A process for surface nickel plating of HVLP copper foil

By using HVLP spraying technology and vacuum heat treatment to form a dense nickel plating layer, the problems of high porosity and insufficient adhesion in the HVLP copper foil nickel plating process are solved, achieving low-energy consumption and environmentally friendly nickel plating treatment, and reducing heavy metal wastewater pollution.

CN122406207APending Publication Date: 2026-07-17JIANGXI XINBORUI TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
JIANGXI XINBORUI TECH CO LTD
Filing Date
2026-06-02
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

The existing HVLP copper foil nickel plating process suffers from high plating porosity, insufficient adhesion, easy corrosion and signal attenuation, and heavy metal wastewater pollution caused by the use of cyanide/acidic electrolytes.

Method used

HVLP spraying technology is used to form a nickel plating layer on the surface of copper foil using a nano-nickel powder suspension. High-purity nitrogen is used as the carrier gas through the HVLP spray gun, and the gas pressure and flow rate are controlled. After spraying, vacuum heat treatment is performed to form a dense nickel plating layer, avoiding the use of cyanide-containing or acidic electrolytes.

Benefits of technology

It reduces coating porosity, improves adhesion, avoids corrosion and signal attenuation, reduces heavy metal wastewater generation, and features simple process equipment and low energy consumption.

✦ Generated by Eureka AI based on patent content.

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Abstract

本发明公开了一种HVLP铜箔表面镀镍处理工艺,该工艺以HVLP喷枪为载体,将纳米镍粉悬浮液(固含量5‑15%)雾化后,在低压(0.2‑0.5 MPa)、高流量(80‑150 L / min)条件下,定向沉积于HVLP铜箔表面;同时采用表面改性纳米镍粉(粒径50‑200 nm,包覆有机分散剂),提升分散性与沉积效率。本发明可以降低镀层孔隙率,从而避免引发腐蚀与信号衰减;同时可以提升附着力,成型后厚度更加均匀;且此工艺不再依赖含氰或酸性电解液,大大降低重金属废水的产生,工艺所需的设备简单,能耗低。
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