the second planarization film 122 (e.g., around the fourth pore H4 of the second planarization film 122).

[0267] Next, a third planarization film 123 having a fifth pore H5 can be formed or provided on the second planarization film 122. Figure 30 (S340 in the middle).

[0268] Reference Figure 32A third planarization film 123 having a fifth pore H5 may be formed or provided on the second planarization film 122. In one or more embodiments, the third planarization film 123 may be formed or provided with a sixth thickness t6. The sixth thickness t6 may be the thickness of the third planarization film 123 after curing, and may be about 1.0 μm to about 2.5 μm.

[0269] In one or more embodiments, the central portion of the fifth aperture H5 may overlap with the fourth aperture H4, and the edge of the fifth aperture H5 may overlap with the first planarization film 121. The size of the fifth aperture H5 may be larger than the size of the fourth aperture H4. The fifth aperture H5 can be formed or provided by exposing the third planarization film 123 using a mask with an opening and developing the exposed third planarization film 123. In this case, the maximum length h2 of the fifth aperture H5 in the first direction (X-axis direction) may be about 50% to about 70% of the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction).

[0270] In one or more embodiments, because the third planarization film 123 is an organic film, a tilted surface with a continuously (e.g., substantially continuously) varying tilt can be formed or provided around the fifth pore H5 of the third planarization film 123 (e.g., around the fifth pore H5 of the third planarization film 123).

[0271] Next, a fourth planarization film 124 can be formed or provided on the third planarization film 123, the second planarization film 122 exposed in the fifth hole H5, and the first planarization film 121 exposed in the fourth hole H4. Figure 30 (S350 in the middle).

[0272] Reference Figure 29 , Figure 32 and Figure 33A fourth planarization film 124 can be formed or provided on the second planarization film 122 exposed in the third planarization film 123, the fifth pore H5, and the first planarization film 121 exposed in the fourth pore H4. In this case, because the fourth planarization film 124 is an organic film, it can be fluid before curing and therefore can flow toward the fourth pore H4 and the fifth pore H5. Therefore, the inclined portions of the fourth planarization film 124 can be formed or provided with a slope gentler than the slope of the inclined surface around the fourth pore H4 of the second planarization film 122 (e.g., around the fourth pore H4 of the second planarization film 122). Similarly, the inclined portions of the fourth planarization film 124 can be formed or provided with a slope gentler than the slope of the inclined surface around the fifth pore H5 of the third planarization film 123 (e.g., around the fifth pore H5 of the third planarization film 123). According to the flow of the fourth planarization film 124, the maximum length D6 of the sixth planarization portion M6 in the first direction (X-axis direction) can be formed or provided to be less than the maximum length h1 of the fourth hole H4 in the first direction (X-axis direction).

[0273] In one or more embodiments, the fourth planarization film 124 may be formed or provided with a seventh thickness t7. The seventh thickness t7 may be the thickness of the fourth planarization film 124 after curing, and may be from about 0.4 μm to about 1.0 μm. The seventh thickness t7 may have a maximum value in the region overlapping with the fourth pore H4.

[0274] Next, pixel electrodes 131 can be formed or provided on the sixth flat portion M6, the fourth inclined portion N4, and the seventh flat portion M7. Figure 30 (S360 in the middle).

[0275] Reference Figure 29 and Figure 34 Pixel electrodes 131 can be formed or provided on the sixth flat portion M6, the fourth inclined portion N4, and the seventh flat portion M7. In this case, such as Figure 28 As described, one side of the pixel electrode 131 may protrude beyond the sixth flat portion M6, and the other side of the pixel electrode 131 may extend to the first contact hole CNT1 and be electrically connected to the thin-film transistor TR.

[0276] Next, a pixel-defining film 135, including an opening that exposes a portion of the pixel electrode 131, may be formed or provided on the pixel electrode 131. Figure 30 (S370 in the middle).

[0277] Reference Figure 29 and Figure 35A pixel defining film 135, including an opening H0 that exposes a portion of the pixel electrode 131, may be formed or provided on the pixel electrode 131. When the pixel defining film 135 is formed or provided, the seventh planar portion M7 of the fourth planarization film 124 may be defined with the interior of the opening H0 as its boundary.

[0278] Next, a light-emitting layer 132 can be formed or provided on the pixel electrode 131 in the opening H0. Figure 30 (S380 in the middle).

