X-ray beam complex and diffraction apparatus

Abstract

The application provides an X-ray beam composite device and a diffraction equipment. A mirror assembly is configured to reflect an incident light beam into a first reflected light beam and a second reflected light beam. When a first monochromatic assembly and a second monochromatic assembly are both in a preset position, the first monochromatic assembly is configured to receive and guide the first reflected light beam to reflect into a first monochromatic light beam, and the second monochromatic assembly is configured to receive and guide the second reflected light beam to reflect into a second monochromatic light beam. The first monochromatic light beam and the second monochromatic light beam are arranged side by side to form a composite light beam. The application solves the technical problem that the detection efficiency is limited when the existing X-ray diffraction equipment measures through a closed X-ray tube, and achieves the technical effect of significantly improving the incident light flux to enhance the diffraction signal strength without increasing the power of the light source.

Description

Technical Field

[0001] This application relates to the field of X-ray optical technology, specifically to an X-ray beam recombination device and diffraction equipment. Background Technology

[0002] X-ray diffraction (XRD) is a powerful and widely used analytical technique, extensively used to characterize key parameters of materials such as crystal structure, phase composition, texture distribution, residual stress, and microstructure. In practical applications, different sample types and analytical requirements determine the configuration of the optical path structure and optical components: the Bragg-Brentano geometry is suitable for phase identification of powder samples, while parallel beam structures are more suitable for high-precision analytical scenarios such as grazing incidence XRD (GIXRD), X-ray reflectivity (XRR), high-resolution XRD (HR-XRD), and residual stress analysis. Especially when studying finely structured materials such as epitaxial single-crystal thin films, a parallel beam with an extremely narrow wavelength bandwidth (i.e., monochromatic radiation with a wavelength of Kα1) is typically required to resolve subtle structural differences.

[0003] Modern thin film material analysis often faces challenges such as extremely thin sample layers or weak diffraction signals. To improve the signal-to-noise ratio or increase detection throughput, it is usually necessary to increase the incident light flux. Although using a high-power rotating anode X-ray generator as a light source can provide higher light intensity, its high cost and complex maintenance make it difficult to popularize. Therefore, existing X-ray diffraction equipment still relies on the more economical closed X-ray tube as a light source.

[0004] However, when existing X-ray diffraction equipment uses a closed X-ray tube as the light source, it is difficult to reach the required count in a short time due to the limited power of the closed X-ray tube.

[0005] It should be noted that the information in the background section above is only used to enhance the understanding of the background technology of this application, and therefore may include technical information that does not constitute technical information known or easily inferred by a person skilled in the art. Summary of the Invention

[0006] In view of the aforementioned problems, this application is made to provide an X-ray beam recombining device and diffraction apparatus that overcomes or at least partially solves the aforementioned problems, comprising: An X-ray beam recombining device is used to guide an incident X-ray beam in an X-ray diffraction apparatus; the device includes: a mirror assembly, a first monochromatic assembly, and a second monochromatic assembly; The mirror assembly is configured to reflect the incident light beam into a first reflected beam and a second reflected beam; When the first monochromatic component and the second monochromatic component are simultaneously in a preset position, the first monochromatic component is configured to receive and guide the first reflected beam to reflect as a first monochromatic beam, and the second monochromatic component is configured to receive and guide the second reflected beam to reflect as a second monochromatic beam, wherein the first monochromatic beam and the second monochromatic beam are arranged side by side to form a composite beam.

[0007] Furthermore, the first monochromatic component includes a first reflective crystal block and a second reflective crystal block; the second monochromatic component includes a third reflective crystal block and a fourth reflective crystal block; The first reflective crystal is configured to receive and guide the first reflected beam to reflect as a first intermediate beam; The second reflective crystal is configured to receive and guide the first intermediate beam to reflect as a first monochromatic beam; The third reflective crystal is configured to receive and guide the second reflected beam to reflect as a second intermediate beam. The fourth reflective crystal is configured to receive and guide the second intermediate beam to reflect as a second monochromatic beam.

[0008] Furthermore, the third reflective crystal is configured to irradiate the edge region of the reflective surface of the fourth reflective crystal with the second intermediate beam, and reflect it as a second monochromatic beam; The first monochromatic component is configured to guide the first monochromatic beam through the outer edge of the fourth reflective crystal and to form a composite beam adjacent to the second monochromatic beam.

[0009] Furthermore, the edge region of the reflective surface of the fourth reflective crystal is located on the side closer to the third reflective crystal; The first monochromatic component is configured to allow the first monochromatic beam to pass between the third and fourth reflective crystal blocks and to form a composite beam adjacent to the second monochromatic beam.

[0010] Furthermore, at least one reflective crystal in the first monochromatic component has a reflective surface with a crystal orientation angle greater than or equal to zero. The reflecting surface of the reflecting crystal block in the second monochromatic component has a crystal orientation angle corresponding to that of the first monochromatic component.

