A culture device for growing mushrooms

Abstract

The application discloses a culture device for mushroom planting, which comprises a planting frame, a supporting plate, a plurality of liquid resistance trigger type gas-liquid regulating components, a negative pressure main pipeline and a drainage pipeline. The supporting plate is used for carrying culture medium and is provided with discharge holes corresponding to different culture areas; each gas-liquid regulating component is installed on the lower side of the supporting plate and comprises a filter cartridge and a gas-liquid regulating valve. The gas-liquid regulating valve is internally provided with a valve core, a return spring, a first chamber, a second chamber and a flow guide channel; a liquid discharge pipe is in communication with the drainage pipeline; and a negative pressure pipe is in communication with the negative pressure main pipeline. Under normal conditions, the valve core blocks a main liquid discharge communication port, so that gas in the filter cartridge is discharged at a small flow rate through the flow guide channel to take away carbon dioxide; when liquid water enters the flow guide channel, liquid resistance causes the negative pressure of the second chamber to increase, thereby driving the valve core to open the main liquid discharge communication port, so that the liquid water is discharged through the liquid discharge pipe. The device can realize automatic liquid discharge in water areas and continuous gas discharge in water-free areas and is suitable for multi-layer and multi-area mushroom planting.

Description

Technical Field

[0001] This invention relates to the field of mushroom cultivation technology, and in particular to a cultivation device for mushroom cultivation. Background Technology

[0002] Mushroom cultivation typically requires suitable temperature, humidity, ventilation, and carbon dioxide concentration. Existing mushroom cultivation equipment usually includes cultivation racks with multiple layers of support plates. The culture medium is laid or placed on these support plates to increase the number of mushrooms cultivated per unit space. During mushroom growth, the mycelium and fruiting bodies continuously respire and release carbon dioxide. Simultaneously, during the fruiting stage, to maintain the high humidity required for mushroom growth, methods such as spraying, watering, or humidified air circulation are usually needed to increase the humidity of the cultivation space.

[0003] Existing cultivation devices typically reduce carbon dioxide concentration and humidity within the cultivation space through overall ventilation, air exchange, or dehumidification. For example, air inlets, outlets, fans, or temperature and humidity control devices are installed in cultivation rooms, sheds, or boxes to allow outside air to enter and exhaust internal air. While these methods can improve the overall environment of the cultivation space to some extent, for cultivation devices with multiple planting racks, support plates, and cultivation zones, the overall ventilation airflow usually preferentially flows along open areas with less resistance, making it difficult to stably pass through the pores or gaps in the culture medium on each support plate. Therefore, localized carbon dioxide retention zones may still form inside the culture medium, at the bottom of the culture medium, under the support plates, and between adjacent cultivation zones, affecting the uniformity of mushroom fruiting and the morphology of the fruiting bodies.

[0004] Maintaining high humidity is crucial for mushroom cultivation. Factors such as spraying, sprinkling, condensation, and localized seepage from the culture medium can easily cause water accumulation on some support plates or in certain cultivation areas. Because the multiple cultivation areas are geographically dispersed, it's difficult to determine in practice which areas have water accumulation and which only require venting. While using a uniform drainage hole or fixed outlet is simple, its fixed discharge pattern prevents automatic switching based on the presence of liquid water in each cultivation area. If all outlets are kept wide open, even areas without water accumulation will be continuously pumped at high flow rates, leading to water loss from the culture medium, localized humidity drops, and hindering normal mushroom growth. Conversely, if the drainage capacity is too low, areas with water accumulation will struggle to drain promptly, resulting in overly wet bottoms of the culture medium, the growth of unwanted microorganisms, or localized oxygen deficiency.

[0005] To address the aforementioned issues, existing technologies may consider installing sensors, solenoid valves, independent fans, or independent drainage control structures in different cultivation areas. This allows for the control of exhaust and drainage in corresponding areas by detecting humidity, water level, or gas concentration. However, for multi-layered planting racks and large-scale cultivation scenarios, the number of cultivation areas is significant. Configuring detection and electrical control components for each cultivation area would lead to complex piping and control circuits, higher costs, and more potential points of failure. Furthermore, in high-humidity environments, the reliability and ease of maintenance of electrical components would be compromised.

[0006] Therefore, the existing mushroom cultivation devices still have the following shortcomings: (1) It is difficult for the overall ventilation to pass through the pores or gaps of the culture medium stably, and carbon dioxide is easily trapped at the bottom of the culture medium and under the support plate; (2) It is difficult to judge in time whether there is water accumulation in multiple cultivation areas, and the unified discharge structure cannot achieve differentiated treatment between water-containing and waterless areas; (3) It is difficult for the fixed discharge port to take into account the different needs of small flow exhaust when there is no water and rapid liquid drainage when there is water; (4) If the system is controlled zone by zone through sensors and electronic valves, the system complexity and maintenance cost are high.

