A manganese-cadmium-sulfur / silicon composite photocathode based on a constant current electrodeposition method, a preparation method and application thereof

By preparing manganese-cadmium-sulfur/silicon composite photocathodes on crystalline silicon surfaces using a constant current electrodeposition method, the problems of insufficient catalytic activity and stability in existing technologies are solved, and highly efficient photocatalytic water splitting performance is achieved.

CN122169136APending Publication Date: 2026-06-09SUZHOU VOCATIONAL INSTITUTE OF INDUSTRIAL TECHNOLOGY
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SUZHOU VOCATIONAL INSTITUTE OF INDUSTRIAL TECHNOLOGY
Filing Date
2026-03-05
Publication Date
2026-06-09

AI Technical Summary

Technical Problem

Existing technologies make it difficult to prepare manganese-cadmium-sulfur/silicon composite photocathode materials with high catalytic activity and stability on silicon surfaces. Furthermore, existing chemical deposition methods cannot form a uniform and dense catalyst layer on silicon surfaces with specific microstructures, which affects the efficiency and stability of photocatalytic water splitting.

Method used

A manganese cadmium sulfur/silicon composite photocathode was prepared on a silicon wafer using a constant current electrodeposition method. By controlling the current density, time, and electrolyte composition, a uniform and dense MnCdS thin film was formed. Combined with a pyramidal texture structure, precise doping and coverage were achieved.

Benefits of technology

It significantly improves the photocatalytic activity and stability of the photocathode, increases photocurrent density, exhibits excellent catalytic stability, and significantly improves photocatalytic water splitting efficiency.

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Abstract

The present application relates to a kind of manganese cadmium sulfur / silicon composite photocathode based on constant current electrodeposition method and preparation method and application thereof.The method is in situ grown with hollow microspheres structure manganese cadmium sulfur on the surface of crystalline silicon with pn junction and surface light trapping microstructure by constant current electrodeposition technology, thereby forming manganese cadmium sulfur / silicon composite photocathode.By controlling the specific conditions in the electrodeposition process, such as the type of Mn source, Cd source and S source, the concentration range thereof, the current density of electrodeposition, the time of electrodeposition, the composition of electrolyte system, such as the type of solvent and the addition of supporting electrolyte, the element ratio of manganese and cadmium in the electrodeposition process is accurately controlled, so that a uniform, dense and firmly bonded MnCdS film is formed on the surface of crystalline silicon with specific microstructure.The photocatalytic activity, water splitting efficiency and catalytic stability of the photocathode are significantly improved.
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