[0011] Furthermore, it also includes: a first slit element; The first slit is disposed on the light-inlet side of the reflector assembly; The first slit is configured to split the incident beam into a first incident sub-beam and a second incident beam; The reflector assembly is configured to reflect the first incident sub-beam into a first reflected beam and the second incident sub-beam into a second reflected beam.

[0012] Furthermore, it also includes: a second slit; The second slit is disposed on the light-emitting side of the reflector assembly; The second slit is configured to define the cross-sectional size of the first and second reflected beams perpendicular to the propagation direction.

[0013] Furthermore, it also includes: a third slit; the third slit is disposed on the light-emitting side of the device; The third slit is configured to define the cross-sectional size of the emitted beam of the device perpendicular to the propagation direction.

[0014] Furthermore, the second monochrome component is provided with a first active mechanism; The first active mechanism is configured to drive the second monochromatic component to move out of the preset position, and to cause the second monochromatic component to receive and guide the first monochromatic beam and reflect it as a third monochromatic beam.

[0015] Furthermore, the first monochrome component is provided with a second movable mechanism; the second monochrome component is provided with a first movable mechanism; The second active mechanism is configured to drive the first monochromatic component to move out of the preset position, and to cause the first monochromatic component to receive and guide the second reflected beam, and reflect it into a fourth monochromatic beam; The first active mechanism is configured to drive the second monochromatic component to move out of the preset position, and to cause the second monochromatic component to receive and guide the first reflected beam, and reflect it as a fifth monochromatic beam.

[0016] An X-ray diffraction apparatus, the apparatus comprising: a sample stage, an incident goniometer arm, a diffraction goniometer arm, an X-ray source, and the device as described in any embodiment of this application; The device and the X-ray source are disposed on the incident goniometer arm; the diffraction goniometer arm is equipped with a detector; The incident goniometer arm is configured to drive the outgoing beam of the device to irradiate the sample on the sample stage and cause the sample to produce a diffracted beam. The diffraction goniometer arm is configured to receive the diffracted beam through the detector.

[0017] This application has the following advantages: In the embodiments of this application, addressing the problem that existing X-ray diffraction equipment using a closed X-ray tube as a light source suffers from power limitations, making it difficult to achieve the required number of measurements, this application provides a solution for forming a composite beam by juxtaposing two monochromatic beams side-by-side. Specifically, it provides an X-ray beam compositing device for guiding an incident X-ray beam in an X-ray diffraction device. The device includes a mirror assembly, a first monochromatic assembly, and a second monochromatic assembly. The mirror assembly is configured to reflect the incident beam into a first reflected beam and a second reflected beam. When the first monochromatic assembly and the second monochromatic assembly are simultaneously in preset positions, the first monochromatic assembly is configured to receive and guide the first reflected beam to reflect into a first monochromatic beam, and the second monochromatic assembly is configured to receive and guide the second reflected beam to reflect into a second monochromatic beam, wherein the first monochromatic beam and the second monochromatic beam are juxtaposed side-by-side to form a composite beam. This application splits the incident beam into two reflected beams by means of the reflector assembly, and then the beams are monochromated by the first monochromatic assembly and the second monochromatic assembly respectively, and then connected side by side to form a composite beam. This solves the technical problem of limited detection efficiency when existing X-ray diffraction equipment is used for measurement by a closed X-ray tube, and achieves the technical effect of significantly increasing the incident light flux to enhance the intensity of the diffraction signal without increasing the power of the light source. Attached Figure Description

[0018] To more clearly illustrate the technical solution of this application, the drawings used in the description of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0019] Figure 1 This is a schematic diagram of the beam recombination structure of an X-ray beam recombination device provided in an embodiment of this application; Figure 2 This is a schematic diagram of the optical path structure of an X-ray beam recombination device according to an embodiment of this application; Figure 3 This is a schematic diagram of the combined structure of the reflective surfaces of the third and fourth reflective crystal blocks forming U-shaped through slots in one embodiment of this application; Figure 4 This is a schematic diagram of the combined structure of the third and fourth reflective crystal blocks forming V-shaped through grooves on their reflective surfaces in one embodiment of this application; Figure 5 This is a schematic diagram of a beam recombination structure in one embodiment of this application, in which a composite beam is compressed using a crystal assembly with a V-shaped through-slot. Figure 6This is a schematic diagram of the combined structure of the first monochrome component and the second monochrome component connected in series in one embodiment of this application; Figure 7 This is a schematic diagram of a combined structure in one embodiment of this application that achieves independent dual-path emission of the light beam by adjusting the relative positions of the first monochromatic component and the second monochromatic component; Figure 8 This is a schematic diagram of the overall structure of an X-ray diffraction device provided in one embodiment of this application; The attached figures are labeled as follows: 1. Incident beam; 11. First incident sub-beam; 12. Second incident sub-beam; 21. First reflected beam; 211. First intermediate beam; 212. Fourth intermediate beam; 213. Fifth monochromatic beam; 22. First monochromatic beam; 31. Second reflected beam; 311. Second intermediate beam; 312. Third intermediate beam; 313. Fourth monochromatic beam; 32. Second monochromatic beam; 40. Composite beam; 41. Third monochromatic beam; 42. Diffracted beam; 5. Mirror assembly; 51. First mirror; 52. Second mirror; 61. The... 611. First reflective crystal block; 612. Second reflective crystal block; 613. Second moving mechanism; 62. Second monochromatic component; 621. Third reflective crystal block; 622. Fourth reflective crystal block; 6221. Edge vertex; 623. First moving mechanism; 71. First slit; 72. Second slit; 73. Third slit; 8. Horizontal reference line; 91. X-ray source; 92. Incident goniometer arm; 93. Sample stage; 931. Goniometer center; 94. Diffraction goniometer arm; 941. Detector; 942. Diffraction guide assembly. Detailed Implementation

