Modeling method and electronic device based on electron backscatter diffraction data
By generating explicit grain boundary layers through data preprocessing and morphological reconstruction, the problems of high computational cost and unrealistic grain boundary morphology in existing technologies are solved, and efficient and accurate finite element mesh modeling of polycrystalline materials is achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- XIAN THERMAL POWER RES INST CO LTD
- Filing Date
- 2026-01-30
- Publication Date
- 2026-06-05
AI Technical Summary
Existing technologies for converting electron backscatter diffraction data into finite element analysis mesh models suffer from high computational costs, element distortion, and unrealistic grain boundary morphology. In particular, when simulating grain boundary slip and corrosion, existing methods cannot reflect the physical width of grain boundaries and may lead to topological distortion.
By preprocessing and coarsening the data, a clean grain map is generated. Topology optimization is performed and the grain boundary space range is identified. A constrained morphological reconstruction is used to generate an explicit grain boundary layer. Its width is controlled and burrs are trimmed to generate a high-quality finite element mesh.
It effectively reduces model size, generates explicit grain boundary layers with user-controllable width, ensures computational efficiency and physical realism, and is suitable for simulating grain boundary slip and corrosion in polycrystalline materials.
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Figure CN122154282A_ABST