Display panel, preparation method thereof and display device

Abstract

This invention discloses a display panel and its manufacturing method, as well as a display device. The display panel includes a substrate; a pixel defining layer located on one side of the substrate, wherein a plurality of pixel openings are provided on the pixel defining layer; a light-emitting layer located on one side of the substrate, wherein the light-emitting layer includes a plurality of light-emitting units, at least partially located within the pixel openings; a first electrode layer located on the side of the light-emitting layer opposite to the substrate; an encapsulation layer located on the side of the first electrode layer opposite to the light-emitting layer; and a light-absorbing layer located between the first electrode layer and the encapsulation layer, wherein the orthographic projection of the light-absorbing layer on the substrate lies within the orthographic projection of the pixel defining layer on the substrate, and the light-absorbing layer is a vapor-deposited material. This invention replaces the black matrix in the traditional color filter technology on the encapsulation layer with a light-absorbing layer vapor-deposited on the first electrode layer and disposed below the encapsulation layer, thereby shortening the distance between the light-absorbing layer and the light-emitting layer, thus optimizing the problem of brightness attenuation at large viewing angles and improving the viewing angle color shift phenomenon.

Description

Technical Field

[0001] This application relates to the field of display technology, and more specifically, to a display panel, a method for manufacturing the same, and a display device. Background Technology

[0002] Organic light-emitting diodes (OLEDs) are a display technology widely used in devices such as smartphones, watches, and laptops, with a market share comparable to that of liquid crystal displays (LCDs). To meet consumer demand for higher screen brightness and longer lifespan, improving the luminous efficiency of OLED devices is particularly important.

[0003] Integrating a color filter into the light-emitting surface of an OLED display can effectively reduce the reflection of ambient light within the panel, thereby improving the display's contrast and visual effect. However, the light-blocking structure set in the non-pixel area of ​​this solution will partially block light from the side, leading to brightness attenuation and color shift at wide viewing angles. Summary of the Invention

[0004] To overcome the technical problems mentioned in the background, this application provides a display panel including a substrate; a pixel defining layer located on one side of the substrate, wherein a plurality of pixel openings are provided on the pixel defining layer; a light-emitting layer located on one side of the substrate, wherein the light-emitting layer includes a plurality of light-emitting units, wherein at least a portion of the light-emitting units are located within the pixel openings; a first electrode layer located on the side of the light-emitting layer opposite to the substrate; an encapsulation layer located on the side of the first electrode layer opposite to the substrate; and a light-absorbing layer located between the first electrode layer and the encapsulation layer, wherein the orthographic projection of the light-absorbing layer on the substrate is located within the orthographic projection of the pixel defining layer on the substrate, and the material of the light-absorbing layer is a vapor-deposited material.

[0005] Optionally, it may also include a light extraction layer located between the first electrode layer and the encapsulation layer, and a light absorption layer located between the encapsulation layer and the light extraction layer, with the light absorption layer in contact with the light extraction layer.

[0006] Optionally, the light-absorbing layer is located between the first electrode layer and the light-extracting layer, and the light-absorbing layer is disposed in contact with the first electrode layer.

[0007] Furthermore, it also includes a second electrode layer located between the substrate and the light-emitting layer; and a filter film layer located on the side of the encapsulation layer opposite to the substrate, the filter film layer including a plurality of filter portions, the orthographic projection of the filter portions on the substrate overlapping the orthographic projection of the light-emitting unit on the substrate.

[0008] Furthermore, the light-absorbing layer has a patterned structure and includes a plurality of light-transmitting openings. In the cross-sectional structure of the display panel along the thickness direction of the display panel, the width of the light-transmitting opening is greater than or equal to the width of the pixel opening, and the width of the filter portion is greater than or equal to the width of the pixel opening.

[0009] Furthermore, the orthographic projection of the light-filtering portion on the substrate overlaps with the orthographic projection of the light-absorbing layer opening on the substrate; preferably, in the cross-sectional structure of the display panel along the thickness direction of the display panel, the width of the light-transmitting opening is equal to the width of the light-filtering portion.

[0010] Furthermore, the thickness of the light-absorbing layer is less than or equal to 1 micrometer, and the material of the light-absorbing layer includes at least one of organic materials, inorganic materials, or metal oxides.

[0011] Furthermore, it also includes an optical adhesive, which covers the filter film layer; and a cover plate, which is attached to the filter film layer by the optical adhesive.

[0012] This application embodiment also provides a method for manufacturing a display panel, including the following steps: providing a substrate, forming a second electrode layer and a pixel defining layer on the substrate, defining a plurality of pixel openings in the pixel defining layer; forming the light-emitting layer within the pixel openings; depositing a first electrode layer on the light-emitting layer using a common mask; depositing a patterned light-absorbing layer on the first electrode layer using a fine metal mask, wherein the orthographic projection of the light-absorbing layer on the substrate is located within the orthographic projection of the pixel defining layer on the substrate; and forming an encapsulation layer on the light-absorbing layer.