[0020] To make the objectives, features, and advantages of this application more apparent and understandable, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. Obviously, the described embodiments are only some, not all, of the embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0021] The inventors discovered through analysis of existing technologies that high-resolution monochromatic light measurement requires extremely high X-ray flux (in photons per second), while enclosed X-ray tubes, limited by heat dissipation capacity and target power density, cannot provide sufficiently high raw X-ray output intensity. At the same time, in high-resolution monochromatic light measurement scenarios, to achieve high angular resolution and monochromaticity, highly selective optical elements such as slits and crystal monochromators are required in the optical path. This leads to a severe attenuation of photon flux during the acquisition of high-resolution monochromatic light, resulting in flux loss.

[0022] ReferenceFigures 1 to 2 This application illustrates an X-ray beam recombining device according to an embodiment of the present application. The device is used to guide an X-ray incident beam 1 in an X-ray diffraction device. The device includes: a mirror assembly 5, a first monochromatic assembly 61, and a second monochromatic assembly 62. The mirror assembly 5 is configured to reflect the incident beam 1 into a first reflected beam 21 and a second reflected beam 31. When the first monochromatic component 61 and the second monochromatic component 62 are simultaneously in a preset position, the first monochromatic component 61 is configured to receive and guide the first reflected beam 21 to reflect as the first monochromatic beam 22, and the second monochromatic component 62 is configured to receive and guide the second reflected beam 31 to reflect as the second monochromatic beam 32, wherein the first monochromatic beam 22 and the second monochromatic beam 32 are arranged side by side to form a composite beam 40.

[0023] In the embodiments of this application, addressing the problem that existing X-ray diffraction equipment using a closed X-ray tube as a light source suffers from power limitations, making it difficult to achieve the required count for measurement, this application provides a solution for forming a composite beam 40 by juxtaposing two monochromatic beams side-by-side. Specifically, it provides an X-ray beam compositing device for guiding an incident X-ray beam 1 in an X-ray diffraction device. The device includes a mirror assembly 5, a first monochromatic assembly 61, and a second monochromatic assembly 62. The mirror assembly 5 is configured to reflect the incident beam 1 into a first reflected beam 21 and a second reflected beam 31. When the first monochromatic assembly 61 and the second monochromatic assembly 62 are simultaneously in a preset position, the first monochromatic assembly 61 is configured to receive and guide the first reflected beam 21 to reflect into a first monochromatic beam 22, and the second monochromatic assembly 62 is configured to receive and guide the second reflected beam 31 to reflect into a second monochromatic beam 32. The first monochromatic beam 22 and the second monochromatic beam 32 are juxtaposed side-by-side to form a composite beam 40. This application splits the incident beam 1 into two reflected beams by the reflector assembly 5, and then the first monochromatic assembly 61 and the second monochromatic assembly 62 monochromate them respectively, forming a composite beam 40 by connecting them side by side. This solves the technical problem of limited detection efficiency when existing X-ray diffraction equipment performs measurements through a closed X-ray tube, and achieves the technical effect of significantly increasing the incident light flux to enhance the intensity of the diffraction signal without increasing the power of the light source.

[0024] The following will further describe an X-ray beam combining device in this exemplary embodiment.

[0025] It should be noted that the first or second monochromatic component of this application can be a single grooved monochromator crystal, which can be used to filter out the Kα2 component and background radiation in the beam based on the Bragg diffraction principle, outputting only high-purity Kα1 parallel light. The reflective crystal block is usually made of germanium (Ge) or silicon (Si) as the crystal material, and its crystal structure can achieve wavelength-selective reflection of X-rays, thereby filtering incident X-rays containing Kα1 and Kα2 into a high-purity Kα1 monochromatic beam (Kα2 content less than 1%) without changing the geometry of the beam.

[0026] The preset position refers to the mechanical structure in which the first monochrome component 61 and the second monochrome component 62 are set at a specific angle or position to ensure that the paths of the first monochrome beam 22 and the second monochrome beam 32 are matched and achieve parallel adjacency.

[0027] The parallel arrangement of the first monochromatic beam 22 and the second monochromatic beam 32 means that the principal axes of the two beams remain parallel in space and illuminate in the same direction. The adjacency of the first monochromatic beam 22 and the second monochromatic beam 32 means that the edges of the two beams are adjacent on the cross-section of the beam. It is worth noting that, unlike a mixed beam, the composite beam 40 refers to the beam structure formed by the spatial parallel and adjacent superposition of the first monochromatic beam 22 and the second monochromatic beam 32. It is essentially a spatial combination of light paths, rather than a superposition of light intensities or a mixing of spectra.