[0007] Therefore, it is necessary to provide a cultivation device for mushroom cultivation that can automatically switch its working state based on the state of the medium entering the discharge component in each cultivation area without manual judgment or zone-by-zone electronic control when multiple cultivation areas share a negative pressure main pipe and drainage pipe: when there is liquid water in a certain cultivation area, the corresponding discharge component automatically opens the drainage channel to drain the water; when there is no liquid water in a certain cultivation area, the corresponding discharge component maintains a low flow rate of exhaust to continue to discharge carbon dioxide and excess moisture, thereby realizing automatic zoned drainage and zoned exhaust of multiple cultivation areas. Summary of the Invention

[0008] The purpose of this invention is to provide a cultivation device for mushroom cultivation, which can realize automatic drainage of water-containing areas and low-flow air venting of waterless areas in multiple cultivation zones, so as to solve the problem that existing cultivation devices are difficult to simultaneously take into account local drainage, carbon dioxide discharge and prevention of excessive water loss of the culture medium.

[0009] To achieve the above objectives, the present invention adopts the following technical solution: a cultivation device for mushroom cultivation, comprising a cultivation rack, a support plate, multiple liquid resistance triggered gas-liquid regulation components, a negative pressure main pipe, and a drainage pipe; The support plate is disposed on the planting rack and is used to support the culture medium. The support plate is provided with discharge holes corresponding to different culture areas. Multiple liquid resistance triggered gas-liquid regulation components are installed on the underside of the support plate. Each of the liquid resistance triggered gas-liquid regulation components includes a filter cartridge and a gas-liquid regulation valve mounted on the filter cartridge, and the filter cartridge is in communication with the discharge port; The gas-liquid regulating valve includes a valve body, a valve core, and a return spring. A partition is provided inside the valve body, which divides the interior of the valve body into a first chamber and a second chamber. The valve core slides through the partition and passes through the first chamber and the second chamber. The valve body is provided with a drain pipe communicating with the first chamber and a negative pressure pipe communicating with the second chamber. The multiple drain pipes are all connected to the drainage pipe, and the multiple negative pressure pipes are all connected to the negative pressure main pipe. The valve core is provided with a flow guiding channel, and the end of the valve core near the filter cartridge is used to block or open the main drain connection between the filter cartridge and the first chamber. Under normal conditions, the reset spring causes the valve core to block the main drain port, allowing the gas inside the filter cartridge to be discharged through the guide channel, the second chamber, the negative pressure pipe, and the negative pressure main pipe; When liquid water enters the flow channel in the filter cartridge, the liquid resistance generated by the flow channel increases the negative pressure in the second chamber. Under the action of negative pressure, the valve core moves against the reset spring and opens the main drain port, allowing the liquid water in the filter cartridge to be discharged through the first chamber, the drain pipe and the drainage pipe.

[0010] Preferably, there are multiple support plates, which are spaced apart along the height of the planting rack; each support plate is provided with at least one liquid resistance triggered gas-liquid regulation component below it, each liquid resistance triggered gas-liquid regulation component corresponds to a different culture area, and can independently switch between exhaust and drainage states according to the state of the medium entering the filter cartridge in the corresponding culture area.

[0011] Preferably, a plurality of culture trays are placed on the support plate, and the culture medium is contained in the culture trays, with each culture tray corresponding to a culture area.

[0012] Preferably, the partition is a sealing ring installed in the valve body, the first chamber and the second chamber are respectively disposed on both sides of the sealing ring, and the valve core slides through the sealing ring.

[0013] The flow channel includes a throttling input orifice, and a first output orifice and a second output orifice connected to the throttling input orifice.

[0014] The throttling input orifice is located at the end of the valve core facing the filter cartridge. The flow cross-sectional area of ​​the throttling input orifice is smaller than the flow cross-sectional area of ​​the main drain port, so that when air passes through the throttling input orifice, a small flow exhaust path is formed, and when liquid water enters the throttling input orifice, it can generate liquid resistance that drives the valve core to move.

[0015] The diameter of the first output hole is smaller than that of the second output hole; when the valve core blocks the main drain connection port, the sealing ring blocks the opening of the second output hole, and the first output hole communicates with the second chamber.

[0016] Preferably, when the liquid water in the filter cartridge decreases or is drained, the medium entering the guide channel is mainly air. The flow resistance at the guide channel decreases, the negative pressure in the second chamber decreases, the reset spring pushes the valve core to reset, so that the valve core re-seals the main drain port, and the gas in the filter cartridge is discharged at a small flow rate through the throttling inlet, the first outlet, the second chamber, the negative pressure pipe and the negative pressure main pipe.

[0017] Preferably, the filter cartridge contains filter media, and a removable plug is threaded onto the bottom end of the filter cartridge.

[0018] Preferably, the main negative pressure pipeline is connected to a negative pressure suction device, which includes a gas-liquid separator and a negative pressure generator. The inlet of the gas-liquid separator is connected to the main negative pressure pipeline, and the gas outlet of the gas-liquid separator is connected to the negative pressure generator. The drainage pipeline is connected to a water collection tank.

