A high hydrogen process chamber and plasma processing apparatus

Abstract

The application relates to the technical field of wafer processing equipment, in particular to a high-hydrogen process reaction chamber and a plasma processing equipment, which comprises a quartz tube, an induction coil, a Faraday shield cage and an ignition device; the quartz tube is arranged at the top of a processing chamber; the Faraday shield cage is annularly arranged between the quartz tube and the induction coil, a plurality of slits extending through the side wall of the Faraday shield cage and along the axial direction are formed in the Faraday shield cage; the ignition device is arranged in at least one slit and connected with a radio frequency power source to input a first radio frequency energy to make the process gas in the quartz tube be broken down and ignited to form an initial plasma; the induction coil is annularly arranged outside the quartz tube and connected with the radio frequency power source to input a second radio frequency energy for generating an alternating magnetic field, and the alternating magnetic field enters the quartz tube through the slits to maintain or increase the ignited plasma; the application successfully solves the problem of ignition difficulty caused by the existence of the Faraday shield cage.

Description

Technical Field

[0001] This invention relates to the field of wafer processing equipment technology, and more particularly to a reaction chamber and plasma processing equipment for a high-hydrogen process. Background Technology

[0002] In ICP-type plasma resist removal or etching equipment used in high-hydrogen processes, although a Faraday shield cage is placed between the coil and the quartz tube to reduce capacitive coupling and reduce plasma erosion of the quartz tube, the Faraday shield cage itself will significantly weaken the electric field used to ignite the plasma. Summary of the Invention

[0003] The present invention proposes a reaction chamber and plasma processing equipment for a high-hydrogen process. The purpose is to take advantage of the characteristic that the electric field is more easily concentrated in the slit, and to efficiently and reliably break down the process gas and form the initial plasma by introducing the first radio frequency energy through the ignition element. This successfully solves the problem of ignition difficulty caused by the presence of the Faraday cage.

[0004] To achieve the above objectives, the present invention provides a reaction chamber for a high-hydrogen process, comprising a quartz tube, an induction coil, a Faraday shielding cage, and an ignition element;

[0005] The quartz tube is located at the top of the processing chamber;

[0006] The Faraday shielding cage is arranged between the quartz tube and the induction coil, and the Faraday shielding cage has a number of slits that penetrate its sidewalls and extend axially.

[0007] The ignition element is disposed in at least one of the slits and connected to a radio frequency power supply to introduce first radio frequency energy that causes the process gas in the quartz tube to be broken down and ignited to form an initial plasma.

[0008] The induction coil is arranged around the outside of the quartz tube and connected to the radio frequency power supply to introduce second radio frequency energy for generating an alternating magnetic field, and to allow the alternating magnetic field to enter the quartz tube through the slit to maintain or increase the ignited plasma.

[0009] Optionally, the power of the first radio frequency energy is less than or equal to the power of the second radio frequency energy, wherein the power of the first radio frequency energy is 10W-1000W and the power of the second radio frequency energy is 1000W-6000W.

[0010] Optionally, the ignition element includes an ignition head and a first radio frequency switch;

[0011] At least a portion of the ignition head is disposed within the slit;

[0012] The first radio frequency switch is located in the circuit between the ignition head and the grounding balance capacitor. The grounding balance capacitor is connected to the radio frequency power supply to control the connection and disconnection between the radio frequency power supply and the ignition head, thereby inputting or stopping the input of the first radio frequency energy to the ignition head.

[0013] Optionally, the ignition head includes a first group and a second group;

[0014] The first group includes a plurality of ignition heads arranged circumferentially and distributed in different slits, for forming ignition points in the slits located at different circumferential positions of the Faraday cage;

[0015] The second group includes multiple ignition heads arranged axially and distributed in different axial segments of the same slit, for forming multiple ignition points at different axial positions within the same slit.

[0016] Optionally, the end of the ignition head furthest from the first radio frequency switch is disposed within the slit, so that when the alternating magnetic field enters the slit, the physical characteristic of the relatively concentrated electric field within the slit can be fully utilized to easily break down the process gas.

[0017] Optionally, the Faraday shielding cage includes a main body, and the main body has a receiving portion on its outer side wall near the slit, the receiving portion communicating with the slit to form a receiving cavity;

[0018] An insulating component is provided inside the receiving cavity, and the insulating component covers the ignition head to prevent the ignition head from interfering with the Faraday shielding cage during discharge.

[0019] Optionally, the reaction chamber of the high-hydrogen process further includes a plasma monitoring device and a processing device. The plasma monitoring device is used to collect the initial plasma signal in real time, and the processing device is connected to the first radio frequency switch and the radio frequency power supply. The processing device controls the on / off state of the first radio frequency switch according to the initial plasma signal.

[0020] Optionally, the reaction chamber of the high-hydrogen process further includes a driving component of an external device connected to the ignition head, so as to drive the ignition head to move into the slit before ignition and drive the ignition head to move out of the slit after ignition.

