Window member and electronic device including the same

Abstract

Disclosed are a window member and an electronic device including the same, the window member including a cover window, an optical member disposed on the cover window, and a functional member disposed on the optical member. The optical member includes a first refractive layer disposed on the cover window, and at least two groups disposed on the first refractive layer. Each of the at least two groups includes a second refractive layer and a third refractive layer. The second refractive layer and the third refractive layer have different refractive indices from each other. The first refractive layer has a first refractive index between a second refractive index of the second refractive layer and a third refractive index of the third refractive layer. The first refractive layer includes at least silicon.

Description

Technical Field

[0001] This disclosure relates to window components, display devices including the window components, and electronic devices. Background Technology

[0002] With the development of the information society, the demand for display devices is increasing. For example, display devices are being used in various electronic devices such as smartphones, digital cameras, laptops, navigation devices, and smart TVs.

[0003] Display devices include flat panel displays such as liquid crystal displays, field emission displays, and light-emitting displays. Light-emitting displays include organic light-emitting displays, inorganic light-emitting displays, and micro light-emitting displays. Organic light-emitting displays include organic light-emitting elements, inorganic light-emitting displays include inorganic light-emitting elements such as inorganic semiconductors, and micro light-emitting displays include micro light-emitting elements.

[0004] When a display device is exposed to external light such as various types of illumination and natural light, the image created on the display device may not be clearly visible to the user due to reflected light, or may cause eye strain. Therefore, the need for anti-reflection technology is increasing in order to provide display devices with high-quality images. Summary of the Invention

[0005] This disclosure provides a window component that can reduce reflectivity and increase transmittance and hardness, a display device including the window component, and an electronic device.

[0006] It should be noted that the purpose of this disclosure is not limited to the above-described purposes; and other purposes of this disclosure will be apparent to those skilled in the art from the following description.

[0007] According to embodiments of this disclosure, the window component includes: a cover window; an optical component disposed on the cover window; and a functional component disposed on the optical component. The optical component includes: a first refractive layer disposed on the cover window; and at least two groups disposed on the first refractive layer. Each of the at least two groups includes a second refractive layer and a third refractive layer. The second and third refractive layers have different refractive indices. The first refractive layer has a first refractive index between the second refractive index of the second refractive layer and the third refractive index of the third refractive layer. The first refractive layer comprises at least silicon.

[0008] In an embodiment, the first refractive layer comprises an oxide containing silicon, an oxide containing silicon nitride, or a nitride containing silicon.

[0009] In one embodiment, the first refractive layer further comprises a metal, and the metal includes aluminum.

[0010] In an embodiment, the second refractive index of the second refractive layer is greater than the first refractive index of the first refractive layer and the third refractive index of the third refractive layer.

[0011] In an embodiment, the third refractive index of the third refractive layer is less than the first refractive index of the first refractive layer and the second refractive index of the second refractive layer.

[0012] In one embodiment, the third refractive layer is spaced apart from the upper surface of the cover window.

[0013] In one embodiment, the first refractive layer is in direct contact with the surface of the cover window, the second refractive layer is disposed on the first refractive layer, and the third refractive layer is disposed on the second refractive layer.

[0014] In an embodiment, each of at least two groups has a second refractive layer and a third refractive layer that are stacked alternately on top of each other.

[0015] In one embodiment, the first refractive layer has a first refractive index between the fourth refractive index of the covering window and the second refractive index of the second refractive layer.

[0016] In an embodiment, the first refractive index of the first refractive layer is in the range of about 1.4 to about 1.9, the second refractive index of the second refractive layer is in the range of about 1.9 to about 2.3, and the third refractive index of the third refractive layer is in the range of about 1.3 to about 1.5.

[0017] In one embodiment, the first refractive layer comprises at least silicon-containing oxide nitride, and the first refractive layer is in direct contact with the surface of the cover window.

[0018] In an embodiment, the thickness of the first refractive layer is in the range of about 75% to about 95% of the thickness of the third refractive layer disposed at the topmost layer of the optical component.

[0019] In an embodiment, the thickness of the second refractive layer is in the range of about 130% to about 240% of the thickness of the third refractive layer disposed at the topmost layer of the optical component.

[0020] In an embodiment, the thickness of the third refractive layer is in the range of about 1% to about 30% of the total thickness of the optical component.

[0021] In one embodiment, the functional component includes an anti-fingerprint layer, wherein the refractive index of the anti-fingerprint layer is equal to the third refractive index of the third refractive layer that is in direct contact with the anti-fingerprint layer.

[0022] In one embodiment, the upper surface of the cover window facing the first refractive layer includes a roughened structure.

[0023] In an embodiment, the first refractive layer comprises a silicon-containing oxide, the second refractive layer comprises a silicon-containing nitride, and the third refractive layer comprises a silicon-containing oxide.

[0024] According to embodiments of this disclosure, the window component includes: a cover window; an optical component disposed on the cover window; and a functional component disposed on the optical component. The optical component includes: a first refractive layer disposed on the cover window and comprising at least silicon; a third refractive layer disposed on the first refractive layer and having a third refractive index greater than the first refractive index of the first refractive layer; and at least one group comprising alternately stacked second and third refractive layers, the second refractive layer disposed on the third refractive layer and having a second refractive index less than the third refractive index of the third refractive layer. The first refractive layer is in direct contact with the cover window.

[0025] In an embodiment, the first refractive layer comprises an oxide containing silicon, a nitride containing silicon, or an oxide oxynitride containing silicon.

[0026] In one embodiment, the first refractive layer further comprises a metal, and the metal includes aluminum.

[0027] In an embodiment, the first refractive layer comprises silicon nitride or silicon aluminum nitride.

[0028] In an embodiment, the second refractive layer comprises silicon aluminum nitride, and the third refractive layer comprises silicon oxide.

[0029] According to an embodiment of this disclosure, a display device includes: a display panel; an adhesive member disposed on the display panel; a cover window disposed on the adhesive member; an optical member disposed on the cover window; and a functional member disposed on the optical member, wherein the optical member includes a first refractive layer located on the cover window and at least two groups located on the first refractive layer and each including a second refractive layer and a third refractive layer, the second refractive layer and the third refractive layer having different refractive indices, and wherein the refractive index of the first refractive layer is between the refractive indices of the second refractive layer and the third refractive layer, and at least contains silicon.

[0030] In one embodiment, an optical component is formed by depositing a first refractive layer on a cover window, depositing a second refractive layer on the first refractive layer, and depositing a third refractive layer on the second refractive layer.

[0031] According to embodiments of this disclosure, an electronic device includes: a display device for providing an image; a processor for providing image data signals to the display device; a memory for storing data signals for driving; and a power module for generating power. The display device includes: a display panel; an adhesive member disposed on the display panel; a cover window disposed on the adhesive member; an optical component disposed on the cover window; and a functional component disposed on the optical component. The optical component includes: a first refractive layer disposed on the cover window; and at least two groups disposed on the first refractive layer. Each of the at least two groups includes a second refractive layer and a third refractive layer, the second and third refractive layers having different refractive indices from each other. The first refractive layer has a first refractive index between the second refractive index of the second refractive layer and the third refractive index of the third refractive layer. The first refractive layer comprises at least silicon.

[0032] According to embodiments of this disclosure, the window component includes a silicon-containing refractive layer to increase the rigidity of the window component and improve warping issues.

[0033] Furthermore, according to embodiments of this disclosure, the window component can improve the display quality of the display device by increasing its transmittance and reducing its reflectance. Specifically, by increasing the transmittance of light in the ultraviolet wavelength range, incomplete curing of the adhesive components used to bond the display panel and the window component can be prevented.

[0034] Furthermore, according to embodiments of this disclosure, the display device and electronic device including the window component can improve display quality, impact resistance, and warping issues.

[0035] It should be noted that the effects of this disclosure are not limited to those described above, and other effects of this disclosure will be apparent to those skilled in the art based on the following description. Attached Figure Description

[0036] The above and other aspects and features of this disclosure will become more apparent from the detailed description of non-limiting embodiments of this disclosure with reference to the accompanying drawings.

[0037] Figure 1 This is a plan view of an electronic device according to an embodiment of the present disclosure.

[0038] Figure 2 This is a perspective view showing an electronic device according to an embodiment of the present disclosure when it is folded.

[0039] Figure 3 This illustrates an embodiment according to the present disclosure. Figure 2 A perspective view of the electronic device when it is unfolded.

[0040] Figure 4 This is a cross-sectional view showing a display device included in an electronic device according to an embodiment of the present disclosure.

[0041] Figure 5 This is a perspective view showing a display device according to an embodiment of the present disclosure.

[0042] Figure 6 This is a side view of an embodiment of the present disclosure. Figure 5 A cross-sectional view of the display device.

[0043] Figure 7 According to embodiments of this disclosure Figure 6 A schematic cross-sectional view of the display panel.

[0044] Figure 8 This is a schematic cross-sectional view of a window component according to an embodiment of the present disclosure.

[0045] Figure 9 This is a detailed cross-sectional view of a window component according to an embodiment of the present disclosure.

[0046] Figure 10 This is a schematic view of an optical component according to an embodiment of the present disclosure.

[0047] Figure 11 This is a schematic cross-sectional view of a window component according to an embodiment of the present disclosure.

[0048] Figure 12 This is a schematic cross-sectional view of a window component according to yet another embodiment of the present disclosure.

[0049] Figure 13 This is a schematic cross-sectional view of a window component according to an embodiment of the present disclosure.

[0050] Figure 14 It is a graph showing the transmittance of the window components manufactured according to Comparative Example 1, Comparative Example 2 and Example 1 according to wavelength.

[0051] Figure 15 It is a graph showing the reflectivity of the window components manufactured according to Comparative Example 1, Comparative Example 2 and Example 1 according to wavelength.