[0279] Reference Figure 36 An emissive layer 132 may be formed or provided on the pixel electrode 131 in the opening H0. The emissive layer 132 may include a sixth flat portion M6, a fourth inclined portion N4, and a seventh flat portion M7 to correspond to the shape of the pixel electrode 131.

[0280] Next, a common electrode 133 can be formed or provided on the light-emitting layer 132 and the pixel defining film 135. Figure 30 (S390 in the middle).

[0281] Reference Figure 37 A common electrode 133 may be formed or provided on the light-emitting layer 132 and the pixel defining film 135. The common electrode 133 may include a sixth flat portion M6, a fourth inclined portion N4 and a seventh flat portion M7, so as to correspond to the shape of the light-emitting layer 132.

[0282] Next, refer to Figure 38 A first inorganic encapsulation layer 141, a first organic encapsulation layer 142, and a second inorganic encapsulation layer 143 may be sequentially formed or provided on a common electrode 133. The first inorganic encapsulation layer 141 may include a sixth flat portion M6, a fourth inclined portion N4, and a seventh flat portion M7 to correspond to the shape of the common electrode 133. The lower surface of the first organic encapsulation layer 142 may be formed or provided to correspond to the shape of the first inorganic encapsulation layer 141. In one or more embodiments, the upper surface of the first organic encapsulation layer 142 may be formed or provided in a flat shape (e.g., substantially flat). The second inorganic encapsulation layer 143 may be formed or provided in a flat shape (e.g., substantially flat) like the upper surface of the first organic encapsulation layer 142.

[0283] A display device manufactured according to one or more embodiments of the present disclosure using a method of manufacturing a display device (or a method of manufacturing a display device) can increase the area of ​​the tilted surface of the light-emitting layer 132 by using a second planarization film 122 and a third planarization film 123 with holes H4 and H5 of different sizes. In one or more embodiments, by forming or providing a fourth planarization film 124 on the holes H4 and H5 and the first planarization film 121, the second planarization film 122, and the third planarization film 123, rapid changes in the tilt angle of the tilted surface of the light-emitting layer 132 can be prevented or reduced. This prevents or reduces the risk of rapid changes in the tilt angle of the tilted surface of the light-emitting layer 132 if (e.g., when) the display device 10 is viewed from the side (see...). Figure 1 (Time) The phenomenon that brightness and color change rapidly depending on the angle.

[0284] Figure 39 This is a plan view illustrating a slit mask on a second planarization film in a method of manufacturing a display device according to one or more embodiments of the present disclosure, and Figure 40 and Figure 41 It shows how to utilize Figure 39 A cross-sectional view of a method for manufacturing a display device using a slit mask. Any content that overlaps with one or more embodiments described herein may be omitted or may be briefly described; the differences will be primarily described.

[0285] Reference Figure 39 and Figure 40 The second mask MSK2 may include multiple full-tone area FTAs ​​and multiple half-tone area HTAs. The multiple full-tone area FTAs ​​and multiple half-tone area HTAs may be arranged or provided alternately. In one or more embodiments, in the full-tone area FTAs, 100% of the light from the exposure apparatus can pass through to expose the second planarization film 122, and in the half-tone area HTAs, only about 50% of the light from the exposure apparatus can pass through to expose the second planarization film 122. In this case, because the second planarization film 122 has fluidity before curing, the tilt angle of the tilted surface of the upper surface of the second planarization film 122 can be gradually changed. The second planarization film 122 may be a positive photoresist.

[0286] Reference Figure 40 and Figure 41A second planarization film 122 having a first coating thickness t10 can be formed or provided on the first planarization film 121. Next, a sloping surface on the upper surface of the planarization film 120 can be formed or provided by exposing the second planarization film 122 using a second mask MSK2 comprising multiple full-tone area FTAs ​​and multiple half-tone area HTAs, and developing the exposed second planarization film 122. In one or more embodiments, the maximum thickness of the second planarization film 122 after exposure can be an eighth thickness t8, which may be less than the first coating thickness t10. Next, as described in one or more embodiments, for example, referring to... Figure 4 The pixel electrode 131, pixel defining film 135, light-emitting layer 132, common electrode 133 and thin film encapsulation layer 140 can be formed or provided sequentially.