[0021] Optionally, the reaction chamber of the high-hydrogen process further includes a position detection device communicatively connected to the drive component and the processing component. The position detection device is used to collect the movement position signal of the ignition head. The processing component controls the on / off state of the drive component based on the movement position signal of the ignition head to control the position of the ignition head before and after ignition.

[0022] Optionally, the circumferential width of each of the slits is from 1 mm to 20 mm.

[0023] To achieve the above objectives, the present invention also provides a plasma processing apparatus, comprising:

[0024] The reaction chamber of the high-hydrogen process;

[0025] A process gas supply system is connected to a quartz tube to supply process gas into the quartz tube;

[0026] A vacuum system, connected to the quartz tube, is used to extract gas from the quartz tube and maintain the required vacuum level in the quartz tube;

[0027] The radio frequency power supply is electrically connected to the induction coil and ignition element.

[0028] The beneficial effects of this invention are as follows:

[0029] This invention utilizes the characteristic that the electric field is more easily concentrated within a slit to efficiently and reliably break down the process gas and form initial plasma by introducing first radio frequency energy through an ignition element, successfully solving the ignition difficulty caused by the presence of a Faraday cage. Subsequently, a second radio frequency energy is introduced through an induction coil to generate an alternating magnetic field, which maintains and enhances the ignited plasma through the slit. This "two-step method" not only achieves reliable ignition and stable maintenance of the plasma, but also optimizes the equipment structure by directly integrating the ignition function within the slit, eliminating the need for a complex external ignition device. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of the structure of the plasma processing device in an embodiment of the present invention. Figure 1 ;

[0031] Figure 2 for Figure 1 Schematic diagram of the structure of the quartz tube and Faraday shielding cage;

[0032] Figure 3 This is a schematic diagram of the structure of the plasma processing device in an embodiment of the present invention. Figure 2 .

[0033] Explanation of reference numerals in the attached figures:

[0034] 1. Quartz tube; 2. Processing chamber; 3. Induction coil; 4. Faraday shielding cage; 41. Slit; 5. Ignition element; 51. Ignition head; 52. First radio frequency switch; 6. Insulating element; 7. Grounding balance capacitor. Detailed Implementation

[0035] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions in the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without inventive effort are within the scope of protection of this invention. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, but do not exclude other elements or objects.

[0036] To address the problems existing in the prior art, embodiments of the present invention provide a reaction chamber for a high-hydrogen process, such as... Figure 1 As shown, the reaction chamber of the high-hydrogen process includes a quartz tube 1, an induction coil 3, a Faraday shield 4, and an ignition element 5.

[0037] In one embodiment, such as Figure 1 As shown, the quartz tube 1 is located at the top of the processing chamber 2.

[0038] In one embodiment, such as Figure 1 As shown, the Faraday shielding cage 4 is arranged in a ring between the quartz tube 1 and the induction coil 3, and the Faraday shielding cage 4 has a number of slits 41 that penetrate its sidewalls and extend axially.

[0039] In one embodiment, such as Figure 1 As shown, the ignition element 5 is disposed within at least one of the slits 41 and connected to a radio frequency power supply to introduce first radio frequency energy that causes the process gas in the quartz tube 1 to be broken down and ignited to form an initial plasma; the induction coil 3 is disposed around the outside of the quartz tube 1 and connected to the radio frequency power supply to introduce second radio frequency energy for generating an alternating magnetic field, and to allow the alternating magnetic field to enter the quartz tube 1 through the slits 41 to maintain or increase the ignited plasma.

[0040] This embodiment cleverly separates and coordinates the two stages of plasma ignition and maintenance in terms of structure and energy. The ignition element 5 is directly placed within the slit 41 of the Faraday shield cage 4, fully utilizing the relatively concentrated electric field at slit 41 and its ease of breaking down the process gas. This allows for the efficient and reliable generation of initial plasma using the first radio frequency energy. After successful ignition, a second radio frequency energy is introduced through the induction coil 3 to generate an alternating magnetic field. This alternating magnetic field penetrates the slit 41 into the quartz tube 1 and induces an eddy current electric field, accelerating the collision of free electrons with the process gas to generate plasma. This maintains or increases the existing initial plasma, achieving stable plasma operation. This two-step method not only solves the starting problem of plasma ignition difficulties caused by the presence of the Faraday shield cage 4, but also integrates the ignition source within the existing structure of the equipment (slit 41), eliminating the need for complex external devices.

[0041] In one embodiment, the power of the first radio frequency energy is 10W-1000W, and the power of the second radio frequency energy is 1000W-6000W. This achieves precise matching and separation control of energy between the plasma ignition and sustaining stages.