[0052] Figure 16 It is a graph showing the transmittance of the window components manufactured according to Comparative Example 2, Example 1 and Example 2 according to wavelength.

[0053] Figure 17 It is a graph showing the reflectivity of the window components manufactured according to Comparative Example 2, Example 1 and Example 2 according to wavelength.

[0054] Figure 18 It is a graph showing the transmittance of the window components manufactured according to Comparative Example 2, Example 1 and Example 3 according to wavelength.

[0055] Figure 19 It is a graph showing the reflectivity of the window components manufactured according to Comparative Example 2, Example 1 and Example 3 according to wavelength.

[0056] Figure 20 This is a block diagram of an electronic device according to an embodiment of the present disclosure.

[0057] Figure 21 This is a view illustrating an electronic device according to various embodiments of the present disclosure. Detailed Implementation

[0058] The invention will now be described more fully below with reference to the accompanying drawings, in which non-limiting embodiments of the present disclosure are illustrated. However, the invention may be embodied in various forms and should not be construed as limited to the embodiments set forth herein.

[0059] It will also be understood that when a layer is referred to as being "on" another layer or substrate, the layer may be directly on said other layer or substrate, or an intermediary layer may be present. When a layer is referred to as being "directly on" another layer or substrate, an intermediary layer may not be present. Throughout the specification, the same reference numerals indicate the same components.

[0060] It will be understood that although the terms “first,” “second,” etc., may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used only to distinguish one element from another. For example, without departing from the teachings of this disclosure, the first element discussed below may be referred to as the second element. Similarly, the second element may also be referred to as the first element.

[0061] Each of the features in the various embodiments of this disclosure can be combined in part or in whole with each other, and various interlocks and drives are technically feasible. Each embodiment can be implemented independently of each other or can be implemented together in association.

[0062] In the following description, embodiments of the present disclosure will be described with reference to the accompanying drawings.

[0063] This disclosure relates to a window component comprising an optical component having a first to a third refractive layer having different refractive indices. The first refractive layer is disposed on a cover window. In some embodiments, a second refractive layer is disposed on the first refractive layer. At least one group consisting of alternately stacked third and second refractive layers is disposed on either the second or first refractive layer. Functional components are disposed on said at least one group.

[0064] The refractive layer has a corresponding refractive index to reduce the refractive index difference at the interface between layers, thereby reducing the amount of external light incident from the outside that is reflected. The corresponding thickness of the refractive layer can further reduce reflectivity by inducing destructive interference. Therefore, the window element can improve the quality of the image displayed by the display device. The refractive layer of the optical element may contain silicon to increase the rigidity of the window element and reduce its warpage.

[0065] Figure 1 This is a plan view of an electronic device according to an embodiment of the present disclosure.

[0066] Reference Figure 1 Electronic device 1 displays moving and / or still images. Electronic device 1 can refer to any electronic device that provides a display screen. For example, in embodiments, electronic device 1 may include a television, laptop computer, monitor, electronic billboard, Internet of Things (IoT) device, mobile phone, smartphone, tablet PC, electronic watch, smartwatch, watch phone, head-mounted display device, mobile communication terminal, electronic notebook, e-book reader, portable multimedia player (PMP), navigation device, game console, and digital camera, camcorder, etc. However, embodiments of this disclosure are not limited thereto, and electronic device 1 can be a variety of small, medium, or large electronic devices.

[0067] Electronic device 1 may include display device 10 for providing a display screen (see...) Figure 4 Examples of display devices may include inorganic light-emitting diode (LED) display devices, organic light-emitting diode (OLED) display devices, quantum dot (QD) light-emitting diode (OLED) display devices, plasma display devices, field emission display devices, etc. In the following description, OLED display devices are used as examples of display devices, but embodiments of this disclosure are not limited thereto. Any other display device may be used, as long as the technical concepts of this disclosure can be applied in the same way.

[0068] The shape of electronic device 1 can be modified in various ways. For example, electronic device 1 can (e.g., in a plan view) have shapes such as a horizontal rectangle, a vertical rectangle, a square, a quadrilateral with rounded corners (e.g., vertices), other polygons, a circle, etc. In embodiments, the shape of the display area DA of electronic device 1 (e.g., in a plan view) can also resemble the overall shape of electronic device 1. Figure 1 In the example shown, electronic device 1 has a rectangular shape with a long side in the second direction DR2.

[0069] Electronic device 1 may include a display area DPA and a non-display area NDA. Images may be displayed in the display area DPA. No images are displayed in the non-display area NDA. The display area DPA may also be referred to as the active area, and the non-display area NDA may also be referred to as the inactive area. The display area DA typically occupies the center of electronic device 1.

[0070] Figure 2 This is a perspective view showing an electronic device according to an embodiment when it is folded. Figure 3 It means Figure 2 A perspective view of the electronic device when it is unfolded.

[0071] Reference Figure 2 and Figure 3 According to an embodiment, the electronic device 1 can be a foldable electronic device. The electronic device 1 can be folded along a folding axis FL. The display area DA can be located on the outer and / or inner side of the electronic device 1. According to an embodiment, the display area DA is located on... Figure 2 and Figure 3 On each of the outer and inner sides of the electronic device 1.

[0072] like Figure 2 As shown, the display area DA can be located on the outside of the electronic device 1. For example, the display area DA can be included on the outer surface of the electronic device 1 when it is folded, and the display area DA can also be included on the inner surface of the electronic device 1 when it is unfolded.

[0073] Figure 4 This is a cross-sectional view showing a display device included in an electronic device according to an embodiment of the present disclosure.

[0074] Reference Figure 4 The display device 10 according to the embodiment may include a display panel 100, an adhesive member 200, and a window member 300.

[0075] Display panel 100 can be a panel for displaying images. In embodiments, display panel 100 can be an organic light-emitting display panel including an organic light-emitting layer, a quantum dot light-emitting display panel including a quantum dot light-emitting layer, an inorganic light-emitting display panel using inorganic semiconductor elements as light-emitting elements, and a micro light-emitting display panel using micro light-emitting diodes as light-emitting elements. In the following description, organic light-emitting display panel is used as display panel 100. However, it will be understood that the embodiments of this disclosure are not limited thereto.

[0076] Window member 300 can be attached to the front surface of display panel 100 via adhesive member 200. Window member 300 may include a cover window, optical members, and functional members. In an embodiment, the cover window may be made of a transparent material such as glass or plastic. The optical members may reduce the reflectivity of external light and increase the transmittance of light emitted from display panel 100. The functional members may provide features such as fingerprint resistance to the surface of window member 300. Window member 300 will be described in detail later.

[0077] The adhesive component 200 may be a transparent adhesive film or a transparent adhesive resin. For example, in an embodiment, the adhesive component 200 may include a transparent adhesive such as a pressure-sensitive adhesive (PSA), an optically clear adhesive (OCA), and an optically clear resin (OCR). The adhesive component 200 may include a material that can be cured using ultraviolet (UV) light.

[0078] Figure 5 This is a perspective view illustrating a display device according to an embodiment of the present disclosure. For example, Figure 5 The display panel 100 of the display device 10 and its peripheral components are shown.

[0079] Reference Figure 5 The display device 10 can provide a display screen for displaying images within the electronic device 1. When viewed from above, the display device 10 can have a shape similar to that of the electronic device 1. For example, in an embodiment, the display device 10 can have a shape similar to a rectangle having a shorter side in a first direction DR1 and a longer side in a second direction DR2. In an embodiment, the corner where the shorter side in the first direction DR1 and the longer side in the second direction DR2 intersect can be rounded with a curvature. However, it should be understood that the embodiments of this disclosure are not limited to this. For example, the corner can be formed as a right angle. When viewed from above, the shape of the display device 10 is not limited to a quadrilateral shape, but can be formed in a shape similar to other polygonal shapes, circular shapes, or elliptical shapes.

[0080] In an embodiment, the display device 10 may include a display panel 100, a display driver 110, a circuit board 120, and a touch driver 130.

[0081] The display panel 100 may include a main area MA and a secondary area SBA.

[0082] The main region MA may include a display region DA containing pixels for displaying images and a non-display region NDA located around the display region DA (e.g., in a plan view). The display region DA may output light from multiple emission regions or multiple aperture regions. For example, the display panel 100 may include pixel circuitry containing switching elements, a pixel defining layer defining the emission region or aperture region, and self-emissive elements.

[0083] For example, a self-emissive element may include, but is not limited to, at least one of the following elements: an organic light-emitting diode including an organic emission layer, a quantum dot light-emitting diode (quantum dot LED) including a quantum dot emission layer, an inorganic light-emitting diode (inorganic LED) including an inorganic semiconductor, and a micro light-emitting diode (micro LED).

[0084] The non-display area NDA may (e.g., in a plan view) be located outside the display area DA. The non-display area NDA may be defined as the edge region of the main area MA of the display panel 100. In an embodiment, the non-display area NDA may include a gate driver that applies gate signals to the gate line and a fan-out line that connects the display driver 110 to the display area DA.

[0085] The auxiliary region SBA can extend from one side of the main region MA. The auxiliary region SBA can include a flexible material that can be bent, folded, or rolled. For example, when the auxiliary region SBA is bent, it can overlap with the main region MA in the thickness direction (e.g., the third direction DR3). The auxiliary region SBA can include a pad (also referred to as a "solder pad") connected to the display driver 110 and the circuit board 120. According to an embodiment, the auxiliary region SBA may not be included in the display device 10, and the display driver 110 and the pad may be arranged in the non-display region NDA.

[0086] The display driver 110 can output signals and voltages for driving the display panel 100. The display driver 110 can supply data voltages to data lines. The display driver 110 can apply power supply voltages to voltage lines and can supply gate control signals to gate drivers. In embodiments, the display driver 110 can be implemented as an integrated circuit (IC) and can be attached to the display panel 100 using chip-on-glass (COG) technology, chip-on-plastic (COP) technology, or ultrasonic bonding. For example, the display driver 110 can be located in an auxiliary region SBA and can be stacked with the main region MA in the thickness direction (e.g., third-direction DR3) as the auxiliary region SBA bends. As another example, the display driver 110 can be mounted on a circuit board 120.

