Display device and method of manufacturing the same

Abstract

The application discloses a display device and a manufacturing method thereof, and belongs to the technical field of display, and aims to at least improve the problem that the insulating layer is prone to breakage under external force, thereby causing the display device to fail. The display device comprises a display panel, a touch function layer and a light shielding layer which are sequentially stacked, the touch function layer comprises a first metal layer, a second metal layer and an organic insulating layer between the first metal layer and the second metal layer, the second metal layer is located on the side of the organic insulating layer away from the display panel, the organic insulating layer comprises a first insulating part and a second insulating part, the second metal layer is supported on the first insulating part, and the first top surface of the first insulating part and the second top surface of the second insulating part have a step difference.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a display device and a method for manufacturing the same. Background Technology

[0002] Touch display devices typically include a display panel and a touch functional layer located on the light-emitting side of the display panel. The touch functional layer includes two metal layers and an insulating layer between them.

[0003] In related technologies, the insulating layer is made of inorganic materials such as silicon nitride. This makes the insulating layer prone to cracking when the display device is subjected to external impact or bending, which can lead to the failure of the display device. Summary of the Invention

[0004] This application provides a display device and a method for manufacturing the same, which at least improves the problem in the related art where the insulating layer is prone to breakage under external force, leading to display device failure.

[0005] To achieve the above objectives, according to a first aspect of this application, a display device is provided, comprising:

[0006] Display panel; and A touch function layer is located on the light-emitting side of the display panel. The touch function layer includes a first metal layer, a second metal layer, and an organic insulating layer located between the first metal layer and the second metal layer. The second metal layer is located on the side of the organic insulating layer away from the display panel. The organic insulating layer includes a first insulating portion and a second insulating portion. The second metal layer is supported on the first insulating portion. The first top surface of the first insulating portion and the second top surface of the second insulating portion have a step difference.

[0007] In some embodiments, the second metal layer includes an electrode assembly, and the display device further includes a light-shielding layer disposed on the side of the second metal layer opposite to the organic insulating layer and covering the electrode assembly.

[0008] In some embodiments, the light-shielding layer contacts both the electrode assembly and the second insulating portion.

[0009] In some embodiments, the sum of the step height and the thickness of the electrode assembly is less than the thickness of the light-shielding layer.

[0010] In some embodiments, the step difference is less than or equal to 0.5 μm.

[0011] In some embodiments, the first metal layer includes connecting lines, the thickness of which is greater than the thickness of the electrode assembly.

[0012] In some embodiments, the angle between the side surface of the first insulating portion and the second top surface is greater than or equal to 90° and less than or equal to 100°.

[0013] In some embodiments, the light-shielding layer has a plurality of openings, each opening exposing a portion of the second top surface; the display device further includes a plurality of color resist blocks, each of the color resist blocks being located within a corresponding opening and in contact with the second top surface.

[0014] According to a second aspect of this application, a method for manufacturing a display device is provided, the method comprising: Provide a display panel; and A touch function layer is formed on the light-emitting side of the display panel. The touch function layer includes a first metal layer, a second metal layer, and an organic insulating layer located between the first metal layer and the second metal layer. The second metal layer is located on the side of the organic insulating layer away from the display panel. The organic insulating layer includes a first insulating portion and a second insulating portion. The second metal layer is supported on the first insulating portion. The first top surface of the first insulating portion and the second top surface of the second insulating portion have a step difference.

[0015] In some embodiments, the second metal layer includes an electrode assembly, and the fabrication method further includes: forming a light-shielding layer covering the electrode assembly on the side of the second metal layer opposite to the organic insulating layer; the step of forming a touch function layer on the light-emitting side of the display panel includes: forming a first metal layer on the light-emitting side of the display panel; forming an organic material layer on the first metal layer, wherein the surface of the organic material layer opposite to the first metal layer is planar; forming a metal material layer on the organic material layer; and patterning the metal material layer to form the second metal layer and the organic insulating layer.