[0042] This embodiment sets the power of the first radio frequency energy to 10W-1000W, ensuring that the energy is sufficient to efficiently break down the high-hydrogen process gas and form the initial plasma in the local area of ​​the slit 41, while avoiding the generation of an unnecessary strong electric field due to excessive power, thereby reducing the risk of initial bombardment of the inner wall of the equipment (especially the quartz tube 1). The power of the second radio frequency energy is set to 1000W-6000W to provide sufficient energy for the induction coil 3 to generate a strong alternating magnetic field, thereby effectively heating, maintaining, and expanding the ignited initial plasma, ensuring the formation of the high-density, stable plasma required for the process. The lower limit of the second radio frequency energy is set to 1000W to ensure sufficient energy input to maintain the plasma; while the upper limit of 6000W sets a power boundary that meets the requirements of most high-hydrogen process technologies (such as etching and resist removal), achieving the process objectives while also considering the power capacity of the equipment and the economics of operation. This stepped energy configuration of "first radio frequency energy ignition, second radio frequency energy maintenance" decouples the demanding ignition process from the stable maintenance process, optimizes energy utilization efficiency, and helps to reduce the long-term corrosion of key components such as quartz tubes by high-energy ions.

[0043] In one embodiment, such as Figure 1As shown, the ignition element 5 includes an ignition head 51 and a first radio frequency switch 52; at least a portion of the ignition head 51 is disposed within the slit 41; the first radio frequency switch 52 is disposed on the circuit between the ignition head 51 and the grounding balancing capacitor 7, specifically, on the circuit between the grounding balancing capacitor 7 and the induction coil 3; the grounding balancing capacitor 7 is connected to the radio frequency power supply to control the on / off connection between the radio frequency power supply and the ignition head 51 to input or stop inputting the first radio frequency energy to the ignition head 51.

[0044] This embodiment constructs an independent and controllable plasma ignition path. By placing the igniter 51 within the slit, the concentrated electric field at the slit 41 can be directly utilized to efficiently break down the gas and form the initial plasma, solving the ignition difficulty caused by the presence of the Faraday cage 4. By specifically controlling the on / off state of this path with a first radio frequency switch 52, the first radio frequency energy can be precisely input to the igniter 51 during the ignition phase, ensuring successful ignition. After ignition, the energy supply to the igniter 51 can be immediately cut off, isolating it from the circuit. This prevents damage to the igniter 51 from the high-power second radio frequency energy during the subsequent plasma sustaining phase, and also avoids the additional electric field coupling caused by the synchronous operation of the igniter 51 and the induction coil 3. This physical isolation eliminates the interference of the igniter 51 as an independent conductor on the electromagnetic field distribution in a strong alternating magnetic field. Through precise timing control, the ignition head 51 is immediately isolated only after completing the critical task of igniting the initial plasma. This ensures that the electromagnetic environment of the entire reaction chamber is entirely dominated by the slit structure of the induction coil 3 and the Faraday shielding cage 4 in subsequent processes. This creates optimal conditions for maintaining a uniform, stable, and pure plasma, which is an important guarantee for improving process controllability, repeatability, and the uniformity of the final wafer processing.

[0045] In another embodiment, such as Figure 3As shown, the first RF switch 52 is located on the circuit between the ignition head 51 and the RF power supply, specifically, on the circuit between the RF power supply and the induction coil 3. This embodiment simplifies the topology of the RF energy delivery path, making the physical connection between the ignition circuit and the induction coil 3 sustaining circuit more direct. By directly placing the first RF switch 52 on the main path between the output of the RF power supply and the ignition head 51, it means that during the ignition phase, the first RF energy output by the RF power supply can reach the ignition head 51 directly through a shorter path with fewer intermediate nodes. This helps reduce RF signal reflection and loss on the transmission path, thereby improving the efficiency and stability of ignition energy transfer. Simultaneously, since the first RF switch 52 is located on the output side of the RF power supply, its control logic (such as switching on and off) can be more directly coordinated with the power output control of the RF power supply, facilitating rapid and synchronous switching from ignition energy to sustaining energy. This circuit layout also facilitates the integration of components such as the RF power supply and the first RF switch 52 into a more compact control unit, helping to optimize internal space and simplify wiring.

[0046] In practical operation, firstly, the RF power supply is controlled to output the first RF energy. Simultaneously, the control circuit turns on the first RF switch 52, guiding this first RF energy to the ignition head 51. At this time, because the discharge end of the ignition head 51 is located within the slit of the Faraday shield cage, it can efficiently utilize the electric field concentration effect to break down the process gas inside the quartz tube 1, thereby successfully igniting and forming the initial plasma. After ignition, the first RF switch 52 is quickly turned off, thus physically isolating the ignition head 51 from the RF power supply circuit. Immediately afterwards, the output of the RF power supply is switched and adjusted to the second RF energy in a very short time, and input to the induction coil 3 through the circuit. The induction coil 3 then generates a strong alternating magnetic field. This magnetic field passes through the slit 41 of the Faraday shield cage 4 and enters the interior of the quartz tube 1, continuously exciting, heating, and maintaining the ignited plasma through electromagnetic induction, bringing it to the stable, high-density state required by the process. This automated process of "ignition to cut-off to maintenance" ensures a smooth transition of the plasma from ignition to maintenance, taking into account ignition reliability, ignition head 51 safety, and uniform stability during the plasma maintenance phase.

