Integrated power management unit for gate all-around technology
By employing an integrated power management unit in GAA technology and utilizing a vertically stacked design of consecutive n-wells and voltage level shifters, the problems of junction leakage and increased area in GAA technology are solved, achieving a smaller area and more flexible circuit design.
Patent Information
- Application Number
- CN202480068665.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-11-07
- Filing Date
- 2024-10-24
- Publication Date
- 2026-06-05
AI Technical Summary
Gate all around (GAA) technology has an unwanted parasitic bottom transistor beneath the bottom nanosheet channel, which leads to increased junction leakage. When the n-well is merged, the junction leakage is severe, affecting transistor performance. At the same time, separating the n-well increases the transistor footprint.
It employs an integrated power management unit, including a 4-height cell structure, utilizing consecutive n-wells and power interconnects, combined with voltage level shifters, and through a vertically stacked voltage domain design, allows for the merging of n-wells without significantly increasing leakage current and reducing transistor footprint.
Without increasing leakage current, the footprint of GAA transistors is reduced, providing greater design flexibility and versatility for integrated circuit layouts of multi-bit voltage level shifters.