[0016] In the display device provided in this application embodiment, since the touch function layer includes an organic insulating layer located between the first metal layer and the second metal layer, the bending and impact resistance of the display device can be effectively improved, thereby addressing the problem in related technologies where the inorganic insulating layer is prone to cracking under external force, leading to display device failure. Furthermore, since the organic insulating layer includes a first insulating portion and a second insulating portion, and the first top surface of the first insulating portion and the second top surface of the second insulating portion have a step difference, the area around the first insulating portion can provide a buffer space for deformation of the first insulating portion, thereby further improving the problem of the organic insulating layer cracking under external force.

[0017] Other features and advantages of this application will be described in detail in the following detailed description section. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 These are schematic diagrams of the structure of a display device provided in some embodiments of this application; Figure 2 These are schematic diagrams of the display device provided in other embodiments of this application; Figure 3 This is a schematic diagram of the structure of the touch function layer according to some embodiments of this application; Figure 4 This is a flowchart of a method for manufacturing a display device according to some embodiments of this application; Figures 5A to 5C This is a flowchart illustrating the manufacturing steps of a touch function layer according to some embodiments of this application. Detailed Implementation

[0020] The technical solutions in the embodiments of this application will now be described with reference to the accompanying drawings. The described technical solutions are for illustrative purposes only and should not be construed as limiting the scope of protection of this application.

[0021] In the description of this application, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Furthermore, the terms "first," "second," and similar words do not indicate any order, quantity, or importance, but are only used to distinguish different technical features. The term "multiple" and similar words indicate two or more unless otherwise expressly defined.

[0022] In this application, the descriptions of the various embodiments each have their own emphasis. Parts not described in detail in a particular embodiment can be found in the relevant descriptions of other embodiments. The embodiments, implementation methods, examples, and related technical features of this application can be combined and substituted for each other without conflict.

[0023] Some embodiments of this application provide a display device, such as... Figure 1As shown, the display device 100 includes a display panel 10 and a touch function layer 20.

[0024] The touch function layer 20 is located on the light-emitting side of the display panel 10. The touch function layer 20 includes a first metal layer 21, a second metal layer 22, and an organic insulating layer 23 located between the first metal layer 21 and the second metal layer 22. The second metal layer 22 is located on the side of the organic insulating layer 23 away from the display panel 10. The organic insulating layer 23 includes a first insulating portion 231 and a second insulating portion 232. The second metal layer 22 is supported on the first insulating portion 231. The first top surface TS1 of the first insulating portion 231 and the second top surface TS2 of the second insulating portion 232 have a step difference D.

[0025] It is worth noting that the first top surface TS1 of the first insulating portion 231 refers to the surface of the first insulating portion 231 facing away from the display panel 10, and the second top surface TS2 of the second insulating portion 232 refers to the surface of the second insulating portion 232 facing away from the display panel 10. Furthermore, the first insulating portion 231 protrudes from the second top surface TS2 of the second insulating portion 232, and the first top surface TS1 of the first insulating portion 231 is further away from the display panel 10 than the second top surface TS2 of the second insulating portion 232.

[0026] For the display device 100 provided in this application embodiment, since the touch function layer 20 includes an organic insulating layer 23 located between the first metal layer 21 and the second metal layer 22, the bending and impact resistance of the display device can be effectively improved, thereby improving the problem in the related art where the inorganic insulating layer is prone to breakage under external force, leading to the failure of the display device 100. Furthermore, since the organic insulating layer 23 includes a first insulating portion 231 and a second insulating portion 232, and the first top surface TS1 of the first insulating portion 231 and the second top surface TS2 of the second insulating portion 232 have a step difference D, the area around the first insulating portion 231 can provide a buffer space for the deformation of the first insulating portion 231, thereby further improving the problem of the organic insulating layer 23 breaking under external force.

[0027] In some embodiments, the second metal layer 22 includes an electrode assembly 221 supported on the first insulating portion 231, and the display device 100 further includes a light-shielding layer 30 located on the side of the second metal layer 22 away from the organic insulating layer 23, the light-shielding layer 30 covering the electrode assembly 221.

[0028] In this case, the light-shielding layer 30 forms a continuous cover over the top and sides of the electrode assembly 221. Since the light-shielding layer 30 covers the electrode assembly 221, the reflection of external light (such as ambient light) by the electrode assembly 221 can be effectively improved, thereby enhancing the contrast of the display device 100.