[0047] It is worth noting that during the ignition and sustaining phases, the first radio frequency energy and the second radio frequency energy are simultaneously connected to the induction coil 3, which will not be elaborated here.

[0048] In one embodiment, the size of the ignition head 51 is as small as possible, specifically, its diameter or cross-sectional width perpendicular to its extension direction can be between 0.5 mm and 5 mm. First, the compact ignition head 51 can be more conveniently positioned within the already narrow slit 41 of the Faraday shield 4, without physically obstructing the original structure of the slit 41 (especially its circumferential width), thus ensuring that the alternating magnetic field can smoothly enter the quartz tube 1 through the slit 41. Second, the smaller size of the ignition head 51 means that the local electric field it forms during the ignition stage is more concentrated and sharper, which is beneficial for achieving efficient breakdown of the process gas at a lower "first radio frequency energy," thereby reducing overall power consumption and improving ignition reliability. Finally, after the plasma enters the "sustaining" stage dominated by the induction coil 3, this helps maintain the uniformity and purity of the plasma within the chamber space, avoiding plasma inhomogeneity or electric field distortion problems that may be caused by the presence of the ignition head 51 as an additional conductor, thus further optimizing the performance and stability of the device in high-hydrogen processes.

[0049] In one embodiment, the ignition head 51 can be a slender needle-like or rod-like electrode. Its main body is made of a high-temperature resistant, highly conductive material (such as tungsten, molybdenum, or their alloys) to withstand the localized high temperature and high-frequency current during ignition. One end of the ignition head 51 is connected to the radio frequency feed line of the first radio frequency switch 52, and the other end (i.e., the discharge end) is precisely machined into a pointed tip or a rounded head with a small radius of curvature to enhance the electric field concentration effect. This structural design, combined with its overall "smallest possible size" feature, allows the electrode to penetrate deep into the slit 41. When the first radio frequency energy is applied, its sharp discharge end can generate an extremely high electric field strength in the local space within the slit 41, thereby efficiently and reliably breaking down the high-hydrogen process gas and forming the initial plasma. Simultaneously, its slender geometry and high-temperature resistance ensure that during the subsequent high-power plasma maintenance phase, even when exposed to a strong electromagnetic field and plasma environment, the structure remains intact. Furthermore, due to its small cross-sectional area, parasitic effects on the plasma electromagnetic field can be effectively suppressed.

[0050] In one embodiment, the ignition head 51 includes a first group and a second group.

[0051] In one embodiment, the first group includes a plurality of ignition heads 51 arranged circumferentially and distributed within different slits 41 to form ignition points within the slits 41 at different circumferential positions of the Faraday cage 4. This arrangement significantly improves the reliability, efficiency, and uniformity of plasma ignition. Distributing the ignition points at different circumferential positions of the Faraday cage 4 means that the process gas can be attempted to be broken down simultaneously or sequentially at multiple angles of the reaction chamber. This greatly increases the probability that at least one location can successfully ignite the initial plasma in the harsh high-hydrogen environment, thereby improving the overall ignition success rate of the device. At the same time, igniting the plasma simultaneously from multiple circumferential positions of the Faraday cage 4 helps the generated initial plasma "seeds" to diffuse and fill the entire chamber cross-section more quickly and uniformly, avoiding the problems of uneven initial distribution or diffusion delay that may occur when the plasma is ignited from a single location. This multi-ignition point setup provides a good spatial distribution foundation for the alternating magnetic field generated by the induction coil 3 to uniformly maintain and enhance the plasma. It is beneficial to form a more uniform and stable plasma across the entire cross-section of the quartz tube 1, thereby improving the uniformity of wafer processing and potentially further reducing the concentrated bombardment of plasma on specific areas of the quartz tube 1.

[0052] In this embodiment, the ignition point refers to one or more specific locations within the slits 41 of the Faraday shielding cage 4, generated by the discharge end of the ignition head 51 when the first radio frequency energy is applied, capable of inducing local ionization of the process gas and forming an initial plasma. It is not a fixed physical structure, but a temporary, small spatial region where high-energy discharge occurs. Its function is to serve as the "spark" or initial core of the plasma ignition process. By setting the ignition head 51 within multiple slits 41 at different circumferential positions, it is equivalent to pre-establishing such "ignition points" at multiple specific locations circumferentially within the reaction chamber. This allows the initial plasma to be reliably ignited at multiple different angles within the chamber, which helps the initial plasma to be generated and diffused more quickly and uniformly, laying the foundation for the uniform maintenance of subsequent plasma.