[0019] The present invention has the following beneficial effects: 1. This application provides a liquid resistance triggered gas-liquid regulation component below the support plate and connects the filter cartridge with the discharge hole on the support plate. Under the action of the negative pressure main pipeline, an airflow path can be formed from above the culture medium downward through the pores or gaps of the culture medium, thereby removing carbon dioxide trapped inside the culture medium, at the bottom of the culture medium and below the support plate, thus improving the problem that ordinary overall ventilation is difficult to penetrate the culture medium area.

[0020] 2. Under normal conditions, the gas-liquid regulating valve of this application forms a small-flow exhaust path through the guide channel on the valve core, so as to keep the culture area in a micro-ventilated state. When liquid water enters the guide channel, the liquid resistance generated by the liquid water increases the negative pressure in the second chamber, thereby driving the valve core to open the main drain port, so that the liquid water in the filter cartridge is discharged through the first chamber and the drain pipe, thereby realizing the automatic increase of the drain capacity when there is water.

[0021] 3. After the liquid water is drained, the medium entering the guide channel is mainly air. The flow resistance at the guide channel is reduced, the negative pressure in the second chamber is reduced, the reset spring pushes the valve core to reset and re-seal the main drain port, so that the component returns to the low flow rate exhaust state, thereby avoiding the loss of water in the culture medium or the decrease in humidity of the culture environment caused by continuous high flow rate negative pressure suction.

[0022] 4. Multiple liquid resistance-triggered gas-liquid regulation components correspond to different culture zones and are connected to a shared negative pressure main pipeline and a shared drainage pipeline. Since each liquid resistance-triggered gas-liquid regulation component can automatically switch its operating state according to the state of the medium entering its filter cartridge, there is no need to pre-determine which culture zone has water accumulation, nor is it necessary to install sensors, solenoid valves, or independent fans in each culture zone. Culture zones with liquid water can automatically open the main drainage port to drain water, while culture zones without liquid water maintain a low-flow exhaust state to continue to remove carbon dioxide and excess moisture. This achieves automatic zoned drainage and venting of multiple culture zones and reduces system control complexity.

[0023] 5. The filter cartridge is equipped with filter media, and the filter media can be replaced and the filter cartridge can be cleaned through a removable plug. This can prevent culture medium debris and impurities from entering the gas-liquid regulating valve or pipeline with the gas-liquid flow, reduce the risk of blockage, and improve the stability and maintenance convenience of the device in long-term use.

[0024] 6. Through the combination of multi-layer support plates and multiple liquid resistance triggered gas-liquid regulation components, this cultivation device is suitable for multi-layer and multi-region mushroom cultivation scenarios. When used in cultivation sheds, cultivation rooms or large-scale cultivation spaces, multi-point exhaust and drainage can be achieved through a unified negative pressure main pipeline and a unified drainage pipeline, which facilitates centralized layout and large-scale management. Attached Figure Description

[0025] Figure 1 This is a first-view three-dimensional structural diagram of the culture device proposed in this invention.

[0026] Figure 2 This is a second-view three-dimensional structural diagram of the culture device proposed in this invention.

[0027] Figure 3 This is a front view schematic diagram of the culture device proposed in this invention.

[0028] Figure 4 This is a three-dimensional structural diagram of the liquid resistance triggered gas-liquid regulation component proposed in this invention.

[0029] Figure 5 This is a cross-sectional structural diagram of the liquid resistance triggered gas-liquid regulation component proposed in this invention.

[0030] Figure 6 This is a three-dimensional structural diagram of the valve core proposed in this invention.

[0031] Figure 7 This is a schematic diagram of the orthographic structure of the valve body proposed in this invention, wherein the valve core is in a state of blocking the main drain port.

[0032] Figure 8This is a schematic diagram of the orthographic structure of the valve body proposed in this invention, wherein the valve core is in the open main drain port state.

[0033] Figure 9 This is a schematic diagram of the cultivation device proposed in this invention used in a multi-layer, multi-region mushroom cultivation scenario.

[0034] In the picture: 100. Planting rack; 200. Support plate; 201. Culture tray; 301. Filter cartridge; 302. Gas-liquid regulating valve; 303. Valve body; 304. Valve core; 305. Return spring; 306. Sealing ring; 307. First chamber; 308. Second chamber; 309. Drain pipe; 310. Negative pressure pipe; 311. Flow guide channel; 312. Throttling input port; 313. First output port; 314. Second output port; 315. Main drain connection port; 400, negative pressure main pipe; 500, drainage pipe. Detailed Implementation

[0035] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0036] In the description of this invention, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0037] Example 1 Reference Figures 1 to 3 This embodiment provides a cultivation device for mushroom cultivation, including a cultivation rack 100, a support plate 200, multiple liquid resistance triggered gas-liquid regulation components, a negative pressure main pipe 400, and a drainage pipe 500.