[0028] To ensure the quality of the composite beam 40, gaps between the first monochromatic beam 22 and the second monochromatic beam 32 should be avoided as much as possible to ensure the continuity of the composite beam 40 in cross-section; at the same time, non-parallelism between the first monochromatic beam 22 and the second monochromatic beam 32 should be avoided to ensure the collimation of the composite beam 40.

[0029] The device described in this application can be directly integrated into X-ray diffraction equipment that uses a closed X-ray tube as a light source or other equipment requiring increased X-ray flux, exhibiting high compatibility. This application can monochromatize and recombine two beams emitted from the light source without sacrificing spectral purity, thereby achieving a theoretical photon flux of twice that of a single monochromatic beam in the composite beam 40. Furthermore, the composite beam 40 of this application not only possesses Kα1 monochromaticity but also forms a continuous, high-density rectangular spot in space, increasing the irradiation area on the sample and thus enhancing the sample's diffraction intensity.

[0030] Reference Figure 2 In one embodiment of this application, the first monochromatic component 61 includes a first reflective crystal 611 and a second reflective crystal 612; the second monochromatic component 62 includes a third reflective crystal 621 and a fourth reflective crystal 622. The first reflective crystal 611 is configured to receive and guide the first reflected beam 21 to reflect as a first intermediate beam 211; The second reflective crystal 612 is configured to receive and guide the first intermediate beam 211 to reflect as a first monochromatic beam 22; The third reflective crystal 621 is configured to receive and guide the second reflected beam 31 to reflect it into a second intermediate beam 311; The fourth reflective crystal 622 is configured to receive and guide the second intermediate beam 311 to reflect as a second monochromatic beam 32.

[0031] It should be noted that the monochromatic components in this embodiment are composed of two reflective crystal blocks, which can reflect the first reflected beam 21 into a first intermediate beam 211 and a first monochromatic beam 22 in sequence after two wavelength selections, and reflect the second reflected beam 31 into a second intermediate beam 311 and a second monochromatic beam 32 in sequence after two wavelength selections.

[0032] As an example, the first monochromatic component 61 and the second monochromatic component 62 may each include at least three reflective crystal blocks. These reflective crystal blocks need to be set at a specific angle or position in the mechanical structure, or reflectors or slits may be added if necessary, to ensure that the paths of the first monochromatic beam 22 and the second monochromatic beam 32 match and are adjacent to each other.

[0033] In one specific implementation, the first monochrome component 61 may be configured with a combination of (+,-) crystal planes, and the second monochrome component 62 may be configured with a combination of (-,+) crystal planes.

[0034] In one specific implementation, the first reflective crystal 611 and the second reflective crystal 612 can be obtained by cutting and processing the same crystal, and the third reflective crystal 621 and the fourth reflective crystal 622 can be obtained by cutting and processing the same crystal.

[0035] Reference Figures 2 to 3 In one embodiment of this application, the third reflective crystal 621 is configured to irradiate the edge region of the reflective surface of the fourth reflective crystal 622 with the second intermediate beam 311 and reflect it as a second monochromatic beam 32. The first monochromatic component 61 is configured to guide the first monochromatic beam 22 through the outer edge of the fourth reflective crystal 622 and form a composite beam 40 adjacent to the second monochromatic beam 32.

[0036] It should be noted that the reflecting surface of a reflective crystal block does not refer to the physical outer surface of the crystal, but specifically to a set of specific lattice planes inside the crystal used to generate diffraction. The lattice reflecting surface of the reflective crystal block can be parallel to its physical outer surface, or it can form a specific crystal plane orientation angle to amplify or compress the light beam.

[0037] The edge of the reflective surface of the fourth reflective crystal 622 can, on the one hand, define the beam cross-section of the second intermediate beam 311 reflected by the fourth reflective crystal 622, and on the other hand, define the beam cross-section of the first monochromatic beam 22 passing along the outer edge of the fourth reflective crystal 622, forming a structure close to a knife-edge. The edge of the fourth reflective crystal 622 corresponds to Figures 3 to 4 The edge vertex 6221 in the middle is used to avoid or reduce the overlap or gap between the first monochromatic beam 22 and the second monochromatic beam 32.

[0038] In one embodiment of this application, the edge region of the reflective surface of the fourth reflective crystal 622 is located on the side close to the third reflective crystal 621; The first monochromatic component 61 is configured to allow the first monochromatic beam 22 to pass between the third reflective crystal 621 and the fourth reflective crystal 622, and to form a composite beam 40 adjacent to the second monochromatic beam 32.