[0087] In one embodiment, the circuit board 120 may be attached to the pad area of ​​the display panel 100 using an anisotropic conductive film (ACF). Leads of the circuit board 120 may be electrically connected to the pad of the display panel 100. The circuit board 120 may be a flexible printed circuit board (FPCB), a rigid printed circuit board (RPCB), or a flexible film such as chip on film (COF).

[0088] Touch driver 130 can be mounted on circuit board 120. Touch driver 130 can be connected to touch sensing unit of display panel 100. Touch driver 130 can supply touch drive signals to multiple touch electrodes of touch sensing unit and can sense changes in capacitance between multiple touch electrodes. For example, touch drive signals can be pulse signals with frequency. Touch driver 130 can determine the presence of input and can find the coordinates of the input based on the amount of capacitance change between touch electrodes. Touch driver 130 can be implemented as an integrated circuit (IC).

[0089] Figure 6 Viewed from the side Figure 5 A cross-sectional view of the display device.

[0090] Reference Figure 6 The display panel 100 may include a display layer DISL and a touch detection layer TDL. In an embodiment, the display layer DISL may include a substrate SUB, a thin film transistor layer TFTL, an emissive material layer EML, and an encapsulation layer TFEL.

[0091] The substrate SUB can be a matrix substrate or a matrix component. In embodiments, the substrate SUB can be a flexible substrate capable of being bent, folded, or rolled. For example, the substrate SUB can include, but is not limited to, polymer resins such as polyimide (PI). According to embodiments, the substrate SUB can include glass or metal materials.

[0092] The thin-film transistor layer (TFTL) can be located on the substrate SUB (e.g., directly disposed on the substrate SUB). The TFTL can include multiple thin-film transistors forming pixel circuitry for a pixel. The TFTL can include gate lines, data lines, voltage lines, gate control lines, fan-out lines for connecting the display driver 110 to the data lines, leads for connecting the display driver 110 to the pad, etc. Each of the thin-film transistors can include a semiconductor region, a source electrode, a drain electrode, and a gate electrode. For example, in an embodiment where the gate driver is formed on one side of the non-display area NDA of the display panel 100, the gate driver can include a thin-film transistor.

[0093] The thin-film transistor layer (TFTL) can be located in the display area (DA), the non-display area (NDA), and the auxiliary area (SBA). The thin-film transistors, gate lines, data lines, and voltage lines in each pixel of the TFTL can be located in the display area (DA). The gate control lines and fan-out lines of the TFTL can be arranged in the non-display area (NDA). The leads of the TFTL can be arranged in the auxiliary area (SBA).

[0094] The emissive material layer (EML) can be located on the thin-film transistor layer (TFTL) (e.g., directly disposed on the TFTL). The EML can include multiple light-emitting elements and pixel-defining films for defining pixels. Each light-emitting element includes a pixel electrode, a common electrode, and an emissive layer to emit light. The multiple light-emitting elements in the EML can be arranged in the display area (DA).

[0095] According to embodiments of this disclosure, the emitting layer may be an organic light-emitting layer comprising organic materials. The emitting layer may include a hole transport layer, an organic light-emitting layer, and an electron transport layer. When the pixel electrode receives voltage through a thin-film transistor in the thin-film transistor layer (TFTL) and the common electrode receives a cathode voltage through a thin-film transistor in the TFTL, holes and electrons can move to the organic light-emitting layer through the hole transport layer and the electron transport layer, respectively, causing them to recombine in the organic light-emitting layer to emit light.

[0096] According to embodiments, the light-emitting element may include a quantum dot light-emitting diode, which includes a quantum dot emitting layer, an inorganic light-emitting diode, or a micro light-emitting diode, which includes an inorganic semiconductor.

[0097] The encapsulation layer TFEL can cover the upper and side surfaces of the emitter material layer EML and protect the emitter material layer EML. The encapsulation layer TFEL may include at least one inorganic film and at least one organic film for encapsulating the emitter material layer EML.

[0098] The touch detection layer (TDL) may be located on the encapsulation layer (TFEL) (e.g., directly disposed on the encapsulation layer (TFEL)). The touch detection layer (TDL) may include a plurality of touch electrodes for sensing a user's touch by capacitive sensing and touch lines connecting the plurality of touch electrodes to the touch driver 130. For example, the touch detection layer (TDL) may sense a user's touch by mutual capacitance sensing or self-capacitance sensing.

[0099] Multiple touch electrodes of the touch detection layer (TDL) can be located in the touch sensor area superimposed on the display area (DA). The touch lines of the touch detection layer (TDL) can be located in the touch periphery area superimposed on the non-display area (NDA).

[0100] Figure 7 yes Figure 6 A schematic cross-sectional view of the display panel.

[0101] Reference Figure 7 In this embodiment, the display panel 100 may include a substrate SUB, a display layer DISL on the substrate SUB, and a touch detection layer TDL on the display layer DISL. The display layer DISL may include a thin film transistor layer TFTL, an emissive material layer EML, and an encapsulation layer TFEL.

[0102] The thin-film transistor layer (TFTL) can be located on the substrate SUB (e.g., directly disposed on the substrate SUB on the third-party DR3). In an embodiment, the TFTL may include a barrier layer BR, a thin-film transistor TFT1, a first capacitor electrode CAE1, a second capacitor electrode CAE2, a first anode connection electrode ANDE1, a second anode connection electrode ANDE2, a gate insulator 530, a first interlayer dielectric layer 541, a second interlayer dielectric layer 542, a first planarization layer 560, and a second planarization layer 580.

[0103] The substrate SUB can be made of an insulating material such as a polymer resin. For example, in this embodiment, the substrate SUB can be made of polyimide. The substrate SUB can be a flexible substrate that can be bent, folded, or rolled up.

[0104] The barrier layer BR can be located on the substrate SUB (e.g., directly disposed on the substrate SUB on the third-direction DR3). The barrier layer BR is a film used to protect the thin-film transistor layer TFTL and the emitter layer 572 of the emitter material layer EML. The barrier layer BR can be composed of multiple inorganic films that are alternately stacked with each other (e.g., on the third-direction DR3). For example, in an embodiment, the barrier layer BR can be composed of multiple layers in which one or more inorganic layers of silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, and aluminum oxide are alternately stacked with each other (e.g., on the third-direction DR3).

[0105] The thin-film transistor TFT1 can be located on the barrier layer BR (e.g., directly disposed on the barrier layer BR on the third-direction DR3). The active layer ACT1 of the thin-film transistor TFT1 can be located on the barrier layer BR. In embodiments, the active layer ACT1 of the thin-film transistor TFT1 may include polycrystalline silicon, monocrystalline silicon, low-temperature polycrystalline silicon, amorphous silicon, or oxide semiconductor.

[0106] The active layer ACT1 may include a channel region CHA1, a source region TS1, and a drain region TD1. The channel region CHA1 may be stacked with the gate electrode TG1 on the third direction DR3 (as the thickness direction of the substrate SUB). The source region TS1 may (e.g., in a plan view) be located on one side of the channel region CHA1, and the drain region TD1 may (e.g., in a plan view) be located on the opposite side of the channel region CHA1. The source region TS1 and the drain region TD1 may not be stacked with the gate electrode TG1 on the third direction DR3. The source region TS1 and the drain region TD1 may be formed by doping silicon semiconductors or oxide semiconductors with ions or impurities to make them conductive.

[0107] The gate insulator 530 may be located on the active layer ACT1 of the thin-film transistor TFT1 (e.g., directly disposed on the active layer ACT1). In an embodiment, the gate insulator 530 may be formed of an inorganic layer (e.g., a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer).

[0108] The gate electrode TG1 and the first capacitor electrode CAE1 of the thin-film transistor TFT1 can be located on the gate insulator 530 (e.g., directly disposed on the gate insulator 530 on the third-direction DR3). The gate electrode TG1 can be stacked with the channel region CHA1 on the third-direction DR3. Although in Figure 7 In the example shown, the gate electrode TG1 and the first capacitor electrode CAE1 are spaced apart from each other, but in some embodiments, the gate electrode TG1 and the first capacitor electrode CAE1 may be connected to each other as a single component. In embodiments, the gate electrode TG1 and the first capacitor electrode CAE1 may be composed of a single layer or multiple layers of one or an alloy of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu).

[0109] The first interlayer dielectric layer 541 may be located on the gate electrode TG1 and the first capacitor electrode CAE1 of the thin-film transistor TFT1. In an embodiment, the first interlayer dielectric layer 541 may be formed of an inorganic layer (e.g., a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer). The first interlayer dielectric layer 541 may be composed of multiple inorganic films.

[0110] The second capacitor electrode CAE2 can be located on the first interlayer dielectric layer 541 (e.g., directly disposed on the first interlayer dielectric layer 541 on the third-direction DR3). The second capacitor electrode CAE2 can be stacked on the third-direction DR3 with the first capacitor electrode CAE1 of the thin-film transistor TFT1. Alternatively, in an embodiment where the gate electrode TG1 and the first capacitor electrode CAE1 are formed as a single component, the second capacitor electrode CAE2 can be stacked on the third-direction DR3 with the gate electrode TG1. Since the first interlayer dielectric layer 541 has a dielectric constant, the capacitor can be formed by the first capacitor electrode CAE1, the second capacitor electrode CAE2, and the first interlayer dielectric layer 541 between the electrodes. In embodiments, the second capacitor electrode CAE2 can be composed of a single layer or multiple layers of one or an alloy of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu).

[0111] The second interlayer dielectric layer 542 may be located above the second capacitor electrode CAE2 (e.g., directly on the second capacitor electrode CAE2). In embodiments, the second interlayer dielectric layer 542 may be formed of an inorganic layer (e.g., a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer). The second interlayer dielectric layer 542 may be composed of multiple inorganic films.