[0038] The planting rack 100 supports the support plate 200. The support plate 200 is disposed on the planting rack 100 and is used to hold the culture medium. In one embodiment, the support plate 200 can be a flat plate, a frame, a mesh, or a tray structure. The support plate 200 is provided with drainage holes corresponding to different culture areas. Multiple drainage holes can be arranged at intervals along the length of the support plate 200, so that each culture area on the support plate 200 can correspond to at least one drainage hole.

[0039] In this embodiment, multiple culture trays 201 can be placed on the support plate 200, and the culture medium is contained in the culture trays 201. Each culture tray 201 can correspond to a culture area. The culture trays 201 can be perforated plates, grid trays, perforated trays, or breathable and permeable containers, so that air above or inside the culture medium can pass through the pores or gaps of the culture medium and enter the lower area of ​​the support plate 200 through the drainage holes on the support plate 200. The culture trays 201 can also allow spray-dried water, condensate, or localized water generated during the culture process to flow downwards into the area corresponding to the drainage holes.

[0040] like Figure 4 As shown, multiple liquid resistance-triggered gas-liquid regulating components are installed on the underside of the support plate 200, and are respectively configured to correspond to the discharge holes on the support plate 200. Each liquid resistance-triggered gas-liquid regulating component corresponds to a culture area and is used to perform small-flow venting or drainage of the culture area. The negative pressure side of each liquid resistance-triggered gas-liquid regulating component is connected to the negative pressure main pipe 400, and the drainage side of each liquid resistance-triggered gas-liquid regulating component is connected to the drainage pipe 500.

[0041] The main negative pressure pipe 400 provides negative pressure suction to each liquid resistance triggered gas-liquid regulating component. The drainage pipe 500 centrally receives the liquid water discharged from each liquid resistance triggered gas-liquid regulating component. Thus, multiple cultivation areas do not require separate independent fans or drainage devices; they can achieve zoned air venting and zoned liquid drainage through the shared main negative pressure pipe 400 and shared drainage pipe 500.

[0042] The main negative pressure pipeline 400 connects to a negative pressure suction device, which may include a gas-liquid separator and a negative pressure generator. The inlet of the gas-liquid separator is connected to the main negative pressure pipeline 400, and the gas outlet of the gas-liquid separator is connected to the negative pressure generator. A liquid collection section is provided at the bottom of the gas-liquid separator. The negative pressure generator can be a suction fan, a negative pressure pump, a diaphragm pump, a gas-liquid dual-purpose pump, or a water ring vacuum pump. Since the main negative pressure pipeline 400 may carry a small amount of water mist or droplets during operation, the gas-liquid separator can prevent liquid water from directly entering the negative pressure generator, thus improving the stability of system operation.

[0043] The drainage pipe 500 can be connected to a water collection tank for centralized collection of liquid water discharged from each culture area. The drainage pipe 500 can also be connected to a main drainage pipe or the liquid collection section of a gas-liquid separator, thereby allowing the discharged liquid water to be centrally discharged or recycled.

[0044] In this embodiment, when the culture device is working, external air conditioned by temperature and / or humidity can be delivered above the culture medium. After the negative pressure is generated in the main negative pressure pipe 400, each liquid resistance triggered gas-liquid regulation component creates a downward suction effect on the corresponding culture area, causing air to enter the liquid resistance triggered gas-liquid regulation component from above the culture medium through the pores or gaps of the culture medium, the culture tray 201, and the discharge holes of the support plate 200, thereby carrying away carbon dioxide and excess moisture trapped in the culture medium area, the bottom of the culture medium, and below the support plate 200.

[0045] When no liquid water enters the corresponding liquid resistance-triggered gas-liquid regulating component in a certain cultivation area, the component maintains a low-flow exhaust state. When liquid water is present in a certain cultivation area and enters the corresponding liquid resistance-triggered gas-liquid regulating component, the component automatically switches to the liquid drainage state, discharging the liquid water in that area into the drainage pipe 500. Since each liquid resistance-triggered gas-liquid regulating component can operate independently according to the state of the medium entering it, the device does not need to pre-determine which cultivation area has water accumulation, nor does it require setting sensors, solenoid valves, or independent fans for each cultivation area. It can achieve a zoned adaptive discharge effect of automatic drainage in water-containing areas and continuous exhaust in waterless areas.

[0046] Example 2 Reference Figures 4 to 6 Each liquid resistance triggered gas-liquid regulation assembly includes a filter cartridge 301 and a gas-liquid regulation valve 302 mounted on the filter cartridge 301.

[0047] The filter cartridge 301 communicates with the discharge hole on the support plate 200 to receive gas, liquid water, and / or high-humidity gas passing through the culture medium, culture tray 201, and support plate 200. The filter cartridge 301 is vertically positioned and contains filter media. The filter media prevents culture medium debris, bacterial residue, impurities, or large particles from entering the gas-liquid regulating valve 302, reducing the risk of clogging. The filter media can be filter cotton, filter screen, sponge filter element, porous filter element, metal mesh cylinder, or other materials that allow air and liquid water to pass through while intercepting impurities. A removable plug is threaded onto the bottom end of the filter cartridge 301. After removing the plug, the user can replace the filter media or flush, clean, or disinfect the inside of the filter cartridge 301. This structure helps improve the long-term operational stability of the device and reduces maintenance difficulty.