[0053] In one embodiment, the second group includes multiple ignition heads 51 arranged axially and distributed along different axial segments of the same slit 41, for forming multiple ignition points at different axial positions within the same slit 41. This arrangement significantly enhances the uniformity and controllability of plasma ignition along the axial direction (i.e., the height direction) of the reaction chamber. Arranging multiple ignition heads 51 at different height positions within the same slit 41 is equivalent to establishing multiple independent initial discharge "sparks" along the axial direction of the slit 41. This firstly improves the ignition success rate, especially for chambers with large axial dimensions or where process gas distribution may be uneven, ensuring the possibility of plasma ignition at multiple heights along the axial direction. Secondly, simultaneous or sequential ignition from multiple axial positions facilitates faster and more uniform distribution and expansion of the initial plasma seed along the axial direction of the slit 41, avoiding the problem of plasma potentially concentrating only at a specific height (e.g., the middle or bottom) within the chamber, thus preventing uneven axial plasma density. This axial multi-ignition point design, combined with the circumferential multi-ignition point design, forms an ignition network distributed in three-dimensional space (circumferential and axial). This provides superior initial conditions for the induction coil 3 to subsequently generate a uniform alternating magnetic field, thereby exciting and maintaining a more uniform and stable plasma in three-dimensional space. Ultimately, this improves the uniformity and consistency of the wafer processing process.

[0054] In one embodiment, such as Figure 1As shown, the end of the ignition head 51 furthest from the first radio frequency switch 52 is disposed within the slit 41. When the alternating magnetic field enters the slit 41, the Faraday shielding cage 4 forms a circumferential physical shield around the ignition head 51, thereby reducing the influence of the ignition head 51 on the electric field during the plasma sustaining phase. This embodiment utilizes the structure of the Faraday shielding cage 4 itself to provide a passive and efficient electromagnetic shielding mechanism for the ignition head 51 during the plasma sustaining phase. When the discharge end of the ignition head 51 furthest from the first radio frequency switch 52 is disposed inside the slit 41, when high-power second radio frequency energy is supplied to the induction coil 3 to generate the strong alternating magnetic field required to sustain the plasma, the main body of the Faraday shielding cage 4 (the portion between adjacent slits 41, i.e., the structure of the Faraday shielding cage 4 excluding the slits 41) will circumferentially surround and "wrap" around the ignition head 51 extending into the slit 41. This circumferential physical structure allows most of the ignition head 51 (especially the discharge end) to be shielded by the conductive walls of the Faraday shielding cage 4, effectively blocking the direct coupling path between the ignition head 51 and the external strong alternating magnetic field. Therefore, the interference of the ignition head 51 on the electric and magnetic fields generated by the induction coil 3 during the plasma sustaining phase is significantly reduced. This ensures that during the plasma sustaining phase, the distribution of the electromagnetic field is mainly determined by the structure of the induction coil 3 and the slit 41 of the Faraday shielding cage 4, and is not affected by the additional conductor, the ignition head 51, thus guaranteeing the uniformity, stability, and purity of the plasma, and improving the controllability and consistency of the process.

[0055] In one embodiment, such as Figure 2As shown, the Faraday shielding cage 4 includes a main body. A receiving portion is formed on the outer wall of the main body near the slit 41, and this receiving portion communicates with the slit 41 to form a receiving cavity. An insulating element 6 is disposed within the receiving cavity, covering the ignition head 51 to prevent the ignition head 51 from interfering with the Faraday shielding cage 4 during discharge. Thus, by creating a receiving portion on the outer wall of the Faraday shielding cage 4 that communicates with the slit 41, a dedicated "receiving cavity" for accommodating the ignition head 51 is formed. This provides a stable and precise positioning and installation space for the ignition head 51, ensuring that its discharge end can reliably extend into the slit 41. More importantly, the insulating element 6, which covers the cavity wall and surrounds the ignition head 51 within the receiving cavity, serves the core function of achieving electrical isolation. When the ignition head 51 is supplied with the first radio frequency energy to perform a high-voltage discharge to ignite the plasma, the insulating component 6 effectively isolates the ignition head 51 from the Faraday shielding cage 4, which is a metallic conductor. This prevents the high-voltage discharge current from flowing directly to the Faraday shielding cage 4, causing a short circuit, arcing, or electrolytic corrosion (i.e., "interference") on the Faraday shielding cage 4. This not only protects the structural integrity of the Faraday shielding cage 4 but also ensures that the ignition energy is concentrated on breaking down the process gas, improving ignition efficiency and reliability. At the same time, this integrated design facilitates the maintenance and replacement of the ignition components.

[0056] In one embodiment, the receiving portion can be a groove, blind hole, or locally recessed area formed on the outer wall of the Faraday shield 4. Its shape typically matches the cross-section (e.g., circular) of the ignition head 51, for example, as a circular blind hole. The receiving portion communicates radially with its adjacent slit 41, thus structurally forming a "receiving cavity" for accommodating and positioning the ignition head 51, composed of the "slit 41" and the "receiving portion." This arrangement provides a compact and functionally defined integrated design. By directly machining the receiving portion onto the body of the Faraday shield 4, a stable and precisely positioned mounting base for the ignition head 51 can be created without additional complex assembly structures, ensuring that the discharge end of the ignition head 51 can be accurately aligned and extended into the slit 41. This integrated design simplifies the overall structure, improves component integration and reliability, and provides convenient and orderly space for subsequent installation of the insulating component 6.