[0013] The present invention also provides a display device, which includes the display panel described in this application.

[0014] The beneficial effects of this invention are that by replacing the black matrix in the traditional color filter technology on the encapsulation layer with a light-absorbing layer deposited on the first electrode layer and placing the light-absorbing layer below the encapsulation layer, the distance between the light-absorbing layer and the light-emitting layer is shortened, allowing light from more viewing angles to be emitted, thereby optimizing the problem of brightness attenuation at large viewing angles and improving the viewing angle color shift phenomenon.

[0015] It should be understood that the description in this section is not intended to identify key or essential features of the embodiments of the present invention, nor is it intended to limit the scope of the invention. Other features of the invention will become readily apparent from the following description. Attached Figure Description

[0016] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the display panel structure provided in an embodiment of the present invention; Figure 2 This is a schematic diagram of the display panel structure provided in an embodiment of the present invention; Figure 3 This is a schematic diagram of the display panel structure provided in an embodiment of the present invention; Figure 4 A flowchart illustrating the manufacturing method of the display panel provided in an embodiment of the present invention. Figure 5 — Figure 9 A schematic diagram illustrating an embodiment of the method for manufacturing a display panel provided in this invention; Explanation of reference numerals in the attached figures: Display panel 100; substrate 10; second electrode layer 11; pixel limiting layer 12; light emitting layer 13; first electrode layer 14; light absorbing layer 15; encapsulation layer 16; light extraction layer 17; filter film layer 18; filter part 181; optical adhesive 19; cover plate 20. Detailed Implementation

[0018] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0019] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0020] It should be noted that similar reference numerals and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. It should be noted that, unless otherwise specified, different features in the embodiments of this application can be combined with each other.

[0021] For ease of understanding, the accompanying diagram shows the mutually orthogonal X-axis, Y-axis, and Z-axis. The direction along the X-axis is called the X-direction, the direction along the Y-axis is called the Y-direction, and the direction along the Z-axis is called the Z-direction. The Z-direction is the normal direction relative to the plane containing the X and Y directions. Furthermore, a view where various elements are observed parallel to the plane containing the X and Y directions is called a top view. Alternatively, the planes in the X and Y directions can be planes parallel to the display surface of the display panel, and the Z-direction can be a direction parallel to the thickness direction of the display panel.

[0022] For certain elements, terms like "above" or "overhead" are sometimes used when describing the position of an element in the Z direction, and "below" or "under" are used when describing the position of an element in the opposite direction. Furthermore, when using terms like "above," "overhead," "below," "under," or "relative" to define the positional relationship between two elements, this includes not only the state where the two elements are directly adjacent, but also the state where the two elements are separated by gaps or other elements. Additionally, terms like "first," "second," and "third" are used only for distinguishing descriptions and should not be interpreted as indicating or implying relative importance.

[0023] Organic Light Emitting Diode (OLED) display technology is widely used in devices such as smartphones, watches, and laptops, with a market share comparable to Liquid Crystal Display (LCD) technology. To meet consumer demands for higher screen brightness and longer lifespan, improving the luminous efficiency of OLED devices is crucial. Currently, mainstream Active-Matrix Organic Light-Emitting Diode (AMOLED) screens often use circular polarizers to reduce ambient light reflection, but this approach results in significant light loss. To address this issue, removing the polarizer and integrating a color filter layer on the encapsulation layer effectively improves light transmittance and reduces reflectivity. However, the black matrix shielding layer placed in non-pixel areas blocks light emission at large angles, leading to decreased viewing angle brightness and color shift. Therefore, developing novel device structures that can improve viewing angle brightness attenuation and color shift is of significant practical importance.

[0024] For the reasons stated above, this embodiment of the invention provides a display panel 100. Figure 1 This is a schematic diagram of the structure of a display panel 100 provided in an embodiment of the present invention, for reference. Figure 1The display panel 100 includes a substrate 10, a pixel defining layer 12, a light-emitting layer 13, a first electrode layer 14, a light-absorbing layer 15, and an encapsulation layer 16. The pixel defining layer 12 is located on one side of the substrate 10 and has a plurality of pixel openings. The light-emitting layer 13 is located on one side of the substrate 10 and includes a plurality of light-emitting units, at least partially located within the pixel openings. The first electrode layer 14 is located on the side of the light-emitting layer 13 facing away from the substrate 10 and is a cathode layer. The encapsulation layer 16 is located on the side of the first electrode layer 14 facing away from the light-emitting layer 13. The light-absorbing layer 15 is located between the first electrode layer 14 and the encapsulation layer 16. The orthographic projection of the light-absorbing layer 15 onto the substrate 10 is within the orthographic projection of the pixel defining layer 12 onto the substrate 10, and the material of the light-absorbing layer 15 is a vapor-deposited material.