[0112] The first anode connection electrode ANDE1 can be located on the second interlayer dielectric layer 542 (e.g., directly disposed on the second interlayer dielectric layer 542 on the third-party DR3). In an embodiment, the first anode connection electrode ANDE1 can be connected to the drain region TD1 of the thin-film transistor TFT1 through a first connection contact hole ANCT1 penetrating the gate insulator 530, the first interlayer dielectric layer 541, and the second interlayer dielectric layer 542. In an embodiment, the first anode connection electrode ANDE1 can be composed of a single layer or multiple layers of one or an alloy of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu).

[0113] The first planarization layer 560 may be located above the first anode connection electrode ANDE1 (e.g., directly disposed on the first anode connection electrode ANDE1) to provide a flat surface over the horizontal difference caused by the thin-film transistor TFT1. In embodiments, the first planarization layer 560 may be formed of an organic layer such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0114] In an embodiment, the second anode connection electrode ANDE2 may be located on the first planarization layer 560 (e.g., directly disposed on the first planarization layer 560 on the third-direction DR3). The second anode connection electrode ANDE2 may be connected to the first anode connection electrode ANDE1 through a second connection contact hole ANCT2 penetrating the first planarization layer 560. In an embodiment, the second anode connection electrode ANDE2 may be composed of a single layer or multiple layers of one or an alloy of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu).

[0115] The second planarization layer 580 may be located on the second anode connection electrode ANDE2 (e.g., directly disposed on the second anode connection electrode ANDE2 on the third-party DR3). In embodiments, the second planarization layer 580 may be formed of an organic layer such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0116] The light-emitting element (LEL) and the emitting material layer (EML) of the dam 590 can be located on the second planarization layer 580. Each of the light-emitting elements (LEL) includes a pixel electrode 571, an emitting layer 572, and a common electrode 573.

[0117] The pixel electrode 571 may be located on the second planarization layer 580 (e.g., directly disposed on the second planarization layer 580 on the third-direction DR3). The pixel electrode 571 may be connected to the second anode connection electrode ANDE2 through the third connection contact hole ANCT3 penetrating the second planarization layer 580.

[0118] In the top-emission structure where light is emitted from the emitting layer 572 to the common electrode 573, the pixel electrode 571 can be made of a metallic material with high reflectivity, such as a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum (Al) and ITO (indium tin oxide) (ITO / Al / ITO), an APC alloy, and a stacked structure of APC alloy and ITO (ITO / APC / ITO). The APC alloy is an alloy of silver (Ag), palladium (Pd), and copper (Cu).

[0119] A dam 590 may separate pixel electrodes 571 on the second planarization layer 580 to define emission regions EA1 and EA2. The dam 590 may be positioned to cover the edges of the pixel electrodes 571 and may expose the central portion of the pixel electrodes 571. In embodiments, the dam 590 may comprise an organic film such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0120] In each of the first emission region EA1 and the second emission region EA2, the pixel electrode 571, the emission layer 572 and the common electrode 573 (e.g., on the third-direction DR3) are sequentially stacked on top of each other, such that holes from the pixel electrode 571 and electrons from the common electrode 573 recombine with each other in the emission layer 572 to emit light.

[0121] The emitting layer 572 may be located on the pixel electrode 571 and the dam 590 (e.g., directly disposed on the pixel electrode 571 and the dam 590). The emitting layer 572 may include organic materials to emit light of a specific color. For example, in an embodiment, the emitting layer 572 may include a hole transport layer, an organic material layer, and an electron transport layer.

[0122] The common electrode 573 may be located on the emitter layer 572. The common electrode 573 may cover the emitter layer 572. In an embodiment, the common electrode 573 may be a common layer formed across the first emitter region EA1 and the second emitter region EA2.

[0123] In an embodiment, in a top-emitting organic light-emitting diode, the common electrode 573 may include a transparent conductive material (TCP) such as ITO and IZO that can transmit light, or a semi-transmissive conductive material such as magnesium (Mg), silver (Ag), or an alloy of magnesium (Mg) and silver (Ag). When the common electrode 573 is made of a semi-transmissive metallic material, light extraction efficiency can be improved by using a microcavity.

[0124] Spacer 591 may be located on dam 590 (e.g., directly disposed on dam 590 on third-direction DR3). In embodiments, spacer 591 may support the mask during the process of manufacturing emitter layer 572. In embodiments, spacer 591 may be implemented as an organic layer such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0125] According to some embodiments of this disclosure, the display panel 100 may further include a capping layer CPL located on the common electrode 573. The capping layer CPL may be made of an inorganic material. For example, in embodiments, the capping layer CPL may include at least one of the following materials: silicon nitride, aluminum nitride, zirconium nitride, titanium nitride, hafnium nitride, tantalum nitride, silicon oxide, aluminum oxide, titanium oxide, tin oxide, cerium oxide, and silicon oxynitride.

[0126] The encapsulation layer TFEL may be located on the common electrode 573 (e.g., on the third-direction DR3). The encapsulation layer TFEL may include at least one inorganic layer to prevent oxygen or moisture from penetrating into the emitter material layer EML. Additionally, the encapsulation layer TFEL may include at least one organic film to protect the emitter material layer EML from particles such as dust. For example, in an embodiment, the encapsulation layer TFEL may include a first inorganic encapsulation film TFE1, an organic encapsulation film TFE2, and a second inorganic encapsulation film TFE3.

[0127] The first inorganic encapsulation film TFE1 may be located on the common electrode 573 (e.g., on the third-direction DR3), the organic encapsulation film TFE2 may be located on the first inorganic encapsulation film TFE1 (e.g., directly disposed on the first inorganic encapsulation film TFE1 on the third-direction DR3), and the second inorganic encapsulation film TFE3 may be located on the organic encapsulation film TFE2 (e.g., directly disposed on the organic encapsulation film TFE2 on the third-direction DR3). The first inorganic encapsulation film TFE1 and the second inorganic encapsulation film TFE3 may be composed of multiple layers in which one or more inorganic layers (e.g., on the third-direction DR3) of silicon nitride, silicon oxynitride, silicon oxide, titanium oxide, and aluminum oxide are alternately stacked. In an embodiment, the organic encapsulation film TFE2 may be an organic film such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, etc.

[0128] The touch detection layer TDL can be located on the encapsulation layer TFEL (e.g., directly disposed on the encapsulation layer TFEL on the third-party DR3). In an embodiment, the touch detection layer TDL includes a first touch insulating layer TINS1, a bridging electrode BE, a second touch insulating layer TINS2, a driving electrode TE, a sensing electrode RE, and a third touch insulating layer TINS3.

[0129] The first touch insulating layer TINS1 may be located on the encapsulation layer TFEL (e.g., directly disposed on the encapsulation layer TFEL on the third-party DR3). In embodiments, the first touch insulating layer TINS1 may be implemented as an inorganic layer (e.g., a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer).

[0130] The bridging electrode BE can be disposed on the first touch insulating layer TINS1 (e.g., directly disposed on the first touch insulating layer TINS1 on the third-party DR3). In embodiments, the bridging electrode BE can be composed of a single layer or multiple layers of one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or alloys thereof.

[0131] The second touch insulating layer TINS2 can be located above the bridging electrode BE (e.g., directly disposed on the bridging electrode BE). In embodiments, the second touch insulating layer TINS2 can be implemented as an inorganic layer (e.g., a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer). Optionally, the second touch insulating layer TINS2 can be made of an organic layer such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0132] The driving electrode TE and the sensing electrode RE can be disposed on the second touch insulating layer TINS2 (e.g., directly disposed on the second touch insulating layer TINS2). In embodiments, the driving electrode TE and the sensing electrode RE can be composed of a single layer or multiple layers of one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu) or alloys thereof.

[0133] The driving electrode TE and the sensing electrode RE can be stacked on the third-direction DR3 with the bridging electrode BE. The driving electrode TE can be connected to the bridging electrode BE through the touch contact hole TCNT1 passing through the first touch insulating layer TINS1.

[0134] The third touch insulating layer TINS3 can be formed on the driving electrode TE and the sensing electrode RE (e.g., directly disposed on the driving electrode TE and the sensing electrode RE). The third touch insulating layer TINS3 can provide a flat surface over the driving electrode TE, the sensing electrode RE, and the bridging electrode BE, which have different heights from each other. In embodiments, the third touch insulating layer TINS3 can be made of an organic layer such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0135] In the following description, the window component 300, which is a key feature of the display device 10 according to an embodiment of the present disclosure, will be described with reference to the accompanying drawings.

[0136] Figure 8 This is a schematic cross-sectional view of a window component according to an embodiment. Figure 9 This is a detailed cross-sectional view of the window components according to an embodiment.

[0137] Reference Figure 8 and Figure 9 The window component 300 may include a cover window 310, an optical component 400, and a functional component 600.

[0138] The cover window 310 prevents the display panel 100 beneath it from deforming due to external impacts (such as cracks, scratches, and dents) and can form the base of the window member 300. The cover window 310 may contain a transparent material, allowing light from the display panel 100 to pass through and be transmitted to the user. In embodiments, the cover window 310 may include materials such as glass or plastic.

[0139] In embodiments, the thickness of the cover window 310 may be less than or equal to about 700 μm. The thickness of an element in the window member 300 may refer to the length of the element in a third direction DR3. For example, in embodiments, the thickness of the cover window 310 may be in the range of about 30 μm to about 700 μm. According to embodiments, the cover window 310 may be an ultrathin glass (UTG) having a thickness in the range of about 30 μm to about 100 μm. According to embodiments, the cover window 310 may be a glass substrate having a thickness in the range of about 400 μm to about 550 μm. According to embodiments, the cover window 310 may be a transparent polymer film or sheet having a thickness in the range of about 30 μm to about 700 μm. However, it should be understood that the embodiments of this disclosure are not limited thereto. The thickness of the cover window 310 may vary in the range of about 30 μm to about 700 μm.