[0287] The accompanying drawings show that the full-tone area FTA and half-tone area HTA can be spaced and / or separated (e.g., spaced apart or separated) by an equal distance (e.g., substantially equal distance), but embodiments of this disclosure are not limited thereto. By adjusting the spacing between the full-tone area FTA and the half-tone area HTA, the degree or frequency of light from the exposure apparatus illuminating the upper surface of the second planarization film 122 can be adjusted.

[0288] For example, if (e.g., when) the spacing between full-tone FTAs ​​is short (e.g., the spacing between halftone HTAs is long), the amount of light incident from the exposure apparatus onto the upper surface of the second planarization film 122 can be increased. Conversely, if (e.g., when) the spacing between full-tone FTAs ​​is long (e.g., the spacing between halftone HTAs is short), the amount of light incident from the exposure apparatus onto the upper surface of the second planarization film 122 can be reduced. Thus, the tilt angle and the range of tilt surface formation of the upper surface of the second planarization film 122 can be adjusted.

[0289] Figure 42 It is shown Figure 2 An enlarged layout diagram of another example of the pixel electrode of the first light-emitting region EA1.

[0290] Reference Figure 42 The first light-emitting region EA1 may include a fifth inclined portion N5 and an eighth flat portion M8.

[0291] The fifth tilted portion N5 may be located at the center of the first light-emitting region EA1. The fifth tilted portion N5 may overlap with the center of the pixel electrode 131. The fifth tilted portion N5 may be a region in which a set or predetermined tilt is formed or provided in the pixel electrode 131. Because a tilt is formed or provided in the pixel electrode 131, the fifth tilted portion N5 may be a region in which the light-emitting layer 132 (see...) is located. Figure 43 The light generated in the display device 10 (see) Figure 1 The area emitted from the side direction of ).

[0292] The planar shape (e.g., substantially planar shape) of the fifth inclined portion N5 may follow the planar shape (e.g., substantially planar shape) of the first light-emitting region EA1. If (e.g., when) the first light-emitting region EA1 has such... Figure 42 When the planar shape shown is circular (e.g., substantially circular), the planar shape of the fifth inclined portion N5 (e.g., substantially planar) can also be circular (e.g., substantially circular). The maximum width a9 of the fifth inclined portion N5 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction).

[0293] The eighth flat portion M8 may be located around the outer portion of the fifth inclined portion N5 (e.g., surrounding the outer portion of the fifth inclined portion N5). The eighth flat portion M8 may be a region in which the pixel electrode 131 is flat (e.g., substantially flat) or the tilt angle of the pixel electrode 131 is less than the first angle. For example, the eighth flat portion M8 may be a region in which the pixel electrode 131 is flat or nearly flat (e.g., substantially flat). Therefore, the light generated in the light-emitting layer 132 of the eighth flat portion M8 can be emitted in the front direction of the display device 10.

[0294] The planar shape (e.g., substantially planar shape) of the eighth flat portion M8 can be an annular shape (e.g., substantially annular shape) or a circle shape with a hollow center (e.g., substantially a circle shape), like a donut. The width a10 of the eighth flat portion M8 in the first direction (X-axis direction) can be less than the maximum length D1 of the first light-emitting region EA1 in the first direction (X-axis direction). In one or more embodiments, the minimum value of the width a10 of the eighth flat portion M8 in the first direction (X-axis direction) can be about 0.5 μm. In embodiments, the width a10 of the eighth flat portion M8 in the first direction (X-axis direction) can range from about 0.5 μm to about 1.5 μm.

[0295] Figure 43 It shows along Figure 42 A cross-sectional view of the section intercepted by line S-S'.

[0296] Reference Figure 43 The display panel 100 may include a substrate 101 and a thin-film transistor layer 110, a light-emitting element layer 130, and a thin-film encapsulation layer 140 on the substrate 101. Since the remaining portions of the assembly, except for the planarization film 120 of the thin-film transistor layer 110, can be formed or provided in substantially the same manner as described in one or more embodiments, their description may be omitted.

[0297] The planarization film 120 may include a first planarization film 121, a second planarization film 122, and a third planarization film 123. In one or more embodiments, the second planarization film 122 may include a sixth pore ( Figure 46 The sixth hole (H6) in the middle. This article will refer to Figure 44 A more detailed description of planarization film 120 is provided.

[0298] Figure 44 yes Figure 43 Enlarged cross-sectional view of part E.