[0048] like Figure 5 As shown, the gas-liquid regulating valve 302 includes a valve body 303, a valve core 304, and a return spring 305. The valve body 303 is mounted on the filter cartridge 301, and a partition is provided inside the valve body 303. The partition divides the interior of the valve body 303 into a first chamber 307 and a second chamber 308. The valve core 304 slides through the partition and passes through the first chamber 307 and the second chamber 308.

[0049] In this embodiment, the partition can be a sealing ring 306 installed inside the valve body 303. The first chamber 307 and the second chamber 308 are respectively disposed on both sides of the sealing ring 306, and the valve core 304 slides through the sealing ring 306. The sealing ring 306 can guide and seal the valve core 304, so that the first chamber 307 and the second chamber 308 are mainly connected through the flow channel 311 on the valve core 304, thereby ensuring that the gas-liquid regulating valve 302 can generate an action response based on the change in flow resistance at the flow channel 311.

[0050] The valve body 303 is equipped with a drain pipe 309 and a negative pressure pipe 310. The drain pipe 309 is connected to the first chamber 307, and the negative pressure pipe 310 is connected to the second chamber 308. The drain pipes 309 of the multiple liquid resistance triggered gas-liquid regulating components are all connected to the drain pipe 500, and the negative pressure pipes 310 of the multiple liquid resistance triggered gas-liquid regulating components are all connected to the main negative pressure pipe 400.

[0051] The end of the valve core 304 near the filter cartridge 301 is used to block or open the main drainage port 315 between the filter cartridge 301 and the first chamber 307. The main drainage port 315 is the main channel for liquid water in the filter cartridge 301 to enter the first chamber 307. When the valve core 304 blocks the main drainage port 315, the liquid water in the filter cartridge 301 cannot directly enter the first chamber 307 through the main drainage port 315; when the valve core 304 moves and opens the main drainage port 315, the liquid water in the filter cartridge 301 can enter the first chamber 307 through the main drainage port 315, and then enter the drainage pipe 500 through the drainage pipe 309.

[0052] The return spring 305 is used to reset the valve core 304 toward the filter cartridge 301. Under normal conditions, the return spring 305 pushes the valve core 304, causing the end of the valve core 304 near the filter cartridge 301 to block the main drain port 315.

[0053] like Figure 5 , Figure 6 As shown, a flow guiding channel 311 is provided on the valve core 304. The flow guiding channel 311 is used to form a small-flow exhaust path under normal conditions and to form a liquid resistance trigger path when liquid water enters. In one embodiment, the flow guiding channel 311 includes a throttling input hole 312 and a first output hole 313 and a second output hole 314 communicating with the throttling input hole 312. The throttling input hole 312 is located at the end of the valve core 304 facing the filter cartridge 301 and is used to receive gas or liquid water in the filter cartridge 301. The flow cross-sectional area of ​​the throttling input hole 312 is smaller than the flow cross-sectional area of ​​the main drain port 315, so that when air passes through the throttling input hole 312, a small-flow exhaust path is formed, and when liquid water enters the throttling input hole 312, a larger liquid resistance is generated.

[0054] The first output port 313 and the second output port 314 are respectively connected to the throttling input port 312. The diameter of the first output port 313 is smaller than that of the second output port 314. When the valve core 304 is in the state of blocking the main drain connection port 315, the sealing ring 306 blocks the opening of the second output port 314, and the first output port 313 is connected to the second chamber 308. Thus, under normal conditions, the gas in the filter cartridge 301 can only enter the second chamber 308 through the throttling input port 312 and the first output port 313, thereby forming a small flow exhaust path and avoiding excessive suction of the culture medium area by the negative pressure main pipeline 400.

[0055] In this embodiment, the spring force of the return spring 305 can be configured to be greater than the driving force generated by the negative pressure of the second chamber 308 acting on the valve core 304 when air enters the second chamber 308 through the guide channel 311, and less than the driving force generated by the negative pressure of the second chamber 308 acting on the valve core 304 when liquid water enters the second chamber 308 through the guide channel 311. Therefore, in the absence of water, the valve core 304 will not be accidentally opened due to ordinary exhaust negative pressure; in the presence of water, after liquid water enters the guide channel 311 and generates greater liquid resistance, the negative pressure of the second chamber 308 increases, which can drive the valve core 304 to move against the return spring 305.

[0056] Example 3 Reference Figure 7 and Figure 8 This embodiment illustrates the switching process between the exhaust state and the liquid discharge state of the liquid resistance triggered gas-liquid regulation component.