[0025] Furthermore, the display panel 100 can be a panel structure with display function, such as a liquid crystal display (LCD). Crystal display (LCD) panels or light-emitting diode (LED) display panels, where LED display panels can be organic light-emitting diodes (OLEDs). This invention relates to OLED (Optical Display Panel), Micro LED (Micro Light Emitting Diode Display), and Quantum Dot Light Emitting Diode (QLED) display panels. In some embodiments, the display panel 100 also integrates touch functionality. For example, the display panel 100 further includes a touch function layer located on the side of the encapsulation layer 16 facing away from the substrate 10. A touch sub-panel is disposed on one side of the display sub-panel. In this case, the touch function layer of the touch sub-panel and the display function layer of the display sub-panel are different film layers and are fabricated independently. In the display panel 100, the touch function layer can also be fabricated in the same process as the display function layer, that is, at least a portion of the film layers of the touch function layer and the display function layer are located in the same layer. This embodiment of the invention does not impose specific limitations here.

[0026] Furthermore, the substrate 10 is made of a rigid or flexible insulating material, wherein the rigid embodiment uses glass or quartz, and the flexible embodiment uses polyimide or a similar high-temperature resistant polymer film. The substrate 10 serves as the physical support and circuit integration platform for the device, supporting the backplane circuitry of the thin-film transistor and providing necessary mechanical stability and electrical isolation. In the bottom-emitting structure, the substrate 10 also acts as the light-emitting interface, requiring high optical transmittance. In flexible applications, it must also possess bending resistance, a low coefficient of thermal expansion, and high-temperature dimensional stability to meet process and usage requirements. In addition, the substrate 10 itself constitutes the first water and oxygen barrier of the device, and the planarization layer formed on its surface provides a low-roughness, stepless film-forming interface for the subsequent anode and organic light-emitting layer 13, thereby ensuring the overall reliability, performance, and production yield of the device.

[0027] Further reference Figure 1 The pixel defining layer 12 is located on one side surface of the substrate 10, and a plurality of pixel openings are provided on the pixel defining layer 12. The pixel defining layer 12 can be an organic material, such as polyimide, acrylic resin, or photosensitive organic insulating material patterned by photolithography. The pixel defining layer 12 can also be an inorganic material such as silicon nitride, silicon oxide, or silicon oxynitride. The pixel defining layer 12 defines an array of pixel openings on the planarization layer surface to define the light-emitting area and position of each sub-pixel, forming a regularly arranged array of pixel openings at predetermined positions; at the same time, the sidewalls of the pixel defining layer 12 form an isolation structure with a specific tilt angle, effectively preventing light emission crosstalk and current diffusion between adjacent pixels, and providing an ideal film boundary and isolation barrier for the organic light-emitting functional layer subsequently formed by evaporation or printing. The width L2, shape, and sidewall morphology of the pixel aperture have been optimized to ensure a high aperture ratio to improve device brightness and efficiency, while also taking into account the process requirements of evaporation shadow mask alignment tolerance and film uniformity, providing a key structural foundation for the deposition of organic materials and high-performance light emission.

[0028] Furthermore, the light-emitting layer 13 is located on one side of the substrate 10 and includes multiple light-emitting units at least partially located within the pixel opening. The light-emitting layer 13 includes a hole injection layer, a hole transport layer, an organic light-emitting functional layer, an electron transport layer, and an electron injection layer deposited sequentially. The organic light-emitting functional layer further employs a host-guest doping system. The host material possesses efficient carrier transport and energy transfer characteristics, while the guest doping material is selected from phosphorescent or fluorescent materials with corresponding emission wavelengths according to the light emission requirements of the red, green, and blue sub-pixels, to achieve high color purity and high-efficiency light emission. The thickness, energy level, and material composition of each functional layer are synergistically optimized to balance carrier injection, transport, and recombination efficiency, thereby constituting a complete light-emitting unit. Under energized conditions, the light-emitting unit excites guest light-emitting molecules to produce visible light of the desired color through recombination of holes injected by the electrodes and electrons injected by the cathode within the organic light-emitting functional layer. Its light-emitting performance determines the color gamut, brightness, and energy efficiency level of the display. The light-emitting layer 13 is made of organic electroluminescent material, and each light-emitting unit corresponds to one pixel opening. The light-emitting units can emit light of specific colors under the action of an electric field, including red, green, and blue light-emitting units. Full-color display is achieved by combining light-emitting units of different colors. The light-emitting layer 13 is formed on the surface of the substrate 10 through a vapor deposition process, and the light-emitting material is uniformly distributed in the pixel opening area.

[0029] Furthermore, the first electrode layer 14 is a cathode layer, deposited above the electron injection layer and covering the entire display area. The first electrode layer 14 is made of a metallic material, including at least one of magnesium, silver, aluminum, or their alloys, and is formed by a vapor deposition process. The first electrode layer 14 acts as a cathode, providing electrons to the light-emitting layer 13, and together with the second electrode layer 11 located on the other side of the light-emitting layer 13, forms a driving electric field, causing the light-emitting material to emit light under the influence of the electric field. The first electrode layer 14 also has a reflective function, capable of reflecting the light emitted downwards from the light-emitting layer 13 upwards, improving light utilization efficiency. Preferably, the first electrode layer 14 is constructed as a semi-transparent or transparent conductive film, serving as the main light-emitting surface in the top light-emitting device; or, the first electrode layer 14 is constructed as a highly reflective metal layer, playing a role in reflection and brightening in the bottom light-emitting device.