[0029] In some examples, the organic insulating layer 23 can be a low-temperature organic overcoating (OC) material, such as polyimide, epoxy resin, acrylic, polyester, photoresist, polyacrylate, polyamide, siloxane and other resin materials.

[0030] In some embodiments, please continue reading Figure 1 The light-shielding layer 30 is in contact with the electrode assembly 221 and the second insulating part 232, respectively.

[0031] This configuration, where the light-shielding layer 30 is in contact with the electrode assembly 221, avoids the need for a planarization layer between the electrode assembly 221 and the light-shielding layer 30, which would increase the thickness of the display device 100 and raise manufacturing costs. Furthermore, since the first top surface TS1 of the first insulating portion 231 and the second top surface TS2 of the second insulating portion 232 have a step difference D, and the light-shielding layer 30 is in contact with both the second insulating portion 232 and the electrode assembly 221, the light-shielding layer 30 simultaneously contacts the electrode assembly 221, the first insulating portion 231, and the second insulating portion 232. This effectively ensures the covering effect of the light-shielding layer 30 on the electrode assembly 221, improving the contrast of the display device 100. It also increases the contact area between the light-shielding layer 30, the electrode assembly 221, and the organic insulating layer 23, enhancing the anti-peeling ability of the light-shielding layer 30.

[0032] The inventors discovered that when the step difference D between the first top surface TS1 and the second top surface TS2 is too large or the thickness of the electrode assembly 221 is too large, the light-shielding layer 30 is difficult to form an effective covering on the electrode assembly 221. For example, the light-shielding layer 30 may break at the position of the first top surface TS1 and the second top surface TS2, making it difficult for the light-shielding layer 30 to cover the side of the electrode assembly 221.

[0033] In some embodiments, the sum of the step difference D and the thickness H1 of the electrode assembly 221 is less than the thickness H2 of the light-shielding layer 30.

[0034] In this case, the probability of the material of the light-shielding layer 30 crossing the step formed by the first insulating part 231 and the electrode assembly 221 can be increased, thereby effectively improving the problem that the light-shielding layer 30 is difficult to form an effective coating on the electrode assembly 221.

[0035] In some embodiments, the first metal layer 21 includes a connecting line 211, the thickness H3 of which is greater than the thickness H1 of the electrode assembly 221.

[0036] This configuration results in a relatively small thickness H1 for the electrode assembly 221, thus reducing the sum of the step difference D and the thickness H1 of the electrode assembly 221. This further increases the probability that the material of the light-shielding layer 30 will cross the step formed by the first insulating portion 231 and the electrode assembly 221, thereby improving the coverage effect of the light-shielding layer 30 on the electrode assembly 221. Furthermore, reducing the thickness H1 of the electrode assembly 221 also improves the manufacturing efficiency of the electrode assembly 221.

[0037] In some examples, the thickness H3 of the connecting line 211 can be 0.4 μm.

[0038] In some embodiments, the thickness H2 of the light-shielding layer 30 is less than or equal to 1.4 μm. The light-shielding layer 30 is made of, for example, a black photoresist material.

[0039] The material of the light-shielding layer 30 typically has good adhesion. However, if the thickness H2 of the light-shielding layer 30 is set too large, material residue from the light-shielding layer 30 may easily remain on the second top surface TS2 of the second insulating portion 232 during the manufacturing process, affecting the display effect of the display device 100. In this embodiment, by controlling the thickness H2 of the light-shielding layer 30 to below 1.4 μm, the problem of material residue on the second top surface TS2 of the light-shielding layer 30 can be effectively improved.

[0040] In some examples, the thickness H2 of the light-shielding layer 30 is greater than or equal to 1 μm. Exemplarily, the thickness H2 of the light-shielding layer 30 can be 1 μm, 1.05 μm, 1.1 μm, 1.15 μm, 1.2 μm, 1.25 μm, 1.3 μm, 1.35 μm, or 1.4 μm, etc.

[0041] In some embodiments, the step difference D is less than or equal to 0.5 μm. For example, the step difference D can be 0.35 μm, 0.4 μm, 0.45 μm, or 0.5 μm, etc.