[0057] I. Normal Exhaust Condition Reference Figure 7 Under normal conditions, the filter cartridge 301 mainly contains air or high-humidity gas. The negative pressure main pipe 400 creates a negative pressure suction effect on the second chamber 308 through the negative pressure pipe 310. The reset spring 305 pushes the valve core 304, causing the end of the valve core 304 near the filter cartridge 301 to block the main drain port 315.

[0058] At this time, the main drain port 315 between the filter cartridge 301 and the first chamber 307 is blocked by the valve core 304, and the gas in the filter cartridge 301 cannot enter the first chamber 307 through the main drain port 315. The gas in the filter cartridge 301 is discharged sequentially through the throttling inlet port 312, the first outlet port 313, the second chamber 308, the negative pressure pipe 310, and the negative pressure main pipe 400.

[0059] Because the diameter of the first output port 313 is small, and the flow cross-sectional area of ​​the throttling input port 312 is smaller than that of the main drainage port 315, a low-flow exhaust path is formed in this state. This low-flow exhaust path allows air above the culture medium to enter the filter cartridge 301 under negative pressure through the pores or gaps of the culture medium, the culture tray 201, and the exhaust holes on the support plate 200, and is further discharged through the guide channel 311, thereby removing carbon dioxide and excess moisture from the culture medium area.

[0060] At the same time, since the exhaust flow rate is small in this state, it will not produce a continuous large flow of suction on the culture medium, thus avoiding water loss or local humidity drop in the culture medium.

[0061] With the valve core 304 blocking the main drain port 315, the sealing ring 306 blocks the opening of the second output port 314, and the first output port 313 communicates with the second chamber 308. Therefore, the second output port 314 will not form a large-flow exhaust path under normal conditions, which is beneficial to maintaining the stability of the small-flow exhaust state.

[0062] II. Water-triggered drainage state Reference Figure 8 When water accumulates, condensates, settles from spray, or seeps into the culture medium in a certain cultivation area, liquid water enters the corresponding filter cartridge 301 through the discharge hole on the support plate 200. After entering the filter cartridge 301, the liquid water enters the throttling inlet 312 of the valve core 304.

[0063] Because the flow resistance generated when liquid water passes through the throttling inlet 312 and the guide channel 311 is greater than the flow resistance generated when air passes through, the replenishment of the second chamber 308 is insufficient under the continuous suction action of the negative pressure main pipe 400, and the negative pressure in the second chamber 308 increases. When the driving force generated by the negative pressure in the second chamber 308 acting on the valve core 304 is greater than the elastic force of the return spring 305 and the frictional resistance between the valve core 304 and the sealing ring 306, the valve core 304 moves away from the filter cartridge 301.

[0064] After the valve core 304 moves, the end of the valve core 304 near the filter cartridge 301 moves away from the main drain port 315, making the filter cartridge 301 connected to the first chamber 307. At this time, the liquid water in the filter cartridge 301 can enter the first chamber 307 through the main drain port 315, and then enter the drainage pipe 500 through the drain pipe 309, and finally be collected in the water collection tank or discharged from the culture device.

[0065] Therefore, in this embodiment, the change in liquid resistance generated after liquid water enters the guide channel 311 triggers an increase in negative pressure in the second chamber 308, which further drives the valve core 304 to open the main drain port 315. In other words, this component does not achieve drainage through a water level sensor, solenoid valve, or manual judgment, but achieves mechanical automatic drainage through the change in liquid resistance caused by the liquid water itself.

[0066] III. Reset and venting state after drainage When the liquid water in the filter cartridge 301 decreases or is completely drained, the medium entering the guide channel 311 becomes predominantly air again. At this time, the flow resistance generated by the air passing through the throttling inlet 312 and the guide channel 311 is small, and the negative pressure in the second chamber 308 decreases.

[0067] When the driving force of the negative pressure in the second chamber 308 acting on the valve core 304 is less than the reset force of the return spring 305, the return spring 305 pushes the valve core 304 to reset towards the filter cartridge 301, causing the valve core 304 to re-seal the main drain port 315. After the main drain port 315 is blocked, the liquid resistance triggered gas-liquid regulating component exits the drain state and re-enters the low-flow exhaust state.

[0068] At this time, the gas in the filter cartridge 301 continues to be discharged at a small flow rate through the throttling inlet 312, the first outlet 313, the second chamber 308, the negative pressure pipe 310 and the negative pressure main pipe 400, thereby continuing to provide micro-ventilation to the corresponding culture area and removing carbon dioxide and excess moisture from the culture medium area.

[0069] As can be seen from the above working process, the liquid resistance triggered gas-liquid regulation component of this embodiment can maintain a small flow rate of venting in the absence of water, automatically open the main drainage port 315 to drain the liquid in the presence of water, and automatically reset to resume small flow rate venting after the water is drained. For multiple culture areas, areas with liquid water can automatically drain water, while areas without liquid water can continuously vent air, thereby realizing automatic zoned drainage and zoned venting.