[0039] It should be noted that the above arrangement of the reflective crystal blocks in this embodiment requires the first monochromatic beam 22 to be configured so that the first monochromatic beam 22 passes between the third reflective crystal block 621 and the fourth reflective crystal block 622. Therefore, the above arrangement requires the first monochromatic component 61 and the second monochromatic component 62 to be distributed sequentially along the irradiation direction of the incident beam 1, which can reduce the cross-sectional distribution space of the first monochromatic component 61 and the second monochromatic component 62 in the direction perpendicular to the propagation direction of the incident beam 1.

[0040] Reference Figure 3 In one specific implementation, the crystal orientation angles of the third reflective crystal block 621 and the fourth reflective crystal block 622 are both zero. Therefore, the reflective surfaces and their corresponding physical surfaces in the third reflective crystal block 621 and the fourth reflective crystal block 622 are parallel, thereby forming a U-shaped channel crystal physical structure.

[0041] Reference Figure 4 In one specific implementation, the crystal orientation angle of the third reflective crystal block 621 is zero, and the lattice reflective surface of the fourth reflective crystal block 622 forms an angle with its physical surface. That is, the crystal orientation angle is greater than zero, thus forming a V-shaped channel crystal physical structure.

[0042] Reference Figures 4 to 5 In one embodiment of this application, at least one reflective crystal block in the first monochromatic component 61 has a reflective surface with a crystal orientation angle greater than or equal to zero. The reflective surface of the reflective crystal block in the second monochromatic component 62 has a crystal orientation angle corresponding to that of the first monochromatic component 61.

[0043] It should be noted that the crystal orientation angle is determined by the crystal cutting and processing method of the reflective block. Since the diffraction of the light beam in the reflective block acts on its internal lattice, the diffraction direction of the light beam is determined by the crystal orientation angle. Furthermore, the diffraction process of the light beam may produce geometric amplification or compression on the cross-section. The calculation formula is as follows:

[0044] in, is the geometric scaling factor for the beam. The Bragg grazing angle at which the light beam strikes the reflecting crystal. The crystal orientation angle of the reflective crystal block.

[0045] when When the value is 0, the reflecting crystal is a symmetrically cut crystal. When the value is 1, the beam is neither amplified nor compressed. when When the value is less than 0, the reflective crystal is an asymmetric cut crystal. When the value is greater than 1, the reflected monochromatic beam is geometrically enlarged compared to the beam before reflection; when When the value is greater than 0, the reflective crystal is an asymmetric cut crystal. When the value is less than 1, each monochromatic beam after reflection undergoes geometrical shrinkage compared to before reflection, increasing the photon density and thus achieving high-flux density composite beam output.

[0046] In scenarios where the light beam is compressed, the reflecting surface of the reflective crystal block in the second monochromatic component 62 should have a crystal orientation angle corresponding to that of the first monochromatic component 61, so that the resolution of the first monochromatic beam 22 and the second monochromatic beam 32 is consistent, thereby ensuring the uniformity of the composite beam 40. This embodiment can achieve control over the edge positions of the two monochromatic beams by reasonably designing the crystal cutting angle, accurately calculating the compression ratio and the crystal position of the reflective crystal block.

[0047] Reference Figure 2 In one specific implementation, the crystal orientation angles of the reflective crystal blocks in the first monochromatic component 61 and the second monochromatic component 62 are both zero, and the reflective surfaces of the reflective crystal blocks in the same monochromator group are arranged parallel to each other and form a U-shaped through groove.

[0048] Reference Figures 4 to 5 In one specific implementation, the crystal orientation angles of the first reflective crystal block 611 and the third reflective crystal block 621 are both zero, while the crystal orientation angles of the second reflective crystal block 612 and the fourth reflective crystal block 622 are both non-zero. The reflective surfaces of the first reflective crystal block 611 and the second reflective crystal block 612 are formed with V-shaped through-slots at an angle to the corresponding crystal plane orientation angle, and the reflective surfaces of the third reflective crystal block 621 and the fourth reflective crystal block 622 are formed with V-shaped through-slots at an angle to the corresponding crystal plane orientation angle.

[0049] Reference Figure 2 In one embodiment of this application, it further includes: a first slit member 71; The first slit 71 is disposed on the light-inlet side of the reflector assembly 5; The first slit 71 is configured to split the incident beam 1 into a first incident sub-beam 11 and a second incident beam 12; The reflector assembly 5 is configured to reflect the first incident sub-beam 11 into a first reflected beam 21 and the second incident beam 12 into a second reflected beam 31.

[0050] It should be noted that the first slit 71 may have two openings, and the incident beam 1 passes through different openings to form two incident sub-beams, which then irradiate the reflector assembly 5. The first slit 71 can block the portion of the incident beam 1 that does not irradiate the reflective surface of the reflector assembly 5, thus preventing beam contamination.

[0051] Reference Figure 2 In a specific embodiment of this application, the reflector assembly 5 includes: a first reflector 51 and a second reflector 52; the reflective surfaces of the first reflector 51 and the second reflector 52 are arranged opposite to each other; The first reflector 51 is configured to reflect the first incident sub-beam 11 into a first reflected beam 21; the second reflector 52 is configured to reflect the second incident sub-beam 12 into a second reflected beam 31.