[0042] In this case, by reducing the step difference D, the sum of the step difference D and the thickness H1 of the electrode assembly 221 can be reduced, thereby further increasing the probability that the material of the light-shielding layer 30 crosses the step formed by the first insulating part 231 and the electrode assembly 221, and thus improving the covering effect of the light-shielding layer 30 on the electrode assembly 221.

[0043] In some examples, the segment difference D is greater than 0 and less than or equal to 0.3 μm.

[0044] This configuration allows the sum of the step difference D and the thickness H1 of the electrode assembly 221 to be further reduced, thereby ensuring that the light-shielding layer 30 forms a good covering effect on the electrode assembly 221.

[0045] For example, the step difference D can be 0.1μm, 0.15μm, 0.2μm, 0.25μm, or 0.3μm, etc.

[0046] In some embodiments, please continue reading Figure 1 The angle between the side surface SS of the first insulating part 231 and the second top surface TS2 is greater than or equal to 90° and less than or equal to 100°.

[0047] In this case, the taper angle of the first insulating portion 231 is in the range of 80° to 90°. When the light-shielding layer 30 covers the electrode assembly 221, since the taper angle of the first insulating portion 231 is relatively large, the length of the side surface SS of the first insulating portion 231 in the horizontal direction (which is perpendicular to the thickness direction of the display device 100) is small. This reduces the coverage area of ​​the light-shielding layer 30 on the electrode assembly 221, thereby increasing the light-emitting area of ​​the display device 100 and improving the display brightness of the display device 100.

[0048] It is worth noting that, Figure 1 The diagram shows the case where the angle between the side surface SS of the first insulating part 231 and the second top surface TS2 is equal to 90°. This angle can also be 91°, 92°, 93°, 94°, 95°, 96°, 97°, 98°, 99°, or 100°, etc.

[0049] In some embodiments, such as Figure 1 and Figure 2 As shown, the light-shielding layer 30 has multiple openings K, each opening K exposing a portion of the second top surface TS2.

[0050] Please continue reading. Figure 2 The display device 100 also includes a color resist layer 40, in which a plurality of color resist blocks 41 are provided, each color resist block 41 being located in a corresponding opening K and in contact with the second top surface TS2.

[0051] Since the color resist block 41 is in contact with the second top surface TS2, and the second top surface TS2 is closer to the display panel than the first top surface TS1, the color resist block 41 can be partially accommodated in the recess corresponding to the organic insulating layer 23. This helps to reduce the distance between the top surface of the color resist block 41 (i.e. the surface of the color resist block 41 facing away from the display panel 10) and the display panel 10, thereby reducing the thickness of the display device 100.

[0052] In some examples, the multiple color resist blocks 41 may include a first color resist block 411, a second color resist block 412, and a third color resist block 413. Each color resist block 41 is located above a light-emitting device, thereby modulating the light emitted by that light-emitting device. For example, the first color resist block 411 transmits red light, the second color resist block 412 transmits green light, and the third color resist block 413 transmits blue light. With this configuration, by controlling the on or off state of the light-emitting devices corresponding to different color resist blocks 41, the display device 100 can display a color image.

[0053] In some examples, the display device 100 also includes a protective layer 50 covering the color resist layer 40. The protective layer 50 may be made of an organic material, such as polyimide.

[0054] In some embodiments, please continue reading Figure 2 The display panel 10 includes a substrate 11, a pixel circuit layer 12, a light-emitting device layer 13, and an encapsulation layer 14 stacked sequentially. In this case, the display panel 10 can be a flexible display panel.

[0055] The pixel circuit layer 12 includes multiple pixel circuits, and the light-emitting device layer 13 includes multiple light-emitting devices. Each light-emitting device includes an anode 132, a light-emitting layer 133, and a cathode 134 stacked sequentially. The anode 132 is electrically connected to the pixel circuit. The anodes 132 of the multiple light-emitting devices are spaced apart from each other, and the cathodes 134 of the multiple light-emitting devices are interconnected. Holes can be injected into the anode 132, and electrons can be injected into the cathode 134. Holes and electrons recombine in the light-emitting layer 133 to emit light, thereby realizing the display of the display panel 10.