[0070] Example 4 Reference Figure 9 In one embodiment, the mushroom cultivation device can be applied to multi-layer, multi-area mushroom cultivation scenarios. The cultivation rack 100 can be configured as a multi-layer structure, with multiple support plates 200 arranged at intervals along the height direction of the cultivation rack 100. Multiple cultivation trays 201 can be placed on each support plate 200, each cultivation tray 201 contains culture medium, and each cultivation tray 201 corresponds to a cultivation area.

[0071] One or more liquid resistance-triggered gas-liquid regulation components can be installed below each support plate 200. Multiple liquid resistance-triggered gas-liquid regulation components can be distributed along the length of the support plate 200 to correspond to different culture areas. The negative pressure pipe 310 of each liquid resistance-triggered gas-liquid regulation component is connected to the main negative pressure pipe 400, and the drain pipe 309 of each liquid resistance-triggered gas-liquid regulation component is connected to the drainage pipe 500.

[0072] In large-space cultivation rooms, cultivation sheds, or factory-style mushroom cultivation spaces, multiple cultivation racks 100 can be installed. The liquid resistance-triggered gas-liquid regulation components on multiple cultivation racks 100 can be connected to one or more negative pressure main pipes 400, and also to one or more drainage pipes 500. The negative pressure main pipe 400 is connected to a negative pressure suction device, and the drainage pipes 500 are connected to a water collection tank.

[0073] It should be noted that, in order to reduce mutual interference when multiple liquid resistance triggered gas-liquid regulating components share the negative pressure main pipe 400 and the drainage pipe 500, in one embodiment, a throttling connector is provided between each negative pressure pipe 310 and the negative pressure main pipe 400. The throttling connector can limit the instantaneous airflow exchange rate between the corresponding negative pressure pipe 310 and the negative pressure main pipe 400, so that the pressure fluctuation generated by one liquid resistance triggered gas-liquid regulating component when liquid water enters the guide channel 311 and actuates is not easily transmitted to other liquid resistance triggered gas-liquid regulating components. Furthermore, the negative pressure main pipeline 400 is connected to a pressure stabilizing chamber, which has a larger effective volume than a single negative pressure pipe 310. This chamber is used to buffer the negative pressure fluctuations generated when multiple negative pressure pipes 310 are connected in parallel to the negative pressure main pipeline 400, so that each liquid resistance triggered gas-liquid regulating component can operate independently according to the medium state in its own filter cartridge 301 under a relatively stable negative pressure reference. In one alternative embodiment, a check valve is provided between each drain pipe 309 and the drain pipe 500. The check valve allows liquid water to flow from the first chamber 307 to the drain pipe 500 and restricts the liquid water in the drain pipe 500 from flowing back into the first chamber 307.

[0074] In this embodiment, when water accumulates in certain culture areas due to spray settling, condensation, or seepage of the culture medium, the corresponding liquid resistance triggered gas-liquid regulation component automatically switches to the drainage state, allowing the liquid water to be discharged through the drainage pipe 500; while in culture areas without water accumulation, the corresponding liquid resistance triggered gas-liquid regulation component maintains a low-flow exhaust state to continuously discharge carbon dioxide and excess moisture.

[0075] Because each liquid resistance-triggered gas-liquid regulation component can independently switch between exhaust and drainage states based on the state of the medium entering its own filter cartridge 301, the device does not require separate humidity sensors, water level sensors, solenoid valves, or independent fans for each cultivation area. For large-scale mushroom cultivation scenarios with a large number of cultivation areas, this structure can significantly reduce the complexity of pipeline layout and electrical control systems, reduce maintenance workload, and improve the adaptive capability of exhaust and drainage in different cultivation areas.

[0076] In one alternative embodiment, a temperature and humidity regulated air supply device can be installed within the culture space. This device supplies temperature- and / or humidity-regulated air to the area above the support plate 200. Under the suction of the negative pressure main duct 400, this air enters the filter cartridge 301 from above the culture medium through the pores or gaps in the culture medium, the culture tray 201, and the discharge holes of the support plate 200, and is then discharged by the liquid resistance triggered gas-liquid regulation component. This downward-suction micro-ventilation path reduces carbon dioxide retention inside the culture medium, at the bottom of the culture medium, and below the support plate 200, while also preventing ordinary general ventilation airflow from bypassing the culture medium area.

[0077] In summary, this embodiment, through the cooperation of multiple liquid resistance-triggered gas-liquid regulation components with a shared negative pressure main pipe 400 and a shared drainage pipe 500, enables the mushroom cultivation device to achieve automatic zoned air venting and automatic zoned liquid drainage in multi-layered, multi-zone environments. This structure is particularly suitable for large-scale mushroom cultivation scenarios with multiple cultivation areas, large spaces, and high costs associated with zone-by-zone electrical control.