[0052] It should be noted that the first slit 71 can guide the first incident sub-beam 11 and the second incident sub-beam 12 to the corresponding reflectors and generate reflected beams.

[0053] In one specific implementation, the incident beam 1 can be a scattering geometry. The first reflector 51 and the second reflector 52 can be parabolic multilayer reflectors with the same surface coating parameters and pre-processed reflective surfaces, so that the scattered incident beam is reflected into a parallel geometry, enabling the first monochromatic component 61 and the second monochromatic component 62 to monochromate the corresponding reflected beam. Although the multilayer reflector has a filtering function for the mixed spectrum from the light source, the beam still contains two wavelengths, Kα1 and Kα2, and monochromatic processing is still required to obtain a high-purity beam.

[0054] Reference Figure 2 In one embodiment of this application, it further includes: a second slit member 72; The second slit 72 is disposed on the light-emitting side of the reflector assembly 5; The second slit 72 is configured to define the cross-sectional size of the first reflected beam 21 and the second reflected beam 31 perpendicular to the propagation direction.

[0055] It should be noted that the above structure can reduce the scattering of the first reflected beam 21 and the second reflected beam 31, and block the scattered light in the reflector assembly 5 to prevent beam contamination.

[0056] Reference Figure 2 In one embodiment of this application, it further includes: a third slit member 73; the third slit member 73 is disposed on the light-emitting side of the device; The third slit 73 is configured to define the cross-sectional size of the emitted beam of the device perpendicular to the propagation direction.

[0057] It should be noted that when the emitted beam of the device is a composite beam 40, the third slit 73 can reduce the scattering of the composite beam 40 and block the scattered light in the first monochromatic component 61 and the second monochromatic component 62 to prevent beam contamination.

[0058] Reference Figure 6 In one embodiment of this application, the second monochrome component 62 is provided with a first active mechanism 623; The first active mechanism 623 is configured to drive the second monochromatic component 62 out of the preset position, and to cause the second monochromatic component 62 to receive and guide the first monochromatic beam 22 and reflect it into a third monochromatic beam 41.

[0059] It should be noted that the first monochromatic component 61 and the second monochromatic component 62 in this embodiment can form a Bartels (+,-,-,+) monochromator structure in series. Compared with deploying the first monochromatic component 61 and the second monochromatic component 62 in a preset position, the deployment method in series allows the second monochromatic component 62 to perform monochromatic processing on the second monochromatic beam 32 again, thereby obtaining an ultra-high resolution third monochromatic beam 41, which can meet the epitaxial film analysis requirements of semiconductor materials such as germanium (Ge) or silicon (Si).

[0060] Under these conditions, the third monochromatic beam 41 serves as the incident light for diffraction analysis of the sample in the X-ray diffraction equipment, while the second reflected beam 31 is not used as the output beam of the device and should be blocked if necessary. Simultaneously, since the position of the third monochromatic beam 41 is offset relative to the composite beam 40, a corresponding displacement mechanism should be provided to compensate for the aforementioned beam offset.

[0061] When the emitted beam of the device is a third monochromatic beam 41, the third slit 73 can reduce the scattering of the composite beam 40 and block the scattered light in the first monochromatic component 61 and the second monochromatic component 62 to prevent beam contamination.

[0062] In a specific embodiment of this application, the openings corresponding to the first slit 71, the second slit 72 and the third slit 73 can be composed of independently movable metal sheets. The metal sheets can be made of molybdenum or tungsten, and the size and position of the slits can be flexibly adjusted to limit the light beam.

[0063] In one specific embodiment of this application, the first active mechanism 623 is configured to drive the second monochromatic component 62 to move out from the preset position and to directly use the first monochromatic beam 22 as the output beam of the device.

[0064] In one specific embodiment of this application, the second reflected beam 31, which has not undergone any monochromatic processing, can be directly used as the output beam of the device.

[0065] Reference Figure 7 In one embodiment of this application, the first monochrome component 61 is provided with a second movable mechanism 613; the second monochrome component 62 is provided with a first movable mechanism 623; The second active mechanism 613 is configured to drive the first monochromatic component 61 to move out of the preset position, and to cause the first monochromatic component 61 to receive and guide the second reflected beam 31, and reflect it into a fourth monochromatic beam 313; The first active mechanism 623 is configured to drive the second monochromatic component 62 to move out of the preset position, and to cause the second monochromatic component 62 to receive and guide the first reflected beam 21 and reflect it as a fifth monochromatic beam 213.

