Dual-probe tunneling electron beam transmission detection device and alignment and transmission detection method
By using a dual-probe tunneling electron beam transmission detection device, the transmission imaging and three-dimensional morphology reconstruction of the internal structure of nanoscale materials are achieved by utilizing the on-off state changes of the tunneling current. This solves the problems of sample conductivity and physical contact in STM technology and realizes high-precision three-dimensional spatial detection.
Patent Information
- Application Number
- CN202610851046.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-06-12
- Publication Date
- 2026-07-24
AI Technical Summary
Existing scanning tunneling microscopy (STM) technology cannot achieve transmission detection of the internal structure of materials. It is limited by the requirements of sample conductivity, physical contact between the probe and the sample, uncontrollable tunneling electron beam, and single signal usage, and cannot perform active scanning detection in three-dimensional space.
A dual-probe tunneling electron beam transmission detection device is used. By symmetrically arranging the first and second probe assemblies, a tunneling electron beam is generated using a bias power supply, and the on-off state change of the tunneling current is detected by a current detector, so as to realize transmission imaging and three-dimensional morphology reconstruction of nanoscale material structures.
It enables transmission detection of the internal structure of materials at the nanoscale with a spatial resolution of up to 0.01 nm. It is suitable for insulating samples, avoids physical contact damage, and can reconstruct the complete three-dimensional morphology.