[0030] Further reference Figure 1The encapsulation layer 16 covers and protects the underlying organic light-emitting functional layer and electrode structure. It is configured as a single-layer or multi-layer composite barrier film, comprising at least one inorganic barrier layer and one organic buffer layer stacked alternately. For example, the encapsulation layer 16 includes an inorganic barrier layer, an organic buffer layer, and an inorganic barrier layer stacked sequentially. The inorganic barrier layer uses at least one of silicon oxide, silicon nitride, aluminum oxide, or aluminum nitride, and is formed into a dense film using chemical vapor deposition or atomic layer deposition processes to block water and oxygen permeation. The organic buffer layer uses acrylate, epoxy resin, or silicone materials, and is formed using inkjet printing or coating processes to release stress and cover microscopic defects. The function of the encapsulation layer 16 is to achieve a balance between high flexibility and high barrier properties through an alternating inorganic / organic multi-layer structure, effectively isolating moisture and oxygen in the environment and preventing degradation of organic materials and electrode corrosion. Simultaneously, its planarized surface provides a reliable interface for the subsequent integration of optical films or touch sensors, thereby ensuring the stability and reliability of the display during long-term use.

[0031] Further reference Figure 1 The light-absorbing layer 15 is deposited between the first electrode layer 14 and the encapsulation layer 16, replacing the traditional black matrix (BM) structure disposed above the encapsulation layer 16. By reducing the physical distance between it and the underlying light-emitting layer 13, it effectively suppresses the difference in optical path length caused by interference from the multilayer film structure, thereby improving the color shift phenomenon of the display panel 100 at wide viewing angles. At the same time, the light-absorbing layer 15 selectively absorbs stray light and ambient reflected light in the non-pixel opening area, which can improve contrast while avoiding obstruction of normal light emission from pixels, thus balancing the front brightness efficiency and wide viewing angle color consistency of the display. The orthographic projection of the light-absorbing layer 15 on the substrate 10 is located within the orthographic projection of the pixel limiting layer 12 on the substrate 10. The position of the light-absorbing layer 15 is designed so that its orthographic projection overlaps with the area of ​​the pixel limiting layer 12, that is, it is located above the non-light-emitting pixel gap area. The light-absorbing layer 15 can absorb ambient light and internal stray light, reducing multiple reflections and scattering of light inside the display panel 100.

[0032] Furthermore, the light-absorbing layer 15 is made of a vapor-deposited light-absorbing material, which is deposited on top of the first electrode layer 14 or the light extraction layer 17 through a vapor deposition process. The light-absorbing layer 15 is in contact with the first electrode layer 14 or the light extraction layer 17. Compared to the photoresist composite system used in traditional black matrices, the fundamental reason why vapor-deposited light-absorbing materials can adapt to vacuum vapor deposition processes lies in the high degree of matching between their material properties and the vapor deposition process. Specifically, vapor-deposited materials refer to a class of functional materials that can be directly converted from a solid or liquid state to a gaseous state (sublimation or evaporation) in a vacuum environment through heating, electron beam bombardment, or laser radiation, and then transported to the substrate surface in atomic and molecular form for condensation and deposition, ultimately forming a solid thin film. Vapor-deposited light-absorbing materials refer to materials that can be formed through vacuum vapor deposition processes (including thermal vapor deposition, reactive vapor deposition, etc.). Vaporized light-absorbing materials can be single-component or pure systems formed through gas-phase reactions. Their low molecular weight or controllable sublimation / vaporization characteristics enable them to achieve non-decomposition vaporization under high vacuum conditions through thermal or electron beam excitation, thereby depositing a dense and uniform thin film on the substrate surface.

[0033] Optionally, vapor-deposited light-absorbing materials include inorganic materials (such as CrOx, TiN, TaN, etc.), which are usually high-purity compounds or can be formed in situ through reactive vapor deposition. They can be controlled to vaporize and form a film under vacuum. They also include organic materials, such as perylene-based, phthalocyanine-based, and polycyclic aromatic hydrocarbon black organic small molecules. Organic vapor-deposited light-absorbing materials can be prepared by vacuum thermal vapor deposition. Organic vapor-deposited light-absorbing materials can sublimate at low temperatures while maintaining their molecular structure, achieving gas-phase transport and deposition. Both types of materials possess excellent film-forming properties and adhesion without relying on any binding medium. Black matrix materials, on the other hand, are mainly composed of polymeric photosensitive resins, micron-sized inorganic pigments (such as carbon black), photoinitiators, and organic solvents. However, polymeric resins, due to their high molecular weight, cannot vaporize without decomposition, and inorganic pigments are difficult to transport in the gas phase. Furthermore, solvents and other auxiliary components decompose during the vapor deposition process, polluting the process environment, making them unsuitable for vacuum vapor deposition.