[0066] It should be noted that the first monochromatic component 61 and the second monochromatic component 62 can be used to simultaneously form two independent outgoing beams. After the second reflected beam 31 enters the first monochromatic component 61, it is reflected by the first reflective crystal 611 to become the third intermediate beam 312, and then by the second reflective crystal 612 to become the fourth monochromatic beam 313. Simultaneously, after the first reflected beam 21 enters the second monochromatic component 62, it is reflected by the third reflective crystal 621 to become the fourth intermediate beam 212, and then by the fourth reflective crystal 622 to become the fifth monochromatic beam 213. On the light-emitting side of the device, the fourth monochromatic beam 313 and the fifth monochromatic beam 213 are not combined, but rather serve as two independent outgoing beams. One beam can be selected for use, or both beams can be used simultaneously, improving the flexibility of optical path switching and expanding the range of selectable beam shapes. That is, by changing or adjusting the relative positions of the first monochromatic component 61 and the second monochromatic component 62, the combined and non-combined (independent) states of the outgoing beams can be switched.

[0067] In the above embodiments of this application, the composite beam 40, the third monochromatic beam 41, the first monochromatic beam 22, and the second reflected beam 31 can all serve as the output beams of the device. The first movable mechanism 623 can flexibly switch between various monochromatic and divergent beam types used for diffraction analysis. Specifically: 1) When the desired output beam needs to simultaneously contain wavelengths Kα1 and Kα2 and is a single (non-composite) parallel beam, only the first incident sub-beam 11 or the second incident sub-beam 12 can be selected to be reflected by a single mirror into collimated parallel light, such as... Figure 6 As shown, the second reflected beam 31 obtained by the second incident sub-beam 12 after being reflected by the second reflecting mirror 52 does not pass through any reflecting crystal, but is directly used as the output beam of the device. At this time, the beam divergence of the second reflected beam 31 is less than or equal to 0.05 degrees.

[0068] 2) When the required output beam needs to contain only the Kα1 wavelength and is a single (non-composite) parallel beam, only the first incident sub-beam 11 or the second incident sub-beam 12 can be selected to be reflected by a single mirror into collimated parallel light, and then wavelength selected by a single monochromatic component to obtain an output beam with a divergence of less than or equal to 0.02 degrees.

[0069] 3) When the required output beam needs to contain only the Kα1 wavelength and be a composite parallel beam, the first incident sub-beam 11 and the second incident sub-beam 12 can be reflected into collimated parallel beams by the corresponding mirrors, and then the wavelengths can be selected and combined by the corresponding monochromatic components to obtain a composite output beam with a divergence of less than or equal to 0.02 degrees.

[0070] 4) When the required output beam needs to contain only the Kα1 wavelength and be a high-resolution single-beam (non-composite) parallel beam, either the first incident sub-beam 11 or the second incident sub-beam 12 can be selected to be reflected by a single mirror into collimated parallel light, such as... Figure 6 As shown, the first incident sub-beam 11 is reflected by the first reflecting mirror 51 to obtain the first reflected beam 21. The first reflected beam 21 passes through the first monochromatic component 61 and the second monochromatic component 62 for wavelength selection to obtain the third monochromatic beam 41. At this time, the beam divergence of the third monochromatic beam 41 is less than or equal to 0.01 degrees.

[0071] In one specific implementation, the X-ray source 91 that emits the incident beam 1 and the principal optical axis of the composite beam 40 are on the same horizontal reference line 8, and the first reflector 51 and the second reflector 52 can be arranged in a mirror image with the horizontal reference line 8 as the axis of symmetry. When the first reflected beam 21 and the second reflected beam 31 are parallel to the horizontal reference line 8, the distance between the first reflective crystal 611 and the second reflective crystal 612 depends on the distance between the first reflected beam 21 and the horizontal reference line 8, and the distance between the third reflective crystal 621 and the fourth reflective crystal 622 depends on the distance between the second reflected beam 31 and the horizontal reference line 8.

[0072] As the diffraction device embodiment is basically similar to the apparatus embodiment, it is described in a relatively simple manner. For relevant details, please refer to the description of the apparatus embodiment.

[0073] Reference Figure 8 This application illustrates an X-ray diffraction apparatus according to an embodiment of the present application. The apparatus includes: a sample stage 93, an incident goniometer arm 92, a diffraction goniometer arm 94, an X-ray source 91, and the device as described in any embodiment of the present application. The device and the X-ray source 91 are disposed on the incident goniometer arm 92; the diffraction goniometer arm 94 is provided with a detector 941; The incident goniometer arm 92 is configured to drive the outgoing beam of the device to irradiate the sample on the sample stage 93 and cause the sample to generate a diffracted beam 42. The diffraction goniometer arm 94 is configured to receive the diffracted beam 42 through the detector 941.

[0074] It should be noted that the X-ray source 91 can be used to emit the incident beam 1, and the X-ray source 91 may include a closed X-ray tube; The incident goniometer arm 92 can be used to ensure that the outgoing beam of the device illuminates the sample located at the center 931 of the goniometer and causes the sample to generate a diffracted beam 42. During the scanning process, the incident goniometer arm 92 can synchronously adjust the incident direction so that the incident angle changes continuously according to the measurement requirements. The diffraction goniometer arm 94 can be used to rotate around the sample and receive the diffracted beam 42 that satisfies the Bragg condition through the detector 941.