[0140] Optical component 400 may be disposed on cover window 310. For example, in an embodiment, optical component 400 may be disposed directly on the upper surface of cover window 310 (e.g., on third-party DR3) and may be in direct contact with the upper surface of cover window 310. Optical component 400 may reduce the reflection of external light incident from the outside (e.g., external environment).

[0141] In an embodiment, the optical component 400 may include a first refractive layer 410, a second refractive layer 420, and a third refractive layer 430 having different refractive indices. In an embodiment, the second refractive layer 420 and the third refractive layer 430 may form a single group, and the optical component 400 may include multiple such groups, each group including the second refractive layer 420 and the third refractive layer 430. For example, when the optical component 400 includes multiple groups (e.g., at least two or more groups) all consisting of the second refractive layer 420 and the third refractive layer 430, the second refractive layer 420 and the third refractive layer 430 may be (e.g., on a third-direction DR3) alternately stacked on top of each other. Figure 9 In the examples shown, two groups of second refractive layers 420 and third refractive layers 430 are sequentially stacked on the first refractive layer 410 (e.g., on the third-direction DR3). However, in some embodiments, three or more groups of second refractive layers 420 and third refractive layers 430 may be sequentially stacked on the first refractive layer 410 (e.g., on the third-direction DR3).

[0142] In an embodiment, the first refractive layer 410 may be located on the cover window 310 (e.g., directly disposed on the cover window 310 on a third-party DR3). For example, the first refractive layer 410 may be directly disposed on the upper surface of the cover window 310 and may be in direct contact with the upper surface of the cover window 310. According to an embodiment, the first refractive layer 410 may be formed on the cover window 310 by vacuum deposition and may be formed directly on the upper surface of the cover window 310. Therefore, the adhesion between the first refractive layer 410 and the cover window 310 can be increased.

[0143] In an embodiment, the first refractive layer 410 may have a refractive index (e.g., a first refractive index) between the refractive index of the second refractive layer 420 (e.g., a second refractive index) and the refractive index of the third refractive layer 430 (e.g., a third refractive index). For example, in an embodiment, the refractive index of the first refractive layer 410 may be less than the refractive index of the second refractive layer 420 and greater than the refractive index of the third refractive layer 430. When the refractive index of the first refractive layer 410 is between the refractive index of the second refractive layer 420 and the refractive index of the third refractive layer 430, the amount of external light incident from the outside (e.g., the external environment) that is reflected can be reduced because the refractive index difference at the interface between the second refractive layer 420 and the first refractive layer 410 is small. For example, the reflectivity of external light can be reduced at the interface between the first refractive layer 410 and the second refractive layer 420.

[0144] In an embodiment, the first refractive layer 410 may have a refractive index (e.g., a first refractive index) between the refractive index of the cover window 310 (e.g., a fourth refractive index) and the refractive index of the second refractive layer 420 (e.g., a second refractive index). For example, in an embodiment, the refractive index (e.g., the first refractive index) of the first refractive layer 410 may be greater than the refractive index (e.g., the fourth refractive index) of the cover window 310 and less than the refractive index (e.g., the second refractive index) of the second refractive layer 420. In embodiments where the refractive index of the first refractive layer 410 is between the refractive index of the cover window 310 and the refractive index of the second refractive layer 420, the amount of externally incident light that is reflected can be reduced because the difference in refractive index at the interface between the cover window 310 and the first refractive layer 410 is small. For example, the reflectivity of external light can be reduced at the interface between the cover window 310 and the first refractive layer 410.

[0145] In embodiments, the refractive index (e.g., the first refractive index) of the first refractive layer 410 may be in the range of about 1.4 to about 1.9. For example, in embodiments, the refractive index of the first refractive layer 410 may be in the range of about 1.7 to about 1.8. However, it should be understood that the embodiments of this disclosure are not limited thereto. The refractive index of the first refractive layer 410 may be adjusted in various ways within the range of 1.4 to 1.9.

[0146] The first refractive layer 410 may comprise at least silicon (Si). For example, in embodiments, the first refractive layer 410 may comprise an oxide containing silicon, an oxide oxynitride containing at least silicon, or a nitride containing silicon. For example, the oxide containing silicon may be silicon oxide (SiO2), the oxide oxynitride containing silicon may be silicon oxynitride (SiON), and the nitride containing silicon may be silicon nitride (SiN). x ).

[0147] According to embodiments of this disclosure, the first refractive layer 410 may be a silicon-containing oxide oxynitride. For example, the first refractive layer 410 may be silicon oxynitride (SiON). In embodiments where the first refractive layer 410 is made of silicon oxynitride, the silicon (Si) content may be in the range of about 10 at% to about 50 at%, the oxygen (O2) content may be less than about 50 at%, and the nitrogen (N) content may be the remainder of the content of silicon and oxygen. In the first refractive layer 410, the refractive index increases with increasing nitrogen content and decreases with increasing oxygen content. Therefore, the contents of silicon, oxygen, and nitrogen can be adjusted in various ways within the aforementioned element content ranges.

[0148] In embodiments, the first refractive layer 410 may further comprise a metal. For example, the first refractive layer 410 may comprise silicon and may also comprise a metal. In embodiments, the metal may be aluminum (Al). For example, in embodiments, the first refractive layer 410 may comprise an oxide comprising silicon and aluminum, an oxide nitride comprising silicon and aluminum, or a nitride comprising silicon and aluminum. For example, a nitride comprising silicon and aluminum may be aluminum silicon nitride (AlSiN). In embodiments where the first refractive layer 410 comprises aluminum, the hardness of the first refractive layer 410 may be increased, thereby preventing warping of the optical component 400.

[0149] According to embodiments of this disclosure, the first refractive layer 410 may be aluminum-silicon-oxygen-nitrogen (AlSiON). In embodiments where the first refractive layer 410 is made of aluminum-silicon-oxygen-nitrogen, the sum of the aluminum (Al) content and the silicon (Si) content may be in the range of about 10 at% to about 50 at%, the oxygen (O2) content may be less than about 50 at%, and the nitrogen (N) content may be the remainder (e.g., the surplus) other than the contents of aluminum, silicon, and oxygen.

[0150] The first refractive layer 410 may have a thickness for reducing light reflectivity at the interface between the cover window 310 and the first refractive layer 410, and at the interface between the first refractive layer 410 and the second refractive layer 420. In an embodiment, the thickness of the first refractive layer 410 may be in the range of about 10% to about 40% relative to the total thickness of the optical component 400. Additionally, the thickness of the first refractive layer 410 may be in the range of about 75% to about 95% of the thickness of the third refractive layer 430 disposed at the uppermost layer of the optical component 400. For example, in an embodiment, according to an optical design of λ / 8 to λ / 2, the thickness of the first refractive layer 410 may be in the range of about 40 nm to about 150 nm.

[0151] The second refractive layer 420 may be located on the first refractive layer 410 (e.g., on the third-direction DR3). For example, the second refractive layer 420 may be directly disposed on the upper surface of the first refractive layer 410 (e.g., on the third-direction DR3) and may be in direct contact with the first refractive layer 410. According to an embodiment, the second refractive layer 420 may be formed on the first refractive layer 410 by vacuum deposition and may be directly formed on the upper surface of the first refractive layer 410. Therefore, the adhesion between the first refractive layer 410 and the second refractive layer 420 can be increased. The second refractive layer 420 may be spaced apart from the cover window 310, and the first refractive layer 410 (e.g., on the third-direction DR3) may be located between the second refractive layer 420 and the cover window 310. For example, the second refractive layer 420 may not be in direct contact with the cover window 310.

[0152] In an embodiment, the second refractive layer 420 may have the highest refractive index in the optical component 400. For example, the refractive index (e.g., the second refractive index) of the second refractive layer 420 may be greater than the refractive index of the first refractive layer 410 and the refractive index of the third refractive layer 430. In embodiments where the refractive index (e.g., the second refractive index) of the second refractive layer 420 is greater than the refractive index (e.g., the first refractive index) of the first refractive layer 410 and the refractive index (e.g., the third refractive index) of the third refractive layer 430, the difference between the refractive index at the interface between the second refractive layer 420 and the first refractive layer 410 and the refractive index at the interface between the second refractive layer 420 and the third refractive layer 430 is small, thus reducing the amount of reflected external light. For example, the reflectivity of external light may be reduced at the interfaces between the first refractive layer 410 and the second refractive layer 420 and at the interfaces between the second refractive layer 420 and the third refractive layer 430.

[0153] In embodiments, the refractive index (e.g., the second refractive index) of the second refractive layer 420 can be in the range of about 1.9 to about 2.3. For example, the refractive index of the second refractive layer 420 can be in the range of about 2.0 to about 2.1. However, it should be understood that the embodiments of this disclosure are not limited thereto. The refractive index of the second refractive layer 420 can be adjusted in various ways within the range of about 1.9 to about 2.3.

[0154] In embodiments, the second refractive layer 420 may include at least one of silicon (Si) and a metal. For example, the second refractive layer 420 may include one of the following materials: silicon oxide, silicon oxynitride, silicon nitride, metal oxide, metal oxynitride, metal nitride, silicon and metal oxide, silicon and metal oxynitride, and silicon and metal nitride. According to embodiments of this disclosure, the second refractive layer 420 may be one of the following materials: silicon oxynitride (SiON), silicon nitride (SiN). xAluminum oxynitride (AlON), aluminum nitride (AlN), aluminum silicon oxynitride (AlSiON), aluminum silicon nitride (AlSiN), tantalum oxide (Ta2O5), niobium oxide (Nb2O5), hafnium oxide (HfO2), titanium oxide (TiO2), zirconium oxide (ZrO2), yttrium oxide (Y2O3), aluminum oxide (Al2O3), and molybdenum oxide (MoO3).