[0299] Reference Figure 44 In the eighth flattening portion M8, the upper surface of the planarization film 120 may be flat (e.g., substantially flat), or the inclination of the upper surface of the planarization film 120 may be less than a first angle. For example, the first angle may be about 3°. If (e.g., when) the inclination of the upper surface of the planarization film 120 is less than about 3°, then the upper surface of the planarization film 120 may be considered almost flat (e.g., substantially flat) without any inclination. The upper surface of the planarization film 120 refers to the upper surface of the third planarization film 123, the portion of the upper surface of the second planarization film 122 that does not overlap with the third planarization film 123, and the portion of the upper surface of the first planarization film 121 that does not overlap with the second planarization film 122.

[0300] In the fifth tilting portion N5, the tilt angle of the upper surface of the planarization film 120 can be a first angle or greater. If (for example, when) the tilt angle of the upper surface of the planarization film 120 is about 3° or greater, then the upper surface of the planarization film 120 can be considered to have a set or predetermined tilt angle.

[0301] Planarization film 120 may include a first planarization film 121, a second planarization film 122, and a third planarization film 123. The first planarization film 121 may be in the protective layer 119 (see...). Figure 43 The upper surface of the first planarization film 121 may be formed or provided as flat (e.g., substantially flat).

[0302] The second planarization film 122 may be on the first planarization film 121. The second planarization film 122 may include a sixth hole H6 passing through the second planarization film 122. The sixth hole H6 may overlap with the fifth inclined portion N5.

[0303] The thickness of the planarization film 120 can be increased from the center C1 of the fifth inclined portion N5 to the outer portion of the fifth inclined portion N5.

[0304] In one or more embodiments, this can be achieved by using light-emitting regions EA1, EA2, and EA3 (see...) Figure 2 An inclined surface is formed or provided at the center of the light-emitting layer 132 to increase the area of ​​the inclined surface. Therefore, light is emitted from the inclined surface of the light-emitting layer 132 and directed toward the display device 10 (see [link]). Figure 1 The amount of light guided from the side of the display device 10 can be increased. Therefore, according to this disclosure, the brightness and color difference for each viewing angle can be improved or enhanced if (e.g., when) the display device 10 is viewed from the side.

[0305] Figure 45 This is a flowchart illustrating a method of manufacturing a display device (or a method of manufacturing a display device) according to one or more embodiments of the present disclosure, and Figures 46 to 54 To show in more detail Figure 45 A view of a method for manufacturing a display device (or a method for manufacturing a display device).

[0306] In the following text, reference will be made to Figures 42 to 54 A method of manufacturing a display device according to one or more embodiments of the present disclosure (or a method of manufacturing a display device) is described in more detail. Any parts that overlap with one or more embodiments described herein may be omitted or may be briefly described, and the differences will be described primarily.

[0307] First, multiple thin-film transistors TR can be formed or provided on the substrate 101. Figure 45 (S410 in the image). Next, a first planarization film 121 can be formed or provided on the thin-film transistor TR. Figure 45 (S420 in the text). Next, a second planarization film 122 having a sixth pore H6 can be formed or provided on the first planarization film 121. Figure 45 (S430 in the middle).

[0308] Reference Figure 46 A second planarization film 122 can be formed or provided on the first planarization film 121. The sixth aperture H6 can be formed or provided by exposing the second planarization film 122 using a mask with openings and developing the exposed second planarization film 122. In one or more embodiments, the maximum length of the sixth aperture H6 in the first direction (X-axis direction) can vary depending on the opening of the mask.

[0309] In one or more embodiments, because the second planarization film 122 is an organic film, a tilted surface with a continuously (e.g., substantially continuously) varying tilt can be formed or provided around the sixth pore H6 of the second planarization film 122 (e.g., around the sixth pore H6 of the second planarization film 122).

[0310] Next, a third planarization film 123 can be formed or provided on the first planarization film 121 exposed in the second planarization film 122 and the sixth hole H6. Figure 45 (S440 in the middle).

[0311] Reference Figure 47 A third planarization film 123 may be formed or provided on the first planarization film 121 exposed in the second planarization film 122 and the sixth pore H6. Because the third planarization film 123 is an organic film, a tilted surface with a continuously (e.g., substantially continuously) varying tilt may be formed or provided around the sixth pore H6.

[0312] Next, pixel electrodes 131 can be formed or provided on the inclined and flat portions. Figure 45 (S450 in the middle).