[0034] In this embodiment, the distance between the light-absorbing layer 15 and the light-emitting layer 13 is shortened by depositing the light-absorbing layer 15 onto the first electrode layer 14. This structural design allows more light emitted from a wide viewing angle to effectively pass through the display panel 100 without being blocked by the traditional black matrix structure. When a driving voltage is applied between the anode and the first electrode layer 14, the organic light-emitting material in the light-emitting unit emits light under the action of the electric field, and the generated light propagates in all directions. The upward-propagating light is emitted through the encapsulation layer 16, and the downward-propagating light is reflected by the first electrode layer 14 and emitted upward. The light-absorbing layer 15 selectively absorbs stray light at specific angles and positions while allowing effective display light to pass through, thereby optimizing brightness performance and color consistency at wide viewing angles and effectively improving the viewing angle distortion problem.

[0035] In one embodiment, reference Figure 2 The display panel 100 also includes a light extraction layer 17, located between the first electrode layer 14 and the encapsulation layer 16. Made of a high-refractive-index material, the light extraction layer 17 can re-extract light that would otherwise be totally internally reflected within the display panel 100 and unable to escape, thereby improving the overall brightness of the display panel 100 and enhancing light emission efficiency. The light extraction layer 17 comprises a dielectric layer with a gradually varying refractive index and / or an optical thin film with micro / nano structures. By optimizing the multiple reflection and refraction paths of photons within the device, it reduces light loss caused by waveguide effects and substrate modes, effectively improving the external quantum efficiency of the device. Simultaneously, the micro / nano structures can control the directionality of the emitted light, improving brightness attenuation at wide viewing angles while further optimizing viewing angle color shift in conjunction with the light-absorbing layer 15, ultimately achieving a display effect with high brightness, wide viewing angle, and uniform color.

[0036] Optionally, continue to refer to Figure 2 A light-absorbing layer 15 is deposited on top of the light-extracting layer 17 and located between the light-extracting layer 17 and the encapsulation layer 16, with the light-absorbing layer 15 in contact with the light-extracting layer 17. By integrating the light-absorbing layer 15 onto the surface of the light-extracting layer 17, its distance from the underlying light-emitting unit can be controlled, and the output of light at a specific wavelength can be modulated using the microcavity effect, thereby effectively absorbing stray light and ambient reflected light to improve contrast. When the light-emitting unit emits light, the generated light is first effectively guided and emitted through the light-extracting layer 17. The light-extracting layer 17 can disrupt the total internal reflection condition between different media interfaces, allowing light that could not be emitted before to regain the opportunity to be emitted. At the same time, the special position design of the light-absorbing layer 15 ensures that unwanted stray light can be effectively absorbed, while useful display light can be smoothly emitted to the outside through the light-extracting layer 17.

[0037] In another embodiment, the light-absorbing layer 15 is located between the first electrode layer 14 and the light-extracting layer 17, and the light-absorbing layer 17 is disposed in contact with the first electrode layer 14.

[0038] In one embodiment, the display panel 100 includes a second electrode layer 11 and a filter film layer 18. The second electrode layer 11 is located between the substrate 10 and the light-emitting layer 13; the filter film layer 18 is located on the side of the encapsulation layer 16 away from the substrate 10, and the filter film layer 18 includes a plurality of filter portions 181, the orthographic projection of the filter portions 181 on the substrate 10 overlaps with the orthographic projection of the light-emitting unit on the substrate 10.

[0039] Furthermore, the second electrode layer 11 is an anode layer. The pixel opening second electrode layer 11 includes a plurality of second electrodes spaced apart. The pixel limiting layer 12 covers the edges of the second electrodes, and a portion of the second electrode area is exposed through the pixel opening. The material of the second electrode layer 11 includes a transparent conductive oxide film, a metal reflective layer, and a stack of transparent conductive oxide films thereon. The transparent conductive oxide is preferably indium tin oxide, and the metal reflective layer is preferably silver or a silver alloy. The second electrode layer 11 efficiently injects holes into the organic functional layer through its high work function characteristics. On the other hand, it is designed to be transparent or highly reflective depending on the bottom-emitting or top-emitting structure, so as to achieve light transmission or internal light reflection respectively. In addition, the second electrode layer 11 and the pixel limiting layer 12 together form the boundary of the pixel light-emitting area. Its surface morphology and energy level structure are optimized to improve hole injection efficiency and reduce interface voltage loss. When a driving voltage is applied to the second electrode layer 11, current is injected into the light-emitting unit in the light-emitting layer 13 through the second electrode layer 11. The light-emitting unit generates an electroluminescence reaction under the excitation of the electric field and emits visible light. By placing the second electrode layer 11 at a specific position between the substrate 10 and the light-emitting layer 13, the charge injection efficiency can be optimized and the light emission uniformity of the light-emitting unit can be improved.