[0056] In addition, the substrate 11 can be a flexible substrate, and the material of the flexible substrate can be one of polyimide, polycarbonate, polynorbornene, and polyethylene terephthalate.

[0057] In this embodiment, by setting the display panel 10 as a flexible display panel and the touch function layer 20 located on the display panel 10, during the bending process of the display panel 10 and the touch function layer 20 as a whole, since the touch function layer 20 is provided with an organic insulating layer 23, the problem of the organic insulating layer 23 easily breaking during the bending process can be avoided.

[0058] In some examples, the pixel circuit includes multiple thin-film transistors (TFTs) and at least one storage capacitor. Each TFT comprises a gate metal layer 111 (for forming the gate of the TFT), a gate insulating layer 112, an active layer 113, an interlayer dielectric layer 114, and a source / drain metal layer 115 (for forming the source and drain of the TFT) sequentially disposed on a substrate 11. Furthermore, a planarization layer 116 may be disposed on the side of the source / drain metal layer 115 opposite to the interlayer dielectric layer 114, allowing the drain of the TFT to be connected to the anode 132 of the light-emitting device via vias in the planarization layer 116.

[0059] In some examples, the light-emitting device layer 13 further includes a pixel defining layer 131 located on the planarization layer 116, the pixel defining layer 131 defining a plurality of pixel openings, each pixel opening containing a light-emitting device. The anodes 132 of adjacent light-emitting devices and the light-emitting layer 133 are separated by the pixel defining layer 131, and the cathodes 134 of each light-emitting device are connected as a whole, that is, the cathodes 134 are a single layer.

[0060] Furthermore, the encapsulation layer 14 covers multiple light-emitting devices to ensure their stable operation. Exemplarily, the encapsulation layer 14 includes at least one encapsulation film. For example, the encapsulation layer 14 may include three encapsulation films stacked sequentially. The encapsulation film in the middle layer may be made of an organic material, while the encapsulation films on both sides may be made of inorganic materials. The inorganic materials may be one or more of silicon nitride, silicon oxide, or silicon oxynitride.

[0061] In some embodiments, such as Figure 3 As shown, the electrode assembly 221 includes a plurality of first touch electrodes 221A arranged side by side and a plurality of second touch electrodes 221B arranged side by side. Each first touch electrode 221A includes a plurality of first electrode blocks 2211 arranged and connected sequentially along a first direction X. Each second touch electrode 221B includes a plurality of second electrode blocks 2212 arranged and spaced apart along a second direction Y, the second direction Y intersecting the first direction X. The angle between the first direction X and the second direction Y can be a right angle. For example, the plurality of first touch electrodes 221A are arranged at intervals along the second direction Y, and the plurality of second touch electrodes 221B are arranged at intervals along the first direction X. In each first touch electrode 221A, any two adjacent first electrode blocks 2211 are connected by a connecting portion 2213, which, along with the first electrode blocks 2211, is located in the second metal layer 22, thus allowing each first touch electrode 221A to form an integral structure.

[0062] In each second touch electrode 221B, any two adjacent second electrode blocks 2212 are connected by a connecting line 211 located in the first metal layer 21. For example, the two ends of the connecting line 211 are respectively connected to two adjacent second electrode blocks 2212 through vias located in the organic insulating layer 23.

[0063] This configuration, utilizing multiple connecting lines 211 located in the first metal layer 21, allows for complete connection of each second touch electrode 221B. The first touch electrode 221A and the second touch electrode 221B intersect at the positions of the connecting lines 211, thus preventing short circuits between them. Furthermore, since the connecting lines 211 and the first touch electrode 221A have overlapping areas and are mutually insulated, a capacitance is formed between them. When a finger touches this area, the original capacitance changes, and by detecting this capacitance change, the position of the touch point can be determined.

[0064] Furthermore, since the electrode assembly 221 includes a first touch electrode 221A and a second touch electrode 221B, and the light-shielding layer 30 covers the electrode assembly 221, the light-shielding layer 30 can directly cover the electrode assembly 221, which occupies a relatively large light-emitting area in the touch functional layer 20, thereby improving the light-shielding effect of the light-shielding layer 30 on the touch functional layer 20, and thus improving the contrast of the display device 100.