[0313] Reference Figure 44 and Figure 48 Pixel electrodes 131 can be formed or provided on the fifth inclined portion N5 and the eighth flat portion M8. In this case, as... Figure 43 As described, one side of the pixel electrode 131 may protrude beyond the eighth flat portion M8, and the other side of the pixel electrode 131 may extend to the first contact hole CNT1 and be electrically connected to the thin-film transistor TR.

[0314] Next, a pixel-defining film 135, including an opening that exposes a portion of the pixel electrode 131, may be formed or provided on the pixel electrode 131. Figure 45 (S460 in the middle).

[0315] Reference Figure 49 A pixel defining film 135, including an opening exposing a portion of the pixel electrode 131, may be formed or provided on the pixel electrode 131. When the pixel defining film 135 is formed or provided, the eighth planar portion M8 of the third planarization film 123 may be defined with the interior of the opening as its boundary.

[0316] Next, a light-emitting layer 132 can be formed or provided on the pixel electrode 131 in the opening. Figure 45 (S470 in the middle).

[0317] Reference Figure 50An emissive layer 132 may be formed or provided on the pixel electrode 131 within the opening. The emissive layer 132 may include a fifth inclined portion N5 and an eighth flat portion M8 to correspond to the shape of the pixel electrode 131.

[0318] Next, a common electrode 133 can be formed or provided on the light-emitting layer 132 and the pixel defining film 135. Figure 45 (S480 in the middle).

[0319] Reference Figure 51 A common electrode 133 may be formed or provided on the light-emitting layer 132 and the pixel defining film 135. The common electrode 133 may include a fifth inclined portion N5 and an eighth flat portion M8 to correspond to the shape of the light-emitting layer 132.

[0320] Next, refer to Figures 52 to 54 A first inorganic encapsulation layer 141, a first organic encapsulation layer 142, and a second inorganic encapsulation layer 143 can be sequentially formed or provided on the common electrode 133.

[0321] The first inorganic encapsulation layer 141 may include a fifth inclined portion N5 and an eighth flat portion M8 to correspond to the shape of the common electrode 133. The lower surface of the first organic encapsulation layer 142 may be formed or provided to correspond to the shape of the first inorganic encapsulation layer 141. In one or more embodiments, the upper surface of the first organic encapsulation layer 142 may be formed or provided in a flat shape (e.g., substantially flat). The second inorganic encapsulation layer 143 may be formed or provided in a flat shape (e.g., substantially flat) like the upper surface of the first organic encapsulation layer 142.

[0322] In view of the entire contents of this disclosure, those skilled in the art will understand that, unless otherwise stated or implied, each suitable feature of one or more embodiments of this disclosure may be combined in part or in whole, or combined with each other, and may be technically interlocked and operated in one or more suitable ways, and each embodiment may be implemented independently of each other or in combination with each other in any suitable way.

[0323] It will be understood by those skilled in the art to which this disclosure pertains that this disclosure may be implemented in one or more suitable forms without altering its spirit and scope. Therefore, it will be understood that one or more embodiments described herein are illustrative in all respects and not restrictive. It will be understood that the scope of this disclosure is defined by the appended claims and their equivalents, and not by the specific embodiments described above, and that all modifications and alterations derived from the appended claims and their equivalents fall within the scope of this disclosure.

Claims

1. A display device, wherein, The display device includes: Base; A thin-film transistor layer is located on one surface of the substrate and includes thin-film transistors; A planarization film is provided on the thin-film transistor and includes a first planar portion and a second planar portion spaced apart from each other, and a first inclined portion between the first planar portion and the second planar portion. Pixel electrodes are located on the first flat portion, the first inclined portion, and the second flat portion of the planarization film. A pixel defining film, including an opening that exposes a portion of the pixel electrode; A light-emitting layer is present in the opening on the pixel electrode; and The common electrode is located on the light-emitting layer and the pixel defining film. Wherein, the minimum thickness of the planarization film in the first planar portion is less than the minimum thickness of the planarization film in the second planar portion, and The thickness of the planarization film in the first inclined portion decreases from the second planar portion to the first planar portion.