[0155] According to embodiments of this disclosure, the second refractive layer 420 may be a silicon-containing nitride. In embodiments, the second refractive layer 420 may be a nitride containing silicon and a metal. For example, the second refractive layer 420 may be aluminum silicon nitride (AlSiN). In embodiments where the second refractive layer 420 is made of aluminum silicon nitride, the sum of the aluminum content and the silicon content may be less than or equal to about 90 at% (e.g., in the range of about 10 at% to about 90 at%). For example, in embodiments where the sum of the aluminum content and the silicon content is 90 at%, the aluminum content may be x at%, and the silicon content may be 90-x at%. The nitrogen (N) content in the second refractive layer 420 may be the remainder (e.g., the remaining portion) other than the silicon and aluminum content. The inclusion of aluminum in the second refractive layer 420 increases the hardness of the second refractive layer 420, thereby preventing warping of the optical component 400.

[0156] The second refractive layer 420 may have a thickness that reduces reflectivity by causing destructive interference between light reflected from the upper surface of the third refractive layer 430 and light reflected at the interface between the second and third refractive layers 420. In embodiments, the thickness of each of the second refractive layers 420 may be in the range of about 130% to about 240% of the thickness of the third refractive layer 430 disposed at the uppermost layer of the optical member 400. For example, in embodiments, according to an optical design of λ / 2, the thickness of the second refractive layer 420 may be in the range of about 100 nm to about 190 nm.

[0157] The third refractive layer 430 may be located on the second refractive layer 420 (e.g., directly disposed on the second refractive layer 420 on the third-direction DR3). For example, the third refractive layer 430 may be directly disposed on the upper surface of the second refractive layer 420 and may be in direct contact with the second refractive layer 420. According to an embodiment, the third refractive layer 430 may be formed on the second refractive layer 420 by vacuum deposition and may be (e.g., directly formed on the upper surface of the second refractive layer 420) on the third-direction DR3. Therefore, the adhesion between the second refractive layer 420 and the third refractive layer 430 can be increased. In an embodiment, the third refractive layer 430 may be spaced apart from the cover window 310, and the first refractive layer 410 and the second refractive layer 420 (e.g., on the third-direction DR3) are located between the third refractive layer 430 and the cover window 310. For example, the third refractive layer 430 may not be in direct contact with the upper surface of the cover window 310 and may be spaced apart from the upper surface of the cover window 310.

[0158] The third refractive layer 430 can have the lowest refractive index in the optical component 400. For example, the refractive index of the third refractive layer 430 (e.g., the third refractive index) can be less than the refractive index of the first refractive layer 410 (e.g., the first refractive index) and the refractive index of the second refractive layer 420 (e.g., the second refractive index). If the refractive index of the third refractive layer 430 is less than the refractive index of the first refractive layer 410 and the second refractive layer 420, the amount of externally incident light being reflected can be reduced because the difference in refractive index at the interface between the second refractive layer 420 and the third refractive layer 430 is small. For example, the reflectivity of external light can be reduced at the interface between the second refractive layer 420 and the third refractive layer 430.

[0159] The refractive index of the third refractive layer 430 may be less than about 1.5. For example, in an embodiment, the refractive index of the third refractive layer 430 may be in the range of about 1.3 to about 1.5. However, it should be understood that the embodiments of this disclosure are not limited thereto. The refractive index of the third refractive layer 430 may be adjusted in various ways within the range of about 1.3 to about 1.5.

[0160] The third refractive layer 430 may include at least one of silicon (Si) and a metal. For example, in embodiments, the third refractive layer 430 may include one of the following materials: an oxide containing silicon, an oxide oxynitride containing silicon, a nitride containing silicon, an oxide containing a metal, an oxide oxynitride containing a metal, a nitride containing a metal, an oxide containing both silicon and a metal, an oxide oxynitride containing both silicon and a metal, or a nitride containing both silicon and a metal. According to embodiments of this disclosure, the third refractive layer 430 may include one of silicon oxynitride (SiON), aluminum oxynitride (AlON), aluminum silicon oxynitride (AlSiON), silicon oxide (SiO2), aluminum oxide (Al2O3), germanium oxide (GeO2), and magnesium oxide (MgO). According to embodiments of this disclosure, the third refractive layer 430 may be an oxide containing silicon. For example, the third refractive layer 430 may be silicon oxide (SiO2).

[0161] The third refractive layer 430 may have a thickness that reduces reflectivity by causing destructive interference between light reflected from the upper surface of the third refractive layer 430 and light reflected at the interface between the second refractive layer 420 and the third refractive layer 430. In embodiments, the thickness of each third refractive layer 430 may be in the range of about 1% to about 30% of the total thickness of the optical component 400. For example, according to an optical design of λ / 4, the thickness of the third refractive layer 430 may be in the range of about 10 nm to about 100 nm.

[0162] According to embodiments of this disclosure, the third refractive layer 430 may be located at the top of the optical component 400 (e.g., the uppermost layer of the optical component 400) and between the second refractive layers 420. In embodiments, the thickness of the third refractive layer 430 at the top of the optical component 400 (including the uppermost layer of the optical component 400) may be greater than the thickness of the third refractive layers 430 located between the second refractive layers 420. For example, in embodiments, the thickness of the third refractive layer 430 at the top of the optical component 400 may be in the range of about 80% to about 90% of the sum of the thicknesses of all the third refractive layers 430 included in the optical component 400. Therefore, the third refractive layer 430 at the top of the optical component 400 can reduce the reflection of external light by causing destructive interference between light reflected from the upper surface of the third refractive layer 430 and light reflected at the interface between the third refractive layer 430 and the second refractive layers 420.

[0163] According to embodiments of this disclosure, the thicknesses of the first refractive layer 410 and the second refractive layer 420 may be in the range of about 70% to about 90% relative to the total thickness of the optical component 400. The first refractive layer 410 and the second refractive layer 420 may comprise materials having a higher hardness and refractive index than the third refractive layer 430, thereby increasing the overall hardness of the optical component 400 or the window component 300.

[0164] In addition, such as Figure 9 As shown, in an embodiment, in optical component 400, the second refractive layer 420 and the third refractive layer 430 of the first group can be disposed on the first refractive layer 410, and the second refractive layer 420 and the third refractive layer 430 of the second group can be disposed on the first group (e.g., directly disposed on the first group on a third-direction DR3). According to embodiments of this disclosure, the ratio of the thickness of the second group to the thickness of the first group can be in the range of about 0.8 to about 1.5, and the ratio of the thickness of the second group to the sum of the thickness of the first group and the thickness of the first refractive layer 410 can be in the range of about 0.6 to about 1.1.

[0165] Figure 10 This is a schematic view illustrating an optical component according to an embodiment of the present disclosure. The view is used to illustrate the reflection of light within the optical component. Figure 10 For ease of explanation, the schematic diagram depicts a first refractive layer 410, a second refractive layer 420, and a third refractive layer 430.

[0166] Reference Figure 10 When light is incident on the optical component 400 from the outside ( Figure 10 When incident light is emitted, the light can be reflected at the upper surface of the third refractive layer 430, the interface between the third refractive layer 430 and the second refractive layer 420, the interface between the second refractive layer 420 and the first refractive layer 410, and the interface between the first refractive layer 410 and the cover window 310.

[0167] In this embodiment, the second refractive layer 420, having a lower refractive index, and the third refractive layer 430, having a higher refractive index, are designed to have thicknesses such that destructive interference occurs between reflected light R1 reflected from the upper surface of the third refractive layer 430 and reflected light R2 reflected at the interface between the third refractive layer 430 and the second refractive layer 420, thereby reducing the reflection of external light. A first refractive layer 410, having a moderate refractive index (e.g., between high and low refractive indices), is disposed between the cover window 310 and the second refractive layer 420, thereby reducing the refractive index difference at the interface between the second refractive layer 420 and the first refractive layer 410, as well as the refractive index difference at the interface between the first refractive layer 410 and the cover window 310. Therefore, the amount of reflection of reflected light R3 reflected at the interface between the second refractive layer 420 and the first refractive layer 410, and reflected light R4 reflected at the interface between the first refractive layer 410 and the cover window 310, can be reduced, thus reducing reflection at each interface.

[0168] In the aforementioned optical component 400, a second refractive layer 420 with a higher refractive index and a third refractive layer 430 with a lower refractive index (e.g., on the third-direction DR3) are alternately stacked, and a first refractive layer 410 with a moderate refractive index is located between the cover window 310 and the second refractive layer 420, thereby reducing the reflectivity of external light. Furthermore, by including a metal such as aluminum in the second refractive layer 420, the rigidity of the optical component 400 can be increased, thereby preventing warping. Additionally, by including a metal such as aluminum in the first refractive layer 410, the rigidity of the optical component 400 can be further increased, thereby further preventing warping.

[0169] Return to reference Figure 9 The functional component 600 can be disposed on the optical component 400. In an embodiment, the functional component 600 can be formed directly on the optical component 400 (e.g., on a third-direction DR3) and can be in direct contact with the upper surface of the optical component 400. For example, the functional component 600 can be in direct contact with the upper surface of the uppermost third refractive layer 430 forming the optical component 400.

[0170] In embodiments, the functional component 600 may include at least one of an anti-fingerprint layer, an anti-glare layer, an anti-scattering layer, an impact-absorbing layer, and an anti-scratch layer. According to embodiments of this disclosure, the functional component 600 may be an anti-fingerprint layer with anti-fingerprint functionality. In embodiments, the anti-fingerprint layer may include one or more of polyimide, polycarbonate, polyethersulfone, polyethylene naphthalate, polyphenylene sulfide, and polymethyl methacrylate. According to embodiments of this disclosure, the anti-fingerprint layer may also contain fluorine. According to embodiments, the anti-fingerprint layer may include a fluoropolymer.