[0057] In one embodiment, the receiving portion may be provided only on one side of the slit 41 in the axial direction, or it may be provided on both sides at the same time. The structure of the receiving portion may be regularly arranged or irregularly arranged, which will not be described in detail here.

[0058] In one embodiment, the insulating element 6 can be a sleeve or tubular structure made of a material with high dielectric strength, high temperature resistance, and resistance to plasma erosion (such as alumina ceramic, aluminum nitride ceramic, or quartz glass). Its inner diameter is slightly larger than the outer diameter of the ignition head 51, so that it fits over the ignition head 51; its outer wall is fixed to the cavity wall of the receiving cavity, thereby forming a complete insulating barrier between the ignition head 51 and the metal Faraday cage 4. The sleeve extends axially along the ignition head 51, and its length typically covers the portion of the ignition head 51 that extends into the receiving cavity and the slit 41. This structural design provides reliable and durable electrical isolation and physical protection. It ensures that during high-voltage discharge from the ignition head 51, the current is strictly limited between the ignition head 51 and the process gas, preventing leakage, sparking, or electrolytic corrosion (i.e., "interference") to the Faraday cage 4, protecting the integrity of the Faraday cage 4, and improving ignition reliability. Meanwhile, its high-temperature resistance and plasma erosion resistance ensure that it maintains stable performance in the high-temperature and reactive particle environment of the subsequent plasma maintenance stage, avoiding failure due to material degradation. In addition, the tubular sleeve structure facilitates assembly, positioning, and maintenance, providing a stable and insulated installation environment for the ignition head 51.

[0059] In one embodiment, the reaction chamber of the high-hydrogen process further includes a plasma monitoring device and a processing device. The plasma monitoring device is used to collect the initial plasma signal in real time. The processing device is connected to the first radio frequency switch 52 and the radio frequency power supply. The processing device controls the on / off state of the first radio frequency switch 52 according to the initial plasma signal.

[0060] This embodiment implements a closed-loop control system based on real-time feedback, thereby automating and precisely managing the transition of plasma from ignition to maintenance. The plasma monitoring device detects and feeds back the critical signal that "initial plasma has been successfully formed" in real time. Upon receiving this signal, the processing unit immediately and automatically executes two key control actions: first, it controls the first radio frequency switch 52 to close, cutting off the radio frequency energy to the ignition head 51, isolating the ignition head 51 from the circuit to prevent damage or interference during the subsequent high-power maintenance phase; second, it synchronously controls the radio frequency power supply, rapidly and smoothly switching from the first radio frequency energy required for ignition to the second radio frequency energy to supply the induction coil 3 to maintain the plasma. This automatic control based on the actual physical state avoids the problems of premature (unstable plasma) or late (overheating of the ignition head) switching that may occur due to relying on preset fixed delays, greatly improving the success rate of equipment ignition, operational reliability, process repeatability, and plasma state stability.

[0061] In one embodiment, the plasma monitoring device can be an optical emission spectrometer or a photodetector. Its core function is to capture physical signals related to plasma generation within the reaction chamber in real time. For example, an optical emission spectrometer analyzes the spectral intensity of plasma emission, while a photodetector monitors changes in light intensity at specific wavelengths to accurately determine whether the initial plasma has been successfully ignited. This plasma monitoring device is typically installed in a location with a good view of the inside of the reaction chamber, such as through an observation window on the quartz tube 1.

[0062] In one embodiment, the processing unit can be a programmable logic controller, a microcontroller unit, or an industrial control computer. Its core function is to receive real-time signals from the plasma monitoring device and execute a series of precise timing and control commands according to preset program logic.

[0063] In one embodiment, the reaction chamber of the high-hydrogen process further includes a driving component of an external device connected to the ignition head 51, to drive the ignition head 51 to move into the slit 41 before ignition and to drive the ignition head 51 out of the slit 41 after ignition. This is achieved by introducing first radio frequency energy into the ignition element 5, causing the process gas inside the quartz tube 1 to break down, ignite, and form an initial plasma, after which the ignition head 51 is driven to move radially out of the slit 41 along the Faraday shielding cage 4.

