Pressure level improvement system, process bias correction data monitoring method, and lithography machine

By integrating the processing module of the air pressure level improvement system into the daily focus monitoring system of the lithography machine, the process deviation correction data is monitored and corrected in real time, thus solving the PDOC offset problem and ensuring the precise focal length definition and process stability of the lithography machine.

CN122194574APending Publication Date: 2026-06-12SIEN (QINGDAO) INTEGRATED CIRCUITS CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SIEN (QINGDAO) INTEGRATED CIRCUITS CO LTD
Filing Date
2024-12-11
Publication Date
2026-06-12

AI Technical Summary

⚠Technical Problem

In the prior art, the process deviation correction data (PDOC) of the air pressure level improvement module is prone to shift after long-term use, which leads to changes in the optimal focal length (BF), affecting the lithography image and etching process. Moreover, the shift cannot be monitored in real time, resulting in misjudgment and poor product reliability.

⚗Method used

The processing module of the air pressure level improvement system is directly connected to the daily focus monitoring system of the lithography machine. Through the acquisition unit and processing unit, the process deviation correction data is monitored in real time, and statistical process control charts are established to realize real-time monitoring and correction of process deviation correction data.

🎯Benefits of technology

It enables real-time monitoring of process deviation correction data, ensuring its stability, accurately defining the optimal focal length, improving lithography effect and process stability, and avoiding misjudgment and process impact.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application provides a gas pressure level improvement system, a process deviation correction data monitoring method and a photolithography machine. The processing module in the gas pressure level improvement system is directly connected to a daily focus monitoring system of the photolithography machine, so that a monitoring unit is not needed to be separately arranged, the updating of a current sub-recipe of the processing module can be realized, the current sub-recipe can be synchronously collected by the collecting unit in the monitoring module, the process deviation correction data corresponding to the collecting unit at different collecting times can be obtained by the processing unit, and the statistical process control chart can be formed according to the process deviation correction data. Therefore, whether the process deviation correction data deviates or not can be monitored in real time through the statistical process control chart, the deviation of the process deviation correction data can be found and corrected in time, the stability of the process deviation correction data is ensured, the best focus can be accurately defined, and the photolithography effect is improved.
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