[0075] In one specific embodiment, the diffraction device further includes a diffraction guiding component 942 for improving the quality of the diffraction signal. The diffraction guiding component 942 may be a diffraction optical path optical component such as a rocking curve optical component, a parallel plate collimator, or a 3-axis crystal collimator. The diffraction guiding component 942 may be disposed on the light-incoming side of the detector 941.

[0076] Although preferred embodiments of the present application have been described, those skilled in the art, upon learning the basic inventive concept, can make other changes and modifications to these embodiments. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments as well as all changes and modifications falling within the scope of the embodiments of the present application.

[0077] Finally, it should be noted that in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or terminal device that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or terminal device. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or terminal device that includes said element.

[0078] The X-ray beam recombination device and diffraction equipment provided in this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. An X-ray beam combining device, characterized in that, The device is used to guide an incident X-ray beam in an X-ray diffraction apparatus; the device includes: a mirror assembly, a first monochromatic assembly, and a second monochromatic assembly; The mirror assembly is configured to reflect the incident light beam into a first reflected beam and a second reflected beam; When the first monochromatic component and the second monochromatic component are simultaneously in a preset position, the first monochromatic component is configured to receive and guide the first reflected beam to reflect as a first monochromatic beam, and the second monochromatic component is configured to receive and guide the second reflected beam to reflect as a second monochromatic beam, wherein the first monochromatic beam and the second monochromatic beam are arranged side by side to form a composite beam.

2. The apparatus according to claim 1, characterized in that, The first monochromatic component includes a first reflective crystal and a second reflective crystal; the second monochromatic component includes a third reflective crystal and a fourth reflective crystal. The first reflective crystal is configured to receive and guide the first reflected beam to reflect as a first intermediate beam; The second reflective crystal is configured to receive and guide the first intermediate beam to reflect as a first monochromatic beam; The third reflective crystal is configured to receive and guide the second reflected beam to reflect as a second intermediate beam. The fourth reflective crystal is configured to receive and guide the second intermediate beam to reflect as a second monochromatic beam.

3. The apparatus according to claim 2, characterized in that, The third reflective crystal is configured to irradiate the edge region of the reflective surface of the fourth reflective crystal with the second intermediate beam, and reflect it as a second monochromatic beam; The first monochromatic component is configured to guide the first monochromatic beam through the outer edge of the fourth reflective crystal and to form a composite beam adjacent to the second monochromatic beam.

4. The apparatus according to claim 3, characterized in that, The edge region of the fourth reflective crystal block's reflective surface is located on the side closest to the third reflective crystal block; The first monochromatic component is configured to allow the first monochromatic beam to pass between the third and fourth reflective crystal blocks and to form a composite beam adjacent to the second monochromatic beam.

5. The apparatus according to claim 1, characterized in that, In the first monochromatic component, at least one reflective crystal block has a reflective surface with a crystal orientation angle greater than or equal to zero. The reflecting surface of the reflecting crystal block in the second monochromatic component has a crystal orientation angle corresponding to that of the first monochromatic component.

6. The apparatus according to claim 1, characterized in that, Also includes: First slit component; The first slit is disposed on the light-inlet side of the reflector assembly; The first slit is configured to split the incident beam into a first incident sub-beam and a second incident beam; The reflector assembly is configured to reflect the first incident sub-beam into a first reflected beam and the second incident sub-beam into a second reflected beam.

7. The apparatus according to claim 1, characterized in that, Also includes: Second slit piece; The second slit is disposed on the light-emitting side of the reflector assembly; The second slit is configured to define the cross-sectional size of the first and second reflected beams perpendicular to the propagation direction.

8. The apparatus according to claim 1, characterized in that, Also includes: Third slit piece; The third slit is disposed on the light-emitting side of the device; The third slit is configured to define the cross-sectional size of the emitted beam of the device perpendicular to the propagation direction.

9. The apparatus according to claim 1, characterized in that, The second monochrome component is provided with a first movable mechanism; The first active mechanism is configured to drive the second monochromatic component to move out of the preset position, and to cause the second monochromatic component to receive and guide the first monochromatic beam and reflect it as a third monochromatic beam.

10. The apparatus according to claim 1, characterized in that, The first monochrome component is provided with a second movable mechanism; the second monochrome component is provided with a first movable mechanism; The second active mechanism is configured to drive the first monochromatic component to move out of the preset position, and to cause the first monochromatic component to receive and guide the second reflected beam, and reflect it into a fourth monochromatic beam; The first active mechanism is configured to drive the second monochromatic component to move out of the preset position, and to cause the second monochromatic component to receive and guide the first reflected beam, and reflect it as a fifth monochromatic beam.

11. An X-ray diffraction apparatus, characterized in that, The device includes: a sample stage, an incident goniometer arm, a diffraction goniometer arm, an X-ray source, and the apparatus as described in any one of claims 1 to 10; The device and the X-ray source are disposed on the incident goniometer arm; the diffraction goniometer arm is equipped with a detector; The incident goniometer arm is configured to drive the outgoing beam of the device to irradiate the sample on the sample stage and cause the sample to produce a diffracted beam. The diffraction goniometer arm is configured to receive the diffracted beam through the detector.

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