[0064] In one embodiment, the drive component can be a linear motor, stepper motor, servo motor, or hydraulic drive device, whose core function is to provide controllable linear motion. This drive component is connected to the ignition head 51 via a mechanical transmission mechanism (such as a lead screw, guide rail, or connecting rod). Before ignition, the processing unit issues a command to the drive component, which pushes the ignition head 51 precisely along a straight line (typically perpendicular to the surface of the Faraday cage 4, i.e., radially), causing its discharge end to extend into a predetermined position within the slit 41. After successful ignition, the processing unit again controls the drive component to move the ignition head 51 radially out of the slit 41, returning it to a "non-interference" position away from the slit 41. This arrangement provides an automated, repeatable, and precise position control scheme. By inserting and removing the ignition head 51 into and out of the slit 41 "on demand," it is ensured that the ignition head 51 is located in the electric field concentration area of ​​the slit 41 during the ignition stage to achieve efficient and reliable ignition. At the same time, the ignition head 51 can be completely removed during the subsequent plasma maintenance stage. This fundamentally eliminates the interference of the ignition head 51 on the plasma uniformity in a strong electromagnetic field and avoids it from being continuously bombarded by high-temperature plasma. This optimizes the performance of the system at different stages, extends the life of the ignition head 51, and improves the process stability.

[0065] In one embodiment, the reaction chamber of the high-hydrogen process further includes a position detection device communicatively connected to the drive component and the processing unit. The position detection device collects the movement position signal of the ignition head 51. The processing unit controls the on / off state of the drive component based on the movement position signal of the ignition head 51, thereby controlling the position of the ignition head 51 before and after ignition. This embodiment achieves real-time sensing and closed-loop control of the movement position of the ignition head 51, thus upgrading the "dynamic positioning" process of the ignition head 51 from open-loop operation to high-precision automated control. The position detection device collects the precise position signal of the ignition head 51 in real time and feeds it back to the processing unit. The processing unit compares this signal with preset target positions (such as "extending into the slit 41 to a specified depth during ignition" and "completely removing from the slit 41 after ignition") and controls the start and stop of the drive component accordingly. The core advantage of this closed-loop control is that it ensures the high accuracy and repeatability of the ignition head 51 position. It can prevent ignition failure due to the ignition head 51 not being in place, and also prevent it from interfering with the plasma if it is not completely removed after ignition. At the same time, this automated position confirmation and linkage control improves the reliability and safety of equipment operation, avoids equipment collisions or performance degradation that may be caused by positioning errors, and is a key technical guarantee to ensure that the aforementioned "on-demand movement" strategy can be executed stably and accurately.

[0066] In one embodiment, the position detection element can be a non-contact sensor (such as an inductive proximity switch, a capacitive proximity switch, or a photoelectric sensor) or a linear encoder. Its core function is to detect the linear displacement of the ignition head 51 relative to a reference point (such as the outer wall of the Faraday cage 4) and generate a corresponding position signal.

[0067] In one embodiment, the circumferential width of each slit 41 is between 1 mm and 20 mm. This embodiment achieves a key balance optimization between the electromagnetic shielding function of the Faraday shielding cage 4 and the plasma generation efficiency. The slit 41 is the physical manifestation of this balance: on the one hand, a sufficiently narrow width (lower limit 1 mm) ensures that the Faraday shielding cage 4 can effectively block the excessively strong capacitive coupling electric field between the induction coil 3 and the plasma, thereby significantly reducing the direct bombardment of high-energy ions (especially hydrogen ions) on the inner wall of the quartz tube 1, playing a core role in protecting the quartz tube 1 and extending its service life. On the other hand, a sufficiently wide width (upper limit 20 mm) ensures that the high-frequency alternating magnetic field generated by the induction coil 3 has enough space to penetrate the slit 41 and enter the interior of the quartz tube 1, thereby effectively exciting, maintaining, and controlling the plasma. If the slit 41 is too narrow, the magnetic field penetration will be excessively restricted, resulting in insufficient plasma power; if it is too wide, the shielding effect will be greatly reduced, and it will be unable to effectively suppress ion bombardment. Therefore, the range of 1mm to 20mm is the preferred range derived from a large amount of engineering practice and electromagnetic simulation. It enables the equipment to maintain high-density and stable plasma in the harsh high-hydrogen process, while controlling the risk of plasma erosion of quartz tube 1 to an acceptable level, thereby ensuring the long-term stable operation of the equipment and the process yield.

[0068] To address the problems existing in the prior art, embodiments of the present invention also provide a plasma processing device, such as... Figure 1 As shown, the plasma processing equipment includes the reaction chamber of the high-hydrogen process, a process gas supply system, a vacuum system, and a radio frequency power supply: the reaction chamber of the high-hydrogen process; the process gas supply system is connected to the quartz tube 1 to supply process gas into the quartz tube 1; the vacuum system is connected to the quartz tube 1 to extract the gas in the quartz tube 1 and maintain the required vacuum level in the quartz tube 1; the radio frequency power supply is electrically connected to the induction coil 3 and the ignition element 5.