[0040] Furthermore, a filter layer 18 is disposed on the upper surface of the encapsulation layer 16, including a plurality of filter sections 181 arranged periodically according to the pixel layout. The orthographic projection of each filter section 181 on the substrate 10 overlaps with the orthographic projection of the corresponding light-emitting unit on the substrate 10. This design allows light emitted from the light-emitting unit to enter the corresponding filter section 181 after passing through the encapsulation layer 16. Each filter section 181 corresponds to the light-emitting area of ​​the red, green, and blue sub-pixels, and is composed of a colored photoresist material that can transmit light of the corresponding wavelength band. By selectively transmitting the target wavelength light emitted by each sub-pixel and absorbing non-target wavelength components in the ambient light, the filter layer 18 significantly reduces ambient light reflectivity and improves display contrast, while replacing the traditional circular polarizer structure to reduce light loss. By forming the filter section 181 on the encapsulation layer 16, reflection and crosstalk at the film layer interface in the optical path can be reduced, thereby achieving higher light extraction efficiency and purer color coordinate output. The filter element 181 possesses specific spectral transmission characteristics, selectively transmitting light of specific wavelengths while blocking or absorbing other wavelengths. When light emitted from the light-emitting unit propagates through the encapsulation layer 16 to the filter film layer 18, the filter element 181 performs wavelength filtering, allowing only specific wavelengths that meet display requirements to pass through, thereby improving color purity and accuracy. By providing the filter film layer 18 above the encapsulation layer 16, the optical performance of the display device can be further optimized. The spatial correspondence between the filter element 181 of the filter film layer 18 and the light-emitting unit ensures that the light emitted by each light-emitting unit can be effectively spectrally adjusted, avoiding light waste and crosstalk. This structural design significantly improves the color performance and display quality of the display device while maintaining good light transmission efficiency.

[0041] Furthermore, the light-absorbing layer 15 adopts a patterned structure design, including multiple light-transmitting openings, which are correspondingly arranged with respect to pixel openings. In the cross-sectional structure of the display panel 100 along the thickness direction, such as... Figure 3 As shown, the width L1 of the light-transmitting opening is designed to be greater than or equal to the width L2 of the pixel opening, ensuring that the light emitted from the pixel opening can fully pass through the light-transmitting opening. A filter section 181 is disposed above the light-absorbing layer 15 and is used to perform color filtering processing on the passing light. The width L3 of the filter section 181 is also designed to be greater than or equal to the width L2 of the pixel opening, ensuring effective utilization of light and accurate color reproduction.

[0042] The matching relationship between the light-transmitting opening of the light-absorbing layer 15 and the width L2 of the pixel opening ensures efficient light transmission. When light is emitted from the pixel opening at different angles, it can pass through smoothly because the size of the light-transmitting opening is not smaller than the pixel opening. The matching design between the filter part 181 and the width L2 of the pixel opening, combined with the opening control of the light-absorbing layer 15, makes the color performance more consistent and accurate when viewed from different angles.

[0043] Furthermore, the orthographic projection of the light filter 181 on the substrate 10 overlaps with the orthographic projection of the light-transmitting opening on the substrate 10. This alignment ensures that the light emitted from the light-emitting layer 13 can accurately pass through the light-transmitting opening and then undergo color filtering by the light filter 181, avoiding color distortion caused by light path misalignment.

[0044] Further reference Figure 3 In the cross-sectional structure of the display panel 100 along the thickness direction, the width L1 of the light-transmitting opening is equal to the width L3 of the light-filtering part 181, ensuring that the light passing through the light-transmitting opening can cover the effective area of ​​the light-filtering part 181, maximizing light utilization efficiency. At the same time, the equal size design also avoids light leakage or loss caused by size mismatch, further improving the uniformity of the display effect.

[0045] When an electric current is applied between the first electrode layer 14 and the second electrode layer 11, the light-emitting layer 13 emits light. The emitted light first passes through the light-transmitting opening of the light-absorbing layer 15, which absorbs stray light and unwanted reflected light, allowing only useful light to pass through the opening. The light from the opening is then color-filtered by the light-filtering section 181, ultimately forming the desired display color output.

[0046] Furthermore, in this embodiment, the thickness of the light-absorbing layer 15 is controlled to be less than 1 micrometer. Specifically, the thickness of the light-absorbing layer 15 can be set to values ​​such as 0.1 micrometer, 0.3 micrometer, 0.5 micrometer, 0.7 micrometer, or 0.9 micrometer. By limiting the thickness of the light-absorbing layer 15 to less than 1 micrometer, the overall performance of the device is avoided from being affected by excessive thickness, light loss during transmission is reduced, and light from more viewing angles can be effectively emitted, ensuring effective transmission of light from a wide viewing angle, thereby maintaining good brightness performance at a wide viewing angle. The thickness of the light-absorbing layer 15 of less than 1 micrometer provides the necessary light absorption function without excessively obstructing light transmission, thus significantly improving the display effect at a wide viewing angle while ensuring display quality.