[0078] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A cultivation device for mushroom cultivation, characterized in that, It includes a planting rack (100), a support plate (200), multiple liquid resistance triggered gas-liquid regulation components, a negative pressure main pipe (400), and a drainage pipe (500). The support plate (200) is disposed on the planting rack (100) and is used to support the culture medium. The support plate (200) is provided with discharge holes corresponding to different culture areas. Multiple liquid resistance triggered gas-liquid regulation components are installed on the underside of the support plate (200). Each of the liquid resistance triggered gas-liquid regulation components includes a filter cartridge (301) and a gas-liquid regulation valve (302) mounted on the filter cartridge (301), the filter cartridge (301) being in communication with the discharge port; The gas-liquid regulating valve (302) includes a valve body (303), a valve core (304), and a return spring (305). The valve body (303) is provided with a partition, which divides the interior of the valve body (303) into a first chamber (307) and a second chamber (308). The valve core (304) slides through the partition and passes through the first chamber (307) and the second chamber (308). The valve body (303) is provided with a drain pipe (309) communicating with the first chamber (307) and a negative pressure pipe (310) communicating with the second chamber (308). The multiple drain pipes (309) are all connected to the drainage pipe (500), and the multiple negative pressure pipes (310) are all connected to the negative pressure main pipe (400). The valve core (304) is provided with a flow channel (311), and the end of the valve core (304) near the filter cartridge (301) is used to block or open the main drain port (315) between the filter cartridge (301) and the first chamber (307). Under normal conditions, the reset spring (305) causes the valve core (304) to block the main drain port (315), allowing the gas in the filter cartridge (301) to be discharged through the guide channel (311), the second chamber (308), the negative pressure pipe (310), and the negative pressure main pipe (400); When liquid water in the filter cartridge (301) enters the guide channel (311), the liquid resistance generated by the liquid water through the guide channel (311) increases the negative pressure in the second chamber (308). Under the action of negative pressure, the valve core (304) moves against the reset spring (305) and opens the main drain port (315), so that the liquid water in the filter cartridge (301) is discharged through the first chamber (307), the drain pipe (309) and the drain pipe (500).

2. The cultivation device for mushroom cultivation according to claim 1, characterized in that: There are multiple support plates (200), and the multiple support plates (200) are spaced apart along the height direction of the planting rack (100); each support plate (200) is provided with at least one liquid resistance triggered gas-liquid regulation component below it, each liquid resistance triggered gas-liquid regulation component corresponds to a different culture area, and can independently switch between exhaust and drainage states according to the state of the medium entering the filter cartridge (301) in the corresponding culture area.

3. The cultivation device for mushroom cultivation according to claim 1, characterized in that: Multiple culture trays (201) are placed on the support plate (200), and the culture medium is contained in the culture trays (201). Each culture tray (201) corresponds to a culture area.

4. The cultivation device for mushroom cultivation according to claim 1, characterized in that: The partition is a sealing ring (306) installed in the valve body (303). The first chamber (307) and the second chamber (308) are respectively disposed on both sides of the sealing ring (306). The valve core (304) slides through the sealing ring (306).

5. The cultivation device for mushroom cultivation according to claim 4, characterized in that: The flow channel (311) includes a throttling input hole (312), a first output hole (313) and a second output hole (314) connected to the throttling input hole (312).

6. The cultivation device for mushroom cultivation according to claim 5, characterized in that: The throttling inlet (312) is located at one end of the valve core (304) facing the filter cartridge (301). The flow cross-sectional area of ​​the throttling inlet (312) is smaller than the flow cross-sectional area of ​​the main drain port (315), so that when air passes through the throttling inlet (312), a small flow exhaust path is formed, and when liquid water enters the throttling inlet (312), it can generate liquid resistance that drives the valve core (304) to move.

7. The cultivation device for mushroom cultivation according to claim 5, characterized in that: The diameter of the first output hole (313) is smaller than that of the second output hole (314); when the valve core (304) blocks the main drain connection port (315), the sealing ring (306) blocks the opening of the second output hole (314), and the first output hole (313) communicates with the second chamber (308).

8. The cultivation device for mushroom cultivation according to claim 7, characterized in that: When the liquid water in the filter cartridge (301) decreases or is drained, the medium entering the guide channel (311) is mainly air. The flow resistance at the guide channel (311) decreases, the negative pressure in the second chamber (308) decreases, the reset spring (305) pushes the valve core (304) to reset, so that the valve core (304) re-seals the main drain port (315), and the gas in the filter cartridge (301) is discharged at a small flow rate through the throttling input hole (312), the first output hole (313), the second chamber (308), the negative pressure pipe (310) and the negative pressure main pipe (400).

9. The cultivation device for mushroom cultivation according to claim 1, characterized in that: The filter cartridge (301) is provided with filter media, and a removable plug is threaded onto the bottom end of the filter cartridge (301).

10. A cultivation device for mushroom cultivation according to claim 1, characterized in that: The negative pressure main pipeline (400) is connected to a negative pressure suction device, which includes a gas-liquid separator and a negative pressure generator. The inlet of the gas-liquid separator is connected to the negative pressure main pipeline (400), and the gas outlet of the gas-liquid separator is connected to the negative pressure generator. The drainage pipeline (500) is connected to the water collection tank.

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