[0171] In embodiments, the functional component 600 can be manufactured by spraying or coating one of the materials listed above in a liquid phase and then drying it. In embodiments, the thickness of the functional component 600 can be in the range of about 1 nm to about 1,000 nm. According to embodiments, when the functional component 600 is an anti-fingerprint layer, the thickness of the anti-fingerprint layer can be in the range of about 1 nm to about 10 nm. The refractive index of the functional component 600 can be similar to or equal to the refractive index of the third refractive layer 430 that directly contacts the functional component 600. For example, in embodiments, the refractive index of the functional component 600 can be in the range of about 1.3 to about 1.5 (such as about 1.4 to about 1.5). According to embodiments of this disclosure, the refractive index of the functional component 600 can be equal to the refractive index of the third refractive layer 430.

[0172] Figure 11 This is a schematic cross-sectional view of a window component according to an embodiment.

[0173] according to Figure 11The optical component 400 of the embodiment and Figure 9 The difference in the optical components of the above embodiments is that the third refractive layer 430 (instead of the second refractive layer 420) can be directly disposed on the upper surface of the first refractive layer 410 (e.g., on the third-direction DR3) and can be in direct contact with the first refractive layer 410. For ease of explanation, the following description will focus on the differences and redundant descriptions will be omitted.

[0174] In an embodiment, in the optical component 400, the first refractive layer 410, the third refractive layer 430, the second refractive layer 420, and the third refractive layer 430 may be sequentially stacked on the cover window 310 (e.g., on the third-direction DR3). For example, the optical component 400 may include a first refractive layer 410 directly disposed on the cover window 310, a third refractive layer 430 directly disposed on the first refractive layer 410, and at least one group including a second refractive layer 420 and a third refractive layer 430 alternately stacked directly disposed on the third refractive layer 430 (e.g., on the third-direction DR3). Although Figure 11 The embodiments shown include only one set of alternately stacked second refractive layers 420 and third refractive layers 430, but the embodiments disclosed herein are not limited to this, and in some embodiments, the number of sets may be two or more.

[0175] According to this embodiment, the total number of layers in the optical component 400 is four, which is consistent with... Figure 9 The embodiment shown has one less layer than the one shown. As a result, the thickness can be reduced. In embodiments where the total number of groups can be two or more, the total number of layers will still be one less, which will also result in a reduction in thickness. The refractive index of the first refractive layer 410, located directly on the cover window 310, can be between the refractive index of the third refractive layer 430 and the refractive index of the second refractive layer 420. For example, in an embodiment, the first refractive layer 410 can have a refractive index (e.g., the first refractive index) that is less than the refractive index of the third refractive layer 430 (e.g., the third refractive index) and greater than the refractive index of the second refractive layer 420 (e.g., the second refractive index). The first refractive layer 410 can reduce the difference in refractive index at the interface with the cover window 310 and can also reduce the difference in refractive index at the interface with the third refractive layer 430. Therefore, the amount of light reflected at the interface between the first refractive layer 410 and the cover window 310 can be reduced. In addition, the first refractive layer 410 can also perform functions not included. Figure 9 The function of the second refractive layer 420 is to reduce the amount of light reflected at the interface between the first refractive layer 410 and the third refractive layer 430.

[0176] According to this embodiment, the first refractive layer 410 additionally performs the function of the second refractive layer 420, which can reduce the total number of layers in the optical component 400. Therefore, the thickness of the optical component 400 can be reduced, and manufacturing costs can be reduced by omitting certain processes.

[0177] Figure 12 This is a schematic cross-sectional view of a window component according to an embodiment.

[0178] according to Figure 12 The optical component 400 of the embodiment differs from the one described above in that the second refractive layer 420 and the third refractive layer 430 can form a single group, and the optical component 400 can include three or more such groups.

[0179] In an embodiment, the optical component 400 may be disposed on the cover window 310 (e.g., directly disposed on the cover window 310 on the third-direction DR3). The optical component 400 may include a plurality of groups Gn, each composed of a second refractive layer 420 and a third refractive layer 430, and a first refractive layer 410. For example, the first refractive layer 410 may be disposed on the cover window 310 (e.g., directly disposed on the cover window 310 on the third-direction DR3). A plurality of groups, each composed of a second refractive layer 420 and a third refractive layer 430, may be disposed on the first refractive layer 410. For example, in an embodiment, a first group G1 having a second refractive layer 420 and a third refractive layer 430 may be arranged on the first refractive layer 410 (e.g., directly disposed on the first refractive layer 410 on the third-direction DR3), and a second group G2 having a second refractive layer 420 and a third refractive layer 430 may be arranged on the first group G1 (e.g., sequentially disposed directly on the first group G1 on the third-direction DR3). The nth group Gn can be placed on the second group G2 (e.g., directly placed on the second group G2 on the third direction DR3), where n is a natural number greater than or equal to 3.

[0180] According to embodiments of this disclosure, depending on the means employing window member 300 or desired optical characteristics, optical member 400 may include three or more groups Gn of a second refractive layer 420 and a third refractive layer 430. Functional member 600 may be arranged on optical member 400 (e.g., directly on optical member 400 on a third-direction DR3).

[0181] Figure 13 This is a schematic cross-sectional view of a window component according to an embodiment.

[0182] Figure 13 The embodiment differs from the above embodiment in that the upper surface of the cover window 310 includes a rough structure 320. Although in Figure 13 It shows Figure 9The structure of the embodiment is given as an example, but it will be understood that the embodiments disclosed herein are not necessarily limited thereto. The coarse structure 320 of the cover window 310 can also be applied to Figure 11 and Figure 12 The embodiment shown.

[0183] The cover window 310 may include a roughening structure 320. For example, the roughening structure 320 may be formed on the upper surface of the cover window 310 facing the first refractive layer 410, and may have an uneven, rough surface. The roughening structure 320 may be formed on the upper surface of the cover window 310 and may be in direct contact with the first refractive layer 410 of the optical component 400.

[0184] The rough structure 320 can be arranged randomly. For example, in an embodiment, the size, spacing, or height of the protrusions of the rough structure 320 can be random, and the shape of the protrusions can also be random.

[0185] The roughened structure 320 can reflect and scatter incident light from the outside to induce destructive interference. For example, incident light can be reflected and scattered between the protrusions of the roughened structure 320 and can undergo destructive interference. Therefore, the upper surface of the cover window 310 with the roughened structure 320 can reduce the reflection of external light. For example, in an embodiment, the direct reflectivity of the cover window 310 with the roughened structure 320 can be less than or equal to about 0.1%, and the scattered reflectivity can be less than or equal to about 0.9%.

[0186] In the following sections, examples and experimental examples based on the embodiments described above will be described. It should be noted that the embodiments disclosed herein are not necessarily limited thereto.

[0187] <Example: Manufacturing of window components> Comparative Example 1 A glass substrate with a thickness of 400 μm was prepared as Comparative Example 1.

[0188] Comparative Example 2 An 8 nm thick SiO2 layer and a 100 nm thick SiN layer are stacked on a 400 μm thick glass substrate. x Layer, a SiO2 layer with a thickness of 20 nm, and a SiN layer with a thickness of 20 nm. x A layer and a SiO2 layer with a thickness of 20 nm were stacked, and then an anti-fingerprint layer with a thickness of 5 nm were stacked to fabricate the window component of Comparative Example 2.

[0189] Example 1 A SiON layer with a thickness of 68 nm, an AlSiN layer with a thickness of 135 nm, a SiO2 layer with a thickness of 13 nm, an AlSiN layer with a thickness of 142 nm, and a SiO2 layer with a thickness of 77 nm are stacked on a glass substrate with a thickness of 400 μm, and then an anti-fingerprint layer with a thickness of 5 nm is stacked to fabricate the window component of Example 1.

[0190] Example 2 A SiON layer with a thickness of 73 nm, an AlSiN layer with a thickness of 170 nm, a SiO2 layer with a thickness of 13 nm, an AlSiN layer with a thickness of 153 nm, and an SiO2 layer with a thickness of 81 nm are stacked on a glass substrate with a thickness of 400 μm, and then an anti-fingerprint layer with a thickness of 5 nm is stacked to fabricate the window component of Example 2.

[0191] Example 3 A SiON layer with a thickness of 45 nm, a SiO2 layer with a thickness of 12 nm, an AlSiN layer with a thickness of 268 nm, and a SiO2 layer with a thickness of 81 nm are stacked on a glass substrate with a thickness of 400 μm, and then an anti-fingerprint layer with a thickness of 5 nm is stacked to fabricate the window component of Example 3.

[0192] In Examples 1 to 3, the refractive index of the SiON layer is approximately 1.72, the refractive index of the AlSiN layer is approximately 2.02, the refractive index of the SiO2 layer is approximately 1.46, and the refractive index of the anti-fingerprint layer is approximately 1.46.

[0193] <Experimental Example 1: Measurement of Transmittance and Reflectance of Window Components> The transmittance and reflectance of the window components manufactured according to Comparative Example 1, Comparative Example 2, Example 1, Example 2, and Example 3 were measured. The transmittance and reflectance were measured using a CM-3700A spectrophotometer, commercially available from Minolta Co., Ltd.

[0194] Figure 14 It is a graph showing the transmittance of the window components manufactured according to Comparative Example 1, Comparative Example 2 and Example 1 according to wavelength. Figure 15 It is a graph showing the reflectivity of the window components manufactured according to Comparative Example 1, Comparative Example 2 and Example 1 according to wavelength.

[0195] Reference Figure 14 It was found that the transmittance of the window component according to Example 1 was better than that of the window components according to Comparative Examples 1 and 2. Specifically, in the wavelength range of 350 nm to 550 nm, the transmittance of the window component according to Example 1 was significantly higher than that of the window component according to Comparative Example 2.