[0069] In one embodiment, the plasma processing equipment can be a plasma etching equipment, a plasma-enhanced chemical vapor deposition equipment, and a plasma photoresist removal equipment. In etching applications, the equipment can utilize the generated high-hydrogen or other reactive plasma to selectively or anisotropically etch materials (such as silicon dioxide, silicon nitride, or metals) on the wafer surface. In deposition applications, the equipment can cause gaseous precursors to undergo chemical reactions in a plasma environment, depositing thin films (such as silicon nitride, silicon oxide, etc.) on the wafer surface. In photoresist removal applications, high-hydrogen (H2) or other oxygen-containing plasmas can effectively remove the photoresist layer from the wafer surface. Through its unique design of integrating the ignition element 5 within the slit 41 of the Faraday cage 4, and its energy control method of "low-power ignition followed by high-power maintenance," the equipment can achieve reliable, uniform ignition and stable maintenance of the plasma in harsh process gas environments such as high-hydrogen environments. This not only solves the problem of process fluctuations caused by difficult ignition or uneven plasma in traditional equipment, but also reduces the erosion of key components such as quartz tube 1 by plasma through Faraday shielding and optimized ignition head 51 management, thereby significantly improving the stability, uniformity, repeatability and service life of the above etching, deposition and desizing processes.

[0070] While embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of the present invention. Furthermore, the present invention described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A reaction chamber for a high-hydrogen process, characterized in that, Includes quartz tube, induction coil, Faraday cage and ignition element; The quartz tube is located at the top of the processing chamber; The Faraday shielding cage is arranged between the quartz tube and the induction coil, and the Faraday shielding cage has a number of slits that penetrate its sidewalls and extend axially. The ignition element is disposed in at least one of the slits and connected to a radio frequency power supply to introduce first radio frequency energy that causes the process gas in the quartz tube to be broken down and ignited to form an initial plasma. The induction coil is arranged around the outside of the quartz tube and connected to the radio frequency power supply to introduce second radio frequency energy for generating an alternating magnetic field, and to allow the alternating magnetic field to enter the quartz tube through the slit to maintain or increase the ignited plasma. The ignition element includes an ignition head and a first radio frequency switch; The Faraday shielding cage includes a main body, and the main body has a receiving portion on its outer side wall near the slit, the receiving portion communicating with the slit to form a receiving cavity; An insulating component is provided inside the receiving cavity, and the insulating component covers the ignition head to prevent the ignition head from interfering with the Faraday shielding cage during discharge.

2. The reaction chamber for the high-hydrogen process according to claim 1, characterized in that, The power of the first radio frequency energy is less than or equal to the power of the second radio frequency energy, the power of the first radio frequency energy is 10W-1000W, and the power of the second radio frequency energy is 1000W-6000W.

3. The reaction chamber for the high-hydrogen process according to claim 1, characterized in that, At least a portion of the ignition head is disposed within the slit; The first radio frequency switch is located in the circuit between the ignition head and the grounding balance capacitor. The grounding balance capacitor is connected to the radio frequency power supply to control the connection and disconnection between the radio frequency power supply and the ignition head, thereby inputting or stopping the input of the first radio frequency energy to the ignition head.

4. The reaction chamber for the high-hydrogen process according to claim 3, characterized in that, The ignition head includes a first group and a second group; The first group includes a plurality of ignition heads arranged circumferentially and distributed in different slits, for forming ignition points in the slits located at different circumferential positions of the Faraday cage; The second group includes multiple ignition heads arranged axially and distributed in different axial segments of the same slit, for forming multiple ignition points at different axial positions within the same slit.

5. The reaction chamber for the high-hydrogen process according to claim 3, characterized in that, The end of the ignition head furthest from the first radio frequency switch is positioned within the slit to fully utilize the physical characteristic of the relatively concentrated electric field within the slit, which facilitates the breakdown of the process gas.

6. The reaction chamber for the high-hydrogen process according to claim 3, characterized in that, It also includes a plasma monitoring device and a processing device. The plasma monitoring device is used to collect the initial plasma signal in real time. The processing device is connected to the first radio frequency switch and the radio frequency power supply. The processing device controls the on / off state of the first radio frequency switch according to the initial plasma signal.

7. The reaction chamber for the high-hydrogen process according to claim 6, characterized in that, It also includes a drive component for a peripheral device connected to the ignition head, so as to drive the ignition head to move into the slit before ignition and to drive the ignition head out of the slit after ignition.

8. The reaction chamber for the high-hydrogen process according to claim 7, characterized in that, It also includes a position detection element that is communicatively connected to the drive component and the processing unit. The position detection element is used to collect the movement position signal of the ignition head. The processing unit controls the on / off state of the drive component according to the movement position signal of the ignition head, so as to control the position of the ignition head before and after ignition.

9. The reaction chamber for the high-hydrogen process according to claim 1, characterized in that, The circumferential width of each slit is between 1 mm and 20 mm.

10. A plasma processing device, characterized in that, include: The reaction chamber for the high-hydrogen process as described in any one of claims 1 to 9; A process gas supply system is connected to a quartz tube to supply process gas into the quartz tube; A vacuum system, connected to the quartz tube, is used to extract gas from the quartz tube and maintain the required vacuum level in the quartz tube; The radio frequency power supply is electrically connected to the induction coil and ignition element.

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