[0065] In some examples, the first touch electrode 221A can be a driving electrode, while the second touch electrode 221B can be a sensing electrode. Alternatively, the first touch electrode 221A can be a sensing electrode, while the second touch electrode 221B can be a driving electrode.

[0066] In some examples, the first electrode block 2211 and the second electrode block 2212 may each have a mesh structure.

[0067] In some examples, the first metal layer 21 also includes multiple touch leads 222, some of which are connected to the first touch electrode 221A, and others are connected to the second touch electrode 221B. One end of each touch lead 222 is connected to either the first touch electrode 221A or the second touch electrode 221B, and the other end is electrically connected to the touch chip. This allows for the transmission of touch driving signals or touch sensing signals, thereby enabling the detection of the touch point position.

[0068] In some embodiments, please refer to Figure 2The touch function layer 20 may further include a touch buffer layer 24 located between the encapsulation layer 14 and the first metal layer 21. The touch buffer layer 24 may be made of organic materials, such as polyimide; or it may be made of inorganic materials, such as silicon nitride, silicon oxide, silicon oxynitride, etc.

[0069] Some embodiments of this application also provide a method for manufacturing a display device 100; please refer to [link to relevant documentation]. Figure 4 and combined Figure 1 The manufacturing method includes the following steps.

[0070] S10, Provide a display panel 10.

[0071] S20. A touch function layer 20 is formed on the light-emitting side of the display panel 10. The touch function layer 20 includes a first metal layer 21, a second metal layer 22, and an organic insulating layer 23 located between the first metal layer 21 and the second metal layer 22. The second metal layer 22 is located on the side of the organic insulating layer 23 away from the display panel 10. The organic insulating layer 23 includes a first insulating portion 231 and a second insulating portion 232. The second metal layer 22 is supported on the first insulating portion 231. The first top surface TS1 of the first insulating portion 231 and the second top surface TS2 of the second insulating portion 232 have a step difference D.

[0072] In this embodiment, since the touch function layer 20 includes an organic insulating layer 23 located between the first metal layer 21 and the second metal layer 22, the bending and impact resistance of the display device can be effectively improved, thereby addressing the problem in related technologies where inorganic insulating layers are prone to breakage under external force, leading to display device 100 failure. Furthermore, since the organic insulating layer 23 includes a first insulating portion 231 and a second insulating portion 232, and the first top surface TS1 of the first insulating portion 231 and the second top surface TS2 of the second insulating portion 232 have a step difference D, the area around the first insulating portion 231 can provide a buffer space for deformation of the first insulating portion 231, thereby further improving the problem of the organic insulating layer 23 breaking under external force.

[0073] In some examples, the second metal layer 22 includes an electrode assembly 221. The fabrication method also includes step S30.

[0074] S30, a light-shielding layer 30 covering the electrode assembly 221 is formed on the side of the second metal layer 22 away from the organic insulating layer 23.

[0075] Since the light-shielding layer 30 covers the electrode assembly 221, the reflection of external light (such as ambient light) by the electrode assembly 221 can be effectively improved, thereby enhancing the contrast of the display device 100.

[0076] In some embodiments, step S20 includes the following steps.

[0077] S21. A first metal layer 21 is formed on the light-emitting side of the display panel 10.

[0078] S22, please refer to Figure 5A An organic material layer 230 is formed on the first metal layer 21, and the surface of the organic material layer 230 facing away from the first metal layer 21 is planar.

[0079] S23, please refer to Figure 5B A metal material layer 220 is formed on the organic material layer 230.

[0080] S24, please refer to Figure 5C The metal material layer 220 is patterned to form a second metal layer 22 and an organic insulating layer 23.