[0196] Reference Figure 15 It was found that the reflectivity of the window component according to Example 1 was better than (e.g., less than) the reflectivity of the window components according to Comparative Examples 1 and 2. Specifically, in the wavelength range of 350 nm to 550 nm, the reflectivity of the window component according to Example 1 was significantly lower than that of the window component according to Comparative Example 2.

[0197] These results show that, in the window member of Example 1, which has a SiON layer with a medium refractive index between a glass substrate and an AlSiN layer with a high refractive index, the reflectivity is reduced and the transmittance is increased. Specifically, when ultraviolet (UV) light is irradiated to cure the adhesive member 200 that bonds the display panel 100 to the window member 300, the transmittance of the window member 300 in the UV wavelength range is excellent, thus preventing incomplete curing of the adhesive member 200.

[0198] Figure 16 It is a graph showing the transmittance of the window components manufactured according to Comparative Example 2, Example 1 and Example 2 according to wavelength. Figure 17 It is a graph showing the reflectivity of the window components manufactured according to Comparative Example 2, Example 1 and Example 2 according to wavelength.

[0199] Reference Figure 16 and Figure 17 According to Example 2, the transmittance of the window component exhibits transmittance and reflectance comparable to those of Example 1 and Comparative Example 2 in the wavelength range of approximately 420 nm to approximately 700 nm.

[0200] These results show that the transmittance and reflectance of the window component according to Example 2 are comparable to those of Example 1 and Comparative Example 2 in the visible wavelength range. In Example 2, the thicknesses of the SiON layer, AlSiN layer, and SiO2 layer are increased compared to Example 1.

[0201] Figure 18 It is a graph showing the transmittance of the window components manufactured according to Comparative Example 2, Example 1 and Example 3 according to wavelength. Figure 19 It is a graph showing the reflectivity of the window components manufactured according to Comparative Example 2, Example 1 and Example 3 according to wavelength.

[0202] Reference Figure 18 and Figure 19 In the wavelength range of approximately 450 nm to approximately 750 nm, the transmittance and reflectance of the window element according to Example 3 are comparable to those of Example 1 and Comparative Example 2.

[0203] These results show that the transmittance and reflectance of the window component according to Example 3 (which has an AlSiN layer not included, thus reducing the thickness compared to Example 1) are comparable to those of Example 1 and Comparative Example 2 in the visible wavelength range.

[0204] Furthermore, each of the window components according to Examples 1 to 3 above has a cross-sectional reflectance of less than or equal to 1% at a wavelength of 550 nm, and an average cross-sectional reflectance of less than or equal to 1% in the wavelength range of 400 nm to 700 nm. For example, it can be seen that the reflectance of the window components according to Examples 1 to 3 is reduced and the transmittance is increased.

[0205] <Experiment Example 2: Measurement of the Hardness of Window Components> The hardness of the window components according to Examples 1 to 3 above was measured. The hardness was measured using a nanoindentation tester commercially available from Anton Paar GmbH.

[0206] The window components according to Examples 1 to 3 all exhibited a hardness exceeding 14 GPa.

[0207] These results show that the window components according to Examples 1 to 3 have excellent hardness.

[0208] The display device according to the embodiments can be applied to various electronic devices. The electronic device according to the embodiments includes the above-described display device, and may also include modules or devices with additional features in addition to the display device.

[0209] Figure 20 This is a block diagram of an electronic device according to an embodiment of the present disclosure.

[0210] Reference Figure 20 The electronic device 1 according to embodiments of the present disclosure may include a display module 11, a processor 12, a memory 13 and a power module 14.

[0211] The processor 12 may include at least one of the following devices: a central processing unit (CPU), an application processor (AP), a graphics processing unit (GPU), a communication processor (CP), an image signal processor (ISP), and a controller.

[0212] The memory 13 can store data information required for the operation of the processor 12 or the display module 11. When the processor 12 executes the application stored in the memory 13, image data signals and / or input control signals can be sent to the display module 11. The display module 11 can process the received signals and output image information through the display screen.

[0213] The power module 14 may include a power module such as a power adapter and a battery device, as well as a power conversion module that converts the power supplied by the power module to generate the power required for the operation of the electronic device 1.

[0214] At least one of the components of the electronic device 1 described above may be included in the display device according to the above embodiment. Additionally, some of the individual modules used as single modules may be included in the display device, while other modules may be disposed separately from the display device. For example, the display device may include display module 11, and the processor 12, memory 13, and power module 14 may be implemented as other devices within the electronic device 1 instead of the display device.

[0215] Figure 21 This is a view illustrating an electronic device according to various embodiments of the present disclosure.

[0216] Reference Figure 21 Various electronic devices employing the display device according to the embodiments may include not only image display electronic devices such as smartphones 1_1a, tablet PCs 1_1b, laptop computers 1_1c, TVs 1_1d, and desktop monitors 1_1e, but also wearable electronic devices including display modules such as smart glasses 1_2a, head-mounted displays 1_2b, and smartwatches 1_2c, as well as vehicle electronic devices 1_3 including display modules such as central information displays (CIDs) placed on the dashboard, center dashboard, and dashboard of a vehicle, and interior mirror displays.

[0217] In concluding this detailed description, those skilled in the art will appreciate that many variations and modifications can be made to the described embodiments without substantially departing from the concept of this disclosure. Therefore, the described embodiments of the invention are used in a general and descriptive sense only and not for limiting purposes.

Claims

1. A window component, the window component comprising: Cover window; Optical components are disposed on the cover window; as well as Functional components are disposed on the optical components. The optical component includes: a first refractive layer disposed on the cover window; and at least two groups disposed on the first refractive layer, each of the at least two groups including a second refractive layer and a third refractive layer, the second refractive layer and the third refractive layer having different refractive indices from each other, wherein the first refractive layer has a first refractive index between the second refractive index of the second refractive layer and the third refractive index of the third refractive layer, and the first refractive layer comprises at least silicon.

2. The window component according to claim 1, wherein, The first refractive layer includes an oxide containing silicon, an oxide containing silicon, or a nitride containing silicon.

3. The window component according to claim 2, wherein, The first refractive layer also comprises a metal, and the metal includes aluminum.

4. The window component according to claim 1, wherein, The second refractive index of the second refractive layer is greater than the first refractive index of the first refractive layer and the third refractive index of the third refractive layer.

5. The window component according to claim 1, wherein, The third refractive index of the third refractive layer is less than the first refractive index of the first refractive layer and the second refractive index of the second refractive layer.

6. The window component according to claim 5, wherein, The third refractive layer is spaced apart from the upper surface of the cover window.

7. The window component according to claim 1, wherein, The first refractive layer is in direct contact with the surface of the cover window, the second refractive layer is disposed on the first refractive layer, and the third refractive layer is disposed on the second refractive layer.

8. The window component according to claim 1, wherein, Each of the at least two groups has a second refractive layer and a third refractive layer that are stacked alternately on top of each other.

9. The window component according to claim 1, wherein, The first refractive index of the first refractive layer is between the fourth refractive index of the cover window and the second refractive index of the second refractive layer.

10. The window component according to claim 1, wherein: The first refractive index of the first refractive layer is in the range of 1.4 to 1.9; The second refractive index of the second refractive layer is greater than 1.9 and equal to or less than 2.3; and The third refractive index of the third refractive layer is greater than 1.3 and less than 1.

5.

11. The window component according to claim 1, wherein: The first refractive layer comprises at least silicon-containing oxide nitride; and The first refractive layer is in direct contact with the surface of the cover window.

12. The window component according to claim 1, wherein, The thickness of the first refractive layer is in the range of 75% to 95% of the thickness of the third refractive layer disposed at the uppermost layer of the optical component.

13. The window component according to claim 1, wherein, The thickness of the second refractive layer is in the range of 130% to 240% of the thickness of the third refractive layer disposed at the uppermost layer of the optical component.

14. The window component according to claim 1, wherein, The thickness of the third refractive layer is in the range of 1% to 30% of the total thickness of the optical component.

15. The window component according to claim 1, wherein, The functional component includes an anti-fingerprint layer, wherein the refractive index of the anti-fingerprint layer is equal to the third refractive index of the third refractive layer that is in direct contact with the anti-fingerprint layer.

16. The window component according to claim 1, wherein, The upper surface of the cover window facing the first refractive layer includes a rough structure.

17. The window component according to claim 1, wherein, The first refractive layer comprises a silicon-containing oxide, the second refractive layer comprises a silicon-containing nitride, and the third refractive layer comprises a silicon-containing oxide.

18. A window component, the window component comprising: Cover window; Optical components are disposed on the cover window; as well as Functional components are disposed on the optical components. The optical component comprises: a first refractive layer disposed on the cover window and comprising at least silicon; a third refractive layer disposed on the first refractive layer and having a third refractive index greater than a first refractive index of the first refractive layer; and at least one group comprising alternately stacked second and third refractive layers, the second refractive layer being disposed on the third refractive layer and having a second refractive index less than the third refractive index of the third refractive layer, wherein the first refractive layer is in direct contact with the cover window.

19. The window component according to claim 18, wherein, The first refractive layer comprises an oxide containing silicon, a nitride containing silicon, or an oxide nitride containing silicon.

20. An electronic device, the electronic device comprising: Display device, providing images; The processor provides image data signals to the display device; Memory, which stores data signals used for driving; as well as Power module, generates electricity. The display device includes: a display panel; an adhesive member disposed on the display panel; a cover window disposed on the adhesive member; an optical member disposed on the cover window; and a functional member disposed on the optical member. The optical component includes: a first refractive layer disposed on the cover window; and at least two groups disposed on the first refractive layer, each of the at least two groups including a second refractive layer and a third refractive layer, the second refractive layer and the third refractive layer having different refractive indices from each other, and wherein the first refractive layer has a first refractive index between the second refractive index of the second refractive layer and the third refractive index of the third refractive layer, and the first refractive layer comprises at least silicon.

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