[0047] Furthermore, the material of the light-absorbing layer 15 includes at least one of organic materials, inorganic materials, or metal oxides. Organic materials can be polymer-based materials, possessing good film-forming properties and optical performance. Inorganic materials can be silicon-based compounds or carbon-based materials, possessing excellent thermal and chemical stability. Metal oxides can be materials such as alumina, zinc oxide, or titanium oxide, possessing adjustable optical band gaps and good light transmission performance.

[0048] In a preferred embodiment, the light-absorbing layer 15 is a composite material of organic materials and metal oxides, with the light absorption performance optimized by adjusting the ratio of the two materials. The organic materials provide flexibility and processability, while the metal oxides provide stable optical properties and durability.

[0049] In another preferred embodiment, the light-absorbing layer 15 adopts a multi-layer structure design, with an inorganic material as the base layer at the bottom, a metal oxide as the functional layer in the middle, and an organic material as the protective layer at the top. This multi-layer structure can fully utilize the advantages of different materials to achieve better optical and mechanical properties.

[0050] In one embodiment, the display panel 100 includes an optical adhesive 19 and a cover plate 20. The optical adhesive 19 covers the filter film layer 18; the cover plate 20 is attached to the filter film layer 18 via the optical adhesive 19. The optical adhesive 19 is made of a transparent optical material, possessing excellent optical transmittance and adhesion properties. The optical adhesive 19 layer has a uniform thickness, ensuring uniform light propagation and avoiding optical distortion caused by uneven thickness. The refractive index of the optical adhesive 19 matches the refractive index of the filter film layer 18 and the cover plate 20, reducing interface reflection loss.

[0051] Furthermore, the cover plate 20 is made of high-transparency glass or polymer material, possessing good mechanical strength and weather resistance. The surface of the cover plate 20 is polished to ensure surface flatness and smoothness. The optical adhesive 19 forms a reliable bond between the cover plate 20 and the filter film layer 18, not only serving a fixing function but also filling tiny gaps, eliminating air interfaces, and improving overall optical performance.

[0052] The combination of optical adhesive 19 and cover plate 20 further enhances the overall performance of the display device. Optical adhesive 19 eliminates the air layer between the filter film layer 18 and cover plate 20, reducing light reflection and scattering at the interface and improving light transmittance and display clarity. Cover plate 20 provides physical protection for the entire display device, preventing the external environment from affecting the internal optical structure.

[0053] This embodiment also provides a method for manufacturing a display panel 100, see reference. Figure 4 This includes the following steps: S01: Reference Figure 5 A substrate 10 is provided, on which a second electrode layer 11 and a pixel defining layer 12 are formed, and a plurality of pixel openings are defined in the pixel defining layer 12. A substrate 10 is provided as the support carrier for the entire device. The substrate 10 can be a glass substrate 10 or a flexible substrate 10. A second electrode layer 11 is sequentially formed on the substrate 10. The second electrode layer 11 serves as the anode layer of the device and is made of a conductive material. Subsequently, a pixel defining layer 12 is formed on the second electrode layer 11. The pixel defining layer 12 is made of an insulating material, and multiple pixel openings are defined in the pixel defining layer 12 using a photolithography process. Each pixel opening corresponds to the light-emitting area of ​​a light-emitting unit. The shape and size of the pixel openings are designed according to the display requirements to ensure good separation between the pixels.

[0054] S02: Reference Figure 6 A light-emitting layer 13 is formed inside the pixel opening; A light-emitting layer 13 is formed within the pixel opening. The light-emitting layer 13 is the core functional layer of the device, responsible for generating light output. The material selection and thickness control of the light-emitting layer 13 affect the luminous efficiency and color characteristics of the device. The light-emitting layer 13 can be formed using processes such as evaporation, sputtering, or solution methods to ensure that the light-emitting layer 13 is uniformly distributed within the pixel opening and forms a good interface bond with the pixel limiting layer 12.

[0055] S03: Reference Figure 7 A first electrode layer 14 is formed by vapor deposition on the light-emitting layer 13 using a common photomask; A first electrode layer 14 is formed by vapor deposition on the light-emitting layer 13 using a common mask. A vacuum evaporation process is employed, in which the light-emitting layer 13 is placed in a vacuum evaporation chamber, the common mask is placed over the surface of the light-emitting layer 13, and electrode material is uniformly vapor-deposited onto the light-emitting layer 13 through an evaporation source to form a continuous first electrode layer 14. The use of a common mask ensures that the first electrode layer 14 forms a uniform coverage across the entire surface of the light-emitting layer 13, providing stable electrode connections.

[0056] S04: Reference Figure 8 A patterned light-absorbing layer 15 is formed by vapor deposition on the first electrode layer 14 using a fine metal mask; A patterned light-absorbing layer 15 is formed by vapor deposition on the first electrode layer 14 using a fine metal mask. The fine metal mask has a pre-designed opening pattern, which is aligned and attached to the surface of the first electrode layer 14. The light-absorbing material is selectively deposited in specific areas of the first electrode layer 14 using a vacuum evaporation process to form the light-absorbing layer 15 with a specific pattern. The high-precision opening design of the fine metal mask ensures that the light-absorbing layer 15 can be accurately positioned in the area where stray light needs to be absorbed, effectively controlling the light propagation path.