[0081] For example, in the process of patterning the metal material layer 220, photoresist is first coated on the metal material layer 220, and then exposure and development steps are performed sequentially, so that the part of the metal material layer 220 to be etched is exposed, and the part to be retained is covered by photoresist. Then, the part of the metal material layer 220 to be etched is etched (for example, by a dry etching process), and the part of the metal material layer 220 that is retained forms the second metal layer 22. After the formation of the second metal layer 22, the surface of the organic insulating layer 23 usually needs to be post-processed to remove by-products from the etching process of the metal material layer 220. However, due to the poor etching resistance of the organic material layer 230, the post-processing step may also cause some areas of the organic material layer 230 to be etched away, thereby forming an organic insulating layer 23 with depressions. The depressed areas correspond to the second insulating portion 232, and the non-depression areas correspond to the first insulating portion 231.

[0082] The inventors discovered that by controlling the pressure in the post-processing steps during the patterning of the metal material layer 220, the depth of the recess can be adjusted, thereby regulating the step difference D between the first top surface TS1 and the second top surface TS2. For example, under otherwise unchanged conditions, reducing the pressure in the post-processing steps from 200 mT to 50 mT can control the step difference D to below 0.3 μm, thus ensuring that the light-shielding layer 30 forms a good coating on the electrode assembly 221.

[0083] It is understood that the display device 100 and its manufacturing method provided in the embodiments of this application can be a wearable device, such as a smart bracelet, smartwatch, etc., or a mobile phone, e-book, e-newspaper, television, personal portable computer, digital photo frame, navigator, etc. The embodiments of this application do not impose any limitations on this.

[0084] The above are merely preferred embodiments of this application and are not intended to limit this application in any way. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of this application without departing from the scope of the technical solution of this application shall still fall within the scope of the technical solution of this application.

Claims

1. A display device, characterized in that, include: Display panel; as well as A touch function layer is located on the light-emitting side of the display panel. The touch function layer includes a first metal layer, a second metal layer, and an organic insulating layer located between the first metal layer and the second metal layer. The second metal layer is located on the side of the organic insulating layer away from the display panel. The organic insulating layer includes a first insulating portion and a second insulating portion. The second metal layer is supported on the first insulating portion. The first top surface of the first insulating portion and the second top surface of the second insulating portion have a step difference.

2. The display device according to claim 1, characterized in that, The second metal layer includes an electrode assembly, and the display device further includes a light-shielding layer disposed on the side of the second metal layer opposite to the organic insulating layer and covering the electrode assembly.

3. The display device according to claim 2, characterized in that, The light-shielding layer is in contact with the electrode assembly and the second insulating part, respectively.

4. The display device according to claim 3, characterized in that, The sum of the step difference and the thickness of the electrode assembly is less than the thickness of the light-shielding layer.

5. The display device according to claim 4, characterized in that, The step difference is less than or equal to 0.5 μm.

6. The display device according to claim 4, characterized in that, The first metal layer includes connecting lines, the thickness of which is greater than the thickness of the electrode assembly.

7. The display device according to claim 3, characterized in that, The angle between the side surface of the first insulating part and the second top surface is greater than or equal to 90° and less than or equal to 100°.

8. The display device according to any one of claims 3-7, characterized in that, The light-shielding layer has multiple openings, each opening exposing a portion of the second top surface; The display device further includes a plurality of color resist blocks, each of which is located within a corresponding opening and in contact with the second top surface.

9. A method for manufacturing a display device, characterized in that, include: Provide a display panel; as well as A touch function layer is formed on the light-emitting side of the display panel. The touch function layer includes a first metal layer, a second metal layer, and an organic insulating layer located between the first metal layer and the second metal layer. The second metal layer is located on the side of the organic insulating layer away from the display panel. The organic insulating layer includes a first insulating portion and a second insulating portion. The second metal layer is supported on the first insulating portion. The first top surface of the first insulating portion and the second top surface of the second insulating portion have a step difference.

10. The method for manufacturing a display device according to claim 9, characterized in that, The second metal layer includes an electrode assembly, and the fabrication method further includes: forming a light-shielding layer covering the electrode assembly on the side of the second metal layer opposite to the organic insulating layer; The step of forming a touch function layer on the light-emitting side of the display panel includes: A first metal layer is formed on the light-emitting side of the display panel; An organic material layer is formed on the first metal layer, wherein the surface of the organic material layer facing away from the first metal layer is planar; A metal material layer is formed on the organic material layer; and The metal material layer is patterned to form the second metal layer and the organic insulating layer.

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