2. The display device according to claim 1, wherein, In the first flattened portion, an extension line extending parallel to one surface of the substrate from the upper surface of the planarization film is defined as the first extension line. In the second flattened portion, an extension line of the upper surface of the planarization film, parallel to one surface of the substrate, is defined as the second extension line. The line connecting the first point where the first inclined portion intersects the first extension line and the second point where the first inclined portion intersects the second extension line is defined as the first inclined line, and The angle between the first extension line and the first inclined line is 15° to 35°.

3. The display device according to claim 2, wherein, The maximum length between one end of the second flat portion and the second point is 0.5 μm to 1.5 μm.

4. The display device according to claim 1, wherein, The planar area of ​​the first inclined portion is 70% to 80% of the planar area of ​​the opening.

5. The display device according to claim 1, wherein, The planarization film further includes: The second inclined portion is spaced apart from the first inclined portion; and The third flat portion is separated from the second flat portion, and The second inclined portion is located between the second flat portion and the third flat portion.

6. The display device according to claim 5, wherein, In the first flattened portion, an extension line extending parallel to one surface of the substrate from the upper surface of the planarization film is defined as the first extension line. In the second flattened portion, an extension line of the upper surface of the planarization film, parallel to one surface of the substrate, is defined as the second extension line. In the third flattening portion, an extension line of the upper surface of the planarization film, parallel to one surface of the substrate, is defined as the third extension line. The line connecting the first point where the first inclined portion intersects the first extension line and the second point where the first inclined portion intersects the second extension line is defined as the first inclined line. The line connecting the fourth point where the second inclined portion intersects the second extended line and the third point where the second inclined portion intersects the third extended line is defined as the second inclined line, and The first angle, which is the acute angle between the first extension line and the first inclined line, is smaller than the second angle, which is the acute angle between the second extension line and the second inclined line.

7. The display device according to claim 5, wherein, The maximum length of the first flat portion in the first direction is 20% to 40% of the maximum length of the opening in the first direction.

8. The display device according to claim 7, wherein, The planar area of ​​the first inclined portion is 10% to 45% of the planar area of ​​the opening.

9. The display device according to claim 8, wherein, The thickness of the first inclined portion is 1.0 μm to 2.5 μm.

10. The display device according to claim 7, wherein, The planar area of ​​the second flat portion is 10% to 25% of the planar area of ​​the opening.

11. The display device according to claim 10, wherein, The thickness of the second inclined portion is 0.4 μm to 1.5 μm.

12. The display device according to claim 5, wherein, The planarization film further includes: The first hole is defined by the boundary between the first flat portion and the first inclined portion; and The second hole is defined by the boundary between the second flat portion and the second inclined portion.

13. The display device according to claim 12, wherein, The size of the second hole is larger than the size of the first hole, and the size of the opening is larger than the size of the second hole.

14. The display device according to claim 12, wherein, The first hole and the second hole overlap with the opening.

15. A display device, wherein, The display device includes: Base; A thin-film transistor layer is located on one surface of the substrate and includes thin-film transistors; A planarization film is provided on the thin-film transistor and includes a tilted portion and a planar portion. Pixel electrodes are located on the inclined portion and the flat portion of the planarization film. A pixel defining film, including an opening that exposes a portion of the pixel electrode; A light-emitting layer is present in the opening on the pixel electrode; and The common electrode is located on the light-emitting layer and the pixel defining film. Wherein, the inclined portion overlaps with the central portion of the pixel electrode, and The flat portion surrounds the sloping portion.

16. The display device according to claim 15, wherein, The thickness of the planarization film increases from the center of the inclined portion toward the outer portion of the inclined portion.

17. The display device according to claim 15, wherein, The width of the flat portion in the first direction is 0.5 μm to 1.5 μm.

18. An electronic device including a display device, the display device comprising: Base; A thin-film transistor layer is located on one surface of the substrate and includes thin-film transistors; A planarization film is provided on the thin-film transistor and includes a first planar portion and a second planar portion spaced apart from each other, and a first inclined portion between the first planar portion and the second planar portion. Pixel electrodes are located on the first flat portion, the first inclined portion, and the second flat portion of the planarization film. A pixel defining film, including an opening that exposes a portion of the pixel electrode; A light-emitting layer is located in the opening on the pixel electrode; as well as The common electrode is located on the light-emitting layer and the pixel defining film. Wherein, the minimum thickness of the planarization film in the first planar portion is less than the minimum thickness of the planarization film in the second planar portion, and The thickness of the planarization film in the first inclined portion decreases from the second planar portion to the first planar portion.

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