[0057] S05: Reference Figure 9 An encapsulation layer 16 is formed on the light-absorbing layer 15; Specifically, a chemical vapor deposition or physical vapor deposition process is used to deposit encapsulation material on the surface of the light-absorbing layer 15 to form a dense encapsulation layer 16. The encapsulation layer 16 can effectively protect the underlying light-absorbing layer 15 and the first electrode layer 14, preventing external environmental factors from affecting the device performance.

[0058] The pixel aperture is fabricated by depositing the light-absorbing layer 15 onto the first electrode layer 14 using the above-described method. Compared to the traditional black matrix structure, this structure design shortens the distance between the light-absorbing layer 15 and the light-emitting layer 13, allowing light from more viewing angles to be effectively emitted, thus avoiding the problem of excessive light absorption at large viewing angles.

[0059] Finally, it should be noted that the above descriptions are merely preferred embodiments of this application, and this application is not limited to the above embodiments. It is understood that other improvements and variations derived or conceived by those skilled in the art without departing from the spirit and concept of this application should be considered to be included within the protection scope of this application.

[0060] In some possible implementations, this application also provides a display device, which includes the display panel described in this application. The display device may include devices with image processing capabilities, such as mobile phones, desktop computers, laptops, tablets, automotive displays, wearable devices, etc. Because this display device includes the display panel described in this application, the electronic device has higher reliability.

[0061] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0062] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A display panel, characterized in that, include: substrate; A pixel defining layer is located on one side of the substrate, and the pixel defining layer is provided with a plurality of pixel openings; A light-emitting layer is located on one side of the substrate, and the light-emitting layer includes a plurality of light-emitting units, wherein the light-emitting units are at least partially located within the pixel opening; The first electrode layer is located on the side of the light-emitting layer that is away from the substrate; An encapsulation layer is located on the side of the first electrode layer that faces away from the substrate; A light-absorbing layer is located between the first electrode layer and the encapsulation layer. The orthographic projection of the light-absorbing layer on the substrate is located within the orthographic projection of the pixel defining layer on the substrate. The material of the light-absorbing layer is a vapor-deposited material.

2. The display panel according to claim 1, characterized in that, Also includes: The light extraction layer is located between the first electrode layer and the encapsulation layer; Optionally, the light-absorbing layer is located between the encapsulation layer and the light extraction layer, and the light-absorbing layer is in contact with the light extraction layer; or, the light-absorbing layer is located between the first electrode layer and the light extraction layer, and the light-absorbing layer is in contact with the first electrode layer.

3. The display panel according to claim 1, characterized in that, Also includes: The second electrode layer is located between the substrate and the light-emitting layer; A light filter layer is located on the side of the encapsulation layer opposite to the substrate. The light filter layer includes a plurality of light filter portions, and the orthographic projection of the light filter portions on the substrate overlaps with the orthographic projection of the light-emitting unit on the substrate.

4. The display panel according to claim 3, characterized in that, The light-absorbing layer has a patterned structure and includes multiple light-transmitting openings. In the cross-sectional structure of the display panel along the thickness direction of the display panel, the width of the light-transmitting opening is greater than or equal to the width of the pixel opening, and the width of the filter portion is greater than or equal to the width of the pixel opening.

5. The display panel according to claim 4, characterized in that, The orthographic projection of the filter portion on the substrate overlaps with the orthographic projection of the opening of the light-absorbing layer on the substrate; Preferably, in the cross-sectional structure of the display panel along the thickness direction of the display panel, the width of the light-transmitting opening is equal to the width of the light-filtering portion.

6. The display panel according to claim 1, characterized in that, The thickness of the light-absorbing layer is less than or equal to 1 micrometer.

7. The display panel according to claim 1, characterized in that, The material of the light-absorbing layer includes at least one of organic materials, inorganic materials, or metal oxides.

8. The display panel according to claim 1, characterized in that, Also includes: Optical adhesive is used to cover the filter film layer; A cover plate, which is attached to the filter film layer by the optical adhesive.

9. A method for manufacturing a display panel, characterized in that, Includes the following steps: A substrate is provided, on which a second electrode layer and a pixel defining layer are formed, wherein a plurality of pixel openings are defined in the pixel defining layer; A light-emitting layer is formed within the pixel opening; A first electrode layer is formed by vapor deposition on the light-emitting layer using a common photomask; A patterned light-absorbing layer is deposited on the first electrode layer using a fine metal mask, wherein the orthogonal projection of the light-absorbing layer on the substrate is located within the orthogonal projection of the pixel defining layer on the substrate; An encapsulation layer is formed on the light-absorbing layer.

10. A display device, characterized in that, Includes the display panel as described in any one of claims 1 to 8.

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